JPH1125854A - Roller hearth type continuous kiln for plasma display panel - Google Patents

Roller hearth type continuous kiln for plasma display panel

Info

Publication number
JPH1125854A
JPH1125854A JP9175610A JP17561097A JPH1125854A JP H1125854 A JPH1125854 A JP H1125854A JP 9175610 A JP9175610 A JP 9175610A JP 17561097 A JP17561097 A JP 17561097A JP H1125854 A JPH1125854 A JP H1125854A
Authority
JP
Japan
Prior art keywords
furnace
hearth
plate
muffle
kiln
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9175610A
Other languages
Japanese (ja)
Inventor
Yoshikazu Shimozato
吉計 下里
Toshiyasu Nagoshi
稔泰 名越
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chugai Ro Co Ltd
Original Assignee
Chugai Ro Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chugai Ro Co Ltd filed Critical Chugai Ro Co Ltd
Priority to JP9175610A priority Critical patent/JPH1125854A/en
Priority to TW087103561A priority patent/TW370605B/en
Priority to KR1019980008655A priority patent/KR19990013330A/en
Publication of JPH1125854A publication Critical patent/JPH1125854A/en
Pending legal-status Critical Current

Links

Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/30Details, accessories, or equipment peculiar to furnaces of these types
    • F27B9/3077Arrangements for treating electronic components, e.g. semiconductors
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/14Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment
    • F27B9/20Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path tunnel furnace
    • F27B9/24Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path tunnel furnace being carried by a conveyor
    • F27B9/2407Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path tunnel furnace being carried by a conveyor the conveyor being constituted by rollers (roller hearth furnace)
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/30Details, accessories, or equipment peculiar to furnaces of these types
    • F27B9/32Casings
    • F27B9/34Arrangements of linings
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/30Details, accessories, or equipment peculiar to furnaces of these types
    • F27B2009/305Particular conformation of the furnace

Abstract

PROBLEM TO BE SOLVED: To provide a roller heath type continuos kiln for plasma display panel capable of easily conducting kiln maintenance, such as removal of impurities attached to the surface of a muffle or removal of broken pieces of a glass substrate from the inside of the muffle. SOLUTION: This roller hearth continuous kiln has a treatment chamber H partitioned with a muffle. The treatment chamber is formed into a muffle structure with a top plate 11, a bed plate 14, and a sidewall of an inner plate 11 structure each made of heat resistant steel, the top plate and the bed plate are detachably attached to the sidewall part, most of a top wall part 1 and most of a bed wall part 2 are formed in separable structures, and detachably attached to the sidewall part on the outside of the kiln, and electric heaters 17a, 17b are arranged in the top wall part within the kiln and the bed wall part within the kiln.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、プラズマディスプ
レイパネル(以下、PDPという)用隔壁等を焼成する
ローラハース型連続焼成炉に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a roller hearth type continuous firing furnace for firing partitions and the like for a plasma display panel (hereinafter referred to as "PDP").

【0002】[0002]

