JPH11202116A - Manufacture of color filter and color filter - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide the manufacture of the color filter where at least the top surface of a protection film corresponding to a filter element is flatly formed. SOLUTION: On a colored layer 15b, a protection film precursor 17a is mounted (G). The top surface corresponding to at least a light transmission area (filter element) is a flat original disk 19 and the top surface of the protection film precursor 17a is made flat to form a protection film precursor layer 17b (H). The protection film 17c is formed by curing the protection film precursor layer 17b.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a protective film for a color filter. Specifically, the present invention relates to improvement of a protective film having a smooth surface. In addition, the present invention relates to a method for manufacturing a color filter in which the protective film and the spacer are integrally formed, and an arrangement position of the spacer can be easily adjusted.

[0002]

2. Description of the Related Art FIG. 10 is a sectional view of a TFT (Thin Film Transistor) color liquid crystal panel in which a color filter 10 is incorporated. Color LCD panel is color filter 1
It is formed by providing a glass substrate 4a opposed to a liquid crystal composition 0 and sealing a liquid crystal composition 2a therebetween. This color filter 10 is provided with red (R), green (G) and blue (B) coloring layers 6 on a glass substrate 4b corresponding to the display elements of each primary color of the liquid crystal panel. This is an indispensable filter for displaying colors. Further, a black matrix 9 is formed between the colored layers 6 in order to improve contrast, prevent mixing of coloring materials, and the like. Further, a protective layer 7 and a common electrode 8 are sequentially formed on each colored layer 6. On the other hand, a transparent pixel electrode 3 and a TFT (not shown) are formed on a matrix inside the glass substrate 4a. Alignment films 1a and 1b are formed in the planes of the two glass substrates 4a and 4b, and by subjecting them to rubbing treatment, liquid crystal molecules can be arranged in a certain direction. Region surrounded by alignment films 1a and 1b (cell gap)
Is filled with a spacer 2b to keep the cell gap constant. Spherical silica, polystyrene, or the like is used as the spacer 2b. By irradiating the liquid crystal panel with backlight, and causing the liquid crystal composition 2a to function as an optical shutter for changing the transmittance of the backlight, color display can be performed.

Conventionally, for the purpose of protecting the colored layer 6,
For the purpose of flattening steps caused by the formation of the colored layer 6, a protective film is applied on the colored layer 6 by a method such as spin coating or roll coating, and then solidified.

When a spacer is sprayed on the cell gap, the spacer is dispersed in a low boiling organic solvent such as chlorofluorocarbon or alcohol by ultrasonic waves or the like, and this spacer dispersion is sprayed on the cell gap and then dried. A wet method of evaporating an organic solvent by a dry method, and a dry method of spraying and dispersing a mixed layer of a spacer and a gas with nitrogen gas or the like have been used.

[0005]

However, if the protective film is formed by the above-described method, it is difficult to completely flatten the surface of the protective film, so that irregularities may be formed on the surface. If a transparent electrode is formed on the protective film in this state by a method such as a sputtering method or a vapor deposition method, a step is formed in the transparent electrode, and the voltage applied to the transparent electrode becomes non-uniform, which may cause disconnection or the like. Was sometimes

In the case where the spacer is sealed in the cell gap, the spacer may be arranged on the filter element even if the spacer can be uniformly dispersed between the cell gaps in the above-mentioned conventional technology. In this case, the spacer arranged on the filter element scatters light,
This causes a reduction in the contrast of the display of the liquid crystal panel. In particular, when the display of the liquid crystal panel is enlarged using a projector or the like, even a minute defect causes a problem.
In addition, impurities may be mixed when dispersing the spacers in the cell gap, which may cause a change in the specific resistance of the liquid crystal. For this reason, the yield has been reduced and the cost has been increased.

In view of the above problems, the present invention provides a method of manufacturing a color filter capable of forming a flat surface of a protective film corresponding to a light transmitting region (filter element) of a colored layer, and a method of manufacturing the same. It is a first object to provide a color filter obtained by:

Further, by integrally forming a support member and a protective film for keeping the distance between cells for enclosing liquid crystal of the color filter constant, a color where the arrangement of the support member can be easily adjusted. A second object is to provide a method of manufacturing a filter and a color filter obtained by the method.

