|
US5669975A
(en)
*
|
1996-03-27 |
1997-09-23 |
Sony Corporation |
Plasma producing method and apparatus including an inductively-coupled plasma source
|
|
US6653104B2
(en)
|
1996-10-17 |
2003-11-25 |
Immunomedics, Inc. |
Immunotoxins, comprising an internalizing antibody, directed against malignant and normal cells
|
|
JP3835827B2
(ja)
|
1997-05-02 |
2006-10-18 |
ザ ガバメント オブ ザ ユナイテッド ステイツ オブ アメリカ，アズ リプレゼンティッド バイ ザ セクレタリーオブ ザ デパートメント オブ ヘルス アンド ヒューマン サービシーズ |
悪性細胞に対する、ｏｎｃタンパク質を含む、免疫毒素
|
|
US6210539B1
(en)
|
1997-05-14 |
2001-04-03 |
Applied Materials, Inc. |
Method and apparatus for producing a uniform density plasma above a substrate
|
|
US6652717B1
(en)
|
1997-05-16 |
2003-11-25 |
Applied Materials, Inc. |
Use of variable impedance to control coil sputter distribution
|
|
US6579426B1
(en)
|
1997-05-16 |
2003-06-17 |
Applied Materials, Inc. |
Use of variable impedance to control coil sputter distribution
|
|
US6361661B2
(en)
|
1997-05-16 |
2002-03-26 |
Applies Materials, Inc. |
Hybrid coil design for ionized deposition
|
|
US6077402A
(en)
*
|
1997-05-16 |
2000-06-20 |
Applied Materials, Inc. |
Central coil design for ionized metal plasma deposition
|
|
US6504126B2
(en)
|
1997-06-30 |
2003-01-07 |
Applied Materials, Inc. |
Plasma reactor with coil antenna of concentrically spiral conductors with ends in common regions
|
|
US6345588B1
(en)
|
1997-08-07 |
2002-02-12 |
Applied Materials, Inc. |
Use of variable RF generator to control coil voltage distribution
|
|
US6076482A
(en)
*
|
1997-09-20 |
2000-06-20 |
Applied Materials, Inc. |
Thin film processing plasma reactor chamber with radially upward sloping ceiling for promoting radially outward diffusion
|
|
CA2312777A1
(en)
|
1997-12-05 |
1999-06-17 |
Robert A. Ditizio |
Plasma reactor with a deposition shield
|
|
US6273022B1
(en)
|
1998-03-14 |
2001-08-14 |
Applied Materials, Inc. |
Distributed inductively-coupled plasma source
|
|
US6254738B1
(en)
*
|
1998-03-31 |
2001-07-03 |
Applied Materials, Inc. |
Use of variable impedance having rotating core to control coil sputter distribution
|
|
US6146508A
(en)
*
|
1998-04-22 |
2000-11-14 |
Applied Materials, Inc. |
Sputtering method and apparatus with small diameter RF coil
|
|
US6390019B1
(en)
|
1998-06-11 |
2002-05-21 |
Applied Materials, Inc. |
Chamber having improved process monitoring window
|
|
TW434636B
(en)
|
1998-07-13 |
2001-05-16 |
Applied Komatsu Technology Inc |
RF matching network with distributed outputs
|
|
US6217718B1
(en)
|
1999-02-17 |
2001-04-17 |
Applied Materials, Inc. |
Method and apparatus for reducing plasma nonuniformity across the surface of a substrate in apparatus for producing an ionized metal plasma
|
|
US6474258B2
(en)
|
1999-03-26 |
2002-11-05 |
Tokyo Electron Limited |
Apparatus and method for improving plasma distribution and performance in an inductively coupled plasma
|
|
US6237526B1
(en)
|
1999-03-26 |
2001-05-29 |
Tokyo Electron Limited |
Process apparatus and method for improving plasma distribution and performance in an inductively coupled plasma
|
|
US6229264B1
(en)
|
1999-03-31 |
2001-05-08 |
Lam Research Corporation |
Plasma processor with coil having variable rf coupling
|
|
KR100338057B1
(ko)
*
|
1999-08-26 |
2002-05-24 |
황 철 주 |
유도 결합형 플라즈마 발생용 안테나 장치
|
|
AU1786301A
(en)
*
|
1999-12-02 |
2001-06-12 |
Tegal Corporation |
Improved reactor with heated and textured electrodes and surfaces
|
|
US6440219B1
(en)
*
|
2000-06-07 |
2002-08-27 |
Simplus Systems Corporation |
Replaceable shielding apparatus
|
|
US6694915B1
(en)
|
2000-07-06 |
2004-02-24 |
Applied Materials, Inc |
Plasma reactor having a symmetrical parallel conductor coil antenna
|
|
US6685798B1
(en)
|
2000-07-06 |
2004-02-03 |
Applied Materials, Inc |
Plasma reactor having a symmetrical parallel conductor coil antenna
|
|
US6409933B1
(en)
|
2000-07-06 |
2002-06-25 |
Applied Materials, Inc. |
Plasma reactor having a symmetric parallel conductor coil antenna
|
|
US6414648B1
(en)
|
2000-07-06 |
2002-07-02 |
Applied Materials, Inc. |
Plasma reactor having a symmetric parallel conductor coil antenna
|
|
US6462481B1
(en)
|
2000-07-06 |
2002-10-08 |
Applied Materials Inc. |
Plasma reactor having a symmetric parallel conductor coil antenna
|
|
TW511158B
(en)
*
|
2000-08-11 |
2002-11-21 |
Alps Electric Co Ltd |
Plasma processing apparatus and system, performance validation system thereof
