JPH1164602A - Antireflection film - Google Patents

Abstract

PROBLEM TO BE SOLVED: To inexpensively obtain an antireflection film having low reflectance in a wide wavelength region and excellent in flexibility and selectivity for materials by using an org. resin thereby forming at least one layer of low refractive index layers of the antireflection layer. SOLUTION: This antireflection film 10A has an antireflection layer 2 formed on a film base body 1, and the antireflection layer 2 consists of each n-layers of high refractive index layers 2a(i) and low refractive index layers 2b(i) (i=1 to n) with the low refractive index layer 2b as the uppermost layer. As for the high refractive index layers 2a, a material having >=1.80 refractive index nH is used. The low refractive index layers 2b consist of a material having <=1.70 refractive index nL. Further, at least one layer of the low refractive index layers, preferably one to three layers and at most 1/2 of the whole layers consist of an org. resin. It is preferable that a low refractive index layer comprising an org. resin is formed as the uppermost layer 2b(n) of the antireflection layer 2.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an antireflection film applied to the surface of a display screen of a display.
In particular, the present invention relates to an antireflection film exhibiting excellent antireflection performance in a wide wavelength range of visible light.

[0002]

2. Description of the Related Art Many displays are used in environments where external light enters, both indoors and outdoors. External light that has entered the display is specularly reflected inside the display, and reproduces a virtual image of the light source on the display screen of the display. For this reason, a fluorescent lamp or the like is reflected on the screen, which causes a problem that an original display image is difficult to see. Further, the external light incident on the display is mixed with the original display light to lower the display quality.

Therefore, in order to prevent such external light from entering the display, a high refractive index layer and a low refractive index layer made of a metal oxide or the like are laminated on the surface of the transparent plastic film substrate, or the transparent plastic film substrate is transparent. A film having an antireflection effect in which a low refractive index layer such as an inorganic compound or an organic fluorine compound is laminated as a single layer on the surface of a plastic film substrate,
That is, an anti-reflection film is stuck on the display surface.

[0004] Separately, a coating layer containing transparent fine particles is formed on the surface of a transparent plastic film substrate to make the surface uneven, whereby the same effect can be obtained by irregularly reflecting external light. Has been made.

[0005]

By the way, with the recent shift to office automation in offices, the frequency of using a computer has been increasing, and the length of time the computer has been used has been opposed to a CRT or a liquid crystal display. Therefore, deterioration in display quality due to external light entering the display and causing a reflected image or the like is also considered to be a cause of health problems such as eye fatigue, and higher reflections over a wider range of visible light than before. There is an increasing demand for an anti-reflection film having an anti-reflection effect and an optical member provided with such an anti-reflection film.

Further, in recent years, with the spread of outdoor life, the chances of using a television or a liquid crystal display outdoors tend to increase more and more, so that the display quality is further improved so that the displayed image can be clearly recognized. There has been a demand for an antireflection film having a higher antireflection effect over a wide range of visible light and an optical member provided with such an antireflection film.

However, a conventional antireflection film formed of a single layer of a low refractive index substance of an inorganic compound or an organic compound exhibits a U-shaped spectral reflection characteristic and cannot obtain a high antireflection effect over a wide range of visible light. . Further, in a multilayer structure in which high refractive index layers and low refractive index layers are alternately laminated, an effective antireflection effect can be obtained over a wide range of visible light, but the cost is increased because the material used is expensive. There's a problem. In particular, since the material for forming the low refractive index layer is practically only silicon oxide, the degree of freedom in material selection is also limited, and an increase in cost for forming the low refractive index layer is inevitable. ing.

On the other hand, the method of irregularly reflecting external light in order to prevent external light from entering the display has a problem that an image on the display appears blurred.

The present invention has been made in view of such a problem, and its object is to suppress the reflectance in a wider wavelength range, to provide a high degree of flexibility and a wide range of material selection. It is an object of the present invention to provide an antireflection film which is wide, excellent in practical use, inexpensive and easily obtained.