[0009]

In order to achieve this object, a method of manufacturing a color filter according to the present invention is directed to a method of manufacturing a color filter including a step of forming a colored layer on a substrate. A first step of mounting a precursor, and a second step of forming a protective film precursor layer by flattening the surface of the protective film precursor with an original master having at least a surface corresponding to a light transmitting region (filter element) of the colored layer. Process and
A third step of curing the protective film precursor layer to form a protective film. With this method, the surface of the protective film can be formed flat.

In the second step, a protective film precursor layer is formed on the master having a concave portion at a predetermined position on the surface of the master, and in the third step, the space between cells for enclosing the liquid crystal of the color filter is formed. It is preferable that a support member (spacer) for keeping the (cell gap) constant and the protective film be integrally formed. According to this method, the location of the spacer can be easily adjusted.

The colored layer includes a light-shielding layer (black matrix) formed in a region other than the light-transmitting region, and the above-mentioned predetermined position is an arbitrary position on the light-shielding layer (for example, a grid-like shape). (Intersection points of black matrices arranged in a matrix). By this method, it is possible to prevent the spacer from being formed on the filter element, so that the yield can be improved and the manufacturing process can be simplified.

Further, it is preferable that the recess has a columnar shape. By making the spacers have a columnar shape, disturbance of alignment of liquid crystal can be suppressed, and display contrast of a liquid crystal panel can be increased. The protective film precursor layer is preferably made of a material that can be cured by applying energy. In particular, this energy is preferably one or both of light and heat.
The protective film precursor is preferably made of a material containing an ultraviolet curable resin.

A color filter according to the present invention is a color filter comprising a substrate and a colored layer formed on the substrate, wherein a master having a flat surface corresponding to at least a light transmitting region of the colored layer on the colored layer. And a protective film formed by:

In particular, the color filter according to the present invention comprises:
It is preferable that a concave portion is formed at a predetermined position on the surface of the master, and a support member and a protective film for keeping a constant interval between cells for enclosing liquid crystal of a color filter formed integrally with the master are provided.

The colored layer includes a light-shielding layer formed in a region other than the light-transmitting region, and the above-mentioned predetermined position is preferably a position corresponding to an arbitrary position on the light-shielding layer. . Preferably, the recess has a columnar shape.

Further, the protective film is preferably made of a material which can be cured by applying energy, and the energy is preferably one or both of light and heat.

Preferably, the protective film is made of a material containing an ultraviolet curable resin.

[0018]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS (Embodiment 1) In this embodiment, after a colored layer is formed by a pigment dispersion method, when a protective film is formed on the colored layer, at least a predetermined region is formed. The present invention relates to a method for manufacturing a color filter for forming a protective film on a master having a flat surface, thereby flattening the surface of the protective film corresponding to the light transmitting region of the colored layer.

In this embodiment, a method of manufacturing a color filter by a pigment dispersion method will be described as an example.
The present invention can be applied to any method such as an electrodeposition method and a printing method.

[Manufacturing Process of Color Filter] FIG.
This embodiment will be described with reference to FIGS. Here, FIG. 1 to FIG. 4 are cross-sectional views of the manufacturing process of the color filter.

Black matrix forming step (FIG. 1)
(A)) A layer having a light-shielding property, for example, a layer made of chromium is formed on a transparent substrate 11 serving as a basis of a color filter by a method such as a sputtering method to a predetermined thickness (for example, 0.15 μm). A resist layer (not shown) is formed thereon. Next, the resist layer is exposed according to a predetermined pattern and then developed to pattern the resist layer. Then, after the chromium layer is etched using the patterned resist layer as a mask, the resist layer is removed to form a patterned light-shielding layer, that is, a black matrix 13.

The black matrix 13 has a structure in which chromium and chromium oxide are laminated.
Low reflection can also be achieved by the light interference effect.

As the composition of the black matrix 13, for example, a resin in which a black dye, a black pigment, carbon black, or the like is dispersed in a polyimide resin or an acrylic resin can be used.

