JPH1158230A - Dressing device of grinding tool - Google Patents

Dressing device of grinding tool

Info

Publication number
JPH1158230A
JPH1158230A JP22158597A JP22158597A JPH1158230A JP H1158230 A JPH1158230 A JP H1158230A JP 22158597 A JP22158597 A JP 22158597A JP 22158597 A JP22158597 A JP 22158597A JP H1158230 A JPH1158230 A JP H1158230A
Authority
JP
Japan
Prior art keywords
electrode
grinding tool
positive electrode
dressing
abrasive grains
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22158597A
Other languages
Japanese (ja)
Inventor
Takuya Senba
卓弥 仙波
Makoto Sato
眞 佐藤
Koji Yoshida
幸司 吉田
Nobuyuki Tsukijihara
信幸 築地原
Akiyoshi Wakizaka
聡良 脇坂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Makino Milling Machine Co Ltd
Original Assignee
Makino Milling Machine Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Makino Milling Machine Co Ltd filed Critical Makino Milling Machine Co Ltd
Priority to JP22158597A priority Critical patent/JPH1158230A/en
Publication of JPH1158230A publication Critical patent/JPH1158230A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To dress a hemispherical tool by making it come into contact with a gel coating inclusive of abrasive grains formed in a formed positive electrode, as relatively rotating a grinding tool and this formed electrode. SOLUTION: A formed negative electrode 26 is opposedly installed in a recess 20a of a positive electrode hold-down member 20 at an opposite minute interval δto a formed electrode 18. A desired d.c. voltage or current is impressed to a gap between the formed electrode 18 and the formed electrode 26. When an electrode field is formed in a grinding fluid in space between the electrode 18 and the electrode 26, a surface of the formed electrode 18 attracts abrasive grains by an electrophoretic phenomenon. Therefore, the abrasive grains are hydrophobicly adsorbed on a surface of the electrode 18, forming a gel coating being high in grain density. In this state intact, a ball grinding wheel 30 is dressed by making it come into contact with the gel coating formed on the surface of the electrode 18, as rotating this ball grinding wheel 30 and the electrode 18.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は研削工具のドレッシ
ング装置に関し、特に半球状の研削工具を精度よくドレ
ッシングするドレッシング装置に関する。
The present invention relates to a dressing apparatus for a grinding tool, and more particularly to a dressing apparatus for dressing a hemispherical grinding tool with high accuracy.

【0002】[0002]

【従来の技術】変位切り込み方式の研削加工を行うこと
によって金型の自由曲面を鏡面仕上するために、半球状
に成形した極微粒のダイヤモンド砥粒を含む砥石または
研削工具が用いられている。砥石は、研削加工の進捗に
より、砥石表面の砥粒間にワーク表面から除去された微
粒の切粉が目詰まりするとともに、砥石の砥粒および結
合材(マトリックス)が漸次除去され変形する。この場
合、高精度な加工面を創成するためには、砥石を精度よ
くツルーイング(成形)およびドレッシング(目立て)
する必要がある。
2. Description of the Related Art In order to mirror-finish a free-form surface of a mold by performing a displacement cutting method, a grindstone or a grinding tool containing ultrafine diamond abrasive grains formed into a hemisphere has been used. The grindstone is deformed by the progress of the grinding process, in which fine chips removed from the work surface are clogged between the abrasive grains on the grindstone surface, and the abrasive grains and the binder (matrix) of the grindstone are gradually removed. In this case, in order to create a high-precision machined surface, the grinding stone must be accurately truing (forming) and dressing (sharpening).
There is a need to.

【0003】精密な表面研磨法として電気泳動現象を利
用した研磨方法は既に公知となっている。例えば、特公
昭59−46739号公報には電気泳動によりワーク表
面を研削する方法が開示されている。この方法では、遊
離砥粒を分散させた懸濁液中において、ワークとポリッ
シャを対向させた状態で両者間に電圧を印加しながら相
対回転運動させ、電気泳動現象を利用してワーク表面を
研磨する。更に、特開平8−257912号公報には、
遊離砥粒を分散させた懸濁液中において、ワークを研磨
すると同時に砥石の再生を行う電気泳動を利用したイン
プロセスドレッシング方法が開示されている。
As a precise surface polishing method, a polishing method utilizing the electrophoresis phenomenon has been already known. For example, Japanese Patent Publication No. 59-46739 discloses a method of grinding a work surface by electrophoresis. In this method, in a suspension in which free abrasive grains are dispersed, the workpiece and the polisher are opposed to each other, and are rotated relative to each other while applying a voltage between them. I do. Further, JP-A-8-257912 discloses that
An in-process dressing method using electrophoresis for regenerating a grindstone while simultaneously polishing a work in a suspension in which free abrasive grains are dispersed is disclosed.

