JPH11307433A - Device and method for developing - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an developing device and method for improving the uniformity of pattern line width after development. SOLUTION: A developer jet nozzle 11 having a slit-shaped jet port is moved from one side position outside a substrate 100 held by a substrate holding part 1 in a static state through the substrate 100 to the other side position outside the substrate 100, and developer is supplied to the substrate 100. The substrate 100 held by the substrate holding part 1 is rotated the prescribed number of times after the lapse of a prescribed time since the end of the supply of the developer to the substrate 100 by the developer jet nozzle 11, and then the substrate 100 is held in a static state in a prescribed time by the substrate holding part 100. The rotation of the substrate 100 and the holding of the substrate 100 in the static state is repeated the prescribed number of times.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a developing apparatus and a developing method for performing a developing process by supplying a developing solution to a photosensitive film on a substrate.

[0002]

2. Description of the Related Art A developing device is used for developing a photosensitive film formed on a substrate such as a semiconductor wafer, a glass substrate for a liquid crystal display, a glass substrate for a photomask, and a substrate for an optical disk.

[0003] For example, a rotary developing device includes a rotation holding unit that holds a substrate horizontally and rotates it around a vertical axis, and a developer discharge nozzle that supplies a developer to the surface of the substrate. The developer discharge nozzle is attached to the tip of a nozzle arm rotatably provided in a horizontal plane, and can move between a position above the substrate and a standby position.

[0004] During the developing process, the developer is supplied to a photosensitive film such as a photoresist on the substrate after the developer discharge nozzle moves from the standby position to above the substrate. The supplied developer is spread over the entire surface of the substrate by the rotation of the substrate,
Contact with photosensitive film. The development of the photosensitive film is performed by stopping the substrate for a certain period of time in a state in which the developer is held on the substrate by the surface tension (a liquid level). When the supply of the developer is completed, the developer discharge nozzle moves to a standby position retreated from above the substrate by the rotation of the nozzle arm.

[0005]

However, in the above-described conventional rotary developing device, the photosensitive film on the substrate is subjected to a large impact when the rotating substrate is exposed to the developing solution at the start of discharge. Bubbles are generated in the developer by the impact, and minute bubbles remaining on the surface of the photosensitive film may cause development defects. Further, the photosensitive film may be damaged by the impact of the developer at the start of the discharge.

In recent years, along with miniaturization of patterns, more accurate resist performance has been demanded, and a more accurate resist developing method has been demanded. Regarding the performance of the resist, the larger the difference in dissolution rate between the exposed and unexposed parts during exposure (dissolution contrast), the better the cross-sectional shape of the resist pattern obtained after development and the higher the resolution of the resist. Thus, a fine resist pattern can be formed. Therefore, the higher the dissolution contrast between exposed and unexposed parts during development, the higher the performance of the resist.

As one of the techniques for improving the dissolution contrast, there is a method of adjusting the composition of the resist so that the resist has a surface insolubilizing effect. The surface insolubilizing effect is an effect that when a developer contacts a resist in an unexposed portion, the dissolution rate of the contact portion is extremely reduced.

It has been clarified that the surface insolubilizing effect is greatly affected by the flow and physical impact of the developer in the initial stage of supplying the developer to the surface of the resist. That is, if the flow of the developing solution is suppressed in the initial stage of the supply of the developing solution, the effect of making the surface hardly soluble is obtained, and the pattern shape of the resist is improved. Further, by supplying the developing solution to the surface of the substrate with a uniform impact force, the effect of insolubilizing the surface is obtained uniformly on the surface of the substrate, and the uniformity of the pattern line width after development is improved.

Therefore, the inventor of the present invention moves the developing solution discharging nozzle linearly from one end to the other end of the substrate while discharging the developing solution from the developing solution discharging nozzle having the slit-shaped discharging port. Has proposed a method of supplying a developer with a uniform impact force on a substrate while suppressing the flow of the developer on the substrate in an initial stage of supply of the developer.

