JPH1187448A5 - - Google Patents

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Publication number
JPH1187448A5
JPH1187448A5 JP1997303808A JP30380897A JPH1187448A5 JP H1187448 A5 JPH1187448 A5 JP H1187448A5 JP 1997303808 A JP1997303808 A JP 1997303808A JP 30380897 A JP30380897 A JP 30380897A JP H1187448 A5 JPH1187448 A5 JP H1187448A5
Authority
JP
Japan
Prior art keywords
light
change
rate
semiconductor region
reflectance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997303808A
Other languages
English (en)
Japanese (ja)
Other versions
JP3681523B2 (ja
JPH1187448A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP30380897A priority Critical patent/JP3681523B2/ja
Priority claimed from JP30380897A external-priority patent/JP3681523B2/ja
Publication of JPH1187448A publication Critical patent/JPH1187448A/ja
Application granted granted Critical
Publication of JP3681523B2 publication Critical patent/JP3681523B2/ja
Publication of JPH1187448A5 publication Critical patent/JPH1187448A5/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP30380897A 1996-11-08 1997-11-06 光学的評価装置，光学的評価方法，半導体装置の製造装置，半導体装置の製造装置の管理方法 Expired - Fee Related JP3681523B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30380897A JP3681523B2 (ja) 1996-11-08 1997-11-06 光学的評価装置，光学的評価方法，半導体装置の製造装置，半導体装置の製造装置の管理方法

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
JP8-296592 1996-11-08
JP29659296 1996-11-08
JP35061296 1996-12-27
JP8-350612 1996-12-27
JP1538297 1997-01-29
JP9-15382 1997-07-15
JP9-189841 1997-07-15
JP18984197 1997-07-15
JP30380897A JP3681523B2 (ja) 1996-11-08 1997-11-06 光学的評価装置，光学的評価方法，半導体装置の製造装置，半導体装置の製造装置の管理方法

Publications (3)

Publication Number Publication Date
JPH1187448A JPH1187448A (ja) 1999-03-30
JP3681523B2 JP3681523B2 (ja) 2005-08-10
JPH1187448A5 true JPH1187448A5 (enExample) 2005-08-18

Family

ID=27519697

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30380897A Expired - Fee Related JP3681523B2 (ja) 1996-11-08 1997-11-06 光学的評価装置，光学的評価方法，半導体装置の製造装置，半導体装置の製造装置の管理方法

Country Status (1)

Country Link
JP (1) JP3681523B2 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6049220A (en) * 1998-06-10 2000-04-11 Boxer Cross Incorporated Apparatus and method for evaluating a wafer of semiconductor material
SG103865A1 (en) * 2001-06-01 2004-05-26 Toshiba Kk Film quality inspecting method and film quality inspecting apparatus
US6878559B2 (en) * 2002-09-23 2005-04-12 Applied Materials, Inc. Measurement of lateral diffusion of diffused layers
WO2005031832A1 (ja) 2003-09-24 2005-04-07 Matsushita Electric Industrial Co., Ltd. 不純物導入方法、不純物導入装置およびこれらを用いて形成した電子素子
EP1753019A4 (en) * 2004-05-21 2008-12-03 Panasonic Corp PROCESS FOR INTRODUCING UNPARALLENCE AND ELECTRONIC ELEMENT THEREWITH
US20090233383A1 (en) * 2005-02-23 2009-09-17 Tomohiro Okumura Plasma Doping Method and Apparatus
JP4363368B2 (ja) 2005-06-13 2009-11-11 住友電気工業株式会社 化合物半導体部材のダメージ評価方法、及び化合物半導体部材の製造方法
US20180286643A1 (en) * 2017-03-29 2018-10-04 Tokyo Electron Limited Advanced optical sensor, system, and methodologies for etch processing monitoring
US10978278B2 (en) 2018-07-31 2021-04-13 Tokyo Electron Limited Normal-incident in-situ process monitor sensor

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