JPH11203942A - Transparent antistatic resin plate - Google Patents

Transparent antistatic resin plate

Info

Publication number
JPH11203942A
JPH11203942A JP10016330A JP1633098A JPH11203942A JP H11203942 A JPH11203942 A JP H11203942A JP 10016330 A JP10016330 A JP 10016330A JP 1633098 A JP1633098 A JP 1633098A JP H11203942 A JPH11203942 A JP H11203942A
Authority
JP
Japan
Prior art keywords
antistatic
transparent
resin plate
plate
haze value
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10016330A
Other languages
Japanese (ja)
Inventor
Masaki Ishii
正樹 石井
Akihiro Mochizuki
明廣 望月
Takao Igarashi
孝雄 五十嵐
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kuraray Co Ltd
Original Assignee
Kuraray Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kuraray Co Ltd filed Critical Kuraray Co Ltd
Priority to JP10016330A priority Critical patent/JPH11203942A/en
Publication of JPH11203942A publication Critical patent/JPH11203942A/en
Pending legal-status Critical Current

Links

Landscapes

  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Laminated Bodies (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
  • Non-Insulated Conductors (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide an antistatic resin plate that is useful for the partition of a clean room and the front plate of a display device, and has high transparency and a small haze value. SOLUTION: This is a transparent antistatic resin plate that has, on a transparent resin board, a static limiting layer containing 60-80 wt.% of fine particles, having an average diameter not more than 0.2 μm, of tin oxide in which antimony is doped. The transparent antistatic resin plate should have a surface resistance value not more than 1×10<9> Ω, a total light ray transmittance not less than 85%, and a haze value not more than a value obtained by adding 0.8% to the haze value of the transparent resin board.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、クリーンルームの
間仕切りやディスプレー装置の前面板として有用な、透
明度が高く且つヘーズ値の小さい帯電防止性の樹脂板に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an antistatic resin plate having a high transparency and a small haze value, which is useful as a partition for a clean room or a front panel of a display device.

【0002】[0002]

【従来の技術】樹脂製の板は、通常、非常に帯電しやす
い性質を有しており、室内に放置していると、浮遊ゴミ
を吸着して外観を損なったり、クリーンルームにおける
汚染源となったりする。これを防止するため種々の帯電
防止樹脂板が提案されている。樹脂製板に帯電防止性能
を付与するためには、樹脂板の表面の抵抗値を低下させ
ることが有効である。その方策として、樹脂表面を親水
性にして水分子が吸着しやすくすることが知られてお
り、実際に、ポリエチレングリコールのような親水性の
官能基を有する樹脂をその樹脂板の製造時に練り込むこ
とが行われている。しかしながら、この方法によって得
られる樹脂板の表面の抵抗値は約1011Ωに過ぎず、ま
た帯電した電荷の半減期は数秒から数十秒程度である。
このような従来技術における欠点を改良するために、光
の波長より充分小さい粒径を有する導電性微粒子を分散
させた層を樹脂表面に設けることで表面抵抗を低下させ
る方法が提案されている(特公昭63−33778号公
報参照)。この方法では、導電性の微粒子として、アン
チモンをドープした酸化スズ微粒子が用いられている。
この方法によって得られる樹脂板の表面の抵抗値は約1
8 Ωであり、帯電した電荷の半減期は1秒以下にな
る。
2. Description of the Related Art Resin plates are usually very easily charged, and when left indoors, they absorb floating dust and impair the appearance, or become a source of contamination in clean rooms. I do. Various antistatic resin plates have been proposed to prevent this. In order to impart antistatic performance to a resin plate, it is effective to lower the resistance value on the surface of the resin plate. As a measure, it is known that the resin surface is made hydrophilic so that water molecules are easily adsorbed. In practice, a resin having a hydrophilic functional group such as polyethylene glycol is kneaded during the production of the resin plate. That is being done. However, the resistance value of the surface of the resin plate obtained by this method is only about 10 11 Ω, and the half life of the charged electric charge is about several seconds to several tens of seconds.
In order to improve such disadvantages in the prior art, there has been proposed a method of reducing the surface resistance by providing a layer in which conductive fine particles having a particle size sufficiently smaller than the wavelength of light are dispersed on the resin surface ( See JP-B-63-33778). In this method, tin oxide fine particles doped with antimony are used as the conductive fine particles.
The resistance value of the surface of the resin plate obtained by this method is about 1
0 8 Ω, and the half life of the charged electric charge is 1 second or less.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、このよ
うな従来知られている帯電防止性樹脂板は、透明性に問
題があり、特に曇りが増加する傾向がある。特にヘーズ
値が2%以上になると外見上曇りが大きいという印象を
強く受ける。本発明の目的は、かかる問題点を解消し、
クリーンルームの間仕切りやディスプレー装置の前面板
として有用な、透明度が高く且つヘーズ値の小さい帯電
防止性の樹脂板を提供することにある。
However, such a conventionally known antistatic resin plate has a problem in transparency, and particularly tends to increase fogging. In particular, when the haze value is 2% or more, the impression that the haze is large in appearance is strongly received. An object of the present invention is to solve such a problem,
An object of the present invention is to provide an antistatic resin plate having a high transparency and a small haze value, which is useful as a partition of a clean room or a front plate of a display device.

