JPH11218373A - Ice maker - Google Patents
Ice makerInfo
- Publication number
- JPH11218373A JPH11218373A JP2123498A JP2123498A JPH11218373A JP H11218373 A JPH11218373 A JP H11218373A JP 2123498 A JP2123498 A JP 2123498A JP 2123498 A JP2123498 A JP 2123498A JP H11218373 A JPH11218373 A JP H11218373A
- Authority
- JP
- Japan
- Prior art keywords
- ice
- ice making
- water
- face
- semiconductor layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、流下式の製氷機に
関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a falling ice maker.
【0002】[0002]
【従来の技術】流下式の製氷機の一般的な構造は、ステ
ンレス鋼板等からなる製氷板を略垂直姿勢で配設する一
方、この製氷板の裏面側に冷凍サイクルの冷却管を配管
し、冷却管に冷媒を流通させて製氷板を冷却しつつ、製
氷板の表面に製氷用水を流下させることで、表面に氷結
層を成長させる構造となっている。2. Description of the Related Art A general structure of a flow-down type ice maker is that an ice maker made of a stainless steel plate or the like is arranged in a substantially vertical posture, and a cooling pipe of a refrigeration cycle is piped on the back side of the ice maker. While cooling the ice making plate by circulating a cooling medium through the cooling pipe, the ice making water is caused to flow down on the surface of the ice making plate, so that a frozen layer is grown on the surface.
【0003】[0003]
【発明が解決しようとする課題】この場合、良質の氷を
効率良く製造するためには、製氷用水が製氷板の表面に
一様に広がって濡らしつつ流下することが望まれるが、
従来の製氷板では水が表面で弾かれて筋のようになって
流れる傾向にあった。もっとも流水量を増せば表面の全
面に広がらせることも可能であるが、流水量が増すと却
って着氷がし辛くなって、製氷時間が長くなってしま
う。また、一様な濡れ性を図るために、製氷板の表面に
有機系の親水性材料を塗布したり、サンドペーパー等で
表面を粗くすることも試みられたが、前者のものでは耐
用年数に問題があり、後者のものでは思った程実効がな
くて、いずれも実用化には至っていない。In this case, in order to efficiently produce high-quality ice, it is desired that the ice-making water spread uniformly on the surface of the ice-making plate and flow down.
In the conventional ice making plate, the water tends to be repelled on the surface and flow like streaks. However, it is possible to spread the water over the entire surface if the amount of flowing water is increased. However, if the amount of flowing water is increased, icing becomes harder and the ice making time becomes longer. In addition, in order to achieve uniform wettability, an attempt was made to apply an organic hydrophilic material to the surface of the ice making plate, or to roughen the surface with sandpaper or the like. There is a problem, and the latter is not as effective as expected, and none of them has been put to practical use.
【0004】一方、製氷が完了したら、製氷板の裏面に
除氷用水を流下させ、必要に応じて冷却管にホットガス
を流して製氷板を加熱することで、生成された氷を取り
出すようになっている。詳細には、生成された氷におけ
る製氷板側の面を溶かして水膜を生じさせることで、製
氷板の表面から剥離するのであるが、水膜と製氷板との
間には表面張力が作用するので、その分剥がれ難くて時
間が掛かり、すなわち従来のものでは除氷作業にも問題
があった。本発明は上記のような事情に基づいて完成さ
れたものであって、その目的は、良質の氷を効率良く生
成でき、また生成された氷の剥離作業もスムーズに行え
るようにした製氷機を提供するところにある。[0004] On the other hand, when the ice making is completed, deicing water is allowed to flow down the back surface of the ice making plate, and if necessary, hot gas is supplied to the cooling pipe to heat the ice making plate so that the generated ice is taken out. Has become. Specifically, the surface of the generated ice is melted on the ice making plate side to form a water film, which separates from the surface of the ice making plate, but surface tension acts between the water film and the ice making plate. Therefore, it is difficult to peel off, and it takes time. In other words, the conventional one has a problem in the deicing work. The present invention has been completed based on the above circumstances, and an object of the present invention is to provide an ice making machine that can efficiently produce high-quality ice and that can smoothly perform the work of separating the produced ice. To provide.
