JPH11262730A - Production of hydrophilic composite material having photocataly tic film - Google Patents
Production of hydrophilic composite material having photocataly tic filmInfo
- Publication number
- JPH11262730A JPH11262730A JP10084896A JP8489698A JPH11262730A JP H11262730 A JPH11262730 A JP H11262730A JP 10084896 A JP10084896 A JP 10084896A JP 8489698 A JP8489698 A JP 8489698A JP H11262730 A JPH11262730 A JP H11262730A
- Authority
- JP
- Japan
- Prior art keywords
- coating
- silica
- photocatalytic
- film
- precursor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000001699 photocatalysis Effects 0.000 title claims abstract description 21
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 10
- 239000002131 composite material Substances 0.000 title claims abstract description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 94
- 239000011248 coating agent Substances 0.000 claims abstract description 52
- 238000000576 coating method Methods 0.000 claims abstract description 48
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 47
- 239000002243 precursor Substances 0.000 claims abstract description 25
- 239000000463 material Substances 0.000 claims abstract description 22
- 239000003054 catalyst Substances 0.000 claims abstract description 14
- 230000007062 hydrolysis Effects 0.000 claims abstract description 9
- 238000006460 hydrolysis reaction Methods 0.000 claims abstract description 9
- 238000000034 method Methods 0.000 claims description 18
- 239000000758 substrate Substances 0.000 claims description 12
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 10
- 229910017604 nitric acid Inorganic materials 0.000 claims description 10
- 239000012298 atmosphere Substances 0.000 claims description 8
- 239000000725 suspension Substances 0.000 claims description 5
- 150000001412 amines Chemical class 0.000 claims description 4
- 239000000126 substance Substances 0.000 abstract description 26
- 230000000694 effects Effects 0.000 abstract description 5
- 230000001443 photoexcitation Effects 0.000 abstract description 4
- 238000000354 decomposition reaction Methods 0.000 abstract 1
- -1 phenyldiethoxysilane Chemical class 0.000 description 47
- 239000010408 film Substances 0.000 description 36
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 21
- 239000000203 mixture Substances 0.000 description 18
- 239000000243 solution Substances 0.000 description 17
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 16
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 13
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 7
- 239000003513 alkali Substances 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- 229920001296 polysiloxane Polymers 0.000 description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- 239000002585 base Substances 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 230000018044 dehydration Effects 0.000 description 6
- 238000006297 dehydration reaction Methods 0.000 description 6
- 239000010419 fine particle Substances 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 239000011941 photocatalyst Substances 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 229920001214 Polysorbate 60 Polymers 0.000 description 4
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000012153 distilled water Substances 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 4
- 150000004756 silanes Chemical class 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 4
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 229910018557 Si O Inorganic materials 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000012670 alkaline solution Substances 0.000 description 3
- 239000008199 coating composition Substances 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 235000014113 dietary fatty acids Nutrition 0.000 description 3
- 239000000194 fatty acid Substances 0.000 description 3
- 229930195729 fatty acid Natural products 0.000 description 3
- 239000005357 flat glass Substances 0.000 description 3
- 230000005923 long-lasting effect Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 3
- 238000010422 painting Methods 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 159000000000 sodium salts Chemical class 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 3
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 3
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 3
- QWOZZTWBWQMEPD-UHFFFAOYSA-N 1-(2-ethoxypropoxy)propan-2-ol Chemical compound CCOC(C)COCC(C)O QWOZZTWBWQMEPD-UHFFFAOYSA-N 0.000 description 2
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 2
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 2
- BMVXCPBXGZKUPN-UHFFFAOYSA-N 1-hexanamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 description 2
- VBICKXHEKHSIBG-UHFFFAOYSA-N 1-monostearoylglycerol Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCC(O)CO VBICKXHEKHSIBG-UHFFFAOYSA-N 0.000 description 2
- 229940054273 1-propoxy-2-propanol Drugs 0.000 description 2
- FENFUOGYJVOCRY-UHFFFAOYSA-N 1-propoxypropan-2-ol Chemical compound CCCOCC(C)O FENFUOGYJVOCRY-UHFFFAOYSA-N 0.000 description 2
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 2
- MXZROAOUCUVNHX-UHFFFAOYSA-N 2-Aminopropanol Chemical compound CCC(N)O MXZROAOUCUVNHX-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 2
- WAEVWDZKMBQDEJ-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical compound COC(C)COC(C)COC(C)CO WAEVWDZKMBQDEJ-UHFFFAOYSA-N 0.000 description 2
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 2
- XBIUWALDKXACEA-UHFFFAOYSA-N 3-[bis(2,4-dioxopentan-3-yl)alumanyl]pentane-2,4-dione Chemical compound CC(=O)C(C(C)=O)[Al](C(C(C)=O)C(C)=O)C(C(C)=O)C(C)=O XBIUWALDKXACEA-UHFFFAOYSA-N 0.000 description 2
- ZYAASQNKCWTPKI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propan-1-amine Chemical compound CO[Si](C)(OC)CCCN ZYAASQNKCWTPKI-UHFFFAOYSA-N 0.000 description 2
- KHLRJDNGHBXOSV-UHFFFAOYSA-N 5-trimethoxysilylpentane-1,3-diamine Chemical compound CO[Si](OC)(OC)CCC(N)CCN KHLRJDNGHBXOSV-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- NWGKJDSIEKMTRX-AAZCQSIUSA-N Sorbitan monooleate Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O NWGKJDSIEKMTRX-AAZCQSIUSA-N 0.000 description 2
- IYFATESGLOUGBX-YVNJGZBMSA-N Sorbitan monopalmitate Chemical compound CCCCCCCCCCCCCCCC(=O)OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O IYFATESGLOUGBX-YVNJGZBMSA-N 0.000 description 2
- HVUMOYIDDBPOLL-XWVZOOPGSA-N Sorbitan monostearate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O HVUMOYIDDBPOLL-XWVZOOPGSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- LWZFANDGMFTDAV-BURFUSLBSA-N [(2r)-2-[(2r,3r,4s)-3,4-dihydroxyoxolan-2-yl]-2-hydroxyethyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O LWZFANDGMFTDAV-BURFUSLBSA-N 0.000 description 2
- ZIQPQYFSSSHQBP-UHFFFAOYSA-N acetyl 2,3-dihydroxypropanoate Chemical compound CC(=O)OC(=O)C(O)CO ZIQPQYFSSSHQBP-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 125000005907 alkyl ester group Chemical group 0.000 description 2
- 125000005037 alkyl phenyl group Chemical group 0.000 description 2
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 2
- SMZOGRDCAXLAAR-UHFFFAOYSA-N aluminium isopropoxide Chemical compound [Al+3].CC(C)[O-].CC(C)[O-].CC(C)[O-] SMZOGRDCAXLAAR-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- ZRGUXTGDSGGHLR-UHFFFAOYSA-K aluminum;triperchlorate Chemical compound [Al+3].[O-]Cl(=O)(=O)=O.[O-]Cl(=O)(=O)=O.[O-]Cl(=O)(=O)=O ZRGUXTGDSGGHLR-UHFFFAOYSA-K 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 239000004566 building material Substances 0.000 description 2
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 description 2
- 239000004568 cement Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- FJDJVBXSSLDNJB-LNTINUHCSA-N cobalt;(z)-4-hydroxypent-3-en-2-one Chemical compound [Co].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O FJDJVBXSSLDNJB-LNTINUHCSA-N 0.000 description 2
- 239000004567 concrete Substances 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- VGWJKDPTLUDSJT-UHFFFAOYSA-N diethyl dimethyl silicate Chemical compound CCO[Si](OC)(OC)OCC VGWJKDPTLUDSJT-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 2
- XWBDWHCCBGMXKG-UHFFFAOYSA-N ethanamine;hydron;chloride Chemical compound Cl.CCN XWBDWHCCBGMXKG-UHFFFAOYSA-N 0.000 description 2
- 150000002169 ethanolamines Chemical class 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 150000004665 fatty acids Chemical class 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- KWIUHFFTVRNATP-UHFFFAOYSA-N glycine betaine Chemical compound C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- SYECJBOWSGTPLU-UHFFFAOYSA-N hexane-1,1-diamine Chemical compound CCCCCC(N)N SYECJBOWSGTPLU-UHFFFAOYSA-N 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- SCVFZCLFOSHCOH-UHFFFAOYSA-M potassium acetate Chemical compound [K+].CC([O-])=O SCVFZCLFOSHCOH-UHFFFAOYSA-M 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 150000003839 salts Chemical group 0.000 description 2
- FSYKKLYZXJSNPZ-UHFFFAOYSA-N sarcosine Chemical compound C[NH2+]CC([O-])=O FSYKKLYZXJSNPZ-UHFFFAOYSA-N 0.000 description 2
- 125000005372 silanol group Chemical group 0.000 description 2
- 239000000344 soap Substances 0.000 description 2
- 229950006451 sorbitan laurate Drugs 0.000 description 2
- 235000011067 sorbitan monolaureate Nutrition 0.000 description 2
- 229950004959 sorbitan oleate Drugs 0.000 description 2
- 229950003429 sorbitan palmitate Drugs 0.000 description 2
- 229950011392 sorbitan stearate Drugs 0.000 description 2
- 239000004575 stone Substances 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 150000003609 titanium compounds Chemical class 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 2
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 2
- DAOVYDBYKGXFOB-UHFFFAOYSA-N tris(2-methylpropoxy)alumane Chemical compound [Al+3].CC(C)C[O-].CC(C)C[O-].CC(C)C[O-] DAOVYDBYKGXFOB-UHFFFAOYSA-N 0.000 description 2
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten trioxide Chemical compound O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- JNYAEWCLZODPBN-JGWLITMVSA-N (2r,3r,4s)-2-[(1r)-1,2-dihydroxyethyl]oxolane-3,4-diol Chemical compound OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O JNYAEWCLZODPBN-JGWLITMVSA-N 0.000 description 1
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
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- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
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- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- ZLGWXNBXAXOQBG-UHFFFAOYSA-N triethoxy(3,3,3-trifluoropropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC(F)(F)F ZLGWXNBXAXOQBG-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- BJDLPDPRMYAOCM-UHFFFAOYSA-N triethoxy(propan-2-yl)silane Chemical compound CCO[Si](OCC)(OCC)C(C)C BJDLPDPRMYAOCM-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- LGROXJWYRXANBB-UHFFFAOYSA-N trimethoxy(propan-2-yl)silane Chemical compound CO[Si](OC)(OC)C(C)C LGROXJWYRXANBB-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- VUWVDNLZJXLQPT-UHFFFAOYSA-N tripropoxy(propyl)silane Chemical compound CCCO[Si](CCC)(OCCC)OCCC VUWVDNLZJXLQPT-UHFFFAOYSA-N 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 235000021269 warm food Nutrition 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Landscapes
- Mirrors, Picture Frames, Photograph Stands, And Related Fastening Devices (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Catalysts (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、基材表面を親水性
になし、且つ維持することの可能な光触媒性被膜を備え
た親水性複合材を製造する方法。The present invention relates to a method for producing a hydrophilic composite material provided with a photocatalytic coating capable of making and maintaining the surface of a substrate hydrophilic.
