JPH1161379A - Vapor deposition device for glass substrate - Google Patents

Vapor deposition device for glass substrate

Info

Publication number
JPH1161379A
JPH1161379A JP22390197A JP22390197A JPH1161379A JP H1161379 A JPH1161379 A JP H1161379A JP 22390197 A JP22390197 A JP 22390197A JP 22390197 A JP22390197 A JP 22390197A JP H1161379 A JPH1161379 A JP H1161379A
Authority
JP
Japan
Prior art keywords
glass substrate
vapor deposition
band
shaped
deposition apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22390197A
Other languages
Japanese (ja)
Other versions
JP3547033B2 (en
Inventor
Fumihiro Sei
文博 清
Toshifumi Hashiguchi
敏文 橋口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP22390197A priority Critical patent/JP3547033B2/en
Publication of JPH1161379A publication Critical patent/JPH1161379A/en
Application granted granted Critical
Publication of JP3547033B2 publication Critical patent/JP3547033B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Surface Treatment Of Glass (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a vapor deposition device for a glass substrate capable of stably and surely executing the vapor deposition of thin coating on a glass substrate without breaking the glass substrate. SOLUTION: Since a vapor deposition mask is formed by combining at least four band-shaped sheets 31 to 35 having flexibility in a frame shape in such a manner that they are independently supported, even in the case deflection occurs on a glass substrate 100, in accordance with the deformation caused by the deflection, the band-shaped sheets 31 to 35 also deflect, and, by the band-shaped sheets 31 to 34, stress can not be applied to the glass substrate 100, so that the breaking of the glass substrate can be prevented.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は平面表示パネルの電
極支持基板などに用いられるガラス基板に対して電極、
保護膜等の薄膜を蒸着形成するガラス基板用蒸着装置に
関し、特にガラス基板に対向して配設される蒸着マスク
の支持を改良したガラス基板用蒸着装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrode for a glass substrate used for an electrode support substrate of a flat display panel, and the like.
The present invention relates to a vapor deposition apparatus for a glass substrate which deposits and forms a thin film such as a protective film, and more particularly to a vapor deposition apparatus for a glass substrate having an improved support of a vapor deposition mask disposed to face the glass substrate.

【0002】平面表示パネルは大表示画面化すると共
に、装置自体の軽量化が望まれている。この大表示画面
化に伴って、平面表示パネルに用いられるガラス基板の
面積も大型化し、また平面表示パネルを軽量化するため
にガラス基板自体を薄く形成することが要求されてい
る。このように大型化され、又は薄く形成されるガラス
基板の所定領域に対して基板を破損させることなく均一
な膜を成膜することが必要となる。
A flat display panel is required to have a large display screen and to reduce the weight of the device itself. With the increase in the size of the display screen, the area of the glass substrate used for the flat display panel is also increased, and the thickness of the glass substrate itself is required to be reduced in order to reduce the weight of the flat display panel. It is necessary to form a uniform film without damaging the substrate in a predetermined area of the glass substrate which is made large or thin in this way.

【0003】[0003]

【従来の技術】従来、この種のガラス基板用蒸着装置と
してEL(Electroluminescence)パネルの発光層形成
に適用した例が特公昭63−15714号公報に開示さ
れており、これを図7(A)及び図7(B)に示す。前
記各図において従来のガラス基板用蒸着装置は、蒸着窓
81を有した蒸着マスク80上にガラス基板100を所
定の間隙85を介して載置し、このガラス基板100を
加熱してこの表面に温度依存性の大きい材料を加熱蒸発
させることにより付着させて発光層を膜形成する構成で
ある。前記蒸着マスク80は、方形状の板状体からな
り、この板状体の略中央に方形状の開口部として蒸着窓
81が穿設され、この蒸着窓81の外周辺に段差状に凹
部82が形成され、この凹部82の四角部分に凸状の基
板固定部83が形成される構成である。
2. Description of the Related Art Japanese Patent Publication No. 63-15714 discloses an example of a conventional vapor deposition apparatus for a glass substrate applied to the formation of a light emitting layer of an EL (Electroluminescence) panel. And FIG. 7B. In each of the drawings, the conventional glass substrate vapor deposition apparatus places a glass substrate 100 on a vapor deposition mask 80 having a vapor deposition window 81 with a predetermined gap 85 therebetween, and heats the glass substrate 100 to cover the surface. In this configuration, a material having a large temperature dependency is attached by heating and evaporating to form a light emitting layer. The vapor deposition mask 80 is formed of a rectangular plate, and a vapor deposition window 81 is formed as a rectangular opening substantially at the center of the plate, and a stepped concave portion 82 is formed around the vapor deposition window 81. Is formed, and a convex substrate fixing portion 83 is formed in a square portion of the concave portion 82.

【0004】次に、前記構成に基づくガラス基板用蒸着
装置のELパネル形成動作について説明する。まず、蒸
発源84を加熱して蒸気84aを発生させ、この蒸気8
4aを蒸着マスク80の蒸着窓81を介してガラス基板
100上に付着させる。この蒸気84aの付着によりガ
ラス基板100上に発光層の膜を形成できることとな
る。この発光層の膜は、蒸発源84にZnS;Mn等か
らなる発光層材を載置しているのでZnS;Mnによる
発光層が形成される。
Next, an operation of forming an EL panel of the vapor deposition apparatus for a glass substrate based on the above configuration will be described. First, the evaporation source 84 is heated to generate steam 84a.
4a is adhered on the glass substrate 100 through the vapor deposition window 81 of the vapor deposition mask 80. By the attachment of the vapor 84a, a light emitting layer film can be formed on the glass substrate 100. In the film of the light emitting layer, a light emitting layer made of ZnS; Mn is placed on the evaporation source 84, so that a light emitting layer of ZnS; Mn is formed.