【0004】[0004]

【課題を解決するための手段】上記の課題は、本発明に
よれば、透明樹脂基板上にアンチモンをドープした平均
粒径が0.2μm以下の酸化スズの微粒子を60〜80
重量%含有する制電層を有する透明帯電防止樹脂板であ
って、該透明帯電防止樹脂板の表面抵抗値が1×109
Ω以下であり、全光線透過率が85%以上であり、且つ
ヘーズ値が透明樹脂基板のヘーズ値に0.8%を加えた
値を超えないものであることを特徴とする透明帯電防止
樹脂板により解決することができる。
According to the present invention, there is provided, according to the present invention, a method in which antimony-doped tin oxide fine particles having an average particle diameter of 0.2 μm or less are coated on a transparent resin substrate by 60 to 80 μm.
A transparent antistatic resin plate having an antistatic layer containing 1% by weight of a transparent antistatic resin plate having a surface resistance of 1 × 10 9.
Ω or less, the total light transmittance is 85% or more, and the haze value does not exceed a value obtained by adding 0.8% to the haze value of the transparent resin substrate. It can be solved by a board.

【0005】本発明において基板として用いることがで
きる樹脂は、透明性を有するものであればよく、その具
体例としてメタクリル樹脂、ポリカーボネート、塩化ビ
ニル樹脂などを挙げることができる。これらの透明樹脂
からなる基板上には、通常ホットメルト接着剤等の粘着
層を介して、アンチモンをドープした酸化スズの微粒子
を60〜80重量%含有する制電層が設けられる。酸化
スズの平均粒径は0.2μm以下であることを要し、そ
の場合は微粒子の大きさが可視光の波長よりも充分小さ
いために、可視光の散乱が少なくなり、透明帯電防止樹
脂板の透明性が確保される。
The resin which can be used as the substrate in the present invention may be any resin having transparency, and specific examples thereof include methacrylic resin, polycarbonate, and vinyl chloride resin. On a substrate made of such a transparent resin, an antistatic layer containing 60 to 80% by weight of fine particles of tin oxide doped with antimony is usually provided via an adhesive layer such as a hot melt adhesive. The average particle size of tin oxide is required to be 0.2 μm or less. In that case, since the size of the fine particles is sufficiently smaller than the wavelength of visible light, scattering of visible light is reduced, and a transparent antistatic resin plate is used. Transparency is ensured.

【0006】酸化スズ微粒子は多く含有される方が粒子
間距離が小さくなり表面抵抗値を小さくすることができ
るが、含有量が80重量%を超えるとヘーズ値が大きく
なり、曇りが大きい印象を受けるようになる。一方、酸
化スズ微粒子の含有量が60重量%未満になると、透明
帯電防止樹脂板の表面抵抗値が1×109 Ωを超えるこ
ととなり、帯電荷の半減期が1秒以上となるので好まし
くない。
When the content of tin oxide fine particles is large, the distance between the particles becomes small and the surface resistance can be reduced. However, when the content exceeds 80% by weight, the haze value increases and the impression that the haze is large is large. To receive it. On the other hand, when the content of the tin oxide fine particles is less than 60% by weight, the surface resistance value of the transparent antistatic resin plate exceeds 1 × 10 9 Ω, and the half life of the charge becomes 1 second or more, which is not preferable. .