【0002】[0002]
【従来の技術】従来、特開平9−328336号に見ら
れるように、光触媒に耐薬品性、機械的強度を向上させ
る方法としてZr元素含有化合物を添加することが主流
であった。同公報に見られるものを詳述すると、以下の
通りである。 (1) 平均粒子系が100nm未満のTiO2微粒子と、
(2)Zr元素含有化合物と、及び(3)Si元素含有化
合物とを含み、かつ酸化物換算の重量比が、(2)/
(1)で0.02〜0.5、(3)/(1)で0.2〜
2.5である組成物、該組成物を用いて形成した被膜
で、光触媒活性、機械的強度及び耐薬品性が優れた被膜
を容易に形成できる組成物と、該組成物を用いて形成し
た被膜の提供。従来、Zr元素含有化合物の一つである
ZrO2は、硝子等に添加する事で耐アルカリ溶液性能
が向上すると言われてきた。しかし、光励起による親水
性能を損ないやすく防汚機能が低下することから、添加
量が制限され十分な耐薬品性能が発揮できない場合があ
った。2. Description of the Related Art Conventionally, as disclosed in JP-A-9-328336, it has been the mainstream to add a Zr element-containing compound to a photocatalyst as a method for improving chemical resistance and mechanical strength. The details found in the publication are as follows. (1) TiO 2 fine particles having an average particle size of less than 100 nm;
(2) It contains a Zr element-containing compound and (3) a Si element-containing compound, and has a weight ratio of (2) /
(1) 0.02-0.5, (3) / (1) 0.2-
2.5, a composition formed using the composition, and a composition capable of easily forming a film having excellent photocatalytic activity, mechanical strength and chemical resistance, and a composition formed using the composition. Providing a coating. Conventionally, it has been said that ZrO 2 , which is one of the Zr element-containing compounds, improves the alkali solution resistance performance when added to glass or the like. However, since hydrophilicity due to photoexcitation is easily damaged and the antifouling function is reduced, the amount of addition is limited, and sufficient chemical resistance may not be exhibited in some cases.
【0003】[0003]
【発明が解決しようとする課題】本発明の目的は上記課
題を解決するためになされたもので、光触媒活性また
は、光励起による親水化機能に関係ない物質を添加する
ことなく、耐薬品性、機械的強度、光触媒分解活性、光
励起による親水化機能を発揮する光触媒性被膜を備えた
親水性複合材を製造する方法を提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned problems, and without adding a substance irrelevant to the photocatalytic activity or the function of hydrophilization by photoexcitation, the chemical resistance and the mechanical resistance are improved. It is an object of the present invention to provide a method for producing a hydrophilic composite material provided with a photocatalytic coating exhibiting a hydrolytic function by photo-catalytic decomposition activity and photoexcitation.
【0004】[0004]
【課題を解決するための手段】上記目的を達成するため
に、基材と、該基材の表面に光触媒性材料とシリカまた
はその前駆体と、を含む光触媒性被膜を備えた親水性複
合材を製造する方法であって、(a)シリカを準備する
工程と、(b)光触媒性材料と前記シリカまたはその前
駆体とを含む懸濁液を表面に塗布する工程と、(c)該
懸濁液を硬化させる工程と、からなる光触媒性被膜を備
えた親水性複合材を製造する方法を提供する。Means for Solving the Problems In order to achieve the above object, a hydrophilic composite material comprising a substrate and a photocatalytic coating containing a photocatalytic material and silica or a precursor thereof on the surface of the substrate. Comprising: (a) preparing silica; (b) applying a suspension containing a photocatalytic material and the silica or a precursor thereof to a surface; Curing a turbid liquid, and a method for producing a hydrophilic composite material provided with a photocatalytic coating.
【0005】本発明の好ましい形態においては、前記工
程(c)は、塗装後、その塗装物を少なくとも1日以上
放置(養生)することである。In a preferred embodiment of the present invention, the step (c) is to leave (curing) the coated product for at least one day after coating.
【0006】本発明の好ましい形態においては、前記工
程(a)は、シリカ前駆体から加水分解によりシリカを
製造する際に、加水分解性触媒を使用することであり、
その加水分解性触媒としては、硝酸を使用しその添加量
をシリカ前駆体1重量部に対して0.03重量部以上に
することが好ましい。In a preferred embodiment of the present invention, the step (a) comprises using a hydrolyzable catalyst when producing silica from a silica precursor by hydrolysis.
It is preferable that nitric acid is used as the hydrolyzable catalyst, and the amount thereof is 0.03 parts by weight or more based on 1 part by weight of the silica precursor.
【0007】本発明の好ましい形態においては、前記工
程(c)は、塗装後、50%以下の湿度雰囲気において
その塗装物を少なくとも1日以上放置(養生)すること
である。In a preferred embodiment of the present invention, the step (c) comprises leaving (curing) the coated product for at least one day in a humidity atmosphere of 50% or less after coating.
【0008】本発明の好ましい形態においては、前記工
程(c)は、塗装後、アミン系触媒雰囲気またはその溶
液内にその塗装物を少なくとも1日以上放置(養生)後
使用することである。[0008] In a preferred embodiment of the present invention, the step (c) is that after coating, the coated product is left (cured) for at least one day in an amine-based catalyst atmosphere or a solution thereof and then used.
【0009】[0009]
【発明の実施の形態】次に、本発明の構成要素について
説明する。ここでいう光触媒性材料とは、価電子帯中の
電子の励起によって正孔或いは伝導電子を生成し、それ
によりおそらくは表面に局所的量論欠陥を生じ、平衡量
以上の化学吸着水及び物理吸着水を吸着させる作用によ
り、基材表面を親水化できるものをさす。具体的物質と
しては、アナタ−ゼ型酸化チタン、ブルッカイト型酸化
チタン、ルチル型酸化チタン、酸化錫、酸化亜鉛、三酸
化二ビスマス、三酸化タングステン、酸化第二鉄、チタ
ン酸ストロンチウムの群から選ばれる1種又は2種以上
等が使用できる。本発明に係わるコーティング組成物に
よるシリカ被膜を形成可能なシリカの前駆体の好ましい
例としては、平均組成式SiXqO(4-q)/2 (式中、X
はアルコキシ基、又は、ハロゲン原子であり、qは0<
q<4を満足する数である)で表されるシリケートが挙
げられる。Next, the components of the present invention will be described. The photocatalytic material here means that holes or conduction electrons are generated by the excitation of electrons in the valence band, possibly causing local stoichiometric defects on the surface, and the amount of chemisorbed water and physisorption exceeding the equilibrium amount. A substance capable of hydrophilizing the surface of a substrate by the action of adsorbing water. Specific substances are selected from the group of anatase-type titanium oxide, brookite-type titanium oxide, rutile-type titanium oxide, tin oxide, zinc oxide, bismuth trioxide, tungsten trioxide, ferric oxide, and strontium titanate. One or two or more of them can be used. Preferable examples of the silica precursor capable of forming a silica film with the coating composition according to the present invention include an average composition formula of Six q O (4-q) / 2 (where
Is an alkoxy group or a halogen atom, and q is 0 <
(the number satisfies q <4).
