JPS4811537B1 - - Google Patents

Info

Publication number
JPS4811537B1
JPS4811537B1 JP42080455A JP8045567A JPS4811537B1 JP S4811537 B1 JPS4811537 B1 JP S4811537B1 JP 42080455 A JP42080455 A JP 42080455A JP 8045567 A JP8045567 A JP 8045567A JP S4811537 B1 JPS4811537 B1 JP S4811537B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP42080455A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US602316A external-priority patent/US3409729A/en
Application filed filed Critical
Publication of JPS4811537B1 publication Critical patent/JPS4811537B1/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
  • Particle Accelerators (AREA)
  • Discharge Heating (AREA)
  • Physical Vapour Deposition (AREA)
  • Saccharide Compounds (AREA)
JP42080455A 1966-12-16 1967-12-16 Pending JPS4811537B1 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US602316A US3409729A (en) 1966-12-16 1966-12-16 Electron beam furnace and method for heating a target therein
US63582367A 1967-05-03 1967-05-03
US64013867A 1967-05-22 1967-05-22
US66002467A 1967-08-11 1967-08-11

Publications (1)

Publication Number Publication Date
JPS4811537B1 true JPS4811537B1 (ja) 1973-04-13

Family

ID=27505058

Family Applications (1)

Application Number Title Priority Date Filing Date
JP42080455A Pending JPS4811537B1 (ja) 1966-12-16 1967-12-16

Country Status (7)

Country Link
US (3) US3497602A (ja)
JP (1) JPS4811537B1 (ja)
BE (1) BE707506A (ja)
DE (2) DE1589487A1 (ja)
FR (1) FR1553153A (ja)
GB (1) GB1196787A (ja)
SE (1) SE342730B (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52116239U (ja) * 1976-02-29 1977-09-03
JPS52157786U (ja) * 1976-05-24 1977-11-30
JPS549452U (ja) * 1977-06-22 1979-01-22
JP2019179706A (ja) * 2018-03-30 2019-10-17 日本電子株式会社 電子銃

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3857014A (en) * 1971-08-25 1974-12-24 A Khotina Electron beam generator
US4104418A (en) * 1975-09-23 1978-08-01 International Business Machines Corporation Glass layer fabrication
US4131753A (en) * 1977-05-18 1978-12-26 Airco, Inc. Multiple electron-beam vapor source assembly
US4153005A (en) * 1977-07-06 1979-05-08 United Technologies Corporation Multiple electron beam vacuum vapor deposition apparatus
US4488902A (en) * 1983-06-10 1984-12-18 Duval Corporation Horizontal, multistage electron beam refinement of metals with recycle
US4518418A (en) * 1983-06-10 1985-05-21 Duval Corporation Electron beam refinement of metals, particularly copper
DE3339131A1 (de) * 1983-10-28 1985-05-09 Leybold-Heraeus GmbH, 5000 Köln Elektronenstrahlverdampfer mit mindestens zwei magnetischen ablenksystemen
US4728772A (en) * 1986-07-16 1988-03-01 The Boc Group, Inc. Vapor source assembly with adjustable magnetic pole pieces
US5502353A (en) * 1992-01-31 1996-03-26 Frederick M. Mako Apparatus for bunching relativistic electrons
CN114442441A (zh) * 2022-02-23 2022-05-06 南京大学 一种激光等离子体极紫外光源靶材的优化方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2735034A (en) * 1956-02-14 High frequency electrical apparatus
US2138928A (en) * 1935-10-16 1938-12-06 Emi Ltd Electron discharge device
US2743366A (en) * 1949-07-22 1956-04-24 Rca Corp Frequency-stabilization by particle beams
DE1156521B (de) * 1961-09-05 1963-10-31 Heraeus Gmbh W C Elektronenstrahlkanone zum Erhitzen von Metallen
BE627166A (ja) * 1962-01-15
DE1199097B (de) * 1962-09-25 1965-08-19 Heraeus Gmbh W C Vorrichtung zum Vakuumbedampfen breiter Baender, insbesondere mit Metallen, durch Erhitzen des Verdampfungsgutes mittels Elektronenstrahlen
US3235647A (en) * 1963-06-06 1966-02-15 Temescal Metallurgical Corp Electron bombardment heating with adjustable impact pattern
US3371206A (en) * 1964-02-04 1968-02-27 Jeol Ltd Electron beam apparatus having compensating means for triangular beam distortion
US3371185A (en) * 1964-10-05 1968-02-27 United Aircraft Corp Electron beam maintenance device
US3294217A (en) * 1964-10-30 1966-12-27 Lamb Co F Jos Workpiece elevator

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52116239U (ja) * 1976-02-29 1977-09-03
JPS52157786U (ja) * 1976-05-24 1977-11-30
JPS549452U (ja) * 1977-06-22 1979-01-22
JP2019179706A (ja) * 2018-03-30 2019-10-17 日本電子株式会社 電子銃

Also Published As

Publication number Publication date
DE1790341A1 (de) 1976-12-30
US3514656A (en) 1970-05-26
DE1589487A1 (de) 1970-04-09
BE707506A (ja) 1968-04-16
GB1196787A (en) 1970-07-01
FR1553153A (ja) 1969-01-10
US3497602A (en) 1970-02-24
SE342730B (ja) 1972-02-14
US3450824A (en) 1969-06-17

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