JPH1176956A5 - - Google Patents
Info
- Publication number
- JPH1176956A5 JPH1176956A5 JP1997252704A JP25270497A JPH1176956A5 JP H1176956 A5 JPH1176956 A5 JP H1176956A5 JP 1997252704 A JP1997252704 A JP 1997252704A JP 25270497 A JP25270497 A JP 25270497A JP H1176956 A5 JPH1176956 A5 JP H1176956A5
- Authority
- JP
- Japan
- Prior art keywords
- open publication
- workpieces
- immersing
- washed
- past
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9252704A JPH1176956A (ja) | 1997-09-02 | 1997-09-02 | 流水式洗浄装置における加圧式給液・整流機構 |
| US09/136,508 US6058950A (en) | 1997-09-02 | 1998-08-19 | Pressurized liquid-supply and straightening mechanism in a water-flow washing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9252704A JPH1176956A (ja) | 1997-09-02 | 1997-09-02 | 流水式洗浄装置における加圧式給液・整流機構 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH1176956A JPH1176956A (ja) | 1999-03-23 |
| JPH1176956A5 true JPH1176956A5 (enExample) | 2005-06-02 |
Family
ID=17241096
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9252704A Pending JPH1176956A (ja) | 1997-09-02 | 1997-09-02 | 流水式洗浄装置における加圧式給液・整流機構 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US6058950A (enExample) |
| JP (1) | JPH1176956A (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19934300C2 (de) * | 1999-07-21 | 2002-02-07 | Steag Micro Tech Gmbh | Vorrichtung zum Behandeln von Substraten |
| TWI233763B (en) * | 1999-12-17 | 2005-06-01 | Matsushita Electric Industrial Co Ltd | Method of manufacturing a circuit board |
| US6585572B1 (en) | 2000-08-22 | 2003-07-01 | Lam Research Corporation | Subaperture chemical mechanical polishing system |
| US6640155B2 (en) | 2000-08-22 | 2003-10-28 | Lam Research Corporation | Chemical mechanical polishing apparatus and methods with central control of polishing pressure applied by polishing head |
| US7481695B2 (en) | 2000-08-22 | 2009-01-27 | Lam Research Corporation | Polishing apparatus and methods having high processing workload for controlling polishing pressure applied by polishing head |
| US6652357B1 (en) | 2000-09-22 | 2003-11-25 | Lam Research Corporation | Methods for controlling retaining ring and wafer head tilt for chemical mechanical polishing |
| US6471566B1 (en) * | 2000-09-18 | 2002-10-29 | Lam Research Corporation | Sacrificial retaining ring CMP system and methods for implementing the same |
| US6443815B1 (en) | 2000-09-22 | 2002-09-03 | Lam Research Corporation | Apparatus and methods for controlling pad conditioning head tilt for chemical mechanical polishing |
| JP4813233B2 (ja) * | 2006-04-04 | 2011-11-09 | ヒタチグローバルストレージテクノロジーズネザーランドビーブイ | 洗浄装置及び洗浄方法 |
| US8707971B2 (en) * | 2008-05-16 | 2014-04-29 | Xyratex Corporation | Laminated walls for uniform fluid flow |
| MY147281A (en) * | 2008-07-31 | 2012-11-30 | Invenpro M Sdn Bhd | An apparatus for washing a workpiece |
| JP3171198U (ja) * | 2011-08-08 | 2011-10-20 | 東京エレクトロン株式会社 | 空気清浄用フィルタ装置 |
| KR102538179B1 (ko) | 2018-09-04 | 2023-06-01 | 삼성전자주식회사 | 습식 식각 장치 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3014957B2 (ja) * | 1996-02-14 | 2000-02-28 | スピードファムクリーンシステム株式会社 | 流水式洗浄装置 |
| US5836325A (en) * | 1996-02-20 | 1998-11-17 | Speedfam Clean System Co., Ltd. | Running water type washing machine |
-
1997
- 1997-09-02 JP JP9252704A patent/JPH1176956A/ja active Pending
-
1998
- 1998-08-19 US US09/136,508 patent/US6058950A/en not_active Expired - Lifetime
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