JPH11340304A - Semiconductor manufacturing equipment - Google Patents

Abstract

PROBLEM TO BE SOLVED: To sufficiently exhibit merits of both a single wafer processing system and a batch processing system and effectively transfer plates, by a method wherein a second plate is used when one wafer is transferred, and a first plate group and the second plate are used when a plurality of wafers are transferred at the same time. SOLUTION: When a plurality of wafers are transferred, all wafer retaining plates 38-42 are used. In the case of a fractional treatment where five wafers at most are carried, a reciprocating motor 54 is driven, parallel swinging links 45, 46 are swung in the clookwise direction, a plate holder 33 is sent out, and a state where a wafer 1 is transferred by using only the wafer retaining plate 38 is obtained. In this state, the wafers are transferred one by one. When five wafers are transferred again at the same time, after the batch treatment is completed, the reciprocating motor 54 is reversely driven, the wafer retaining plate 38 is retreated and returned to the original position, and a plurality of the wafers are transferred with the wafer retaining plates 38-42.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] 1. Field of the Invention [0002] The present invention relates to transfer of a wafer in a vertical CVD diffusion apparatus.

[0002]

2. Description of the Related Art CV is one of the manufacturing processes of semiconductor devices.
There is D processing. In this method, a required number of silicon wafers are heated in a CVD apparatus and subjected to chemical vapor deposition (CVD). In order to homogenize the CVD process, both ends of a row are sandwiched between product wafers. In the figure, a plurality of dummy wafers are arranged, and one monitor wafer for inspection is arranged at a required interval in the middle of a product wafer. This is outlined in FIG.

[0003] In the diffusion furnace, the wafer 1 is supported by a boat 2, and the wafer 1 is c
When performing the VD process, first, the wafers 1 are inserted into the boat 2 so as to have a required arrangement, and the boat 2 into which the wafers 1 are inserted is loaded into a diffusion furnace. Generally, the temperature inside the diffusion furnace is not uniform over the entire area. Therefore, the boat 2 has a sufficient number of wafers to be processed (for example, 1.5 times the number of processed wafers). The number of the wafers is equal to the number of wafers, and when processing the wafers 1, the wafers should be stored at a uniform temperature distribution or the wafer storage position of the boat 2 should be selected according to the number of wafers 1. Has become.

At the upper end and the lower end of the wafer array of the boat 2, dummy wafer groups 3 and 4 each composed of an appropriate number of dummy wafers 1b are stored, and a predetermined number of product wafers 1a are sandwiched between the monitor wafers 1c. The product wafer group 5 consisting of
The product wafer groups 5 are sequentially stored with the c in between.
Lowermost product wafer group 5 and dummy wafer group 4
The monitor wafer 1c is inserted in between. The wafer transfer device performs a series of operations for transferring wafers loaded in a cassette to the boat and loading processed wafers in an empty cassette. A conventional wafer transfer device will be described with reference to FIG.

FIG. 4 shows a wafer transfer apparatus of a single-wafer type (a method of transferring one wafer at a time). A cassette 7 in which wafers 1 are loaded is arranged around a handling unit 6 in the same circle. A required number of units are arranged on the circumference, and a transfer elevator 8 and a load / unload elevator 9 are provided adjacent to the handling unit 6, and the boat cradle 10 of the transfer elevator 8 includes the circumference. A vertical diffusion furnace 12 is provided above the boat cradle 11 of the load / unload elevator 9 so as to ascend and descend along the generatrix of the cylindrical surface. A transfer unit 13 for transferring the boat 2 is provided between the transfer elevator 8 and the load / unload elevator 9.

The handling unit 6 includes a rotating arm 14 that rotates about the center of the circumference and moves up and down, and a wafer suction chuck 15 that advances and retreats in a radial direction along the rotating arm 14. The wafers 1 are sucked and taken out one by one, and are sequentially transferred to the boat 2 placed on the transfer elevator 8 from the upper side. The transfer elevator 8 descends one step at a time following the progress of the transfer of the wafer 1.

The boat 2 on which the transfer of the wafers 1 is completed is transferred from the transfer elevator 8 to the load / unload elevator 9 by the transfer unit 13, and the load / unload elevator 9 spreads the boat 2 by the diffusion. Furnace 1
Charge into 2.

When the CVD process is completed, the boat 2 is taken out of the diffusion furnace 12 and further transferred to the transfer elevator 8 by the transfer unit 13, and the handling unit 6
Is loaded into the cassette 7 in the reverse order to that described above.

The above-described conventional wafer transfer apparatus is a single wafer type, but there is also a batch type as shown in FIG.

This is because the wafer suction chuck 15 has 25
A set of suction plates 16 is provided, and all 25 wafers 1 loaded in the cassette 7 are collectively chucked and transferred to the boat 2.

[0011]

However, the above-described conventional single-wafer type wafer transfer apparatus and batch type wafer transfer apparatus have the following problems.

