JPH11233505A - Exhaust apparatus - Google Patents
Exhaust apparatusInfo
- Publication number
- JPH11233505A JPH11233505A JP10048881A JP4888198A JPH11233505A JP H11233505 A JPH11233505 A JP H11233505A JP 10048881 A JP10048881 A JP 10048881A JP 4888198 A JP4888198 A JP 4888198A JP H11233505 A JPH11233505 A JP H11233505A
- Authority
- JP
- Japan
- Prior art keywords
- exhaust
- pressure
- opening
- dew
- path member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/25—Process efficiency
Landscapes
- Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
- Formation Of Insulating Films (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、水蒸気を用いて被
処理体に対して熱処理を行う反応容器に接続された排気
装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exhaust device connected to a reaction vessel for performing a heat treatment on an object using steam.
【0002】[0002]
【従来の技術】半導体デバイスの絶縁膜であるシリコン
酸化膜を形成する装置として例えば縦型熱処理装置が知
られている。縦型熱処理装置は、加熱炉で囲まれた石英
製の反応管内に、多数枚の半導体ウエハを棚状に保持し
たウエハボートを搬入すると共に酸化用のガスを導入し
てシリコンを酸化するものである。そして酸化処理の方
法としては、水蒸気を用いるタイプのウェット酸化処理
と水蒸気を用いずに酸素あるいはオゾンなどを用いるド
ライ酸化処理とがあり、ウェット酸化処理を行う場合に
は排気路中に水分が溜まって排気路を塞いでしまわない
ようにするために、図10に示すように例えば反応管1
0内を排気するための排気路11の最も低い位置にドレ
イン管12を接続し、このドレイン管12を流れてきた
水が容器13に溜められるようになっている。この容器
13の底部には、例えば一端が工場排水側に接続された
排水管14の他端が接続されている。また排気路11の
先端側には排ガス中の水分を結露させるためのトラップ
15及び反応管10内の圧力を調整するためのバタフラ
イバルブ16を介して、工場に設置された排気ダクトに
接続されており、反応管10内から排気されたガスは前
記排気ダクトを通り、所定の処理がなされた後外気へ排
出される。2. Description of the Related Art For example, a vertical heat treatment apparatus is known as an apparatus for forming a silicon oxide film as an insulating film of a semiconductor device. A vertical heat treatment apparatus oxidizes silicon by carrying a wafer boat holding a large number of semiconductor wafers in a shelf into a quartz reaction tube surrounded by a heating furnace and introducing an oxidizing gas. is there. As a method of the oxidation treatment, there are a wet oxidation treatment using steam and a dry oxidation treatment using oxygen or ozone without using steam. In the case of performing the wet oxidation treatment, water is accumulated in an exhaust passage. As shown in FIG. 10, for example, a reaction tube 1
A drain pipe 12 is connected to the lowest position of an exhaust path 11 for exhausting the inside of the tube 0, and water flowing through the drain pipe 12 is stored in a container 13. The other end of the drainage pipe 14 whose one end is connected to the factory drainage side, for example, is connected to the bottom of the container 13. The end of the exhaust passage 11 is connected to an exhaust duct installed in a factory via a trap 15 for dew condensation of moisture in the exhaust gas and a butterfly valve 16 for adjusting the pressure in the reaction tube 10. The gas exhausted from the inside of the reaction tube 10 passes through the exhaust duct, and after being subjected to a predetermined process, is exhausted to the outside air.
【0003】[0003]
【発明が解決しようとする課題】ところで酸化処理を行
う場合には反応管10内の圧力がバタフライバルブ14
により所定の値例えば−5mmH2 Oに維持されるよう
にコントロールされるが、パターンの微細化による薄膜
化に伴い、絶縁膜の膜質について厳しい要求がなされて
きており、このためプロセス圧についても高い精度でコ
ントロールすることが必要である。しかしながら上述の
装置ではドレイン管12から流れてきた水を開放された
容器13内に溜めるようにしているので、反応管10内
の処理ガスがドレイン管12を通じて例えば工場内に漏
洩してしまう。このようにガスの漏洩が起こると、環境
衛生上好ましくないという問題がある。When the oxidation treatment is performed, the pressure in the reaction tube 10 is increased by the butterfly valve 14.
Is controlled so as to be maintained at a predetermined value, for example, −5 mmH 2 O. However, as the pattern becomes thinner by miniaturization of the pattern, strict requirements are imposed on the film quality of the insulating film, and therefore the process pressure is also high. It is necessary to control with precision. However, in the above-described apparatus, since the water flowing from the drain tube 12 is stored in the open container 13, the processing gas in the reaction tube 10 leaks through the drain tube 12 into, for example, a factory. When the gas leaks as described above, there is a problem that it is not preferable in terms of environmental health.
【0004】一方前記容器13を密閉すると、ドレイン
管12と排水管14とが容器13内の空間を介して連通
するので、反応管10内がドレイン管12の背圧、つま
り排水管10の一端側の圧力の影響を受ける。なお排水
管14に設けられたバルブVを閉じておくと、反応管1
0内の圧力が容器13内の水量に応じた容器13内の圧
力の影響を受ける。On the other hand, when the vessel 13 is sealed, the drain pipe 12 and the drain pipe 14 communicate with each other via the space in the vessel 13, so that the inside of the reaction pipe 10 is back pressure of the drain pipe 12, that is, one end of the drain pipe 10. Affected by side pressure. When the valve V provided on the drain pipe 14 is closed, the reaction pipe 1
The pressure in 0 is affected by the pressure in the container 13 according to the amount of water in the container 13.
【0005】更にまた上述の装置は、トラップ15にて
排ガス中の水分が結露するので、ここで圧力が大きく変
動し、時間的に見れば排気路11に設けられた図示しな
い圧力計の圧力検出値が頻繁に波を打つ格好になるの
で、バタフライ弁16が小刻みに揺れる。こうしたこと
から反応管10内の圧力を所定値に高い精度で維持する
ことが困難であるという問題がある。Further, in the above-described apparatus, since the moisture in the exhaust gas is condensed in the trap 15, the pressure fluctuates greatly at this point, and the pressure is detected by a pressure gauge (not shown) provided in the exhaust path 11 in terms of time. The butterfly valve 16 fluctuates in small increments because the value frequently appears to wave. For this reason, there is a problem that it is difficult to maintain the pressure in the reaction tube 10 at a predetermined value with high accuracy.
