JPS4840699A - - Google Patents
Info
- Publication number
- JPS4840699A JPS4840699A JP9135872A JP9135872A JPS4840699A JP S4840699 A JPS4840699 A JP S4840699A JP 9135872 A JP9135872 A JP 9135872A JP 9135872 A JP9135872 A JP 9135872A JP S4840699 A JPS4840699 A JP S4840699A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US18440571A | 1971-09-28 | 1971-09-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4840699A true JPS4840699A (ja) | 1973-06-14 |
Family
ID=22676735
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9135872A Pending JPS4840699A (ja) | 1971-09-28 | 1972-09-13 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS4840699A (ja) |
| DE (1) | DE2243153A1 (ja) |
| FR (1) | FR2154459B1 (ja) |
| GB (1) | GB1338370A (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5031028B1 (ja) * | 1968-08-15 | 1975-10-06 |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3878085A (en) * | 1973-07-05 | 1975-04-15 | Sloan Technology Corp | Cathode sputtering apparatus |
| DE3316548C2 (de) * | 1983-03-25 | 1985-01-17 | Flachglas AG, 8510 Fürth | Verfahren zur Beschichtung eines transparenten Substrates |
| GB2178061B (en) * | 1985-07-01 | 1989-04-26 | Atomic Energy Authority Uk | Coating improvements |
| GB2182350B (en) * | 1985-07-01 | 1989-04-26 | Atomic Energy Authority Uk | Coating improvements |
| GB2180262B (en) * | 1985-09-05 | 1990-05-09 | Plessey Co Plc | Methods of forming substances on substrates by reactive sputtering |
| GB2181461B (en) * | 1985-10-10 | 1989-09-27 | Canadian Patents Dev | Doping semiconductor compounds by reactive sputtering |
-
1972
- 1972-08-29 FR FR7231325A patent/FR2154459B1/fr not_active Expired
- 1972-08-30 GB GB4015872A patent/GB1338370A/en not_active Expired
- 1972-09-01 DE DE19722243153 patent/DE2243153A1/de active Pending
- 1972-09-13 JP JP9135872A patent/JPS4840699A/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5031028B1 (ja) * | 1968-08-15 | 1975-10-06 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2243153A1 (de) | 1973-04-05 |
| FR2154459B1 (ja) | 1974-08-19 |
| GB1338370A (en) | 1973-11-21 |
| FR2154459A1 (ja) | 1973-05-11 |