JPS4888990A - - Google Patents
Info
- Publication number
- JPS4888990A JPS4888990A JP47018073A JP1807372A JPS4888990A JP S4888990 A JPS4888990 A JP S4888990A JP 47018073 A JP47018073 A JP 47018073A JP 1807372 A JP1807372 A JP 1807372A JP S4888990 A JPS4888990 A JP S4888990A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1807372A JPS535831B2 (ja) | 1972-02-23 | 1972-02-23 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1807372A JPS535831B2 (ja) | 1972-02-23 | 1972-02-23 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4888990A true JPS4888990A (ja) | 1973-11-21 |
| JPS535831B2 JPS535831B2 (ja) | 1978-03-02 |
Family
ID=11961474
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1807372A Expired JPS535831B2 (ja) | 1972-02-23 | 1972-02-23 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS535831B2 (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2022106761A (ja) * | 2015-02-10 | 2022-07-20 | ノヴァ メジャリング インスツルメンツ インコーポレイテッド | 二次イオン質量分析を用いた半導体測定および表面分析のためのシステムならびに手法 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6345637Y2 (ja) * | 1980-07-23 | 1988-11-28 |
-
1972
- 1972-02-23 JP JP1807372A patent/JPS535831B2/ja not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2022106761A (ja) * | 2015-02-10 | 2022-07-20 | ノヴァ メジャリング インスツルメンツ インコーポレイテッド | 二次イオン質量分析を用いた半導体測定および表面分析のためのシステムならびに手法 |
| US11764050B2 (en) | 2015-02-10 | 2023-09-19 | Nova Measuring Instruments Inc. | Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS535831B2 (ja) | 1978-03-02 |