|
|
US6494998B1
(en)
|
2000-08-30 |
2002-12-17 |
Tokyo Electron Limited |
Process apparatus and method for improving plasma distribution and performance in an inductively coupled plasma using an internal inductive element
|
|
US6673199B1
(en)
|
2001-03-07 |
2004-01-06 |
Applied Materials, Inc. |
Shaping a plasma with a magnetic field to control etch rate uniformity
|
|
US6527912B2
(en)
*
|
2001-03-30 |
2003-03-04 |
Lam Research Corporation |
Stacked RF excitation coil for inductive plasma processor
|
|
US6583572B2
(en)
|
2001-03-30 |
2003-06-24 |
Lam Research Corporation |
Inductive plasma processor including current sensor for plasma excitation coil
|
|
US7096819B2
(en)
*
|
2001-03-30 |
2006-08-29 |
Lam Research Corporation |
Inductive plasma processor having coil with plural windings and method of controlling plasma density
|
|
WO2003015110A1
(en)
*
|
2001-08-09 |
2003-02-20 |
Koninklijke Philips Electronics N.V. |
Planar inductive component and a planar transformer
|
|
US7571697B2
(en)
*
|
2001-09-14 |
2009-08-11 |
Lam Research Corporation |
Plasma processor coil
|
|
US6933801B2
(en)
|
2001-10-26 |
2005-08-23 |
Applied Materials, Inc. |
Distributed load transmission line matching network
|
|
JP3820188B2
(ja)
|
2002-06-19 |
2006-09-13 |
三菱重工業株式会社 |
プラズマ処理装置及びプラズマ処理方法
|
|
JP2005063760A
(ja)
*
|
2003-08-08 |
2005-03-10 |
Sekisui Chem Co Ltd |
プラズマ処理方法および処理装置
|
|
KR100710923B1
(ko)
*
|
2004-06-02 |
2007-04-23 |
동경 엘렉트론 주식회사 |
플라즈마 처리장치 및 임피던스 조정방법
|
|
US8453600B2
(en)
*
|
2004-12-28 |
2013-06-04 |
Hitachi Kokusai Electric Inc. |
Substrate processing apparatus
|
|
CN100437844C
(zh)
*
|
2005-12-05 |
2008-11-26 |
北京北方微电子基地设备工艺研究中心有限责任公司 |
电感耦合线圈
|
|
US7626135B2
(en)
*
|
2006-05-10 |
2009-12-01 |
Sub-One Technology, Inc. |
Electrode systems and methods of using electrodes
|
|
TWI354302B
(en)
*
|
2006-05-26 |
2011-12-11 |
Delta Electronics Inc |
Transformer
|
|
TW200830941A
(en)
*
|
2007-01-15 |
2008-07-16 |
Jehara Corp |
Plasma generating apparatus
|
|
US20090000738A1
(en)
*
|
2007-06-29 |
2009-01-01 |
Neil Benjamin |
Arrays of inductive elements for minimizing radial non-uniformity in plasma
|
|
JP5137675B2
(ja)
*
|
2008-04-28 |
2013-02-06 |
三菱電機株式会社 |
誘導加熱調理器
|
|
JP4752879B2
(ja)
*
|
2008-07-04 |
2011-08-17 |
パナソニック電工株式会社 |
平面コイル
|
|
JP5694721B2
(ja)
*
|
2009-10-27 |
2015-04-01 |
東京エレクトロン株式会社 |
プラズマ処理装置及びプラズマ処理方法
|
|
US9208999B2
(en)
|
2009-11-20 |
2015-12-08 |
Oerlikon Surface Solultions Ag, Trubbach |
Coil section assembly for simulating circular coils for vacuum devices
|
|
KR101287834B1
(ko)
*
|
2009-12-21 |
2013-07-19 |
한국전자통신연구원 |
자기공명을 이용한 에너지 공급 장치, 조리 장치 및 방법
|
|
SI23611A
(sl)
|
2011-01-20 |
2012-07-31 |
Institut@@quot@JoĹľef@Stefan@quot |
Metoda in naprava za vzbujanje visokofrekvenčne plinske plazme
|
|
DE102012109461A1
(de)
*
|
2012-10-04 |
2014-06-12 |
PAC Plasma Applications Consulting GmbH & Co. KG |
Selbsttragende Spuleneinheit für eine Plasmaquelle, Verfahren zur Herstellung einer solchen Spuleneinheit und entsprechende Plasmaquelle
|
|
US20150077208A1
(en)
*
|
2013-09-16 |
2015-03-19 |
Ken Goldman |
High-q parallel-trace planar spiral coil for biomedical implants
|
|
US9497846B2
(en)
*
|
2013-10-24 |
2016-11-15 |
The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration |
Plasma generator using spiral conductors
|
|
US10193228B2
(en)
|
2013-10-24 |
2019-01-29 |
The United States Of America As Represented By The Administrator Of Nasa |
Antenna for near field sensing and far field transceiving
|
|
US10180341B2
(en)
|
2013-10-24 |
2019-01-15 |
The United States Of America As Represented By The Administrator Of Nasa |
Multi-layer wireless sensor construct for use at electrically-conductive material surfaces
|
|
US9736920B2
(en)
*
|
2015-02-06 |
2017-08-15 |
Mks Instruments, Inc. |
Apparatus and method for plasma ignition with a self-resonating device
|
|
US9484084B2
(en)
|
2015-02-13 |
2016-11-01 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Pulling devices for driving data lines
|
|
US10971333B2
(en)
|
2016-10-24 |
2021-04-06 |
Samsung Electronics Co., Ltd. |
Antennas, circuits for generating plasma, plasma processing apparatus, and methods of manufacturing semiconductor devices using the same
|
|
US12074390B2
(en)
|
2022-11-11 |
2024-08-27 |
Tokyo Electron Limited |
Parallel resonance antenna for radial plasma control
|