【従来の技術】PDPの製造工程には、対向するガラス
基板の少なくとも一方に形成した多数の隔壁を焼成する
工程、あるいはガラス基板の一方の外縁部に塗布した封
着剤を仮焼成する工程等の焼成工程がある。たとえば、
隔壁の焼成は、粉末ガラス等(PbO・B23系低融点
ガラス粉末と特殊セラミック粉末とを混合したもの)
に、樹脂バインダを溶剤に溶解したビークルを加えて混
練したペーストをスクリーン印刷法によりガラス基板上
に数回塗布して所定高さの隔壁を形成し、所定時間放置
してレベリングを行なったのち、100〜150℃で1
0〜15分間乾燥を行なう。その後、焼成炉でペースト
に含まれる有機物を分解させるために昇温速度5〜15
℃/分で焼成温度(550〜580℃)まで昇温し、約
10分間保持して隔壁を焼成する。その後2〜15℃/
分の降温速度で冷却するものである。この焼成炉として
は、ローラハース型連続焼成炉が実用化されている。こ
のローラハース型焼成炉は、マッフル構造の加熱帯と徐
冷帯および水冷ジャケット構成の冷却帯で構成され、前
記加熱帯および徐冷帯の処理室は、炉内のクリーン化に
対応するため、前記マッフル(天井板、炉床板、両側
板)をそれぞれ耐熱ガラスで構成し、各板をそれぞれ炉
内壁と所定間隔をもって配置したものである。なお、前
記加熱帯は通常、昇温帯、加熱帯および焼成帯から構成
されている。
2. Description of the Related Art PDP manufacturing processes include a process of firing a large number of partition walls formed on at least one of the opposing glass substrates or a process of temporarily firing a sealing agent applied to one outer edge of the glass substrate. Firing process. For example,
The baking of the partition walls is performed by powder glass or the like (a mixture of a PbO.B 2 O 3 -based low-melting glass powder and a special ceramic powder)
In addition, a paste obtained by adding a vehicle in which a resin binder is dissolved in a solvent and kneading the mixture is applied several times on a glass substrate by a screen printing method to form a partition having a predetermined height, and left for a predetermined time to perform leveling. 1 at 100-150 ° C
Dry for 0-15 minutes. Thereafter, the temperature is raised at a rate of 5 to 15 in order to decompose organic substances contained in the paste in a firing furnace.
The temperature is raised to a firing temperature (550 to 580 ° C.) at a rate of ° C./minute, and the temperature is maintained for about 10 minutes to fire the partition walls. Then 2-15 ° C /
The cooling is performed at a cooling rate of one minute. As this firing furnace, a roller hearth type continuous firing furnace has been put to practical use. This roller hearth type firing furnace is composed of a heating zone having a muffle structure, a slow cooling zone, and a cooling zone having a water-cooled jacket configuration, and the processing chambers of the heating zone and the slow cooling zone correspond to the cleaning of the furnace. The muffle (ceiling plate, hearth plate, both side plates) is made of heat-resistant glass, and each plate is arranged at a predetermined interval from the furnace inner wall. In addition, the said heating zone is normally comprised from a heating zone, a heating zone, and a baking zone.

【0003】[0003]

【発明が解決しようとする課題】ところで、隔壁等の焼
成処理時、ペースト中の樹脂バインダ等の有機物は空気
と反応して熱・酸化分解して除去されるが、この分解ガ
ス中の炭化物等の不純物がマッフル表面に付着する。そ
のため、定期的にこの不純物を除去してマッフル表面を
清浄化する必要がある。また、焼成処理中に炉内でガラ
ス基板が破損すると、炉内から破損物を除去する必要が
ある。しかしながら、従来のローラハース型連続焼成炉
では、加熱帯等の処理室を形成するマッフルが耐熱ガラ
スで構成されているため、この耐熱ガラスの破損を防止
する必要上、前記不純物の除去作業、破損物の除去作業
は慎重に行なわなければならず作業性が悪く作業時間が
長くなる。また、側板を形成するマッフルは炉内壁から
所定間隔をもって設けるため、それだけ、炉幅が大きく
なる等の問題を有していた。したがって、本発明は加熱
帯等の処理室をマッフル構造とするものの、マッフル内
表面に付着した不純物の除去を容易に、かつ、ガラス基
板が処理室内で破損した際に、これら破損片をマッフル
を破損することなく容易に除去することのできるPDP
用ローラハース型連続焼成炉を提供することを目的とす
る。また、より生産性のよいPDP用ローラハース型連
続焼成炉を提供することを目的とする。
During the baking treatment of the partition walls and the like, the organic matter such as the resin binder in the paste reacts with the air and is removed by heat and oxidative decomposition. Impurities adhere to the muffle surface. For this reason, it is necessary to periodically remove these impurities to clean the muffle surface. In addition, when the glass substrate is broken in the furnace during the firing process, it is necessary to remove the broken material from the furnace. However, in the conventional roller hearth type continuous firing furnace, since the muffle forming the processing chamber such as the heating zone is made of heat-resistant glass, it is necessary to prevent breakage of the heat-resistant glass. Must be carefully performed, and the workability is poor and the work time is lengthened. Further, since the muffle forming the side plate is provided at a predetermined interval from the inner wall of the furnace, there has been a problem that the furnace width is correspondingly increased. Therefore, although the present invention has a muffle structure in the processing chamber such as a heating zone, it is easy to remove impurities attached to the inner surface of the muffle, and when the glass substrate is broken in the processing chamber, the broken pieces are muffled. PDP that can be easily removed without damage
It is an object to provide a roller hearth type continuous firing furnace for use. It is another object of the present invention to provide a roller hearth type continuous firing furnace for PDP with higher productivity.