[0010]

Means for Solving the Problems In order to achieve the above object, the present inventor has stated that at least one side of a film substrate has
A high refractive index layer having a refractive index of 1.80 or more and a refractive index of 1.7
An antireflection film having an antireflection layer in which low-refractive-index layers of 0 or less are alternately laminated, wherein at least one of the low-refractive-index layers is made of an organic resin. .

[0011] In particular, in the above antireflection film, the total number of laminated layers of the high refractive index layer and the low refractive index layer is 2 to 6, or the high refractive index layer is made of ceramics, preferably, the ceramic is made of oxidized material. Titanium, zirconium oxide, tantalum oxide, zinc oxide, indium oxide, hafnium oxide,
Provided is one selected from cerium oxide, tin oxide, niobium oxide, yttrium oxide, ytterbium oxide, indium tin oxide, and a mixture of two or more of these.

[0012] In the above antireflection film, the organic resin forming the low refractive index layer is thermosetting, ultraviolet curable or electron beam curable, and exhibits thermoplasticity.

In the above antireflection film, one having a hard coat layer formed between the film substrate and the antireflection layer or one having a water repellent / antifouling layer formed on the antireflection layer I will provide a.

Further, the present invention provides an optical member having the above antireflection film.

According to the antireflection film of the present invention, a high refractive index layer having a refractive index of 1.80 or more and a low refractive index having a refractive index of 1.70 or less are formed on at least one surface of the film substrate. Since the antireflection layer in which the layers are alternately laminated is formed, an excellent antireflection effect can be obtained in a wide wavelength range of visible light. In addition, since at least one of the low refractive index layers forming the antireflection film is made of an organic resin, flexibility can be enhanced. Further, the organic resin forming the low refractive index layer is not limited to a single kind of organic resin, and various resins can be used as long as the refractive index is 1.70 or less. Therefore, this antireflection film has a wide range of material choices and can be manufactured at low cost.

[0016]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, an example of an antireflection film according to an embodiment of the present invention will be described in detail with reference to the drawings.
In each of the drawings, the same reference numerals represent the same or equivalent components.

FIGS. 1 to 4 are cross-sectional views each showing a layer structure of an embodiment of the antireflection film of the present invention.

The anti-reflection film 10A shown in FIG. 1 is obtained by forming an anti-reflection layer 2 on a film substrate 1. The anti-reflection layer 2 includes a high refractive index layer 2a (i) and a low refractive index layer 2b (i). Are alternately laminated (i = 1 to n) so that the low refractive index layer 2b is the uppermost layer. FIG. 2 shows the antireflection film 10A of FIG. In this embodiment, two high-refractive-index layers 2a and two low-refractive-index layers 2b are stacked.

In this antireflection film 10A, the film substrate 1 is preferably formed of a transparent plastic film, and is made of polymethyl methacrylate, polycarbonate, polystyrene, polyethylene sulfide, polyether sulfone, polyolefin, polyethylene terephthalate, polyethylene naphthalate. , Triacetyl cellulose or the like can be used, and these are appropriately selected depending on the purpose and use of the antireflection film 10A. Further, the thickness is selected according to the application.

The antireflection layer 2 is formed by alternately laminating a high refractive index layer 2a and a low refractive index layer 2b so as to have a predetermined optical film thickness nd (refractive index n × shape film thickness d). The rate layer 2b is configured to be the uppermost layer.

Here, as the high refractive index layer 2a, a layer having a refractive index n _H of 1.80 or more is used. High refractive index layer 2a
If the refractive index n _H of less than 1.80, it is impossible to sufficiently suppress the reflection of the antireflection film 10A.