【0006】本発明は、このような事情の下になされた
ものであり、その目的は水蒸気を用いて被処理体に対し
て熱処理例えば酸化処理を行う場合に反応容器内の圧力
を高い精度で制御することができ、例えば良質な酸化膜
を得ることのできる排気装置を提供することを目的とす
る。[0006] The present invention has been made under such circumstances, and an object of the present invention is to control the pressure in a reaction vessel with high accuracy when performing heat treatment, for example, oxidation treatment on an object using steam. An object of the present invention is to provide an exhaust device that can be controlled and can obtain a high-quality oxide film, for example.
【0007】[0007]
【課題を解決するための手段】請求項1の発明は、水蒸
気を用いて被処理体に対して熱処理を行う反応容器に接
続された排気装置において、前記反応容器に接続された
排気路部材と、この排気路部材に設けられ、排気ガス中
の水分を結露させるための結露手段と、前記排気路部材
における結露手段よりも下流側に設けられた圧力調整部
と、前記反応容器の排気口と結露手段との間におけるこ
れらよりも低い位置にて排気路部材から分岐された第1
の排水路部材と、この第1の排水路部材を通って流れて
きた水を溜めるようにその中に第1の排水路部材の下端
が開口する密閉容器と、この密閉容器内に一端が開口す
る第2の排水路部材と、を備え、前記第2の排水路部材
の一端は、第1の排水路部材の下端開口部よりも上方側
の位置にて密閉容器内の水を吸い込めるように開口し、
前記第1の排水路部材の下端開口部よりも上方側に水位
が位置することによって、第1の排水路部材及び第2の
排水路部材の各開口部間に液相が存在するように構成し
たことを特徴とする。このように構成すれば、反応容器
内の圧力制御を行うにあたって、第1の排水路部材の背
圧の影響がなくなる。この場合密閉容器内の水位が第1
の排水路部材の開口部よりも上に位置するように密閉容
器内に液体を供給するための液体供給手段を設けるよう
にしてもよい(請求項2の発明)。According to a first aspect of the present invention, there is provided an exhaust device connected to a reaction vessel for performing heat treatment on an object to be processed by using steam, wherein an exhaust path member connected to the reaction vessel is provided. A dew-condensing unit provided in the exhaust path member, for dew condensation of moisture in the exhaust gas, a pressure adjusting unit provided downstream of the dew-condensing unit in the exhaust path member, and an exhaust port of the reaction vessel. A first branch branched from the exhaust path member at a position lower than these with the dew condensation means.
, A closed container in which the lower end of the first drainage member is opened so as to collect water flowing through the first drainage member, and one end opened in the closed container. And a second drainage channel member, wherein one end of the second drainage channel member sucks water in the sealed container at a position above the lower end opening of the first drainage channel member. Opening to
The water level is located above the lower end opening of the first drainage channel member so that a liquid phase exists between the openings of the first drainage channel member and the second drainage channel member. It is characterized by having done. With this configuration, the influence of the back pressure of the first drainage channel member is eliminated when controlling the pressure in the reaction vessel. In this case, the water level in the closed container is the first
The liquid supply means for supplying the liquid into the closed container may be provided so as to be located above the opening of the drainage member (the invention of claim 2).
【0008】また排気路部材の下流側は、工場に設けら
れた排気ダクトに接続され、前記排気路部材における圧
力調整部よりも下流側からは主分岐路を、その分岐点よ
りも高いレベルを経由して密閉容器に接続されるように
分岐させると共に、この主分岐路内の圧力を検出して例
えば工場に設置された排気ダクト内の圧力を監視する圧
力監視部を設けるようにしてもよい(請求項3の発
明)。この場合主分岐路から更に補助分岐路を分岐し、
この補助分岐路に圧力監視部を設けることが好ましい
(請求項4の発明)。Further, the downstream side of the exhaust path member is connected to an exhaust duct provided in a factory, and the main branch path is provided from the downstream side of the pressure adjusting portion of the exhaust path member, and the level is higher than the branch point. A branch may be made so as to be connected to an airtight container via an airtight container, and a pressure monitoring unit that detects the pressure in the main branch and monitors the pressure in an exhaust duct installed in a factory, for example, may be provided. (Invention of claim 3). In this case, the auxiliary branch road is further branched from the main branch road,
It is preferable to provide a pressure monitoring unit in this auxiliary branch passage (the invention of claim 4).
【0009】請求項5の発明は、水蒸気を用いて被処理
体に対して熱処理を行う反応容器に接続された排気装置
において、前記反応容器に接続された排気路部材と、こ
の排気路部材に設けられ、排気ガス中の水分を結露させ
るための結露手段と、前記排気路部材における結露手段
よりも下流側に設けられた圧力調整部と、前記反応容器
の排気口と結露手段との間におけるこれらよりも低い位
置にて排気路部材から分岐された第1の排水路部材と、
前記排気路部材における結露手段の下流側から分岐して
設けられた分岐路と、この分岐路に設けられ、前記結露
手段における水分の結露による排気路部材内の圧力変動
を吸収するための圧力変動吸収部と、を備え、前記圧力
変動吸収部は、外部に連通するように前記分岐路に形成
された開口部と、この開口部を内側から塞ぐように抑制
され、前記排気路部材内の圧力が低くなったときに、抑
制力に抗して内部に引き寄せられて開口部を開く蓋体
と、を備えたことを特徴とする。According to a fifth aspect of the present invention, there is provided an exhaust device connected to a reaction vessel for performing a heat treatment on an object to be processed using steam, wherein an exhaust path member connected to the reaction vessel, and an exhaust path member connected to the reaction vessel. A dew-condensing unit for dew-condensing moisture in the exhaust gas, a pressure adjusting unit provided downstream of the dew-condensing unit in the exhaust-path member, and a dew-condensing unit between the exhaust port of the reaction vessel and the dew-condensing unit. A first drainage channel member branched from the exhaust channel member at a position lower than these,
A branch path provided from the downstream side of the dew condensation means in the exhaust path member, and a pressure fluctuation provided in the branch path for absorbing pressure fluctuation in the exhaust path member due to dew condensation of water in the dew condensation means. An opening portion formed in the branch passage so as to communicate with the outside, and the pressure fluctuation absorbing portion is suppressed so as to block the opening from the inside, and the pressure in the exhaust passage member is reduced. And a lid that is drawn inward against the restraining force to open the opening when is lowered.
