JPH1180041A - Production of triene compound - Google Patents
Production of triene compoundInfo
- Publication number
- JPH1180041A JPH1180041A JP9251285A JP25128597A JPH1180041A JP H1180041 A JPH1180041 A JP H1180041A JP 9251285 A JP9251285 A JP 9251285A JP 25128597 A JP25128597 A JP 25128597A JP H1180041 A JPH1180041 A JP H1180041A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- group
- general formula
- reaction
- transition metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- -1 triene compound Chemical class 0.000 title claims abstract description 57
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910052723 transition metal Inorganic materials 0.000 claims abstract description 12
- 150000003624 transition metals Chemical class 0.000 claims abstract description 12
- 229910001507 metal halide Inorganic materials 0.000 claims abstract description 11
- 150000005309 metal halides Chemical class 0.000 claims abstract description 11
- 239000003446 ligand Substances 0.000 claims abstract description 10
- 239000007848 Bronsted acid Substances 0.000 claims abstract description 6
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 6
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 5
- 125000003118 aryl group Chemical group 0.000 claims abstract description 5
- 125000003545 alkoxy group Chemical group 0.000 claims description 4
- 125000004185 ester group Chemical group 0.000 claims description 4
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims description 4
- 125000001424 substituent group Chemical group 0.000 claims description 4
- 230000000737 periodic effect Effects 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 abstract description 20
- 239000002253 acid Substances 0.000 abstract description 2
- 239000006227 byproduct Substances 0.000 abstract description 2
- 239000002994 raw material Substances 0.000 abstract description 2
- 239000007795 chemical reaction product Substances 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 26
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 12
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 7
- 150000003623 transition metal compounds Chemical class 0.000 description 7
- DQQNMIPXXNPGCV-UHFFFAOYSA-N 3-hexyne Chemical compound CCC#CCC DQQNMIPXXNPGCV-UHFFFAOYSA-N 0.000 description 6
- 125000002534 ethynyl group Chemical class [H]C#C* 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 6
- 239000000243 solution Substances 0.000 description 5
- QMBQEXOLIRBNPN-UHFFFAOYSA-L zirconocene dichloride Chemical compound [Cl-].[Cl-].[Zr+4].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 QMBQEXOLIRBNPN-UHFFFAOYSA-L 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 4
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 4
- VHILMKFSCRWWIJ-UHFFFAOYSA-N dimethyl acetylenedicarboxylate Chemical compound COC(=O)C#CC(=O)OC VHILMKFSCRWWIJ-UHFFFAOYSA-N 0.000 description 4
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 4
- 230000035484 reaction time Effects 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 4
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical group CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 3
- 239000005977 Ethylene Substances 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 239000003153 chemical reaction reagent Substances 0.000 description 3
- ZMMRKRFMSDTOLV-UHFFFAOYSA-N cyclopenta-1,3-diene zirconium Chemical compound [Zr].C1C=CC=C1.C1C=CC=C1 ZMMRKRFMSDTOLV-UHFFFAOYSA-N 0.000 description 3
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N Propionic acid Chemical group CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 239000000010 aprotic solvent Substances 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical group OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- MKNXBRLZBFVUPV-UHFFFAOYSA-L cyclopenta-1,3-diene;dichlorotitanium Chemical compound Cl[Ti]Cl.C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 MKNXBRLZBFVUPV-UHFFFAOYSA-L 0.000 description 2
- 125000000058 cyclopentadienyl group Chemical group C1(=CC=CC1)* 0.000 description 2
- 229910052735 hafnium Inorganic materials 0.000 description 2
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 125000003454 indenyl group Chemical group C1(C=CC2=CC=CC=C12)* 0.000 description 2
- DLEDOFVPSDKWEF-UHFFFAOYSA-N lithium butane Chemical compound [Li+].CCC[CH2-] DLEDOFVPSDKWEF-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- IUGYQRQAERSCNH-UHFFFAOYSA-N pivalic acid Chemical group CC(C)(C)C(O)=O IUGYQRQAERSCNH-UHFFFAOYSA-N 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 238000006478 transmetalation reaction Methods 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical group CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- 125000004973 1-butenyl group Chemical group C(=CCC)* 0.000 description 1
- GHRYSOFWKRRLMI-UHFFFAOYSA-N 1-naphthyloxyacetic acid Chemical group C1=CC=C2C(OCC(=O)O)=CC=CC2=C1 GHRYSOFWKRRLMI-UHFFFAOYSA-N 0.000 description 1
- 125000006017 1-propenyl group Chemical group 0.000 description 1
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Natural products C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 1