【0004】[0004]

【発明が解決しようとする課題】既述したように、高精
度の研削加工では精度よくツルーイングおよびドレッシ
ングを行うことが不可欠である。然しながら、上記2つ
の公報に開示された方法では半球状の研削工具のツルー
イングとドレッシングを行なうことができない。本発明
は、電気泳動現象を利用して、研削工具、特に半球状の
砥石から成る研削工具を精度よくツルーイングとドレッ
シングが可能な装置を提供することを目的としている。
As described above, it is indispensable to perform truing and dressing with high precision in high-precision grinding. However, the methods disclosed in the above two publications cannot perform truing and dressing of a hemispherical grinding tool. An object of the present invention is to provide an apparatus capable of accurately truing and dressing a grinding tool, particularly a grinding tool made of a hemispherical grindstone, utilizing the electrophoresis phenomenon.

【0005】[0005]

【課題を解決するための手段】上記目的は、研削工具と
総形陽電極とを研磨液中で対応させて相対回転させなが
ら、総形陽電極と総形陰電極との間に所定の電圧または
電流を印加して、電気泳動現象により、総形陽電極に研
磨液中の遊離砥粒を吸着して研削工具をドレッシングす
ることにより達成される。
SUMMARY OF THE INVENTION The object of the present invention is to provide a grinding tool and a positive electrode having a predetermined voltage between the positive electrode and the negative electrode while rotating the grinding tool and the positive electrode correspondingly in the polishing liquid. Alternatively, it is achieved by dressing a grinding tool by applying a current and adsorbing free abrasive grains in the polishing liquid to the positive electrode by the electrophoresis phenomenon.

【0006】本発明は、研削工具のドレッシング装置に
おいて、研磨液を貯留した加工槽内に回転可能に支持さ
れた半球状の研削工具と、前記研削工具に対設され、前
記研削工具の回転軸線に平行な回転軸線回りに回転可能
に支持され、かつ前記研削工具に対応した形状の総形陽
電極と、前記総形陽電極に対して所定間隔をあけて対
設、固定された総形陰電極とを具備し、前記総形陽電極
と総形陰電極の間に電界を形成し、両者間に前記研磨液
中に分散された遊離砥粒の電気泳動現象を生じさせると
もに、前記研削工具と前記総形陽電極とを相対回転させ
て、前記研削工具のドレッシングを行う研削工具のドレ
ッシング装置を要旨とする。
According to the present invention, there is provided a dressing apparatus for a grinding tool, wherein a hemispherical grinding tool rotatably supported in a processing tank storing a polishing liquid, a rotating axis of the grinding tool provided opposite to the grinding tool. A positive electrode having a shape that is rotatably supported about a rotation axis parallel to the grinding tool, and that has a shape corresponding to the grinding tool; An electrode, forming an electric field between the positive electrode and the negative electrode, causing an electrophoretic phenomenon of free abrasive grains dispersed in the polishing liquid therebetween, and the grinding tool. A dressing apparatus for a grinding tool for performing relative dressing of the grinding tool and the general-purpose positive electrode to dress the grinding tool.

【0007】[0007]

【発明の実施の形態】図1を参照すると、本発明実施形
態による研削工具のドレッシング装置10は、基台12
の上面に中空円筒形状のフレーム14が設けられてお
り、該フレーム14に研磨液を貯留するための加工槽1
6が取り付けられている。加工槽16内には陽極固定部
材20が回転軸線Oを中心として回転自在にフレーム1
4に支持されている。陽極固定部材20はアクリルなど
の電気絶縁材料により凹部20aを有した概ね円筒形状
に形成されており、上端外周部に沿ってフランジ部20
bを備えている。陽極固定部材20のフランジ部20b
とフレーム14の間にはOリングなどのシール部材14
aが配設されており、フレーム14の内部に研磨液が侵
入することを防止している。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Referring to FIG. 1, a dressing apparatus 10 for a grinding tool according to an embodiment of the present invention includes
A hollow cylindrical frame 14 is provided on an upper surface of the processing tank 1, and a processing tank 1 for storing a polishing liquid in the frame 14 is provided.
6 is attached. An anode fixing member 20 is rotatable around a rotation axis O in the processing tank 16.
4 is supported. The anode fixing member 20 is formed of an electrically insulating material such as acrylic into a substantially cylindrical shape having a concave portion 20a.
b. Flange portion 20b of anode fixing member 20
A sealing member 14 such as an O-ring
a is provided to prevent the polishing liquid from entering the inside of the frame 14.