【0010】また、シリカ被膜を形成可能なシリカの前
駆体の好ましい例としては、一般式SiX4(式中、Xは
アルコキシ基、又は、ハロゲン原子である。)で表され
る4官能加水分解性シラン誘導体が挙げられる。上記4
官能加水分解性シラン誘導体の好ましい具体例として
は、テトラメトキシシラン、テトラエトキシシラン、テ
トラプロポキシシラン、テトラブトキシシラン、ジエキ
シジメトキシシラン、シラノール、テトラクロロシラ
ン、テトラブロモシラン等が挙げられる。A preferred example of a silica precursor capable of forming a silica coating is a tetrafunctional hydrolysis represented by the general formula SiX 4 (where X is an alkoxy group or a halogen atom). Silane derivatives. 4 above
Preferred specific examples of the functional hydrolyzable silane derivative include tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, tetrabutoxysilane, diethoxydimethoxysilane, silanol, tetrachlorosilane, tetrabromosilane and the like.
【0011】また、上記シリケートの好ましい具体例と
しては、上記4官能加水分解性シラン誘導体の部分加水
分解物及び脱水縮合物などが挙げられる。本発明による
塗料組成物に含まれる上記前駆体の添加量は適宜決定さ
れてよいが、例えば光触媒粒子1重量部に対して、シリ
カ換算重量で10重量部以下が好ましく、より好ましく
は5重量部以下であり、最も好ましくは1重量部以下で
ある。また、0.05重量部以上が好ましく、より好ま
しくは0.1重量部以上であり、最も好ましくは0.2
重量部以上である。Preferred specific examples of the silicate include a partial hydrolyzate and a dehydration condensate of the tetrafunctional hydrolyzable silane derivative. The amount of the precursor contained in the coating composition according to the present invention may be appropriately determined. For example, the amount is preferably 10 parts by weight or less, more preferably 5 parts by weight in terms of silica, based on 1 part by weight of photocatalyst particles. Or less, most preferably 1 part by weight or less. Further, it is preferably at least 0.05 part by weight, more preferably at least 0.1 part by weight, most preferably at least 0.2 part by weight.
It is more than weight part.
【0012】本発明においては、シリコーン、シリコー
ンの前駆体、シリカの前駆体、ヒドロキシアルコキシセ
ルロース、ヒドロキシアルキルセルロース、ポリビニル
アルコール、ポリビニルアルコールーポリ酢酸ビニル共
重合体、ウレタン、アミノ基含有縮物等の水溶性樹脂を
含有させてもよい。これら物質を添加することにより、
室温程度の温度でも充分に固着性に優れた親水性部材を
提供できるようになる。In the present invention, silicone, a precursor of silicone, a precursor of silica, hydroxyalkoxycellulose, hydroxyalkylcellulose, polyvinyl alcohol, a polyvinyl alcohol-polyvinyl acetate copolymer, urethane, amino group-containing condensate, etc. A water-soluble resin may be contained. By adding these substances,
Even at a temperature of about room temperature, a hydrophilic member excellent in fixability can be provided.
【0013】ここでシリコーン前駆体としては、メチル
トリメトキシシラン、エチルトリメトキシシラン、メチ
ルトリエトキシシラン、エチルトリエトキシシラン、メ
チルトリプロポキシシラン、エチルトリプロポキシシラ
ン、n-プロピルトリメトキシシラン、n-プロピルトリ
エトキシシラン、n-プロピルトリプロポキシシラン、
イソプロピルトリメトキシシラン、イソプロピルトリエ
トキシシラン、イソプロピルトリプロポキシシラン、メ
チルトリブトキシシラン、エチルトリブトキシシラン、
n-プロピルブトキシシラン、イソプロピルブトキシシ
ラン、フェニルトリブトキシシラン、フェニルトリメト
キシシラン、フェニルトリエトキシシラン、フェニルト
リプロポキシシラン、γ―グリシドキシプロピルトリメ
トキシシラン、γ―グリシドキシプロピルトリエトキシ
シラン、γ―グリシドキシプロピルトリプロポキシシラ
ン、γ―メタクリロキシプロピルトリエトキシシラン、
γ―メタクリロキシプロピルトリメトキシシラン、γ―
メタクリロキシプロピルトリプロポキシシラン、β-
(3、4-エポキシシクロヘキシル)エチルトリエトキシ
シラン、β-(3、4-エポキシシクロヘキシル)エチルト
リメトキシシラン、γ―アミノプロピルトリメトキシシ
ラン、γ―メルカプトプロピルトリエトキシシラン、γ
―メルカプトプロピルトリメトキシシラン、トリフルオ
ロプロピルトリメトキシシラン、トリフルオロプロピル
トリエトキシシラン、フェニルメチルジエトキシシラ
ン、フェニルメチルジメトキシシラン、ジメチルジメト
キシシラン、ジメチルジエトキシシラン、ジエチルジエ
トキシシラン、フェニルジメトキシシラン、フェニルジ
エトキシシラン等のシラン誘導体、その(部分)加水分
解物、加水分解・縮合物の群から選ばれる1種以上等が
好適に利用できる。シリコーンとしては、上記シリコー
ン前駆体を必要に応じて加水分解、脱水縮合させたもの
を利用できる。シリカの前駆体としては、テトラエトキ
シシラン、テトラ-n-プロポキシシラン、テトラブトキ
シシラン、テトラメトキシシラン、テトライソプロポキ
シシラン、ジメトキシジエトキシシラン等のテトラアル
コキシシラン;メチルシリケート、エチルシリケート、
プロピルシリケート、ブチルシリケート等のアルキルシ
リケート等が好適に利用できる。Here, the silicone precursor includes methyltrimethoxysilane, ethyltrimethoxysilane, methyltriethoxysilane, ethyltriethoxysilane, methyltripropoxysilane, ethyltripropoxysilane, n-propyltrimethoxysilane, and n-propyltrimethoxysilane. Propyltriethoxysilane, n-propyltripropoxysilane,
Isopropyltrimethoxysilane, isopropyltriethoxysilane, isopropyltripropoxysilane, methyltributoxysilane, ethyltributoxysilane,
n-propylbutoxysilane, isopropylbutoxysilane, phenyltributoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, phenyltripropoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, γ-glycidoxypropyltripropoxysilane, γ-methacryloxypropyltriethoxysilane,
γ-methacryloxypropyltrimethoxysilane, γ-
Methacryloxypropyltripropoxysilane, β-
(3,4-epoxycyclohexyl) ethyltriethoxysilane, β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, γ-aminopropyltrimethoxysilane, γ-mercaptopropyltriethoxysilane, γ
-Mercaptopropyltrimethoxysilane, trifluoropropyltrimethoxysilane, trifluoropropyltriethoxysilane, phenylmethyldiethoxysilane, phenylmethyldimethoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, diethyldiethoxysilane, phenyldimethoxysilane, A silane derivative such as phenyldiethoxysilane, a (partially) hydrolyzed product thereof, and one or more selected from the group consisting of a hydrolyzed / condensed product can be suitably used. As the silicone, those obtained by subjecting the above silicone precursor to hydrolysis and dehydration condensation as necessary can be used. As the silica precursor, tetraethoxysilane, tetra-n-propoxysilane, tetrabutoxysilane, tetramethoxysilane, tetraisopropoxysilane, tetraalkoxysilane such as dimethoxydiethoxysilane; methyl silicate, ethyl silicate,
Alkyl silicates such as propyl silicate and butyl silicate can be suitably used.
【0014】本発明に係わる塗料組成物中のシリカは、
シリカ微粒子でもシリカ被膜前駆体でもよい。シリカ微
粒子は、光触媒微粒子を効率よく部材表面に固定化する
ものと考えられる。本発明の好ましい態様によれば、シ
リカ微粒子の平均粒径は1〜1000nmが好ましい。
シリカ微粒子の平均粒径は例えば動的レーザー散乱法に
よって求める事が出来る。The silica in the coating composition according to the present invention comprises:
Silica fine particles or a silica coating precursor may be used. It is considered that the silica fine particles efficiently fix the photocatalyst fine particles on the member surface. According to a preferred embodiment of the present invention, the average particle size of the silica fine particles is preferably from 1 to 1000 nm.
The average particle size of the silica fine particles can be determined, for example, by a dynamic laser scattering method.
【0015】本発明において、シリカの前駆体としての
シラン化合物を加水分解することで、シリカが製造され
る。この時使用されるシリカ前駆体の加水分解性触媒の
例としては、硝酸、硫酸、塩酸、プロピオン酸、酢酸、
マレイン酸、アジピン酸、フマル酸、吉草酸、クエン
酸、乳酸、酪酸、リンゴ酸、ピクリン酸、ギ酸、炭酸、
フェノール等が挙げられる。In the present invention, silica is produced by hydrolyzing a silane compound as a silica precursor. Examples of the silica precursor hydrolysis catalyst used at this time include nitric acid, sulfuric acid, hydrochloric acid, propionic acid, acetic acid,
Maleic acid, adipic acid, fumaric acid, valeric acid, citric acid, lactic acid, butyric acid, malic acid, picric acid, formic acid, carbonic acid,
Phenol and the like.