【0005】前記蒸着マスク80の基板固定部83によ
って蒸着マスク80とガラス基板100との間に間隙8
5を設けているために、蒸着マスク80とガラス基板1
00との熱伝導率や熱容量の差に起因する温度差が生じ
ても蒸着マスク80からガラス基板100への熱の移動
は蒸着窓81付近では起こらない。わずかに基板固定部
83からガラス基板100へ熱が伝導するが、この基板
固定部83はガラス基板100の蒸着面から十分に離
し、また接触面積も小さくしているため蒸着面への熱伝
導は極力おさえられる。
A gap 8 is formed between the deposition mask 80 and the glass substrate 100 by the substrate fixing portion 83 of the deposition mask 80.
5, the deposition mask 80 and the glass substrate 1
Even if a temperature difference occurs due to a difference in thermal conductivity or heat capacity from the temperature of 00, heat transfer from the evaporation mask 80 to the glass substrate 100 does not occur near the evaporation window 81. Although heat is slightly conducted from the substrate fixing portion 83 to the glass substrate 100, the substrate fixing portion 83 is sufficiently separated from the vapor deposition surface of the glass substrate 100 and has a small contact area, so that heat conduction to the vapor deposition surface is small. It is suppressed as much as possible.

【0006】従って、ガラス基板100の蒸着面内での
温度分布は均一となるので、例示しているZnS;Mn
の高温では膜形成速度の低下となる性質からの形成膜厚
の不均一は発生せず均一な発光層が形成できるとしてい
る。
Accordingly, the temperature distribution on the deposition surface of the glass substrate 100 becomes uniform, so that ZnS;
It is stated that a uniform light-emitting layer can be formed without causing nonuniformity of the formed film thickness due to the property that the film formation speed is reduced at the high temperature.

【0007】[0007]

【発明が解決しようとする課題】しかしながら従来のガ
ラス基板用蒸着装置は以上のように構成されていたこと
から、蒸気84aを発生させるために蒸発源84からの
発熱によりガラス基板100に撓みが生じ、この撓んだ
ガラス基板100と蒸着マスク80とが接触してガラス
基板100が破損するという課題を有する。即ち、前記
ガラス基板100の熱伝導率と蒸着マスク80の熱伝導
率とが異なるため、蒸発源84から熱が加えられると撓
みに差異が生じてガラス基板100が蒸着マスク80に
接触して破損することとなる。
However, since the conventional vapor deposition apparatus for a glass substrate is constructed as described above, the glass substrate 100 is bent by the heat generated from the evaporation source 84 to generate the vapor 84a. In addition, there is a problem that the bent glass substrate 100 comes into contact with the vapor deposition mask 80 and the glass substrate 100 is damaged. That is, since the thermal conductivity of the glass substrate 100 is different from the thermal conductivity of the deposition mask 80, when heat is applied from the evaporation source 84, a difference occurs in the bending, and the glass substrate 100 comes into contact with the deposition mask 80 and is broken. Will be done.

【0008】また、蒸着マスク80によりガラス基板1
00の外周辺の総てが遮蔽されているため、ガラス基板
100の中心部分と遮蔽された外周辺部分との間に大き
な温度分布の差異が生じ、この温度分布の差異によりガ
ラス基板100が破損するという課題を有する。
Further, the glass substrate 1 is
00, the entire outer periphery is shielded, so that a large difference in temperature distribution occurs between the central portion of the glass substrate 100 and the shielded outer peripheral portion, and the difference in the temperature distribution damages the glass substrate 100. Have the task of doing

【0009】本発明は前記課題を解消するためになされ
たもので、ガラス基板を破損することなく安定且つ確実
にガラス基板に対する薄膜蒸着ができるガラス基板用蒸
着装置の提供を目的とする。
SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and has as its object to provide a vapor deposition apparatus for a glass substrate capable of stably and reliably depositing a thin film on a glass substrate without damaging the glass substrate.

【0010】[0010]

【課題を解決するための手段】本発明に係るガラス基板
用蒸着装置は、ガラス基板の所定領域を蒸着マスクによ
り蒸着エリアとして規定し、当該蒸着エリアに対して薄
膜を蒸着するガラス基板用蒸着装置において、前記蒸着
マスクが、可撓性を有する帯状板を少なくとも4枚枠状
に組合せてなり、当該各帯状板を個別に独立して支持し
て形成するものである。このように本発明においては、
可撓性を有する帯状板を個別独立に支持して組合せるこ
とにより蒸着マスクを形成していることから、ガラス基
板に撓みが生じても、この撓みによる変形に対応して帯
状板も撓むこととなり、この帯状板からガラス基板に対
して応力が加えられなくなり、ガラス基板の破損を防止
できる。
According to the present invention, there is provided a glass substrate vapor deposition apparatus for defining a predetermined area of a glass substrate as a vapor deposition area by using a vapor deposition mask and depositing a thin film on the vapor deposition area. , The vapor deposition mask is formed by combining at least four flexible band-shaped plates in a frame shape, and supporting each of the band-shaped plates individually and independently. Thus, in the present invention,
Since the vapor deposition mask is formed by separately supporting and combining flexible strips, even if the glass substrate is bent, the strip is bent in response to the deformation caused by the bending. As a result, no stress is applied to the glass substrate from the strip-shaped plate, and the glass substrate can be prevented from being damaged.

【0011】また、本発明に係るガラス基板用蒸着装置
は必要に応じて、ガラス基板と一体化する他のガラス基
板のシール部に対向する枠状のシール接合領域を、前記
組合された帯状板でマスクするものでる。このように本
発明においては、枠状のシール接合領域を組合された帯
状板でマスクするようにしているので、シール接合領域
の内側の表示領域に薄膜を蒸着できると共に、シール接
合領域の外周領域に薄膜を蒸着できることとなり、ガラ
ス基板の温度分布をより均一にしてガラス基板の割れ、
破損を極力防止できる。
Further, the glass substrate deposition apparatus according to the present invention may include a frame-shaped seal joint region facing a seal portion of another glass substrate integrated with the glass substrate, if necessary, by combining the combined band-shaped plate. Is to be masked. As described above, in the present invention, since the frame-shaped seal bonding area is masked by the combined belt-like plate, a thin film can be deposited on the display area inside the seal bonding area, and the outer peripheral area of the seal bonding area can be formed. Thin film can be deposited on the glass substrate, thereby making the temperature distribution of the glass substrate more uniform and cracking the glass substrate,
Damage can be prevented as much as possible.