However, as a result of further experiments by the present inventors, among the resists having the surface insolubilizing effect described above,
It has been found that with a certain type of resist, the line width of the pattern after development is not sufficiently uniform even when the developer is supplied by a developer discharge nozzle having a slit-shaped discharge port.

An object of the present invention is to provide a developing apparatus and a developing method capable of improving the uniformity of a pattern line width after development.

[0012]

The inventor of the present invention has found that when a certain kind of resist is used, the phenomenon that the uniformity of the pattern line width after development is insufficient is caused by the following reason. Guessed.

The development reaction means that a reactive group soluble in a developing solution is generated by exposure of a resist to a photosensitive agent, and a neutralizing reaction between the reactive group and the developing solution causes a reaction between the photosensitive agent and a resin component of the resist around the photosensitive agent. Are both reactions that dissolve in the developer. The resin component is generally a polymer having a molecular weight of tens of thousands or more.
That is, it is considered that the dissolution reaction proceeds in a kind of critical state. Generally, in a solution, a dissolved substance uniformly disperses due to concentration diffusion, which is one of transport phenomena, but fluctuations due to thermal motion cannot be avoided in principle.

Normally, even if a fluctuation occurs, it collapses during thermal motion, but under special external conditions, for example, under a critical state, the fluctuation may easily grow to a state quantity that can be macroscopically observed. Are known.

[0015] For the above reason, macroscopic fluctuations may grow in the dissolution reaction of the resist, and the concentration distribution of the dissolved product may not be uniform, and there may be a portion that partially aggregates. . As a result, the concentration of the developing solution for the dissolution reaction relatively decreases in the portion where the dissolved product is aggregated, so that the pattern line width after development in this portion varies, and the in-plane pattern line width varies. It is considered that this causes a phenomenon that the uniformity is reduced.

Since such a phenomenon occurs after a lapse of time after the development reaction has progressed to some extent, it is effective in the process of discharging the developing solution, for example, in the improvement of the developing solution filling method and the developing solution discharging nozzle. Measures cannot be taken.

Therefore, the present inventor has noticed that aggregation of the dissolved product occurs after the development reaction has progressed to some extent.
The following invention was devised to improve the uniformity of the pattern line width after development.

(1) First Invention A developing device according to a first invention comprises a substrate holding means for holding a substrate in a horizontal posture, a developing solution discharge nozzle for discharging a developing solution, and a stationary state on the substrate holding means. Moving means for moving the developer discharge nozzle from a position on one side outside the held substrate to a position on the other side outside the substrate from the position above the substrate, a driving means for rotating and driving the substrate holding means, After a lapse of a predetermined time from the end of the supply of the developing solution onto the substrate by the nozzle, the substrate held by the substrate holding unit is rotated at a predetermined rotation speed by the driving unit, and then the substrate is held stationary by the substrate holding unit for a predetermined time. And control means for causing the

In the developing device according to the present invention, the developing solution discharge nozzle is moved from one position outside the substrate, which is held stationary by the substrate holding means, to the position on the other side outside the substrate by passing over the substrate. By doing so, the developer is supplied onto the stationary substrate. After a lapse of a predetermined time from the end of the supply of the developing solution onto the substrate by the developing solution discharge nozzle, the substrate is rotated at a predetermined number of revolutions, and then the substrate is kept stationary for a predetermined time.

After a certain period of time from the completion of the supply of the developer, dissolved products are actively generated in the course of development. At this stage, by rotating the substrate at a predetermined number of revolutions and then stopping, the non-uniform aggregation phenomenon of the dissolved product due to the growth of fluctuation is avoided by physical fluctuation. As a result, the uniformity of the pattern line width after development is improved.

(2) Second Invention In a developing device according to a second aspect of the present invention, in the configuration of the developing device according to the first aspect of the present invention, the control means controls the rotation of the substrate by the driving means and the stationary state of the substrate by the substrate holding means. The holding in the state is repeated a predetermined number of times.

By repeating the rotation of the substrate and the holding of the substrate in a stationary state, the phenomenon of non-uniform aggregation of dissolved products due to the growth of fluctuations can be effectively avoided. Therefore, the uniformity of the pattern line width after development is further improved.