【0005】[0005]
【課題を解決するための手段】上記の目的を達成するた
めの手段として、請求項1の発明は、冷却される製氷板
の表面に水を流下させることで氷を生成した後に生成し
た氷を製氷板から剥離するようにした製氷機において、
前記製氷板の表面に、光励起に対応して表面が親水性を
示す光半導体層が形成されている構成としたところに特
徴を有する。Means for Solving the Problems As means for achieving the above object, the invention of claim 1 is directed to a method of producing ice by causing water to flow down on the surface of an ice making plate to be cooled. In an ice machine that is designed to peel off from the ice making plate,
The present invention is characterized in that an optical semiconductor layer whose surface has hydrophilicity in response to light excitation is formed on the surface of the ice making plate.
【0006】請求項2の発明は、冷却される製氷板の表
面に水を流下させることで氷を生成した後に、製氷板の
裏面に除氷用水を流下させることで生成した氷を製氷板
から剥離するようにした製氷機において、前記製氷板の
裏面に、光励起に対応して表面が親水性を示す光半導体
層が形成されているところに特徴を有する。請求項3の
発明は、請求項1または請求項2の発明において、前記
光半導体層が酸化チタンを主成分として構成されている
ところに特徴を有する。According to a second aspect of the present invention, ice is generated by flowing water on the surface of the ice making plate to be cooled, and then the ice generated by flowing deicing water on the back surface of the ice making plate is converted from the ice making plate. In an ice making machine that is peeled, a feature is that an optical semiconductor layer having a hydrophilic surface is formed on the back surface of the ice making plate in response to light excitation. The invention of claim 3 is characterized in that, in the invention of claim 1 or claim 2, the optical semiconductor layer is composed mainly of titanium oxide.
【0007】[0007]
【発明の作用及び効果】<請求項1の発明>光半導体層
の持つ親水性機能により、製氷用水は製氷板の表面の全
面に一様に広がりつつ流下する。これにより、全面にわ
たって均一な品質の氷が効率良く生成される。また、製
氷板を加熱して生成された氷を剥がす場合、光半導体層
の表面には薄い水膜ができていて、この水膜から氷が溶
けて生成された水膜が剥がされるといった現象を呈す
る。両水膜の間の表面張力はごく小さなものに抑えられ
るから、氷の剥離作業もスムーズに行われる。<Operation and effect of the invention><Invention of claim 1> Due to the hydrophilic function of the optical semiconductor layer, the ice making water flows down while spreading uniformly over the entire surface of the ice making plate. Thereby, ice of uniform quality over the entire surface is efficiently generated. Also, when the ice produced by heating the ice making plate is peeled off, there is a phenomenon that a thin water film is formed on the surface of the optical semiconductor layer, and the water film generated by melting of the ice is peeled from the water film. Present. Since the surface tension between the two water films is suppressed to a very small value, the operation of removing the ice is also smoothly performed.
【0008】<請求項2の発明>光半導体層の持つ親水
性機能により、除氷用水が製氷板の裏面の全面に一様に
広がりつつ流下するので、表面側に生成された氷が剥離
しやすくなる。すなわち、除氷能力を高めることができ
る。 <請求項3の発明>光半導体層として形成された酸化チ
タンは酸化機能を発揮するので、有機物を分解して抗
菌、脱臭等に有効であり、よって製氷板の表面または裏
面を清浄に保つことができる。また、酸化チタンを主成
分とした光半導体層は、塗料等と比較すると、薄膜とし
て強固に密着した状態で形成されるから、剥がれ難く、
すなわち耐久性に優れている。<Invention of claim 2> Due to the hydrophilic function of the optical semiconductor layer, deicing water flows down while spreading uniformly over the entire back surface of the ice making plate, so that the ice generated on the front surface side is peeled off. It will be easier. That is, the deicing ability can be increased. <Invention of claim 3> Since the titanium oxide formed as the optical semiconductor layer exhibits an oxidizing function, it is effective for decomposing organic substances, and is effective for antibacterial, deodorizing, and the like. Can be. In addition, the optical semiconductor layer containing titanium oxide as a main component is hardly peeled off because it is formed in a tightly adhered state as a thin film as compared with a paint or the like.
That is, it has excellent durability.
