JPH11176978A - Semiconductor integrated circuit - Google Patents

Semiconductor integrated circuit

Info

Publication number
JPH11176978A
JPH11176978A JP9339807A JP33980797A JPH11176978A JP H11176978 A JPH11176978 A JP H11176978A JP 9339807 A JP9339807 A JP 9339807A JP 33980797 A JP33980797 A JP 33980797A JP H11176978 A JPH11176978 A JP H11176978A
Authority
JP
Japan
Prior art keywords
integrated circuit
semiconductor substrate
circuit chip
conductive metal
metal plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9339807A
Other languages
Japanese (ja)
Inventor
Toyohisa Matsukawa
豊久 松川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP9339807A priority Critical patent/JPH11176978A/en
Publication of JPH11176978A publication Critical patent/JPH11176978A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/552Protection against radiation, e.g. light or electromagnetic waves
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA

Abstract

PROBLEM TO BE SOLVED: To improve noise immunity and resistance to latch-up. SOLUTION: An integrated circuit chip 1, in which an integrated circuit is formed, is mounted on a package substrate 22 to configure a chip scale package CSP. A side of the integrated circuit chip 1 to which the integrated circuit is integrated is directed downward. A conductive metal part 3 is stuck on the opposite side of the integrated circuit chip to the side which the integrated circuit integrated thereto, while having conductivity with respect to a semiconductor substrate 10. A current hardly flows to the semiconductor substrate 10 due to internal causes or due to external disturbances through the presence of the conductive metallic plate 3. Then a potential distribution tends to be hardly generated resulting from of a voltage difference unexpectedly.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体基板に配線
層を順次積層する等して集積回路が作り込まれた集積回
路チップを、ユーザの回路を作り込む基板に実装すると
該集積回路チップは集積回路が作り込まれている面が下
側になるように、パッケージ基板に搭載して構成された
半導体集積回路に係り、特に、ノイズ耐性及びラッチア
ップ耐性を向上することができる半導体集積回路に関す
る。
BACKGROUND OF THE INVENTION The present invention relates to a method of mounting an integrated circuit chip on which an integrated circuit is formed by sequentially laminating wiring layers on a semiconductor substrate on a substrate on which a user's circuit is formed. The present invention relates to a semiconductor integrated circuit mounted on a package substrate such that a surface on which an integrated circuit is formed is on the lower side, and more particularly to a semiconductor integrated circuit capable of improving noise resistance and latch-up resistance. .

【0002】[0002]

【従来の技術】CSP(chip scale package)は、DI
P(dual inline package )やPGA(pin grid arra
y)に比べ、小面積で薄く小型外形であり、実装面積及
び体積が小さい。このため、利用する機器の小型化に有
効である。
2. Description of the Related Art CSP (chip scale package)
P (dual inline package) or PGA (pin grid arra
Compared to y), it has a small area, a thin and small external shape, and a small mounting area and volume. For this reason, it is effective for miniaturization of equipment to be used.

【0003】CSPは、実装方法で大別すると、フリッ
プ型と非フリップ型とがある。
The CSP is roughly classified into a flip type and a non-flip type according to a mounting method.

【0004】まず、フリップ型のCSPの集積回路チッ
プ1は、例えば図1に示すように、半導体基板10に
は、配線層を順次積層する等して集積回路が作り込まれ
ている。又、該集積回路からその外部に対して配線を引
き出す場合、引出し配線層14でハンダバンプ16に接
続する。ここでこの図1において、符号12は、絶縁層
である。
First, in a flip-type CSP integrated circuit chip 1, as shown in FIG. 1, for example, an integrated circuit is formed on a semiconductor substrate 10 by sequentially laminating wiring layers. When wiring is drawn out from the integrated circuit to the outside, the wiring is connected to the solder bump 16 by the drawing wiring layer 14. Here, in FIG. 1, reference numeral 12 denotes an insulating layer.

