JPS4879617A - - Google Patents

Info

Publication number
JPS4879617A
JPS4879617A JP909572A JP909572A JPS4879617A JP S4879617 A JPS4879617 A JP S4879617A JP 909572 A JP909572 A JP 909572A JP 909572 A JP909572 A JP 909572A JP S4879617 A JPS4879617 A JP S4879617A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP909572A
Other languages
Japanese (ja)
Other versions
JPS5119982B2 (cg-RX-API-DMAC7.html
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP47009095A priority Critical patent/JPS5119982B2/ja
Priority to FR7302524A priority patent/FR2169217B1/fr
Priority to DE19732303671 priority patent/DE2303671C3/de
Priority to GB389273A priority patent/GB1376114A/en
Publication of JPS4879617A publication Critical patent/JPS4879617A/ja
Publication of JPS5119982B2 publication Critical patent/JPS5119982B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/0085—Azides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Photoreceptors In Electrophotography (AREA)
JP47009095A 1972-01-26 1972-01-26 Expired JPS5119982B2 (cg-RX-API-DMAC7.html)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP47009095A JPS5119982B2 (cg-RX-API-DMAC7.html) 1972-01-26 1972-01-26
FR7302524A FR2169217B1 (cg-RX-API-DMAC7.html) 1972-01-26 1973-01-24
DE19732303671 DE2303671C3 (de) 1972-01-26 1973-01-25 Lichthärtbare Photoresistschicht
GB389273A GB1376114A (en) 1972-01-26 1973-01-25 Photoresist layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP47009095A JPS5119982B2 (cg-RX-API-DMAC7.html) 1972-01-26 1972-01-26

Publications (2)

Publication Number Publication Date
JPS4879617A true JPS4879617A (cg-RX-API-DMAC7.html) 1973-10-25
JPS5119982B2 JPS5119982B2 (cg-RX-API-DMAC7.html) 1976-06-22

Family

ID=11711041

Family Applications (1)

Application Number Title Priority Date Filing Date
JP47009095A Expired JPS5119982B2 (cg-RX-API-DMAC7.html) 1972-01-26 1972-01-26

Country Status (3)

Country Link
JP (1) JPS5119982B2 (cg-RX-API-DMAC7.html)
FR (1) FR2169217B1 (cg-RX-API-DMAC7.html)
GB (1) GB1376114A (cg-RX-API-DMAC7.html)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5152002A (en) * 1974-08-29 1976-05-08 Hoechst Ag Oo nafutokinonjiajidojudotaide purisenshitaizushitainsatsuban
JPS5741636A (en) * 1980-08-27 1982-03-08 Toshiba Corp Photoresist composition
JPS6175304A (ja) * 1984-09-21 1986-04-17 Casio Comput Co Ltd カラ−液晶表示素子
JPH01139650A (ja) * 1987-10-15 1989-06-01 Hercules Inc ビニルシラン・アジドシラン変性熱可塑性ポリマー組成物
WO2007004345A1 (ja) * 2005-06-30 2007-01-11 Toray Industries, Inc. 感光性樹脂組成物および接着改良剤

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4491629A (en) * 1982-02-22 1985-01-01 Tokyo Shibaura Denki Kabushiki Kaisha Water soluble photoresist composition with bisazide, diazo, polymer and silane
NL8203980A (nl) * 1982-10-15 1984-05-01 Philips Nv Werkwijze voor de fotolithografische behandeling van een substraat.
JPS60147729A (ja) * 1984-01-12 1985-08-03 Toshiba Corp ホトレジスト組成物
GB8403698D0 (en) * 1984-02-13 1984-03-14 British Telecomm Semiconductor device fabrication
US4950583A (en) * 1986-09-17 1990-08-21 Brewer Science Inc. Adhesion promoting product and process for treating an integrated circuit substrate therewith
AU603908B2 (en) * 1987-07-30 1990-11-29 Minnesota Mining And Manufacturing Company Subbing layers for photographic elements and photographic elements incorporating such layers
US4886739A (en) * 1988-08-10 1989-12-12 Eastman Kodak Company Thermally processable imaging element and process

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS494851A (cg-RX-API-DMAC7.html) * 1972-05-04 1974-01-17

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS494851A (cg-RX-API-DMAC7.html) * 1972-05-04 1974-01-17

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5152002A (en) * 1974-08-29 1976-05-08 Hoechst Ag Oo nafutokinonjiajidojudotaide purisenshitaizushitainsatsuban
JPS5741636A (en) * 1980-08-27 1982-03-08 Toshiba Corp Photoresist composition
JPS6175304A (ja) * 1984-09-21 1986-04-17 Casio Comput Co Ltd カラ−液晶表示素子
JPH01139650A (ja) * 1987-10-15 1989-06-01 Hercules Inc ビニルシラン・アジドシラン変性熱可塑性ポリマー組成物
WO2007004345A1 (ja) * 2005-06-30 2007-01-11 Toray Industries, Inc. 感光性樹脂組成物および接着改良剤
US7977028B2 (en) 2005-06-30 2011-07-12 Toray Industries, Inc. Photosensitive resin composition and adhesion promoter

Also Published As

Publication number Publication date
DE2303671B2 (de) 1975-10-23
GB1376114A (en) 1974-12-04
FR2169217B1 (cg-RX-API-DMAC7.html) 1983-05-27
FR2169217A1 (cg-RX-API-DMAC7.html) 1973-09-07
JPS5119982B2 (cg-RX-API-DMAC7.html) 1976-06-22
DE2303671A1 (de) 1973-08-09

Similar Documents

Publication Publication Date Title
FR2198127B1 (cg-RX-API-DMAC7.html)
FR2169217B1 (cg-RX-API-DMAC7.html)
JPS4927009U (cg-RX-API-DMAC7.html)
FR2208547A5 (cg-RX-API-DMAC7.html)
CS173640B2 (cg-RX-API-DMAC7.html)
JPS4936972U (cg-RX-API-DMAC7.html)
JPS5721404B2 (cg-RX-API-DMAC7.html)
JPS4953947A (cg-RX-API-DMAC7.html)
JPS4985551A (cg-RX-API-DMAC7.html)
CH566258A5 (cg-RX-API-DMAC7.html)
CH562747A5 (cg-RX-API-DMAC7.html)
CH594019A5 (cg-RX-API-DMAC7.html)
SE7115867L (cg-RX-API-DMAC7.html)
CH568124A5 (cg-RX-API-DMAC7.html)
CH568307A5 (cg-RX-API-DMAC7.html)
CH1291872A4 (cg-RX-API-DMAC7.html)
CH561657A5 (cg-RX-API-DMAC7.html)
CH566534A5 (cg-RX-API-DMAC7.html)
BG17922A1 (cg-RX-API-DMAC7.html)
BG17866A1 (cg-RX-API-DMAC7.html)
CH570407A5 (cg-RX-API-DMAC7.html)
BG18223A1 (cg-RX-API-DMAC7.html)
CH560847A5 (cg-RX-API-DMAC7.html)
CH563739A5 (cg-RX-API-DMAC7.html)
BG19252A1 (cg-RX-API-DMAC7.html)