【0009】[0009]
【発明の実施の形態】以下、本発明の一実施形態を図1
ないし図3に基づいて説明する。本実施形態に係る製氷
機の概略構造を図1及び図2によって説明する。符号1
はステンレス鋼板等からなる製氷板であって、一対が所
定間隔を開けて垂直姿勢で配設されており、それぞれの
上端部が互いに接近する方向に折曲されて山形に接合さ
れ、各製氷板1の表面(以下製氷面2という)へ製氷用
水を案内する案内部5が形成されている。各製氷板1の
裏面(以下除氷面3という)には、冷凍サイクルの一部
を構成する冷却管6(蒸発器)が、それぞれ上下方向に
所定間隔を開けて蛇行状に接合配設されている。DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to FIG.
A description will be given based on FIG. A schematic structure of the ice making machine according to the present embodiment will be described with reference to FIGS. Sign 1
Is an ice making plate made of a stainless steel plate or the like, a pair of which are arranged in a vertical position at a predetermined interval, each upper end is bent in a direction approaching each other and joined in a mountain shape, and each ice making plate is A guide portion 5 for guiding the ice making water to the surface of the first surface (hereinafter, referred to as an ice making surface 2) is formed. Cooling pipes 6 (evaporators) constituting a part of the refrigeration cycle are respectively provided on the back surface of each ice making plate 1 (hereinafter referred to as the deicing surface 3) in a meandering manner at predetermined intervals in the vertical direction. ing.
【0010】上記した案内部5の頂上の上方には、製氷
用水の給水管7が水平姿勢で配設され、その給水管7に
開口された給水口8から、図2の矢線に示すように案内
部5に向けて製氷用水が供給されるようになっている。
また、両製氷板1の下方位置には、製氷板1の製氷面2
において凍結に至らなかった余剰水を受けるタンク10
が装備されている。このタンク10は、ポンプ11を介
して上記の給水管7と接続され、タンク10内の水がポ
ンプ11により汲み上げられて上記のように給水管7か
ら製氷用水として循環供給されるようになっている。ま
た、案内部5の内側には、除氷用の散水管13が装備さ
れて別系統の給水路14と接続されており、そこに介設
された開閉弁15を開放することにより、散水管13に
開口された散水口から、両製氷板1の除氷面3の上部に
向けて除氷用水が散水されるようになっている。A water supply pipe 7 for water for making ice is disposed above the top of the guide section 5 in a horizontal posture, and is supplied from a water supply port 8 opened in the water supply pipe 7 as shown by an arrow in FIG. The water for ice making is supplied to the guide portion 5.
The ice making surface 2 of the ice making plate 1 is located below the two ice making plates 1.
Tank 10 that receives excess water that did not freeze in
Is equipped. The tank 10 is connected to the water supply pipe 7 via a pump 11, and the water in the tank 10 is pumped up by the pump 11 and circulated and supplied as ice making water from the water supply pipe 7 as described above. I have. A sprinkling pipe 13 for deicing is provided inside the guide section 5 and is connected to a water supply path 14 of another system, and by opening an on-off valve 15 interposed there, the sprinkling pipe 13 is opened. The deicing water is sprinkled from the sprinkling port opened to the upper part of the deicing surfaces 3 of both ice making plates 1.
【0011】さて、上記した両製氷板1の製氷面2と除
氷面3とには、それぞれ図3に詳細に示すように、酸化
チタンを主成分とした光半導体層21が形成されてい
る。なお、この光半導体層21の膜厚は強調するために
実際よりも厚く図示されている。上記した光半導体層2
1の形成方法としては、以下に挙げるものがある。 第1例:塗膜形成要素としてシリコーンにアナターゼ型
チタニアルゾルを添加して、チタニア含有塗料用組成物
を調整し、これを製氷板1の製氷面2と除氷面3とに塗
布し、所定の温度で硬化させてアナターゼ型チタニア粒
子がシリコーン塗膜中に分散された光半導体層21を形
成する。As shown in detail in FIG. 3, an optical semiconductor layer 21 mainly composed of titanium oxide is formed on the ice making surface 2 and the deicing surface 3 of both the ice making plates 1 described above. . It should be noted that the thickness of the optical semiconductor layer 21 is shown to be larger than the actual thickness for emphasis. Optical semiconductor layer 2 described above
The method for forming 1 is as follows. First Example: A titania-containing coating composition was prepared by adding anatase-type titanal sol to silicone as a coating film forming element, and the composition was applied to the ice making surface 2 and the deicing surface 3 of an ice making plate 1, By curing at a temperature, an optical semiconductor layer 21 in which anatase type titania particles are dispersed in a silicone coating film is formed.