【0005】このような集積回路チップ1は、図2に示
すように、パッケージ基板22に表裏を反転させて実装
することでCSPとなる。即ち、ユーザの回路を作り込
む基板5に実装すると、集積回路チップ1は集積回路を
作り込んでいる面が下側になるように反転させて、集積
回路チップ1はパッケージ基板22に実装されている。
該実装は、ハンダバンプ16の溶融接続による。
[0005] As shown in FIG. 2, such an integrated circuit chip 1 is mounted on a package substrate 22 with its front and back turned to be a CSP. That is, when the integrated circuit chip 1 is mounted on the substrate 5 on which the circuit of the user is formed, the integrated circuit chip 1 is inverted so that the surface on which the integrated circuit is formed is on the lower side, and the integrated circuit chip 1 is mounted on the package substrate 22. I have.
The mounting is performed by melting the solder bumps 16.

【0006】ここで、ユーザ回路基板5には、当該フリ
ップ型CSPに加え、その他の素子が搭載され、ユーザ
回路が構成される。又、集積回路チップ1のハンダバン
プ16と、パッケージ基板22のハンダボール24と
は、パッケージ基板22に作り込んである配線層の配線
で、基本的に一対一で電気的に接続されている。又、パ
ッケージ基板22は、一般にガラスエポキシ樹脂等を母
材とする。
[0006] Here, other elements are mounted on the user circuit board 5 in addition to the flip-type CSP to form a user circuit. Further, the solder bumps 16 of the integrated circuit chip 1 and the solder balls 24 of the package substrate 22 are wirings of a wiring layer formed on the package substrate 22, and are basically electrically connected one to one. The package substrate 22 is generally made of glass epoxy resin or the like as a base material.

【0007】次に、非フリップ型のCSPの集積回路チ
ップ1は、図3に示すように、テープ基板32に実装す
ることでCSPとなる。集積回路チップ1は、集積回路
を作り込んでいる面を上側にして実装する。この時、集
積回路チップ1に作り込んであるボンディングパッド
は、ボンディングワイヤ36でテープ基板32のパッド
に接続される。又該パッドは、テープ基板32に作り込
んである配線層の配線で、基本的に一対一でハンダボー
ル34に電気的に接続されている。
Next, as shown in FIG. 3, the non-flip type CSP integrated circuit chip 1 is mounted on a tape substrate 32 to become a CSP. The integrated circuit chip 1 is mounted with the surface on which the integrated circuit is formed facing upward. At this time, the bonding pads formed in the integrated circuit chip 1 are connected to the pads of the tape substrate 32 by the bonding wires 36. The pads are wirings of a wiring layer formed on the tape substrate 32 and are basically electrically connected to the solder balls 34 one-to-one.

【0008】[0008]

【発明が解決しようとする課題】しかしながら、前述の
フリップ型のCSPや、非フリップ型のCSPでは、半
導体基板10の電気抵抗が高いため(小さくないた
め)、ノイズ耐性及びラッチアップ耐性が低下してしま
うという問題がある。特に、フリップ実装する場合、こ
のような問題が生じ易い。
However, in the above-mentioned flip-type CSP and non-flip-type CSP, since the electric resistance of the semiconductor substrate 10 is high (not small), noise resistance and latch-up resistance are reduced. Problem. In particular, in the case of flip mounting, such a problem is likely to occur.

【0009】又、前述のフリップ型のCSPは、ユーザ
の回路を作り込む基板に実装して利用している状態で
は、このユーザ回路基板とは反対側が、その集積回路チ
ップの集積回路が作り込まれてはいない面となる。この
ため、CSPの半導体基板は、電界や磁界等の外的影響
を受け易くなり、集積回路チップのノイズ耐性及びラッ
チアップ耐性が低下してしまうという問題がある。
When the flip-type CSP is mounted on a board on which a user's circuit is formed and used, the integrated circuit of the integrated circuit chip is mounted on the side opposite to the user circuit board. This is a rare side. For this reason, the semiconductor substrate of the CSP is susceptible to external influences such as an electric field and a magnetic field, and the noise resistance and the latch-up resistance of the integrated circuit chip are reduced.