【0010】このようにすれば、圧力変動が緩和される
ので圧力調整部の動作が安定する。この場合圧力変動吸
収部の蓋体は、前記排気路部材内の圧力が低くなったと
きに、抑制力に抗して内部に引き寄せられて開口部を開
く代わりに、開口部を閉じたまま内部に引き寄せられよ
うに弾性膜により形成されたものとすることもできる。With this configuration, the pressure fluctuation is reduced, and the operation of the pressure adjusting section is stabilized. In this case, when the pressure in the exhaust passage member becomes low, the lid of the pressure fluctuation absorbing portion is pulled inside against the suppressing force to open the opening and instead of opening the opening, the inside of the lid is kept closed. It may be formed of an elastic film so as to be attracted to the elastic film.
【0011】[0011]
【発明の実施の形態】以下に本発明の排気装置につい
て、縦型熱処理装置に適用した実施の形態を例にとって
説明する。縦型熱処理装置は図1に示すようにヒータ2
1に囲まれた反応容器例えば石英製の反応管22内に、
多数枚のウエハWをウエハボート23に棚状に保持して
例えば下方側から搬入し、反応管22の下端開口部をキ
ャップ20で閉じ所定の熱処理を行うものである。この
熱処理の一つとしてシリコン膜を酸化する酸化処理があ
り、処理ガスとしては水蒸気(H2 O)と例えば塩化水
素ガスとの混合ガスが用いられる。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An exhaust system according to the present invention will be described below with reference to an embodiment applied to a vertical heat treatment apparatus. As shown in FIG.
In a reaction vessel surrounded by 1, for example, a reaction tube 22 made of quartz,
A large number of wafers W are held in a wafer boat 23 in a shelf shape and are carried in, for example, from below, and the lower end opening of the reaction tube 22 is closed with a cap 20 to perform a predetermined heat treatment. One of the heat treatments is an oxidation treatment for oxidizing a silicon film, and a mixed gas of water vapor (H 2 O) and, for example, hydrogen chloride gas is used as a processing gas.
【0012】本発明の実施の形態に係る排気装置は、図
1を参照しながらその概略を述べると、前記反応管22
の排気口24に接続された排気路部材をなす排気管3
と、この排気管3から分岐された第1の排水路部材をな
すドレイン管4と、このドレイン管4の下方に設けられ
たトラップをなす筒状の密閉容器41と、排気管3にお
けるドレイン管4の分岐点よりも下流側に設けられた結
露手段をなす冷却器5と、排気管3における冷却器5の
下流側に設けられた圧力調製部をなすバタフライバルブ
6とを備えている。An exhaust system according to an embodiment of the present invention will be described with reference to FIG.
Exhaust pipe 3 forming an exhaust path member connected to the exhaust port 24
A drain pipe 4 serving as a first drainage channel member branched from the exhaust pipe 3; a cylindrical closed vessel 41 serving as a trap provided below the drain pipe 4; and a drain pipe in the exhaust pipe 3. 4 is provided with a cooler 5 serving as dew condensation means provided downstream of the branch point, and a butterfly valve 6 serving as a pressure adjusting unit provided downstream of the cooler 5 in the exhaust pipe 3.
【0013】図2はこの排気装置100が縦型熱処理装
置の背面に取り付けられている状態を模式的に示す図で
ある。図2中25は外装体をなすほぼ直方体形状の筐体
であり、この筐体25の前面からウエハカセットが取り
込まれ、背面側に設けられた炉体20(断熱体、ヒータ
21及び反応管22からなる)内にウエハが搬入されて
熱処理される。この例では排気装置100は上下の長さ
がおよそ3m程度のユニットとして構成されており、排
気管3の上端部3aは図示しない配管を介して、工場内
の排気ダクトに接続される。FIG. 2 is a diagram schematically showing a state in which the exhaust device 100 is attached to the back of the vertical heat treatment device. In FIG. 2, reference numeral 25 denotes a substantially rectangular parallelepiped casing serving as an exterior body. A wafer cassette is taken in from a front face of the casing 25, and a furnace body 20 (a heat insulator, a heater 21, a reaction tube 22) ) Is carried in and heat-treated. In this example, the exhaust device 100 is configured as a unit having a vertical length of about 3 m, and the upper end 3a of the exhaust pipe 3 is connected to an exhaust duct in a factory via a pipe (not shown).
【0014】以下にこの排気装置について詳述すると、
排気管3は図1〜図3に示すように排気口24から例え
ば水平に伸びた後、下方側に屈曲してほぼ真下に向かい
更に上方側に向けてほぼ鉛直に伸びている。排気管3の
下端部はほぼU字状に屈曲しており、その屈曲部31に
てドレイン管4が分岐している。前記屈曲部31は内部
に通気路32が形成された通気路ユニット33により構
成されており、この通気路32は排気管3の一部及びド
レイン管4の分岐点をなしている。また排気口24と屈
曲部31との間において排気管3内の圧力を検出して反
応管22内の圧力を監視する圧力監視部34(図1参
照)とバルブ35とが設けられている。The exhaust system will be described below in detail.
As shown in FIGS. 1 to 3, the exhaust pipe 3 extends from the exhaust port 24 horizontally, for example, and then bends downward, almost right below, and further extends almost vertically upward. The lower end of the exhaust pipe 3 is bent substantially in a U shape, and the drain pipe 4 branches at the bent portion 31. The bent portion 31 is constituted by a ventilation path unit 33 in which a ventilation path 32 is formed. The ventilation path 32 forms a part of the exhaust pipe 3 and a branch point of the drain pipe 4. Further, a pressure monitoring unit 34 (see FIG. 1) for detecting the pressure in the exhaust pipe 3 and monitoring the pressure in the reaction pipe 22 and a valve 35 are provided between the exhaust port 24 and the bent portion 31.
