JPH1144644A - Icp analyzer - Google Patents

Icp analyzer

Info

Publication number
JPH1144644A
JPH1144644A JP20290597A JP20290597A JPH1144644A JP H1144644 A JPH1144644 A JP H1144644A JP 20290597 A JP20290597 A JP 20290597A JP 20290597 A JP20290597 A JP 20290597A JP H1144644 A JPH1144644 A JP H1144644A
Authority
JP
Japan
Prior art keywords
spray chamber
waste liquid
sample
tube
icp
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20290597A
Other languages
Japanese (ja)
Inventor
Nobuhiko Nishi
伸彦 西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP20290597A priority Critical patent/JPH1144644A/en
Publication of JPH1144644A publication Critical patent/JPH1144644A/en
Pending legal-status Critical Current

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  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide an ICP(high-frequency inductively coupled plasma) analyzer capable of increasing an analysis precision suppressing pressure fluctuation in a spray chamber, even if a waste liquid is discharged in a lump. SOLUTION: A sample 7 is nebulized by a nebulizer 6 and sprayed into a spray chamber 1, and the nebulized sample is led to a plasma torch 8. As a matter of fact, only mist having fine grain diameters is led to the plasma torch 8. A great part of it such as large fog drops adheres the internal wall of the spray chamber 1, sinks by the own weight, and becomes a solution to collect at a drain outlet provided at the bottom of the spray chamber 1. A waster liquid is caused to flow out of a U-tube 4 by the increase of this new waste liquid by its amount, but the fluctuation of the liquid level of the spray chamber 1 is suppressed, and pressure fluctuation is reduced, since a buffer container 3 is provided between the U-tube 4 and the spray chamber 1.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、ICP(高周波誘
導結合プラズマ)発光分光分析装置およびICP−質量
分析装置(MS)として使用されるICP分析装置に関
する。
The present invention relates to an ICP (High Frequency Inductively Coupled Plasma) emission spectrometer and an ICP analyzer used as an ICP-mass spectrometer (MS).

【0002】[0002]

【従来技術】ICP(高周波誘導結合プラズマ、以下I
CPという)は元素分析用の優れた励起発光源として、
またイオン源として多く利用されるが、その構成は図2
に示すとおりである。すなわち、試料は液体で扱われる
のがほとんどであるが、スプレーチェンバ1内でネブラ
イザ6によって試料7を霧化させてエアロゾルとしてこ
れをプラズマトーチ8に導き、高周波コイル9で発生さ
せる高周波磁界を用いてプラズマを生成させ、発光強度
やイオン量を測定して試料中の元素の定性・定量分析が
行われる。
2. Description of the Related Art ICP (High Frequency Inductively Coupled Plasma;
CP) is an excellent excitation light source for elemental analysis.
It is often used as an ion source.
As shown in FIG. That is, most of the sample is treated with a liquid. However, the sample 7 is atomized by the nebulizer 6 in the spray chamber 1 and is guided to the plasma torch 8 as an aerosol, and a high-frequency magnetic field generated by the high-frequency coil 9 is used. To generate plasma, and measure the emission intensity and the amount of ions to perform qualitative and quantitative analysis of the elements in the sample.

【0003】このようなICP分析においては、スプレ
ーチェンバ1内で霧化された試料7の内、プラズマトー
チ8に導入されるエアロゾルはごく一部であってほとん
どはスプレーチェンバ1内で再び溶液となって排出され
る。この排出はスプレーチェンバ1のドレイン部に廃液
溜管2を接続し、廃液溜管2の他端にU字管4を接続し
てU字管4を介してドレインタンク5に排出されるよう
になっている。このU字管4は、所定の高さに設置して
あるから廃液溜管2に廃液が貯溜されることによって、
余剰液の排出がU字管4からなされてもスプレーチェン
バ1の廃液面を一定に保つことができ、これによりスプ
レーチェンバ1内の圧力が一定となるように工夫されて
いる。また、廃液溜管2での廃液の貯溜によって試料エ
アロゾル導入に用いられるアルゴンガスが、排出口を通
過するのを防ぐ機能もある。
In such an ICP analysis, of the sample 7 atomized in the spray chamber 1, the aerosol introduced into the plasma torch 8 is only a small part, and most of the aerosol is again mixed with the solution in the spray chamber 1. Is discharged. This discharge is performed by connecting the waste liquid reservoir 2 to the drain of the spray chamber 1, connecting the U-shaped tube 4 to the other end of the waste liquid reservoir 2, and discharging to the drain tank 5 via the U-shaped tube 4. Has become. Since the U-shaped pipe 4 is installed at a predetermined height, the waste liquid is stored in the waste liquid storage pipe 2,
Even if the surplus liquid is discharged from the U-shaped tube 4, the waste liquid level of the spray chamber 1 can be kept constant, whereby the pressure in the spray chamber 1 is designed to be constant. Further, there is also a function of preventing the argon gas used for introducing the sample aerosol from passing through the discharge port by storing the waste liquid in the waste liquid storage tube 2.