【0010】本発明は、前記従来の問題点を解決するべ
くなされたもので、ノイズ耐性及びラッチアップ耐性を
向上することができる半導体集積回路を提供することを
目的とする。
An object of the present invention is to solve the above-mentioned conventional problems, and an object of the present invention is to provide a semiconductor integrated circuit capable of improving noise resistance and latch-up resistance.

【0011】[0011]

【課題を解決するための手段】本発明は、半導体基板に
配線層を順次積層する等して集積回路が作り込まれた集
積回路チップをパッケージ基板に搭載して構成され、該
集積回路チップは集積回路が作り込まれている面が下側
になるように、ユーザの回路を作り込む基板に前記パッ
ケージ基板を実装して利用するようにした半導体集積回
路において、前記集積回路チップの前記集積回路を作り
込んだ面とは反対の面に、前記半導体基板に対して導電
性がある状態で、導電金属板を貼り付けるようにしたこ
とを特徴とする半導体集積回路したことにより、前記課
題を解決したものである。
According to the present invention, an integrated circuit chip in which an integrated circuit is formed by, for example, sequentially laminating wiring layers on a semiconductor substrate is mounted on a package substrate. In a semiconductor integrated circuit in which the package substrate is mounted and used on a substrate on which a user's circuit is to be formed, such that the surface on which the integrated circuit is formed is on the lower side, the integrated circuit of the integrated circuit chip This problem is solved by a semiconductor integrated circuit characterized in that a conductive metal plate is attached to a surface opposite to a surface on which the semiconductor substrate is formed, in a state where the semiconductor substrate is conductive. It was done.

【0012】又、前記半導体集積回路において、前記導
電金属板は、その熱膨張係数が前記半導体基板と同等と
され、その厚さが0.1mm以上とされたことにより、
ノイズ耐性及びラッチアップ耐性を効果的に向上するこ
とができる。
In the semiconductor integrated circuit, the conductive metal plate has a thermal expansion coefficient equal to that of the semiconductor substrate and a thickness of 0.1 mm or more.
Noise immunity and latch-up immunity can be effectively improved.

【0013】以下、本発明の作用について簡単に説明す
る。
Hereinafter, the operation of the present invention will be briefly described.

【0014】前述のフリップ型のCSPや、非フリップ
型のCSPで、ノイズ耐性及びラッチアップ耐性を低下
させる要因を調べたところ、半導体基板10の電気抵抗
が高いため(小さくないため)、ノイズ耐性及びラッチ
アップ耐性が低下してしまうという問題が見出された。
内的要因で、あるいは外的要因で、電気抵抗が高い半導
体基板10に電流が流れると電位差が生じて電位分布が
生じる。すると、ノイズ耐性及びラッチアップ耐性が低
下してしまう。
Investigation was made on the factors that reduce the noise resistance and the latch-up resistance of the flip-type CSP and the non-flip-type CSP. As a result, the electrical resistance of the semiconductor substrate 10 is high (not small). And the problem that the latch-up resistance is reduced.
When a current flows through the semiconductor substrate 10 having a high electric resistance due to an internal factor or an external factor, a potential difference occurs and a potential distribution occurs. Then, noise resistance and latch-up resistance are reduced.

【0015】本発明のCSPの半導体集積回路では、集
積回路チップの集積回路を作り込んだ面とは反対の面
に、前記半導体基板に対して導電性がある状態で、導電
金属板を貼り付けるようにしている。従って、半導体基
板の実質的電気抵抗を抑えることができ、これにより、
ノイズ耐性及びラッチアップ耐性を向上することができ
る。
In the semiconductor integrated circuit of the CSP according to the present invention, a conductive metal plate is attached to a surface of the integrated circuit chip opposite to the surface on which the integrated circuit is formed, in a state of being conductive with respect to the semiconductor substrate. Like that. Therefore, the substantial electrical resistance of the semiconductor substrate can be suppressed, and
Noise immunity and latch-up immunity can be improved.