【0004】[0004]

【課題を解決するための手段】本発明は、前記目的を達
成するために、マッフルにより区画された処理室を有す
るプラズマディスプレイパネル用ローラハース型連続焼
成炉において、前記処理室を耐熱鋼製の天井板と耐熱鋼
製の炉床板と耐熱鋼製内板構造の側壁とでマッフル構造
とし、前記天井板と炉床板をそれぞれ炉内側の炉側壁部
に着脱自在に取り付けるとともに、前記炉の天井壁部と
炉床壁部の大半を分離構造とし、これらをそれぞれ炉外
側の側壁部に着脱自在に取り付け、かつ、炉内天井壁部
と炉内炉床壁部に電熱ヒータを配設したものである。ま
た、前記天井板と炉床板との間を2枚の耐熱鋼製仕切板
で上部処理室と下部処理室とに分割するとともに、2枚
の仕切板間で形成される空間に電熱ヒータを設け、か
つ、前記上部,下部処理室にそれぞれハースローラを配
設したものである。
According to the present invention, there is provided a roller hearth type continuous firing furnace for a plasma display panel having a processing chamber partitioned by muffles, wherein the processing chamber is made of a heat-resistant steel ceiling. A muffle structure comprising a plate, a hearth plate made of heat-resistant steel, and a side wall of a heat-resistant steel inner plate structure. Most of the furnace hearth and the hearth wall are separated, and these are detachably attached to the furnace outer side wall, respectively, and electric heaters are arranged on the furnace inner ceiling wall and the furnace hearth wall. . Further, the space between the ceiling plate and the hearth plate is divided into an upper processing chamber and a lower processing chamber by two heat-resistant steel partition plates, and an electric heater is provided in a space formed between the two partition plates. And a hearth roller disposed in each of the upper and lower processing chambers.

【0005】[0005]

【発明の実施の形態】つぎに、本発明の実施の態様を図
にしたがって説明する。図に示すPDP用ローラハース
型連続焼成炉(以下、R・H型焼成炉という)Tは、大
略、昇温帯A、加熱帯B、焼成帯C、徐冷帯Dと急冷帯
Eとからなる。そして、前記昇温帯Aから徐冷帯Dの各
処理室Hはマッフル構造となっており、かつ、R・H型
焼成炉Tの内部には上下2段に所定間隔でハースローラ
Rが設けられ、PDPを構成するガラス基板Wが上下2
列で同時に焼成されるようになっている。
Next, embodiments of the present invention will be described with reference to the drawings. A roller hearth type continuous firing furnace (hereinafter, referred to as an RH type firing furnace) T for a PDP shown in the figure generally includes a heating zone A, a heating zone B, a firing zone C, a slow cooling zone D, and a rapid cooling zone E. Each of the processing chambers H from the temperature-raising zone A to the slow cooling zone D has a muffle structure, and hearth rollers R are provided at predetermined intervals in upper and lower two stages inside an RH type firing furnace T, The glass substrate W that constitutes the PDP is up and down 2
They are fired simultaneously in rows.

【0006】また、少なくともマッフル10の内面に不
純物が付着し、あるいはガラス基板Wが破損しやすい前
記昇温帯Aおよび加熱帯Bは、図2,図5に示す断面構
造となっている。なお、図においては、焼成帯Cおよび
徐冷帯Dも同様構成としてある。すなわち、昇温帯Aお
よび加熱帯Bを構成する天井壁部1の一部(以下、分離
天井壁部1aという)と炉床壁部2の一部(以下、分離
炉床部2aという)は、所定ブロック毎に炉側壁部3か
ら着脱自在となっている。
Further, the heating zone A and the heating zone B in which impurities adhere to at least the inner surface of the muffle 10 or the glass substrate W is apt to be broken have a cross-sectional structure shown in FIGS. In the figure, the sintering zone C and the slow cooling zone D have the same configuration. That is, a part of the ceiling wall part 1 (hereinafter, referred to as a separated ceiling wall part 1a) and a part of the hearth wall part 2 (hereinafter, referred to as a separated hearth part 2a) constituting the heating zone A and the heating zone B, It is detachable from the furnace side wall 3 for each predetermined block.