【0012】また、本発明に係るガラス基板用蒸着装置
は必要に応じて、ガラス基板又は帯状板が熱膨張により
形状変化した場合に、当該形状変化に伴って前記帯状板
が移動自在に支持されものである。このように本発明に
おいては、帯状板を移動自在に支持しているので、ガラ
ス基板又は帯状板自体の熱膨張による変形をを吸収し
て、帯状板からガラス基板に対して応力が加えられなく
なり、ガラス基板の破損を防止できる。
Further, the glass substrate vapor deposition apparatus according to the present invention, if necessary, when the glass substrate or the band-shaped plate changes its shape due to thermal expansion, the band-shaped plate is movably supported with the shape change. Things. As described above, in the present invention, since the strip-shaped plate is movably supported, the deformation caused by thermal expansion of the glass substrate or the strip-shaped plate itself is absorbed, so that stress is not applied from the strip-shaped plate to the glass substrate. In addition, damage to the glass substrate can be prevented.

【0013】また、本発明に係るガラス基板用蒸着装置
は必要に応じて、帯状板の一端又は両端を長孔又は弾性
体で支持されるものである。このように本発明において
は、帯状板に対する押圧力及び帯状板自体の変形を長孔
による支持又は弾性体による支持で吸収できることとな
り、ガラス基板に対する応力をより減衰させてガラス基
板の破損を防止できる。
Further, the vapor deposition apparatus for a glass substrate according to the present invention has one end or both ends of the strip-shaped plate supported by a long hole or an elastic body as required. As described above, in the present invention, the pressing force against the band-shaped plate and the deformation of the band-shaped plate itself can be absorbed by the support by the elongated holes or the support by the elastic body, and the stress on the glass substrate can be further attenuated to prevent the glass substrate from being damaged. .

【0014】[0014]

【発明の実施の形態】BEST MODE FOR CARRYING OUT THE INVENTION

(本発明の第1の実施形態)以下、本発明の第1の実施
形態に係るガラス基板用蒸着装置をプラズマディスプレ
イ(PDP)のMgO保護膜を蒸着形成する場合につい
て図1及び図2に基づいて説明する。図1は第1の実施
形態に係るガラス基板用蒸着装置を下方から見た平面図
及びこのA−A線断面図、図2は図1に記載するガラス
基板用蒸着装置の動作説明図、図3は図2における部分
詳細説明図である。なお、蒸発源等は省略している。
(First Embodiment of the Present Invention) Hereinafter, a case where a vapor deposition apparatus for a glass substrate according to a first embodiment of the present invention forms an MgO protective film of a plasma display (PDP) by vapor deposition will be described with reference to FIGS. 1 and 2. Will be explained. 1 is a plan view of the glass substrate deposition apparatus according to the first embodiment viewed from below and a cross-sectional view taken along line AA. FIG. 2 is an operation explanatory diagram of the glass substrate deposition apparatus shown in FIG. FIG. 3 is a partially detailed explanatory view of FIG. Note that the evaporation source and the like are omitted.

【0015】前記各図において第1の実施形態に係るガ
ラス基板用蒸着装置は、略中央にPDP用ガラス基板1
00を収納する取付開口部10を有する基板支持枠1
と、この基板支持枠1から取付開口部10内に突出して
配設され、この突出する側端に取付られた支持片21
a、〜、24aをガラス基板100に当接させて蒸着状
態を保持する基板保持部21、〜、24と、前記取付開
口部10に縦横に各々架け渡した井桁(枠)状に組合せ
てなり、前記ガラス基板100の周辺のシール接合領域
をマスクするように配設される帯状板31、〜、34
と、前記基板支持枠1から取付開口部10内に突出して
配設され、この突出した先端部分で前記帯状板31、
〜、34を下方から支持するマスク受け板ばね41a・
41b・41c、〜、44a・44b・44cとで蒸着
マスクを形成する構成である。
In each of the drawings, the glass substrate deposition apparatus according to the first embodiment has a PDP glass substrate 1 substantially at the center.
Substrate support frame 1 having mounting opening 10 for housing 00
And a support piece 21 protruding from the substrate support frame 1 into the mounting opening 10 and attached to the protruding side end.
a,..., and 24 a are brought into contact with the glass substrate 100 to hold the vapor deposition state, and are combined with each other in a cross-shaped (frame) shape that is vertically and horizontally laid over the mounting opening 10. , Strip-shaped plates 31 to 34 disposed so as to mask the sealing joint area around the glass substrate 100.
The belt-like plate 31 is disposed so as to protrude from the substrate support frame 1 into the mounting opening 10, and has the protruding tip portion.
, 34 for supporting the mask from below.
41b, 41c,..., 44a, 44b, 44c form an evaporation mask.

【0016】前記基板保持部21、〜、24の支持片2
1a、〜、24aは、先端を球形状とし、断熱性・可撓
性を有する、例えばポリイミド系材料を用いることもで
きる。この支持片21a、〜、24aの先端を球形状と
することにより、蒸着の際に加えられる熱応力によりガ
ラス基板100に撓み(熱変形)が生じた場合にも、常
にガラス基板100の基板面に対して垂直に安定した支
持ができることとなる。
The support pieces 2 of the substrate holders 21,.
For 1a to 24a, for example, a polyimide-based material having a spherical tip at the tip and having heat insulation and flexibility can be used. By making the tips of the support pieces 21a to 24a spherical, even if the glass substrate 100 is bent (thermally deformed) due to thermal stress applied at the time of vapor deposition, the substrate surface of the glass substrate 100 is always maintained. , And can be stably supported vertically.

【0017】前記帯状板31、〜、34は、その板幅を
シール接合領域に対応する幅で形成され、4枚を矩形状
の枠体として組合せることにより蒸着マスクとして構成
している。この帯状板31、〜、34の両端近傍には各
々長孔31a・31b、〜、34a・34bが穿設さ
れ、この各長孔31a・31b、〜、34a・34bに
突片31c・31d、〜、34c・34dが挿通される
構成である。この突片31c・31d、〜、34c・3
4dは、帯状板31、〜、34をこの長手方向に対して
スライド移動自在に支持すると共に、この長手方向に直
交する方向への移動を規制している。この帯状板31、
〜、34は、ニッケル・鉄の合金材料で形成することも
でき、この合金で形成した場合にはガラス基板100の
熱膨張係数により近づけることができることとなる。
Each of the strip-shaped plates 31, 34 is formed so as to have a width corresponding to the sealing joint area, and is formed as a vapor deposition mask by combining four pieces as a rectangular frame. In the vicinity of both ends of the band-shaped plates 31, ..., 34, long holes 31a, 31b, ..., 34a, 34b are respectively formed. Protrusions 31c, 31d are formed in the respective long holes 31a, 31b, ..., 34a, 34b. , 34c and 34d are inserted. The projections 31c and 31d,.
Reference numeral 4d supports the strip-shaped plates 31, to 34 so as to be slidable with respect to the longitudinal direction, and regulates movement in a direction perpendicular to the longitudinal direction. This band-like plate 31,
, 34 can also be formed of a nickel-iron alloy material, and when formed of this alloy, the coefficient of thermal expansion of the glass substrate 100 can be made closer to that.