Step of coating colored photosensitive resin layer (R) (FIG. 1)
(B)) A photosensitive resin colored red (R) by dispersing a pigment as a coloring material in a resin such as polyimide is coated on the substrate 11 on which the black matrix 13 is formed, and the colored photosensitive resin is formed. The layer 15a is formed. As a coating method, a method such as a spin coating method, a roll coating method, and a dip coating method can be used. The thickness of the colored photosensitive resin layer 15a is determined according to required color characteristics, and is about 1 μm to 2 μm.

Exposure Step (FIG. 1C) As shown in FIG. 1C, only a predetermined area of the colored photosensitive resin layer 15a is exposed through a mask A. Mask A is
The pattern is formed such that light is transmitted only in a region corresponding to the R color pattern of the color filter to be manufactured.

Developing Step (FIG. 2D) In the exposing step, areas other than the exposed area are dissolved and removed with a developer to form a colored layer (R). As a developer,
An alkaline aqueous solution such as tetramethylammonium hydroxide, sodium hydroxide, potassium hydroxide, calcium hydroxide, and a mixed solution of trisodium phosphate and sodium silicate can be used.

Step of Forming Colored Layers (G, B) (FIG. 2E) For the colored layers G and B, similarly to the formation of the colored layer R, a colored photosensitive resin layer application step, an exposure step, and a development step are respectively performed. By repeating this, as shown in FIG.
The R, G, and B colored layers 15b are formed.

Step of Forming Protective Film Precursor Layer (FIGS. 2 (F) to 3 (H)) As shown in FIG. 2 (F), a protective film precursor 17a is dropped on the colored layer 15b. The composition of the protective film precursor 17a is not particularly limited as long as it does not affect the light transmittance and color characteristics required as a color filter when the protective film is formed and satisfies the function as a protective film. Instead, various resin-based, glass-based, and ceramic-based materials can be used.

Further, the protective film precursor 17a is preferably a material that can be cured by applying energy. The protective film precursor 17a made of such a material becomes a robust film when formed into a protective film, and the reliability of the protective film increases.

The energy is preferably one or both of light and heat. In this manner, a general-purpose exposure apparatus, a baking furnace, a hot plate, and the like can be used, so that equipment cost can be reduced and productivity can be improved.

As such a material, for example, an ultraviolet curable acrylic resin can be used. UV-curable acrylic resins are suitable because they have excellent optical characteristics using various commercially available resins and photosensitive agents, and can be prepared in a short time.

Specific examples of the basic composition of the ultraviolet-curable acrylic resin include a prepolymer or oligomer, a monomer, and a photopolymerization initiator.

As the prepolymer or oligomer,
For example, acrylates such as epoxy acrylates, urethane acrylates, polyester acrylates, polyether acrylates, and spiroacetal acrylates; methacrylates such as epoxy methacrylates, urethane methacrylates, polyester methacrylates, and polyether methacrylates; Is available.

As the monomer, for example, 2-ethylhexyl acrylate, 2-ethylhexyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, N-vinyl-2-pyrrolidone, carbitol acrylate, tetrahydrofurfuryl acrylate, isovol Monofunctional monomers such as nyl acrylate, dicyclopentenyl acrylate, 1,3-butanediol acrylate, 1,6-hexanediol diacrylate, 1,6-hexanediol dimethacrylate, neopentyl glycol acrylate, polyethylene glycol diacrylate, Bifunctional monomers such as pentaerythritol diacrylate, trimethylolpropane triacrylate, trimethylolpropane trimethacrylate DOO, pentaerythritol triacrylate, and polyfunctional monomers such as dipentaerythritol hexaacrylate.

As the photopolymerization initiator, for example, 2,2-
Acetophenones such as dimethoxy-2-phenylacetophenone, α-hydroxyisobutylphenone, butylphenones such as p-isopropyl-α-hydroxyisobutylphenone, p-tert-butyldichloroacetophenone, p-tert-butyltrichloroacetophenone, α, halogenated acetophenones such as α-dichloro-4-phenoxyacetophenone, benzophenone,
Benzophenones such as N, N-tetraethyl-4,4-diaminobenzophenone; benzyls such as benzyl and benzyldimethylketal; benzoins such as benzoin and benzoin alkyl ether; 1-phenyl-1,2
Oximes such as -propanedione-2- (o-ethoxycarbonyl) oxime, 2-methylthioxanthone,
-Radical generating compounds such as xanthones such as chlorothioxanthone, benzoin ethers such as benzoin ether and isobutyl benzoin ether, and Michler's ketones can be used.

