JPS4865271A - - Google Patents
Info
- Publication number
- JPS4865271A JPS4865271A JP10018971A JP10018971A JPS4865271A JP S4865271 A JPS4865271 A JP S4865271A JP 10018971 A JP10018971 A JP 10018971A JP 10018971 A JP10018971 A JP 10018971A JP S4865271 A JPS4865271 A JP S4865271A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10018971A JPS5139836B2 (enrdf_load_stackoverflow) | 1971-12-13 | 1971-12-13 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10018971A JPS5139836B2 (enrdf_load_stackoverflow) | 1971-12-13 | 1971-12-13 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4865271A true JPS4865271A (enrdf_load_stackoverflow) | 1973-09-08 |
| JPS5139836B2 JPS5139836B2 (enrdf_load_stackoverflow) | 1976-10-29 |
Family
ID=14267339
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10018971A Expired JPS5139836B2 (enrdf_load_stackoverflow) | 1971-12-13 | 1971-12-13 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5139836B2 (enrdf_load_stackoverflow) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50159567A (enrdf_load_stackoverflow) * | 1974-06-14 | 1975-12-24 | ||
| JPS58103534A (ja) * | 1981-12-16 | 1983-06-20 | Toshiba Corp | 真空蒸着装置 |
| JPS5941837A (ja) * | 1982-08-31 | 1984-03-08 | Mitsubishi Electric Corp | フオトレジストの被着方法 |
| JPS60180144A (ja) * | 1984-02-27 | 1985-09-13 | Nec Kansai Ltd | 半導体素子製造方法 |
| JPH0661601A (ja) * | 1992-06-04 | 1994-03-04 | Internatl Business Mach Corp <Ibm> | メタライゼーション層及びその形成方法 |
-
1971
- 1971-12-13 JP JP10018971A patent/JPS5139836B2/ja not_active Expired
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50159567A (enrdf_load_stackoverflow) * | 1974-06-14 | 1975-12-24 | ||
| JPS58103534A (ja) * | 1981-12-16 | 1983-06-20 | Toshiba Corp | 真空蒸着装置 |
| JPS5941837A (ja) * | 1982-08-31 | 1984-03-08 | Mitsubishi Electric Corp | フオトレジストの被着方法 |
| JPS60180144A (ja) * | 1984-02-27 | 1985-09-13 | Nec Kansai Ltd | 半導体素子製造方法 |
| JPH0661601A (ja) * | 1992-06-04 | 1994-03-04 | Internatl Business Mach Corp <Ibm> | メタライゼーション層及びその形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5139836B2 (enrdf_load_stackoverflow) | 1976-10-29 |