【0018】前記マスク受け板ばね41a・41b・4
1c、〜、44a・44b・44cは、前記ガラス基板
100が撓む最大幅(変形の最大幅)を全部又は一部を
吸収する弾性力を有する構成である。例えば、42イン
チのPDPに用いられるガラス基板100は、長手方向
の端部から約30cmの位置を基板保持部21、〜、2
4の4箇所で保持した場合には、その最大撓み幅が約3
mmとなり、この撓み幅の3mmを吸収できるマスク受
け板ばね41a・41b・41c、〜、44a・44b
・44cの弾性力が必要となる。
The mask receiving leaf springs 41a, 41b, 4
1c,..., 44a, 44b, and 44c have an elastic force that absorbs all or a part of the maximum width (the maximum width of deformation) of the glass substrate 100. For example, the glass substrate 100 used for a 42-inch PDP has a substrate holder 21,.
4, the maximum deflection width is about 3
mm, and the mask receiving leaf springs 41a, 41b, 41c,..., 44a, 44b capable of absorbing the bending width of 3 mm.
-An elastic force of 44c is required.

【0019】次に、前記構成に基づく本実施形態に係る
ガラス基板用蒸着装置によりPDPのガラス基板に保護
膜を蒸着する動作について説明する。まず、基板支持枠
1の取付開口部10内に、予め複数の電極とそれらを覆
う誘電体層が形成されたガラス基板100を収納して基
板保持部21、〜、24上に載置する。このガラス基板
100を基板保持部21、〜、24に載置した状態で、
蒸発源(図示を省略)の加熱により酸化マグネシウム
(MgO)を蒸発させて蒸気流の酸化マグネシウムを発
生させる。この蒸気流の酸化マグネシウムを、ガラス基
板100上の電極を覆った誘電体層(図示を省略)の表
面上に結晶成長させて成膜が開始する。
Next, the operation of depositing a protective film on a glass substrate of a PDP by the glass substrate deposition apparatus according to the present embodiment based on the above configuration will be described. First, the glass substrate 100 on which a plurality of electrodes and a dielectric layer covering them are formed in advance is accommodated in the mounting opening 10 of the substrate support frame 1 and placed on the substrate holding units 21 to 24. In a state where the glass substrate 100 is placed on the substrate holders 21 to 24,
Magnesium oxide (MgO) is evaporated by heating an evaporation source (not shown) to generate a vapor stream of magnesium oxide. The vaporized magnesium oxide is crystal-grown on the surface of a dielectric layer (not shown) covering the electrodes on the glass substrate 100, and film formation is started.

【0020】この成膜開始後において、蒸発源により発
生した熱がガラス基板100に熱応力として加えられ、
この熱応力によりガラス基板100に撓みが生じる。こ
のガラス基板100の撓みにより図2中に示すように破
線で示す当初の形状から実線で示す形状に変形すること
となる。このガラス基板100の変形により帯状板3
1、〜、34に図2中に示す矢印A方向に押圧力が加え
られる。この押圧力により帯状板31、〜、34が略弓
形状に変形し、この変形に伴って両端近傍の長孔31a
・31b、〜、34a・34bが突片31c・31d、
〜、34c・34dに規制されつつスライド移動する。
この突片31c・31d、〜、34c・34dの規制に
より、図3(A)に示すように帯状板31、〜、34は
この長手方向(図示矢印B又はC方向)及びこの長手方
向の下方へのみ移動し、これ以外の方向(図示矢印X方
向)へ移動することがない。このように帯状板31、
〜、34を長手方向及びこの下方へのみ移動させること
により、ガラス基板100のシール接合領域(非蒸着領
域)から位置ずれすることなく常に正確にマスキング動
作が実行できる。
After the start of the film formation, heat generated by the evaporation source is applied to the glass substrate 100 as thermal stress,
This thermal stress causes the glass substrate 100 to bend. Due to the bending of the glass substrate 100, the glass substrate 100 is deformed from an initial shape shown by a broken line to a shape shown by a solid line as shown in FIG. The deformation of the glass substrate 100 causes the belt-like plate 3
A pressing force is applied to 1, to 34 in the direction of arrow A shown in FIG. The pressing force deforms the band-shaped plates 31, to 34 into a substantially arcuate shape.
31b, ..., 34a and 34b are protruding pieces 31c and 31d,
, Slides while being restricted by 34c and 34d.
Due to the regulation of the protruding pieces 31c and 31d,..., And 34c and 34d, as shown in FIG. 3A, the belt-like plates 31,. And does not move in any other direction (the direction indicated by the arrow X in the figure). Thus, the strip-shaped plate 31,
By moving..., 34 only in the longitudinal direction and below this, the masking operation can always be performed accurately without displacement from the seal bonding area (non-deposition area) of the glass substrate 100.