The arrangement of the wafers to be inserted in the boat 2 and the number of the upper and lower dummy wafers, or the number of monitor wafers and the number of monitor wafers to be provided. Depends on processing conditions or processing specifications of the customer. In the former single-wafer method, since wafers are transferred one by one, any arrangement of wafers can be handled. However, the number of operations is remarkably large, so that the transfer time is long and the efficiency is low. In addition, the fact that the number of operations is large increases the possibility of dust generation stochastically, which adversely affects product quality.

On the other hand, the latter batch method has an advantage that the transfer time is short and is extremely efficient. However, since the processing is performed in batches of 25 wafers, it is difficult to arrange the arrangement of the wafers when transferring the wafers. Can not. Therefore, dummy wafers, monitor wafers, and product wafers are mixed so as to form a predetermined arrangement when the wafers are loaded into the cassette. The work of loading wafers into cassettes is manual, and the work of loading different types of wafers in a predetermined arrangement is extremely complicated, inefficient, and unavoidable. Was.

The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a wafer transfer apparatus capable of fully exhibiting the advantages of a single wafer system and the advantages of a batch system in a semiconductor manufacturing apparatus.

[0015]

According to the present invention, there is provided a first plate group having a plurality of plates for a substrate transfer machine,
And a second plate composed of a single plate that can be transferred independently of the group of plates. When a single substrate is transferred, the substrate is transferred using the second plate. The present invention relates to a semiconductor manufacturing apparatus provided with a wafer transfer device for transferring a substrate by simultaneously using a first plate group and a second plate when transferring a plurality of substrates at one time. The present invention relates to a semiconductor manufacturing apparatus including four plates, and also relates to a semiconductor manufacturing apparatus in which a plate pitch is equally spaced from a first plate group to a second plate,
The first plate group is supported by one of the orthogonal substrates, and the second plate relates to a semiconductor manufacturing apparatus supported by the other substrate.

[0016]

Embodiments of the present invention will be described below with reference to the drawings.

FIGS. 1 and 2 show, in particular, a wafer gripper 18 of the wafer transfer apparatus according to the present embodiment, and the wafer gripper 18 is, for example, a rotary arm shown in FIGS. 14 is provided to be able to advance and retreat in the radial direction.

Hereinafter, the wafer gripper 18 will be described.

The vertical substrate 20 is fixed to the base plate 19 and the upper substrate 21 is fixed to the base plate 19 via a support not shown.

A guide block 22 is fixed to the upper substrate 21, and a pair of left and right sliders 2 is attached to the guide block 22.
3, 24, 25, 26 are slidably mounted. The sliders 23, 24, 25, 26 are screwed with screw rods 27, 28 rotatably provided on the upper substrate 21, respectively, and driven gears 29, 30 are fitted to upper ends of the screw rods 27, 28, respectively. .

A pitch changing motor 31 is mounted between the driven gears 29 and 30, and a driving gear 32 fitted to an output shaft of the pitch changing motor 31 is engaged with the driven gears 29 and 30.

The sliders 23, 24, 25, 26 have inverted L-shaped plate holders 34, 35, 36,
37, and the plate holders 34, 35, 36, 3
7, the wafer support plates 39, 40, 41, 4
Install 2. Each wafer support plate 39, 40, 4
A concave portion 43 on which a wafer can be placed is formed on the upper surfaces of the first and second wafers. The wafer support plates 39, 40,
A first plate group is constituted by 41 and 42.

The plate holders 34, 35, 3
6, 37 are the wafer support plates 39, 40, 4
The plate holders 34, 35, 3 have a shape capable of supporting the first and second plates 42 at appropriate intervals in the vertical direction.
Sliders 23, 24, 25,
The screwing relationship between the screw rods 26 and the screw rods 27 and 28 is such that the screw pitch with which the slider 23 to which the plate holder 34 supporting the second-stage wafer support plate 39 from below is screwed is screwed. The screw pitch of the portion where the slider 24 to which the plate holder 35 supporting the third-stage wafer support plate 40 from the bottom is screwed is doubled, and similarly, the screw pitch of the fourth-stage slider 25 is 3 When the pitch changing motor 31 is driven, the sliders 23, 24, 25, 26 are moved by the screw rods 27, 28 to the respective wafers. Support plate 3
Maintaining the relationship that the pitches between 9, 40, 41, 42 and a wafer support plate 38 described later are equal,
The pitch can be expanded or reduced.

The lowermost wafer support plate 38 is fixed to the plate holder 33 attached to the advance / retreat mechanism 44, so that it can be moved forward and backward without any vertical displacement. The wafer support plate 38 constitutes a second plate.

The reciprocating mechanism 44 will be described below.

The vertical swing link 45,
The pivotal link 46 is pivotally connected to the parallel swinging links 45 and 46, respectively. The upper ends of the floating parallel links 47 and 48 are pivotally connected to the first-stage plate holder 33, and the lower ends of the floating parallel links 47 and 48 are pivotally connected to the slider 49. The slider 49 is provided with a guide 50.
Is slidably provided on the vertical substrate 20 via a.

The turning radii of the parallel swinging links 45 and 46 are made equal to the turning radii of the floating parallel links 47 and 48 at the pivot point of the plate holder 33, so that the two parallel links 45, 46 and 47 are made equal. , 48 to offset the vertical displacement.

