JPS4893401A - - Google Patents
Info
- Publication number
- JPS4893401A JPS4893401A JP2546072A JP2546072A JPS4893401A JP S4893401 A JPS4893401 A JP S4893401A JP 2546072 A JP2546072 A JP 2546072A JP 2546072 A JP2546072 A JP 2546072A JP S4893401 A JPS4893401 A JP S4893401A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
- G03F1/56—Organic absorbers, e.g. of photo-resists
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
- G03F7/0215—Natural gums; Proteins, e.g. gelatins; Macromolecular carbohydrates, e.g. cellulose; Polyvinyl alcohol and derivatives thereof, e.g. polyvinylacetals
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2546072A JPS5027402B2 (en:Method) | 1972-03-13 | 1972-03-13 | |
| IT4872673A IT982883B (it) | 1972-03-13 | 1973-03-12 | Elemento fotosensibile e procedi mento per fabbricare negative a finestra aperta |
| FR7308853A FR2175955B1 (en:Method) | 1972-03-13 | 1973-03-13 | |
| GB1207773A GB1424817A (en) | 1972-03-13 | 1973-03-13 | Photosensitive elements |
| CH360773A CH563026A5 (en:Method) | 1972-03-13 | 1973-03-13 | |
| DE2312496A DE2312496C2 (de) | 1972-03-13 | 1973-03-13 | Verfahren zur Herstellung von leicht abschälbaren Negativdruckvorlagen |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2546072A JPS5027402B2 (en:Method) | 1972-03-13 | 1972-03-13 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4893401A true JPS4893401A (en:Method) | 1973-12-03 |
| JPS5027402B2 JPS5027402B2 (en:Method) | 1975-09-08 |
Family
ID=12166628
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2546072A Expired JPS5027402B2 (en:Method) | 1972-03-13 | 1972-03-13 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS5027402B2 (en:Method) |
| DE (1) | DE2312496C2 (en:Method) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5351004A (en) * | 1976-10-18 | 1978-05-10 | Aicello Chemical Co | Composition of photosensitive resin plate |
| JPS5534205A (en) * | 1978-08-30 | 1980-03-10 | Hitachi Ltd | Photosensitive composition |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5858546A (ja) * | 1981-10-02 | 1983-04-07 | Kimoto & Co Ltd | 製版用感光性マスク材料 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE686123C (de) * | 1935-06-05 | 1940-01-03 | Chemische Forschungs Gmbh | Verfahren zur Veraenderung der Eigenschaften von Polyvinylalkoholen und ihren Derivaten |
| DE754015C (de) * | 1940-02-24 | 1953-05-11 | Johannes Dr Albrecht | Lichtempfindliche Schicht zur Herstellung von Druckformen |
| GB1165832A (en) * | 1967-05-12 | 1969-10-01 | Ilford Ltd | Photographic Silver Halide Emulsions of the Print-Out Type |
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1972
- 1972-03-13 JP JP2546072A patent/JPS5027402B2/ja not_active Expired
-
1973
- 1973-03-13 DE DE2312496A patent/DE2312496C2/de not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5351004A (en) * | 1976-10-18 | 1978-05-10 | Aicello Chemical Co | Composition of photosensitive resin plate |
| JPS5534205A (en) * | 1978-08-30 | 1980-03-10 | Hitachi Ltd | Photosensitive composition |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2312496A1 (de) | 1973-09-27 |
| JPS5027402B2 (en:Method) | 1975-09-08 |
| DE2312496C2 (de) | 1985-01-31 |