【0015】前記冷却器5は、図4に示すように排気ガ
スが通る筒状体51と、この筒状体51の外側に上下に
形成された冷却水通路52と、筒状体51内に所定の間
隔をおいて長さ方向に設けられ交互に左と右とに配置さ
れた、筒状体51内の断面形状に対応する半円形の邪魔
板53とを備えている。排気ガス中に残っている水分は
冷却器5内を通ったときに邪魔板53による衝突と冷却
水による冷却とによって、結露し、結露した水が排気管
3及びドレイン管4を伝わって密閉容器41内に落ちて
いく。また排気ガスはこの冷却器5によって冷却され
る。As shown in FIG. 4, the cooler 5 has a tubular body 51 through which exhaust gas passes, a cooling water passage 52 formed vertically above and outside the tubular body 51, and a cooling water passage 52 inside the tubular body 51. A semicircular baffle plate 53 corresponding to the cross-sectional shape in the tubular body 51 is provided at predetermined intervals in the length direction and alternately arranged on the left and right sides. The moisture remaining in the exhaust gas is condensed by the collision with the baffle plate 53 and the cooling by the cooling water when passing through the cooler 5, and the condensed water is transmitted through the exhaust pipe 3 and the drain pipe 4 to form a sealed container. It falls into 41. The exhaust gas is cooled by the cooler 5.
【0016】前記密閉容器41内にはドレイン管4の下
端の開口部が密閉容器41の底部付近に位置するように
ドレイン管4が上部から突入されていると共に、第2の
排水路部材である排水管42が下方側から突入されてい
る。排水管42の一端(上端)の開口部はドレイン管4
の下端開口部よりも例えば6〜8cm程度上方に位置し
ており、排水管42の他端は例えば外部の排水路側に接
続され、結露水を排水している。43はバルブである。The drain pipe 4 is inserted into the hermetic container 41 from above so that the opening at the lower end of the drain pipe 4 is located near the bottom of the hermetic container 41, and serves as a second drain passage member. A drain pipe 42 protrudes from below. The opening at one end (upper end) of the drain pipe 42 is the drain pipe 4
The lower end of the drain pipe 42 is located, for example, about 6 to 8 cm above, and the other end of the drain pipe 42 is connected to, for example, an external drain path side to drain dew water. 43 is a valve.
【0017】密閉容器41内に溜められた水は排水管4
2により排出され、ウエハの酸化処理中は水蒸気が排気
管3内及び冷却器5内にて結露して水が流れ落ちるため
密閉容器41内の水位は排水管42の一端開口部の高さ
に維持される。この結果ドレイン管4及び排水管42の
各開口部の間に液相が介在し、互いの連通が阻止される
ので、排水管42側の圧力つまりドレイン管4の背圧が
反応管22内に及ぼす影響はない。排水管42は密閉容
器41の下方側から突入される代りに側面から水平に突
入され、一端開口部が横を向いていてもよい。The water stored in the sealed container 41 is drained
During the oxidation process of the wafer, water vapor is condensed in the exhaust pipe 3 and the cooler 5 and water flows down, so that the water level in the sealed container 41 is maintained at the height of one end opening of the drain pipe 42. Is done. As a result, a liquid phase is interposed between the openings of the drain pipe 4 and the drain pipe 42, and communication between them is prevented, so that the pressure on the drain pipe 42 side, that is, the back pressure of the drain pipe 4 is generated in the reaction pipe 22. No effect. The drain pipe 42 may protrude horizontally from the side instead of protruding from the lower side of the sealed container 41, and may have one end opening sideways.
【0018】図5は上述のトラップに対する比較例であ
り、この比較例のようにドレイン管4の下端開口部より
も排水管42の一端(上端)開口部を下方に位置した場
合にはドレイン管4及び排水管42が互いに連通し、ド
レイン管4の背圧の変動による反応管22内の圧力変動
が大きい。FIG. 5 is a comparative example of the above-described trap. When the one end (upper end) opening of the drain pipe 42 is located lower than the lower end opening of the drain pipe 4 as in this comparative example, the drain pipe is drained. 4 and the drain pipe 42 communicate with each other, and the fluctuation in the pressure inside the reaction tube 22 due to the fluctuation in the back pressure of the drain pipe 4 is large.
【0019】またこの例では、図1に示すように反応管
22の下端開口部をキャップ20でシールしたときに反
応管22の下端のフランジ部とキャップ20との間をシ
ール用排気管26により吸引しており、その排気ガス中
の水分は、シール用排気管26から分岐したドレイン管
27を通じて密閉容器41内に流れ落ちるようになって
いる。In this example, as shown in FIG. 1, when the lower end opening of the reaction tube 22 is sealed with the cap 20, the space between the flange at the lower end of the reaction tube 22 and the cap 20 is formed by the sealing exhaust pipe 26. The water in the exhaust gas is sucked and flows down into the closed container 41 through the drain pipe 27 branched from the sealing exhaust pipe 26.
【0020】ここで水蒸気を用いずに例えば酸素ガスや
オゾンガスを用いてドライ酸化を行う場合には、このま
までは密閉容器41内の水が蒸発して排気管3内を介し
て排気されるので減少し、ドレイン管4及び排水管42
が連通してしまう。またドライ酸化から水蒸気を用いた
ウェット酸化に切り替えたときにも、初期のうちは密閉
容器41内の水が不足して同様のことが起こる。このた
め本実施の形態では図1及び図3に示すように前記通気
路ユニット33の通気路32の途中に、液体例えば水を
供給するための給水管71を接続し、給水源72からの
水を流量調整部73で僅かな流量(例えば一筋の細い流
れが形成される程度の流量)に調整して、ドレイン管4
を通じて密閉容器41内に常時水を溜めておくようにし
ている。In the case where dry oxidation is performed using, for example, oxygen gas or ozone gas without using water vapor, the water in the sealed container 41 evaporates and is exhausted through the exhaust pipe 3 as it is. Drain pipe 4 and drain pipe 42
Will communicate. Also, when the dry oxidation is switched to the wet oxidation using steam, the same occurs due to a shortage of water in the sealed container 41 at the initial stage. Therefore, in the present embodiment, a water supply pipe 71 for supplying a liquid, for example, water is connected in the middle of the ventilation path 32 of the ventilation path unit 33 as shown in FIGS. Is adjusted to a small flow rate (for example, a flow rate at which a thin stream is formed) by the flow rate adjusting unit 73, and the drain pipe 4 is adjusted.
