JPS4830703B1 - - Google Patents

Info

Publication number
JPS4830703B1
JPS4830703B1 JP41081285A JP8128566A JPS4830703B1 JP S4830703 B1 JPS4830703 B1 JP S4830703B1 JP 41081285 A JP41081285 A JP 41081285A JP 8128566 A JP8128566 A JP 8128566A JP S4830703 B1 JPS4830703 B1 JP S4830703B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP41081285A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4830703B1 publication Critical patent/JPS4830703B1/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/01Manufacture or treatment
    • H10D64/011Manufacture or treatment of electrodes ohmically coupled to a semiconductor
    • H10D64/0111Manufacture or treatment of electrodes ohmically coupled to a semiconductor to Group IV semiconductors
    • H10D64/0113Manufacture or treatment of electrodes ohmically coupled to a semiconductor to Group IV semiconductors the conductive layers comprising highly doped semiconductor materials, e.g. polysilicon layers or amorphous silicon layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P32/00Diffusion of dopants within, into or out of wafers, substrates or parts of devices
    • H10P32/10Diffusion of dopants within, into or out of semiconductor bodies or layers
    • H10P32/14Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase
    • H10P32/1408Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase from or through or into an external applied layer, e.g. photoresist or nitride layers
    • H10P32/1414Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase from or through or into an external applied layer, e.g. photoresist or nitride layers the applied layer being silicon, silicide or SIPOS, e.g. polysilicon or porous silicon
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P32/00Diffusion of dopants within, into or out of wafers, substrates or parts of devices
    • H10P32/10Diffusion of dopants within, into or out of semiconductor bodies or layers
    • H10P32/17Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material
    • H10P32/171Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material being group IV material
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/043Dual dielectric
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/122Polycrystalline
JP41081285A 1965-12-13 1966-12-13 Pending JPS4830703B1 (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DES0100933 1965-12-13

Publications (1)

Publication Number Publication Date
JPS4830703B1 true JPS4830703B1 (enExample) 1973-09-22

Family

ID=7523384

Family Applications (1)

Application Number Title Priority Date Filing Date
JP41081285A Pending JPS4830703B1 (enExample) 1965-12-13 1966-12-13

Country Status (9)

Country Link
US (1) US3502517A (enExample)
JP (1) JPS4830703B1 (enExample)
AT (1) AT264591B (enExample)
CH (1) CH489906A (enExample)
DE (1) DE1544273A1 (enExample)
FR (1) FR1504977A (enExample)
GB (1) GB1100780A (enExample)
NL (1) NL6614433A (enExample)
SE (1) SE331719B (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3577045A (en) * 1968-09-18 1971-05-04 Gen Electric High emitter efficiency simiconductor device with low base resistance and by selective diffusion of base impurities
US3601888A (en) * 1969-04-25 1971-08-31 Gen Electric Semiconductor fabrication technique and devices formed thereby utilizing a doped metal conductor
US3717514A (en) * 1970-10-06 1973-02-20 Motorola Inc Single crystal silicon contact for integrated circuits and method for making same
US3699646A (en) * 1970-12-28 1972-10-24 Intel Corp Integrated circuit structure and method for making integrated circuit structure
US3940288A (en) 1973-05-16 1976-02-24 Fujitsu Limited Method of making a semiconductor device
US3880676A (en) * 1973-10-29 1975-04-29 Rca Corp Method of making a semiconductor device
JPS5950113B2 (ja) * 1975-11-05 1984-12-06 株式会社東芝 半導体装置
US4063973A (en) * 1975-11-10 1977-12-20 Tokyo Shibaura Electric Co., Ltd. Method of making a semiconductor device
JPS5317081A (en) * 1976-07-30 1978-02-16 Sharp Corp Production of i2l device
GB1548520A (en) * 1976-08-27 1979-07-18 Tokyo Shibaura Electric Co Method of manufacturing a semiconductor device
US4050967A (en) * 1976-12-09 1977-09-27 Rca Corporation Method of selective aluminum diffusion
US4157926A (en) * 1977-02-24 1979-06-12 The United States Of America As Represented By The Secretary Of The Navy Method of fabricating a high electrical frequency infrared detector by vacuum deposition
US4274892A (en) * 1978-12-14 1981-06-23 Trw Inc. Dopant diffusion method of making semiconductor products
US4472212A (en) * 1982-02-26 1984-09-18 At&T Bell Laboratories Method for fabricating a semiconductor device
WO1983003029A1 (en) * 1982-02-26 1983-09-01 Western Electric Co Diffusion of shallow regions
US4698104A (en) * 1984-12-06 1987-10-06 Xerox Corporation Controlled isotropic doping of semiconductor materials
EP0410390A3 (en) * 1989-07-27 1993-02-24 Seiko Instruments Inc. Method of producing semiconductor device
WO2012170087A1 (en) * 2011-06-10 2012-12-13 Massachusetts Institute Of Technology High-concentration active doping in semiconductors and semiconductor devices produced by such doping

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3089794A (en) * 1959-06-30 1963-05-14 Ibm Fabrication of pn junctions by deposition followed by diffusion
NL268758A (enExample) * 1960-09-20
US3189973A (en) * 1961-11-27 1965-06-22 Bell Telephone Labor Inc Method of fabricating a semiconductor device
BE636317A (enExample) * 1962-08-23 1900-01-01
US3275910A (en) * 1963-01-18 1966-09-27 Motorola Inc Planar transistor with a relative higher-resistivity base region
US3326729A (en) * 1963-08-20 1967-06-20 Hughes Aircraft Co Epitaxial method for the production of microcircuit components
NL6504750A (enExample) * 1964-04-15 1965-10-18

Also Published As

Publication number Publication date
FR1504977A (fr) 1967-12-08
DE1544273A1 (de) 1969-09-04
SE331719B (enExample) 1971-01-11
GB1100780A (en) 1968-01-24
AT264591B (de) 1968-09-10
US3502517A (en) 1970-03-24
NL6614433A (enExample) 1967-06-14
CH489906A (de) 1970-04-30

Similar Documents

Publication Publication Date Title
FI43434B (enExample)
BE669499A (enExample)
BE659872A (enExample)
BE663414A (enExample)
BE663720A (enExample)
BE664422A (enExample)
BE664522A (enExample)
BE665556A (enExample)
BE665839A (enExample)
BE665895A (enExample)
BE666844A (enExample)
BE667866A (enExample)
BE668008A (enExample)
BE668163A (enExample)
BE668355A (enExample)
BE668594A (enExample)
BE668933A (enExample)
BE668955A (enExample)
BE669168A (enExample)
BE675010A (enExample)
BE670507A (enExample)
BE670784A (enExample)
BE671031A (enExample)
BE671411A (enExample)
BE671559A (enExample)