【0004】[0004]

【発明が解決しようとする課題】従来のICP分析装置
は以上のように構成されているが、ICP分析を精度良
く行うにはプラズマの安定が必要であり、そのためには
スプレーチェンバ1内の圧力を一定に保つことが重要で
ある。スプレーチェンバ1内の圧力を変動させる要因は
一つではないが、上述したスプレーチェンバ1内の廃液
の処理も問題となる。すなわち、図2において、スプレ
ーチェンバ1、廃液溜管2、U字管4の材質は、取り扱
われる試料が有機溶媒や薬品類であることを考慮してガ
ラスやテフロン等の耐薬品性の材料が使用され、一般的
に親水性に乏しい。そのためU字管4からの廃液排出は
徐々には排出されず、廃液溜管2に在る貯溜量が有る値
を越えたとき一塊となって一気に流失してしまう。そう
するとスプレーチェンバ1内の液面を揺動させ、圧力を
変動させプラズマを不安定にさせる問題がある。
Although the conventional ICP analyzer is constructed as described above, it is necessary to stabilize the plasma in order to perform the ICP analysis with high accuracy. It is important to keep constant. Although there is no single factor that causes the pressure in the spray chamber 1 to fluctuate, the treatment of the waste liquid in the spray chamber 1 described above also poses a problem. That is, in FIG. 2, the materials of the spray chamber 1, the waste liquid storage tube 2, and the U-shaped tube 4 are made of a chemical resistant material such as glass or Teflon in consideration of the fact that the sample to be handled is an organic solvent or chemicals. Used and generally poor in hydrophilicity. Therefore, the waste liquid is not gradually discharged from the U-shaped tube 4, and when the storage amount in the waste liquid storage tube 2 exceeds a certain value, the waste liquid is suddenly lost as a lump. In this case, there is a problem that the liquid level in the spray chamber 1 fluctuates, the pressure fluctuates, and the plasma becomes unstable.

【0005】本発明は、このような事情に鑑みてなされ
たものであって、ICP分析において分析時にスプレー
チェンバ1内の液面が安定に保たれるようにして、常に
精度の良い分析が行えるICP分析用試料導入装置を提
供するものである。
The present invention has been made in view of such circumstances, and in the ICP analysis, the liquid level in the spray chamber 1 is kept stable at the time of analysis, so that accurate analysis can always be performed. It is intended to provide a sample introduction device for ICP analysis.

【0006】[0006]

【課題を解決するための手段】上記の目的を達成するた
め、本発明のICP分析装置は、試料導入装置を構成す
るスプレーチェンバ1とこのスプレーチェンバ1に貯溜
する液面の高さを一定に保つために設けられたU字管4
との間に上部が密閉されたバッフア容器3を設置したこ
とを特徴とする。
In order to achieve the above object, an ICP analyzer according to the present invention comprises a spray chamber 1 constituting a sample introduction device and a level of a liquid stored in the spray chamber 1 kept constant. U-shaped tube 4 provided to keep
And a buffer container 3 whose upper part is hermetically closed.

【0007】[0007]

【発明の実施の形態】本発明のICP分析装置を、その
一実施例を示す図1にしたがって説明する。図におい
て、1はスプレーチェンバ、2は廃液溜管、3はバッフ
ア容器、4はU字管、5はドレインタンク、6はネブラ
イザ、7は試料、8はプラズマトーチ、そして9は高周
波コイルである。
DESCRIPTION OF THE PREFERRED EMBODIMENTS An ICP analyzer of the present invention will be described with reference to FIG. In the figure, 1 is a spray chamber, 2 is a waste liquid reservoir, 3 is a buffer container, 4 is a U-shaped tube, 5 is a drain tank, 6 is a nebulizer, 7 is a sample, 8 is a plasma torch, and 9 is a high frequency coil. .