, Water is always stored in the closed container 41.
【0021】前記反応管3における冷却器5の下流側に
は、図1に示すように夫々分岐路を介して圧力検出部で
ある圧力センサ54及び圧力監視部55が設けられてい
る。圧力センサ54はその検出値により前記バタフライ
バルブ6の開度を制御して反応管22内の圧力を調整す
るためのものであり、圧力監視部55は冷却器5の下流
側の排気管3内の圧力を監視するためのものである。こ
れら圧力センサ54及び圧力監視部55は、冷却器5に
より水分が除去された後の排気ガスの圧力を測定するも
のであるから、計器内に水分が侵入することが防止され
る。At the downstream side of the cooler 5 in the reaction tube 3, a pressure sensor 54 and a pressure monitoring unit 55, which are pressure detecting units, are provided via branch paths as shown in FIG. The pressure sensor 54 controls the opening of the butterfly valve 6 based on the detected value to adjust the pressure in the reaction tube 22, and the pressure monitoring unit 55 controls the pressure in the exhaust pipe 3 downstream of the cooler 5. For monitoring the pressure of the air. Since the pressure sensor 54 and the pressure monitoring unit 55 measure the pressure of the exhaust gas after the water has been removed by the cooler 5, it is possible to prevent the water from entering the instrument.
【0022】更に排気管3における圧力監視部55の下
流側には、図1及び図6に示すように分岐路81を介し
て圧力変動吸収部8が設けられている。この圧力変動吸
収部8は、外部(大気圧)に連通するように分岐路81
に形成された開口部82と、この開口部82の内側周縁
部に形成された水平な保持面83の上に当該開口部82
を塞ぐように載置された蓋体84とからなる。圧力変動
吸収部8の役割りについて述べると、排ガス中の水蒸気
が冷却器5で結露するため、その下流側の圧力が図7の
実線(1)で示すように細かく頻繁に変動する。このた
め圧力センサ54の検出値が変動するのでバタフライバ
ルブ6が微動し、反応管22内の圧力が不安定になる。
そこで圧力変動吸収部8を設ければ、図8(a)に示す
ようにある圧力値までは蓋体84が開口部82を塞いで
いるが、圧力が低くなり過ぎると蓋体84が自重に抗し
て内部に引き寄せられ、つまり上に持ち上がって開口部
82が開き、圧力が上昇する。この結果冷却器5の下流
側の圧力は図7の点線(2)で示すようにその変動が滑
らかになり、バタフライバルブ6の開閉動作が安定し、
従って反応管22内の圧力が安定する。Further, on the downstream side of the pressure monitoring unit 55 in the exhaust pipe 3, a pressure fluctuation absorbing unit 8 is provided via a branch passage 81 as shown in FIGS. The pressure fluctuation absorbing section 8 is connected to a branch 81 so as to communicate with the outside (atmospheric pressure).
The opening 82 is formed on a horizontal holding surface 83 formed on an inner peripheral portion of the opening 82.
And a lid 84 placed so as to close the cover. Describing the role of the pressure fluctuation absorbing section 8, since the water vapor in the exhaust gas is condensed in the cooler 5, the downstream pressure fluctuates finely and frequently as shown by the solid line (1) in FIG. For this reason, the detection value of the pressure sensor 54 fluctuates, so that the butterfly valve 6 slightly moves, and the pressure in the reaction tube 22 becomes unstable.
Therefore, if the pressure fluctuation absorbing portion 8 is provided, the lid 84 closes the opening 82 up to a certain pressure value as shown in FIG. 8A, but if the pressure becomes too low, the lid 84 becomes under its own weight. It is drawn inward against the inside, that is, it is lifted up to open the opening 82 and the pressure increases. As a result, the pressure on the downstream side of the cooler 5 fluctuates smoothly as shown by a dotted line (2) in FIG. 7, and the opening / closing operation of the butterfly valve 6 becomes stable.
Therefore, the pressure in the reaction tube 22 is stabilized.
【0023】この例は蓋体84が開口部82を塞ぐ抑制
力として蓋体84の自重を用いているが、例えばバネを
組み合わせて蓋体84が常時開口部82を塞ぐように抑
制されているものであってもよいし、あるいはまた図9
に示すように弾性膜例えばゴム膜よりなる蓋体85で開
口部82を塞ぎ、排気管3内の圧力が低いときには蓋体
85が開口部82を閉じたまま内部に引き寄せられるよ
うな構成としてもよい。In this example, the lid 84 uses its own weight as a suppressing force for closing the opening 82. For example, a combination of a spring and the lid 84 is suppressed so that the opening 84 always closes the opening 82. 9 or as shown in FIG.
As shown in FIG. 7, the opening 82 is closed by a lid 85 made of an elastic film, for example, a rubber film, and when the pressure in the exhaust pipe 3 is low, the lid 85 can be drawn inside with the opening 82 closed. Good.
【0024】そして例えば停電により工場内の排気ダク
トの排気が停止したときには、蓋体84と分岐路81の
内面との隙間から排気ガスが漏洩するおそれがあるの
で、分岐路81の途中にバルブ86を設け、停電などが
起こったときにはバルブ86を閉じるようにしている。When the exhaust of the exhaust duct in the factory is stopped due to, for example, a power failure, the exhaust gas may leak from the gap between the lid 84 and the inner surface of the branch passage 81. The valve 86 is closed when a power failure or the like occurs.