【0008】本実施形態において前記研磨液はイオン交
換水にカルボキシメチルセルロース(CMC)と、遊離
砥粒として酸化アルミナ砥粒を分散させた懸濁液とから
成る。遠心力により研磨液が飛散することを防止するた
め、および、粒径が比較的大きなアルミナ砥粒を研磨液
に分散させるために比較的粘度の高い研磨液とした。よ
り具体的には、CMC水溶液に重量比で約5%のアルミ
ナ砥粒を分散させ、粘度を45から50cPに維持し
た。アルミナ砥粒の粒径は1.5から6.7μmとし
た。研磨液を加工槽16内で循環させるために研磨液循
環装置24が設けられている。研磨液循環装置24はチ
ュービングポンプ24aを具備しており、該チュービン
グポンプ24aは管路24bを介して加工槽16の底部
から研磨液を吸い込んで、管路24cを介して加工槽1
6の上方部、詳細には、加工槽16内の陽極固定部材2
0の凹部20aの上方部に研磨液を循環させる。
In the present embodiment, the polishing liquid comprises carboxymethyl cellulose (CMC) in ion-exchanged water and a suspension in which alumina oxide abrasive grains are dispersed as free abrasive grains. A polishing liquid having a relatively high viscosity was used in order to prevent the polishing liquid from being scattered by centrifugal force and to disperse alumina abrasive grains having a relatively large particle diameter in the polishing liquid. More specifically, about 5% by weight of alumina abrasive grains were dispersed in the CMC aqueous solution, and the viscosity was maintained at 45 to 50 cP. The particle size of the alumina abrasive was 1.5 to 6.7 μm. A polishing liquid circulation device 24 is provided to circulate the polishing liquid in the processing tank 16. The polishing liquid circulation device 24 is provided with a tubing pump 24a. The tubing pump 24a sucks the polishing liquid from the bottom of the processing tank 16 through a pipe 24b, and the processing tank 1 through a pipe 24c.
6, specifically, the anode fixing member 2 in the processing tank 16.
The polishing liquid is circulated over the upper part of the recess 20a.

【0009】陽極固定部材20の凹部20a内には、総
形陽電極18が陽極固定部材20に対して回転軸線Oに
沿って同心状に固定されている。総形陽電極18は、例
えばステンレス鋼などの耐腐食性の金属材料により、ツ
ルーイング、ドレッシングを行う研削工具に対して総形
に形成される。すなわち、研削工具の半球状部と略等し
い半径の円弧を有した図示のような回転体形状に形成さ
れる。フレーム14の内部において基台12の上面に
は、陽極固定部材20を回転軸線Oを中心として回転駆
動するための駆動モータ22が固定されており、陽極固
定部材20は駆動モータ22の回転軸22aに取り付け
られている。駆動モータ22は、例えば1500rpm
で回転させることができる。こうして、総形陽電極18
は駆動モータ22により陽極固定部材20とともに回転
軸線Oを中心として回転駆動される。
In the recess 20a of the anode fixing member 20, a positive electrode 18 is fixed concentrically to the anode fixing member 20 along the rotation axis O. The positive electrode 18 is formed of a corrosion-resistant metal material such as stainless steel, for example, to a grinding tool that performs truing and dressing. That is, it is formed into a rotating body shape as shown in the figure having an arc having a radius substantially equal to the hemispherical portion of the grinding tool. A drive motor 22 for rotating and driving the anode fixing member 20 about the rotation axis O is fixed on the upper surface of the base 12 inside the frame 14, and the anode fixing member 20 is connected to a rotation shaft 22 a of the drive motor 22. Attached to. The drive motor 22 is, for example, 1500 rpm
Can be rotated. In this way, the total positive electrode 18
Is driven to rotate about the rotation axis O together with the anode fixing member 20 by the drive motor 22.

