JPH1154324A - Deposition source for forming soft magnetic thin film by vacuum deposition - Google Patents
Deposition source for forming soft magnetic thin film by vacuum depositionInfo
- Publication number
- JPH1154324A JPH1154324A JP22109397A JP22109397A JPH1154324A JP H1154324 A JPH1154324 A JP H1154324A JP 22109397 A JP22109397 A JP 22109397A JP 22109397 A JP22109397 A JP 22109397A JP H1154324 A JPH1154324 A JP H1154324A
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- iron
- gas
- alloy
- cobalt
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
- H01F10/16—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing cobalt
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Thin Magnetic Films (AREA)
- Physical Vapour Deposition (AREA)
- Magnetic Heads (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、高密度記録に対応
した磁気ヘッドのコアを製造する技術分野に属し、特
に、真空蒸着法により軟磁性体薄膜を形成するための蒸
着ソースに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention belongs to the technical field of manufacturing a core of a magnetic head corresponding to high-density recording, and more particularly to a deposition source for forming a soft magnetic thin film by a vacuum deposition method.
【0002】[0002]
【従来の技術】ハードディスク装置やフロッピーディス
ク装置などのコンピュータ用の磁気記録装置の分野で
は、より小型の装置でより大容量の記憶を実現すべく、
さまざまな角度から高密度記録に向けての際限のない技
術開発が行われている。この種の磁気記録装置に用いら
れている従来の代表的な磁気ヘッドコアは、電子ビーム
加熱式真空蒸着法により適宜な基板にニッケル・鉄合金
などの二元系の軟磁性体薄膜を形成したものであった。2. Description of the Related Art In the field of magnetic recording devices for computers such as hard disk devices and floppy disk devices, in order to realize larger capacity storage with smaller devices.
Endless technologies are being developed for high-density recording from various angles. A typical conventional magnetic head core used in this type of magnetic recording apparatus is a binary soft magnetic thin film such as a nickel-iron alloy formed on an appropriate substrate by an electron beam heating vacuum evaporation method. Met.
【0003】より高密度記録を実現するための磁気ヘッ
ドコア材料としては、従来のニッケル・鉄合金は飽和磁
束密度(10000ガウス以下)の面で不充分な材料と
なってきた。そのため、より飽和磁束密度の高いコバル
ト・鉄・ニッケル合金などの三元系の軟磁性体に研究の
目が向けられている。[0003] As a magnetic head core material for realizing higher density recording, a conventional nickel-iron alloy has become an insufficient material in terms of saturation magnetic flux density (10000 gauss or less). Therefore, attention has been focused on ternary soft magnetic materials having a higher saturation magnetic flux density, such as cobalt-iron-nickel alloys.
【0004】[0004]
【発明が解決しようとする課題】本発明者らも、飽和磁
束密度の高いコバルト・鉄・ニッケル合金(17000
ガウス程度になる)に注目し、この材料で高密度記録に
対応する磁気ヘッドコアを製造すべく研究開発を続けて
きた。まずは、ニッケル・鉄合金をコバルト・鉄・ニッ
ケル合金に置換し、従来のやり方と同様な電子ビーム加
熱式真空蒸着法により磁気ヘッドコア用の軟磁性体薄膜
を適宜な基板に形成し、その成膜状態を分析するととも
に、磁気ヘッドとしての特性を詳しく測定した。The present inventors have also proposed a cobalt-iron-nickel alloy (17000) having a high saturation magnetic flux density.
(It will be about Gaussian), and research and development have been continued to manufacture a magnetic head core corresponding to high density recording with this material. First, a nickel-iron alloy is replaced with a cobalt-iron-nickel alloy, and a soft magnetic thin film for a magnetic head core is formed on an appropriate substrate by an electron beam heating vacuum evaporation method similar to the conventional method, and the film is formed. The state was analyzed and the characteristics as a magnetic head were measured in detail.