(3) Third Invention In a developing device according to a third aspect of the present invention, in the configuration of the developing device according to the first or second aspect, the control means changes the rotation direction for each rotation of the substrate by the driving means. It is to reverse.

Thus, the effect of the flow of the developer on the photosensitive film can be made uniform. As a result, the symmetry and the rectangularity of the pattern shape after development are improved.

(4) Fourth Invention In the developing device according to the fourth invention, in the configuration of the developing device according to the second or third invention, the predetermined number of times is two or more and five or more.
It is characterized by being less than times. Thereby, the phenomenon of non-uniform aggregation of dissolved products due to the growth of fluctuations is sufficiently avoided, and the uniformity of the pattern line width after development is further improved.

(5) Fifth Invention In the developing device according to the fifth invention, in the configuration of the developing device according to any one of the first to fourth inventions, the fixed time is 1 second or more and 5 seconds or less. It is characterized by. Thereby, the phenomenon of non-uniform aggregation of dissolved products due to the growth of fluctuations is sufficiently avoided, and the uniformity of the pattern line width after development is further improved.

(6) Sixth Invention According to a sixth aspect of the present invention, in the developing device according to any one of the first to fifth aspects, the predetermined number of rotations is 5 or more.
The rotation speed is not less than 25 rpm and not more than 25 rpm. Thereby, the phenomenon of non-uniform aggregation of dissolved products due to the growth of fluctuations is sufficiently avoided, and the uniformity of the pattern line width after development is further improved.

(7) Seventh Invention In the developing device according to the seventh invention, in the configuration of the developing device according to any one of the first to sixth inventions, the predetermined time is 0.5.
It is characterized by being not less than seconds and not more than 5 seconds. This allows
The uneven aggregation phenomenon of the dissolved product due to the growth of fluctuation is sufficiently avoided, and the uniformity of the pattern line width after development is further improved.

(8) Eighth Invention In the developing device according to the eighth invention, in the configuration of the developing device according to any one of the first to seventh inventions, the developing solution discharge nozzle has a slit-shaped discharge port. It is characterized by the following. In this case, the developer is simultaneously supplied to a region having a constant width.

(9) Ninth Invention According to a ninth aspect of the present invention, in the configuration of the developing device according to any one of the first to eighth aspects, the moving means includes a slit-shaped discharge nozzle for the developer discharging nozzle. It is characterized by being moved in a direction substantially perpendicular to the outlet.

In this case, since the slit-shaped discharge port of the developing solution discharge nozzle is linearly scanned on the substrate, the developing solution can be uniformly supplied to a wide area on the substrate.

(10) Tenth Invention The developing method according to the tenth invention is directed to a developing method which passes over the substrate from one side outside the substrate and is held stationary by the substrate holding means, and the other side outside the substrate. Supplying the developing solution onto the substrate while moving the developing solution discharge nozzle to the position, and after a certain period of time from the end of the supply of the developing solution onto the substrate by the developing solution discharge nozzle, the substrate held by the substrate holding means is removed. Having the substrate held by the substrate holding means in a stationary state for a predetermined time after being rotated at a predetermined number of rotations.

In the developing method according to the present invention, the developing solution discharge nozzle is moved from one position outside the substrate, which is held stationary by the substrate holding means, over the substrate to the other position outside the substrate. By doing so, the developer is supplied onto the stationary substrate. After a lapse of a predetermined time from the end of the supply of the developing solution onto the substrate by the developing solution discharge nozzle, the substrate is rotated at a predetermined number of revolutions, and then the substrate is kept stationary for a predetermined time.

After a certain period of time from the end of the supply of the developing solution, dissolved products are actively generated in the course of development. At this stage, by rotating the substrate at a predetermined number of revolutions and then stopping, the non-uniform aggregation phenomenon of the dissolved product due to the growth of fluctuation is avoided by physical fluctuation. As a result, the uniformity of the pattern line width after development is improved.