【0016】又、フリップ型のCSPにおいて、ノイズ
耐性及びラッチアップ耐性を低下させる要因を調べたと
ころ、電界や磁界等の外乱による、CSPの半導体基板
に対する悪影響が見出された。フリップ型のCSPは、
ユーザの回路を作り込む基板に実装して利用している状
態では、このユーザ回路基板とは反対側が、その集積回
路チップの集積回路が作り込まれてはいない面となる。
このため、CSPの半導体基板は、電界や磁界等の外的
影響を受け易くなり、集積回路チップのノイズ耐性及び
ラッチアップ耐性が低下するということが見出された。
In addition, when a factor that reduces noise resistance and latch-up resistance in the flip-type CSP was examined, an adverse effect on the semiconductor substrate of the CSP due to disturbance such as an electric field or a magnetic field was found. The flip type CSP is
In a state where the integrated circuit chip is used by being mounted on a substrate on which a user's circuit is formed, the surface opposite to the user circuit substrate is a surface on which the integrated circuit of the integrated circuit chip is not formed.
For this reason, it has been found that the semiconductor substrate of the CSP is easily affected by external influences such as an electric field and a magnetic field, and the noise resistance and the latch-up resistance of the integrated circuit chip are reduced.

【0017】上記のような外乱の影響を抑えるため、本
発明のフリップ型CSPの半導体集積回路では、集積回
路チップの集積回路を作り込んだ面とは反対の面に、前
記半導体基板に対して導電性がある状態で、導電金属板
を貼り付けるようにしている。
In order to suppress the influence of the disturbance as described above, in the flip-type CSP semiconductor integrated circuit of the present invention, the flip-type CSP is mounted on a surface opposite to the surface on which the integrated circuit of the integrated circuit chip is formed. A conductive metal plate is stuck in a state where there is conductivity.

【0018】このように導電金属板を貼り付けると、内
的要因によって、あるいは何らかの外乱によって半導体
基板に電流が流れにくくなり、不用意に電位差が生じて
電位分布が発生してしまいにくくなる。又、電界や磁界
等の外的影響に対して該導電金属板は、シールド作用を
なし、該外的影響が引き起こす問題を低減することがで
きる。
When the conductive metal plate is attached in this manner, it becomes difficult for a current to flow through the semiconductor substrate due to an internal factor or due to some disturbance, so that a potential difference is inadvertently generated and a potential distribution is less likely to occur. Further, the conductive metal plate has a shielding effect against external influences such as an electric field and a magnetic field, so that problems caused by the external influences can be reduced.

【0019】このように本発明によれば、ノイズ耐性及
びラッチアップ耐性を向上することができる。
As described above, according to the present invention, noise resistance and latch-up resistance can be improved.

【0020】又、CSPにおいて、集積回路チップは微
細な加工がなされ、運搬や保管に際して疵などが生じ
て、不具合を生じてしまう恐れがある。この問題につい
ては、例えば後述する実施形態の図4のように、該集積
回路チップ1の一方の面(図中の下方面)はパッケージ
基板22で保護される。又本発明を適用すると、該集積
回路チップ1の反対面(図中の上方面)は、符号3で示
される導電金属板により、保護することができる。この
ように本発明を適用すると、CSPの製品の品質維持が
容易にできるようになる。
Further, in the CSP, the integrated circuit chip is finely processed, and there is a possibility that a flaw or the like may occur during transportation or storage, thereby causing a problem. Regarding this problem, one surface (the lower surface in the figure) of the integrated circuit chip 1 is protected by the package substrate 22, as shown in FIG. When the present invention is applied, the opposite surface (the upper surface in the drawing) of the integrated circuit chip 1 can be protected by a conductive metal plate indicated by reference numeral 3. By applying the present invention in this manner, the quality of CSP products can be easily maintained.