【0005】その結果、従来のニッケル・鉄合金を蒸着
ソースとして薄膜を形成していた場合には、蒸着レート
が安定していて、均一な薄膜が形成できたが、蒸着ソー
スをコバルト・鉄・ニッケル合金に置換して行った場合
には、蒸着レートが変動し、均一な薄膜を形成できず、
そのため磁気ヘッドコアとして望ましい特性を実現でき
なかった。As a result, when a thin film was formed using a conventional nickel-iron alloy as a deposition source, a uniform thin film could be formed with a stable deposition rate. In the case of replacing with a nickel alloy, the deposition rate fluctuates and a uniform thin film cannot be formed.
Therefore, the desired characteristics as a magnetic head core could not be realized.
【0006】本発明は、上記した背景に鑑みてなされた
もので、その目的とするところは、上記した問題を解決
し、飽和磁束密度の高いコバルト・鉄・ニッケル合金の
均一な薄膜を電子ビーム加熱式真空蒸着法により安定に
形成し、高密度記録に適した磁気ヘッドコアを歩留りよ
く製造できるようにすることにある。SUMMARY OF THE INVENTION The present invention has been made in view of the above background, and an object of the present invention is to solve the above-mentioned problem and to form a uniform thin film of a cobalt-iron-nickel alloy having a high saturation magnetic flux density by an electron beam. An object of the present invention is to make it possible to manufacture a magnetic head core suitable for high-density recording with good yield by being formed stably by a heating type vacuum evaporation method.
【0007】[0007]
【課題を解決するための手段】そこで本発明者らは、コ
バルト・鉄・ニッケル合金を蒸着ソースとして電子ビー
ム加熱式真空蒸着法により薄膜を形成した場合に、なぜ
蒸着レートが変動してしまうのかをさまざまな観点から
分析した。その結果、蒸着レートの変動と蒸着ソースの
含有ガス濃度との関連性が強いことを究明した。The inventors of the present invention have determined why the deposition rate fluctuates when a thin film is formed by electron beam heating vacuum deposition using a cobalt-iron-nickel alloy as a deposition source. Was analyzed from various viewpoints. As a result, it has been found that there is a strong relationship between the variation of the deposition rate and the concentration of the gas contained in the deposition source.
【0008】コバルト・鉄・ニッケル合金の蒸着ソース
は、各金属素材を混合して真空中で溶解して合金化する
ことで製造する。その真空中での溶解プロセスで溶湯を
混合しながらガス抜き処理を行っている。このときの真
空度が良好でなかったり、ガス抜き処理が充分に行われ
ないと、でき上がった蒸着ソース(合金インゴット)の
含有ガス濃度が高くなる。なお、合金インゴットに含有
される主なガスは酸素や窒素である。[0008] A deposition source of a cobalt-iron-nickel alloy is manufactured by mixing and melting each metal material in a vacuum to form an alloy. The degassing process is performed while mixing the molten metal in the melting process in the vacuum. At this time, if the degree of vacuum is not good or if the degassing process is not sufficiently performed, the concentration of the gas contained in the formed deposition source (alloy ingot) becomes high. The main gases contained in the alloy ingot are oxygen and nitrogen.
【0009】そして、コバルト・鉄・ニッケル合金の蒸
着ソースにおける含有ガス濃度が0.005重量%を超
えると蒸着レートの変動が顕著になることが分った。反
対に、コバルト・鉄・ニッケル合金の蒸着ソースにおけ
る含有ガス濃度が0.005重量%以下に抑えられてい
ると、蒸着レートの変動は許容範囲内に収まり、充分に
均一な蒸着膜を安定に形成できることが分った。It has been found that when the concentration of the gas contained in the deposition source of the cobalt-iron-nickel alloy exceeds 0.005% by weight, the variation in the deposition rate becomes significant. Conversely, if the concentration of the gas contained in the deposition source of the cobalt-iron-nickel alloy is suppressed to 0.005% by weight or less, the variation in the deposition rate falls within the allowable range, and a sufficiently uniform deposited film is stably formed. It was found that it could be formed.
