JPS4914102B1 - - Google Patents
Info
- Publication number
- JPS4914102B1 JPS4914102B1 JP44000665A JP66569A JPS4914102B1 JP S4914102 B1 JPS4914102 B1 JP S4914102B1 JP 44000665 A JP44000665 A JP 44000665A JP 66569 A JP66569 A JP 66569A JP S4914102 B1 JPS4914102 B1 JP S4914102B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Electron Beam Exposure (AREA)
- Welding Or Cutting Using Electron Beams (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP44000665A JPS4914102B1 (ja) | 1968-12-26 | 1968-12-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP44000665A JPS4914102B1 (ja) | 1968-12-26 | 1968-12-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4914102B1 true JPS4914102B1 (ja) | 1974-04-05 |
Family
ID=11480013
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP44000665A Pending JPS4914102B1 (ja) | 1968-12-26 | 1968-12-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS4914102B1 (ja) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5317202U (ja) * | 1976-07-23 | 1978-02-14 | ||
| JP2009545178A (ja) * | 2006-07-25 | 2009-12-17 | シリコン ジェネシス コーポレーション | 連続大面積走査注入プロセスのための方法およびシステム |
| JP2011129332A (ja) * | 2009-12-17 | 2011-06-30 | Nissin Ion Equipment Co Ltd | イオンビーム照射装置 |
| JP2011249096A (ja) * | 2010-05-26 | 2011-12-08 | Nissin Ion Equipment Co Ltd | イオン注入装置 |
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1968
- 1968-12-26 JP JP44000665A patent/JPS4914102B1/ja active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5317202U (ja) * | 1976-07-23 | 1978-02-14 | ||
| JP2009545178A (ja) * | 2006-07-25 | 2009-12-17 | シリコン ジェネシス コーポレーション | 連続大面積走査注入プロセスのための方法およびシステム |
| JP2011129332A (ja) * | 2009-12-17 | 2011-06-30 | Nissin Ion Equipment Co Ltd | イオンビーム照射装置 |
| JP2011249096A (ja) * | 2010-05-26 | 2011-12-08 | Nissin Ion Equipment Co Ltd | イオン注入装置 |