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 125000004975 3-butenyl group Chemical group C(CC=C)* 0.000 description 1
- VVNYDCGZZSTUBC-UHFFFAOYSA-N 5-amino-2-[(2-methylpropan-2-yl)oxycarbonylamino]-5-oxopentanoic acid Chemical compound CC(C)(C)OC(=O)NC(C(O)=O)CCC(N)=O VVNYDCGZZSTUBC-UHFFFAOYSA-N 0.000 description 1
- 125000006043 5-hexenyl group Chemical group 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- SLARNVPEXUQXLR-UHFFFAOYSA-L [Cl-].[Cl-].CC1=C(C)C(C)([Zr++]C2(C)C=CC(C)=C2C)C=C1 Chemical compound [Cl-].[Cl-].CC1=C(C)C(C)([Zr++]C2(C)C=CC(C)=C2C)C=C1 SLARNVPEXUQXLR-UHFFFAOYSA-L 0.000 description 1
- XRMLSJOTMSZVND-UHFFFAOYSA-L [Cl-].[Cl-].CC1=CC=CC1(C)[Zr++]C1(C)C=CC=C1C Chemical compound [Cl-].[Cl-].CC1=CC=CC1(C)[Zr++]C1(C)C=CC=C1C XRMLSJOTMSZVND-UHFFFAOYSA-L 0.000 description 1
- 239000003905 agrochemical Substances 0.000 description 1
- 125000005336 allyloxy group Chemical group 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000003828 azulenyl group Chemical group 0.000 description 1
- 150000001555 benzenes Chemical class 0.000 description 1
- 239000012267 brine Substances 0.000 description 1
- ODWXUNBKCRECNW-UHFFFAOYSA-M bromocopper(1+) Chemical compound Br[Cu+] ODWXUNBKCRECNW-UHFFFAOYSA-M 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical compound I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000522 cyclooctenyl group Chemical group C1(=CCCCCCC1)* 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- BMTKGBCFRKGOOZ-UHFFFAOYSA-K cyclopenta-1,3-diene;zirconium(4+);trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Zr+4].C=1C=C[CH-]C=1 BMTKGBCFRKGOOZ-UHFFFAOYSA-K 0.000 description 1
- 125000002433 cyclopentenyl group Chemical group C1(=CCCC1)* 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- JJQHEAPVGPSOKX-UHFFFAOYSA-L cyclopentyl(trimethyl)silane;dichlorozirconium Chemical compound Cl[Zr]Cl.C[Si](C)(C)[C]1[CH][CH][CH][CH]1.C[Si](C)(C)[C]1[CH][CH][CH][CH]1 JJQHEAPVGPSOKX-UHFFFAOYSA-L 0.000 description 1
- JWBQJUFCNOLNNC-UHFFFAOYSA-N dec-5-yne Chemical compound CCCCC#CCCCC JWBQJUFCNOLNNC-UHFFFAOYSA-N 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- CTLSARLLLBZBRV-UHFFFAOYSA-N dewar benzene Chemical class C1=CC2C=CC21 CTLSARLLLBZBRV-UHFFFAOYSA-N 0.000 description 1
- MIILMDFFARLWKZ-UHFFFAOYSA-L dichlorozirconium;1,2,3,4,5-pentamethylcyclopentane Chemical compound [Cl-].[Cl-].CC1=C(C)C(C)=C(C)C1(C)[Zr+2]C1(C)C(C)=C(C)C(C)=C1C MIILMDFFARLWKZ-UHFFFAOYSA-L 0.000 description 1
- IVTQDRJBWSBJQM-UHFFFAOYSA-L dichlorozirconium;indene Chemical compound C1=CC2=CC=CC=C2C1[Zr](Cl)(Cl)C1C2=CC=CC=C2C=C1 IVTQDRJBWSBJQM-UHFFFAOYSA-L 0.000 description 1
- NKDDWNXOKDWJAK-UHFFFAOYSA-N dimethoxymethane Chemical compound COCOC NKDDWNXOKDWJAK-UHFFFAOYSA-N 0.000 description 1
- KGZOWUQLGYRGDJ-ZKQLUIBLSA-N dimethyl (Z)-2-[(Z,5E)-4-ethyl-5-(trimethylsilylmethylidene)non-3-en-3-yl]but-2-enedioate Chemical compound COC(\C=C(\C(=C(/C(=C/[Si](C)(C)C)/CCCC)\CC)\CC)/C(=O)OC)=O KGZOWUQLGYRGDJ-ZKQLUIBLSA-N 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- ZSWFCLXCOIISFI-UHFFFAOYSA-N endo-cyclopentadiene Natural products C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- BLHLJVCOVBYQQS-UHFFFAOYSA-N ethyllithium Chemical compound [Li]CC BLHLJVCOVBYQQS-UHFFFAOYSA-N 0.000 description 1
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- SFCRJYVNDZSYCT-UHFFFAOYSA-N hex-1-ynyl(trimethyl)silane Chemical compound CCCCC#C[Si](C)(C)C SFCRJYVNDZSYCT-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical group CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-N isovaleric acid Chemical group CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- PZJJKWKADRNWSW-UHFFFAOYSA-N trimethoxysilicon Chemical group CO[Si](OC)OC PZJJKWKADRNWSW-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- DUNKXUFBGCUVQW-UHFFFAOYSA-J zirconium tetrachloride Chemical compound Cl[Zr](Cl)(Cl)Cl DUNKXUFBGCUVQW-UHFFFAOYSA-J 0.000 description 1
- VPGLGRNSAYHXPY-UHFFFAOYSA-L zirconium(2+);dichloride Chemical compound Cl[Zr]Cl VPGLGRNSAYHXPY-UHFFFAOYSA-L 0.000 description 1
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- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、トリエン化合物の
製造方法に関するものである。トリエン化合物は、合成
高分子の原料や変性剤、医薬品や農薬の合成中間体、非
線形光学材料などとして有用な物質である。The present invention relates to a method for producing a triene compound. Triene compounds are useful substances as raw materials and modifiers for synthetic polymers, synthetic intermediates for pharmaceuticals and agricultural chemicals, nonlinear optical materials, and the like.
【0002】[0002]
【従来の技術】従来、周期表4族遷移金属または金属ハ
ライドの存在下にアセチレン類の3分子を反応して得ら
れる化合物は、「J.Chem.Soc.,Chem.Commun.,1995,36
1」に示されている様にベンゼン誘導体やデュワーベン
ゼン誘導体である。すなわち、アセチレン類から直接に
トリエン化合物を合成する方法は知られていない。2. Description of the Related Art Conventionally, a compound obtained by reacting three molecules of acetylenes in the presence of a transition metal or a metal halide of Group 4 of the periodic table is disclosed in J. Chem. Soc., Chem. Commun., 1995, 36.
As shown in "1", it is a benzene derivative or a Dewar benzene derivative. That is, a method for synthesizing a triene compound directly from acetylenes is not known.