【0025】更に図1および図3に示すように排気管3
におけるバタフライバルブ6の下流側にはバルブ91を
介して通気路ユニット92が設けられており、排気管3
はこの通気路ユニット92内の水平な通気路93を介し
て上方に伸びており、その先端は図示しない工場内の排
気ダクトに接続されている。また水平な通気路93から
主分岐管61が分岐している。この主分岐管61は通気
路93から一旦上方に向かった後、U字状に屈曲して下
方側に伸び、前記密閉容器41内におけるドレイン管4
の下端よりも下方位置にて開口している。この主分岐管
61の途中からは補助分岐管62が分岐し、その先端部
に圧力監視部63が設けられている。この圧力監視部6
3は、工場内の排気ダクト内の圧力を監視し、停電等に
よる排気が停止したときにバルブ86、91を遮断する
ためのものである。Further, as shown in FIG. 1 and FIG.
A ventilation path unit 92 is provided downstream of the butterfly valve 6 via a valve 91 in the exhaust pipe 3.
Extends upward through a horizontal air passage 93 in the air passage unit 92, and the end thereof is connected to an exhaust duct in a factory (not shown). The main branch pipe 61 branches from the horizontal ventilation path 93. The main branch pipe 61 once goes upward from the ventilation path 93, then bends in a U-shape and extends downward, so that the drain pipe 4 in the closed vessel 41 is formed.
It is open at a position lower than the lower end. An auxiliary branch pipe 62 branches from the middle of the main branch pipe 61, and a pressure monitoring unit 63 is provided at a distal end thereof. This pressure monitor 6
Reference numeral 3 is for monitoring the pressure in the exhaust duct in the factory and shutting off the valves 86 and 91 when the exhaust is stopped due to a power failure or the like.
【0026】主分岐管61は排気管3から分岐して、分
岐点よりも高い位置を経由して配管されているため、工
場内排気ダクト側から水が流れてきたとしても主分岐管
61内には侵入しにくく、更にこの主分岐管61から補
助分岐管62を介して圧力監視部63を設けているため
この圧力監視部63内に水が入るおそれはない。なお主
分岐管61内に水が入り込んだ場合には、流れ落ちて前
記密閉容器41内に溜められる。The main branch pipe 61 branches from the exhaust pipe 3 and is routed through a position higher than the branch point, so that even if water flows from the exhaust duct side in the factory, the main branch pipe 61 is left inside. And the pressure monitoring section 63 is provided from the main branch pipe 61 via the auxiliary branch pipe 62, so that there is no risk of water entering the pressure monitoring section 63. When water enters the main branch pipe 61, it flows down and is stored in the closed container 41.
【0027】このような排気装置の全体の動作について
述べると、反応管22内の水蒸気を含むガスは、工場内
の排気ダクトの吸引力によって排気管路31内に排気さ
れ、圧力センサ54の圧力検出値に基づいてバタフライ
バルブ6の開度が調整され、以って反応管22内の圧力
が調整される。そしてガス中の水分は排気管路31内を
通るときに一部が結露し、残存している水分も冷却器5
内にて結露し、その結露水は密閉容器41内に流れ落ち
て溜められる。The operation of such an exhaust system will be described. The gas containing water vapor in the reaction tube 22 is exhausted into the exhaust pipe 31 by the suction force of the exhaust duct in the factory, and the pressure of the pressure sensor 54 is reduced. The opening of the butterfly valve 6 is adjusted based on the detected value, so that the pressure in the reaction tube 22 is adjusted. Part of the moisture in the gas is condensed when passing through the exhaust pipe 31.
Dew forms inside the container, and the condensed water flows down and is stored in the closed container 41.
【0028】密閉容器41内の水は排水管42により排
出されるが、排水管42とドレイン管4とは水によって
互いの連通が阻止されているので、反応管22内の圧力
はドレイン管4の背圧の影響を受けない。また冷却器5
にて排ガス中の水分が結露するのでその下流側の圧力は
小刻みに変動しようとするが、圧力変動吸収部8にて圧
力変動を吸収して滑らかにしているためバタフライバル
ブの微動が抑えられる。従って反応管22内の圧力を高
い精度で制御することができる。The water in the closed vessel 41 is discharged by a drain pipe 42. Since the drain pipe 42 and the drain pipe 4 are prevented from communicating with each other by water, the pressure in the reaction pipe 22 is reduced by the drain pipe 4. Unaffected by back pressure. Cooler 5
However, the pressure in the downstream side tends to fluctuate little by little because moisture in the exhaust gas condenses, but the fluctuation of the butterfly valve is suppressed because the pressure fluctuation is absorbed and smoothed by the pressure fluctuation absorbing section 8. Therefore, the pressure in the reaction tube 22 can be controlled with high accuracy.
【0029】更に給水管71によって密閉容器41内に
は常時水が溜められているので、水蒸気を用いないドラ
イ酸化を行う場合にもドレイン管4と排水管42との連
通が阻止されているので安定した圧力制御を行うことが
できる。なお本発明ではドライ酸化を行うときにのみ給
水管から密閉容器41内へ給水するようにしてもよい
が、上述のように常時わずかながら給水していれば、オ
ペレータが、給水操作し忘れた場合のリスクを回避する
ことができる。Further, since water is always stored in the sealed container 41 by the water supply pipe 71, even when performing dry oxidation without using steam, communication between the drain pipe 4 and the drain pipe 42 is prevented. Stable pressure control can be performed. In the present invention, water may be supplied from the water supply pipe into the closed container 41 only when dry oxidation is performed. However, if water is supplied only slightly as described above, the operator may forget to perform the water supply operation. Risk can be avoided.
【0030】[0030]
【発明の効果】以上のように本発明によれば水蒸気を用
いて熱処理を行う場合に反応容器内の圧力を高い精度で
制御することができ、例えば良質な酸化膜を得ることが
できる。As described above, according to the present invention, when heat treatment is performed using steam, the pressure in the reaction vessel can be controlled with high precision, and for example, a high-quality oxide film can be obtained.
【図1】本発明の実施の形態の全体構成を示す構成図で
ある。FIG. 1 is a configuration diagram showing an overall configuration of an embodiment of the present invention.
