JPH11169865A - Treatment of hydrogen peroxide containing waste water and device therefor - Google Patents

Abstract

PROBLEM TO BE SOLVED: To restrain use of an oxidizing/reducing agent which is environment load material, heating, and radiation of a lot of energy called as ultraviolet radiation and to make harmless the unreacted silicon sludge that needs to treating as ordinary industrial waste when decomposing hydrogen peroxide in waste water. SOLUTION: After hydrogen peroxide containing waste water is introduced into a pH adjusting tank 1 to adjusts it to alkalinity from neutral, unreacted silicon sludge is added in a hydrogen peroxide decomposition tank 2 to decompose hydrogen peroxide in liquid into water by hydrogen and electrons formed by reaction of unreacted silicon and hydroxide ions, and the waste water is separated into treated water and unreacted silicon sludge in a solid-liquid separation mechanism 3 and only the treated water is discharged. On the other hand, the separated unreacted silicon sludge is returned to the hydrogen peroxide decomposition tank 2 by a returning mechanism 4 and is repeatedly used for decomposition of hydrogen peroxide.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for treating wastewater containing hydrogen peroxide, and more particularly, to a method for removing hydrogen peroxide from water or water with respect to a relatively concentrated wastewater containing hydrogen peroxide of about several hundred mg / l. The present invention relates to a method and apparatus for decomposing oxygen to make it harmless.

[0002]

2. Description of the Related Art Generally, as a method for decomposing hydrogen peroxide in wastewater, a metal as an electron donor, catalase and peroxidase as hydrogen peroxide decomposing enzymes, and sodium hydrogen sulfite as a reducing agent are added to the wastewater. Method (for example, JP-A-60-163434, JP-A-9-11)
No. 7763, Japanese Patent Publication No. 7-22752, Japanese Patent Publication No. 7-83819), or a method of decomposing hydrogen peroxide into water and oxygen by heating or irradiating with ultraviolet rays.

[0003] By the way, in order to treat a relatively concentrated waste water containing hydrogen peroxide of several hundred mg / l or more, heating or irradiation with ultraviolet light, addition of a metal as an electron donor, activated carbon or the like, and sulfurous acid as a reducing agent A reduction method using sodium hydrogen or the like, or a treatment method combining these methods is generally used.

A method for treating a relatively concentrated waste water containing hydrogen peroxide of several hundred mg / l or more will be described with reference to FIGS.

In the processing method shown in FIG.
And a hydrogen peroxide decomposing tank 32 and a reducing agent treatment tank 33 are arranged in accordance with the processing order. First, in the pH adjustment tank 31, a pH adjusting agent (NaO
The pH is adjusted from neutral to alkaline by adding H). Next, hydrogen peroxide is decomposed into water and oxygen by adding a reducing agent (sodium hydrogen sulfite) in the hydrogen peroxide decomposing tank 32. Finally, reducing agent treatment tank 3
In 3, the residual excess reducing agent was treated by adding an oxidizing agent (NaClO).

In the processing method shown in FIG.
And a first hydrogen peroxide decomposing tank 42 and a second reducing agent processing tank 44 are arranged in accordance with the processing order.
The pH is adjusted from neutral to alkaline by adding a pH adjusting agent (NaOH) to the hydrogen peroxide-containing wastewater in the H adjusting tank 41. Next, in the hydrogen peroxide decomposing tank 42, heating is performed by the heater 43, and then the second reducing agent processing tank 44
In this method, ultraviolet rays were irradiated from an ultraviolet lamp 44 to decompose hydrogen peroxide into water and oxygen.

[0007]

However, the processing method shown in FIG. 4 has a problem that a large amount of a chemical such as a redox agent must be used.

[0008] The reason is that in order to sufficiently decompose hydrogen peroxide, it is necessary to add an excess of a stable reducing agent to the hydrogen peroxide in an amount equal to or greater than that of the hydrogen peroxide. This is because an oxidizing agent is required to process the fraction.

Further, the processing method shown in FIG. 5 has a problem that a large amount of energy is required for decomposing hydrogen peroxide, that is, heating by a heater and irradiation of ultraviolet rays by an ultraviolet lamp.

The reason is that the decomposition of hydrogen peroxide requires a sufficient temperature rise close to the boiling point of water, and the light absorption band of hydrogen peroxide is a high energy band in the ultraviolet region. This is because a large amount of energy is required for generating ultraviolet rays and ultraviolet rays.