[0035]

FIG. 1 is a plan view of a developing device according to an embodiment of the present invention. FIG.
FIG. 3 is a sectional view taken along line X-Y of FIG.
It is a line sectional view.

As shown in FIG. 2 and FIG. 3, the developing device includes a substrate holding section 1 for sucking and holding the substrate 100 in a horizontal posture.
Is provided. The substrate holding unit 1 is fixed to a tip of a rotating shaft 3 of a motor 2 and is configured to be rotatable around a vertical axis. Around the substrate holding portion 1, a circular inner cup 4 is provided so as to freely move up and down so as to surround the substrate 100. A square outer cup 5 is provided around the inner cup 4.

As shown in FIG. 1, standby pots 6 and 7 are arranged on both sides of the outer cup 5, respectively.
A guide rail 8 is disposed on one side of the guide rail.
The nozzle arm 9 is provided so as to be movable in the scanning direction A and the opposite direction along the guide rail 8 by the arm driving unit 10. On the other side of the outer cup 5, a pure water discharge nozzle 12 for discharging pure water is provided rotatably in the direction of arrow R.

A developing solution discharge nozzle 11 having a slit-shaped discharge port 15 at the lower end thereof is attached to the nozzle arm 9 perpendicularly to the guide rail 8. As a result, the developer discharge nozzle 11 moves the substrate 100 from the position of the standby pot 6.
It is possible to move in a straight line parallel along the scanning direction A to the position of the standby pot 7 after passing through the upper side.

As shown in FIG. 2, the developing solution discharge nozzle 11
Is supplied with a developer by a developer supply system 14. The control unit 13 controls the rotation operation of the motor 2, the scanning of the developer discharge nozzle 11 by the arm drive unit 10, and the discharge of the developer from the developer discharge nozzle 11.

In this embodiment, the substrate holding unit 1 corresponds to a substrate holding unit, the arm driving unit 10 corresponds to a moving unit, the motor 2 corresponds to a driving unit, and the control unit 13 corresponds to a control unit.

As shown in FIG.
Are arranged perpendicular to the scanning direction A of the developer discharge nozzle 11. The slit width t of the slit-shaped discharge port 15 is 0.05 to
It is 1.0 mm, and in this embodiment, it is 0.2 mm. In addition, the discharge width L of the slit-shaped discharge port 15 is set to be equal to or larger than the diameter of the substrate 100 to be processed. When the substrate 100 having a diameter of 8 inches is processed, in this embodiment, 210 mm is used. Is set to

The developing solution discharge nozzle 11 has a bottom surface
The scanning is performed in the scanning direction A so as to maintain a state parallel to the surface of the zero. The distance between the slit-shaped discharge port 15 and the surface of the substrate 100 is 0.2 to 5 mm, more preferably 0.5 to 5 mm.
It is 2 mm, and 1.5 mm in this embodiment.

Next, referring to FIGS. 5 and 6, FIG.
The operation of the developing device will be described. As shown in FIG. 5A, the substrate 100 is held by the substrate holding unit 1 in a stationary state. During standby, the developer discharge nozzle 11 is waiting at a position P <b> 0 in the standby pot 6. During the development processing, the developer discharge nozzle 11 moves up in the scanning direction A after rising, and then descends at the scanning start position P1 in the outer cup 5.

Thereafter, the developing solution discharge nozzle 11 starts scanning at a predetermined scanning speed from the scanning start position P1. At this time, the developer is not yet discharged from the developer discharge nozzle 11. In this embodiment, the scanning speed is 10 to 500 m
m / sec.

After the scanning of the developing solution discharge nozzle 11 is started, the slit-shaped discharge port 15 of the developing solution discharging nozzle 11
Before reaching the upper side, the discharge of the developer by the developer discharge nozzle 11 is started at a predetermined flow rate at the discharge start position P2.
In this embodiment, the flow rate of the developer is set to 1.2 L / min.