【0003】[0003]
【発明が解決しようとする課題】本発明は、上記実情に
鑑みなされたものであり、その目的は、アセチレン類か
ら直接に特定の構造を有する共役トリエン化合物を製造
する新規な方法を提供することにある。SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a novel method for producing a conjugated triene compound having a specific structure directly from acetylenes. It is in.
【0004】[0004]
【課題を解決するための手段】すなわち、本発明の要旨
は、0℃以下の温度において、先ず、下記一般式(1)
で表されるメタラシクロペンタジエニルと金属ハライド
と下記一般式(2)で表されるアセチレン化合物とを反
応させ、次いで、ブレンステッド酸を反応させることを
特徴とする下記一般式(3)で表されるトリエン化合物
の製造方法に存する。That is, the gist of the present invention is that, at a temperature of 0 ° C. or less, first, the following general formula (1)
Wherein a metallacyclopentadienyl represented by the following formula is reacted with a metal halide and an acetylene compound represented by the following general formula (2), and then a Bronsted acid is reacted. The present invention relates to a method for producing a triene compound represented by the formula:
【0005】[0005]
【化2】 Embedded image
【0006】一般式(1)〜(3)中、R1〜R6は、そ
れぞれ、アルキル基、アルケニル基、芳香族基、シリル
基、アルコキシ基、エステル基を表す。但し、これらの
基は、炭素数が1〜20であり且つ置換基を有していて
もよい。そして、一般式(1)中、Mは遷移金属、Lは
配位子、nは0〜4の整数を表す。In the general formulas (1) to (3), R 1 to R 6 each represent an alkyl group, an alkenyl group, an aromatic group, a silyl group, an alkoxy group, or an ester group. However, these groups have 1 to 20 carbon atoms and may have a substituent. In the general formula (1), M represents a transition metal, L represents a ligand, and n represents an integer of 0 to 4.
【0007】[0007]
【発明の実施の形態】以下、本発明を詳細に説明する。
先ず、下記一般式(1)で表されるメタラシクロペンタ
ジエニルについて説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail.
First, metallacyclopentadienyl represented by the following general formula (1) will be described.
【0008】[0008]
【化3】 Embedded image
【0009】一般式(1)中、Mは遷移金属を表す。遷
移金属は周期表上の3〜10族の金属を意味する。遷移
金属としては、特に制限されないが、好ましくは3〜6
族の遷移金属、更に好ましくは、チタン、ジルコニウ
ム、ハフニウム等の4族の遷移金属である。In the general formula (1), M represents a transition metal. The transition metal means a metal belonging to Groups 3 to 10 on the periodic table. Although it does not specifically limit as a transition metal, Preferably it is 3-6.
Group 4 transition metals, more preferably Group 4 transition metals such as titanium, zirconium and hafnium.
【0010】一般式(1)中、Lは配位子を表し、その
具体例としては、シクロペンタジエニル基、インデニル
基、フルオレニル基、アズレニル基、炭化水素オキシ
基、アミド基、アセチルアセトナート基、カルボキシル
基、ホスフィン配位子、アミン配位子、エーテル配位
子、これらが適当な架橋基により連結した配位子を有す
る化合物が挙げられる。なお、上記の各基は、何れも、
置換基を有していてもよい。また、一般式(1)中、n
は0〜4、好ましくは1又は2の整数を表す。そして、
nが2以上の場合における各配位子は、同一であっても
異なっていてもよい。In the general formula (1), L represents a ligand, and specific examples thereof include cyclopentadienyl group, indenyl group, fluorenyl group, azulenyl group, hydrocarbonoxy group, amide group, acetylacetonate. Group, a carboxyl group, a phosphine ligand, an amine ligand, an ether ligand, and compounds having a ligand in which these are linked by an appropriate crosslinking group. Incidentally, each of the above groups,
It may have a substituent. In the general formula (1), n
Represents an integer of 0 to 4, preferably 1 or 2. And
When n is 2 or more, each ligand may be the same or different.
【0011】一般式(1)中、R1〜R4は、それぞれ、
アルキル基、アルケニル基、芳香族基、シリル基、アル
コキシ基、エステル基を表す。但し、これらの基は、炭
素数が1〜20であり且つ置換基を有していてもよい。In the general formula (1), R 1 to R 4 each represent
Represents an alkyl group, an alkenyl group, an aromatic group, a silyl group, an alkoxy group, or an ester group. However, these groups have 1 to 20 carbon atoms and may have a substituent.
【0012】上記のR1〜R4の具体例としては、メチ
ル、エチル、プロピル、イソプロピル、ブチル、イソブ
チル、t−ブチル、ペンチル、ネオペンチル、ヘキシ
ル、オクチル、ノニル、デシル、シクロペンチル、シク
ロヘキシル、シクロオクチル等のアルキル基、ビニル、
アリル、1−プロペニル、1、2又は3−ブテニル、1
〜5−ヘキセニル、シクロペンテニル、シクロヘキセニ
ル、シクロオクテニル等のアルケニル基、フェニル、ナ
フチル、トリル、キシリル等の芳香族基、トリメチルシ
リル、トリエチルシリル、トリメトキシシリル、トリエ
トキシシリル、ジフェニルメチルシリル、ジメチルフェ
ニルシリル、トリフェニルシリル等のシリル基、メトキ
シ、エトキシ、プロポキシ、イソプロポキシ、ブトキ
シ、イソブトキシ、t−ブトキシ等のアルコキシ基、フ
ェノキシ、ナフトキシ等のアリロキシ基、メチルカルボ
キシレート、エチルカルボキシレート、プロピルカルボ
キシレート、イソプロピルカルボキシレート、ブチルカ
ルボキシレート、イソブチルカルボキシレート、t−ブ
チルカルボキシレート、フェニルカルボキシレート等の
エステル基が挙げられる。Specific examples of R 1 to R 4 include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, t-butyl, pentyl, neopentyl, hexyl, octyl, nonyl, decyl, cyclopentyl, cyclohexyl, cyclooctyl. Alkyl groups such as vinyl,
Allyl, 1-propenyl, 1, 2 or 3-butenyl, 1
Alkenyl groups such as 5-hexenyl, cyclopentenyl, cyclohexenyl, and cyclooctenyl; aromatic groups such as phenyl, naphthyl, tolyl, and xylyl; trimethylsilyl, triethylsilyl, trimethoxysilyl, triethoxysilyl, diphenylmethylsilyl, and dimethylphenylsilyl , Silyl groups such as triphenylsilyl, methoxy, ethoxy, propoxy, isopropoxy, butoxy, isobutoxy, alkoxy groups such as t-butoxy, phenoxy, allyloxy groups such as naphthoxy, methyl carboxylate, ethyl carboxylate, propyl carboxylate, Ester groups such as isopropyl carboxylate, butyl carboxylate, isobutyl carboxylate, t-butyl carboxylate and phenyl carboxylate; That.