The high refractive index layer 2a has a refractive index n _H of 1.80.
There is no particular limitation on the forming material as long as it is as described above, but practically, titanium oxide, zirconium oxide, tantalum oxide, zinc oxide, indium oxide, hafnium oxide, cerium oxide, tin oxide, niobium oxide, yttrium oxide, oxide oxide It is preferable to use any one of metal oxides such as ytterbium and indium / tin oxide, or a mixed material containing these as main materials. Among them, since zinc oxide, indium oxide, tin oxide, indium tin, and a mixture thereof have conductivity, when the high refractive index layer 2a is formed therefrom, the antireflection film 10A has an electromagnetic wave shield in addition to the antireflection function. It is preferable because a function can be provided.

The high refractive index layer 2a can be formed by a vacuum film forming process such as a vacuum evaporation method, a reactive evaporation method, an ion beam assisted evaporation method, a sputtering method, an ion plating method, and a plasma CVD method. However, the present invention is not limited to this, and may be formed by any film forming method.

On the other hand, the low refractive index layer 2b is formed of a material having a refractive index n _L of 1.70 or less. When the refractive index n _L of the low refractive index layer 2b exceeds 1.70, the anti-reflection film 10
The reflectivity of A cannot be sufficiently suppressed.

In addition, at least one of the low-refractive-index layers 2b (i = 1 to n), preferably １ ／ of the total number of layers, is set to 1
Three layers are formed from an organic resin. In this case, it is preferable to form a low-refractive-index layer made of an organic resin on the uppermost layer (2b (n)) of the antireflection layer 2 because the effect of the present invention can be exerted at a high level.

As such an organic resin, various thermosetting resins, ultraviolet curable resins, electron beam curable resins, and the like can be used. More specifically, for example, organic silicon-based resins, polyfunctional And acrylic, urethane, polyester, and melamine thermoplastic resins.

In the present invention, at least one layer of the low refractive index layer 2b is formed of an organic resin as described above, but the remaining low refractive index layer 2b may be formed of a metal oxide. Or an organic resin such as

The method of forming the low-refractive-index layer 2b is not particularly limited. For example, the low-refractive-index layer 2b can be formed by a vacuum film-forming process similarly to the high-refractive-index layer 2a. And heat drying method, heat curing method,
It can also be formed by a film forming process such as an ultraviolet irradiation curing method and an electron beam irradiation curing method. These are appropriately selected according to the organic resin used for forming the low refractive index layer 2b. In addition, when performing an ultraviolet curing method, an electron beam irradiation curing method, or the like, the organic resin is heated and vaporized in a vacuum, or mist is introduced by ultrasonic waves, and introduced into the base material.
It is also possible to form the low refractive index layer 2b by irradiating an electron beam or the like.

The total number of laminated layers of the high refractive index layer 2a and the low refractive index layer 2b as described above is preferably small in consideration of productivity, cost, etc., but is usually 2 to 6 layers. preferable. Thereby, the reflection characteristics of the antireflection film of the present invention can be set to a value within a range of 400 nm to 700 nm, which is generally regarded as visible light, within a range of 450 nm to 65, which is relatively high for human eyes.
In the range of 0 nm, the average reflectance can be set to 3% or less, further 1% or less.

In the present invention, the structure other than the above-described anti-reflection layer 2 can be formed in the same manner as a known anti-reflection film, but preferably, the anti-reflection film 10B shown in FIG. 3 or the reflection film shown in FIG. As in the case of the prevention film 10C, a water-repellent / dirt-proof layer 3 and a hard coat layer 4 are provided.

The water-repellent / soil-repellent layer 3 is formed on the anti-reflective layer 2 to protect the surface of the anti-reflective layer 2 and to further enhance the antifouling property. Any material can be used without limitation as long as it has transparency and the required performance is satisfied. For example, compounds having a hydrophobic group, more specifically, fluorocarbons, perfluorosilanes, and the like, and high molecular compounds thereof can be preferably used. In addition, a polymer compound having oil repellency such as a methyl group is suitable for improving fingerprint wiping stains.

The water-repellent / antifouling layer 3 may be formed by a vacuum film-forming process such as a vacuum deposition method, a sputtering method, an ion plating method, a plasma CVD method, or a plasma polymerization method, or a micro-deposition method depending on the material to be formed. Various coating methods of a wet process such as gravure, screen, and dip can be used.