The developing solution discharge nozzle 11 scans the substrate 100 from the discharging start position P2 in the scanning direction A while discharging the developing solution.
(See FIG. 6). Thereby, the substrate 1
The developer is continuously supplied to the entire surface of No. 00. The supplied developer is held on the substrate 100 by the surface tension (a liquid level).

After the developer discharge nozzle 11 has passed over the substrate 100, the discharge of the developer by the developer discharge nozzle 11 is stopped at the discharge stop position P3 off the substrate 100. When the developer discharge nozzle 11 reaches the scan stop position P4 in the outer cup 5, the developer discharge nozzle 1
1 is stopped.

Thereafter, the developing solution discharge nozzle 11 rises at the scanning stop position P4, and then moves to the position P of the other standby pot 7.
5 and descends into the standby pot 7.

As shown in FIG. 5B, after completion of the liquid filling,
The state in which the developer is supplied to the stationary substrate 100 is defined as 1
~ 5 seconds, more preferably 2-4 seconds (3 seconds in this embodiment)
maintain.

Thereafter, as shown in FIG. 5C, the substrate 100 is rotated by the substrate holder 1 at a rotation speed of 5 to 25 rpm, preferably 10 to 20 rpm (15 rpm in this embodiment). The rotational acceleration in this case is 10 to 300
rpm / sec, desirably 20 to 50 rpm / sec (30 rpm / sec in the present embodiment). After the substrate 100 is rotated for 1 to 2 seconds (1.5 seconds in this embodiment), the substrate 100 is decelerated and stopped at the same deceleration as during acceleration.

Then, as shown in FIG.
00 is kept in a stationary state for 0.5 to 5 seconds (2 seconds in this embodiment).

Under the same conditions as above, the substrate 10 shown in FIG.
The rotation of 0 and the stationary holding of FIG. 5D are repeated 2 to 5 times, preferably 3 times. At this time, the rotation direction is reversed every time the substrate 100 rotates.

Thereafter, the substrate 100 is rotated, for example, at a rotation speed of about 1000 rpm, and pure water is supplied to the substrate 100 from the rinsing liquid discharge nozzle 12 for cleaning, the development is stopped, and a rinsing process is performed with pure water.

Finally, the supply of pure water by the rinsing liquid discharge nozzle 12 is stopped, and the substrate 100 is moved to, for example, 4000 rpm.
m, and shake off the pure water from the substrate 100.
Dry 00. After that, the rotation of the substrate 100 is stopped, and the developing process ends.

In the development process, dissolved products are actively generated during the progress of the development after 1 to 5 lapses from the loading on the substrate 100. According to the developing method of the present embodiment, 1 to 1
By repeating the low-speed rotation of the substrate 100 a plurality of times after the lapse of 5 seconds, it is possible to effectively prevent the non-uniform condensation phenomenon of the dissolved product due to the growth of the fluctuation by physical fluctuation. As a result, the in-plane uniformity of the pattern line width after development is improved.

Further, by inverting the direction of rotation for each rotation of the substrate 100, the effect of the flow of the developer on the resist pattern can be made uniform. As a result, the symmetry and the rectangularity of the resist pattern shape are improved.

Hereinafter, the step of rotating the substrate 100 in FIG. 5C is referred to as a stirring step. Here, the relationship between the number of times of the stirring step, the start delay time, the number of rotations, the acceleration time, the deceleration time, and the time interval of FIG. 5C and the uniformity of the pattern line width was measured. The measurement results are shown in Tables 1 to 6 and FIGS. In the figure, a black square indicates the average value of the pattern line width after development, and a black circle indicates 3σ. σ is the standard deviation of the pattern line width, and 3σ is the variation in the pattern line width after development. In each measurement, other conditions were selected such that the uniformity of the pattern line width after development was the best.

Table 1 and FIG. 7 show the measurement results of the relationship between the number of times of the stirring step, the pattern line width after development, and 3σ.

[0059]

[Table 1]

As shown in Table 1 and FIG. 7, when the number of times of the stirring step is three, 3σ is the smallest.