【0016】この加水分解性触媒の量は、シリカ前駆体
1重量部に対して0.03重量部以上の範囲が好まし
く、さらに好ましくは、0.1重量部以上の範囲が好ま
しく、最も好ましいのが、0.3重量部以上にして製造
する事が好ましい。このようにこの量で加水分解性触媒
を添加する場合、被膜内のシリカの網目構造が緻密にな
ると同時にSi-O結合が多くなると考えられる。そのた
め、例えば水酸化ナトリウムのようなアルカリ溶液が被
膜に付着すると、水酸化ナトリウムとシリカとが反応し
てナトリウム塩が生成すると同時に、そのシリカの網目
構造が破壊されると見られる。しかし、上記のようなシ
リカの状態になると、この反応は被膜全体から見るとわ
ずかな変化であり、これによる被膜の破壊が行われて
も、被膜全体が破壊されるには時間がかかることにな
る。そこで、上記のような操作を行うことにより、アル
カリ溶液が付着しても長持ちする被膜ができあがると考
えられる。このように耐アルカリ性能すなわち耐薬品性
の向上のみならず、膜強度の向上もこの操作で得られる
とともに硬化する工程期間の短縮もまた可能にすること
が出来る。The amount of the hydrolyzable catalyst is preferably at least 0.03 part by weight, more preferably at least 0.1 part by weight, most preferably at most 1 part by weight of the silica precursor. However, it is preferable to manufacture it at 0.3 parts by weight or more. Thus, when the hydrolyzable catalyst is added in this amount, it is considered that the network structure of silica in the coating film becomes dense and the number of Si—O bonds increases. Therefore, for example, when an alkali solution such as sodium hydroxide adheres to the coating film, sodium hydroxide and silica react with each other to generate a sodium salt, and at the same time, it is considered that the network structure of the silica is destroyed. However, in the silica state as described above, this reaction is a slight change when viewed from the whole film, and even if the film is destroyed by this, it takes time to destroy the entire film. Become. Therefore, it is considered that a long-lasting film is formed by performing the above-described operation even when the alkaline solution adheres. As described above, not only the alkali resistance, that is, the chemical resistance, but also the film strength can be improved by this operation, and the curing period can be shortened.
【0017】本発明において、塗装後、その塗装物を少
なくとも1日以上放置(養生)することで該懸濁液を硬
化させる工程において、湿度が50%RH以下の条件と
なる雰囲気の場所で放置(養生)して行うことは、被膜
内で行われると思われる脱水縮合反応を促進したものと
考えられる。そしてそれによりシラノール基からシロキ
サン結合への反応が促進され、被膜内のシリカの網目構
造が緻密になると同時にSi−O結合が多くなると考え
られる。そのため、例えば水酸化ナトリウムのようなア
ルカリ溶液が被膜に付着すると、水酸化ナトリウムとシ
リカとが反応してナトリウム塩が生成すると同時に、そ
のシリカの網目構造が破壊されると見られる。しかし、
上記のようなシリカの状態になると、この反応は被膜全
体から見るとわずかな変化であり、これによる被膜の破
壊が行われても、被膜全体が破壊されるには時間がかか
ることになる。そこで、上記のような操作を行うことに
より、アルカリ溶液が付着しても長持ちする被膜ができ
あがると考えられる。このように耐アルカリ性能すなわ
ち耐薬品性の向上のみならず、膜強度の向上もこの操作
で得られるとともに硬化する工程期間の短縮もまた可能
にすることが出来る。In the present invention, in the step of curing the suspension by leaving (curing) the coated product for at least one day after coating, the coated product is left in an atmosphere where the humidity is 50% RH or less. It is considered that performing (curing) promotes the dehydration condensation reaction that is considered to be performed in the coating. Then, it is considered that the reaction from the silanol group to the siloxane bond is accelerated, and the network structure of the silica in the coating film becomes dense and the number of Si—O bonds increases. Therefore, for example, when an alkali solution such as sodium hydroxide adheres to the coating film, sodium hydroxide and silica react with each other to generate a sodium salt, and at the same time, it is considered that the network structure of the silica is destroyed. But,
In the state of silica as described above, this reaction is a slight change when viewed from the whole film, and even if the film is destroyed by this reaction, it takes time to destroy the entire film. Therefore, it is considered that a long-lasting film is formed by performing the above-described operation even when the alkaline solution adheres. As described above, not only the alkali resistance, that is, the chemical resistance, but also the film strength can be improved by this operation, and the curing period can be shortened.
【0018】本発明において、塗装後、その塗装物を少
なくとも1日以上放置(養生)することで該懸濁液を硬
化させる工程において、濃度として0.01%〜20%
のエチルアミン溶液のようなアミン系脱水縮合触媒をエ
タノール等のアルコール系溶媒またはトルエンのような
芳香族系の溶媒に溶かした溶液を調製し、その中に塗膜
した部材を浸せきして静置することで、シラノール基か
らシロキサン結合への反応が促進され、被膜内のシリカ
の網目構造が緻密になると同時にSi-O結合が多くなると
考えられる。そのため、例えば水酸化ナトリウムのよう
なアルカリ溶液が被膜に付着すると、水酸化ナトリウム
とシリカとが反応してナトリウム塩が生成すると同時
に、そのシリカの網目構造が破壊されると見られる。し
かし、上記のようなシリカの状態になると、この反応は
被膜全体から見るとわずかな変化であり、これによる被
膜の破壊が行われても、被膜全体が破壊されるには時間
がかかることになる。そこで、上記のような操作を行う
ことにより、アルカリ溶液が付着しても長持ちする被膜
ができあがると考えられる。このように耐アルカリ性能
すなわち耐薬品性の向上のみならず、膜強度の向上もこ
の操作で得られるとともに硬化する工程期間の短縮もま
た可能にすることが出来る。In the present invention, after the coating, the coated material is left (cured) for at least one day to cure the suspension.
A solution prepared by dissolving an amine-based dehydration / condensation catalyst such as an ethylamine solution in an alcohol-based solvent such as ethanol or an aromatic-based solvent such as toluene is prepared, and the coated member is immersed therein and allowed to stand. It is considered that the reaction from the silanol group to the siloxane bond is accelerated, and the network structure of the silica in the film becomes dense, and the number of Si—O bonds increases. Therefore, for example, when an alkali solution such as sodium hydroxide adheres to the coating film, sodium hydroxide and silica react with each other to generate a sodium salt, and at the same time, it is considered that the network structure of the silica is destroyed. However, in the silica state as described above, this reaction is a slight change when viewed from the whole film, and even if the film is destroyed by this, it takes time to destroy the entire film. Become. Therefore, it is considered that a long-lasting film is formed by performing the above-described operation even when the alkaline solution adheres. As described above, not only the alkali resistance, that is, the chemical resistance, but also the film strength can be improved by this operation, and the curing period can be shortened.
【0019】脱水縮合反応を促進するための浸せき溶液
として上記のようなエチルアミン溶液の他にアンモニ
ア、アミノプロピルアルコールのようなエタノールアミ
ン類、n―ヘキシルアミン、トリブチルアミン、ジアザ
ビシクロウンデセン、エチレンジアミン、ジエチレント
リアミン、ヘキサンジアミン、ジエチレントリアミン、
トリエチレンテトラミン、テトラエチレンベンタミン、
γ―アミノプロピルトリメトキシシラン、γ―(2−ア
ミノエチル)―アミノプロピルトリメトキシシラン、γ
―アミノプロピルメチルメトキシシラン、γ―(2−ア
ミノエチル)―アミノプロピルメチルジメトキシシラン
のごときアミン化合物;テトライソプロピルチタネー
ト、テトラブチルチタネートのようなチタン化合物;ア
ルミニウムトリイソブトキシド、アルミニウムトリイソ
プロポキシド、アルミニウムアセチルアセトナート、過
塩素酸アルミニウム、塩化アルミニウムのようなアルミ
ニウム化合物;コバルトオクチレート、コバルトアセチ
ルアセトナートのような含金属化合物類;リン酸、硝
酸、クエン酸のごとき酸性酸化物;鉄アセチルアセトナ
ート、ジブチルジラウリン酸錫、錫アセチルアセテート
のような錫化合物などが上げられる。そして、これらの
脱水縮合触媒を複数組み合わせて使うと効果的である。As the immersion solution for accelerating the dehydration condensation reaction, ammonia, ethanolamines such as aminopropyl alcohol, n-hexylamine, tributylamine, diazabicycloundecene, ethylenediamine in addition to the above ethylamine solution , Diethylenetriamine, hexanediamine, diethylenetriamine,
Triethylenetetramine, tetraethylenebentamine,
γ-aminopropyltrimethoxysilane, γ- (2-aminoethyl) -aminopropyltrimethoxysilane, γ
Amine compounds such as -aminopropylmethylmethoxysilane, γ- (2-aminoethyl) -aminopropylmethyldimethoxysilane; titanium compounds such as tetraisopropyl titanate and tetrabutyl titanate; aluminum triisobutoxide, aluminum triisopropoxide; Aluminum compounds such as aluminum acetylacetonate, aluminum perchlorate and aluminum chloride; metal-containing compounds such as cobalt octylate and cobalt acetylacetonate; acid oxides such as phosphoric acid, nitric acid and citric acid; iron acetylacetate Examples thereof include tin compounds such as nate, tin dibutyl dilaurate, and tin acetyl acetate. It is effective to use a plurality of these dehydration condensation catalysts in combination.
【0020】本発明の好ましい様態によれば、本発明に
よる組成物は、界面活性剤をさらに含む事が出来る。界
面活性剤は、光触媒粒子1重量部に対して、10重量部
未満、より好ましくは、0.1〜2重量部程度添加され
るのが好ましい。According to a preferred embodiment of the present invention, the composition according to the present invention may further comprise a surfactant. The surfactant is preferably added in an amount of less than 10 parts by weight, more preferably about 0.1 to 2 parts by weight, based on 1 part by weight of the photocatalyst particles.