A pivot 51 fixed to one of the parallel swing links 46 projects through the vertical board 20, and a pulley 52 is fixed to the projecting end. An advancing / retracting motor 54 is fixed to the anti-parallel oscillating link side of the vertical substrate 20 via a motor support bracket 53, and a driving pulley 55 is fitted to an output shaft of the advancing / retracting motor 54, and the driving pulley 55 and the pulley 52 and a timing belt 56.

The forward / backward rotation of the forward / backward motor 54 allows the wafer support plate 38 to move forward and backward, and the amount of advance of the wafer support plate 38 depends on the upper wafer support plates 39, 40 and 41. , 42 project completely.

In the drawings, 57 and 58 are sensors for detecting the stroke ends of the floating parallel links 47 and 48, and 59 and 60 are detecting pieces for operating the sensors 47 and 48.

The operation will be described below.

All wafer support plates 38, 39,
When the wafers are supported and transferred at one time in the steps 40, 41 and 42, the wafer supporting plates 38, 39, 40 and 4
2 are positions indicated by solid lines in FIG.

Next, when performing fraction processing for transferring five or less wafers 1, the advance / retreat motor 54 is driven, and the drive pulley 55, the timing belt 56, the pulley 52
2, the parallel swing links 45 and 46 are swung clockwise in FIG. Due to the swing of the parallel swing links 45, 46, the floating parallel links 47, 48 rotate counterclockwise while descending downward, so that the plate holder 3 is rotated.
Send 3 The sensor 57 is connected to the floating parallel link 4
When the stroke ends of 7, 48 are detected, the forward / backward motor 5
4 is stopped.

Thus, the lowermost wafer support plate 3
8 is ready to transfer the wafer 1 (2 in FIG. 2).
(Indicated by a chain line), and the wafers 1 can be transferred one by one.

When the fraction processing has been completed and five wafers 1 are to be transferred at the same time again, the advance / retreat motor 54 is driven to rotate in the reverse direction, the lowermost wafer support plate 38 is retracted and returned to the position shown by the solid line in FIG. .

Next, the pitch between the wafers when the wafers are stored differs depending on the size of the wafer 1. In this case, the pitch of the wafer support plates 38, 39, 40, 41 and 42 is adjusted.

The pitch changing motor 31 is driven to rotate the screw rods 27 and 28 via the driving gear 32 and the driven gears 29 and 30. By the rotation of the screw rods 27, 28, the plate holders 34, 35,
The sliders 23, 24, on which 36, 37 are fixed,
25 and 26 move. The sliders 23, 24, 2
As described above, since the screw pitch changes at the same magnification in the portion where the upper and lower wafer supporting plates 39 and 39 are screwed together, the upper and lower wafer supporting plates 39 and 39 are referred to.
40, 41, and 42 are moved while maintaining the relationship of equal intervals, and the pitch is adjusted.

Although the number of wafers accommodated in the wafer cassette is 25 in the above embodiment, the number of wafer support plates is set to "5", which is a divisor of "25". 25 wafer support plates
It may be a sheet.

Further, it is needless to say that various changes can be made without departing from the gist of the present invention, such as a case where the wafer support plate is formed by a vacuum suction method.

[0040]

As described above, according to the present invention, it is possible to selectively transfer a plurality of wafers at a time and to transfer one wafer at a time, so that wafer transfer can be performed efficiently and arbitrary wafers can be transferred. Can correspond to an array,
Further, when a plurality of wafers are transferred at one time, the transfer is performed by using the first plate group and the second plate at the same time, so that all the wafer support plates can be provided for transfer, and there is no waste of plates. Demonstrates excellent effects.

[Brief description of the drawings]

FIG. 1 is a perspective view of a main part of an embodiment of the present invention as seen from a distance.

FIG. 2 is a perspective view of a main part of the embodiment of the present invention.

FIG. 3 is an explanatory diagram showing an example of the arrangement of wafers according to the embodiment of the present invention.

FIG. 4 is an explanatory view showing a conventional wafer transfer device.

FIG. 5 is an explanatory view showing the conventional wafer transfer device.

[Explanation of symbols]

 1 Wafer 23 Slider 24 Slider 25 Slider 26 Slider 27 Screw rod 28 Screw rod 31 Pitch change motor 38 Wafer support plate 39 Wafer support plate 40 Wafer support plate 41 Wafer support plate 42 Wafer support plate 44 Advance / retreat mechanism 54 Advance / retreat motor

Claims (3)

[Claims] 1. A second plate including a first plate group having a plurality of plates for a substrate transfer machine, and a single plate that can be transferred independently of the first plate group. When a single substrate is transferred, the first plate group and the second plate are simultaneously transferred using the second plate, and when a plurality of substrates are transferred at one time. A semiconductor manufacturing apparatus including a wafer transfer device for transferring a substrate by using the same. 2. The semiconductor manufacturing apparatus according to claim 1, wherein the first plate group includes four plates. 3. The semiconductor manufacturing apparatus according to claim 1, wherein the plate pitches are equally spaced from the first plate group to the second plate.