It is necessary to set the thickness of the water repellent / antifouling layer 3 so as not to impair the function of the antireflection layer 2.
It is preferable that the shape film thickness be 50 nm or less.

The hard coat layer 4 is provided as needed in order to impart a desired hardness to the antireflection film.
Therefore, as the hard coat layer 4, it is preferable to form a layer having transparency and appropriate hardness,
There is no particular limitation on the forming material. For example, a resin cured by irradiation with ionizing radiation or ultraviolet light or a thermosetting resin can be used. In particular, an ultraviolet-curable acrylic or organic silicon-based resin or a thermosetting polysiloxane resin is preferable. More preferably, these resins have the same or similar refractive index as the film substrate 1, but have a thickness of 3 μm.
In the case of m or more, this point is not particularly necessary.

In forming the hard coat layer 4, there is no limitation on the coating method, but it is preferable to form the hard coat layer 4 with a smooth and uniform surface.

The hard coat layer 4 has an average particle diameter of 0.01
Up to 3 μm of transparent inorganic or organic ultrafine particles may be mixed and dispersed. As a result, a light diffusion process called anti-glare can be performed. By forming the anti-reflection layer 2 on the hard coat layer 4 which has been subjected to the light diffusing treatment, the blur of the image is reduced, and the image becomes clearer than when the light diffusing treatment is simply performed. .
These ultrafine particles are not particularly limited as long as they are transparent, but particles made of a low refractive index material having a refractive index of 1.6 or less are preferable. For example, silicon oxide particles, magnesium fluoride particles and the like are stable. It is suitable in terms of heat resistance and the like.

The anti-reflection film of the present invention can be used in the same manner as a conventional anti-reflection film. For example, the anti-reflection film is bonded to a glass plate, a plastic plate, a polarizing plate, etc. using an adhesive or an adhesive. An optical member having antireflection properties can be obtained. Therefore, the present invention includes such an optical member.

[0038]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be specifically described below based on embodiments.

Example 1 An antireflection film having the layer structure shown in FIG. 2 was produced as follows.

As a transparent film substrate 1, a polyethylene terephthalate (PET) film (100 μm thick)
m) An antireflection layer 2 having a layer structure shown in Table 1 below was formed on the m) to obtain an antireflection film. In this case, first, a high-refractive-index layer 2a made of titanium oxide and a low-refractive-index layer 2b made of silicon oxide are laminated on the film substrate 1 by a plasma-assisted vapor deposition method, and the uppermost layer (fourth layer) is further formed. As an organic resin layer forming the low refractive index layer 2b, a silicone resin was formed by a thermosetting method.

Table 1 shows the refractive index and the optical thickness nd of each layer constituting the anti-reflection layer 2. The optical thickness of each layer is
The film thickness was monitored by an optical film thickness monitor, and when the light amount reached a target value, the film formation was stopped to control the film thickness to a predetermined value.

FIG. 5 shows the spectral reflection characteristics of the obtained antireflection film by absolute reflection measurement. From this figure, it was confirmed that this antireflection film has a reflectance of 0.5% or less over a wavelength of light of 450 nm to 650 nm or more, and has high antireflection properties in a wide wavelength range.

[0043]

[Table 1] Layered base film of antireflection film: PET film (thickness: 100 μm) Antireflection layer: First layer High refractive index layer: TiO ₂ (n _H1 = 2.30, nd = 65 nm) Second layer Low refractive index layer: SiO ₂ (n _L1 = 1.46, nd = 35 nm) Third Layer High refractive index layer: TiO ₂ (n _H2 = 2.30, nd = 110 nm) 4th layer Low refractive index layer: Silicone resin (n _L2 = 1.50, nd = 145 nm)

Example 2 A triacetyl cellulose film (80 μm thick) was used as a transparent film substrate 1, and a monofunctional acrylic resin was first formed thereon as a transparent hard coat layer 4 by an ultraviolet irradiation curing method. Then, an antireflection layer 2 having a layer configuration shown in Table 2 was formed. In this case, first, a high-refractive-index layer 2a made of titanium oxide and a low-refractive-index layer 2b made of silicon oxide are formed by a plasma-assisted vapor deposition method in the same manner as in Example 1, and the uppermost layer (fourth layer) Low refractive index layer 2b
An acrylic resin was formed by an ultraviolet irradiation method as an organic resin layer.