【0012】第2例:まず製氷板1の製氷面2と除氷面
3とに無定形シリカの薄膜を形成し、次にテトラエトキ
シチタンTi(OC2H5)4とエタノールとの混合物か
らなるチタニアコーティング溶液を調整し、この溶液を
製氷面2と除氷面3に塗布して乾燥させる。テトラエト
キシチタンの加水分解によって、水酸化チタンが生成
し、さらに脱水縮重合によって無定形チタニアが生成す
る。 第3例:上記の第2例と同様に、製氷板1の製氷面2と
除氷面3上に無定形シリカの薄膜を形成し、スパッタリ
ング法により無定形TiO2からなる薄膜を形成しても
よい。 上記の各例のように形成された酸化チタンを主成分とし
た光半導体層21は、透明で、光励起に対応して表面が
親水性を示すものである。併せて、光励起による酸化機
能を有し、有機物を分解して抗菌、脱臭等に有効とな
る。Second Example: First, an amorphous silica thin film is formed on the ice making surface 2 and the deicing surface 3 of the ice making plate 1 and then a mixture of tetraethoxytitanium Ti (OC 2 H 5 ) 4 and ethanol is formed. A titania coating solution is prepared, and the solution is applied to the ice making surface 2 and the deicing surface 3 and dried. The hydrolysis of tetraethoxytitanium produces titanium hydroxide, and the dehydration-condensation polymerization produces amorphous titania. Third Example: A thin film of amorphous silica is formed on the ice making surface 2 and the deicing surface 3 of the ice making plate 1 in the same manner as the second example, and a thin film made of amorphous TiO 2 is formed by a sputtering method. Is also good. The optical semiconductor layer 21 containing titanium oxide as a main component formed as in each of the above examples is transparent and has a hydrophilic surface in response to photoexcitation. In addition, it has an oxidizing function by photoexcitation and decomposes organic substances to be effective for antibacterial, deodorizing, and the like.
【0013】また、製氷板1の製氷面2と除氷面3にそ
れぞれ光を当てるべく蛍光ランプ23が装備されてい
る。蛍光ランプ23としては、酸化チタンが最もその能
力を発揮できる紫外線ランプ(波長が370nm近辺)
が好ましい。蛍光ランプ23は、製氷機が稼働している
間点灯させるようにしても良いが、間欠的に点灯するよ
うにすると、その寿命を伸ばすことができる。間欠点灯
の方法としては、製氷工程中に点灯、除氷工程中に点
灯、氷が剥離されて製氷板に氷がない状態のときに点
灯、あるいは製氷の工程とは関係なく点灯と消灯とを交
互に繰り返す、といったことが考えられる。A fluorescent lamp 23 is provided for irradiating the ice making surface 1 and the deicing surface 3 of the ice making plate 1 with light. As the fluorescent lamp 23, an ultraviolet lamp (a wavelength of about 370 nm) in which titanium oxide can exhibit its best performance
Is preferred. The fluorescent lamp 23 may be turned on while the ice maker is operating, but if it is turned on intermittently, the life of the fluorescent lamp 23 can be extended. The method of intermittent lighting is to turn on during the ice making process, turn on during the deicing process, turn on when the ice is peeled and there is no ice on the ice making plate, or turn on and off regardless of the ice making process. Alternately, it is conceivable.
【0014】本実施形態は上記のような構造であって、
続いてその作用を説明する。製氷を行う場合には、冷却
管6に冷媒を流して製氷板1を冷却しつつ、給水管7か
ら製氷用水を供給する。製氷用水は案内部5から両製氷
板1の製氷面2を流下し、製氷面2における主に冷却管
6が配管された部分から順次に氷結層を成長させ、すな
わち氷Iが生成される。The present embodiment has the above structure,
Subsequently, the operation will be described. When performing ice making, water for ice making is supplied from the water supply pipe 7 while cooling the ice making plate 1 by flowing a refrigerant through the cooling pipe 6. The ice-making water flows down the ice-making surfaces 2 of both ice-making plates 1 from the guide portion 5, and a frozen layer is grown sequentially from the portion of the ice-making surface 2 where the cooling pipe 6 is mainly piped, that is, ice I is generated.