【図2】本発明の実施の形態に係る排気装置が縦型熱処
理装置の背面に取り付けられている様子を示す斜視図で
ある。FIG. 2 is a perspective view showing a state in which the exhaust device according to the embodiment of the present invention is attached to the back surface of the vertical heat treatment device.
【図3】上記排気装置を示す側面図である。FIG. 3 is a side view showing the exhaust device.
【図4】冷却器の一例を示す一部切り欠き側面図であ
る。FIG. 4 is a partially cutaway side view showing an example of a cooler.
【図5】トラップをなす密閉容器内の構造の比較例を示
す断面図である。FIG. 5 is a cross-sectional view showing a comparative example of a structure inside a closed container forming a trap.
【図6】圧力変動吸収部を示す断面図である。FIG. 6 is a sectional view showing a pressure fluctuation absorbing section.
【図7】冷却器の下流側の圧力変動の様子を模式的に示
す特性図である。FIG. 7 is a characteristic diagram schematically showing a state of pressure fluctuation on the downstream side of the cooler.
【図8】圧力変動吸収部の動作を示す説明図である。FIG. 8 is an explanatory diagram illustrating an operation of a pressure fluctuation absorbing unit.
【図9】圧力変動吸収部の他の例を示す説明図である。FIG. 9 is an explanatory diagram showing another example of the pressure fluctuation absorbing unit.
【図10】従来の排気装置を示す構成図である。FIG. 10 is a configuration diagram showing a conventional exhaust device.
22 反応管 24 排気口 3 排気管 4 ドレイン管 41 密閉容器 42 排水管 5 冷却器 6 バタフライバルブ 61 主分岐管 62 補助分岐管 63 圧力センサ 71 給水管 8 圧力変動吸収部 81 分岐管 82 開口部 84 蓋体 Reference Signs List 22 Reaction pipe 24 Exhaust port 3 Exhaust pipe 4 Drain pipe 41 Closed vessel 42 Drain pipe 5 Cooler 6 Butterfly valve 61 Main branch pipe 62 Auxiliary branch pipe 63 Pressure sensor 71 Water supply pipe 8 Pressure fluctuation absorbing part 81 Branch pipe 82 Opening 84 Lid
Claims (6)
を行う反応容器に接続された排気装置において、 前記反応容器に接続された排気路部材と、 この排気路部材に設けられ、排気ガス中の水分を結露さ
せるための結露手段と、 前記排気路部材における結露手段よりも下流側に設けら
れた圧力調整部と、 前記反応容器の排気口と結露手段との間におけるこれら
よりも低い位置にて排気路部材から分岐された第1の排
水路部材と、 この第1の排水路部材を通って流れてきた水を溜めるよ
うにその中に第1の排水路部材の下端が開口する密閉容
器と、 この密閉容器内に一端が開口する第2の排水路部材と、
を備え、 前記第2の排水路部材の一端は、第1の排水路部材の下
端開口部よりも上方側の位置にて密閉容器内の水を吸い
込めるように開口し、前記第1の排水路部材の下端開口
部よりも上方側に水位が位置することによって、第1の
排水路部材及び第2の排水路部材の各開口部間に液相が
存在するように構成したことを特徴とする排気装置。An exhaust device connected to a reaction vessel that performs heat treatment on an object to be processed using steam, an exhaust path member connected to the reaction vessel, and an exhaust gas provided in the exhaust path member. Dew-condensing means for dew-condensing moisture therein; a pressure adjusting unit provided downstream of the dew-condensing means in the exhaust path member; and a lower position between the exhaust port of the reaction vessel and the dew-condensing means. A first drainage channel member branched from the exhaust channel member, and a seal in which a lower end of the first drainage channel member is opened so as to accumulate water flowing through the first drainage channel member. A container, a second drainage member having one end opened in the closed container,
And one end of the second drainage channel member is opened at a position above the lower end opening of the first drainage channel member so as to be able to suck water in a closed vessel, and the first drainage member is provided. The liquid level is located above the lower end opening of the channel member so that a liquid phase exists between the respective openings of the first drainage channel member and the second drainage channel member. Exhaust system.
開口部よりも上に位置するように密閉容器内に液体を供
給するための液体供給手段を設けたことを特徴とする請
求項1記載の排気装置。2. A liquid supply means for supplying a liquid into the closed container such that a water level in the closed container is located above an opening of the first drainage channel member. Item 7. The exhaust device according to Item 1.
た排気ダクトに接続され、 前記排気路部材における圧力調整部よりも下流側からは
主分岐路を、その分岐点よりも高いレベルを経由して密
閉容器に接続されるように分岐させると共に、この主分
岐路内の圧力を検出して排気ダクト内の圧力を監視する
圧力監視部を設けたことを特徴とする請求項1または2
記載の排気装置。3. A downstream side of the exhaust path member is connected to an exhaust duct provided in a factory, and a main branch path is provided at a level higher than a branch point of the exhaust path member from a downstream side of the pressure adjusting section. And a pressure monitoring unit for detecting a pressure in the main branch path and monitoring a pressure in the exhaust duct by branching so as to be connected to the closed vessel via the airtight container. 2
The described exhaust device.
この補助分岐路に圧力監視部を設けたことを特徴とする
請求項3記載の排気装置。4. An auxiliary branch is further branched from the main branch.
The exhaust device according to claim 3, wherein a pressure monitoring unit is provided in the auxiliary branch passage.