An object of the present invention is to provide a method and an apparatus for treating hydrogen peroxide-containing wastewater without using a large amount of energy or using a redox agent that is an environmentally harmful substance. .

[0012]

In order to achieve the above object, a method for treating hydrogen peroxide-containing wastewater according to the present invention comprises adding hydrogen and electrons to hydrogen peroxide contained in wastewater to remove the hydrogen peroxide. A method for treating hydrogen peroxide-containing wastewater that is rendered harmless as water, comprising adding unreacted silicon sludge generated during the production of silicon semiconductor to the hydrogen peroxide-containing wastewater, and converting the unreacted silicon sludge and hydroxyl ions into water. Hydrogen peroxide is decomposed into water by hydrogen and electrons generated by the reaction.

In addition, when adding the unreacted silicon sludge to the hydrogen peroxide-containing wastewater, the pH of the hydrogen peroxide-containing wastewater is adjusted to be alkaline, so that the silicon oxide present on the surface of the unreacted silicon sludge is adjusted. Dissolves the film and increases the reaction rate between unreacted silicon and hydroxyl ions contained in unreacted silicon sludge to increase the production of hydrogen and electrons, thereby improving the processing rate of hydrogen peroxide. is there.

In addition, when unreacted silicon sludge is added to the hydrogen peroxide-containing wastewater, and when hydrogen peroxide is treated with hydrogen and electrons generated by the reaction of the unreacted silicon sludge with hydroxyl ions, the unreacted silicon sludge is used. Is completely consumed to convert all the unreacted silicon into silicon oxide, thereby rendering the unreacted silicon sludge that generates hydrogen gas by reacting with moisture harmless.

Further, the apparatus for treating hydrogen peroxide-containing wastewater according to the present invention has a sludge addition mechanism and a decomposition mechanism,
A hydrogen peroxide-containing wastewater treatment apparatus for adding hydrogen and electrons to hydrogen peroxide contained in wastewater and detoxifying the hydrogen peroxide as water, wherein the sludge addition mechanism is produced in accordance with the production of silicon semiconductors. And performing a process of adding unreacted silicon sludge to the hydrogen peroxide-containing wastewater.The decomposition mechanism converts hydrogen peroxide into water by hydrogen and electrons generated by a reaction between unreacted silicon sludge and hydroxyl ions. This is a process for decomposing into.

In addition, the apparatus has a pH adjusting mechanism, which adjusts the pH of the hydrogen peroxide-containing wastewater to alkaline when adding the unreacted silicon sludge to the hydrogen peroxide-containing wastewater. , By the pH adjusting mechanism,
When the unreacted silicon sludge is added to the hydrogen peroxide-containing wastewater, the pH of the hydrogen peroxide-containing wastewater is adjusted to alkaline, thereby dissolving the silicon oxide film present on the surface of the unreacted silicon sludge. By increasing the reaction rate between unreacted silicon and hydroxyl ions contained in the reactive silicon sludge and increasing the amount of generated hydrogen and electrons, the processing rate of hydrogen peroxide is improved.

Further, a pH adjusting mechanism is provided, by which unreacted silicon sludge is added to the hydrogen peroxide-containing wastewater, the hydrogen peroxide-containing wastewater is adjusted to be strongly alkaline, and all unreacted silicon is removed. Silicon oxide is used to detoxify unreacted silicon sludge that generates hydrogen gas by reaction with moisture.

Further, the apparatus has a solid-liquid separation mechanism and a transfer mechanism. The solid-liquid separation mechanism separates treated water and unreacted silicon sludge and discharges only the treated water. Recovering the separated unreacted silicon sludge and returning it to the sludge addition mechanism, adding unreacted silicon sludge to the hydrogen peroxide-containing wastewater,
When treating hydrogen peroxide with hydrogen and electrons generated by the reaction of the unreacted silicon sludge and hydroxyl ions, the unreacted silicon sludge separated by the solid-liquid separation mechanism is recovered and collected by the transport mechanism. The unreacted silicon sludge, which is returned to the sludge addition mechanism and completely consumes the unreacted silicon contained in the unreacted silicon sludge, is converted into silicon oxide, and hydrogen gas is generated by the reaction with moisture. It becomes something.