【0010】陽極固定部材20の凹部20a内には、更
に、総形陰電極26が、総形陽電極18に対微小間隙δ
をおいて対設されている。総形陰電極26は、例えばグ
ラファイトで成り、総形陽電極18に対して総形に形成
されている。微小間隙δを調節可能にドレッシング装置
10の図示しない固定部に固定されている。総形陽電極
18と総形陰電極26の間には、電源装置28により所
望の直流電圧または直流電流が印加される。総形陽電極
18と総形陰電極26の間において研磨液中に電界が形
成される。
In the recess 20 a of the anode fixing member 20, a negative electrode 26 is further formed with a small gap δ with respect to the positive electrode 18.
It is opposed. The general negative electrode 26 is made of, for example, graphite and is formed in a general shape with respect to the general positive electrode 18. The small gap δ is fixed to a fixed portion (not shown) of the dressing device 10 so as to be adjustable. A desired DC voltage or DC current is applied between the positive electrode 18 and the negative electrode 26 by the power supply 28. An electric field is formed in the polishing liquid between the positive electrode 18 and the negative electrode 26.

【0011】陽極固定部材20の凹部20a内には、更
に、ツルーイングまたはドレッシングすべき研削工具と
してボール砥石30が対設されている。ボール砥石30
は、総形陽電極18の回転軸線Oに平行な回転軸線O1
を中心として回転自在に主軸装置32の先端部に装着さ
れている。主軸装置32は回転軸線O1に沿う方向およ
び同回転軸線に対して垂直方向に移動可能に構成されて
おり、ボール砥石30の先端部を総形陽電極18に対し
て正確に位置決めできようになっている。ボール砥石3
0は極微粒レジンボンド砥石であり、平均粒径4から5
μmのダイヤモンド砥粒をメラミン樹脂にて結合し、円
柱と半球とを組み合わせた形状にて形成されている。ボ
ール砥石30は単に半球形状に形成してもよい。
In the recess 20a of the anode fixing member 20, a ball grindstone 30 is further provided as a grinding tool to be trued or dressed. Ball whetstone 30
Is a rotation axis O1 parallel to the rotation axis O of the shaped positive electrode 18.
Is attached to the front end of the spindle device 32 so as to be rotatable around the center. The spindle device 32 is configured to be movable in a direction along the rotation axis O1 and in a direction perpendicular to the rotation axis, so that the tip of the ball grindstone 30 can be accurately positioned with respect to the overall positive electrode 18. ing. Ball whetstone 3
0 is an extremely fine resin-bonded grindstone having an average particle size of 4 to 5
μm diamond abrasive grains are combined with a melamine resin and formed in a shape combining a cylinder and a hemisphere. The ball grindstone 30 may be simply formed in a hemispherical shape.

【0012】以下、本発明実施形態の作用を説明する。
一般的に、CMCを溶解させた水溶液にアルミナ砥粒を
分散させると、CMCの親水基が金属イオンを放出して
負に帯電し、疎水基には砥粒が吸着される。CMC溶液
に砥粒を分散させた懸濁液から成る研磨液に、総形陽電
極18と総形陰電極26の間に電圧を印加して両者間の
微小間隙に電場を形成すると、CMCに疎水吸着した砥
粒が、電気泳動現象により総形陽電極18の表面に吸引
される。そして、総形陽電極18の表面に吸引されたC
MCおよび砥粒が総形陽電極18の表面に疎水吸着し
て、図2に示すように砥粒濃度の高いゲル状の皮膜34
が形成される。
Hereinafter, the operation of the embodiment of the present invention will be described.
Generally, when alumina abrasive grains are dispersed in an aqueous solution in which CMC is dissolved, the hydrophilic groups of CMC release metal ions and become negatively charged, and the abrasive grains are adsorbed to the hydrophobic groups. When a voltage is applied between the positive electrode 18 and the negative electrode 26 to form an electric field in a minute gap between the positive electrode 18 and the negative electrode 26, a polishing liquid comprising a suspension in which abrasive grains are dispersed in a CMC solution is formed. The abrasive grains that have been hydrophobically adsorbed are attracted to the surface of the positive electrode 18 by the electrophoresis phenomenon. Then, C sucked on the surface of the
The MC and the abrasive grains are hydrophobically adsorbed on the surface of the positive electrode 18, and as shown in FIG.
Is formed.