を行う反応容器に接続された排気装置において、 前記反応容器に接続された排気路部材と、 この排気路部材に設けられ、排気ガス中の水分を結露さ
せるための結露手段と、 前記排気路部材における結露手段よりも下流側に設けら
れた圧力調整部と、 前記反応容器の排気口と結露手段との間におけるこれら
よりも低い位置にて排気路部材から分岐された第1の排
水路部材と、 前記排気路部材における結露手段の下流側から分岐して
設けられた分岐路と、 この分岐路に設けられ、前記結露手段における水分の結
露による排気路部材内の圧力変動を吸収するための圧力
変動吸収部と、を備え、 前記圧力変動吸収部は、外部に連通するように前記分岐
路に形成された開口部と、この開口部を内側から塞ぐよ
うに抑制され、前記排気路部材内の圧力が低くなったと
きに、抑制力に抗して内部に引き寄せられて開口部を開
く蓋体と、を備えたことを特徴とする排気装置。5. An exhaust device connected to a reaction vessel for performing heat treatment on an object to be processed using steam, comprising: an exhaust path member connected to the reaction vessel; and an exhaust gas provided in the exhaust path member. Dew-condensing means for dew-condensing moisture therein; a pressure adjusting unit provided downstream of the dew-condensing means in the exhaust path member; and a lower position between the exhaust port of the reaction vessel and the dew-condensing means. A first drainage path member branched from the exhaust path member, and a branch path branching from the downstream side of the dew condensation means in the exhaust path member; A pressure fluctuation absorbing portion for absorbing pressure fluctuation in the exhaust path member due to condensation of the pressure fluctuation absorbing portion, wherein the pressure fluctuation absorbing portion has an opening formed in the branch passage so as to communicate with the outside, and the opening Department And a lid that opens toward the inside against the restraining force and opens the opening when the pressure in the exhaust path member is reduced. apparatus.
材内の圧力が低くなったときに、抑制力に抗して内部に
引き寄せられて開口部を開く代わりに、開口部を閉じた
まま内部に引き寄せられように弾性膜により形成された
ものであることを特徴とする請求項5記載の排気装置。6. The lid of the pressure fluctuation absorbing section closes the opening when the pressure in the exhaust passage member decreases, instead of being drawn inward against the suppressing force and opening the opening. 6. The exhaust device according to claim 5, wherein the exhaust device is formed of an elastic film so as to be drawn inside while being held.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP04888198A JP3592923B2 (en) | 1998-02-13 | 1998-02-13 | Exhaust device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP04888198A JP3592923B2 (en) | 1998-02-13 | 1998-02-13 | Exhaust device |
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JPH11233505A true JPH11233505A (en) | 1999-08-27 |
JP3592923B2 JP3592923B2 (en) | 2004-11-24 |
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JP04888198A Expired - Fee Related JP3592923B2 (en) | 1998-02-13 | 1998-02-13 | Exhaust device |
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001035453A1 (en) * | 1999-11-09 | 2001-05-17 | Tokyo Electron Limited | Heat treatment device |
EP1357582A1 (en) * | 2000-10-27 | 2003-10-29 | Tokyo Electron Limited | Heat-treating device |
JP2007073880A (en) * | 2005-09-09 | 2007-03-22 | Hitachi Kokusai Electric Inc | Substrate processing apparatus |
EP3686322A1 (en) * | 2019-01-25 | 2020-07-29 | Kabushiki Kaisha Toshiba | Silicon-containing product forming apparatus |
CN112864054A (en) * | 2021-01-26 | 2021-05-28 | 北京北方华创微电子装备有限公司 | Semiconductor processing equipment |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63195722U (en) * | 1987-06-05 | 1988-12-16 | ||
JPH0247266A (en) * | 1988-08-04 | 1990-02-16 | Tel Sagami Ltd | Treating device |
JPH0261068A (en) * | 1988-08-26 | 1990-03-01 | Tel Sagami Ltd | Heat treating device |
JPH03229414A (en) * | 1990-02-05 | 1991-10-11 | Tokyo Electron Sagami Ltd | Thermal treatment apparatus |
JPH07106318A (en) * | 1993-09-30 | 1995-04-21 | Tokyo Electron Ltd | Heat treatment equipment |
JPH0897196A (en) * | 1994-09-26 | 1996-04-12 | Sony Corp | Heat treating furnace |
-
1998
- 1998-02-13 JP JP04888198A patent/JP3592923B2/en not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63195722U (en) * | 1987-06-05 | 1988-12-16 | ||
JPH0247266A (en) * | 1988-08-04 | 1990-02-16 | Tel Sagami Ltd | Treating device |
JPH0261068A (en) * | 1988-08-26 | 1990-03-01 | Tel Sagami Ltd | Heat treating device |
JPH03229414A (en) * | 1990-02-05 | 1991-10-11 | Tokyo Electron Sagami Ltd | Thermal treatment apparatus |
JPH07106318A (en) * | 1993-09-30 | 1995-04-21 | Tokyo Electron Ltd | Heat treatment equipment |
JPH0897196A (en) * | 1994-09-26 | 1996-04-12 | Sony Corp | Heat treating furnace |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001035453A1 (en) * | 1999-11-09 | 2001-05-17 | Tokyo Electron Limited | Heat treatment device |
US6936108B1 (en) | 1999-11-09 | 2005-08-30 | Tokyo Electron Limited | Heat treatment device |
EP1357582A1 (en) * | 2000-10-27 | 2003-10-29 | Tokyo Electron Limited | Heat-treating device |
EP1357582A4 (en) * | 2000-10-27 | 2005-02-02 | Tokyo Electron Ltd | Heat-treating device |
JP2007073880A (en) * | 2005-09-09 | 2007-03-22 | Hitachi Kokusai Electric Inc | Substrate processing apparatus |
EP3686322A1 (en) * | 2019-01-25 | 2020-07-29 | Kabushiki Kaisha Toshiba | Silicon-containing product forming apparatus |
KR20200092883A (en) * | 2019-01-25 | 2020-08-04 | 가부시끼가이샤 도시바 | Apparatus for forming silicon-containing materials |
CN111485286A (en) * | 2019-01-25 | 2020-08-04 | 株式会社东芝 | Apparatus for forming silicon-containing substance |
US11795543B2 (en) | 2019-01-25 | 2023-10-24 | Kabushiki Kaisha Toshiba | Silicon-containing product forming apparatus |
CN112864054A (en) * | 2021-01-26 | 2021-05-28 | 北京北方华创微电子装备有限公司 | Semiconductor processing equipment |
CN112864054B (en) * | 2021-01-26 | 2024-06-21 | 北京北方华创微电子装备有限公司 | Semiconductor processing equipment |
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