【0007】本発明の透明帯電防止樹脂板は、その全光
線透過率が85%以上であることが必要である。全光線
透過率が85%未満であると、視覚上の透明感が明かに
損なわれるので好ましくない。
[0007] The transparent antistatic resin plate of the present invention must have a total light transmittance of 85% or more. If the total light transmittance is less than 85%, the visual transparency is clearly impaired, which is not preferable.

【0008】また、本発明の透明帯電防止樹脂板におい
ては、そのヘーズ値が透明樹脂基板のヘーズ値に0.8
%を加えた値を超えないことが必要である。ヘーズ値が
透明樹脂基板のヘーズ値に0.8%を加えた値以上にな
ると、樹脂板に曇り感が目立つようになり好ましくな
い。
[0008] In the transparent antistatic resin plate of the present invention, the haze value of the transparent antistatic resin plate is 0.8 to the haze value of the transparent resin substrate.
It is necessary not to exceed the value obtained by adding the percentage. If the haze value is equal to or greater than the value obtained by adding 0.8% to the haze value of the transparent resin substrate, the resin plate becomes undesirably cloudy.

【0009】本発明の透明帯電防止樹脂板は、ロール転
写法により製造するのが適当である。例えばポリエチレ
ンテレフタレート(以下、PETと略称する場合があ
る)などの樹脂製フィルム上に離型層、制電層および粘
着層をこれらの順に積層し、得られた積層フィルムを透
明樹脂基板上に加圧ロールによって張り合わせた後に、
積層フィルムのみを剥離することにより、目的とする透
明帯電防止樹脂板を製造することができる。制電層は透
明樹脂基板の片面に設けてもよいが、両面に設けても差
支えない。
The transparent antistatic resin plate of the present invention is suitably produced by a roll transfer method. For example, a release layer, an antistatic layer and an adhesive layer are laminated on a resin film such as polyethylene terephthalate (hereinafter sometimes abbreviated as PET) in this order, and the resulting laminated film is applied on a transparent resin substrate. After laminating with a pressure roll,
By peeling off only the laminated film, the intended transparent antistatic resin plate can be manufactured. The antistatic layer may be provided on one side of the transparent resin substrate, or may be provided on both sides.

【0010】本発明において制電層は薄い方がヘーズ値
が小さくなる傾向がある。特に制電層のヘーズ値を1%
以下にするためには、その厚さを1.5μm以下にする
のがよい。このような薄い制電層を透明樹脂基板上に均
一に設けるためには、該樹脂板上に直接制電層を設ける
よりも、一旦樹脂フィルム上に設けたものを透明樹脂基
板に転写する方が容易である。
In the present invention, the thinner the antistatic layer, the smaller the haze value tends to be. In particular, the haze value of the antistatic layer is 1%
In order to reduce the thickness to less than 1.5 μm, the thickness is preferably set to 1.5 μm or less. In order to uniformly provide such a thin antistatic layer on a transparent resin substrate, it is better to transfer the one provided on the resin film to the transparent resin substrate than to provide the antistatic layer directly on the resin plate. Is easy.

【0011】また、本発明において制電層をより高い温
度で乾燥する方がヘーズ値が小さくなる傾向がある。ポ
リエチレンテレフタレートなどの樹脂フィルムの方が、
メタクリル樹脂などの透明樹脂基板よりも高温による処
理が容易なので、制電層は樹脂フィルム上に設ける方が
有利であり、この点からも、制電層を樹脂フィルム上に
設け、これを透明樹脂基板に転写する方が有利である。
本発明において制電層は、架橋構造を有したハードコー
ト塗料をマトリックスとしてもよく、この層の硬化には
熱硬化、紫外線硬化等が好適に用いられる。
In the present invention, the haze value tends to decrease when the antistatic layer is dried at a higher temperature. Resin film such as polyethylene terephthalate,
Since the treatment at a higher temperature is easier than that of a transparent resin substrate such as methacrylic resin, it is advantageous to provide the antistatic layer on a resin film. Transferring to a substrate is advantageous.
In the present invention, the antistatic layer may be formed of a hard coat paint having a crosslinked structure as a matrix, and heat curing, ultraviolet curing, or the like is suitably used for curing this layer.