If necessary, a compound such as an amine may be added to prevent curing inhibition by oxygen, or a solvent component may be added to facilitate coating.
The solvent component is not particularly limited to the type, and various organic solvents can be applied. For example, propylene glycol monomethyl ether acetate, propylene glycol monopropyl ether, methoxymethyl propionate, methoxyethyl propionate,
One or more mixed solutions of ethyl cellosolve, ethyl cellosolve acetate, ethyl lactate, ethyl pyruvate, methyl amyl ketone, cyclohexanone, xylene, toluene, butyl acetate and the like can be used.

Then, as shown in FIG. 3 (G), the master 19 having a flat surface corresponding to at least the filter element is brought into close contact with the protective film precursor 17a dropped on the coloring layer and spread. As shown in (H), a protective film precursor layer 17b is formed in a predetermined region. In this case, Master 1
It is desirable that the flatness of the surface of No. 9 be high precision. Specifically, the irregularities of the master 19 are desirably within ± 0.1 μm.

In this step, the protective film precursor is previously spread on the colored layer 15b or the master 19 by a method such as spin coating or roll coating.
The master 19 may be closely attached.

Step of Hardening Precursor Film Precursor Layer (FIG. 3 (I)) After the protective film precursor layer 17b is formed in a predetermined area, protection is performed by performing a curing process according to the composition of the protective film precursor layer 17b. The protective layer 17c is obtained by curing the film precursor layer 17b. In the present embodiment, since an ultraviolet-curable acrylic resin is used, the protective film precursor layer 17b is cured by irradiating ultraviolet rays under predetermined conditions.

Master Disc Peeling Step (FIG. 4 (J)) After forming the protective film 17c, the master disc 19 is peeled from the substrate 11 as shown in FIG. 4 (F).

Transparent Electrode Forming Step (FIG. 4K) Next, a transparent electrode 21a is formed over the entire surface of the protective film 17c by using a known method such as a sputtering method or a vapor deposition method. As a composition of the transparent electrode 21a, ITO (Indium T
In Oxide), a material having both light-transmitting and conductive properties, such as a composite oxide of indium oxide and zinc oxide, can be used.

Patterning Step (FIG. 4 (L)) When a metal insulate metal (MIM) in which metal layers and insulating layers are alternately laminated is adopted as a driving method of the liquid crystal panel, the transparent electrode 21a is patterned.

Note that a TFT (Thin Fil) is used to drive the liquid crystal panel.
This step is not necessary when m Transistor) or the like is used.

According to the present embodiment, since the surface of the protective film can be flattened with high accuracy, the voltage applied to the common electrode formed on the protective film can be made uniform. Therefore, when the liquid crystal panel adopts the simple matrix driving method, it is possible to suppress the occurrence of crosstalk.

Further, according to the present embodiment, since the variation in the sheet resistance of the common electrode (ITO film) formed on the protective film can be suppressed, display unevenness of the liquid crystal panel can be prevented.

(Second Embodiment of the Invention)
The protective film of the color filter and the spacer are integrally formed on a master having a concave portion at a predetermined position on the surface, and the spacer is arranged at a suitable position.

[Manufacturing Process of Color Filter] FIG.
This embodiment will be described with reference to FIG. here,
5 and 6 are cross-sectional views illustrating a process of manufacturing a color filter. However, the steps up to the formation of the black matrix and the colored layer on the substrate are the same as those of the first embodiment, and thus the description is omitted.

Step of Forming Protective Film Precursor Layer (FIGS. 5A and 5B) As shown in FIG. 5A, a protective film precursor 18a is dropped on the colored layer 16b. The composition of the protective film precursor 18a does not affect the light transmittance and color characteristics required for a color filter when cured (protective film) in a step described later, and satisfies the function as a protective film. It is necessary to. In addition, by having appropriate strength and elasticity characteristics required for the spacer, damage to elements such as a TFT array can be prevented. Furthermore,
It is preferable to take into account the volume change due to the difference in the coefficient of thermal expansion and the coefficient of thermal expansion in order not to lower the reliability of the liquid crystal panel due to damage to the alignment film or the colored layer. As the composition of the protective film precursor 18a having such characteristics, for example, the composition shown in the first embodiment can be used.