【0021】前記帯状板31、〜、34が略弓形状の下
方へ屈曲変化すると、これを下方から支持するマスク受
け板ばね41a・41b・41c、〜、44a・44b
・44cが図2中に示す矢印A方向へ押し下げられ、図
3(B)に破線で示す帯状板31(32、〜、34)及
びマスク受け板ばね41b(41a・42b、〜、44
d)から実線で示す位置まで変位する。このようにガラ
ス基板100の熱変形に伴って帯状板31、〜、34及
びこれを支持するマスク受け板ばね41a・41b・4
1c、〜、44a・44b・44cが変位することか
ら、ガラス基板100に帯状板31、〜、34からなる
蒸着マスクが押圧接触してもガラス基板100に固定的
な応力が加えられることがなくなり、ガラス基板100
の割れ、破損を未然に防止できる。
When the belt-like plates 31, 34 are bent downwardly in a substantially arcuate shape, the mask receiving leaf springs 41a, 41b, 41c, 44a, 44b for supporting them from below.
44c is pushed down in the direction of arrow A shown in FIG. 2, and the band-shaped plate 31 (32,..., 34) and the mask receiving plate spring 41b (41a, 42b,.
Displaced from d) to the position shown by the solid line. As described above, the strip-shaped plates 31 to 34 and the mask receiving plate springs 41a, 41b, and 4 supporting the strip-shaped plates 31 to 34 in accordance with the thermal deformation of the glass substrate 100.
Since 1c,..., 44a, 44b, 44c are displaced, fixed stress is not applied to the glass substrate 100 even when the vapor deposition mask formed of the strip-shaped plates 31,. , Glass substrate 100
Cracks and breakage can be prevented.

【0022】また、前記帯状板31、〜、34が略弓形
状に屈曲変化しても、先端が球形状に形成された支持片
21a、〜、24aでガラス基板100を当接支持する
ようにしているので、図3(C)に示すようにガラス基
板100の蒸着面に対して垂直な角度で支持片21a、
〜、24aが当接しているのでより安定且つ確実な支持
ができる。
Further, even if the belt-shaped plates 31, 34 are bent into a substantially arc shape, the glass substrate 100 is abutted and supported by the supporting pieces 21a, 24a, 24a each having a spherical tip. Therefore, as shown in FIG. 3C, the support pieces 21a,
And 24a are in contact, so that more stable and reliable support can be achieved.

【0023】このように4枚の帯状板31、〜、34を
井桁状に組合せて蒸着マスクを形成しているので、図4
(A)に示すように前記ガラス基板100のシール接合
領域101のみを非蒸着領域としてマスクできる。従っ
て、このシール接合領域101の内側の表示面に対応し
た表示領域102に酸化マグネシウムの保護層が成膜で
きると共に、前記シール接合領域101の外周辺部10
3も酸化マグネシウムを成膜できることとなる。なお、
外周辺部の特に電極端子領域に成膜された酸化マグネシ
ウムは、この後除去する必要がある。このように前記シ
ール接合領域101の内外(表示領域102及び外周辺
部103)を同時に蒸着することによりガラス基板10
0の温度分布をより均一にして割れ、破損を極力防止で
きる。
As described above, since the four strip-shaped plates 31,..., 34 are combined in a grid pattern to form a vapor deposition mask, FIG.
As shown in (A), only the seal bonding region 101 of the glass substrate 100 can be masked as a non-deposition region. Accordingly, a protective layer of magnesium oxide can be formed on the display region 102 corresponding to the display surface inside the seal bonding region 101, and the outer peripheral portion 10 of the seal bonding region 101 can be formed.
3 can also form a magnesium oxide film. In addition,
Magnesium oxide deposited on the outer peripheral part, especially on the electrode terminal area, needs to be removed thereafter. As described above, the inside and outside of the seal bonding region 101 (the display region 102 and the outer peripheral portion 103) are simultaneously vapor-deposited so that the glass substrate 10
By making the temperature distribution of 0 more uniform, cracking and breakage can be prevented as much as possible.

【0024】なお、前記実施形態においては4枚の帯状
板31、〜、34を井桁状に組合せる構成としたが、5
枚の帯状板で図4(B)に示すようにシール接合領域1
01の外に試験端子領域104をマスクして形成する構
成とすることもできる。この試験用端子領域104は試
験工程が終了した後切断される。
In the above-described embodiment, the four band-shaped plates 31,...
As shown in FIG. 4B, the seal bonding area 1
Alternatively, the test terminal area 104 may be formed by masking the test terminal area 104 in addition to the area 01. The test terminal area 104 is cut after the test process is completed.

【0025】(本発明の第2実施の形態)図5は第2の
実施形態に係るガラス基板用蒸着装置の断面図及び帯状
板の支持構造詳細図である。同図において本実施形態に
係るガラス基板用蒸着装置は、前記図1に記載の蒸着装
置と同様に基板支持枠1と、基板保持部21、〜、24
と、帯状板31、〜、34と、マスク受け板ばね41a
・41b・41c、〜、44a・44b・44cとを備
え、この構成に加え、この帯状板31、〜、34両端部
にコイルばね51a・51b、〜、54a・54bを接
続し、この帯状板31、〜、34の両端近傍をガイド5
1c・51d、〜、54c・54dに挿通してスライド
自在に支持する構成である。このコイルばね51a・5
1b、〜、54a・54bは、一端を帯状板31、〜、
34の端部に形成される取付孔311a・311b、
〜、314a・314bに挿通され、他端を基板支持枠
1の取付ピン11a・11b、〜、14a・14bに係
合固定される構成である。
(Second Embodiment of the Present Invention) FIG. 5 is a sectional view of a glass substrate evaporation apparatus and a detailed view of a supporting structure of a strip-shaped plate according to a second embodiment. In the same figure, the vapor deposition apparatus for a glass substrate according to the present embodiment includes a substrate support frame 1 and substrate holding portions 21 to 24 similarly to the vapor deposition apparatus shown in FIG.
, Strip-shaped plates 31 to 34, and mask receiving leaf spring 41a
41b, 41c, ..., 44a, 44b, 44c, and in addition to this configuration, coil springs 51a, 51b, ..., 54a, 54b are connected to both ends of the strips 31, 34, 34, respectively. Guide 5 near both ends of 31, 34
1c, 51d,..., 54c, 54d. This coil spring 51a / 5
1b, ..., 54a and 54b, one end of the band-shaped plate 31, ...,
Mounting holes 311a and 311b formed at the end of
, 314a and 314b, and the other end is engaged and fixed to the mounting pins 11a and 11b of the substrate support frame 1.