【0007】具体的には、図3,図6および図7に示す
ように、分離天井壁部1aは吊下げ金具4により上方に
炉側壁部3から分離され、また分離炉床部2aは炉床2
下方に敷設されたローラコンベア5上を移動するリフタ
ーテーブル6により下方に炉側壁部3から分離されるよ
うになっている。なお、前記分離天井壁部1aと分離炉
床部2aとは炉側壁部3にボルト・ナット等の着脱自在
な取付部材7により取り付けられている。
More specifically, as shown in FIGS. 3, 6, and 7, the separated ceiling wall 1a is separated upward from the furnace side wall 3 by a hanging metal fitting 4, and the separated hearth 2a is Floor 2
A lifter table 6 that moves on a roller conveyor 5 laid below is separated downward from the furnace side wall 3. The separated ceiling wall 1a and the separated hearth 2a are attached to the furnace side wall 3 by detachable attachment members 7 such as bolts and nuts.

【0008】前記マッフル10は内板11、天井板1
2、炉床板14とからなり、いずれも耐熱鋼板、好まし
くは、酸化スケールの発生による不都合を防ぐため、耐
酸化性耐熱鋼、たとえば、サンドビック社製253MA
等である。
The muffle 10 comprises an inner plate 11, a ceiling plate 1
2. A hearth plate 14, which is a heat-resistant steel plate, preferably an oxidation-resistant heat-resistant steel such as 253MA manufactured by Sandvik Co., Ltd.
And so on.

【0009】そして、前記内板11は炉側壁部3の内表
面に沿い、かつ、その上下端部は外方に折曲され、分離
天井壁部1aおよび分離炉床壁部2aが分離される位置
において外方に長く延びている。天井板12と炉床板1
4とは、図3,図6および図7に示すように、断面凹凸
を有し、その両端を炉側壁部3の上下端の内側に内板1
1とともにボルト13により取り付けられている。
The inner plate 11 extends along the inner surface of the furnace side wall 3 and its upper and lower ends are bent outward to separate the separation ceiling wall 1a and the separation furnace floor wall 2a. It extends outwardly in position. Ceiling board 12 and hearth board 1
4, as shown in FIG. 3, FIG. 6 and FIG.
1 together with bolts 13.

【0010】なお、本実施の態様においては、前記天井
板12と炉床板14との間に2枚の仕切板15が所定間
隔をもって前記内板11に設けた受け金具16上に2段
に載置されるようになっている。また、分離天井壁部1
aと分離炉床部2aおよび前記2段の仕切板15間には
電熱ヒータ17a,17b,17cがそれぞれ配設さ
れ、前記ハースローラRは前記天井板11と仕切板15
間および仕切板15と炉床板14との間に端部が炉側壁
部3から外に突出するように配設されている。さらに、
昇温帯Aと徐冷帯Dには、図1,図2,図5に示すよう
に、処理室H内にクーリングエア等の気体供給手段18
と炉内雰囲気を炉外に排気する排気手段19が設けてあ
る。
In this embodiment, two partition plates 15 are mounted in two steps on a receiving bracket 16 provided on the inner plate 11 at a predetermined interval between the ceiling plate 12 and the hearth plate 14. Is to be placed. Separated ceiling wall 1
a, electric heaters 17a, 17b, 17c are respectively disposed between the separation hearth 2a and the two-stage partition plate 15, and the hearth roller R is provided between the ceiling plate 11 and the partition plate 15;
The end portions are arranged between the partition plate 15 and the hearth plate 14 so that the end portions protrude outside from the furnace side wall portion 3. further,
As shown in FIG. 1, FIG. 2, and FIG. 5, gas supply means 18 such as cooling air is provided in the processing chamber H.
And an exhaust means 19 for exhausting the atmosphere inside the furnace to the outside of the furnace.

【0011】つぎに、前記構成からなるR・H型焼成炉
Tを使用してPDP用隔壁の焼成方法を説明する。ま
ず、前記したペーストをスクリーン印刷法等によりガラ
ス基板W上に印刷して隔壁を形成し、100〜150℃
で10〜15分間乾燥処理を行なう。ついで、乾燥処理
を経たガラス基板WをR・H型焼成炉Tの装入部に装入
し、ガラス基板Wを順次抽出側にハースローラRで搬送
して、その間に隔壁を焼成処理する。
Next, a method of firing the partition walls for PDP using the RH type firing furnace T having the above-described configuration will be described. First, the above-mentioned paste is printed on a glass substrate W by a screen printing method or the like to form a partition, and 100 to 150 ° C.
For 10 to 15 minutes. Next, the dried glass substrate W is loaded into the loading section of the RH type firing furnace T, and the glass substrate W is sequentially conveyed to the extraction side by the hearth roller R, during which the partition walls are fired.