【0010】[0010]
【発明の実施の形態】本発明の蒸着ソースを製造する方
法の一例について説明する。コバルト・鉄・ニッケルの
各合金材料を所定の重量比で混合したものを白金ルツボ
に入れ、これを真空炉に収容して加熱し、前記金属材料
を溶解して混合する。このときの炉内の真空度は4×1
0-6Torr以上に保つ。これにより、合金材料内で微
量にガスが発生しても、真空雰囲気下であるため、ソー
ス表面に溜まって皮膜を形成することなく、雰囲気内に
抜け出る。また真空にするだけで充分な効果(ガス抜
き)が得られないときには、溶湯のガス抜き処理とし
て、HIP処理(合金材料に圧縮して内部のガスの追い
出し)を行う。こうすることで、でき上がった蒸着ソー
ス(コバルト・鉄・ニッケル合金のインゴット)の含有
ガス濃度を0.005重量%以下にすることができる。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An example of a method for manufacturing a deposition source according to the present invention will be described. A mixture of alloy materials of cobalt, iron and nickel at a predetermined weight ratio is put into a platinum crucible, which is placed in a vacuum furnace and heated to dissolve and mix the metal materials. The degree of vacuum in the furnace at this time was 4 × 1
Keep at 0 -6 Torr or more. As a result, even if a small amount of gas is generated in the alloy material, the gas escapes into the atmosphere without accumulating on the source surface and forming a film because the gas is in a vacuum atmosphere. If a sufficient effect (gas release) cannot be obtained by merely applying a vacuum, HIP processing (compression of the alloy material to expel internal gas) is performed as gas release processing of the molten metal. By doing so, the concentration of the gas contained in the completed deposition source (an ingot of a cobalt-iron-nickel alloy) can be reduced to 0.005% by weight or less.
【0011】なお、含有ガス濃度を0.005重量%以
下に抑えた蒸着ソースの蒸着レート変動がないことを確
認し、また、0.005重量%以上(実験では0.01
0重重量%)の蒸着ソースでは、変動レートが20〜3
0%になった。In addition, it was confirmed that there was no fluctuation in the deposition rate of the deposition source in which the concentration of the contained gas was suppressed to 0.005% by weight or less.
0% by weight), the variation rate is 20-3.
0%.
【0012】[0012]
【発明の効果】以上詳細に説明したように、真空蒸着法
により軟磁性体薄膜を形成するための蒸着ソースとし
て、本発明は、コバルト・鉄・ニッケル合金からなり、
含有ガス濃度が0.005重量%以下であるものを提供
する。本発明による蒸着ソースを用いることで、蒸着レ
ートの変動がない均一なコバルト・鉄・ニッケル合金薄
膜を安定に形成できる。そのため、高密度記録に適した
磁気ヘッドコアを歩留りよく製造できるようになる。As described in detail above, the present invention, as a deposition source for forming a soft magnetic thin film by a vacuum deposition method, comprises a cobalt-iron-nickel alloy,
A gas having a gas concentration of 0.005% by weight or less is provided. By using the deposition source according to the present invention, a uniform cobalt-iron-nickel alloy thin film having no change in the deposition rate can be stably formed. Therefore, a magnetic head core suitable for high-density recording can be manufactured with high yield.
Claims (1)
含有ガス濃度が0.005重量%以下であることを特徴
とする真空蒸着法により軟磁性体薄膜を形成するための
蒸着ソース。Claims: 1. An alloy comprising a cobalt-iron-nickel alloy,
A vapor deposition source for forming a soft magnetic thin film by a vacuum vapor deposition method, wherein the gas concentration is 0.005% by weight or less.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22109397A JPH1154324A (en) | 1997-07-31 | 1997-07-31 | Deposition source for forming soft magnetic thin film by vacuum deposition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22109397A JPH1154324A (en) | 1997-07-31 | 1997-07-31 | Deposition source for forming soft magnetic thin film by vacuum deposition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH1154324A true JPH1154324A (en) | 1999-02-26 |
Family
ID=16761387
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22109397A Pending JPH1154324A (en) | 1997-07-31 | 1997-07-31 | Deposition source for forming soft magnetic thin film by vacuum deposition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH1154324A (en) |
-
1997
- 1997-07-31 JP JP22109397A patent/JPH1154324A/en active Pending
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Legal Events
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