Next, as shown in FIG. 5B, a master 20 having a recess 20b at a predetermined position on a flat surface (the manufacturing process of the master will be described later) is applied to the coloring layer 16b.
The protective film precursor layer 18b is formed by closely contacting and spreading the protective film precursor 18a dropped thereon. The depth of the recess 20b formed in the master 20 corresponds to the height of the spacer, and is processed according to the liquid crystal panel to be manufactured.
For example, in a VGA liquid crystal panel using a TFT as a driving element, the depth is about 2 μm to 6 μm. In addition, as shown in FIG. 7, it is preferable that the concave portion 20b is disposed at a position where the lattice-shaped black matrix intersects. According to such a configuration, the spacer can be easily provided at a position where the lattice-shaped black matrix intersects. Therefore, no spacer is arranged on the filter element, and the production yield of the color filter can be improved. Further, by providing the spacers on the black matrix, it is possible to reduce unevenness in alignment of liquid crystal due to the spacers, influence on the polarization characteristics of the liquid crystal panel, and the like, and to maintain a favorable image quality of the liquid crystal panel.

The shape of the concave portion 20b can be a columnar shape, a prismatic shape, or the like, but a cylindrical shape is particularly preferable.
By forming the spacer in a columnar shape, disturbance of the alignment of the liquid crystal can be suppressed.

The spacers need not be arranged at all grid points of the black matrix, but may be arranged at arbitrary grid points. However, in order to maintain the cell gap uniformly, it is necessary to arrange the spacers so that a necessary strength is obtained. For example, the spacing between the spacers is preferably in the range of 100 μm to 200 μm.

The arrangement pattern of the filter elements is not limited to the mosaic arrangement shown in FIG.
The delta arrangement and the stripe arrangement shown in FIG. 7B and FIG. 7C may be used. In this case, the spacer may be provided at any position on the black matrix. However, the arrangement pattern of the spacers shown in the figure is an example, and is not limited to this.

Step of Hardening Precursor Film Precursor Layer (FIG. 5C) After forming the protective film precursor layer 18b in a predetermined region, a curing process is performed according to the composition of the protective film precursor layer 18b. By this step, the protective film precursor layer 18b is cured, and the protective film 18c is obtained. When an ultraviolet-curable acrylic resin is used as the protective film precursor layer 18b, the protective film precursor layer 18b is cured by irradiating it with ultraviolet light under predetermined conditions.

Master Disc Peeling Step (FIG. 6D) After the protective film precursor layer 18b is cured, the master 20 is peeled from the protective film 18c. Spacer 18d on colored layer 16b
Can be obtained integrally with the protective film 18c.

Transparent Electrode Forming Step (FIG. 6E) Next, a transparent electrode 22 is formed on the protective film 18c. In this step, the transparent electrode 22 is formed over the entire surface of the protective film 18c by using a known method such as a sputtering method or an evaporation method. As a composition of the transparent electrode 22, ITO (Indium Tin
Oxide), a material having both light-transmitting and conductive properties, such as a composite oxide of indium oxide and zinc oxide, can be used.

Patterning Step (FIG. 6F) In the case of employing a metal insulate metal (MIM) in which metal layers and insulating layers are alternately laminated as a driving method of the liquid crystal panel, a resist (FIG. (Not shown), and the transparent electrode 22 is patterned into a desired shape.
That is, the transparent electrode 22 formed on the spacer 18d is etched using the resist as a mask. However, the transparent electrode 22 formed on the spacer 18d need not be etched as long as it functions as a spacer even when the transparent electrode 22 is formed on the spacer 18d.

Note that a TFT (Thin Fi
This step is unnecessary when using lm Transistor) or the like.

[Manufacturing Process of Master] Next, the manufacturing process of the master 20 used in the present embodiment will be described with reference to FIG.