According to the present invention, unreacted silicon sludge is reacted with hydroxyl ions to generate silicon oxide, hydrogen and electrons. Normally, the generated hydrogen is bonded to each other and released as a hydrogen gas from a liquid phase to a gas phase. However, if hydrogen peroxide is present in the liquid, it reacts with the hydrogen peroxide to generate water. Specifically, the reaction between unreacted silicon in unreacted silicon sludge and hydrogen ions changes depending on the pH value, and the reaction is more likely to occur as the pH is increased by adding a large amount of an alkaline agent. This is because the reaction rate depends on the concentration of the reacting substance, and the silicon oxide layer present on the surface of the unreacted silicon sludge is etched with alkali, increasing the chance of reaction between unreacted silicon and hydroxyl ions. It is.

[0020]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described below with reference to the drawings.

(Embodiment 1) FIG. 1 is a processing flow configuration diagram showing an apparatus for treating hydrogen peroxide-containing wastewater according to Embodiment 1 of the present invention.

As shown in the figure, the treatment apparatus for wastewater containing hydrogen peroxide according to the present invention basically has a sludge addition mechanism and a decomposition mechanism, and the hydrogen peroxide contained in the wastewater contains hydrogen. Electrons are added to render hydrogen peroxide harmless as water. In FIG. 1, a sludge adding mechanism and a decomposition mechanism are integrated to constitute a hydrogen peroxide decomposition tank 2.

The sludge adding mechanism performs a process of adding unreacted silicon sludge generated during the production of silicon semiconductor to the hydrogen peroxide-containing wastewater. The decomposition mechanism includes an unreacted silicon sludge and water. In this process, hydrogen peroxide is decomposed into water by hydrogen and electrons generated by the reaction of acid ions.

In the present invention, in order to treat the wastewater containing hydrogen peroxide, unreacted silicon sludge generated during the production of silicon semiconductor in the sludge addition mechanism is added to the wastewater containing hydrogen peroxide. In the above, hydrogen peroxide is decomposed into water by hydrogen and electrons generated by the reaction between unreacted silicon sludge and hydroxyl ions, and the treated water is drained.

In the present invention, a pH adjusting mechanism 1 may be added. The pH adjusting mechanism 1 adjusts the pH of the hydrogen peroxide-containing wastewater to alkaline when adding the unreacted silicon sludge to the hydrogen peroxide-containing wastewater.

In the present invention, in order to treat the wastewater containing hydrogen peroxide by adding the pH adjusting mechanism 1, the pH adjusting mechanism 1 is used.
Thus, when the unreacted silicon sludge is added to the hydrogen peroxide-containing wastewater, the pH of the hydrogen peroxide-containing wastewater is adjusted to alkaline, thereby dissolving the silicon oxide film present on the surface of the unreacted silicon sludge. By increasing the rate of reaction between unreacted silicon and hydroxyl ions contained in unreacted silicon sludge and increasing the production of hydrogen and electrons, the processing speed of hydrogen peroxide is increased to perform the treatment.

In the present invention, in order to treat the hydrogen peroxide-containing wastewater by adding the pH adjusting mechanism 1, unreacted silicon sludge is added to the hydrogen peroxide-containing wastewater by the pH adjusting mechanism 1, and The hydrogen-containing wastewater may be adjusted to be highly alkaline, all unreacted silicon may be converted into silicon oxide, and unreacted silicon sludge that generates hydrogen gas by reaction with moisture may be detoxified.

Further, in the present invention, a solid-liquid separation mechanism 3 and a transport mechanism 4 may be added. The solid-liquid separation mechanism 3 separates the treated water and unreacted silicon sludge and discharges only the treated water. The transport mechanism 5 collects the separated unreacted silicon sludge and returns it to the sludge addition mechanism. Things.

In the present invention, in order to treat the wastewater containing hydrogen peroxide by adding the solid-liquid separation mechanism 3 and the transport mechanism 4,
When adding unreacted silicon sludge to the hydrogen peroxide-containing wastewater, and treating hydrogen peroxide with hydrogen and electrons generated by the reaction of the unreacted silicon sludge and hydroxyl ions,
The unreacted silicon sludge separated by the solid-liquid separation mechanism 3 is collected and returned to the sludge adding mechanism by the transport mechanism 4 to completely consume the unreacted silicon contained in the unreacted silicon sludge. All silicon is converted to silicon oxide, and unreacted silicon sludge that generates hydrogen gas by reaction with moisture is treated so as to be harmless.

