JPH11273581A - Ecr ion source - Google Patents

Abstract

PROBLEM TO BE SOLVED: To easily install and remove an inner wall of a plasma chamber and the contents, and facilitate maintenance work by arranging a stand movable in the direction for separating the plasma chamber or an Einzel vacuum chamber. SOLUTION: In maintenance a clamp 48 is released, and a moving stand 40 is moved into the beam upstream by a rail 42 to be fixed by an upstream clamp 50. Therefore, an interval between an insulating seat 18 and a plasma chamber 14 is sufficiently opened to easily perform the maintenance in the plasma chamber 14 from the beam upstream. After finishing the maintenance, the clamp 50 is released, and the moving stand 40 is moved up to striking on a stopper 44 so that a vacuum O-ring 20 is pressed down by the plasma chamber 14 by using the clamp 48. Both the plasma chamber 14, a vacuum chamber 26 and an Einzel vacuum chamber 22 are maintained in a vacuum state. Therefore, damage of an apparatus at maintenance time is prevented, work time is reduced, and an operation rate of the apparatus is increased to reduce a labor cost.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ECR ion source that uses a solid such as a metal oxide as an ion generation source and generates multiply charged ions of a metal, and more particularly to an ECR ion source that is easy to maintain.

[0002]

2. Description of the Related Art There is known an ion implanter which is a fusion of a particle accelerator and an isotope separator used in high energy physics or nuclear physics. As one of the ion sources used in this ion implantation apparatus, a microwave ion source is used as a multi-charged ion generating source using an ECR discharge. In recent years, a strong magnetic field has been applied to use an ECR discharge. Accordingly, a monovalent high-current ion beam is also taken out.

As shown in FIG. 1, for example, such an ion source includes an ECR body 10 provided with a hexapole magnet 12 for increasing ionization efficiency, and a beam upstream side (right side in the figure) of the ECR body 10. Plasma chamber 14 inserted from
And an anode electrode 16 inserted and held in the plasma chamber 14 by, for example, fitting, and a vacuum O-ring 20 sandwiched between the plasma chamber 14 while being electrically insulated from the plasma chamber 14 by, for example, an insulating seat 18. Einzel vacuum chamber 2 arranged opposite to plasma chamber 14
2 and a male-threaded extraction electrode which is inserted substantially along the axis of the plasma chamber 14 and in the vicinity of the anode electrode 16 in a state of being screwed into a female screw cut into the Einzel vacuum chamber 22. 24.

In FIG. 1, reference numeral 26 denotes a vacuum chamber disposed upstream of the plasma chamber 14 on the beam side;
Is a microwave waveguide connected to the vacuum chamber 26, 30 is a cooling water pipe connected to the plasma chamber 14, and 32 is the ECR body 10 and the Einzel vacuum chamber 22 are fixed together. A fixed frame,
During operation, the plasma chamber 14, the vacuum chamber 2
6 and the inside of the Einzel vacuum chamber 22 are both in a vacuum state.

In such an ECR ion source, since the dissolved solid metal adheres to the inner wall of the plasma chamber 14 and its contents (the anode electrode 16 and the extraction electrode 24), the inside of the chamber is frequently cleaned and maintained. There is a need to.

Therefore, conventionally, the plasma chamber 14 has been disassembled into pieces and then cleaned by the following procedure.

The waveguide 28 and the exhaust port (not shown) connected to the vacuum chamber 26 on the beam upstream side of the ECR body 10 are removed. The vacuum chamber 26 is removed from the ECR body 10. The cooling water pipe 30 connected to the plasma chamber 14 is removed. The plasma chamber 14 is pulled out of the ECR main body 10. Remove the Einzel vacuum chamber 22. Remove and clean the electrodes from each chamber.

[0008]

As described above, the conventional ECR ion source requires the complicated operations (1) to (4) for maintenance of the plasma chamber 14. The mechanically weak parts (articles) (waveguide 28, plasma chamber 14, vacuum sealing surface of each part, etc.) may be damaged. In addition, there is a problem in that not only is the maintenance time taken very long, but not only the operating time of the equipment is lost, but also the maintenance labor costs are extremely high.

SUMMARY OF THE INVENTION The present invention has been made in order to solve the above-mentioned conventional problems, and has as its object to facilitate installation and removal of the inner wall of the plasma chamber and its contents, thereby facilitating maintenance.

[0010]

SUMMARY OF THE INVENTION The present invention provides a plasma chamber inserted into an ECR body for generating a metal multiply charged ion using a solid such as a metal oxide as an ion generation source, and a plasma chamber. An anode electrode inserted and held in the chamber; an Einzel vacuum chamber disposed opposite to the plasma chamber in a state of being electrically insulated from the plasma chamber; and the plasma fixed in the Einzel vacuum chamber. In an ECR ion source having an extraction electrode inserted along the axis of the chamber to the vicinity of the anode electrode, a moving gantry on which the plasma chamber or the Einzel vacuum chamber is mounted and which moves in a direction to separate them is provided. By providing the above, the above problem is solved.