【0013】上記の中では、メチル、エチル、n−ブチ
ル、t−ブチル、ヘキシル、フェニル、トリメチルシリ
ル、メチルカルボキシレート、エチルカルボキシレー
ト、t−ブチルカルボキシレート、フェニルカルボキシ
レートが好ましく、エチル、n−ブチル、t−ブチル、
ヘキシル、トリメチルシリル、メチルカルボキシレート
が更に好ましい。Of the above, methyl, ethyl, n-butyl, t-butyl, hexyl, phenyl, trimethylsilyl, methyl carboxylate, ethyl carboxylate, t-butyl carboxylate and phenyl carboxylate are preferred, and ethyl, n-butyl carboxylate are preferred. Butyl, t-butyl,
Hexyl, trimethylsilyl and methylcarboxylate are more preferred.
【0014】一般式(1)で表されるメタラシクロペン
タジエニルは、対応する有機遷移金属化合物と下記一般
式(4)及び(5)でそれぞれ表されるアセチレン化合
物との反応で得ることが出来る。一般式(4)及び
(5)中のR1〜R4の意義は、前記一般式(1)におけ
るのと同義である。The metallacyclopentadienyl represented by the general formula (1) can be obtained by reacting a corresponding organic transition metal compound with an acetylene compound represented by the following general formulas (4) and (5). I can do it. The meanings of R 1 to R 4 in formulas (4) and (5) are the same as those in formula (1).
【0015】[0015]
【化4】 Embedded image
【0016】有機遷移金属化合物としては、前述の配位
子を有する化合物が挙げられるが、その好ましい具体例
は次の(i)〜(iii)に示す通りである。Examples of the organic transition metal compound include compounds having the above-mentioned ligands. Preferred specific examples thereof are as shown in the following (i) to (iii).
【0017】(i)少なくとも2個のハロゲンを有する
4族遷移金属化合物(a)とこのハロゲンを炭素数2以
上のアルキル基に置換することが可能な化学試剤(b)
とを反応させて得られる化合物 (ii)環中に4族遷移金属を有するメタラサイクル化合
物または置換メタラサイクル化合物 (iii)2価の4族遷移金属化合物(I) Group 4 transition metal compound having at least two halogens (a) and a chemical reagent capable of substituting this halogen with an alkyl group having 2 or more carbon atoms (b)
(Ii) a metallacycle compound or a substituted metallacycle compound having a group 4 transition metal in the ring (iii) a divalent group 4 transition metal compound
【0018】なお、反応条件により、(i)の化合物は
(ii)又は(iii)の化合物に変換可能であり、(iii)
の化合物は(ii)の化合物に変換可能である。The compound (i) can be converted into the compound (ii) or (iii) depending on the reaction conditions.
Is convertible into the compound of (ii).
【0019】上記(i)の化合物の合成において使用す
る化学試剤(a)としては、ジルコニウムテトラクロラ
イド、ジルコノセンジクロリド、ジルコノセンジブロマ
イド、ジルコノセンジアイオダイド、シクロペンタジエ
ニルジルコニウムトリクロライド、ビス(メチルシクロ
ペンタジエニル)ジルコニウムジクロライド、ビス(ジ
メチルシクロペンタジエニル)ジルコニウムジクロライ
ド、ビス(トリメチルシクロペンタジエニル)ジルコニ
ウムジクロライド、ビス(テトラメチルシクロペンタジ
エニル)ジルコニウムジクロライド、ビス(ペンタメチ
ルシクロペンタジエニル)ジルコニウムジクロライド、
ビス(トリメチルシリルシクロペンタジエニル)ジルコ
ニウムジクロライド、ビス(インデニル)ジルコニウム
ジクロライド、ビス(ジメチルアミド)ジルコニウムジ
クロライド等が挙げられる。そして、上記(i)の化合
物の合成において使用する化学試剤(b)としては、例
えば、エチルリチウム、n−ブチルリチウム、エチルグ
リニヤ、ブチルグリニヤ等が挙げられる。The chemical reagent (a) used in the synthesis of the compound (i) includes zirconium tetrachloride, zirconocene dichloride, zirconocene dibromide, zirconocene diiodide, cyclopentadienyl zirconium trichloride, bis (methylcyclohexane) (Pentadienyl) zirconium dichloride, bis (dimethylcyclopentadienyl) zirconium dichloride, bis (trimethylcyclopentadienyl) zirconium dichloride, bis (tetramethylcyclopentadienyl) zirconium dichloride, bis (pentamethylcyclopentadienyl) Zirconium dichloride,
Bis (trimethylsilylcyclopentadienyl) zirconium dichloride, bis (indenyl) zirconium dichloride, bis (dimethylamido) zirconium dichloride and the like can be mentioned. Examples of the chemical reagent (b) used in the synthesis of the compound (i) include ethyl lithium, n-butyl lithium, ethyl Grignard, butyl Grignard and the like.
