JPS4880440A - - Google Patents
Info
- Publication number
- JPS4880440A JPS4880440A JP1248072A JP1248072A JPS4880440A JP S4880440 A JPS4880440 A JP S4880440A JP 1248072 A JP1248072 A JP 1248072A JP 1248072 A JP1248072 A JP 1248072A JP S4880440 A JPS4880440 A JP S4880440A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Weting (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1248072A JPS558590B2 (https=) | 1972-02-02 | 1972-02-02 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1248072A JPS558590B2 (https=) | 1972-02-02 | 1972-02-02 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4880440A true JPS4880440A (https=) | 1973-10-27 |
| JPS558590B2 JPS558590B2 (https=) | 1980-03-05 |
Family
ID=11806539
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1248072A Expired JPS558590B2 (https=) | 1972-02-02 | 1972-02-02 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS558590B2 (https=) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5076987A (https=) * | 1973-11-08 | 1975-06-24 | ||
| JPS50110284A (https=) * | 1974-02-06 | 1975-08-30 | ||
| JPS5199935A (https=) * | 1975-03-01 | 1976-09-03 | Canon Kk | |
| JPS5373086A (en) * | 1976-12-11 | 1978-06-29 | Fujitsu Ltd | Formation of multilayer wiring structure |
| JPS5497372A (en) * | 1978-01-19 | 1979-08-01 | Mitsubishi Electric Corp | Etching method of metal layer |
| JPS5570029A (en) * | 1978-11-21 | 1980-05-27 | Mitsubishi Electric Corp | Etching method of silicon nitride film |
| JPS55145178A (en) * | 1979-05-02 | 1980-11-12 | Agency Of Ind Science & Technol | Precision working method of solid surface |
| JPS5923522A (ja) * | 1982-07-29 | 1984-02-07 | Matsushita Electronics Corp | ドライエツチング方法 |
| JPS61114556A (ja) * | 1984-11-09 | 1986-06-02 | Fujitsu Ltd | 半導体装置の製造方法 |
| JPS6272129A (ja) * | 1985-09-26 | 1987-04-02 | Toshiba Corp | 半導体装置の製造方法 |
-
1972
- 1972-02-02 JP JP1248072A patent/JPS558590B2/ja not_active Expired
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5076987A (https=) * | 1973-11-08 | 1975-06-24 | ||
| JPS50110284A (https=) * | 1974-02-06 | 1975-08-30 | ||
| JPS5199935A (https=) * | 1975-03-01 | 1976-09-03 | Canon Kk | |
| JPS5373086A (en) * | 1976-12-11 | 1978-06-29 | Fujitsu Ltd | Formation of multilayer wiring structure |
| JPS5497372A (en) * | 1978-01-19 | 1979-08-01 | Mitsubishi Electric Corp | Etching method of metal layer |
| JPS5570029A (en) * | 1978-11-21 | 1980-05-27 | Mitsubishi Electric Corp | Etching method of silicon nitride film |
| JPS55145178A (en) * | 1979-05-02 | 1980-11-12 | Agency Of Ind Science & Technol | Precision working method of solid surface |
| JPS5923522A (ja) * | 1982-07-29 | 1984-02-07 | Matsushita Electronics Corp | ドライエツチング方法 |
| JPS61114556A (ja) * | 1984-11-09 | 1986-06-02 | Fujitsu Ltd | 半導体装置の製造方法 |
| JPS6272129A (ja) * | 1985-09-26 | 1987-04-02 | Toshiba Corp | 半導体装置の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS558590B2 (https=) | 1980-03-05 |