JPS4917675A - - Google Patents

Info

Publication number
JPS4917675A
JPS4917675A JP48036818A JP3681873A JPS4917675A JP S4917675 A JPS4917675 A JP S4917675A JP 48036818 A JP48036818 A JP 48036818A JP 3681873 A JP3681873 A JP 3681873A JP S4917675 A JPS4917675 A JP S4917675A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP48036818A
Other languages
Japanese (ja)
Other versions
JPS525226B2 (US07696358-20100413-C00002.png
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4917675A publication Critical patent/JPS4917675A/ja
Publication of JPS525226B2 publication Critical patent/JPS525226B2/ja
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/16Feed and outlet means for the gases; Modifying the flow of the gases
    • C30B31/165Diffusion sources
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H01L21/223Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a gaseous phase

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP48036818A 1972-04-05 1973-04-02 Expired JPS525226B2 (US07696358-20100413-C00002.png)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7211912A FR2178751B1 (US07696358-20100413-C00002.png) 1972-04-05 1972-04-05

Publications (2)

Publication Number Publication Date
JPS4917675A true JPS4917675A (US07696358-20100413-C00002.png) 1974-02-16
JPS525226B2 JPS525226B2 (US07696358-20100413-C00002.png) 1977-02-10

Family

ID=9096355

Family Applications (1)

Application Number Title Priority Date Filing Date
JP48036818A Expired JPS525226B2 (US07696358-20100413-C00002.png) 1972-04-05 1973-04-02

Country Status (7)

Country Link
US (1) US3852129A (US07696358-20100413-C00002.png)
JP (1) JPS525226B2 (US07696358-20100413-C00002.png)
CA (1) CA984976A (US07696358-20100413-C00002.png)
DE (1) DE2315894C3 (US07696358-20100413-C00002.png)
FR (1) FR2178751B1 (US07696358-20100413-C00002.png)
GB (1) GB1372162A (US07696358-20100413-C00002.png)
IT (1) IT980738B (US07696358-20100413-C00002.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5561021A (en) * 1978-10-31 1980-05-08 Fujitsu Ltd Preparation of semiconductor device

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2284982A1 (fr) * 1974-09-16 1976-04-09 Radiotechnique Compelec Procede de diffusion d'impuretes dans des corps semiconducteurs
JPS5464978U (US07696358-20100413-C00002.png) * 1977-10-17 1979-05-08
FR2409791A1 (fr) * 1977-11-25 1979-06-22 Silicium Semiconducteur Ssc Appareils de dopage par diffusion de tranches semi-conductrices
US4348580A (en) * 1980-05-07 1982-09-07 Tylan Corporation Energy efficient furnace with movable end wall
US4415385A (en) * 1980-08-15 1983-11-15 Hitachi, Ltd. Diffusion of impurities into semiconductor using semi-closed inner diffusion vessel
US4742022A (en) * 1986-06-26 1988-05-03 Gte Laboratories Incorporated Method of diffusing zinc into III-V compound semiconductor material

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL125226C (US07696358-20100413-C00002.png) * 1960-05-02
US3305412A (en) * 1964-02-20 1967-02-21 Hughes Aircraft Co Method for preparing a gallium arsenide diode
DE1283204B (de) * 1964-06-20 1968-11-21 Siemens Ag Verfahren zum Eindiffundieren von zwei Fremdstoffen in einen einkristallinen Halbleiterkoerper
GB1054360A (US07696358-20100413-C00002.png) * 1964-12-05
GB1086660A (en) * 1964-12-22 1967-10-11 Siemens Ag A process for doping semiconductor bodies
US3279964A (en) * 1965-06-03 1966-10-18 Btu Eng Corp Method for continuous gas diffusion
US3617820A (en) * 1966-11-18 1971-11-02 Monsanto Co Injection-luminescent diodes
US3540952A (en) * 1968-01-02 1970-11-17 Gen Electric Process for fabricating semiconductor laser diodes
JPS4915903B1 (US07696358-20100413-C00002.png) * 1969-08-18 1974-04-18

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5561021A (en) * 1978-10-31 1980-05-08 Fujitsu Ltd Preparation of semiconductor device
JPS584811B2 (ja) * 1978-10-31 1983-01-27 富士通株式会社 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS525226B2 (US07696358-20100413-C00002.png) 1977-02-10
DE2315894C3 (de) 1980-10-02
DE2315894B2 (US07696358-20100413-C00002.png) 1980-02-07
GB1372162A (en) 1974-10-30
IT980738B (it) 1974-10-10
FR2178751A1 (US07696358-20100413-C00002.png) 1973-11-16
US3852129A (en) 1974-12-03
CA984976A (en) 1976-03-02
DE2315894A1 (de) 1973-10-18
FR2178751B1 (US07696358-20100413-C00002.png) 1974-10-18

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