【0020】上記(ii)の化合物の具体例としては、ジ
ルコナシクロペンタン、ジルコナシクロペンテン、ジル
コナシクロペンタジエン、シクロペンタジエニル等の水
素がメチル基やトリメチルシリル基で置換された化合
物、および、シクロペンタジエジエニルがインデニルと
置換した化合物などが挙げられる。Specific examples of the compound (ii) include compounds in which hydrogen such as zirconacyclopentane, zirconacyclopentene, zirconacyclopentadiene, and cyclopentadienyl has been substituted with a methyl group or a trimethylsilyl group; Compounds in which cyclopentadiedienyl is substituted with indenyl may, for example, be mentioned.
【0021】上記(iii)の化合物の具体例としては、
ジルコノセン等が挙げられる。また、上記(i)〜(ii
i)の化合物でジルコニウムの代わりにチタンやハフニ
ウムを持つ化合物も同時に例示することが出来る。Specific examples of the compound of the above (iii) include:
Zirconocene and the like. In addition, the above (i) to (ii)
Compounds having titanium or hafnium in place of zirconium in the compound of i) can also be exemplified at the same time.
【0022】有機遷移金属化合物と前記一般式(4)及
び(5)でそれぞれ表されるアセチレン化合物との反応
については後述する。The reaction between the organic transition metal compound and the acetylene compound represented by the general formulas (4) and (5) will be described later.
【0023】次に、下記一般式(2)で表されるアセチ
レン化合物について説明する。Next, the acetylene compound represented by the following general formula (2) will be described.
【0024】[0024]
【化5】 Embedded image
【0025】一般式(2)中のR5及びR6の意義は、前
記一般式(1)におけるR1〜R4のそれと同義である。The meanings of R 5 and R 6 in the general formula (2) are the same as those of R 1 to R 4 in the general formula (1).
【0026】本発明においては、前記一般式(1)で表
されるメタラシクロペンタジエニルと前記一般式(2)
で表されるアセチレン化合物とを反応させることにより
下記一般式(3)で表されるトリエン化合物を製造す
る。In the present invention, the metallacyclopentadienyl represented by the general formula (1) and the general formula (2)
By reacting with an acetylene compound represented by the formula, a triene compound represented by the following general formula (3) is produced.
【0027】[0027]
【化6】 Embedded image
【0028】一般式(3)中のR1〜R6の意義は、前記
一般式(1)におけるR1〜R4、前記一般式(2)にお
けるR5及びR6と同義である。The meanings of R 1 to R 6 in the general formula (3) are the same as R 1 to R 4 in the general formula (1) and R 5 and R 6 in the general formula (2).
【0029】次に、金属ハライドについて説明する。金
属ハライドとしては、リチウムハライド、マグネシウム
ハライド、アルミニウムハライド、ガリウムハライド、
インジウムハライド、錫ハライド、亜鉛ハライド、カド
ニウムハライド、銅ハライド、ニッケルハライド、マン
ガンハライド等が挙げられる。これらの中では、アルミ
ニウムハライド、銅ハライド、亜鉛ハライドが好まし
く、塩化アルミニウム、塩化銅、臭化銅、ヨウ化銅が更
に好ましい。Next, the metal halide will be described. As metal halides, lithium halide, magnesium halide, aluminum halide, gallium halide,
Indium halide, tin halide, zinc halide, cadmium halide, copper halide, nickel halide, manganese halide and the like can be mentioned. Among these, aluminum halide, copper halide, and zinc halide are preferable, and aluminum chloride, copper chloride, copper bromide, and copper iodide are more preferable.
【0030】次に、ブレンステッド酸について説明す
る。ブレンステッド酸としては、塩酸、硫酸、硝酸、塩
化アンモニウム等の無機酸、酢酸、シュウ酸、酪酸の様
なカルボン酸類やフェノール類の様な有機酸が挙げられ
る。これらの中では、塩酸、硫酸、硝酸、酢酸が好まし
く、塩酸が更に好ましい。Next, the Bronsted acid will be described. Examples of Bronsted acids include inorganic acids such as hydrochloric acid, sulfuric acid, nitric acid, and ammonium chloride, and carboxylic acids such as acetic acid, oxalic acid, and butyric acid, and organic acids such as phenols. Among them, hydrochloric acid, sulfuric acid, nitric acid and acetic acid are preferred, and hydrochloric acid is more preferred.
【0031】次に本発明の製造方法における反応機構に
ついて説明する。本発明の製造方法における反応機構
は、下記の反応式の一例に示す様に推定される。下記の
反応式は、理解を容易にするために前述のメタラシクロ
ペンタジエニルの合成反応工程(a)を含めているが、
本発明の製造方法は(a)〜(d)工程を一貫して行な
ってもよい。Next, the reaction mechanism in the production method of the present invention will be described. The reaction mechanism in the production method of the present invention is estimated as shown in an example of the following reaction formula. The following reaction formula includes the above-mentioned synthesis reaction step (a) of metallacyclopentadienyl for easy understanding,
In the production method of the present invention, the steps (a) to (d) may be performed consistently.
【0032】[0032]
【化7】 Embedded image
【0033】上記(a)工程において、有機遷移金属化
合物と2分子のアセチレン化合物とから、2,4−メタ
ラシクロペンタジエンが生成する。(b)工程におい
て、メタラシクロペンタジエンは金属ハライドとの間で
トランスメタル化反応が起こり、更に、(c)工程にお
いて、トランスメタル化反応で新たに生成した金属−炭
素の結合間にアセチレン化合物が挿入される。そして、
(d)工程において、プレンステッド酸により、金属−
炭素の結合が切断される。In the step (a), 2,4-metallacyclopentadiene is produced from the organic transition metal compound and two molecules of the acetylene compound. In the step (b), a transmetallation reaction occurs between the metallacyclopentadiene and the metal halide, and in the step (c), an acetylene compound is formed between the metal-carbon bond newly generated in the transmetallation reaction. Inserted. And
In the step (d), the metal-
The carbon bond is broken.