Resist Layer Forming Step (FIG. 8A) A resist is applied on a master precursor 20 a made of quartz as a material to form a resist layer 26. Master precursor 20
a is not limited to quartz as long as it is a material that can be etched, and for example, glass, silicon single crystal, metal, ceramic, resin and the like can be used. As the composition of the resist layer 26, for example, a commercially available positive resist which is generally used in the manufacture of semiconductor devices and is prepared by blending a diazonaphthoquinone derivative as a photosensitive agent with a cresol novolak resin can be used as it is. . Here, the positive resist is a substance whose exposed area can be selectively removed by a developer. The thickness of the resist layer 26 may be a thickness necessary to function as an etching mask in an etching step described later, and is generally 1 μm to 3 μm.

Resist Layer Exposure Step (FIG. 8B) A mask B is arranged on the resist layer 26, and the resist layer 26 is exposed to a desired pattern via the mask B. The mask B is patterned so that light is transmitted only to the concave portion 20b shown in FIG. 5B, that is, the region other than the region corresponding to the spacer 18d.

Developing Step (FIG. 8 (C)) When development is performed with a developing solution after the exposure, as shown in FIG. 8 (C), only the resist in the area exposed in the exposure step is selectively removed, and the master precursor is removed. 20a is exposed, and the other areas remain covered with the resist layer 26. As the developing solution, an alkaline aqueous solution such as tetramethylammonium hydroxide, sodium hydroxide, potassium hydroxide, calcium hydroxide, a mixed solution of trisodium phosphate and sodium silicate can be used.

Etching Step (FIG. 9D) The master precursor 20a is etched to a predetermined depth using the patterned resist layer 26 as a mask. As an etching method, there is a wet etching method or a dry etching method. If an optimum method and conditions are selected from the viewpoint of an etching cross-sectional shape, an etching rate, in-plane uniformity, etc., according to the material of the master precursor 20a. Good. Dry etching is superior from the viewpoint of controllability. For example, parallel plate reactive ion etching (RI
E) method, inductively coupled (CIP) method, electron cyclotron resonance (ECR) method, helicon wave excitation method, magnetron method, plasma etching method, ion beam etching method and the like can be used. By changing the conditions such as the gas pressure and the bias voltage, the concave portion 20b can be etched into a desired shape such as a rectangular shape or a tapered shape. The etching depth corresponds to the depth of the spacer to be formed, and is about 2 μm to 6 μm.

Stripping of resist layer (FIG. 9E) When the depth of the recess 20b reaches a predetermined depth, etching is stopped and the resist layer 26 is stripped.

As described above, the depth of the concave portion 20b of the master 20 can be controlled with high accuracy by the etching technique. For example, the etching error is ± 0.05 μm for the depth of the concave portion of 3 μm. Therefore, since the height of the spacer, that is, the cell gap can be kept constant,
It is easy to maintain retardation of the liquid crystal at a suitable value.

For example, when natural light enters the STN liquid crystal panel from above, light passing through the first polarizing film becomes linearly polarized light, and light passing through the second polarizing film becomes elliptically polarized light due to the birefringence of liquid crystal molecules. become. This phase shift depends on the retardation δnd which is the product of the difference δn between the refractive index of the major axis and the minor axis of the liquid crystal molecules and the thickness (cell gap interval) d of the liquid crystal layer. The value of the retardation is important in designing a liquid crystal panel. For example, in the case of the normally black mode, it is known that when the retardation value of the light of 550 nm is 0.48 μm or less, the contrast suddenly deteriorates due to light leakage. According to the present embodiment, not only the position of the spacer can be easily adjusted, but also the height (cell gap interval) d of the spacer can be made uniform, so that the retardation value is kept at a suitable value. can do. Therefore, display characteristics such as the light transmittance, contrast ratio, and response speed of the liquid crystal can be easily optimized.

Further, according to the present embodiment, since the protective film and the spacer can be integrally formed, there is a possibility that impurities (particularly, impurities such as ions) may be mixed into the liquid crystal in the process of dispersing the spacer as in the prior art. Absent. Therefore, when a voltage is applied to the liquid crystal interposed between the transparent electrode and the common electrode to change the arrangement of the liquid crystal, no impurity is mixed into the liquid crystal, so that the driving characteristics of the liquid crystal can be improved.

