JPH1116115A - Manufacture of magnetic head - Google Patents
Manufacture of magnetic headInfo
- Publication number
- JPH1116115A JPH1116115A JP16373397A JP16373397A JPH1116115A JP H1116115 A JPH1116115 A JP H1116115A JP 16373397 A JP16373397 A JP 16373397A JP 16373397 A JP16373397 A JP 16373397A JP H1116115 A JPH1116115 A JP H1116115A
- Authority
- JP
- Japan
- Prior art keywords
- slider
- magnetic head
- polishing
- grinding
- floating surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/048—Lapping machines or devices; Accessories designed for working plane surfaces of sliders and magnetic heads of hard disc drives or the like
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Magnetic Heads (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、磁気ディスク装置
用の浮上型または接触型磁気ヘッドの製法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a floating or contact type magnetic head for a magnetic disk drive.
【0002】[0002]
【従来の技術】外部記憶装置の一種である磁気ディスク
装置は、図3のように回転する円盤状の磁気ディスク2
に磁気ヘッド(スライダー)1で情報の書き込み・読み
込みを磁気的に行うものである。2. Description of the Related Art A magnetic disk device, which is a kind of external storage device, has a rotating magnetic disk 2 as shown in FIG.
The magnetic head (slider) 1 magnetically writes and reads information.
【0003】磁気ヘッドは、セラミック製で端部に磁気
信号を記録する素子、再生する素子を搭載している。磁
気ディスク装置において磁気ディスクと磁気ヘッドは、
数十m/s以上の速度で相対運動している。このとき、
磁気ディスクに対して磁気ヘッドが気体の動圧を受けて
浮上しているものを浮上型、接触したまま摺動するもの
を接触型という。The magnetic head is made of ceramic and has an element for recording a magnetic signal and an element for reproducing a magnetic signal at its end. In a magnetic disk drive, a magnetic disk and a magnetic head are
Relative motion at a speed of several tens m / s or more. At this time,
A magnetic head that floats on a magnetic disk by receiving the dynamic pressure of a gas is called a floating type, and a magnetic head that slides while in contact is called a contact type.
【0004】ここで磁気ディスクに対向する面7である
浮上面の形状を正確に形成する必要がある。なぜなら、
その形状のばらつきによって浮上特性が変化したり、耐
摩耗性が劣化したりするからである。ここで浮上面7の
形状を正確に形成するには、チップ切断を行ったあとの
スライダーを1個づつで研磨加工を行う必要性がある。
なぜなら、チップ切断によって浮上面の形状が変化する
ことがあるという問題や、スライダーが連なった状態で
は、連なった方向に曲率をつけて研磨することが難しい
からである。従来、このような工程は、治具に接着材ま
たは粘着シート・接着シート8などで固定して行われて
いた。図5のように弾性体の粘着力で保持して浮上面を
加工する方法は、例えば、特開平4−358378号公
報に例示されている。Here, it is necessary to accurately form the shape of the air bearing surface which is the surface 7 facing the magnetic disk. Because
This is because the flying characteristics change and the wear resistance deteriorates due to the variation in the shape. Here, in order to accurately form the shape of the air bearing surface 7, it is necessary to perform the polishing process with one slider after the chip is cut.
This is because the shape of the air bearing surface may change due to chip cutting, and it is difficult to grind the connecting surface in a continuous direction with a curvature in a connected direction. Conventionally, such a process has been performed by fixing to a jig with an adhesive or an adhesive sheet / adhesive sheet 8 or the like. As shown in FIG. 5, a method of processing the air bearing surface while holding it with the adhesive force of an elastic body is exemplified in, for example, Japanese Patent Application Laid-Open No. 4-358378.