Table 2 shows the refractive index and the optical thickness nd of each layer constituting the antireflection layer 2. FIG. 6 shows the spectral reflection characteristics of the obtained antireflection film by absolute reflection measurement. As shown in the figure, the antireflection film has a wavelength of 45
The reflectance was 0.5% or less over 0 nm to 650 nm or more, and it was confirmed that the film had high antireflection properties in a wide wavelength range.

[0046]

[Table 2] Layer composition of antireflection film Base film: triacetyl cellulose film (thickness: 80 μm) Hard coat layer: acrylic resin (n _H1 = 1.50, thickness: 5 μm) Anti-reflection layer: First layer High refractive index layer: TiO ₂ (n _H1 = 2.30, nd = 60 nm) Second layer Low refractive index layer: SiO ₂ (n _L1 = 1.46, nd = 40 nm) Third Layer High refractive index layer: TiO ₂ (n _H2 = 2.30, nd = 120 nm) Fourth layer Low refractive index layer: acrylic resin (n _L2 = 1.50, nd = 140 nm)

Example 3 As a transparent film substrate 1, a PET film (thickness: 10
0 μm), and an antireflection layer 2 having a layer configuration shown in Table 3 was formed thereon. In this case, first, a high refractive index layer 2a made of titanium oxide and a low refractive index layer 2b made of silicon oxide
Were formed by the plasma-assisted vapor deposition method in the same manner as in Example 1, and a silicone resin was formed by an ultraviolet irradiation curing method as an organic resin layer forming the uppermost (fourth) low refractive index layer 2b.

Further, perfluorosilane was formed thereon as a water-repellent / dirtproof layer 3 by a plasma CVD method to form an antireflection film.

Antireflection layer 2 of the obtained antireflection film
Table 3 shows the refractive index and the optical film thickness nd of each layer constituting the above. Further, when the spectral reflection characteristics of the obtained antireflection film by absolute reflection measurement were measured, it was almost the same as in FIG. 5 of Example 1 described above, and the light wavelength was 450 nm to 65 nm.
The reflectance was 0.5% or less over 0 nm or more, and it was confirmed that the film had high antireflection properties in a wide wavelength range.

[0050]

[Table 3] Layered base film of antireflection film: PET film (thickness: 100 μm) Antireflection layer: First layer High refractive index layer: TiO ₂ (n _H1 = 2.30, nd = 65 nm) Second layer Low refractive index layer: SiO ₂ (n _L1 = 1.46, nd = 35 nm) Third Layer High refractive index layer: TiO ₂ (n _H2 = 2.30, nd = 110 nm) 4th layer Low refractive index layer: Silicone resin (n _L2 = 1.50, nd = 145 nm) Water repellent / antifouling layer: perfluorosilane (thickness 0.01 μm)

Example 4 A triacetylcellulose film (80 μm thick) was used as a transparent film substrate 1, and an organosilicon resin was first formed thereon as a transparent hard coat layer 4 by an ultraviolet irradiation curing method. Then, an antireflection layer 2 having a layer configuration shown in Table 4 was formed. In this case, first, a high refractive index layer 2a made of titanium oxide and a low refractive index layer 2b made of silicon oxide
Were formed by plasma-assisted vapor deposition in the same manner as in Example 1, and an acrylic resin was formed by an electron beam irradiation curing method as an organic resin layer constituting the uppermost (fourth) low refractive index layer 2b.