Further, the maintenance work is further facilitated by providing a stopper for positioning the moving gantry and a fixing mechanism for fixing the moving gantry, such as a clamp or a bolt.

[0012]

Embodiments of the present invention will be described below in detail with reference to the drawings.

In this embodiment, an ECR ion source similar to the conventional example shown in FIG. 1 is used.
As shown in FIG. 3 (maintenance position), the ECR main body 10 to which the plasma chamber 14 and the vacuum chamber 26 are attached is moved to the Einzel vacuum chamber 22.
A movable gantry 40 is provided for moving in a direction in which the moving gantry is separated from the cradle.

The wheels 41 of the movable gantry 40 run on rails 42 fixed on the fixed gantry 32, and have a sufficient stroke required for maintenance work on the fixed gantry 32. It can be moved.

At the end of the rail 42 on the side of the Einzel vacuum chamber 22 (left side in the figure), an EC for operating the ion source is provided.
A stopper 44 for positioning the R body 10 is provided. The ECR body 1 under maintenance is attached to the end of the rail 42 on the vacuum chamber 26 side (right side in the figure).
A stopper 46 for positioning 0 is provided. Further, at both ends of the seal 42, the movable gantry 40 is located at an ion source operating position and a maintenance position, respectively.
Clamps 48 and 50 are provided to fix the vacuum O-ring 20 inserted between the insulating seat 18 and the plasma chamber 14 with a sufficient force, particularly in the ion source operating position. Has been.

Hereinafter, the operation of the present embodiment will be described.

For maintenance, the clamp 48
Is released, and the movable gantry 40 can move on the rail 42.

The movable gantry 40 is moved to the upstream side (right side in the figure) of the beam and fixed by the clamp 50 on the upstream side.

As described above, as shown in FIG. 3, the space between the insulating seat 18 and the plasma chamber 14 is sufficiently opened, and maintenance in the plasma chamber 14 from the beam upstream side can be easily performed.

After the maintenance is completed, the clamp 50 is released, the movable base 40 is moved to a position where it comes into contact with the stopper 44, and the vacuum O-ring 20 is pressed by the plasma chamber 14 with a sufficient force using the clamp 48. , Returning to the state shown in FIG.
Vacuum chamber 26 and Einzel vacuum chamber 22
However, both are maintained in a vacuum state in which ions can be generated.

In the above embodiment, the Einzel vacuum chamber 22 is fixed on the fixed base 32,
The CR body 10 was moved on the rails 42. On the contrary, the ECR body 10 to which the plasma chamber 14 and the vacuum chamber 26 were fixed was fixed to the fixed base 32, and the Einzel vacuum chamber 22 was moved. The ECR main body 10 and the Einzel vacuum chamber 22 can be mounted on different mounts, or both can be moved in a direction in which they are separated from each other.

In some cases, the ECR main body 10 may be installed vertically. In this case, the ECR main body 10 may be moved by nuts or screws instead of the wheels 41 and rails 42.

Further, instead of the clamps 48 and 50, it is also possible to fix them with bolts.

[0024]

According to the present invention, it is not necessary to remove each chamber from the ECR main body during maintenance work of the plasma chamber or the like, or the chambers can be easily removed and maintenance can be easily performed. Therefore, it is possible to prevent the equipment from being damaged during the maintenance work and to reduce the cost of spare parts.
In addition, the time required for maintenance can be reduced, and the operation rate of the device can be increased. Further, labor costs related to maintenance can be reduced.

[Brief description of the drawings]

FIG. 1 is a cross-sectional view showing a configuration of a conventional ECR ion source.

FIG. 2 is a sectional view showing an ion source operating position in the ECR ion source according to the embodiment of the present invention.

FIG. 3 is a sectional view showing a maintenance position.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 10 ... ECR main body 14 ... Plasma chamber 16 ... Anode electrode 22 ... Einzel vacuum chamber 24 ... Extraction electrode 26 ... Vacuum chamber 32 ... Fixed gantry 40 ... Movable gantry 42 ... Rail 44,46 ... Stopper 48,50 ... Clamp

Claims (3)

[Claims] 1. A plasma chamber inserted into an ECR body for generating polyvalent ions of a metal using a solid such as a metal oxide as an ion generation source, and an anode inserted and held in the plasma chamber. An electrode, an Einzel vacuum chamber opposed to the plasma chamber in a state of being electrically insulated from the plasma chamber, and a state substantially fixed along the Einzel vacuum chamber along a substantially axis of the plasma chamber. An ECR ion source having an extraction electrode inserted to the vicinity of the anode electrode, wherein the plasma chamber or the Einzel vacuum chamber is mounted, and an ECR is provided. Ion source. 2. An ECR ion source according to claim 1, further comprising a stopper for positioning said movable gantry and a fixing mechanism for fixing said movable gantry. . 3. The ECR ion source according to claim 2, wherein said fixing mechanism is a clamp.
CR ion source.