【0013】この状態で、総形陽電極18およびボール
砥石30を回転させながら両者を互いに押接すると、総
形陽電極18の形状がボール砥石30に転写され、ボー
ル砥石30がツルーイング(成形)される。また、ボー
ル砥石30および総形陽電極18を回転させながら、ボ
ール砥石30を総形陽電極18の表面に形成されたゲル
状の皮膜34に接触させることによりボール砥石30が
ドレッシング(目立て)される。つまり、ボール砥石3
0を総形陽電極18の表面に接触するように押接するこ
とにより、ボール砥石30のダイヤモンド砥粒および結
合材としてのメラミン樹脂の両者が除去され、ボール砥
石30に総形陽電極18の形状が転写される。また、ボ
ール砥石30が総形陽電極18でなく、総形陽電極18
の表面に形成されたゲル状の皮膜34に接触するように
ボール砥石30を位置決めすることにより、ゲル状の皮
膜がポリッシャとして作用し、ボール砥石30のメラミ
ン樹脂のみが除去されボール砥石30がドレッシングさ
れる。
When the positive electrode 18 and the ball grindstone 30 are pressed against each other while rotating in this state, the shape of the positive electrode 18 is transferred to the ball grindstone 30 and the ball grindstone 30 is trued (formed). Is done. The ball grindstone 30 is dressed by bringing the ball grindstone 30 into contact with the gel-like film 34 formed on the surface of the molded positive electrode 18 while rotating the ball grindstone 30 and the shaped positive electrode 18. You. That is, ball grinding stone 3
0 is pressed into contact with the surface of the positive electrode 18 to remove both the diamond abrasive grains of the ball grindstone 30 and the melamine resin as a binder. Is transferred. Also, the ball grinding wheel 30 is not the general positive electrode 18 but the general positive electrode 18.
By positioning the ball grindstone 30 so as to come into contact with the gel-like film 34 formed on the surface of the ball, the gel-like film acts as a polisher, and only the melamine resin of the ball grindstone 30 is removed and the ball grindstone 30 is dressed. Is done.

【0014】実験によれば、1.5μmのアルミナ砥粒
を用いてボール砥石30を総形陽極18に15μm接触
させて印加電流を1Aとした場合で、約0.8μmの真
円度にボール砥石をツルーイングすることができた。ま
た、1.5μmのアルミナ砥粒を用いてボール砥石30
と総形陽電極18との間に5μmの隙間を設定して印加
電流を1Aとした場合、ボール砥石30から砥粒がほと
んど除去されておらず、良好なドレッシングがなされて
いることが観察された。なお、本ドレッシング装置は、
研削工具を主軸に装着して金型などを加工するマシニン
グセンタのテーブル上の加工の支障にならない場所に設
け、金型加工中に適宜ドレッシングやツルーイングがオ
ンマシンで行えるように構成しても良いし、ドレッシン
グ専用機として構成しても良い。
According to an experiment, when the ball grinding stone 30 is brought into contact with the shaped anode 18 by 15 μm using 1.5 μm alumina abrasive grains and the applied current is 1 A, the ball is rounded to a circularity of about 0.8 μm. The grinding stone could be trued. Also, a ball grinding stone 30 using 1.5 μm alumina abrasive grains is used.
When a gap of 5 μm is set between the electrode and the positive electrode 18 and the applied current is set to 1 A, it is observed that the abrasive grains are hardly removed from the ball grindstone 30 and that good dressing is performed. Was. In addition, this dressing device,
A grinding tool may be mounted on the table of a machining center that processes a die or the like by mounting it on the main shaft so as not to hinder processing, and dressing or truing may be performed on-machine as needed during die processing. Alternatively, it may be configured as a dressing-only machine.

【0015】[0015]

【発明の効果】本発明によれば、遊離砥粒を分散させた
研磨液に電界を形成して砥粒を電気泳動させることによ
り、総形陽電極の表面に砥粒を含むゲル状の皮膜を形成
し、この皮膜を用いて、半球状の研削工具と総形陽電極
とを相対回転させながら、研削工具を総形陽電極の表面
に接触させることにより研削工具のツルーイングを行
い、総形陽電極の表面に形成された皮膜にのみ接触させ
ることにより研削工具のドレッシングを行うことが可能
となる。よって、半球状の研削工具を精度よく成形及び
目立てすることができる。特にドレッシングは、研削工
具の砥粒の脱落を極力起こさず、ボンドのみを削るとい
ういわゆるソフトなドレッシングを行うことができる。
According to the present invention, a gel-like film containing abrasive grains is formed on the surface of the positive electrode by forming an electric field in the polishing liquid in which free abrasive grains are dispersed and electrophoresing the abrasive grains. Using the film, the grinding tool is brought into contact with the surface of the positive electrode while the hemispherical grinding tool and the positive electrode are rotated relative to each other. The dressing of the grinding tool can be performed by making contact only with the film formed on the surface of the positive electrode. Therefore, a hemispherical grinding tool can be accurately formed and sharpened. In particular, in the dressing, so-called soft dressing in which only the bond is removed without causing the abrasive grains of the grinding tool to fall off as much as possible can be performed.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明実施形態によるドレッシング装置の略断
面図である。
FIG. 1 is a schematic sectional view of a dressing device according to an embodiment of the present invention.