【0026】前記構成に基づき本実施形態に係るガラス
基板用蒸着装置は、前記第1の実施形態と同様にガラス
基板100が蒸着成膜中に熱応力による撓みで形状変化
が生じ、この形状変化により帯状板31、〜、34に押
圧接触したとしても、前記コイルばね51a・51b、
〜、54a・54bが伸延してこの押圧接触による応力
を吸収できる。このコイルばね51a・51b、〜、5
4a・54bの伸延に伴って帯状板31、〜、34が長
手方向(図示矢印D方向)にスライド移動することとな
るが、この帯状板31、〜、34のスライド移動を矢印
D方向にのみガイド51c・51d、〜、54c・54
dが規制して長手方向に直交するX方向への揺れ、ずれ
を防止している。
Based on the above configuration, the glass substrate deposition apparatus according to the present embodiment, as in the first embodiment, undergoes a shape change due to bending due to thermal stress during deposition of the glass substrate 100, and this shape change occurs. Even if the coil springs 51a, 51b are pressed into contact with the band-shaped plates 31,
, 54a and 54b extend to absorb the stress caused by this pressing contact. These coil springs 51a and 51b,.
The strips 31 to 34 are slid in the longitudinal direction (the direction of arrow D in the drawing) with the extension of 4a and 54b, but the sliding movement of the strips 31 to 34 is limited to the direction of arrow D only. Guides 51c / 51d, ..., 54c / 54
d restricts the swing and displacement in the X direction perpendicular to the longitudinal direction.

【0027】このように、ガラス基板100の変形若し
くは帯状板31、〜、34自体の熱膨張に伴う帯状板3
1、〜、34からの応力をコイルばね51a・51b、
〜、54a・54bで吸収することにより、ガラス基板
100に帯状板31、〜、34からの応力が加えられな
くなり、ガラス基板100の割れ、破損を防止できる。
As described above, the band-shaped plate 3 accompanying the deformation of the glass substrate 100 or the thermal expansion of the band-shaped plates 31 to 34 themselves.
The stresses from 1, 34 are applied to the coil springs 51a and 51b,
By absorbing the light from the strips 54a and 54b, the stress from the strips 31 to 34 is not applied to the glass substrate 100, so that the glass substrate 100 can be prevented from being broken or damaged.

【0028】前記実施形態においては帯状板31、〜、
34をスライド移動させることによりガラス基板100
の変形等に基づく帯状板31、〜、34からの応力を吸
収する構成としたが、図6(A)、(B)に示すように
帯状板31、〜、34のガラス基板100に対向する面
に弾性又は可塑性を有する中間支持材6を配設する構成
とすることもできる。この中間支持部材6は、例えばポ
リイミド系樹脂又はシリコーン系樹脂等で形成すること
もできる。
In the above embodiment, the strip-shaped plates 31,.
34, the glass substrate 100 is slid.
6A, the stress from the band-shaped plates 31 to 34 is absorbed. However, as shown in FIGS. 6A and 6B, the structure is opposed to the glass substrate 100 of the band-shaped plates 31 to 34. A configuration in which an intermediate support member 6 having elasticity or plasticity is provided on the surface can also be adopted. The intermediate support member 6 can be formed of, for example, a polyimide resin or a silicone resin.

【0029】このように帯状板31、〜、34に中間支
持材6を配設することにより、ガラス基板100が蒸着
成膜中に図6(B)に示す矢印A方向へ変形して帯状板
31、〜、34側に押圧力が生じたとしても中間支持材
6が弾性変形又は可塑性変形することにより、ガラス基
板100の変形に伴う押圧力を吸収できる。この押圧力
の吸収により帯状板31、〜、34からの応力がガラス
基板100側へ加えられなくなり、ガラス基板100の
割れ、破損を未然に防止できる。
By arranging the intermediate supporting members 6 on the strips 31 to 34 as described above, the glass substrate 100 is deformed in the direction of arrow A shown in FIG. Even if a pressing force is generated on the sides 31 to 34, the pressing force accompanying the deformation of the glass substrate 100 can be absorbed by the intermediate support member 6 being elastically or plastically deformed. Due to the absorption of the pressing force, the stress from the strip-shaped plates 31 to 34 is not applied to the glass substrate 100 side, so that the glass substrate 100 can be prevented from being cracked or damaged.

【0030】なお、前記各実施形態においてはPDPの
保護膜を酸化マグネシウムの薄膜蒸着により形成した
が、他の材料により保護膜を蒸着して形成することもで
き、また保護膜以外に透明電極用のITO膜等を蒸着し
て形成することもできる。
In each of the above embodiments, the PDP protective film is formed by depositing a thin film of magnesium oxide. However, the protective film may be formed by depositing a protective film with another material. Can be formed by vapor deposition of an ITO film or the like.

【0031】また、前記実施形態においてはPDPを対
象として説明したが、他のLCD(Liquid Crystal Dis
play)、ELディスプレイ等の平面表示パネルに用いら
れるガラス基板に薄膜を蒸着する場合にも適用すること
ができる。
Although the above embodiment has been described with reference to a PDP, other LCDs (Liquid Crystal Dispersers) may be used.
play), and can also be applied to the case where a thin film is deposited on a glass substrate used for a flat display panel such as an EL display.

【0032】[0032]

【発明の効果】以上のように本発明においては、可撓性
を有する帯状板を個別独立に支持して組合せることによ
り蒸着マスクを形成していることから、ガラス基板に撓
みが生じても、この撓みによる変形に対応して帯状板も
撓むこととなり、この帯状板からガラス基板に対して応
力が加えられなくなり、ガラス基板の破損を防止できる
という効果を奏する。
As described above, in the present invention, since the vapor deposition mask is formed by individually supporting and combining flexible belt-shaped plates, even if the glass substrate is bent. In addition, the belt-like plate also bends in response to the deformation due to this bending, so that no stress is applied to the glass substrate from this belt-like plate, and the effect of preventing the glass substrate from being damaged can be obtained.

【0033】また、本発明に係るガラス基板用蒸着装置
は必要に応じて、枠状のシール接合領域を組合された帯
状板でマスクするようにしているので、シール接合領域
の内側の表示領域の外周領域に薄膜を蒸着できることと
なり、ガラス基板の温度分布をより均一にしてガラス基
板の割れ、破損を極力防止できるという効果を有する。
Further, the vapor deposition apparatus for a glass substrate according to the present invention, if necessary, masks the frame-shaped seal joint area with the combined strip-shaped plate, so that the display area inside the seal joint area can be masked. Since the thin film can be deposited on the outer peripheral region, the temperature distribution of the glass substrate can be made more uniform, and the glass substrate can be prevented from being broken or damaged as much as possible.