【0005】[0005]
【発明が解決しようとする課題】しかし、特開平4−3
58378号公報に記載されている方法では、接着材が
スライダーに付着して取り除きにくく、スライダー汚染
の問題がある。この工程は、加工の最終工程であること
があり、残渣が残ることは歩留まりの低下につながる。
さらにホットメルト系接着剤では加熱が必要であり、熱
に弱い読み取り素子が破壊される可能性がある。また接
着材によってスライダーが変形を受け、剥離後に所望の
浮上面を得られない問題がある。However, Japanese Patent Laid-Open Publication No.
In the method described in Japanese Patent No. 58378, the adhesive adheres to the slider and is difficult to remove, and there is a problem of slider contamination. This step may be the last step of the processing, and the remaining residue leads to a decrease in yield.
Further, the hot-melt adhesive requires heating, and the heat-sensitive read element may be destroyed. Further, there is a problem that the slider is deformed by the adhesive and a desired air bearing surface cannot be obtained after peeling.
【0006】このような条件を満たし、かつ研磨液に対
して耐食性のある接着剤を選定することは難しい。弾性
体による方法では、研磨荷重が均一に付加されにくく、
研磨量が各スライダーごとにばらつくため安定しない。
ホットメルト系接着剤では加熱が必要であり、熱に弱い
読み取り素子が破壊される可能性がある。また接着材に
よってスライダーが変形を受け、剥離後に所望の浮上面
を得られない問題がある。さらにスライダーのサイズ
は、年々小さくなってきており、スライダー単位でのハ
ンドリングが手作業では困難となり自動化・機械化が必
要であるが、従来、接着方法では機械化が難しく隘路に
なっている。[0006] It is difficult to select an adhesive that satisfies these conditions and has corrosion resistance to the polishing liquid. With the method using an elastic body, it is difficult to uniformly apply a polishing load,
The polishing amount is not stable because it varies for each slider.
Hot-melt adhesives require heating, and the reading elements that are sensitive to heat may be destroyed. Further, there is a problem that the slider is deformed by the adhesive and a desired air bearing surface cannot be obtained after peeling. Furthermore, the size of the slider has been decreasing year by year, and handling by the slider unit is difficult by manual work, and automation and mechanization are required.
【0007】自動化・機械化を行うための方法として特
開平3−256667号公報に記載されている方法があ
るが、研磨圧の加圧に弾性体を用いているので、前述と
同様の問題が発生する。As a method for performing automation and mechanization, there is a method described in JP-A-3-256667. However, since an elastic body is used for pressing the polishing pressure, the same problem as described above occurs. I do.
【0008】本発明の目的は、流体の加圧によって研磨
を行うことによって、接着工程を省くことにより上記の
問題を解決することにある。また流体の圧力は、それぞ
れのスライダーに対して均等にすることができるので、
研磨量のばらつきも小さい加工方法の提供にある。[0008] It is an object of the present invention to solve the above-mentioned problem by eliminating the bonding step by performing polishing by pressurizing a fluid. Also, the fluid pressure can be equalized for each slider,
Another object of the present invention is to provide a processing method with a small variation in the polishing amount.
【0009】[0009]
【課題を解決するための手段】まず、加工すべき上記ス
ライダーをテンプレート11に入れて研磨加工の摺動方
向に対しては拘束し、研磨面に垂直な方向は自由に可動
する状態にする。そして加工すべき浮上面の裏側の面に
対して流体を適切な圧力分布になるように吹き付けるこ
とにより、研磨圧が発生し、研磨がそれに応じて進行す
る。First, the slider to be machined is placed in the template 11 and constrained in the sliding direction of the polishing process so that the slider is free to move in the direction perpendicular to the polishing surface. Then, a fluid is sprayed onto the surface on the back side of the floating surface to be processed so as to have an appropriate pressure distribution, so that a polishing pressure is generated, and the polishing proceeds accordingly.