【0015】ここで、製氷板1の製氷面2には酸化チタ
ンを主成分とした光半導体層21が形成されており、光
励起により親水性を示す。そのため製氷用水は、図1に
示すように、製氷板1の製氷面2の全面を濡らしながら
一様に広がって流下する。これにより、白濁も少ない良
質の氷が均一に生成される。また、流量を多くしないで
も製氷用水は一様に広げられるので、流量が抑えられた
分、氷の成長時間が短縮でき、すなわち製氷能力が上げ
られる。併せて、光半導体層21として形成された酸化
チタンは酸化機能を発揮するので、雑菌類の繁殖を抑制
する抗菌作用を呈し、製氷板1の製氷面2すなわち生成
された氷Iに対して衛生面上で好適となる。Here, an optical semiconductor layer 21 containing titanium oxide as a main component is formed on the ice making surface 2 of the ice making plate 1, and exhibits hydrophilicity by light excitation. Therefore, as shown in FIG. 1, the ice making water spreads uniformly and wets down the entire surface of the ice making surface 2 of the ice making plate 1. As a result, high-quality ice with little cloudiness is uniformly generated. Also, since the ice making water is spread evenly without increasing the flow rate, the ice growth time can be shortened by the reduced flow rate, that is, the ice making capacity can be increased. At the same time, since the titanium oxide formed as the optical semiconductor layer 21 exhibits an oxidizing function, it exhibits an antibacterial action for suppressing the propagation of various fungi and sanitizes the ice making surface 2 of the ice making plate 1, ie, the generated ice I. It becomes suitable on the surface.
【0016】製氷が完了したら、散水管13から除氷用
水を散水して製氷板1の除氷面3を流下させ、また必要
に応じて冷却管6にホットガスを流して製氷板1を加熱
することで、生成された氷Iを取り出す。詳細には、図
3に示すように、生成された氷Iにおける製氷板1側の
面を溶かして水膜W1を生じさせることで、製氷板1の
製氷面2から剥離する。ここで従来のように、製氷面2
に光半導体層21が形成されていなくて、氷Iがステン
レス鋼板の表面から直に剥離される場合は、水膜W1と
ステンレス製の製氷面との間に表面張力が作用すること
により、その分、氷Iが剥がれ難い。それに対して本実
施形態では、製氷面2に親水性を呈する光半導体層21
が形成されているため、その表面には薄い水膜W2がで
きており、氷Iから溶けた水膜W1が光半導体層21の
表面の水膜W2から剥離される状態となる。その場合、
両水膜W1,W2の間に作用する表面張力は、従来のよ
うな水膜W1と製氷面自体との間に作用する表面張力よ
りも遙かに小さいから、氷Iはスムーズに剥離される。
これにより、除氷時間が短縮化されて製氷能力が向上
し、また剥離が遅れて前の氷の上に新たな氷が生成され
るといった二重製氷もなくなる。When the ice making is completed, deicing water is sprinkled from the water sprinkling tube 13 to flow down the deicing surface 3 of the ice making plate 1 and, if necessary, hot gas is flowed into the cooling tube 6 to heat the ice making plate 1. Then, the generated ice I is taken out. More specifically, as shown in FIG. 3, the surface of the generated ice I on the side of the ice making plate 1 is melted to form a water film W <b> 1, so that the ice I is separated from the ice making surface 2 of the ice making plate 1. Here, as before, the ice making surface 2
When the optical semiconductor layer 21 is not formed and the ice I is peeled off directly from the surface of the stainless steel plate, the surface tension acts between the water film W1 and the ice-making surface made of stainless steel. The ice I is hard to come off. On the other hand, in the present embodiment, the optical semiconductor layer 21 exhibiting hydrophilicity on the ice making surface 2 is provided.
Is formed, a thin water film W2 is formed on the surface, and the water film W1 melted from the ice I is separated from the water film W2 on the surface of the optical semiconductor layer 21. In that case,
Since the surface tension acting between the water films W1 and W2 is much smaller than the surface tension acting between the water film W1 and the ice making surface itself as in the prior art, the ice I is smoothly separated. .
As a result, the deicing time is shortened to improve the ice making capacity, and double ice making such that new ice is generated on the previous ice due to delayed separation is also eliminated.