Table 4 shows the refractive index and the optical thickness nd of each layer constituting the anti-reflection layer 2. Further, when the spectral reflection characteristics of the obtained antireflection film by absolute reflection measurement were measured, it was almost the same as in FIG. 6 of Example 2 described above, and the reflectance was 0.5% over the light wavelength of 450 nm to 650 nm or more. It was as follows, and it was confirmed that the composition had high antireflection properties in a wide wavelength range.

[0053]

[Table 4] Layer composition of antireflection film Base film: triacetyl cellulose film (80 μm thickness) Hard coat layer: organosilicon resin (n _H1 = 1.49, thickness 5 μm) Anti-reflection layer: First layer High refractive index layer: TiO ₂ (n _H1 = 2.30, nd = 60 nm) Second layer Low refractive index layer: SiO ₂ (n _L1 = 1.46, nd = 40 nm) Third Layer High refractive index layer: TiO ₂ (n _H2 = 2.30, nd = 120 nm) Fourth layer Low refractive index layer: acrylic resin (n _L2 = 1.50, nd = 140 nm)

Example 5 A PET film (thickness: 10) was used as the transparent film substrate 1.
0 μm), and an antireflection layer 2 having a layer configuration shown in Table 5 was formed thereon. In this case, first, a high-refractive-index layer 2a made of indium oxide-tin oxide mixture (ITO) and a low-refractive index layer 2b made of silicon oxide are formed by a plasma-assisted vapor deposition method in the same manner as in the first embodiment. A thermoplastic acrylic resin was applied and formed as an organic resin layer constituting the (fourth layer) low refractive index layer 2b.

Further, perfluorosilane was formed thereon as a water-repellent / dirt-proof layer 3 by a plasma CVD method to obtain an antireflection film.

Antireflection layer 2 of the obtained antireflection film
Table 5 shows the refractive index and the optical film thickness nd of each layer constituting the above. Further, when the spectral reflection characteristics of the obtained antireflection film by absolute reflection measurement were measured, it was almost the same as in FIG. 5 of Example 1 described above, and the light wavelength was 450 nm to 65 nm.
The reflectance was 0.5% or less over 0 nm or more, and it was confirmed that the film had high antireflection properties in a wide wavelength range.

Further, the electromagnetic wave shielding property is 100
It was confirmed that there was an attenuation of 30 dB at MHz and good shielding properties were exhibited.

[0058]

[Table 5] Layered base film of antireflection film: PET film (thickness: 100 μm) Antireflection layer: 1st layer High refractive index layer: ITO (n _H1 = 2.10, nd = 55 nm) 2nd layer Low refractive index layer: SiO ₂ (n _L1 = 1.46, nd = 25 nm) 3rd layer High refractive index layer: ITO (n _H2 = 2.10, nd = 150 nm) Fourth layer Low refractive index layer: thermoplastic acrylic resin (n _L2 = 1.50, nd = 135 nm) Water repellent / antifouling layer: perfluorosilane (thickness 0.01 μm)

Comparative Example 1 As a transparent film substrate 1, a PET film (thickness 10
0 μm), and a single layer of a polyfunctional acrylic resin corresponding to the low-refractive-index layer 2b was formed thereon as an anti-reflection layer 2 by an ultraviolet irradiation curing method to obtain an anti-reflection film of a comparative example.

The refractive index and the optical film pressure nd of the polyfunctional acrylic resin layer were as shown in Table 6. FIG. 7 shows the spectral reflection characteristics of the obtained antireflection film by absolute reflection measurement. As can be seen from the figure, the antireflection film of this comparative example has a significantly higher reflectance than the antireflection films of Examples 1 to 5, and has a wavelength range showing antireflection properties as compared with the examples. It was narrow.