【0010】このとき圧力の調整により、加工能率の調
整が可能である。また加工前や加工後については、流体
の圧力を減圧することによりスライダーを治具に保持し
て前後工程との移送が容易である。またスライダーが小
さくなるにつれて、粘着力を利用した保持方法は接着す
る面積が小さくなるため、外れやすくなるが、本発明の
方法では、テンプレート11に拘束されている為に、そ
のような問題が発生しにくい。また流体の圧力を制御す
ることにより、加工中に研磨圧を変化させることが可能
なため、加工量の調整や面の形状を制御可能である。At this time, the working efficiency can be adjusted by adjusting the pressure. Before and after processing, the slider is held in a jig by reducing the pressure of the fluid, and the transfer between the preceding and following steps is easy. Further, as the slider becomes smaller, the holding method using the adhesive force has a smaller area to be adhered and thus is more likely to come off. However, in the method of the present invention, such a problem occurs because the method is restricted by the template 11. Hard to do. In addition, since the polishing pressure can be changed during processing by controlling the pressure of the fluid, the processing amount can be adjusted and the surface shape can be controlled.
【0011】さらに加工時に流体が定常的に被加工物で
あるスライダーの近くを流れるため、研磨時に発生する
切粉を除去しやすくなる。特に加圧する上記流体として
研磨液・潤滑液を用いることが可能であり、このときに
は、加工点に研磨液・潤滑液が届きやすくなり、加工が
精度よく行われる。[0011] Further, since the fluid constantly flows near the slider, which is a workpiece, during processing, it is easy to remove chips generated during polishing. In particular, a polishing liquid or a lubricating liquid can be used as the fluid to be pressurized. In this case, the polishing liquid or the lubricating liquid can easily reach the processing point, and the processing is performed with high accuracy.
【0012】[0012]
【発明の実施の形態】本発明を、実施例に基づき図1〜
9を参照して説明する。BRIEF DESCRIPTION OF THE DRAWINGS FIG.
This will be described with reference to FIG.
【0013】(実施例1)研磨機上で研磨定盤6の表面を
ダイヤモンドバイトで1〜50μmの溝を螺旋状に形成
することの出来る修正装置を有し、軸剛性のしっかりし
ている空気軸受けに支えられた回転部をその質量に対し
て1.5〜4倍の慣性質量を有することが望まれる。ま
た、研磨定盤を取り付けたときにその外周の偏心は0.
1〜10μmになっているようにする必要がある。用い
る研磨定盤はしっかりした台座に固定されされており、
錫もしくはそれに0.1〜40%程度の異種金属を含む
合金でつくられている必要がある。異種金属としてはP
b、In,Cu、Fe、Ag、Sb、Zn,Bi等があ
る。(Embodiment 1) A correction device capable of forming a groove of 1 to 50 μm in a spiral shape on a surface of a polishing platen 6 with a diamond tool on a polishing machine is provided. It is desired that the rotating portion supported by the bearing has an inertial mass 1.5 to 4 times the mass of the rotating portion. Also, when the polishing platen is attached, the eccentricity of the outer periphery is 0.
It is necessary to make it 1 to 10 μm. The polishing platen to be used is fixed on a firm base,
It must be made of tin or an alloy containing about 0.1 to 40% of a dissimilar metal. P as a dissimilar metal
b, In, Cu, Fe, Ag, Sb, Zn, Bi and the like.
【0014】半径は修正リング4を定盤に載せたとき、
内周側と外周側で3〜20mmはみ出しているような大
きさがよい。溝の形成については修正リング4と接触す
る領域で1μm〜10μmの平坦性を有していなければ
ならない。ダイヤモンドバイトとしては先端Rが0.0
5〜2mmで先端角は30〜75度程度のものが良い。
定盤修正は修正装置で充分に不要なバリ・凹凸を除去し
た後、1μm〜50μm程度のダイヤモンドバイトの送
りで切り込みを入れればよい。さらにセラミック製の修
正リング4を用いて研磨定盤が充分な平面度を有するま
で研磨液を滴下しながら、研磨定盤上で回転させる。こ
のとき、修正リングは強制的に回転運動を与えられる機
構を有しているほうが良い。When the radius of the correction ring 4 is set on the surface plate,
The size is preferably such that it protrudes by 3 to 20 mm on the inner peripheral side and the outer peripheral side. As for the formation of the groove, the region to be in contact with the repair ring 4 must have a flatness of 1 μm to 10 μm. The tip R is 0.0 as a diamond bite
It is preferable that the tip angle is about 5 to 2 mm and the tip angle is about 30 to 75 degrees.