【0034】上記の各工程は、非プロトン性の溶媒の存
在下、窒素やアルゴン等の不活性ガス又はエチレンガス
雰囲気で行うのが好ましい。非プロトンの溶媒として
は、例えば、トルエンの様な炭化水素溶媒、クロロベン
ゼン、メチレンクロライドの様なハロゲン化炭化水素溶
媒、エチルエーテル、テトラヒドロフラン、ジメトキシ
メタンの様なエーテル系溶媒が挙げられる。これらの中
では、テトラヒドロフランが好ましい。Each of the above steps is preferably carried out in an inert gas atmosphere such as nitrogen or argon or an ethylene gas atmosphere in the presence of an aprotic solvent. Examples of the aprotic solvent include hydrocarbon solvents such as toluene, halogenated hydrocarbon solvents such as chlorobenzene and methylene chloride, and ether solvents such as ethyl ether, tetrahydrofuran and dimethoxymethane. Of these, tetrahydrofuran is preferred.
【0035】上記の(a)工程において、有機遷移金属
化合物に対するアセチレン類の使用割合は、通常0.5
〜50倍モル、好ましくは0.5〜10倍モルである。
反応温度は、通常−100〜100℃、好ましくは−8
5〜80℃である。反応時間は、通常10〜120分、
好ましくは30〜60分とされる。In the above step (a), the ratio of acetylene to the organic transition metal compound is usually 0.5
The amount is from 50 to 50 times, preferably from 0.5 to 10 times.
The reaction temperature is usually -100 to 100C, preferably -8.
5 to 80 ° C. The reaction time is usually 10 to 120 minutes,
Preferably, it is 30 to 60 minutes.
【0036】本発明においては、先ず、前段反応とし
て、前記一般式(1)で表されるメタラシクロペンタジ
エニルと金属ハライドと前記一般式(2)で表されるア
セチレン化合物とを反応させ(b〜c工程)、次いで、
後段反応として、ブレンステッド酸を反応させる(d工
程)。上記の前段反応においては、前記の反応式に示す
態様とは異なって金属ハライドとアセチレン化合物とを
同時に反応系に存在させてもよい。メタラシクロペンタ
ジエニルに対し、金属ハライドの使用割合は、通常0.
3〜50倍モル、好ましくは0.3〜10倍モル、アセ
チレン類の使用割合は、通常0.5〜50倍モル、好ま
しくは0.5〜10倍モル、ブレンステッド酸の使用割
合は、通常、等モル以上である。In the present invention, first, as a first-stage reaction, the metallacyclopentadienyl represented by the general formula (1) is reacted with a metal halide and the acetylene compound represented by the general formula (2) ( b to c steps), and then
As a subsequent reaction, a Brnsted acid is reacted (step d). In the above first-stage reaction, unlike the embodiment shown in the above reaction formula, a metal halide and an acetylene compound may be simultaneously present in the reaction system. The ratio of metal halide to metallacyclopentadienyl is usually 0.1%.
3 to 50 times mol, preferably 0.3 to 10 times mol, the use ratio of acetylenes is usually 0.5 to 50 times mol, preferably 0.5 to 10 times mol, the use ratio of Bronsted acid is Usually, it is at least equimolar.
【0037】本発明において、上記の反応(b〜c工
程)は0℃以下の温度で行なうことが重要である。0℃
より高い反応温度ではベンゼン誘導体が得られ、本発明
の目的とするトリエン化合物が得られない。反応温度
は、好ましくは−20℃以下である。反応時間は、通常
10〜120分、好ましくは30〜60分とされる。In the present invention, it is important that the above reaction (steps b to c) is performed at a temperature of 0 ° C. or lower. 0 ° C
At a higher reaction temperature, a benzene derivative is obtained, and the triene compound intended in the present invention cannot be obtained. The reaction temperature is preferably -20C or lower. The reaction time is generally 10 to 120 minutes, preferably 30 to 60 minutes.
【0038】[0038]
【実施例】以下、本発明を実施例により更に詳細に説明
するが、本発明は、その要旨を超えない限り、以下の実
施例に限定されるものではない。なお、反応溶媒に使用
したテトラヒドロフラン(THF)は脱水したものであ
る。また、化合物の単離はカラムクロマトにて行い、同
定は、1H−NMR、13C−NMR、HRMSにて行っ
た。EXAMPLES Hereinafter, the present invention will be described in more detail with reference to examples, but the present invention is not limited to the following examples unless it exceeds the gist of the present invention. The tetrahydrofuran (THF) used as the reaction solvent was dehydrated. The compound was isolated by column chromatography, and the identification was performed by 1 H-NMR, 13 C-NMR, and HRMS.
【0039】実施例1 下記化学式で表されるトリエン化合物を製造した。Example 1 A triene compound represented by the following chemical formula was produced.
【0040】[0040]
【化8】 Embedded image
【0041】窒素雰囲気下、50mLの大きさのシュレ
ンクチューブにジルコノセンジクロリド730mg
(2.5mmol)とTHF20mLを加えた。−78
℃に冷却し、n-BuLiのヘキサン溶液(5mmol)
をシリンジで滴下した。この反応溶液を−78℃で1時
間攪拌した後、これに3−ヘキシン(2mmol)を加
えた。更に、同じ温度でジメチルアセチレンジカルボキ
シレート(284mg、2mmol)とCuCl(19
8mg、2mmol)を加えた。−78℃で1時間反応
させた後、この温度で3NのHClと反応させた。トリ
エン化合物の収率は78%であった。なお、本実施例に
おいては、後述の実施例2、3及び比較例1で得られた
ジメチル(3,4,5,6−テトラエチル)フタレート
は副生しなかった。Under a nitrogen atmosphere, 730 mg of zirconocene dichloride was placed in a 50 mL Schlenk tube.