Table 2 and FIG. 8 show the measurement results of the relationship between the start delay time of the stirring step, the pattern line width after development, and 3σ. The start delay time is a time during which the state in which the developing solution is supplied onto the substrate 100 in a stationary state in FIG. 5B is maintained.

[0062]

[Table 2]

As shown in Table 2 and FIG. 8, when the start delay time of the stirring step is 3.0 seconds, 3σ is minimum.

Table 3 and FIG. 9 show the measurement results of the relationship between the rotation speed in the stirring step, the pattern line width after development, and 3σ.

[0065]

[Table 3]

As shown in Table 3 and FIG.
In the case of 5 rpm, 3σ is minimum.

Table 4 and FIG. 10 show the measurement results of the relationship between the acceleration time of the stirring step, the pattern line width after development, and 3σ.

[0068]

[Table 4]

As shown in Table 4 and FIG. 10, when the acceleration time is 0.50 seconds, 3σ is minimum.

Table 5 and FIG. 11 show the measurement results of the relationship between the deceleration time of the stirring step, the pattern line width after development, and 3σ.

[0071]

[Table 5]

As shown in Table 5 and FIG. 11, when the deceleration time is 0.50 seconds, 3σ is minimum.

Table 6 and FIG. 12 show the measurement results of the relationship between the time interval of the stirring step, the pattern line width after development, and 3σ. The time interval of the stirring step is a time during which the substrate 100 is kept stationary in FIG.

[0074]

[Table 6]

As shown in Table 6 and FIG. 12, when the time interval of the stirring step is 1.00 seconds, 3σ is minimum.

According to the developing method of this embodiment, 0.5 μm
In the line pattern, 3σ representing the variation of the pattern line width became 14 nm or less. In contrast, FIG.
When the rotation shown in FIG. 5C and the stationary state shown in FIG. 5D were not performed, 3σ was about 26 to 32 nm in the same 0.5 μm line pattern. As described above, according to the developing method of the present embodiment, the in-plane uniformity of the pattern line width after the development was greatly improved.

Further, in the developing device of the present embodiment, the discharge of the developing solution is started before the developing solution discharging nozzle 11 reaches the stationary substrate 100, so that the developing solution at the start of the discharging may impact the substrate 100. Is avoided. Thereby, generation of bubbles in the developer is suppressed, and generation of development defects is prevented.

Further, while the developing solution discharge nozzle 11 is moving, the developing solution near the slit-shaped discharge port 15 which comes into contact with the air is discarded outside the substrate 100, and the developing solution discharge nozzle 11
At the time when the developer reaches 0, a new developer is supplied from the developer discharge nozzle 11 onto the stationary substrate 100. This prevents development defects caused by the deteriorated developer solution and prevents particles generated by drying the developer solution from adhering to the surface of the photosensitive film on the substrate 100.

Further, the developing solution discharge nozzle 11 is horizontally and linearly moved in parallel with the slit-shaped discharge port 15 and the upper surface of the substrate 100 on the substrate 100 on which the developing solution discharge nozzle 11 is stationary.
Since the strip-shaped developer formed in the slit-shaped discharge port 15 continuously contacts the surface of the substrate 100, the developer is uniformly supplied to the entire surface of the substrate 100 without applying an impact to the surface of the substrate 100.

Further, the developing solution discharge nozzle 11 is
Since the supply of the developer is continued until the developer passes above, an adverse effect on the developer in the liquid pool due to the impact at the time of stopping the discharge is prevented. As a result, the occurrence of development defects is suppressed, and the line width uniformity of the photosensitive film pattern after development is improved.

Further, the developing solution discharge nozzle 11 is
Since the discharge of the developer is stopped after passing over, the impact of the dripping of the developer at the time of stopping the discharge on the photosensitive film on the substrate 100 is prevented. Therefore, occurrence of development defects and deterioration of line width uniformity of the photosensitive film pattern are prevented.

In the above embodiment, the case where the present invention is applied to a developing apparatus and a developing method using a developing solution discharge nozzle having a slit-shaped discharge port has been described.
If a developing device and a developing method of a paddle developing method of supplying a developing solution to a substrate in a stationary state and performing a developing process with the developing solution held on the substrate, a developing device using another developing solution discharge nozzle and The present invention can be applied to a developing method.