The surface plate may be corrected by sufficiently removing unnecessary burrs and irregularities by a correction device, and then cutting the diamond plate by feeding a diamond bite of about 1 μm to 50 μm. Further, the polishing plate is rotated on the polishing platen using a ceramic correction ring 4 while dropping the polishing liquid until the polishing platen has a sufficient flatness. At this time, it is preferable that the correction ring has a mechanism capable of forcibly applying a rotational movement.
【0015】定盤と修正リングとの回転比は充分安定し
なければならない。The rotation ratio between the platen and the correction ring must be sufficiently stable.
【0016】研磨液としては界面活性剤を含むダイヤモ
ンドスラリーで平均砥粒径が1/10〜1/2μmのも
のを用いる。充分に研磨定盤の平面度が形成されること
を確認して、研磨定盤6・修正リング4から砥粒の取り
除くため、洗浄する。このようにして、研磨定盤6を作
成する。As the polishing liquid, a diamond slurry containing a surfactant and having an average abrasive particle size of 1/10 to 1/2 μm is used. After confirming that the flatness of the polishing platen is sufficiently formed, cleaning is performed to remove abrasive grains from the polishing platen 6 and the correction ring 4. Thus, the polishing platen 6 is prepared.
【0017】次に図1のような支持治具10に磁気ヘッ
ドスラダーを1個もしくは複数個をテンプレート部11
に並べ、スライダー裏面の空気圧を流体加圧用の穴12
によって減圧することにより、図6のように治具にスラ
イダーを保持させる。これを研磨定盤に載せ、図2のよ
うに空気圧を流体加圧用の穴12によって加圧すること
により、スライダー1を研磨定盤6に押しつけ、図4の
ように研磨加工を行う。加工終了後に研磨定盤の回転を
停止させ、空気圧を減圧することにより、図6のように
スライダー1を治具11に保持し、治具を持ち上げて移
動させることにより、図7のように定盤から洗浄用のケ
ースに一括して移送できる。この製法によって、図9の
ように工程が簡略化される。Next, one or a plurality of magnetic head slides are mounted on a support jig 10 as shown in FIG.
And the air pressure on the back of the slider is
As a result, the slider is held by the jig as shown in FIG. This is placed on a polishing platen, and the slider 1 is pressed against the polishing platen 6 by pressurizing the air pressure with a fluid pressurizing hole 12 as shown in FIG. 2 to perform the polishing process as shown in FIG. After finishing the processing, the rotation of the polishing platen is stopped, and the air pressure is reduced to hold the slider 1 on the jig 11 as shown in FIG. It can be transferred from the panel to the case for cleaning at once. By this manufacturing method, the steps are simplified as shown in FIG.
【0018】(実施例2)実施例1と同様な定盤6を作成
し、治具の窪みにスライダーを並べ、研磨定盤上にお
く。スライダー裏面に潤滑液を加圧することにより、研
磨圧として作用して、研磨加工が行われる。空気を加圧
するときに較べ、流体の密度が大きいので、被加工物が
振動しにくく安定して加工が行われる。(Embodiment 2) A platen 6 similar to that in Embodiment 1 is prepared, sliders are arranged in the depressions of the jig, and placed on a polishing platen. By applying a lubricating liquid to the back surface of the slider, the lubricating liquid acts as a polishing pressure to perform polishing. Since the density of the fluid is higher than when air is pressurized, the workpiece is less likely to vibrate and the processing is performed stably.
【0019】(実施例3)図8に示すように、ベース厚さ
25μm,ダイヤモンド砥粒0.25μmの研磨テープ
13を用いて、平均移動速度1m/min研磨圧力2.