Next, a specific example of the present invention will be described as a first embodiment with reference to FIG. The apparatus for treating hydrogen peroxide-containing wastewater according to the first embodiment of the present invention shown in FIG.
, A hydrogen peroxide decomposition tank 2, a solid-liquid separation mechanism 3, and a return mechanism 4.

The pH adjustment tank 1 is used to store hydrogen peroxide-containing wastewater.
By adding an H adjuster (NaOH), the pH of the waste water containing hydrogen peroxide is adjusted from neutral to alkaline.

The hydrogen peroxide decomposing tank 2 is used for adding unreacted silicon sludge generated during the production of silicon semiconductor to hydrogen peroxide adjusted to alkaline, and for converting unreacted silicon sludge to hydrogen peroxide adjusted to alkaline. Hydrogen peroxide in the liquid is decomposed by hydrogen and electrons generated by the reaction of unreacted silicon sludge and hydroxyl ions with the addition of sludge.

The solid-liquid separation mechanism 3 separates waste water from the hydrogen peroxide decomposition tank 2 into treated water and unreacted silicon sludge,
Only treated water is discharged.

The return mechanism 4 collects unreacted silicon sludge separated by the solid-liquid separation mechanism 3 and returns it to the hydrogen peroxide decomposition tank 2.

Next, a method for treating waste water containing hydrogen peroxide using the treatment apparatus shown in FIG. 1 will be described.

First, the wastewater containing hydrogen peroxide is introduced into the pH adjusting tank 1, and the pH of the wastewater containing hydrogen peroxide is adjusted from neutral to alkaline by adding a pH adjuster (NaOH) thereto.

Next, the pH-adjusted wastewater is introduced into a hydrogen peroxide decomposition tank 2 and decomposition treatment is performed by adding unreacted silicon sludge generated during the production of silicon semiconductors thereto. Unreacted silicon sludge reacts with hydroxyl ions when in liquid to produce silicon oxide, hydrogen and electrons. Usually, the generated hydrogen is bonded to each other and released as a hydrogen gas from a liquid phase to a gas phase. However, if hydrogen peroxide is present in the liquid, it reacts with the hydrogen peroxide to generate water. Specifically, the reaction between unreacted silicon and hydroxyl ions in unreacted silicon sludge changes depending on the pH value,
The reaction is more likely to occur as the pH is increased by adding a large amount of an alkaline agent. This is because the reaction rate depends on the concentration of the reacting substance, and the layer of silicon oxide present on the surface of the unreacted silicon sludge is etched with alkali, increasing the chance that unreacted silicon reacts with hydroxyl ions. That's why.

Next, the waste water that has been solid-liquid separated in the hydrogen peroxide decomposition tank 2 is introduced into the solid-liquid separation mechanism 3, where it is separated into treated water and unreacted silicon sludge, and the treated water is discharged.

On the other hand, the separated unreacted silicon sludge is recovered, returned to the hydrogen peroxide decomposition tank 2 by the return mechanism 4, and the recovered unreacted silicon sludge is reused.

(Embodiment 2) FIG. 2 is a processing flow configuration diagram showing Embodiment 2 of the present invention.

A second embodiment of the present invention shown in FIG. 2 is an improvement of the first embodiment. In the second embodiment, a membrane separation device 13 and a storage tank 14 are installed as the solid-liquid separation mechanism 3 of the first embodiment. is there.

A hydrogen peroxide measuring tank 10 is provided, and OR
The P-total 9 measures the concentration of hydrogen peroxide in the wastewater containing hydrogen peroxide.

That is, a hydrogen peroxide measuring tank 10 for measuring the concentration of hydrogen peroxide contained in the waste water containing hydrogen peroxide with the ORP meter 9, a pH adjusting tank 11 for adjusting the pH of the waste water containing hydrogen peroxide, A hydrogen peroxide decomposition tank 12 for decomposing hydrogen peroxide by adding silicon sludge, a membrane separation device 13 for separating treated water after decomposing hydrogen peroxide and unreacted silicon sludge, and a separated unreacted silicon sludge And a return pump 15 for returning unreacted silicon sludge to the hydrogen peroxide decomposition tank 12.