【0021】本発明による組成物に添加が可能な界面活
性剤の例としては、スルホン酸ポリオキシエチレンアル
キルフェニルエーテルアンモニウム塩、スルホン酸ポリ
オキシエチレンアルキルフェニルエーテルナトリウム
塩、脂肪酸カリセッケン、脂肪酸ナトリウムセッケン、
ジオクチルスルホコハク酸ナトリウム、アルキルサルフ
ェート、アルキルエーテルサルフェート、アルキルサル
フェートソーダ塩、アルキルエーテルサルフェートソー
ダ塩、ポリオキシエチレンアルキルエーテルサルフェー
ト、ポリオキシエチレンアルキルエーテルサルフェート
ソーダ塩、アルキルサルフェートTEA塩、ポリオキシエ
チレンアルキルエーテルサルフェートTEA塩、2-エチル
ヘキシルアルキル硫酸エステルナトリウム塩、アシルメ
チルタウリン酸ナトリウム、ラウロイルメチルタウリン
酸ナトリウム、ドデシルベンゼンスルホン酸ナトリウ
ム、スルホコハク酸ラウリル2ナトリウム、ポリオキシ
エチレンスルホコハク酸ラウリル2ナトリウム、ポリカ
ルボン酸、オレオイルザルコシン、アミドエーテルサル
フェート、ラウロイルザルコシネート、スルホFAエステ
ルナトリウム塩等のアニオン性界面活性剤;ポリオキシ
エチレンラウリルエーテル、ポリオキシエチレントリデ
シルエーテル、ポリオキシエチレンアセチルエーテル、
ポリオキシエチレンステアリルエーテル、ポリオキシエ
チレンオレイルエーテル、ポリオキシエチレンアルキル
エーテル、ポリオキシエチレンアルキルエステル、ポリ
オキシエチレンアルキルフェノールエーテル、ポリオキ
シエチレンノニルフェノールエーテル、ポリオキシエチ
レオクチルフェニルエーテル、ポリオキシエチレンラウ
レート、ポリオキシエチレンステアレート、ポリオキシ
エチレンノニルフェ二ルエーテル、ポリオキシエチレン
オレエート、ソルビタンアルキルエステル、ポリオキシ
エチレンソルビタンアルキルエステル、ポリエーテル変
性シリコーン、ポリエステル変性シリコーン、ソルビタ
ンラウラート、ソルビタンステアレート、ソルビタンパ
ルミテート、ソルビタンソスキオレエート、ソルビタン
オレエート、ポリオキシエチレンソルビタンラウラー
ト、ポリオキシエチレンソルビタンステアレート、ポリ
オキシエチレンソルビタンパルミテート、ポリオキシエ
チレンソルビタンオレエート、グリセロールステアレー
ト、ポリグリセリン脂肪酸エステル、アルキルアルキロ
ールアミド、ラウリン酸ジエタノールアミド、オレイン
酸ジエタノールアミド、オキシエチレンドデシルアミ
ン、ポリオキシエチレンアルキルアミン、ポリオキシエ
チレンオクタデシルアミン、ポリオキシエチレンアルキ
ルプロピレンジアミン、ポリオキシエチレンオキシプロ
ピレンブロックポリマー、ポリオキシエチレンステアレ
ート等のノニオン性界面活性剤;ジメチルアルキルベタ
イン、アルキルグリシン、アミドベタイン、イミダゾリ
ン等の両面界面活性剤;オクタデシルジメチルベンジル
アンモニウムクロライド、アルキルジメチルベンジルア
ンモニウムクロライド、テトラデシルジメチルベンジル
アンモニウムクロライド、ジオレイルジメチルベンジル
アンモニウムクロライド、1−ヒドロキシー2−アルキ
ルイミダゾリン4級塩、アルキルイソキノリニウムブロ
マイド、高分子アミン、オクタデシルトリメチルアンモ
ニウムクロライド、アルキルトリメチルアンモニウムク
ロライド、ドデシルトリメチルアンモニウムクロライ
ド、ヘキサデシルトリメチルアンモニウムクロライド、
ベヘニルトリメチルアンモニウムクロライド、アルキル
イミダゾリン4級塩、ジアルキルジメチルアンモニウム
クロライド、オクタデシルアミン酢酸塩、テトラデシル
アミン酢酸塩、アルキルプロピレンジアミン酢酸塩、ジ
デシルジメチルアンモニウムクロライド等のカチオン性
界面活性剤等が挙げられる。Examples of surfactants that can be added to the composition according to the present invention include ammonium sulfonate polyoxyethylene alkylphenyl ether ether, sodium sulfonate polyoxyethylene alkylphenyl ether ether, fatty acid soap, fatty acid sodium soap, and the like.
Sodium dioctyl sulfosuccinate, alkyl sulfate, alkyl ether sulfate, alkyl sulfate soda salt, alkyl ether sulfate soda salt, polyoxyethylene alkyl ether sulfate, polyoxyethylene alkyl ether sulfate soda salt, alkyl sulfate TEA salt, polyoxyethylene alkyl ether sulfate TEA salt, sodium 2-ethylhexylalkyl sulfate, sodium acylmethyltaurate, sodium lauroylmethyltaurate, sodium dodecylbenzenesulfonate, disodium lauryl sulfosuccinate, disodium lauryl polyoxyethylene sulfosuccinate, polycarboxylic acid, oleic acid Oil sarcosine, amide ether sulfate, lauroylza Koshineto, anionic surfactants such as sulfo-FA ester sodium salt; polyoxyethylene lauryl ether, polyoxyethylene tridecyl ether, polyoxyethylene acetyl ether,
Polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene alkyl ether, polyoxyethylene alkyl ester, polyoxyethylene alkyl phenol ether, polyoxyethylene nonyl phenol ether, polyoxyethylene octyl phenyl ether, polyoxyethylene laurate, poly Oxyethylene stearate, polyoxyethylene nonylphenyl ether, polyoxyethylene oleate, sorbitan alkyl ester, polyoxyethylene sorbitan alkyl ester, polyether-modified silicone, polyester-modified silicone, sorbitan laurate, sorbitan stearate, sorbitan palmitate , Sorbitan sosquioleate, sorbitan oleate, poly Xyethylene sorbitan laurate, polyoxyethylene sorbitan stearate, polyoxyethylene sorbitan palmitate, polyoxyethylene sorbitan oleate, glycerol stearate, polyglycerin fatty acid ester, alkylalkylolamide, lauric acid diethanolamide, oleic acid diethanolamide Nonionic surfactants such as oxyethylene dodecylamine, polyoxyethylene alkylamine, polyoxyethylene octadecylamine, polyoxyethylene alkylpropylenediamine, polyoxyethyleneoxypropylene block polymer, and polyoxyethylene stearate; dimethylalkyl betaine; Surfactants such as alkylglycine, amidobetaine, imidazoline and the like; octadecyldi Tylbenzylammonium chloride, alkyldimethylbenzylammonium chloride, tetradecyldimethylbenzylammonium chloride, dioleyldimethylbenzylammonium chloride, 1-hydroxy-2-alkylimidazoline quaternary salt, alkylisoquinolinium bromide, polymer amine, octadecyltrimethylammonium Chloride, alkyltrimethylammonium chloride, dodecyltrimethylammonium chloride, hexadecyltrimethylammonium chloride,
Cationic surfactants such as behenyltrimethylammonium chloride, alkylimidazoline quaternary salt, dialkyldimethylammonium chloride, octadecylamine acetate, tetradecylamine acetate, alkylpropylenediamine acetate, and didecyldimethylammonium chloride.