(2.5 mmol) and 20 mL of THF were added. -78
Cooled to ℃, n-BuLi hexane solution (5 mmol)
Was dropped with a syringe. After the reaction solution was stirred at -78 ° C for 1 hour, 3-hexyne (2 mmol) was added thereto. Furthermore, dimethylacetylenedicarboxylate (284 mg, 2 mmol) and CuCl (19
(8 mg, 2 mmol). After reacting at −78 ° C. for 1 hour, it was reacted with 3N HCl at this temperature. The yield of the triene compound was 78%. In this example, dimethyl (3,4,5,6-tetraethyl) phthalate obtained in Examples 2 and 3 and Comparative Example 1 described later did not produce by-products.
【0042】実施例2 実施例1において、3−ヘキシン(2mmol)を加え
た後以降の反応温度を−78℃から−50℃に変更し、
ジメチルアセチレンジカルボキシレートとCuClを添
加した後の反応時間を30分に変更した以外は、実施例
1と同様に反応を行なった。実施例1と同一のトリエン
化合物の収率34%であった。なお、本実施例において
は、ジメチル(3,4,5,6−テトラエチル)フタレ
ートが収率47%で副生した。Example 2 In Example 1, the reaction temperature after adding 3-hexyne (2 mmol) was changed from -78 ° C to -50 ° C,
The reaction was carried out in the same manner as in Example 1 except that the reaction time after adding dimethyl acetylenedicarboxylate and CuCl was changed to 30 minutes. The yield of the same triene compound as in Example 1 was 34%. In this example, dimethyl (3,4,5,6-tetraethyl) phthalate was by-produced at a yield of 47%.
【0043】実施例3 実施例1において、3−ヘキシン(2mmol)を加え
た後以降の反応温度を−78℃から−30℃に変更し、
ジメチルアセチレンジカルボキシレートとCuClを添
加した後の反応時間を30分に変更した以外は、実施例
1と同様に反応を行なった。実施例1と同一のトリエン
化合物の収率10%であった。なお、本実施例において
は、ジメチル(3,4,5,6−テトラエチル)フタレ
ートが74%の収率で副生された。Example 3 In Example 1, the reaction temperature after adding 3-hexyne (2 mmol) was changed from −78 ° C. to −30 ° C.
The reaction was carried out in the same manner as in Example 1 except that the reaction time after adding dimethyl acetylenedicarboxylate and CuCl was changed to 30 minutes. The yield of the same triene compound as in Example 1 was 10%. In this example, dimethyl (3,4,5,6-tetraethyl) phthalate was by-produced in a yield of 74%.
【0044】実施例4 下記化学式で表されるトリエン化合物(a):(メチル
−3−メトキシカルボニル−4,5−ジエチル−6−ブ
チル−7−トリメチルシリル−(2Z,4Z,6E)−
2,4,6−ヘプタトリエノエート)と、トリエン化合
物(b):(メチル−3−メトキシカルボニル−4−ト
リメチルシリル−5−ブチル−6−エチル−(2Z,4
E,6E)−2,4,6−ノナトリエノエート)とを同
時に製造した。Example 4 Triene compound (a) represented by the following chemical formula: (methyl-3-methoxycarbonyl-4,5-diethyl-6-butyl-7-trimethylsilyl- (2Z, 4Z, 6E)-
2,4,6-heptatrienoate) and a triene compound (b): (methyl-3-methoxycarbonyl-4-trimethylsilyl-5-butyl-6-ethyl- (2Z, 4
E, 6E) -2,4,6-nonatrienoate).
【0045】[0045]
【化9】 Embedded image
【0046】窒素雰囲気下、50mLの大きさのシュレ
ンクチューブにジルコノセンジクロリド730mg
(2.5mmol)とTHF20mLを加えた。−78
℃に冷却し、n-BuLiのヘキサン溶液(5mmol)
をシリンジで滴下した。この反応溶液を窒素下−78℃
で1時間攪拌した後、エチレンを1時間吹き込んでか
ら、温度を徐々に室温に戻した。これに、室温中、エチ
レン雰囲気下で1−トリメチルシリル−1−ヘキシン
(2mmol)を加えて1時間攪拌した。更に、3−ヘ
キシン(0.23mL、2mmol)を加え、窒素雰囲
気下で50℃で1時間攪拌した。ここに、ジメチルアセ
チレンジカルボキシレート(2mmol)、CuCl
(2mmol)を−78℃で加えた。−78℃で1時間
攪拌し、この温度で3NのHClと反応させた。反応液
をジエチルエーテルで抽出し、これを、水、炭酸水素ナ
トリウム、食塩水、水で順次に洗浄した後、硫酸マグネ
シウムで乾燥した。目的の2つのトリエン化合物(a)
と(b)とをカラムにて単離した(前者と後者の割合
4:1)。両者合わせたトリエン化合物の収率64%で
あった。Under a nitrogen atmosphere, 730 mg of zirconocene dichloride was placed in a 50 mL Schlenk tube.
(2.5 mmol) and 20 mL of THF were added. -78
Cooled to ℃, n-BuLi hexane solution (5 mmol)
Was dropped with a syringe. The reaction solution was cooled to -78 ° C under nitrogen.