【0021】[0021]

【発明の実施の形態】以下、図を用いて本発明の実施の
形態を詳細に説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described below in detail with reference to the drawings.

【0022】図4は、本発明が適用された実施形態のC
SPの断面図である。
FIG. 4 is a diagram showing C of the embodiment to which the present invention is applied.
It is sectional drawing of SP.

【0023】この図は、前述した図2に対応させて描い
てある。これらの図を比較して明らかなように、図4の
本実施形態は、図2の従来例のCSPに対して新たに、
導電金属板3を設けている。この導電金属板3は、集積
回路チップ1の集積回路を作り込んだ面とは反対の面
に、半導体基板10に対して導電性がある状態で貼り付
けられている。
This figure is drawn corresponding to FIG. 2 described above. As is clear from comparison of these figures, the present embodiment of FIG. 4 is newly added to the conventional CSP of FIG.
A conductive metal plate 3 is provided. The conductive metal plate 3 is attached to the surface of the integrated circuit chip 1 opposite to the surface on which the integrated circuit is formed, in a state of being conductive with respect to the semiconductor substrate 10.

【0024】導電金属板3は、銅、アルミニウム、鉄、
その他の金属等の単体、あるいは合金で、導電性につい
て問題のないものを素材とする。例えば、半導体集積回
路のリードフレームにも使用されている、鉄及びニッケ
ルを主とした合金の「42Arroy」でもよい。
The conductive metal plate 3 is made of copper, aluminum, iron,
Other materials such as simple metals or alloys having no problem in conductivity are used as the material. For example, “42 Arrowy”, which is an alloy mainly containing iron and nickel, which is also used for a lead frame of a semiconductor integrated circuit may be used.

【0025】なお、導電金属板3の形状については、導
電性の確保のため、0.1mm以上の厚さであることが
好ましい。このような厚さを考慮すると、該導電金属板
3の形成は、蒸着形成よりも、貼り付け形成が製造上良
好である。この貼り付け形成による接合は、半導体基板
10に対して導電性がある状態でなされている。
The shape of the conductive metal plate 3 is preferably 0.1 mm or more in order to secure conductivity. In consideration of such a thickness, the formation of the conductive metal plate 3 is more preferably performed by bonding than by vapor deposition. The bonding by this bonding is performed in a state where the semiconductor substrate 10 is conductive.

【0026】又、このような貼り付け状態の品質や信頼
性の観点からは、半導体基板10の材質と、導電金属板
3の材質との熱膨張係数の隔差は少ない方がよい。好ま
しくは、導電金属板5の材質の熱膨張係数は、半導体基
板10の材質の熱膨張係数と同等とされる。例えば、導
電金属板3の材質を前述の「42Arroy」とすれ
ば、該導電金属板3とシリコン素材の半導体基板10と
の熱膨張係数は同等とされる。
In addition, from the viewpoint of the quality and reliability of such an attached state, it is preferable that the difference in the coefficient of thermal expansion between the material of the semiconductor substrate 10 and the material of the conductive metal plate 3 is small. Preferably, the coefficient of thermal expansion of the material of the conductive metal plate 5 is equal to the coefficient of thermal expansion of the material of the semiconductor substrate 10. For example, if the material of the conductive metal plate 3 is “42 Arrowy”, the coefficient of thermal expansion between the conductive metal plate 3 and the semiconductor substrate 10 made of a silicon material is equivalent.

【0027】ここで図5の符号A及び符号Bのハンダバ
ンプ16間に電流を流した場合の、集積回路チップ1の
半導体基板10に生じる電位差を考える。この場合、符
号A及び符号Bのハンダバンプ16間における集積回路
チップ1の断面は、図6の通りである。
Here, consider a potential difference generated in the semiconductor substrate 10 of the integrated circuit chip 1 when a current flows between the solder bumps 16 of the reference numerals A and B in FIG. In this case, the cross section of the integrated circuit chip 1 between the solder bumps 16 of the reference numerals A and B is as shown in FIG.