【0012】すなわち、R・H型焼成炉Tに装入された
ガラス基板Wは、昇温帯Aおよび加熱帯Bで5〜15℃
/minの昇温速度で焼成温度(500〜600℃)まで
加熱される。この間に、主に昇温帯Aで隔壁中の樹脂バ
インダは熱・酸化分解され大半が気化し、処理室H内へ
供給されたクリーンエアとともに炉外に排出される。な
お、前記クリーンエアとは、JISB9920で示され
る清浄度クラス7で露点−10℃程度の空気をいう。そ
して、ガラス基板Wは焼成帯C(500〜600℃)で
所定時間(5〜30分)保持されて隔壁が焼成され、つ
ぎの徐冷帯D、急冷帯Eで冷却され炉外に排出されるこ
とになる。
That is, the glass substrate W charged into the RH-type firing furnace T is heated at 5 to 15 ° C. in the heating zone A and the heating zone B.
It is heated to a firing temperature (500 to 600 ° C.) at a heating rate of / min. During this time, the resin binder in the partition wall is mainly thermally and oxidatively decomposed in the temperature increasing zone A, most of which is vaporized, and discharged out of the furnace together with the clean air supplied into the processing chamber H. The clean air is air having a dew point of about −10 ° C. in a cleanliness class 7 indicated by JIS B9920. Then, the glass substrate W is held in a sintering zone C (500 to 600 ° C.) for a predetermined time (5 to 30 minutes) to sinter the partition walls, cooled in the subsequent slow cooling zone D and rapid cooling zone E, and discharged out of the furnace. Will be.

【0013】前記処理工程において、前述のように、主
として昇温帯Aにおいて、隔壁中の樹脂バインダが熱・
酸化分解され、このときに生じる大半の不純物(ヤニ)
はクリーンエアとともに炉外に排出されるが、若干は前
記マッフル10表面に付着して除去する必要が生じる。
また、ハースローラRでガラス基板Wを炉内搬送中にお
いて破損し、その破損片を除去する必要が生じる。この
場合、分離天井壁部1aあるいは分離炉床部2aを炉側
壁部3に取り付けている取付部材7を取り外したのち、
分離天井壁部1aは吊下げ金具4を利用してクレーンで
取り外し、また、分離炉床壁部2aはリフタテーブル6
により取り外す。その後、天井板12あるいは炉床板1
4を炉側壁部3に取り付けているボルト13を取り外し
たのち天井板12および炉床板14を取り外し、さらに
は、仕切板15を炉外に取出して、清掃あるいは破損片
を片付けることになる。
In the above-mentioned processing step, as described above, mainly in the temperature raising zone A, the resin binder in the partition walls is heat and heat.
Most impurities (oxidants) generated by oxidative decomposition at this time
Is discharged out of the furnace together with the clean air, but it is necessary to remove a small amount by adhering to the surface of the muffle 10.
Further, the glass substrate W is broken by the hearth roller R during the transfer in the furnace, and it is necessary to remove the broken pieces. In this case, after removing the attachment member 7 that attaches the separation ceiling wall 1a or the separation hearth 2a to the furnace side wall 3,
The separated ceiling wall 1a is detached by a crane using the hanging bracket 4, and the separated hearth wall 2a is lifter table 6
Remove with. Thereafter, the ceiling plate 12 or the hearth plate 1
After removing the bolts 13 for attaching 4 to the furnace side wall 3, the ceiling plate 12 and the hearth plate 14 are removed, and further, the partition plate 15 is taken out of the furnace to clean or remove broken pieces.