【0012】[0012]

【実施例】以下、本発明を具体的に詳しく説明する。な
お、実施例および比較例におけるヘーズ値は、JIS−
K7105法に従い測定したものである。表面抵抗値は
ADVANTEST社製R8340超高抵抗/微小電流
計を用いて測定した。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail. The haze value in the examples and comparative examples is JIS-
It is measured according to the K7105 method. The surface resistance was measured using an R8340 ultrahigh resistance / microammeter manufactured by ADVANTEST.

【0013】実施例1 厚さ25μmのPETフィルムにシリコン型の離型剤を
塗布、乾燥したのち、アンチモンをドープした平均粒径
が0.2μm以下の酸化スズ微粒子を70重量%含有し
たアクリル系塗料を約1μm塗布乾燥し、次いでアクリ
ル系粘着剤をその上より塗布乾燥した。こうして得られ
たフィルムを厚さ3mmのポリメチルメタクリレート
(以下、PMMAと略称する場合がある)樹脂基板とあ
わせ、150℃に加熱したロールを用いて、圧着した
後、PETフィルムを剥がし、制電板を得た。この操作
を基板のもう一方の面についても行った。こうして得ら
れた制電板は、ヘーズ値がPMMA樹脂基板の0.2%
に0.6%を加えた0.8%であり、表面抵抗値が6×
107 Ωであった。
Example 1 A 25 μm-thick PET film was coated with a silicone-type release agent, dried, and then an acrylic-based material containing 70% by weight of antimony-doped tin oxide fine particles having an average particle diameter of 0.2 μm or less was used. The coating was applied and dried at about 1 μm, and then an acrylic pressure-sensitive adhesive was applied thereon and dried. The film thus obtained is combined with a 3 mm-thick polymethyl methacrylate (hereinafter sometimes abbreviated as PMMA) resin substrate, and pressed using a roll heated to 150 ° C., and then the PET film is peeled off. I got a board. This operation was performed on the other surface of the substrate. The thus obtained antistatic plate has a haze value of 0.2% of the PMMA resin substrate.
0.8% obtained by adding 0.6% to the surface resistance, and the surface resistance value is 6 ×
It was 10 7 Ω.

【0014】実施例2 制電層の厚さを0.8μmとした以外は実施例1と同様
にして透明制電板を得た。この制電板はヘーズ値が0.
6%であり、表面抵抗値が1×109 Ωであった。
Example 2 A transparent antistatic plate was obtained in the same manner as in Example 1, except that the thickness of the antistatic layer was changed to 0.8 μm. This electricity control plate has a haze value of 0.
6%, and the surface resistance was 1 × 10 9 Ω.

【0015】実施例3 制電層の厚さを1.2μmとした以外は実施例1と同様
にして制電板を得た。この制電板はヘーズ値が1.0%
であった。
Example 3 An antistatic plate was obtained in the same manner as in Example 1 except that the thickness of the antistatic layer was changed to 1.2 μm. This electricity control board has a haze value of 1.0%
Met.

【0016】実施例4 制電層のマトリックス中に架橋剤を加え、塗布した後に
紫外線を照射し、ハードコート層とした。その後、ポリ
ブチラールからなる中間層を塗布した後、粘着層を塗布
し、転写フィルムを作製した。この転写フィルムを用い
て実施例1と同様にPMMA樹脂基板に転写し、制電板
を得た。ヘーズ値および表面抵抗値は、実施例1と同様
であり、耐擦傷性もスチールウールで100回擦った前
後のヘーズ値の変化(ΔH)が0.2〜0.3%と非常
に低い値となった。
Example 4 A crosslinking agent was added to the matrix of the antistatic layer, and after application, ultraviolet rays were irradiated to form a hard coat layer. Then, after applying an intermediate layer made of polybutyral, an adhesive layer was applied to prepare a transfer film. Using this transfer film, transfer was performed to a PMMA resin substrate in the same manner as in Example 1 to obtain an antistatic plate. The haze value and the surface resistance value were the same as those in Example 1, and the abrasion resistance was such that the change in the haze value (ΔH) before and after rubbing 100 times with steel wool was a very low value of 0.2 to 0.3%. It became.