【0022】本発明の好ましい態様においては、本発明
による組成分は、重合硬化触媒を含んでなることができ
る。好ましい重合硬化触媒の例としては、アルミニウム
キレ−ト、アルミニウムアセチルアセトナ−ト、過塩素
酸アルミニウム、塩化アルミニウム、アルミニウムイソ
ブトキシド、アルミニウムイソプロポキシドのようなア
ルミニウム化合物;テトライソプロピルチタネ−ト、テ
トラブチルチタネ−トのようなチタン化合物;水酸化リ
チウム、水酸化ナトリウム、水酸化カリウム、ナトリウ
ムメチラ−ト、酢酸ナトリウム、ギ酸ナトリウム、酢酸
カリウム、ギ酸カリウム、プロピオン酸カリウム、テト
ラメチルアンモニウムクロライド、テトラメチルアンモ
ニウムヒドロキシドのような塩基性化合物類;n−ヘキ
シルアミン、トリブチルアミン、ジアザビクロウンデセ
ン、エチレンジアミン、ヘキサンジアミン、ジエチレン
トリアミン、テトラエチレンペンタミン、トリエチレン
テトラミン、エタノ−ルアミン類、γ−アミノプロピル
トリメトキシシラン、γ−アミノプロピルメチルジメト
キシシラン、γ−(2−アミノエチル)−アミノプロピ
ルトリメトキシシラン、γ−(2−アミノエチル)−ア
ミノプロピルメチルジメトキシシランのようなアミン化
合物;錫アセチルアセトナ−ト、ジブチル錫オクチレ−
トのような錫化合物;コバルトオクチレ−ト、コバルト
アセチルアセトナ−ト、鉄アセチルアセトナ−トのよう
な含金属化合物類;リン酸、硝酸、フタル酸、p−トル
エンスルホン酸、トリクロル酢酸のような酸性化合物類
などが挙げられる。In a preferred embodiment of the invention, the composition according to the invention can comprise a polymerization curing catalyst. Examples of preferred polymerization curing catalysts include aluminum compounds such as aluminum chelate, aluminum acetylacetonate, aluminum perchlorate, aluminum chloride, aluminum isobutoxide and aluminum isopropoxide; tetraisopropyl titanate; Titanium compounds such as tetrabutyl titanate; lithium hydroxide, sodium hydroxide, potassium hydroxide, sodium methylate, sodium acetate, sodium formate, potassium acetate, potassium formate, potassium propionate, tetramethylammonium chloride And basic compounds such as tetramethylammonium hydroxide; n-hexylamine, tributylamine, diazabicroundecene, ethylenediamine, hexanediamine, diethylenetriamine, tetraethylamine. Lenpentamine, triethylenetetramine, ethanolamines, γ-aminopropyltrimethoxysilane, γ-aminopropylmethyldimethoxysilane, γ- (2-aminoethyl) -aminopropyltrimethoxysilane, γ- (2-aminoethyl) Amine compounds such as aminopropylmethyldimethoxysilane; tin acetylacetonate, dibutyltin octylate;
Metal compounds such as cobalt octylate, cobalt acetylacetonate, iron acetylacetonate; phosphoric acid, nitric acid, phthalic acid, p-toluenesulfonic acid, trichloroacetic acid And acidic compounds such as
【0023】本発明の好ましい態様においては、本発明
による組成物は、部材の表面に適用されたとき平滑な表
面を形成できるよう、レベリング剤を含んでなることが
できる。レベリング剤の添加は、とりわけ大型の物品に
本発明による組成物を適用する場合に有利であり、エチ
レングリコ−ル、モノアセトンアルコ−ル、ジアセトン
アルコ−ル、エチレングリコ−ルモノメチルエ−テル、
4−ヒドロキシ−4−メチル−2−ペンタノン、ジプロ
ピレングリコ−ル、プロピレングリコ−ル、トリプロピ
レングリコ−ル、1−エトキシ−2−プロパノ−ル、1
−ブトシキ−2−プロパノ−ル、1−プロポキシ−2−
プロパノ−ル、プロピレングリコ−ルモノメチルエ−テ
ル、ジプロピレングリコ−ルモノメチルエ−テル、ジプ
ロピレングリコ−ルモノエチルエ−テル、トリプロピレ
ングリコ−ルモノメチルエ−テル、ジアセトンアルコ−
ル、セロソルブ等が好適に利用できる。本発明による組
成物の部材表面への適用方法は適宜選択されてよいが、
例えばスプレ−コ−ティング法、ディップコ−ティング
法、フロ−コ−ティング法、スピンコ−ティング法、ロ
−ルコ−ティング法、刷毛塗り、バ−コ−ティング法、
スポンジ塗り等の方法が好適に利用できる。In a preferred embodiment of the present invention, the composition according to the present invention may comprise a leveling agent so that it can form a smooth surface when applied to the surface of the component. The addition of a leveling agent is particularly advantageous when applying the composition according to the invention to large articles, ethylene glycol, monoacetone alcohol, diacetone alcohol, ethylene glycol monomethyl ether,
4-hydroxy-4-methyl-2-pentanone, dipropylene glycol, propylene glycol, tripropylene glycol, 1-ethoxy-2-propanol, 1
-Butoxy-2-propanol, 1-propoxy-2-
Propanol, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, tripropylene glycol monomethyl ether, diacetone alcohol
And cellosolve can be suitably used. The method of applying the composition of the present invention to the member surface may be appropriately selected,
For example, a spray coating method, a dip coating method, a flow coating method, a spin coating method, a roll coating method, a brush coating, a bar coating method,
A method such as sponge coating can be suitably used.
【0024】表面に適用された後組成物は乾燥又は硬化
され、薄膜とされる。乾燥又は硬化の過程でシリカ前駆
体はシリカになる。ここで乾燥は自然乾燥又は加熱によ
る乾燥のいずれであってもよく、さらに前駆体がシリカ
になる限りにおいて紫外線照射等による重合反応を生じ
させてもよい。After being applied to the surface, the composition is dried or cured to form a thin film. During the course of drying or curing, the silica precursor becomes silica. Here, the drying may be either natural drying or drying by heating. Further, as long as the precursor becomes silica, a polymerization reaction by ultraviolet irradiation or the like may be caused.
【0025】本発明による組成物に含まれる溶媒は、上
記光触媒粒子及び上記前駆体を安定に分散させ、最終的
に親水化表面が得られる限り限定されないが、例えば、
水若しくは有機溶媒またはそれらの混合溶媒がその例と
して挙げられる。特に水若しくはアルコ−ル又はそれら
の混合溶媒が好ましい。本発明の溶媒にアルコ−ルを用
いる場合、例えば、メタノ−ル。エタノ−ル、n−プロ
パノ−ル、イソプロパノ−ル、t−ブタノ−ル、イソブ
タノ−ル、n−ブタノ−ル、2−メチルプロパノ−ル、
ペンタノ−ル、エチレングリコ−ル、モノアセトンアル
コ−ル、ジアセトンアルコ−ル、エチレングリコ−ルモ
ノメチルエ−テル、4−ヒドロキシ−4−メチル−2−
ペンタノン、ジプロピレングリコ−ル、プロピレングリ
コ−ル、トリプロピレングリコ−ル、1−エトキシ−2
−プロパノ−ル、1−ブトキシ−2−プロパノ−ル、1
−プロポキシ−2−プロパノ−ル、プロピレングリコ−
ルモノメチルエ−テル、ジプロピレングリコ−ルモノメ
チルエ−テル、ジプロピレングリコ−ルモノエチルエ−
テル、トリプロピレングリコ−ルモノメチルエ−テル等
が好適に利用できる。The solvent contained in the composition according to the present invention is not limited as long as the photocatalyst particles and the precursor are stably dispersed and a hydrophilic surface is finally obtained.
Examples thereof include water or an organic solvent or a mixed solvent thereof. Particularly, water, alcohol, or a mixed solvent thereof is preferable. When alcohol is used as the solvent in the present invention, for example, methanol is used. Ethanol, n-propanol, isopropanol, t-butanol, isobutanol, n-butanol, 2-methylpropanol,
Pentanol, ethylene glycol, monoacetone alcohol, diacetone alcohol, ethylene glycol monomethyl ether, 4-hydroxy-4-methyl-2-
Pentanone, dipropylene glycol, propylene glycol, tripropylene glycol, 1-ethoxy-2
-Propanol, 1-butoxy-2-propanol, 1
-Propoxy-2-propanol, propylene glyco-
Monomethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether
Ter, tripropylene glycol monomethyl ether and the like can be suitably used.
【0026】本発明が、適用可能な基材としては、防曇
効果を期待する場合には透明な部材であり、その材質は
ガラス、プラスチック等が好適に利用できる。適用可能
な基材を用途でいえば、車両用後方確認ミラー、浴室用
鏡、洗面所用鏡、歯科用鏡、道路鏡のような鏡、眼鏡レ
ンズ、光学レンズ、照明用レンズ、半導体用レンズ、複
写機用レンズ、車両用後方確認カメラレンズのようなレ
ンズ、プリズム、建物や監視塔の窓ガラス、自動車、鉄
道車両、航空機、船舶、潜水艇、雪上車、ロ−プウエイ
のゴンドラ、遊園地のゴンドラ、宇宙船のような乗り物
の窓ガラス、自動車、オ−トバイ、鉄道車両、航空機、
船舶、潜水艇、雪上車、スノ−モ−ビル、ロ−プウエイ
のゴンドラ、遊園地のゴンドラ、宇宙船のような乗り物
の風防ガラス、防護用ゴ−グル、スポ−ツ用ゴ−グル、
防護用マスクのシ−ルド、スポ−ツ用マスクのシ−ル
ド、ヘルメットのシ−ルド、冷凍食品陳列ケ−スのガラ
ス、中華饅頭等の保温食品の陳列ケ−スのガラス、計測
機器のカバ-、レ−ザ−歯科治療器等の収束レンズ、車
間距離センサ−等のレ−ザ−光検知用センサ−のカバ−
赤外線センサ−のカバ−、カメラ用フィルタ−、及び上
記物品表面に貼着させるためのフイルム、シ−ト、シ−
ル等を含む。The substrate to which the present invention can be applied is a transparent member when an anti-fogging effect is expected, and glass, plastic, or the like can be suitably used as the material. Speaking of applicable base materials, rear-view mirrors for vehicles, mirrors for bathrooms, mirrors for toilets, dental mirrors, mirrors such as road mirrors, spectacle lenses, optical lenses, lighting lenses, lenses for semiconductors, Lenses for copiers, lenses such as rear view camera lenses for vehicles, prisms, windows for buildings and watchtowers, automobiles, railway vehicles, aircraft, ships, submersibles, snowmobiles, lowway gondolas, amusement parks Gondolas, window glasses for vehicles such as spaceships, automobiles, motorcycles, railway vehicles, aircraft,
Ships, submersibles, snowmobiles, snowmobiles, gondolaes in lowways, gondolaes in amusement parks, windshields for vehicles such as spaceships, protective goggles, sports goggles,
Protective mask shields, sports mask shields, helmet shields, glass for frozen food display cases, glass for warm food products such as Chinese buns, measuring instrument Covers, covers for lasers such as converging lenses for laser treatment equipment and laser light detection sensors for inter-vehicle distance sensors, etc.