【0014】前記実施の態様においては、処理室Hのマ
ッフル構造を2枚の仕切板15,15により区切り、ハ
ースローラRを2段に設けてガラス基板Wを処理する場
合について述べたが、仕切板15、中間の電熱ヒータ1
7cを設けず、ハースローラRも1段とするようにして
もよいことは勿論である。
In the above embodiment, the case where the muffle structure of the processing chamber H is divided by the two partition plates 15 and 15 and the hearth roller R is provided in two stages to process the glass substrate W has been described. 15. Intermediate electric heater 1
Needless to say, the hearth roller R may be formed as one stage without the 7c.

【0015】[0015]

【発明の効果】以上の説明で明らかなように、本発明に
よれば、処理室を構成する炉の天井壁部と炉床壁部の大
半を炉本体(炉側壁部)から容易に取り外しのできる分
離天井壁部と分離炉床壁部とし、かつ、マッフルも分離
構造であるため、これらを取り外すことによりマッフル
に付着した不純物や破損ガラス片の除去作業を効率的に
行なえる。また、マッフル構成部材は従来のようにガラ
ス製でなく耐熱鋼製であるため、前記除去作業時に破損
することがなく取扱いが容易である。さらに、マッフル
の側壁は内板構造の側壁で構成するため、従来のよう
に、炉側壁の内側に所定間隔をもって設置する必要がな
く、それだけ炉巾を軽減することができる。さらにま
た、マッフル内に2枚の仕切板を設け、この仕切板間に
ヒータを配置して処理室を2室とし、この各処理室にロ
ーラハースを配設するようにすると、前述の効果に加え
て、さらに生産性を向上することができる。
As is apparent from the above description, according to the present invention, most of the ceiling wall and the hearth wall of the furnace constituting the processing chamber can be easily removed from the furnace body (furnace side wall). Since the separation ceiling wall and separation hearth wall can be formed and the muffle has a separation structure, removal of impurities and broken glass fragments attached to the muffle can be performed efficiently by removing these. In addition, since the muffle component is made of heat-resistant steel instead of glass as in the related art, it is easy to handle without being damaged during the removal operation. Further, since the side wall of the muffle is constituted by the side wall of the inner plate structure, unlike the conventional case, it is not necessary to install the inside of the furnace side wall at a predetermined interval, and the furnace width can be reduced accordingly. Further, when two partition plates are provided in the muffle, a heater is arranged between the partition plates to form two processing chambers, and a roller hearth is provided in each of the processing chambers. Thus, the productivity can be further improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明にかかるディスプレイパネル用ローラ
ハース型連続焼成炉の縦断面図。
FIG. 1 is a longitudinal sectional view of a roller hearth type continuous firing furnace for a display panel according to the present invention.

【図2】 図1の昇温帯の拡大断面図。FIG. 2 is an enlarged cross-sectional view of a heating zone in FIG. 1;

【図3】 図1の昇温帯における一部拡大側面図。FIG. 3 is a partially enlarged side view of the temperature rising zone in FIG. 1;

【図4】 図1の加熱帯における一部拡大詳細図。FIG. 4 is a partially enlarged detailed view of a heating zone in FIG. 1;

【図5】 図2の要部拡大図。FIG. 5 is an enlarged view of a main part of FIG. 2;

【図6】 図5の一部拡大図。FIG. 6 is a partially enlarged view of FIG. 5;

【図7】 図5の一部拡大図。FIG. 7 is a partially enlarged view of FIG. 5;