【0017】比較例1〜3 市場で入手した制電板について、ヘーズ値を測定したと
ころ、いずれも2%以上と非常に大きな値であった。ま
た比較例1で用いた制電板は、バフ研磨の痕が残り、表
面荒さ(Rz)が0.6μm以上であった。
Comparative Examples 1 to 3 The haze value of a commercially available antistatic plate was measured and found to be a very large value of 2% or more. In addition, the antistatic plate used in Comparative Example 1 had buffing marks left on it, and had a surface roughness (Rz) of 0.6 μm or more.

【0018】比較例4 制電層の厚さを1.5μmとした以外は実施例1と同様
にして制電板を得た。ヘーズ値が1.2%と大きくなっ
た。
Comparative Example 4 An antistatic plate was obtained in the same manner as in Example 1, except that the thickness of the antistatic layer was changed to 1.5 μm. The haze value increased to 1.2%.

【0019】比較例5 制電層の乾燥条件を120℃とした以外は実施例1と同
様にして制電板を得た。ヘーズ値が1.5%と大きくな
った。
Comparative Example 5 An antistatic plate was obtained in the same manner as in Example 1 except that the drying conditions of the antistatic layer were set to 120 ° C. The haze value increased to 1.5%.

【0020】比較例6 離型層の乾燥条件を100℃とした以外は実施例1と同
様にして制電板を得た。転写層にむらが生じ外観不良と
なった。
Comparative Example 6 An antistatic plate was obtained in the same manner as in Example 1 except that the drying condition of the release layer was changed to 100 ° C. The transfer layer was uneven, resulting in poor appearance.

【0021】実施例5 制電層の導電性微粒子の含有量を60%とした以外は実
施例1と同様にして制電板を得た。この制電板は、表面
抵抗値が1×109 Ωとなった。
Example 5 An antistatic plate was obtained in the same manner as in Example 1 except that the content of the conductive fine particles in the antistatic layer was changed to 60%. This antistatic plate had a surface resistance of 1 × 10 9 Ω.

【0022】比較例7 制電層の導電性微粒子の含有量を52%とした以外は実
施例1と同様にして制電板を得た。この制電板は表面抵
抗値が3×109 Ωとなった。
Comparative Example 7 An antistatic plate was obtained in the same manner as in Example 1 except that the content of the conductive fine particles in the antistatic layer was changed to 52%. This antistatic plate had a surface resistance of 3 × 10 9 Ω.

【0023】比較例8 制電層の導電性微粒子の含有量を85%とした以外は実
施例1と同様にして制電板を得た。この制電板は、導電
性微粒子の凝集が生じて異物として観察されるようにな
り外観が劣化した。上記の実施例1〜5および比較例1
〜8において、得られた制電板の電気的特性、光学特性
等をまとめて表1に示す。
Comparative Example 8 An antistatic plate was obtained in the same manner as in Example 1, except that the content of the conductive fine particles in the antistatic layer was changed to 85%. In this antistatic plate, agglomeration of the conductive fine particles occurred, so that the antistatic plate was observed as a foreign substance, and the appearance was deteriorated. Examples 1 to 5 and Comparative Example 1 above
Tables 1 to 8 collectively show the electrical characteristics, optical characteristics, and the like of the obtained antistatic plate.

【0024】[0024]

【表1】 [Table 1]

【0025】[0025]

【発明の効果】本発明により、クリーンルームの間仕切
りやディスプレー装置の前面板として有用な、透明度が
高く且つヘーズ値の小さい帯電防止性の樹脂板を提供す
ることができる。
According to the present invention, it is possible to provide an antistatic resin plate having a high transparency and a small haze value, which is useful as a partition for a clean room or a front panel of a display device.

フロントページの続き (51)Int.Cl.6 識別記号 FI H05K 9/00 H05K 9/00 V Continued on the front page (51) Int.Cl. 6 Identification code FI H05K 9/00 H05K 9/00 V