Cover of infrared sensor, filter for camera, and film, sheet, and sheet for attaching to the surface of the article
Includes
【0027】本発明が適用可能な基材としては、表面清
浄化効果を期待する場合にその材質は、例えば、金属、
セラミック、ガラス、プラスチック、木、石、セメン
ト、コンクリ−ト、繊維、布帛、それらの組み合わせ、
それらの積層体が好適に利用できる。適用可能な基材を
用途でいえば、建材、建物外装、建物内装、窓枠、窓ガ
ラス、構造部材、乗り物の外装及び塗装、機械装置や物
品の外装、防塵カバ−及び塗装、交通標識、各種表示装
置、広告塔、道路用遮音壁、鉄道用遮音壁,橋、ガ−ド
レ−ルの外装及び塗装、トンネル内装及び塗装、トンネ
ル内装及び塗装、碍子、太陽電池カバ−、太陽熱温水器
集熱カバ−、ビニ−ルハウス、車両用照明灯のカバ−、
住宅設備、便器、浴槽、洗面台、照明器具、照明カバ
−、台所用品、食器、食器洗浄器、流し、調理レンジ、
キッチンフ−ド、換気扇、及び上記物品表面に貼着させ
るためのフィイルム、シ−ト、シ−ル等を含む。As a substrate to which the present invention can be applied, when a surface cleaning effect is expected, its material is, for example, metal,
Ceramic, glass, plastic, wood, stone, cement, concrete, fiber, fabric, combinations thereof,
Those laminates can be suitably used. Applicable base materials include building materials, building exteriors, building interiors, window frames, windowpanes, structural members, vehicle exteriors and coatings, machinery and articles exteriors, dustproof covers and coatings, traffic signs, Various display devices, advertising towers, noise barriers for roads, noise barriers for railways, bridges, exterior and coating of girder rails, tunnel interiors and paintings, tunnel interiors and paintings, insulators, solar battery covers, solar water heater collector covers -, Vinyl houses, vehicle lighting covers,
Housing equipment, toilet bowl, bathtub, wash basin, lighting equipment, lighting cover, kitchenware, tableware, dishwasher, sink, cooking range,
Includes kitchen hoods, ventilation fans, and films, sheets, seals, etc. for attaching to the article surface.
【0028】本発明が適用可能な基材としては、帯電防
止効果を期待する場合にその材質は、例えば、金属、セ
ラミック、ガラス、プラスチック、木、石、セメント、
コンクリ−ト、繊維、布帛、それらの組み合わせ、それ
らの積層体が好適に利用できる。適用可能な基材を用途
でいえば、ブラウン管、磁気記録メテ゛イア、光記録メデイ
ア、光磁気記録メデイア、オ−デイオテ−プ、ビデオテ−
プ、アナログレコ−ド、家庭用電気製品のハウジングや
部品や外装及び塗装、OA機器製品のハウジングや部品
や外装及び塗装、建材、建物外装、建物内装、窓枠、窓
ガラス、構造部材、乗り物の外装及び塗装、機械装置や
物品の外装、防塵カバ−及び塗装、及び上記物品表面に
貼着させるためのフイルム、シ−ト、シ−ル等を含む。As a substrate to which the present invention can be applied, when an antistatic effect is expected, its material is, for example, metal, ceramic, glass, plastic, wood, stone, cement, or the like.
Concrete, fibers, fabrics, combinations thereof, and laminates thereof can be suitably used. Speaking of applicable base materials, cathode ray tubes, magnetic recording media, optical recording media, magneto-optical recording media, audio tapes, video tapes
Housing, parts, exterior and coating for home appliances, analog records, home electric appliances, housing, parts and exterior and painting for OA equipment products, building materials, building exterior, building interior, window frames, window glass, structural members, vehicles Exteriors and coatings, exteriors of machinery and articles, dustproof covers and coatings, and films, sheets, seals, etc. for attaching to the surface of the articles.
【0029】[0029]
【実施例】実施例1 40%固形分濃度のエチルシリケート40(コルコート
社製):6gをメタノール(和光純薬製);44.7g
で希釈し、5分ほどスターラーで混合した後、60〜7
0%硝酸溶液(和光純薬製)を蒸留水で希釈して作った
2%硝酸溶液;9.3gを静かに注入しながら混合す
る。この後、エチルシリケート40の加水分解を進行す
るため、30℃に設定した恒温槽内において3日間スタ
ーラーで撹拌する。この4%溶液;25gに、ジアセト
ンアルコール(ゴードー溶剤製);17.5gとn―プ
ロパノール(和光純薬製);17.5gを混合して作っ
た溶剤に希釈し、その希釈後の溶液に10%ナノチタニ
ア(NTS-1,昭和電工製);40gを添加し、30℃に設
定した恒温槽内において2時間スターラーで撹拌する。
撹拌後、1日間常温常湿の雰囲気下に静置する。これに
より5%固形分濃度の超親水性膜用コーティング剤;1
00gが出来る。ここで言う固形分濃度とは、光触媒粒
子及び前駆体のシリカ換算重量の合計を言う。このコー
ティング剤の鏡への塗布方法としては、まず基材となる
市販のフロート板ガラスまたは鏡のコーティング面を市
販の中性洗剤によりよく洗浄し、その後水道水ですすぐ
操作を3回以上繰り返す。その後、エタノール(和光純
薬製)で表面の水分を洗い流し、最後に蒸留水で洗浄す
る。この時、可能であれば、超音波洗浄機による洗浄を
行えば、さらにいい塗布を行うことが出来る。この基材
にコロナ放電処理や、セリア研磨剤による塗布面の研磨
処理を行い、表面を親水化した後、上記コーティング剤
の塗布を2回行う。塗布方法としては、ロールコーター
法、リバースコーター法等の一般的に使用されている塗
布方法が使用でき、塗布が行える。塗布の後2時間常温
常湿雰囲気内で放置(養生)後、150℃の乾燥機内に
30分おいて乾燥させる。乾燥後常温常湿条件雰囲気内
に塗布物を静置し、1ヶ月間放置(養生)する。 Example 1 Ethyl silicate 40 (manufactured by Colcoat) having a solid content of 40%: 6 g of methanol; 44.7 g of methanol (manufactured by Wako Pure Chemical Industries)
After mixing with a stirrer for about 5 minutes,
A 2% nitric acid solution prepared by diluting a 0% nitric acid solution (manufactured by Wako Pure Chemical Industries) with distilled water; 9.3 g is mixed while gently injecting. Thereafter, in order to advance the hydrolysis of the ethyl silicate 40, the mixture is stirred with a stirrer for 3 days in a thermostat set at 30 ° C. 25% of this 4% solution was diluted with a solvent prepared by mixing 17.5 g of diacetone alcohol (manufactured by Gordo solvent) and 17.5 g of n-propanol (manufactured by Wako Pure Chemical), and the diluted solution was used. 40 g of 10% nanotitania (NTS-1, manufactured by Showa Denko) is added to the mixture, and the mixture is stirred with a stirrer for 2 hours in a thermostat set at 30 ° C.
After stirring, the mixture is allowed to stand for one day under an atmosphere of normal temperature and normal humidity. Thereby, a coating agent for a superhydrophilic film having a solid content of 5%;
00g. The solid content concentration here refers to the total of the silica equivalent weights of the photocatalyst particles and the precursor. As a method of applying this coating agent to a mirror, first, the coating surface of a commercially available float plate glass or a mirror serving as a base material is thoroughly washed with a commercially available neutral detergent, and then the operation of rinsing with tap water is repeated three times or more. After that, the surface water is washed away with ethanol (manufactured by Wako Pure Chemical Industries), and finally washed with distilled water. At this time, if possible, an even better coating can be performed by performing cleaning using an ultrasonic cleaning machine. The substrate is subjected to corona discharge treatment or polishing treatment of the application surface with a ceria abrasive to make the surface hydrophilic, and then the coating agent is applied twice. As a coating method, a commonly used coating method such as a roll coater method or a reverse coater method can be used, and coating can be performed. After the application, the substrate is left (cured) in a normal temperature and normal humidity atmosphere for 2 hours and then dried in a dryer at 150 ° C. for 30 minutes. After drying, the coated material is allowed to stand still in an atmosphere of normal temperature and normal humidity, and left (cured) for one month.
【0030】実施例2 コーティング剤の調製は、エチルシリケート40の加水
分解に使用する硝酸濃度を1%にする事以外は実施例1
と同様である。 Example 2 A coating agent was prepared in the same manner as in Example 1 except that the concentration of nitric acid used for hydrolysis of ethyl silicate 40 was 1%.
Is the same as
【0031】比較例1 コーティング剤の調製は、エチルシリケート40の加水
分解に使用する硝酸濃度を0.04%にする事以外は実
施例1と同様である。 Comparative Example 1 The preparation of the coating agent was the same as in Example 1 except that the concentration of nitric acid used for hydrolysis of ethyl silicate 40 was 0.04%.