The concentration of hydrogen peroxide is about 300 to 400 mg
/ L of wastewater is measured by the ORP meter 9 in the hydrogen peroxide measuring tank 10 and the pH adjusting tank 11
To adjust the pH of the hydrogen peroxide-containing wastewater to alkaline, and introduce it into the hydrogen peroxide decomposition tank 12.
Hydrogen peroxide is decomposed into water by hydrogen and electrons generated from unreacted silicon sludge previously added to the hydrogen peroxide decomposition tank 12 in excess of hydrogen peroxide. Next, the treated water is separated into unreacted silicon sludge and water by the membrane separation device 13, and the water is discharged.

On the other hand, unreacted silicon sludge is adjusted from neutral to weakly acidic in order to suppress the reaction.
And returned to the hydrogen peroxide decomposition tank 12 by the return pump 15 for repeated use.

(Embodiment 3) FIG. 3 is a processing flow configuration diagram showing Embodiment 3 of the present invention. Embodiment 3 of the present invention shown in FIG. 3 is a hydrogen peroxide measuring tank 20 for measuring the concentration of hydrogen peroxide contained in the wastewater containing hydrogen peroxide with the ORP meter 19.
And a pH adjusting tank 2 for adjusting the pH of the waste water containing hydrogen peroxide
1, a hydrogen peroxide decomposition tank 22 for decomposing hydrogen peroxide by adding unreacted silicon sludge, a membrane separation device 23 for separating treated water after decomposing hydrogen peroxide and unreacted silicon sludge, And a recovery tank 24.

In the third embodiment of the present invention, the pH adjusting tank 21
The pH of the wastewater containing hydrogen peroxide is adjusted to be strongly alkaline with
Unreacted silicon sludge is completely consumed in the hydrogen peroxide decomposition tank 22.

In the third embodiment of the present invention, the unreacted silicon sludge in the wastewater discharged from the hydrogen peroxide decomposition tank 22 is harmless by completely consuming the unreacted silicon sludge in the hydrogen peroxide decomposition tank 22. In the membrane separation device 23, unreacted silicon sludge is recovered as harmless silicon oxide, and the treated water is drained.

Therefore, according to the third embodiment of the present invention, the unreacted silicon sludge can be collected and disposed as harmless silicon oxide, and the unreacted silicon sludge is returned to the hydrogen peroxide decomposition tank for processing. There is an advantage that a mechanism is not required and the configuration for processing can be simplified.

[0050]

As described above, according to the present invention, by collecting and reusing unreacted silicon sludge, hydrogen peroxide is generated by the reaction between silicon and hydroxide ions to convert hydrogen peroxide into water. The decomposition of hydrogen peroxide does not require a large amount of energy such as a redox agent, heating, or irradiation with ultraviolet light to decompose hydrogen peroxide. it can.

When the unreacted silicon sludge is used for decomposing hydrogen peroxide, it is made strongly alkaline to dissolve the silicon oxide on the surface of the unreacted silicon sludge and to promote the reaction between the unreacted silicon sludge and hydroxyl ions. In addition, unreacted silicon can be converted into harmless silicon oxide, and the treatment of unreacted silicon sludge, which is usually treated as industrial waste, can be eliminated.

[Brief description of the drawings]

FIG. 1 is a processing flow configuration diagram showing a first embodiment of the present invention.

FIG. 2 is a processing flow configuration diagram showing Embodiment 2 of the present invention.

FIG. 3 is a processing flow configuration diagram showing a third embodiment of the present invention.

FIG. 4 is a flowchart showing a conventional method for treating fluorine-containing wastewater.

FIG. 5 is a flowchart showing a conventional method for treating fluorine-containing wastewater.