【0008】バッフア容器3は上部が密閉されており、
下部に廃液溜管2の接続口、そしてバッフア容器3の高
さの中間位置にはU字管4への接続口を持つている。下
部に接続された廃液溜管2の他端は、スプレーチェンバ
1のドレイン口に接続されており、バッフア容器3の中
間にあるU字管4への接続口にはエルボ形配管が介在さ
れそしてU字管4が接続される。U字管4の他端はドレ
インタンク5に接続され、廃液は最終ここに貯溜され
る。なお、U字管4の上部には空気抜きの開口をもって
いる。
[0008] The upper part of the buffer container 3 is sealed,
A connection port for the waste liquid storage pipe 2 is provided at a lower portion, and a connection port for the U-shaped pipe 4 is provided at an intermediate position of the height of the buffer container 3. The other end of the waste liquid storage pipe 2 connected to the lower part is connected to the drain port of the spray chamber 1, and the connection port to the U-shaped pipe 4 in the middle of the buffer vessel 3 is provided with an elbow type pipe. The U-shaped tube 4 is connected. The other end of the U-shaped tube 4 is connected to the drain tank 5, and the waste liquid is finally stored here. The upper part of the U-shaped tube 4 has an air vent opening.

【0009】分析に先立ち、廃液溜管2ならびにバッフ
ア容器3には前もって溶媒が貯溜される。スプレーチェ
ンバ1、バッフア容器3そしてU字管4の高さの相対位
置は図1に示す状態に置かれる。ネブライザ6からのア
ルゴンガスが供給されている時は、各々の液面高さはス
プレーチェンバ1でA、バッフア容器3でBそしてU字
管4でCの高さにある。ここで、U字管4は大気圧に解
放されているのでバッフア容器3の液面Bには、U字管
4の液面高さCとの水柱高さに相当する圧力がかかって
いることになる。
Prior to the analysis, a solvent is stored in the waste liquid storage tube 2 and the buffer container 3 in advance. The relative positions of the heights of the spray chamber 1, the buffer container 3 and the U-shaped tube 4 are set as shown in FIG. When argon gas is being supplied from the nebulizer 6, the liquid level is at A in the spray chamber 1, B at the buffer vessel 3 and C at the U-tube 4. Here, since the U-tube 4 is released to the atmospheric pressure, a pressure corresponding to the water column height of the liquid surface height C of the U-tube 4 is applied to the liquid level B of the buffer container 3. become.

【0010】分析の際には、試料7がネブライザ6で霧
化されてスプレーチェンバ1内に噴霧される。そして霧
化された試料はこのスプレーチェンバ1で粒子の均一化
と気流の安定化が図られた後、プラズマトーチ8に導か
れる。実際には粒経の細かいミストのみがプラズマトー
チ8に導入され、大きな霧滴など大部分はスプレーチェ
ンバ1の内壁に付着し、また自重で沈降し溶液となって
スプレーチェンバ1の底部にあるドレイン口に溜まる。
At the time of analysis, the sample 7 is atomized by the nebulizer 6 and sprayed into the spray chamber 1. The atomized sample is guided to the plasma torch 8 after the spray chamber 1 achieves uniform particles and stabilizes the air flow. Actually, only a mist with a fine particle diameter is introduced into the plasma torch 8, and most of large mist droplets adhere to the inner wall of the spray chamber 1 and settle down by their own weight to form a solution, and a drain at the bottom of the spray chamber 1 is formed. Collect in your mouth.