【0017】また、除氷用水を除氷面3に散水して氷I
を剥離する場合において、その除氷用水が製氷面2側に
回り込むことが無いとは言えない。その点この実施形態
では、除氷面3側にも、抗菌作用を呈する光半導体層2
1が形成されていて清浄に保たれているから、除氷用水
を介して雑菌等が製氷面2側に回ることも防止される。Further, deicing water is sprinkled on the deicing surface 3 to remove ice I.
In the case of peeling off, it cannot be said that the deicing water does not flow to the ice making surface 2 side. In this respect, in this embodiment, the optical semiconductor layer 2 exhibiting an antibacterial action is also provided on the deicing surface 3 side.
1 is formed and kept clean, so that germs and the like are prevented from flowing to the ice making surface 2 side through the deicing water.
【0018】<他の実施形態>本発明は上記記述及び図
面によって説明した実施形態に限定されるものではな
く、要旨を逸脱しない範囲内で種々変更して実施するこ
とができる。<Other Embodiments> The present invention is not limited to the embodiments described above with reference to the drawings, and can be implemented with various modifications without departing from the scope of the invention.
【図1】 本発明の一実施形態に係る製氷機の斜視図FIG. 1 is a perspective view of an ice making machine according to an embodiment of the present invention.
【図2】 その断面図FIG. 2 is a sectional view thereof.
【図3】 製氷部分を示す部分拡大断面図FIG. 3 is a partially enlarged sectional view showing an ice making part.
1…製氷板 2…製氷面 3…除氷面 6…冷却管 7
…(製氷用水の)給水管 13…(除氷用水の)散水管
21…光半導体層 I…氷 W1…水膜 W2…水膜1 ... ice making plate 2 ... ice making surface 3 ... de-icing surface 6 ... cooling pipe 7
... water supply pipe (water for ice making) 13 ... water sprinkling pipe (water for deicing) 21 ... optical semiconductor layer I ... ice W1 ... water film W2 ... water film
Claims (3)
ることで氷を生成した後に生成した氷を製氷板から剥離
するようにした製氷機において、 前記製氷板の表面に、光励起に対応して表面が親水性を
示す光半導体層が形成されていることを特徴とする製氷
機。1. An ice making machine in which water is caused to flow on a surface of an ice making plate to be cooled and ice generated after the ice is formed is separated from the ice making plate. And an optical semiconductor layer having a hydrophilic surface.
ることで氷を生成した後に、製氷板の裏面に除氷用水を
流下させることで生成した氷を製氷板から剥離するよう
にした製氷機において、 前記製氷板の裏面に、光励起に対応して表面が親水性を
示す光半導体層が形成されていることを特徴とする製氷
機。2. After ice is generated by flowing water on the surface of the ice making plate to be cooled, ice generated by flowing deicing water on the back surface of the ice making plate is separated from the ice making plate. An ice maker, wherein an optical semiconductor layer having a hydrophilic surface is formed on a back surface of the ice maker plate in response to light excitation.
して構成されていることを特徴とする請求項1または請
求項2記載の製氷機。3. The ice making machine according to claim 1, wherein the optical semiconductor layer is mainly composed of titanium oxide.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2123498A JPH11218373A (en) | 1998-02-02 | 1998-02-02 | Ice maker |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2123498A JPH11218373A (en) | 1998-02-02 | 1998-02-02 | Ice maker |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH11218373A true JPH11218373A (en) | 1999-08-10 |
Family
ID=12049356
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2123498A Pending JPH11218373A (en) | 1998-02-02 | 1998-02-02 | Ice maker |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH11218373A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108081357A (en) * | 2017-12-27 | 2018-05-29 | 宁波雯泽纺织品有限公司 | Cloth tensioning apparatus |
JP2019074242A (en) * | 2017-10-13 | 2019-05-16 | 三菱電機株式会社 | Ice-making device, ice dispenser and refrigerator |
-
1998
- 1998-02-02 JP JP2123498A patent/JPH11218373A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019074242A (en) * | 2017-10-13 | 2019-05-16 | 三菱電機株式会社 | Ice-making device, ice dispenser and refrigerator |
CN108081357A (en) * | 2017-12-27 | 2018-05-29 | 宁波雯泽纺织品有限公司 | Cloth tensioning apparatus |
CN108081357B (en) * | 2017-12-27 | 2019-06-21 | 宁波雯泽纺织品有限公司 | Cloth tensioning apparatus |
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