【0034】また、本発明においては、帯状板を移動自
在に支持しているので、ガラス基板又は帯状板自体の熱
膨張による変形をを吸収して、帯状板からガラス基板に
対して応力が加えられなくなり、ガラス基板の破損を防
止できるという効果を有する。また、本発明において
は、帯状板に対する押圧力及び帯状板自体の変形を長孔
による支持又は弾性体による支持で吸収できることとな
り、ガラス基板に対する応力をより減衰させてガラス基
板の破損を防止できるという効果を有する。
In the present invention, since the strip is movably supported, it absorbs the deformation of the glass substrate or the strip itself due to thermal expansion, and applies stress from the strip to the glass substrate. And the glass substrate can be prevented from being damaged. Further, in the present invention, the pressing force against the band-shaped plate and the deformation of the band-shaped plate itself can be absorbed by the support by the elongated holes or the support by the elastic body, and the stress on the glass substrate can be further attenuated to prevent the breakage of the glass substrate. Has an effect.

【図面の簡単な説明】[Brief description of the drawings]

【図1】(A)は本発明の第1の実施形態に係るガラス
基板用蒸着装置の下側から見た平面図である。(B)は
同図(A)におけるI−I線の断面図である。
FIG. 1A is a plan view of a glass substrate evaporation apparatus according to a first embodiment of the present invention, as viewed from below. FIG. 2B is a cross-sectional view taken along line II in FIG.

【図2】図1に記載のガラス基板用蒸着装置を下側から
見た平面説明図である。
FIG. 2 is an explanatory plan view of the glass substrate deposition apparatus shown in FIG. 1 as viewed from below.

【図3】(A)は図2おける帯状板の端部詳細図であ
る。(B)は図2おけるII−II線断面図である。(C)
は図2おける基板保持部の詳細図である。
FIG. 3A is a detailed view of an end portion of the belt-like plate in FIG. 2; (B) is a sectional view taken along the line II-II in FIG. 2. (C)
FIG. 3 is a detailed view of the substrate holding unit in FIG. 2.

【図4】(A)は図1に記載のガラス基板用蒸着装置に
より保護膜を形成したガラス基板の平面図である。
(B)は他の実施形態に係るガラス基板用蒸着装置によ
り保護膜を形成したガラス基板の平面図である。
FIG. 4A is a plan view of a glass substrate on which a protective film is formed by the glass substrate vapor deposition apparatus shown in FIG.
(B) is a plan view of a glass substrate on which a protective film is formed by a glass substrate evaporation apparatus according to another embodiment.

【図5】(A)は本発明の第2の実施形態に係るガラス
基板用蒸着装置の断面図である。(B)は同図(A)に
おける帯状板の端部支持構造の詳細図である。
FIG. 5A is a cross-sectional view of a glass substrate vapor deposition apparatus according to a second embodiment of the present invention. (B) is a detailed view of the end support structure of the band-shaped plate in FIG.

【図6】(A)は本発明の第2の実施形態に係るガラス
基板用蒸着装置に中間支持部材を配設した断面図であ
る。(B)は同図(A)に記載のガラス基板が撓んで中
間支持部材で支持した状態の断面図である。
FIG. 6A is a cross-sectional view in which an intermediate support member is provided in a glass substrate evaporation apparatus according to a second embodiment of the present invention. FIG. 2B is a cross-sectional view illustrating a state in which the glass substrate illustrated in FIG. 1A is bent and supported by an intermediate support member.

【図7】(A)は従来のガラス基板用蒸着装置における
蒸着マスクの斜視図である。(B)は従来のガラス基板
用蒸着装置における蒸着マスクの蒸着説明図である。
FIG. 7A is a perspective view of a deposition mask in a conventional glass substrate deposition apparatus. (B) is an explanatory view of vapor deposition of a vapor deposition mask in a conventional glass substrate vapor deposition apparatus.

【符号の説明】[Explanation of symbols]

10 取付開口部 11a・11b、〜、14a・14b 取付ピン 21、〜、24 基板保持部 21a、〜、24a 支持片 31、〜、34 帯状板 31a・31b、〜、34a・34b 長孔 31c・31d、〜、34c・34d 突片 41a・41b・41c、〜、44a・44b・44c
マスク受け板ばね 51a・51b、〜、54a・54b コイルばね 51c・51d、〜、54c・54d ガイド 80 蒸着マスク 81 蒸着窓 82 凹部 83 基板固定部 84 蒸発源 84a 蒸気 85 間隙 100 ガラス基板 102 表示領域 103 外周辺部 104 試験端子領域 311a・311b、〜、314a・314b 取付孔
Reference Signs List 10 mounting openings 11a, 11b,-, 14a, 14b mounting pins 21,-, 24 substrate holding parts 21a,-, 24a support pieces 31,-, 34 strip-shaped plates 31a, 31b,-, 34a, 34b long holes 31c- 31d, ~, 34c, 34d Projection 41a, 41b, 41c, ~, 44a, 44b, 44c
Mask receiving plate springs 51a / 51b, ..., 54a / 54b Coil springs 51c / 51d, ..., 54c / 54d Guide 80 Evaporation mask 81 Evaporation window 82 Concave part 83 Substrate fixing part 84 Evaporation source 84a Vapor 85 Gap 100 Glass substrate 102 Display area 103 outer peripheral portion 104 test terminal area 311a / 311b, to 314a / 314b mounting hole