【0011】この新しい廃液の増加によってそれだけU
字管4から廃液は流出することになるが、ここで廃液は
U字管4が親水性に乏しいため、徐々には排出されず廃
液の貯溜量が在る値を越えたときに一塊になって一気に
流れ出してしま。従来法によればこの事が直ちにスプレ
ーチェンバ1の液面を上下に振動させ、スプレーチェン
バ1内の圧力を変動させていたが、本発明ではバッフア
容器3がU字管4とスプレーチェンバ1との間に設置し
てあるためスプレーチェンバ1の液面のみが直接影響を
受けるのではなく、バッフア容器3の液面にもその作用
は及ぶ。しかしバッフア容器3は上部が密閉された構造
であるためこの空間は空気バネの役割をし、液面の上下
振動の振幅を抑える働きをする。これによってスプレー
チェンバ1の液面もU字管4からの廃液排出のために生
じる上下変動は抑えられることになる。なお、バッフア
容器3は上面が閉じていればよく、どのような形状のも
のでも良い。
[0011] Due to the increase of this new waste liquid, U
The waste liquid flows out from the U-shaped pipe 4, but the waste liquid is not gradually discharged because the U-shaped pipe 4 has poor hydrophilicity, and becomes a lump when the amount of waste liquid exceeds a certain value. I'm flowing at a stretch. According to the conventional method, this immediately causes the liquid level of the spray chamber 1 to vibrate up and down to fluctuate the pressure in the spray chamber 1, but in the present invention, the buffer container 3 comprises the U-tube 4 and the spray chamber 1. Because the liquid level of the spray chamber 1 is not directly affected, the effect is also exerted on the liquid level of the buffer container 3. However, since the upper portion of the buffer container 3 is closed, this space functions as an air spring and functions to suppress the amplitude of the vertical vibration of the liquid surface. As a result, the liquid level in the spray chamber 1 can be suppressed from fluctuating up and down due to discharge of waste liquid from the U-shaped tube 4. The buffer container 3 only needs to have a closed upper surface, and may have any shape.

【0012】[0012]

【発明の効果】本発明のICP分析装置は、上記の構成
であり、スプレーチェンバとU字管との間に上部を密閉
したバッフア容器を設置したため、このバッフア容器の
上部空間が空気バネとして働き、U字管からの廃液排出
があつてもスプレーチェンバ内の圧力変動が低減され、
プラズマの安定、従って分析精度が改善される。
According to the ICP analyzer of the present invention having the above-described structure, a buffer container whose upper part is hermetically sealed is provided between the spray chamber and the U-shaped tube, so that the upper space of the buffer container functions as an air spring. The pressure fluctuation in the spray chamber is reduced even if the waste liquid is discharged from the U-shaped pipe,
The stability of the plasma and thus the accuracy of the analysis is improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明のICP分析装置の一実施例を示す図で
ある。
FIG. 1 is a diagram showing one embodiment of an ICP analyzer of the present invention.

【図2】従来例のICP分析装置を示す図である。FIG. 2 is a diagram showing a conventional ICP analyzer.

【符号の説明】[Explanation of symbols]

1…スプレーチェンバ 2…廃液溜管 3…バッフア容器 4…U字管 5…ドレインタンク 6…ネブライザ 7…試料 8…プラズマトーチ 9…高周波コイル DESCRIPTION OF SYMBOLS 1 ... Spray chamber 2 ... Waste liquid reservoir 3 ... Buffer container 4 ... U-shaped tube 5 ... Drain tank 6 ... Nebulizer 7 ... Sample 8 ... Plasma torch 9 ... High frequency coil

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】ネブライザで霧化された試料をスプレーチ
ェンバを経てプラズマトーチに導入して励起発光・イオ
ン化させることにより分析を行うICP分析装置におい
て、前記スプレーチェンバとこのスプレーチェンバに貯
溜する液面の高さを一定に保つために設けられたU字管
との間に上部が密閉された廃液溜となるバッフア容器を
設置したことを特徴とするICP分析装置。
1. An ICP analyzer for analyzing a sample atomized by a nebulizer by introducing a sample atomized by a nebulizer into a plasma torch via a spray chamber to excite and emit and ionize the sample, wherein the spray chamber and a liquid surface stored in the spray chamber An ICP analyzer characterized in that a buffer container serving as a waste liquid tank whose upper part is hermetically closed is provided between a U-shaped pipe provided for keeping the height of the wastewater constant.
JP20290597A 1997-07-29 1997-07-29 Icp analyzer Pending JPH1144644A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20290597A JPH1144644A (en) 1997-07-29 1997-07-29 Icp analyzer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20290597A JPH1144644A (en) 1997-07-29 1997-07-29 Icp analyzer

Publications (1)

Publication Number Publication Date
JPH1144644A true JPH1144644A (en) 1999-02-16

Family

ID=16465134

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20290597A Pending JPH1144644A (en) 1997-07-29 1997-07-29 Icp analyzer

Country Status (1)

Country Link
JP (1) JPH1144644A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006010415A (en) * 2004-06-23 2006-01-12 Horiba Ltd Gas-liquid separation container and icp optical emission spectrometer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006010415A (en) * 2004-06-23 2006-01-12 Horiba Ltd Gas-liquid separation container and icp optical emission spectrometer

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