【符号の説明】 A…昇温帯、B…加熱帯、C…焼成帯、D…徐冷帯、E
…急冷帯、H…処理室、R…ハースローラ、T…ディス
プレイパネル用ローラハース型連続焼成炉、W…ガラス
基板、1…天井壁部、1a…分離天井壁部、2…炉床壁
部、2a…分離天井壁部、3…炉側壁部、4…吊下げ金
具、6…リフターテーブル、7…取付部材、10…マッ
フル、11…内板、12…天井板、14…炉床板、15
…仕切板、17a,17b,17c…電熱ヒータ。
[Description of Signs] A: heating zone, B: heating zone, C: firing zone, D: slow cooling zone, E
... Quenching zone, H ... Treatment room, R ... Heath roller, T ... Roller hearth type continuous firing furnace for display panel, W ... Glass substrate, 1 ... Ceiling wall, 1a ... Separated ceiling wall, 2 ... Heart floor wall, 2a ... Separated ceiling wall, 3 ... furnace side wall, 4 ... hanging bracket, 6 ... lifter table, 7 ... mounting member, 10 ... muffle, 11 ... inner plate, 12 ... ceiling plate, 14 ... furnace plate, 15
... partition plates, 17a, 17b, 17c ... electric heaters.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 マッフルにより区画された処理室を有す
るプラズマディスプレイパネル用ローラハース型連続焼
成炉において、前記処理室を耐熱鋼製の天井板と耐熱鋼
製の炉床板と耐熱鋼製内板構造の側壁とでマッフル構造
とし、前記天井板と炉床板をそれぞれ炉内側の炉側壁部
に着脱自在に取り付けるとともに、前記炉の天井壁部と
炉床壁部の大半を分離構造とし、これらをそれぞれ炉外
側の側壁部に着脱自在に取り付け、かつ、炉内天井壁部
と炉内炉床壁部に電熱ヒータを配設したことを特徴とす
るプラズマディスプレイパネル用ローラハース型連続焼
成炉。
In a roller hearth continuous firing furnace for a plasma display panel having a processing chamber partitioned by a muffle, the processing chamber is formed of a heat-resistant steel ceiling plate, a heat-resistant steel hearth plate, and a heat-resistant steel inner plate structure. A side wall and a muffle structure, the ceiling plate and the hearth plate are detachably attached to a furnace side wall portion inside the furnace, and the ceiling wall portion and the hearth wall portion of the furnace are separated from each other. A roller hearth type continuous firing furnace for a plasma display panel, characterized in that the heater is removably attached to an outer side wall and an electric heater is disposed on a furnace inner wall and a furnace hearth wall.
【請求項2】 前記天井板と炉床板との間を2枚の耐熱
鋼製仕切板で上部処理室と下部処理室とに分割するとと
もに、2枚の仕切板間で形成される空間に電熱ヒータを
設け、かつ、上部,下部処理室にそれぞれハースローラ
を配設したことを特徴とする前記請求項1に記載のプラ
ズマディスプレイパネル用ローラハース型連続熱処理
炉。
2. The space between the ceiling plate and the hearth plate is divided into an upper processing chamber and a lower processing chamber by two heat-resistant steel partition plates, and the space formed between the two partition plates is electrically heated. 2. The roller hearth type continuous heat treatment furnace for a plasma display panel according to claim 1, wherein a heater is provided, and hearth rollers are provided in the upper and lower processing chambers.
JP9175610A 1997-07-01 1997-07-01 Roller hearth type continuous kiln for plasma display panel Pending JPH1125854A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP9175610A JPH1125854A (en) 1997-07-01 1997-07-01 Roller hearth type continuous kiln for plasma display panel
TW087103561A TW370605B (en) 1997-07-01 1998-03-11 Roller hearth type continuous firing furnace for plasma display panel
KR1019980008655A KR19990013330A (en) 1997-07-01 1998-03-14 Roller Haas Type Continuous Firing Furnace for Plasma Display Panel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9175610A JPH1125854A (en) 1997-07-01 1997-07-01 Roller hearth type continuous kiln for plasma display panel

Publications (1)

Publication Number Publication Date
JPH1125854A true JPH1125854A (en) 1999-01-29

Family

ID=15999109

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9175610A Pending JPH1125854A (en) 1997-07-01 1997-07-01 Roller hearth type continuous kiln for plasma display panel

Country Status (3)

Country Link
JP (1) JPH1125854A (en)
KR (1) KR19990013330A (en)
TW (1) TW370605B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6930285B2 (en) 2002-12-11 2005-08-16 Pioneer Plasma Display Corporation Firing furnace for plasma display panel and method of manufacturing plasma display panel
US7568914B2 (en) 2006-07-10 2009-08-04 Fujitsu Hitachi Plasma Display Limited Heat treatment apparatus

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100418030B1 (en) * 2001-05-11 2004-02-14 엘지전자 주식회사 A Device For Manufacturing The Plasma Display Panel

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6930285B2 (en) 2002-12-11 2005-08-16 Pioneer Plasma Display Corporation Firing furnace for plasma display panel and method of manufacturing plasma display panel
US7568914B2 (en) 2006-07-10 2009-08-04 Fujitsu Hitachi Plasma Display Limited Heat treatment apparatus

Also Published As

Publication number Publication date
KR19990013330A (en) 1999-02-25
TW370605B (en) 1999-09-21

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