JPS49131681A - - Google Patents
Info
- Publication number
- JPS49131681A JPS49131681A JP4540973A JP4540973A JPS49131681A JP S49131681 A JPS49131681 A JP S49131681A JP 4540973 A JP4540973 A JP 4540973A JP 4540973 A JP4540973 A JP 4540973A JP S49131681 A JPS49131681 A JP S49131681A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4540973A JPS5634857B2 (fr) | 1973-04-20 | 1973-04-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4540973A JPS5634857B2 (fr) | 1973-04-20 | 1973-04-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS49131681A true JPS49131681A (fr) | 1974-12-17 |
| JPS5634857B2 JPS5634857B2 (fr) | 1981-08-13 |
Family
ID=12718444
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4540973A Expired JPS5634857B2 (fr) | 1973-04-20 | 1973-04-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5634857B2 (fr) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5179575A (fr) * | 1975-01-06 | 1976-07-10 | Hitachi Ltd | |
| JPS5366376A (en) * | 1976-11-26 | 1978-06-13 | Fujitsu Ltd | Photo mask |
| JPS5950444A (ja) * | 1982-09-16 | 1984-03-23 | Tokyo Ohka Kogyo Co Ltd | 微細加工用ホトマスク |
| JPS60128449A (ja) * | 1983-12-15 | 1985-07-09 | Hoya Corp | フオトマスクとその製造方法 |
| JPS62235953A (ja) * | 1986-04-07 | 1987-10-16 | Fuotopori Ouka Kk | ホトマスク |
| WO1989001650A1 (fr) * | 1987-08-10 | 1989-02-23 | Idemitsu Petrochemical Company Limited | Element durable pour application de motifs |
-
1973
- 1973-04-20 JP JP4540973A patent/JPS5634857B2/ja not_active Expired
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5179575A (fr) * | 1975-01-06 | 1976-07-10 | Hitachi Ltd | |
| JPS5366376A (en) * | 1976-11-26 | 1978-06-13 | Fujitsu Ltd | Photo mask |
| JPS5427707B2 (fr) * | 1976-11-26 | 1979-09-11 | ||
| JPS5950444A (ja) * | 1982-09-16 | 1984-03-23 | Tokyo Ohka Kogyo Co Ltd | 微細加工用ホトマスク |
| JPS60128449A (ja) * | 1983-12-15 | 1985-07-09 | Hoya Corp | フオトマスクとその製造方法 |
| JPS62235953A (ja) * | 1986-04-07 | 1987-10-16 | Fuotopori Ouka Kk | ホトマスク |
| JPH0556500B2 (fr) * | 1986-04-07 | 1993-08-19 | Tokyo Ohka Kogyo Co Ltd | |
| WO1989001650A1 (fr) * | 1987-08-10 | 1989-02-23 | Idemitsu Petrochemical Company Limited | Element durable pour application de motifs |
| US5051295A (en) * | 1987-08-10 | 1991-09-24 | Idemitsu Petrochemical Company Limited | Protective film for photo masks and lith films |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5634857B2 (fr) | 1981-08-13 |