【図2】総形陽電極の部分拡大図であり、総形陽電極の
表面に形成される皮膜を示す図である。
FIG. 2 is a partially enlarged view of the shaped positive electrode, showing a film formed on the surface of the shaped positive electrode.

【符号の説明】[Explanation of symbols]

10…ドレッシング装置 12…基台 14…フレーム 16…加工槽 18…総形陽電極 24…研磨液循環装置 26…総形陰電極 28…電源装置 30…ボール砥石 DESCRIPTION OF SYMBOLS 10 ... Dressing apparatus 12 ... Base 14 ... Frame 16 ... Processing tank 18 ... Shape positive electrode 24 ... Abrasive circulating device 26 ... Shape negative electrode 28 ... Power supply device 30 ... Ball grindstone

───────────────────────────────────────────────────── フロントページの続き (72)発明者 築地原 信幸 福岡県北九州市小倉南区上貫1丁目3番8 号 (72)発明者 脇坂 聡良 福岡県福岡市東区和白東5丁目13番22号 村上ハイツ204号室 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Nobuyuki Tsukijihara 1-3-8 Kaneuki, Kokuraminami-ku, Kitakyushu-shi, Fukuoka Prefecture Room 22 Murakami Heights Room 204

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 研削工具のドレッシング装置において、 研磨液を貯留した加工槽内に回転可能に支持された半球
状の研削工具と、 前記研削工具に対設され、前記研削工具の回転軸線に平
行な回転軸線回りに回転可能に支持され、かつ前記研削
工具に対応した形状の総形陽電極と、 前記総形陽電極に対して所定間隔をあけて対設、固定さ
れた総形陰電極とを具備し、 前記総形陽電極と総形陰電極の間に電界を形成し、両者
間に前記研磨液中に分散された遊離砥粒の電気泳動現象
を生じさせるともに、前記研削工具と前記総形陽電極と
を相対回転させて、前記研削工具のドレッシングを行う
研削工具のドレッシング装置。
1. A dressing device for a grinding tool, comprising: a hemispherical grinding tool rotatably supported in a processing tank in which a polishing liquid is stored; a hemispherical grinding tool provided opposite to the grinding tool, and parallel to a rotation axis of the grinding tool. A positive electrode having a shape corresponding to the grinding tool and rotatably supported around a rotation axis, and a fixed negative electrode opposed to the general positive electrode at a predetermined interval and fixed. Forming an electric field between the positive electrode and the negative electrode, causing an electrophoretic phenomenon of free abrasive particles dispersed in the polishing liquid between the two, and the grinding tool and the A dressing device for a grinding tool for dressing the grinding tool by relatively rotating the positive electrode.
【請求項2】 前記ドレッシング装置が、更に、前記加
工槽内の研磨液を循環させるための研磨液循環装置を具
備する請求項1に記載のドレッシング装置。
2. The dressing apparatus according to claim 1, wherein the dressing apparatus further includes a polishing liquid circulation device for circulating a polishing liquid in the processing tank.
JP22158597A 1997-08-18 1997-08-18 Dressing device of grinding tool Pending JPH1158230A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22158597A JPH1158230A (en) 1997-08-18 1997-08-18 Dressing device of grinding tool

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22158597A JPH1158230A (en) 1997-08-18 1997-08-18 Dressing device of grinding tool

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2001222068A Division JP4141118B2 (en) 2001-07-23 2001-07-23 Grinding tool dressing equipment

Publications (1)

Publication Number Publication Date
JPH1158230A true JPH1158230A (en) 1999-03-02

Family

ID=16769060

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22158597A Pending JPH1158230A (en) 1997-08-18 1997-08-18 Dressing device of grinding tool

Country Status (1)

Country Link
JP (1) JPH1158230A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6736657B2 (en) 2000-02-24 2004-05-18 Takata-Petri Ag Device for transmitting electric current between two components of a steering device for motor vehicles

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6736657B2 (en) 2000-02-24 2004-05-18 Takata-Petri Ag Device for transmitting electric current between two components of a steering device for motor vehicles

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