【0032】実施例、比較例で用いた評価方法は、次の
通りである。 耐薬品性:20重量%のNa2CO3水溶液に48時間浸
せき後、膜の外観の変化を肉眼で観察した。耐薬品性評
価において、◎:膜が完全についている状態、○:膜は
あるが、喫水線がかなり薄く見える状態、△:膜はある
が、はっきり喫水線が見える状態、×:膜が完全に剥が
れている状態とした。The evaluation methods used in the examples and comparative examples are as follows. Chemical resistance: After immersion in a 20% by weight aqueous solution of Na 2 CO 3 for 48 hours, changes in the appearance of the film were visually observed. In the chemical resistance evaluation, ◎: state where the film is completely attached, ○: state where the film is present but the waterline looks quite thin, Δ: state where the film is present but the waterline is clearly visible, ×: the film is completely peeled off State.
【0033】[0033]
【表1】 [Table 1]
【0034】実施例3 コーティング剤の調製は実施例1と同様で、コーティン
グ後の放置(養生)方法を次のように行った。基材にコ
ーティング剤を塗布してサンプルを作った後、塩酸エチ
ルアミン(和光純薬製):1.0gを、ジアセトンアル
コール(ゴードー溶剤製);70gとアミノプロパノー
ル(和光純薬製);123gとを混合して作った溶剤に
添加し、10分ほど撹拌する。この時、なるべく非水系
の薬剤を使用する。そしてこの溶液を蓋付のシャーレー
に移して、さらにその溶液の中に被膜面を上にして放置
(養生)後のサンプルを浸せきさせる。次に、シャーレ
ーの蓋をしてデシケータ内に静置する。静置後デシケー
タの蓋をして42日間以上静置し、放置(養生)する。
放置(養生)完了後、サンプルを蒸留水で洗浄する。 Example 3 The preparation of the coating agent was the same as in Example 1, and the method of leaving (curing) after coating was performed as follows. After a sample was prepared by applying a coating agent to a substrate, 1.0 g of ethylamine hydrochloride (manufactured by Wako Pure Chemical), 70 g of diacetone alcohol (manufactured by Gordo Solvent), and 123 g of aminopropanol (manufactured by Wako Pure Chemical); 123 g Is added to a solvent prepared by mixing the above, and stirred for about 10 minutes. At this time, a non-aqueous chemical is preferably used. Then, the solution is transferred to a petri dish with a lid, and the sample after standing (curing) is immersed in the solution with the coating surface facing upward. Next, the lid of the petri dish is covered, and the dish is left in a desiccator. After standing, cover the desiccator with the lid closed, and stand for 42 days or more, and leave (curing).
After standing (curing) is completed, the sample is washed with distilled water.
【0035】実施例4 コーティング剤の調製は実施例1と同様で、コーティン
グ後の放置(養生)方法を次のように行った。基材にコ
ーティング剤を塗布してサンプルを作った後、塩酸エチ
ルアミン(和光純薬製):1.0gを、ジアセトンアル
コール(ゴードー溶剤製);470gとアミノプロパノ
ール(和光純薬製);123gとを混合して作った溶剤
に添加し、10分ほど撹拌する。この時、なるべく非水
系の薬剤を使用する。そしてこの溶液を蓋付のシャーレ
ーに移して、さらにその溶液の中に被膜面を上にして放
置(養生)後のサンプルを浸せきさせる。次に、シャー
レーの蓋をしてデシケータ内に静置する。静置後デシケ
ータの蓋をして42日間以上静置し、放置(養生)す
る。放置(養生)完了後、サンプルを蒸留水で洗浄す
る。 Example 4 The preparation of the coating agent was the same as in Example 1, and the method of leaving (curing) after coating was performed as follows. After preparing a sample by applying a coating agent to the base material, 1.0 g of ethylamine hydrochloride (manufactured by Wako Pure Chemical); 470 g of diacetone alcohol (manufactured by Gordo Solvent); 123 g of aminopropanol (manufactured by Wako Pure Chemical); Is added to a solvent prepared by mixing the above, and stirred for about 10 minutes. At this time, a non-aqueous chemical is preferably used. Then, the solution is transferred to a petri dish with a lid, and the sample after standing (curing) is immersed in the solution with the coating surface facing upward. Next, the lid of the petri dish is covered, and the dish is left in a desiccator. After standing, cover the desiccator with the lid closed, and stand for 42 days or more, and leave (curing). After standing (curing) is completed, the sample is washed with distilled water.
【0036】実施例5 コーティング剤の調製は実施例1と同様で、コーティン
グ後の放置(養生)方法を次のように行った。基材にコ
ーティング剤を塗布した後、そのサンプルをアルゴン雰
囲気で湿度0%RH近くに設定したガス循環精製機付小
型バキュームグローブボックス装置(美和製作所製)内
に静置する。そして、約43日間静置し放置(養生)す
る。 Example 5 The preparation of the coating agent was the same as in Example 1, and the method of leaving (curing) after coating was performed as follows. After applying the coating agent to the base material, the sample is allowed to stand in a small vacuum glove box device (manufactured by Miwa Seisakusho) equipped with a gas circulation purifier set in an argon atmosphere at a humidity near 0% RH. Then, it is left standing (curing) for about 43 days.
【0037】比較例2 コーティング剤の調製は、放置(養生)期間を44日間
にすること以外実施例1と同様である。 Comparative Example 2 The preparation of the coating agent was the same as in Example 1 except that the standing (curing) period was set to 44 days.
【0038】実施例、比較例で用いた評価方法は、次の
通りである。被膜強度:鉛筆硬度測定で被膜強度を評価
する。使用する鉛筆硬度計(東洋精機製のP型)を使用
し、評価の判定要領は、JIS K5400に準ずる。The evaluation methods used in the examples and comparative examples are as follows. Film strength: The film strength is evaluated by pencil hardness measurement. A pencil hardness tester (P type manufactured by Toyo Seiki) is used, and the evaluation judgment procedure conforms to JIS K5400.
【0039】[0039]
【表2】 [Table 2]
【0040】[0040]
【発明の効果】本発明の製造方法を用いる事により、被
膜強度の向上と被膜の耐薬品性の向上を図ることが可能
である。By using the manufacturing method of the present invention, it is possible to improve the film strength and the chemical resistance of the film.
フロントページの続き (51)Int.Cl.6 識別記号 FI // C08J 7/04 C08J 7/04 T (72)発明者 大島 功治 福岡県北九州市小倉北区中島2丁目1番1 号 東陶機器株式会社内Continued on the front page (51) Int.Cl. 6 Identification symbol FI // C08J 7/04 C08J 7/04 T (72) Inventor Koji Oshima 2-1-1 Nakajima, Kokurakita-ku, Kitakyushu-shi, Fukuoka Totoki Equipment Inside the corporation
Claims (6)
シリカまたはその前駆体と、を含む光触媒性被膜を備え
た親水性複合材を製造する方法であって、(a)シリカ
を準備する工程と、(b)光触媒性材料と前記シリカま
たはその前駆体とを含む懸濁液を表面に塗布する工程
と、(c)該懸濁液を硬化させる工程と、からなる製造
方法。1. A method for producing a hydrophilic composite material provided with a photocatalytic coating comprising a substrate and a photocatalytic material and silica or a precursor thereof on the surface of the substrate, comprising: (B) applying a suspension containing a photocatalytic material and the silica or a precursor thereof to the surface; and (c) curing the suspension. .
を少なくとも1日以上放置することを特徴とする請求項
1に記載の製造方法。2. The method according to claim 1, wherein in the step (c), after the coating, the coated product is left for at least one day.
水分解によりシリカを製造する際に、加水分解性触媒を
使用することを特徴とする請求項1または請求項2に記
載の製造方法。3. The method according to claim 1, wherein the step (a) uses a hydrolyzable catalyst when producing silica by hydrolysis from a silica precursor. .
し、該硝酸の添加量をシリカ前駆体1重量部に対して
0.03重量部以上であることを特徴とする請求項3に
記載の製造方法。4. The method according to claim 3, wherein nitric acid is used as the hydrolyzable catalyst, and the amount of the nitric acid is 0.03 parts by weight or more based on 1 part by weight of the silica precursor. Production method.
の湿度雰囲気においてその塗装物を少なくとも1日以上
放置することを特徴とする請求項1または請求項2に記
載の製造方法。5. The method according to claim 1, wherein in the step (c), after the coating, the coated material is left in a humidity atmosphere of 50% or less for at least one day or more.
媒雰囲気またはその溶液内にその塗装物を少なくとも1
日以上放置後使用することを特徴とする請求項1または
請求項2に記載の製造方法。6. In the step (c), after the coating, at least one coated product is placed in an amine-based catalyst atmosphere or a solution thereof.
The method according to claim 1, wherein the method is used after standing for at least one day.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10084896A JPH11262730A (en) | 1998-03-16 | 1998-03-16 | Production of hydrophilic composite material having photocataly tic film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10084896A JPH11262730A (en) | 1998-03-16 | 1998-03-16 | Production of hydrophilic composite material having photocataly tic film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH11262730A true JPH11262730A (en) | 1999-09-28 |
Family
ID=13843514
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10084896A Pending JPH11262730A (en) | 1998-03-16 | 1998-03-16 | Production of hydrophilic composite material having photocataly tic film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH11262730A (en) |
-
1998
- 1998-03-16 JP JP10084896A patent/JPH11262730A/en active Pending
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