JPS49107679A - - Google Patents

Info

Publication number
JPS49107679A
JPS49107679A JP49011565A JP1156574A JPS49107679A JP S49107679 A JPS49107679 A JP S49107679A JP 49011565 A JP49011565 A JP 49011565A JP 1156574 A JP1156574 A JP 1156574A JP S49107679 A JPS49107679 A JP S49107679A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP49011565A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS49107679A publication Critical patent/JPS49107679A/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/40Crystalline structures
    • H10D62/405Orientations of crystalline planes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00Subject matter not provided for in other groups of this subclass
    • H10P14/6309
    • H10P14/6322
    • H10P14/662
    • H10P14/69215
    • H10P14/6923
    • H10P32/1414
    • H10P32/171
    • H10P95/00
    • H10W20/40

Landscapes

  • Bipolar Transistors (AREA)
JP49011565A 1973-02-05 1974-01-29 Pending JPS49107679A (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US329795A US3915767A (en) 1973-02-05 1973-02-05 Rapidly responsive transistor with narrowed base

Publications (1)

Publication Number Publication Date
JPS49107679A true JPS49107679A (enExample) 1974-10-12

Family

ID=23287051

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49011565A Pending JPS49107679A (enExample) 1973-02-05 1974-01-29

Country Status (3)

Country Link
US (1) US3915767A (enExample)
JP (1) JPS49107679A (enExample)
GB (1) GB1467263A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5359380A (en) * 1976-11-09 1978-05-29 Nippon Gakki Seizo Kk Production of transistor

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4006046A (en) * 1975-04-21 1977-02-01 Trw Inc. Method for compensating for emitter-push effect in the fabrication of transistors
US4063973A (en) * 1975-11-10 1977-12-20 Tokyo Shibaura Electric Co., Ltd. Method of making a semiconductor device
JPS543479A (en) * 1977-06-09 1979-01-11 Toshiba Corp Semiconductor device and its manufacture
US4191603A (en) * 1978-05-01 1980-03-04 International Business Machines Corporation Making semiconductor structure with improved phosphosilicate glass isolation
US4157269A (en) * 1978-06-06 1979-06-05 International Business Machines Corporation Utilizing polysilicon diffusion sources and special masking techniques
JPS5544713A (en) * 1978-09-26 1980-03-29 Toshiba Corp Semiconductor device
JPS5586151A (en) * 1978-12-23 1980-06-28 Chiyou Lsi Gijutsu Kenkyu Kumiai Manufacture of semiconductor integrated circuit
US4263066A (en) * 1980-06-09 1981-04-21 Varian Associates, Inc. Process for concurrent formation of base diffusion and p+ profile from single source predeposition
US4567644A (en) * 1982-12-20 1986-02-04 Signetics Corporation Method of making triple diffused ISL structure
IT1188309B (it) * 1986-01-24 1988-01-07 Sgs Microelettrica Spa Procedimento per la fabbricazione di dispositivi elettronici integrati,in particolare transistori mos a canale p ad alta tensione
JP2565317B2 (ja) * 1986-12-03 1996-12-18 富士通株式会社 半導体装置の製造方法
KR900005123B1 (ko) * 1987-09-26 1990-07-19 삼성전자 주식회사 바이폴라 트랜지스터의 제조방법
US5236867A (en) * 1987-11-13 1993-08-17 Matsushita Electronics Corporation Manufacturing method of contact hole arrangement of a semiconductor device
US5008207A (en) * 1989-09-11 1991-04-16 International Business Machines Corporation Method of fabricating a narrow base transistor
US5132765A (en) * 1989-09-11 1992-07-21 Blouse Jeffrey L Narrow base transistor and method of fabricating same
US5274267A (en) * 1992-01-31 1993-12-28 International Business Machines Corporation Bipolar transistor with low extrinsic base resistance and low noise
JP2924417B2 (ja) * 1992-02-26 1999-07-26 日本電気株式会社 半導体装置
JP3527148B2 (ja) * 1999-09-24 2004-05-17 日本電気株式会社 半導体装置の製造方法
US6406966B1 (en) * 2000-11-07 2002-06-18 National Semiconductor Corporation Uniform emitter formation using selective laser recrystallization

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3664896A (en) * 1969-07-28 1972-05-23 David M Duncan Deposited silicon diffusion sources
JPS495668B1 (enExample) * 1970-04-03 1974-02-08
US3660156A (en) * 1970-08-19 1972-05-02 Monsanto Co Semiconductor doping compositions
US3673471A (en) * 1970-10-08 1972-06-27 Fairchild Camera Instr Co Doped semiconductor electrodes for mos type devices
US3759762A (en) * 1970-10-19 1973-09-18 Motorola Inc Method of forming integrated circuits utilizing low resistance valueslow temperature deposited oxides and shallow junctions
US3753807A (en) * 1972-02-24 1973-08-21 Bell Canada Northern Electric Manufacture of bipolar semiconductor devices

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5359380A (en) * 1976-11-09 1978-05-29 Nippon Gakki Seizo Kk Production of transistor

Also Published As

Publication number Publication date
GB1467263A (en) 1977-03-16
US3915767A (en) 1975-10-28

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