[Explanation of symbols]

 Reference Signs List 1 pH adjustment tank 2 Hydrogen peroxide decomposition tank 3 Solid-liquid separation mechanism 4 Return mechanism 9 ORP meter 10 Hydrogen peroxide measurement tank 11 pH adjustment tank 12 Hydrogen peroxide decomposition tank 13 Membrane separator 14 Storage tank 15 Return pump 19 ORP meter Reference Signs List 20 Hydrogen peroxide measurement tank 21 pH adjustment tank 22 Hydrogen peroxide decomposition tank 23 Membrane separation device 24 Sludge collection tank

Claims (7)

[Claims] 1. A method for treating hydrogen peroxide-containing wastewater in which hydrogen and electrons are added to hydrogen peroxide contained in the wastewater to detoxify the hydrogen peroxide as water, the method being produced with the production of silicon semiconductors. Hydrogen peroxide, wherein unreacted silicon sludge is added to the hydrogen peroxide-containing wastewater, and hydrogen peroxide is decomposed into water by hydrogen and electrons generated by the reaction of the unreacted silicon sludge with hydroxyl ions. Wastewater treatment method. 2. The method according to claim 1, wherein said unreacted silicon sludge is added to said hydrogen peroxide-containing wastewater.
By adjusting H to alkaline, the silicon oxide film present on the surface of the unreacted silicon sludge is dissolved,
The hydrogen peroxide treatment rate is improved by increasing the reaction rate between unreacted silicon and hydroxyl ions contained in unreacted silicon sludge to increase the amount of hydrogen and electrons generated. The method for treating wastewater containing hydrogen peroxide according to claim 1. 3. An unreacted silicon sludge is added to the hydrogen peroxide-containing wastewater when hydrogen peroxide is treated by hydrogen and electrons generated by the reaction of the unreacted silicon sludge with hydroxyl ions. Completely converting all unreacted silicon into silicon oxide and detoxifying unreacted silicon sludge which generates hydrogen gas by reaction with moisture by completely consuming the unreacted silicon contained in the water. The method for treating hydrogen peroxide-containing wastewater according to claim 1. 4. An apparatus for treating hydrogen peroxide-containing wastewater, comprising a sludge addition mechanism and a decomposition mechanism, wherein hydrogen and electrons are added to hydrogen peroxide contained in the wastewater to detoxify the hydrogen peroxide as water. The sludge addition mechanism performs a process of adding unreacted silicon sludge generated during the production of silicon semiconductor to the hydrogen peroxide-containing wastewater.The decomposition mechanism includes an unreacted silicon sludge and water. An apparatus for treating hydrogen peroxide-containing wastewater, which performs a process of decomposing hydrogen peroxide into water using hydrogen and electrons generated by the reaction of acid ions. 5. A pH adjusting mechanism for adjusting the pH of the hydrogen peroxide-containing wastewater to alkaline when adding the unreacted silicon sludge to the hydrogen peroxide-containing wastewater. When the unreacted silicon sludge is added to the hydrogen peroxide-containing wastewater by the pH adjustment mechanism, the pH of the hydrogen peroxide-containing wastewater is adjusted to be alkaline, whereby the silicon present on the surface of the unreacted silicon sludge Dissolves oxide film and increases the rate of reaction between unreacted silicon and hydroxyl ions contained in unreacted silicon sludge to increase the production of hydrogen and electrons, thereby improving the processing rate of hydrogen peroxide. The apparatus for treating hydrogen peroxide-containing wastewater according to claim 4, wherein: 6. A pH adjusting mechanism, wherein unreacted silicon sludge is added to the hydrogen peroxide-containing wastewater, the hydrogen peroxide-containing wastewater is adjusted to be strongly alkaline, and all unreacted silicon is removed. The apparatus for treating hydrogen peroxide-containing wastewater according to claim 4, wherein the apparatus is used to detoxify unreacted silicon sludge, which is silicon oxide and generates hydrogen gas by reacting with moisture. 7. A solid-liquid separation mechanism having a solid-liquid separation mechanism and a transfer mechanism, wherein the solid-liquid separation mechanism separates treated water and unreacted silicon sludge, and discharges only the treated water. Recovering the separated unreacted silicon sludge and returning it to the sludge adding mechanism, adding unreacted silicon sludge to the hydrogen peroxide-containing wastewater, and generating the unreacted silicon sludge by reacting with hydroxyl ions. When processing hydrogen peroxide with hydrogen and electrons,
The unreacted silicon sludge separated by the solid-liquid separation mechanism is collected and returned to the sludge adding mechanism by the transport mechanism, and the unreacted silicon contained in the unreacted silicon sludge is completely consumed, so that the unreacted silicon sludge is completely consumed. The method for treating wastewater containing hydrogen peroxide according to claim 4 or 5, wherein all the silicon is made of silicon oxide, and the unreacted silicon sludge that generates hydrogen gas by reacting with moisture is made harmless. .