After stirring for 1 hour, ethylene was blown for 1 hour, and the temperature was gradually returned to room temperature. To this was added 1-trimethylsilyl-1-hexyne (2 mmol) at room temperature under an ethylene atmosphere, and the mixture was stirred for 1 hour. Further, 3-hexyne (0.23 mL, 2 mmol) was added, and the mixture was stirred at 50 ° C. for 1 hour under a nitrogen atmosphere. Here, dimethyl acetylene dicarboxylate (2 mmol), CuCl
(2 mmol) was added at -78 ° C. Stirred at −78 ° C. for 1 hour and reacted with 3N HCl at this temperature. The reaction solution was extracted with diethyl ether, washed with water, sodium hydrogen carbonate, brine and water in that order, and dried over magnesium sulfate. Two target triene compounds (a)
And (b) were isolated on a column (4: 1 ratio between former and latter). The yield of the combined triene compound was 64%.
【0047】実施例5 実施例1において、ジルコノセンジクロリド730mg
(2.5mmol)の代わりにチタノセンジクロリド7
30mg(2.5mmol)を使用した以外は、実施例
1と同様に反応を行なった。実施例1と同一のトリエン
化合物の収率76%であった。Example 5 In Example 1, 730 mg of zirconocene dichloride was used.
(2.5 mmol) instead of titanocene dichloride 7
The reaction was carried out in the same manner as in Example 1, except that 30 mg (2.5 mmol) was used. The yield of the same triene compound as in Example 1 was 76%.
【0048】実施例6 下記化学式で表されるトリエン化合物を製造した。Example 6 A triene compound represented by the following chemical formula was produced.
【0049】[0049]
【化10】 Embedded image
【0050】実施例1において、ジルコノセンジクロリ
ド730mg(2.5mmol)の代わりにチタノセン
ジクロリド730mg(2.5mmol)、3−ヘキシ
ン(2mmol)の代わりに5−デシン(2mmol)
を使用した以外は、実施例1と同様に反応を行なった。
トリエン化合物の収率60%であった。In Example 1, 730 mg (2.5 mmol) of titanocene dichloride was used instead of 730 mg (2.5 mmol) of zirconocene dichloride, and 5-decyne (2 mmol) was used instead of 3-hexyne (2 mmol).
The reaction was carried out in the same manner as in Example 1 except that was used.
The yield of the triene compound was 60%.
【0051】比較例1 実施例1において、3−ヘキシン(2mmol)を加え
た後以降の反応温度を−78℃から23℃に変更した以
外は、実施例1と同様に反応を行なった。トリエン化合
物は生成せず、下記の化学式に示すジメチル(3,4,
5,6−テトラエチル)フタレートのみが86%の収率
で単離された。Comparative Example 1 A reaction was carried out in the same manner as in Example 1 except that the reaction temperature after adding 3-hexyne (2 mmol) was changed from -78 ° C to 23 ° C. No triene compound was produced, and the dimethyl (3,4,4)
Only 5,6-tetraethyl) phthalate was isolated in 86% yield.
【0052】[0052]
【化11】 Embedded image
【0053】[0053]
【発明の効果】以上説明した本発明によれば、アセチレ
ン類から直接に特定の構造を有する共役トリエン化合物
を製造する新規な方法が提供される。According to the present invention described above, a novel method for producing a conjugated triene compound having a specific structure directly from acetylenes is provided.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI C07C 43/15 C07C 43/15 43/166 43/166 67/347 67/347 69/602 69/602 C07F 7/00 C07F 7/00 A Z 7/08 7/08 J 7/28 7/28 Z ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 6 Identification code FI C07C 43/15 C07C 43/15 43/166 43/166 67/347 67/347 69/602 69/602 C07F 7/00 C07F 7 / 00 AZ 7/08 7/08 J 7/28 7/28 Z
Claims (2)
般式(1)で表されるメタラシクロペンタジエニルと金
属ハライドと下記一般式(2)で表されるアセチレン化
合物とを反応させ、次いで、ブレンステッド酸を反応さ
せることを特徴とする下記一般式(3)で表されるトリ
エン化合物の製造方法。 【化1】 (一般式(1)〜(3)中、R1〜R6は、それぞれ、ア
ルキル基、アルケニル基、芳香族基、シリル基、アルコ
キシ基、エステル基を表す。但し、これらの基は、炭素
数が1〜20であり且つ置換基を有していてもよい。そ
して、一般式(1)中、Mは遷移金属、Lは配位子、n
は0〜4の整数を表す。)At a temperature of 0 ° C. or lower, first, a metallacyclopentadienyl represented by the following general formula (1) is reacted with a metal halide and an acetylene compound represented by the following general formula (2), Then, a method for producing a triene compound represented by the following general formula (3), characterized by reacting a Bronsted acid. Embedded image (In the general formulas (1) to (3), R 1 to R 6 each represent an alkyl group, an alkenyl group, an aromatic group, a silyl group, an alkoxy group, or an ester group. The number may be 1 to 20 and may have a substituent, and in the general formula (1), M is a transition metal, L is a ligand, n
Represents an integer of 0 to 4. )
が周期表4族の遷移金属である請求項1に記載の製造方
法。2. The method according to claim 1, wherein the transition metal represented by M in the general formula (1) is a transition metal belonging to Group 4 of the periodic table.
Priority Applications (1)
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JP9251285A JPH1180041A (en) | 1997-09-01 | 1997-09-01 | Production of triene compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9251285A JPH1180041A (en) | 1997-09-01 | 1997-09-01 | Production of triene compound |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH1180041A true JPH1180041A (en) | 1999-03-23 |
Family
ID=17220538
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100724750B1 (en) | 2003-05-26 | 2007-06-07 | 패밀리 가부시키가이샤 | Chair-type massage machine, cover for massage machine, cover for ottoman, and massage machine |
-
1997
- 1997-09-01 JP JP9251285A patent/JPH1180041A/en not_active Withdrawn
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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KR100724750B1 (en) | 2003-05-26 | 2007-06-07 | 패밀리 가부시키가이샤 | Chair-type massage machine, cover for massage machine, cover for ottoman, and massage machine |
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