【0028】まず、従来、導電金属板3がない場合、符
号A及び符号Bのハンダバンプ16間の電流は、半導体
基板10に流れる。該電流に対する電気抵抗は、半導体
基板10の導電率に依存し、大きい(小さくない)。
First, conventionally, when there is no conductive metal plate 3, the current between the solder bumps 16 of the reference numerals A and B flows through the semiconductor substrate 10. The electric resistance to the current depends on the conductivity of the semiconductor substrate 10 and is large (not small).

【0029】一方、本実施形態の場合で、導電金属板3
がある場合には、符号Aのハンダバンプ16と導電金属
板3との距離は、半導体基板10の厚さであり、極めて
短距離であり、該ハンダバンプ16と導電金属板3との
間の電気抵抗は小さい。更に、符号Bのハンダバンプ1
6と導電金属板3との間についても同様である。又、符
号A及び符号Bのハンダバンプ16間の電流は、半導体
基板10に比べて導電率が良好な導電金属板3にほとん
ど流れ、半導体基板10には流れにくい。
On the other hand, in the case of the present embodiment, the conductive metal plate 3
In this case, the distance between the solder bump 16 of symbol A and the conductive metal plate 3 is the thickness of the semiconductor substrate 10 and is extremely short, and the electrical resistance between the solder bump 16 and the conductive metal plate 3 is small. Is small. Furthermore, the solder bump 1 of the code B
The same applies to the space between the conductive metal plate 6 and the conductive metal plate 3. Further, the current between the solder bumps 16 of the reference numerals A and B almost flows to the conductive metal plate 3 having a higher conductivity than the semiconductor substrate 10, and hardly flows to the semiconductor substrate 10.

【0030】以上から、これらハンダバンプ16間の電
流に対する電気抵抗はほぼ導電金属板3の導電率にのみ
依存し、比較的小さい。又、半導体基板10に流れる電
流は少ない。従って、該半導体基板10内に生じる電位
差は、導電金属板3がない上記の従来例に比べ少ない。
As described above, the electric resistance to the current between the solder bumps 16 depends only on the conductivity of the conductive metal plate 3 and is relatively small. Further, the current flowing through the semiconductor substrate 10 is small. Therefore, the potential difference generated in the semiconductor substrate 10 is smaller than in the above-described conventional example in which the conductive metal plate 3 is not provided.

【0031】このように本実施形態では、上記のよう
に、まず内的要因によって電流が流れる場合にも、半導
体基板10に電流が流れにくくなる。又、何らかの外乱
によっても、半導体基板10に電流が流れにくくなり、
不用意に半導体基板10に電位差が生じて電位分布が発
生してしまいにくくなる。又、電界や磁界等の外的影響
に対して該導電金属板は、シールド作用をなし、該外的
影響が引き起こす問題を低減することができる。
As described above, in the present embodiment, as described above, even when the current first flows due to an internal factor, the current hardly flows through the semiconductor substrate 10. Also, due to some disturbance, it becomes difficult for the current to flow through the semiconductor substrate 10,
A potential difference is inadvertently generated in the semiconductor substrate 10 and a potential distribution is less likely to occur. Further, the conductive metal plate has a shielding effect against external influences such as an electric field and a magnetic field, so that problems caused by the external influences can be reduced.

【0032】このように本実施形態によれば、本発明を
効果的に適用することができ、ノイズ耐性及びラッチア
ップ耐性を向上することができる。
As described above, according to the present embodiment, the present invention can be effectively applied, and noise resistance and latch-up resistance can be improved.

【0033】[0033]

【発明の効果】本発明によれば、ノイズ耐性及びラッチ
アップ耐性を向上することができる。
According to the present invention, noise resistance and latch-up resistance can be improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】従来のフリップ型CSPの集積回路チップの断
面図
FIG. 1 is a cross-sectional view of a conventional flip-type CSP integrated circuit chip.