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 ガラス基板の所定領域を蒸着マスクによ
り蒸着エリアとして規定し、当該蒸着エリアに対して薄
膜を蒸着するガラス基板用蒸着装置において、 前記蒸着マスクが、可撓性を有する帯状板を少なくとも
4枚枠状に組合せてなり、当該各帯状板を個別に独立し
て支持して形成することを特徴とするガラス基板用蒸着
装置。
1. A deposition apparatus for a glass substrate, wherein a predetermined area of a glass substrate is defined as a deposition area by a deposition mask, and a thin film is deposited on the deposition area. A vapor deposition apparatus for a glass substrate, wherein at least four frames are combined to form and support each of the strips individually and independently.
【請求項2】 前記請求項1に記載のガラス基板用蒸着
装置において、 前記枠状のマスクは、前記ガラス基板の中央部及び周辺
部の各領域に同時に蒸着膜を形成するように配置される
ことを特徴とするガラス基板用蒸着装置。
2. The deposition apparatus for a glass substrate according to claim 1, wherein the frame-shaped mask is disposed so as to simultaneously form a deposition film in each of a central portion and a peripheral portion of the glass substrate. An evaporation apparatus for a glass substrate, comprising:
【請求項3】 前記請求項1又は2に記載のガラス基板
用蒸着装置において、 前記ガラス基板又は帯状板が熱膨張により形状変化した
場合に、当該形状変化に伴って前記帯状板が移動自在に
支持されることを特徴とするガラス基板用蒸着装置。
3. The glass substrate deposition apparatus according to claim 1, wherein, when the glass substrate or the band-shaped plate changes shape due to thermal expansion, the band-shaped plate is movable along with the shape change. An evaporation apparatus for a glass substrate, which is supported.
【請求項4】 前記請求項1ないし3のいづれかに記載
のガラス基板用蒸着装置において、 前記帯状板の一端又は両端を長孔又は弾性体で支持され
ることを特徴とするガラス基板用蒸着装置。
4. The glass substrate vapor deposition apparatus according to claim 1, wherein one or both ends of the strip-shaped plate are supported by a long hole or an elastic body. .
【請求項5】 前記請求項1ないし4のいづれかに記載
のガラス基板用蒸着装置において、 前記ガラス基板を保持する保持部材の先端部が、球形状
を有し且つ断熱性及び可塑性を有する材料により形成さ
れていることを特徴とするガラス基板用蒸着装置。
5. The vapor deposition apparatus for a glass substrate according to claim 1, wherein a tip of a holding member for holding the glass substrate has a spherical shape and is made of a material having heat insulation and plasticity. An evaporation apparatus for a glass substrate, which is formed.
【請求項6】 前記請求項1ないし5のいづれか記載の
ガラス基板用蒸着装置において、 前記帯板状のガラス基板と対向する板面に弾性又は可塑
性の材料膜を形成してなることを特徴とするガラス基板
用蒸着装置。
6. The vapor deposition apparatus for a glass substrate according to claim 1, wherein an elastic or plastic material film is formed on a plate surface facing the band-shaped glass substrate. Glass substrate deposition equipment.
【請求項7】 プラズマディスプレイパネルの酸化マグ
ネシウムよりなる保護膜を蒸着法で形成するプラズマデ
ィスプレイパネルの保護膜蒸着方法において、 複数の電極とそれを覆う誘電体層が形成されたガラス基
板の周辺部における枠状のシール接合領域だけを遮蔽す
る枠状の蒸着マスクを配置し、当該シール接合領域の内
外に形成されている前記誘電体層の表面に当該酸化マグ
ネシウム膜を所定の膜厚で蒸着することを特徴とするプ
ラズマディスプレイパネルの保護膜蒸着方法。
7. A protective film deposition method for a plasma display panel, wherein a protective film made of magnesium oxide for a plasma display panel is formed by a vapor deposition method, wherein a peripheral portion of a glass substrate on which a plurality of electrodes and a dielectric layer covering the electrodes are formed. A frame-shaped vapor deposition mask for shielding only the frame-shaped seal bonding area is disposed, and the magnesium oxide film is vapor-deposited to a predetermined thickness on the surface of the dielectric layer formed inside and outside the seal bonding area. A method for depositing a protective film on a plasma display panel.
JP22390197A 1997-08-20 1997-08-20 Glass substrate deposition equipment Expired - Fee Related JP3547033B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22390197A JP3547033B2 (en) 1997-08-20 1997-08-20 Glass substrate deposition equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22390197A JP3547033B2 (en) 1997-08-20 1997-08-20 Glass substrate deposition equipment

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2004064415A Division JP4254925B2 (en) 2004-03-08 2004-03-08 Method for forming protective film of plasma display panel

Publications (2)

Publication Number Publication Date
JPH1161379A true JPH1161379A (en) 1999-03-05
JP3547033B2 JP3547033B2 (en) 2004-07-28

Family

ID=16805492

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Link
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Publication number Priority date Publication date Assignee Title
JP2003017258A (en) * 2001-06-29 2003-01-17 Sanyo Electric Co Ltd Manufacturing method of electroluminescent display
KR100592917B1 (en) 2004-09-25 2006-06-26 두산디앤디 주식회사 Organic material depositing apparatus for substrate deflects prevention means
JP2008101254A (en) * 2006-10-20 2008-05-01 Mitsubishi Heavy Ind Ltd Vapor deposition apparatus and vapor deposition method
JP2008277614A (en) * 2007-05-01 2008-11-13 Ihi Corp Substrate carrier
JP2008277478A (en) * 2007-04-27 2008-11-13 Fujifilm Corp Board clamp mechanism and drawing system
JP2010262814A (en) * 2009-05-01 2010-11-18 Nippon Hoso Kyokai <Nhk> Method for manufacturing plasma display panel and substrate sealing device
WO2021098336A1 (en) * 2019-11-21 2021-05-27 昆山国显光电有限公司 Mask plate and evaporation system

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003017258A (en) * 2001-06-29 2003-01-17 Sanyo Electric Co Ltd Manufacturing method of electroluminescent display
JP4707271B2 (en) * 2001-06-29 2011-06-22 三洋電機株式会社 Method for manufacturing electroluminescence element
KR100592917B1 (en) 2004-09-25 2006-06-26 두산디앤디 주식회사 Organic material depositing apparatus for substrate deflects prevention means
JP2008101254A (en) * 2006-10-20 2008-05-01 Mitsubishi Heavy Ind Ltd Vapor deposition apparatus and vapor deposition method
JP2008277478A (en) * 2007-04-27 2008-11-13 Fujifilm Corp Board clamp mechanism and drawing system
JP2008277614A (en) * 2007-05-01 2008-11-13 Ihi Corp Substrate carrier
JP2010262814A (en) * 2009-05-01 2010-11-18 Nippon Hoso Kyokai <Nhk> Method for manufacturing plasma display panel and substrate sealing device
WO2021098336A1 (en) * 2019-11-21 2021-05-27 昆山国显光电有限公司 Mask plate and evaporation system

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