[0067]

According to the present invention, it is possible to provide a method of manufacturing a color filter capable of forming a flat surface of a protective film corresponding to a light transmitting region of a colored layer, and a color filter obtained by the method. it can.

Also, by integrally forming the protective film and the support member (spacer) on the master, the location of the spacer can be easily adjusted. Thereby, since it is possible to prevent the spacer from being formed on the filter element, the yield can be improved and the manufacturing process can be simplified. Therefore, the cost can be reduced.

[Brief description of the drawings]

FIG. 1 is a cross-sectional view of a color filter manufacturing process (first embodiment).

FIG. 2 is a cross-sectional view of the manufacturing process of the color filter (first embodiment).

FIG. 3 is a cross-sectional view of a color filter manufacturing process (first embodiment).

FIG. 4 is a sectional view of the manufacturing process of the color filter (first embodiment).

FIG. 5 is a cross-sectional view of a color filter manufacturing process (Embodiment 2).

FIG. 6 is a sectional view of a color filter manufacturing process (Embodiment 2).

FIG. 7 is a diagram showing an arrangement pattern of filter elements.

FIG. 8 is a cross-sectional view illustrating a manufacturing process of a master having a concave portion on the surface.

FIG. 9 is a cross-sectional view illustrating a manufacturing process of a master having a concave portion on the surface.

FIG. 10 is a cross-sectional view of a conventional liquid crystal panel.

[Explanation of symbols]

11, 12: substrate, 13, 14, black matrix, 15a: colored photosensitive resin, 15b: colored layer, 17
a, 18a: protective film precursor, 17b, 18b: protective film precursor layer, 17c, 18c: protective film, 18d: spacer,
19, 20 masters, 20b ... recesses, 21a, 21b, 22
… Transparent electrode

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[Procedure amendment]

[Submission date] January 12, 1998

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Claims (14)

[Claims] 1. A method of manufacturing a color filter comprising a step of forming a colored layer on a substrate, wherein the first step of mounting a protective film precursor on the colored layer corresponds to at least a light transmitting region of the colored layer. A second step of forming a protective film precursor layer by flattening the surface of the protective film precursor using a master having a flat surface, and a third step of curing the protective film precursor layer to form a protective film. And a process for producing a color filter. 2. In the second step, the protective film precursor layer is formed on a master having a concave portion at a predetermined position on the surface of the master, and the liquid crystal of the color filter is formed in the third step. 2. The method for manufacturing a color filter according to claim 1, wherein a support member for keeping a space between cells to be sealed and the protective film are integrally formed. 3. The color layer includes a light-shielding layer formed in a region other than the light-transmitting region, and the predetermined position is a position corresponding to an arbitrary position on the light-shielding layer. Item 3. A method for manufacturing a color filter according to Item 2. 4. The concave portion has a columnar shape.
Alternatively, the method for manufacturing a color filter according to claim 3. 5. The method of manufacturing a color filter according to claim 1, wherein the protective film precursor layer is made of a material that can be cured by applying energy. 6. The method according to claim 5, wherein the energy is one or both of light and heat. 7. The method for manufacturing a color filter according to claim 1, wherein the protective film precursor contains an ultraviolet curable resin. 8. A color filter comprising a substrate and a colored layer formed on the substrate, wherein at least a surface corresponding to a light transmitting region of the colored layer is formed on the colored layer by a flat master. Color filter with protective film. 9. A support member and a protective film for forming a concave portion at a predetermined position on the surface of the master, and for maintaining a constant distance between cells for sealing liquid crystal of the color filter formed integrally with the master. The color filter according to claim 8, further comprising: 10. The colored layer includes a light-shielding layer formed in a region other than the light-transmitting region, and the predetermined position is a position corresponding to an arbitrary position on the light-shielding layer. Item 10. A color filter according to item 9. 11. The color filter according to claim 9, wherein the recess has a columnar shape. 12. The protective film according to claim 8, wherein the protective film is made of a material that can be cured by applying energy.
2. The color filter according to any one of 1. 13. The color filter according to claim 12, wherein the energy is one of light and heat or both. 14. The color filter according to claim 8, wherein the protective film includes an ultraviolet curable resin.