【図2】上記集積回路チップをCSPとして構成した場
合の断面図
FIG. 2 is a cross-sectional view when the integrated circuit chip is configured as a CSP.

【図3】従来の非フリップ型CSPの断面図FIG. 3 is a sectional view of a conventional non-flip type CSP.

【図4】本発明が適用された実施形態のフリップ型CS
Pの断面図
FIG. 4 is a flip type CS according to an embodiment to which the present invention is applied;
Sectional view of P

【図5】フリップ型CSPで集積回路チップ1に電流を
流す場合の状況を示す平面図
FIG. 5 is a plan view showing a situation in which a current flows through the integrated circuit chip 1 in a flip-type CSP.

【図6】上記の状況でのフリップ型CSPの断面図FIG. 6 is a cross-sectional view of the flip-type CSP in the above situation.

【符号の説明】[Explanation of symbols]

1…集積回路チップ 3…導電金属板 5…ユーザ回路基板 10…半導体基板 12…絶縁層 14…引出し配線層 16…ハンダバンプ 22…パッケージ基板 24…ハンダボール 32…テープ基板 34…ハンダボール 36…ボンディングワイヤ DESCRIPTION OF SYMBOLS 1 ... Integrated circuit chip 3 ... Conductive metal plate 5 ... User circuit board 10 ... Semiconductor substrate 12 ... Insulating layer 14 ... Lead-out wiring layer 16 ... Solder bump 22 ... Package board 24 ... Solder ball 32 ... Tape board 34 ... Solder ball 36 ... Bonding Wire

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】半導体基板に配線層を順次積層する等して
集積回路が作り込まれた集積回路チップを、ユーザの回
路を作り込む基板に実装すると該集積回路チップは集積
回路が作り込まれている面が下側になるように、パッケ
ージ基板に搭載して構成された半導体集積回路におい
て、 前記集積回路チップの前記集積回路を作り込んだ面とは
反対の面に、前記半導体基板に対して導電性がある状態
で、導電金属板を貼り付けるようにしたことを特徴とす
る半導体集積回路。
When an integrated circuit chip on which an integrated circuit is formed by, for example, sequentially laminating wiring layers on a semiconductor substrate is mounted on a substrate on which a circuit of a user is formed, the integrated circuit chip is formed with the integrated circuit. A semiconductor integrated circuit mounted on a package substrate so that the surface of the integrated circuit chip is located on the lower side, with respect to the surface of the integrated circuit chip opposite to the surface on which the integrated circuit is formed. A semiconductor integrated circuit, wherein a conductive metal plate is adhered in a state of being conductive.
【請求項2】請求項1において、前記導電金属板は、 その熱膨張係数が前記半導体基板と同等とされ、 その厚さが0.1mm以上とされたことを特徴とする半
導体集積回路。
2. The semiconductor integrated circuit according to claim 1, wherein said conductive metal plate has a thermal expansion coefficient equal to that of said semiconductor substrate and a thickness of 0.1 mm or more.
JP9339807A 1997-12-10 1997-12-10 Semiconductor integrated circuit Pending JPH11176978A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9339807A JPH11176978A (en) 1997-12-10 1997-12-10 Semiconductor integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9339807A JPH11176978A (en) 1997-12-10 1997-12-10 Semiconductor integrated circuit

Publications (1)

Publication Number Publication Date
JPH11176978A true JPH11176978A (en) 1999-07-02

Family

ID=18331008

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9339807A Pending JPH11176978A (en) 1997-12-10 1997-12-10 Semiconductor integrated circuit

Country Status (1)

Country Link
JP (1) JPH11176978A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8085545B2 (en) 2008-05-21 2011-12-27 Samsung Electronics Co., Ltd. Structure for blocking an electromagnetic interference, wafer level package and printed circuit board having the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8085545B2 (en) 2008-05-21 2011-12-27 Samsung Electronics Co., Ltd. Structure for blocking an electromagnetic interference, wafer level package and printed circuit board having the same

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