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 透明樹脂基板上にアンチモンをドープし
た平均粒径が0.2μm以下の酸化スズの微粒子を60
〜80重量%含有する制電層を有する透明帯電防止樹脂
板であって、該透明帯電防止樹脂板の表面抵抗値が1×
109 Ω以下であり、全光線透過率が85%以上であ
り、且つヘーズ値が透明樹脂基板のヘーズ値に0.8%
を加えた値を超えないものであることを特徴とする透明
帯電防止樹脂板。
1. An antimony-doped tin oxide fine particle having an average particle diameter of 0.2 μm or less is placed on a transparent resin substrate.
A transparent antistatic resin plate having an antistatic layer containing from 80 to 80% by weight, wherein the transparent antistatic resin plate has a surface resistance of 1 ×
10 9 Ω or less, the total light transmittance is 85% or more, and the haze value is 0.8% of the haze value of the transparent resin substrate.
A transparent antistatic resin plate characterized in that the value does not exceed the value obtained by adding
JP10016330A 1998-01-12 1998-01-12 Transparent antistatic resin plate Pending JPH11203942A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10016330A JPH11203942A (en) 1998-01-12 1998-01-12 Transparent antistatic resin plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10016330A JPH11203942A (en) 1998-01-12 1998-01-12 Transparent antistatic resin plate

Publications (1)

Publication Number Publication Date
JPH11203942A true JPH11203942A (en) 1999-07-30

Family

ID=11913442

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10016330A Pending JPH11203942A (en) 1998-01-12 1998-01-12 Transparent antistatic resin plate

Country Status (1)

Country Link
JP (1) JPH11203942A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001087590A1 (en) * 2000-05-19 2001-11-22 Tdk Corporation Functional film having functional layer and article provided with the functional film
WO2001087591A1 (en) * 2000-05-19 2001-11-22 Tdk Corporation Functional film
JP2006181791A (en) * 2004-12-27 2006-07-13 Kuraray Co Ltd Transfer material and laminate

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001087590A1 (en) * 2000-05-19 2001-11-22 Tdk Corporation Functional film having functional layer and article provided with the functional film
WO2001087591A1 (en) * 2000-05-19 2001-11-22 Tdk Corporation Functional film
US6797210B2 (en) 2000-05-19 2004-09-28 Tdk Corporation Functional film having functional layer and article provided with functional layer
KR100791725B1 (en) * 2000-05-19 2008-01-03 티디케이가부시기가이샤 Functional film having functional layer and article provided with the functional film
JP2006181791A (en) * 2004-12-27 2006-07-13 Kuraray Co Ltd Transfer material and laminate

Similar Documents

Publication Publication Date Title
JP3611234B2 (en) Protective film for display screen
JP2003039607A (en) Antistatic hard coat film and method for manufacturing the same
JP2009210911A (en) Optical laminated sheet and image display device
JP4058256B2 (en) Anti-reflection film and anti-reflection treated object
JP2009107171A (en) Optical laminate sheet, and manufacturing method therefor
JP2002019039A (en) Protective film for protecting surface of optical member
JP7279608B2 (en) Light control film and light control device
KR101271284B1 (en) Functional film for display screen and method for producing same
JP2005031282A (en) Resin composition for optical element, resin cured product for optical element, and optical element
JP2010234610A (en) Antistatic in-mold transfer sheet having anti-glare properties, and injection-molded product using the same
JP2002267804A (en) Antireflection film and method for manufacturing the same
JPH11203942A (en) Transparent antistatic resin plate
JP2001215307A (en) Anti-glare layer and optical member
JPH07178880A (en) Antistatic transparent resin plate
JPH07181306A (en) Non-glare layer and its sheet, polarizing plate and elliptic polarizing plate
JP2002117724A (en) Transparent conductive film and touch panel
JP3083588B2 (en) Surface protection film
JP2006163081A (en) Antidazzle protective substrate and its manufacturing method
JP2003245978A (en) Method for manufacturing object treated for anti- reflection
JP2003036729A (en) Conductive material
JPH0811266A (en) Infrared-shielding laminate and its manufacture
JP2005121811A (en) Optical diffusion layer transfer sheet and method for forming the optical diffusion layer
JP2006171724A (en) Antiglare film
JP4720030B2 (en) Anti-reflection film and anti-reflection treated object
JP2000025110A (en) Manufacture of antistatic plate

Legal Events

Date Code Title Description
A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A711

Effective date: 20031212

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20031212

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20051219

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20060314

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060512

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060601

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20070619

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A711

Effective date: 20070704

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070711

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20070704

A911 Transfer of reconsideration by examiner before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20070904

A912 Removal of reconsideration by examiner before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A912

Effective date: 20071012