[0061]

[Table 6] Layered base film of antireflection film: PET film (thickness: 100 μm) Antireflection layer: Low refractive index layer: Polyfunctional group acrylic resin (n _L1 = 1.50, nd = 138 nm)

[0062]

According to the present invention, a high refractive index layer having a refractive index of 1.80 or more is provided on at least one surface of a film substrate.
A low-refractive-index layer having a refractive index of 1.70 or less is alternately laminated to form an anti-reflection layer, and at least one of the low-refractive-index layers of the anti-reflection layer is formed of an organic resin. With low reflectivity in the region, flexibility, excellent material selectivity, it is possible to obtain an anti-reflection film,
Further, such an antireflection film can be provided at low cost.

Further, by using a conductive metal oxide for forming the antireflection layer, the antireflection film of the present invention can have conductivity and antistatic properties in addition to the antireflection effect. In addition, by forming a water-repellent / anti-smudge layer on the outermost surface, anti-smudge properties can be imparted, and a highly functional anti-reflection film with high practicality can be obtained.

The optical member can be formed by bonding the antireflection film of the present invention to a glass plate or the like. By using such an optical member for a display, the display quality is improved and the displayed image is more improved. You will be able to clearly recognize.

[Brief description of the drawings]

FIG. 1 is a layer configuration diagram of an antireflection film of the present invention.

FIG. 2 is a layer configuration diagram of the antireflection film of the present invention.

FIG. 3 is a layer configuration diagram of another embodiment of the antireflection film of the present invention.

FIG. 4 is a layer configuration diagram of another embodiment of the antireflection film of the example.

FIG. 5 is a spectral reflection spectrum of the antireflection film of Example 1 measured by absolute reflection.

FIG. 6 is a spectral reflection spectrum of the antireflection film of Example 2 measured by absolute reflection.

FIG. 7 is a spectral reflection spectrum of the antireflection film of Comparative Example 1 measured by absolute reflection.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Film base material 2 Antireflection layer 2a High-refractive-index layer 2b Low-refractive-index layer 3 Water-repellent and antifouling layer 4 Hard-coat layer 10A, 10B, 10C Antireflection film

 ──────────────────────────────────────────────────続 き Continuation of the front page (72) Inventor Mitsuru Kano 1-5-1, Taito, Taito-ku, Tokyo Letterpress Printing Co., Ltd.

Claims (13)

[Claims] 1. A high refractive index layer having a refractive index of 1.80 or more and a refractive index of 1.70 on at least one surface of a film substrate.
An antireflection film having an antireflection layer in which the following low refractive index layers are alternately laminated, wherein at least one of the low refractive index layers is made of an organic resin. 2. The antireflection film according to claim 1, wherein the total number of laminated layers of the high refractive index layer and the low refractive index layer is 2 to 6. 3. The antireflection film according to claim 1, wherein the high refractive index layer is made of ceramic. 4. The ceramics are titanium oxide, zirconium oxide, tantalum oxide, zinc oxide, indium oxide,
Hafnium oxide, cerium oxide, tin oxide, niobium oxide,
Yttrium oxide, ytterbium oxide, indium
4. The antireflection film according to claim 3, wherein the antireflection film is selected from tin oxide and a mixture of two or more thereof. 5. The antireflection film according to claim 1, wherein the low refractive index layer is formed on the uppermost layer of the antireflection layer. 6. The antireflection film according to claim 1, wherein the organic resin of the low refractive index layer is thermosetting. 7. The antireflection film according to claim 1, wherein the organic resin of the low refractive index layer is ultraviolet curable. 8. The antireflection film according to claim 1, wherein the organic resin of the low refractive index layer is electron beam curable. 9. The antireflection film according to claim 1, wherein the organic resin of the low refractive index layer is thermoplastic. 10. Between a film substrate and an antireflection layer,
The antireflection film according to any one of claims 1 to 9, wherein a hard coat layer is formed. 11. The hard coat layer having an average particle size of 0.0
The antireflection film according to claim 10, comprising transparent fine particles of 1 to 3 μm. 12. The anti-reflection film according to claim 1, wherein a water-repellent / anti-fouling layer is formed on the anti-reflection layer. 13. An optical member having the antireflection film according to claim 1.