[Brief description of the drawings]

FIG. 1 is a plan view of a developing device according to an embodiment of the present invention.

FIG. 2 is a sectional view taken along line XX of a main part of the developing device of FIG.

FIG. 3 is a sectional view taken along line YY of a main part of the developing device of FIG.

FIG. 4 is a diagram showing a slit-shaped discharge port of a developer discharge nozzle.

FIG. 5 is a diagram for explaining the operation of the developing device of FIG. 1;

FIG. 6 is a plan view showing scanning of a developing solution discharge nozzle on a substrate.

FIG. 7 is a diagram showing a measurement result of a relationship between the number of times of a stirring process and a pattern line width after development and a variation thereof.

FIG. 8 is a diagram showing a measurement result of a relationship between a start delay time of a stirring process and a pattern line width after development and a variation thereof.

FIG. 9 is a diagram showing a measurement result of a relationship between the number of rotations in a stirring process and a pattern line width after development and a variation thereof.

FIG. 10 is a diagram showing a measurement result of a relationship between an acceleration time of a stirring process, a pattern line width after development, and a variation thereof.

FIG. 11 is a diagram showing a measurement result of a relationship between a deceleration time of a stirring process and a pattern line width after development and a variation thereof.

FIG. 12 is a diagram showing a measurement result of a relationship between a time interval of a stirring process, a pattern line width after development, and its variation.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Substrate holding part 8 Guide rail 9 Nozzle arm 10 Nozzle drive part 11 Developer discharge nozzle 14 Developer supply system 13 Control part 15 Slit-shaped discharge port

Continuing from the front page (72) Inventor Moritaka Yano 4-chome Tenjin Kitamachi 1-chome, Horikawa-dori Terauchi, Kamigyo-ku, Kyoto Dainippon Screen Mfg. Co., Ltd.

Claims (10)

[Claims] 1. A substrate holding means for holding a substrate in a horizontal posture, a developing solution discharge nozzle for discharging a developing solution, and a position on one side outside the substrate which is held by the substrate holding means in a stationary state. Moving means for moving the developing solution discharge nozzle to a position on the other side outside the substrate, driving means for rotating and driving the substrate holding means, supply of the developing solution onto the substrate by the developing solution discharge nozzle Control means for rotating the substrate held by the substrate holding means by a predetermined number of revolutions after a lapse of a predetermined time from the end, and then holding the substrate in a stationary state for a predetermined time by the substrate holding means. A developing device, characterized in that: 2. The developing apparatus according to claim 1, wherein the control unit repeats the rotation of the substrate by the driving unit and the holding of the substrate in a stationary state by the substrate holding unit a predetermined number of times. 3. The developing device according to claim 2, wherein said control means reverses the direction of rotation each time the driving means rotates the substrate. 4. The developing device according to claim 2, wherein the predetermined number is two or more and five or less. 5. The developing device according to claim 1, wherein the predetermined time is 1 second or more and 5 seconds or less. 6. The predetermined rotation speed is not less than 5 rpm and not more than 25 r.
pm or less. 7. The developing device according to claim 1, wherein the predetermined time is 0.5 seconds or more and 5 seconds or less. 8. The developing device according to claim 1, wherein the developing solution discharge nozzle has a slit-shaped discharge port. 9. The developing device according to claim 8, wherein said moving means moves said developing solution discharge nozzle in a direction substantially perpendicular to said slit-shaped discharge port. 10. A developing solution discharge nozzle is moved from one position outside the substrate, held stationary by the substrate holding means, over the substrate to the other position outside the substrate while moving the developing solution onto the substrate. Supplying the developing solution onto the substrate by the developing solution discharge nozzle, and after a lapse of a predetermined time, rotating the substrate held by the substrate holding device at a predetermined number of revolutions, and then rotating the substrate holding device. And holding the substrate in a stationary state for a predetermined period of time.