8MPaで浮上型磁気ヘッドを乾式研磨するときに、テ
ンプレート11で横方向にずれないようにスライダー1
を保持し、スライダー背面の加圧穴12から空気によっ
て0.1から0.4kPa程度加圧しながら、研磨テー
プ13を走行させることにより研磨が行われる。(Example 3) As shown in FIG. 8, a polishing tape 13 having a base thickness of 25 μm and diamond abrasive grains of 0.25 μm was used.
When the floating magnetic head is dry-polished at 8 MPa, the slider 1 is moved so that the template 11 does not shift laterally.
Is held, and polishing is performed by running the polishing tape 13 while applying pressure of about 0.1 to 0.4 kPa with air from the pressurizing hole 12 on the back surface of the slider.
【0020】加工終了後は、スライダー裏面側の空気圧
を減圧することにより、治具10にスライダー1を保持
し、次工程に移送する。After the processing is completed, the slider 1 is held on the jig 10 by reducing the air pressure on the back side of the slider, and is transferred to the next step.
【0021】[0021]
【発明の効果】本発明によれば、磁気ヘッドの浮上面を
量産性よく、かつ研磨量を制御しながら加工することが
可能である。また、製法に接着工程を含まないので、機
械化しやすく、接着剤による汚染がない。According to the present invention, the flying surface of the magnetic head can be processed with good mass productivity and while controlling the polishing amount. In addition, since the bonding method is not included in the manufacturing method, it is easy to mechanize, and there is no contamination by the adhesive.
【図1】本発明スライダー保持方法を示す図。FIG. 1 is a diagram showing a slider holding method of the present invention.
【図2】加工時の治具断面図。FIG. 2 is a sectional view of a jig during processing.
【図3】磁気ディスク装置概略図。FIG. 3 is a schematic diagram of a magnetic disk device.
【図4】研磨加工方法を示す図。FIG. 4 is a view showing a polishing method.
【図5】従来スライダー保持方法を示す図。FIG. 5 is a diagram showing a conventional slider holding method.
【図6】被加工物保持時の治具断面図。FIG. 6 is a sectional view of a jig when holding a workpiece.
【図7】移送後の治具断面図。FIG. 7 is a sectional view of a jig after transfer.
【図8】研磨テープによる加工方法の断面図。FIG. 8 is a cross-sectional view of a processing method using a polishing tape.
【図9】本発明の製造工程図。FIG. 9 is a manufacturing process diagram of the present invention.
1…磁気ヘッドスライダー、 2…磁気ディス
ク、3…加工治具、4…修正リング、5…研磨液・潤滑
液、6…研磨定盤、7…浮上面・接触面、8…接着弾性
体シート、9…加工治具の下面、 10…本発明加工治
具、11…本発明加工治具の窪み部(テンプレート)、
12…流体加圧用穴、13…研磨テープ、14…スライ
ダー搬送用ケース。DESCRIPTION OF SYMBOLS 1 ... Magnetic head slider, 2 ... Magnetic disk, 3 ... Processing jig, 4 ... Repair ring, 5 ... Polishing liquid / lubricating liquid, 6 ... Polishing surface plate, 7 ... Floating surface / contact surface, 8 ... Adhesive elastic body sheet , 9: lower surface of processing jig, 10: processing jig of the present invention, 11: recessed portion (template) of processing jig of the present invention,
12: Hole for pressurizing fluid, 13: Polishing tape, 14: Case for slider conveyance.
Claims (4)
の浮上面を1個づつで研磨する磁気ヘッドの製法におい
て、 前記スライダーを治具に接着または粘着しないで、流体
で加圧して研磨を行うことを特徴とする磁気ヘッドの製
法。1. A method of manufacturing a magnetic head for polishing the flying surface of a magnetic head slider for a magnetic disk drive one by one, wherein the polishing is performed by applying pressure with a fluid without adhering or sticking the slider to a jig. Characteristic magnetic head manufacturing method.
て研磨を行う磁気ヘッドの製法。2. The method according to claim 1, wherein the polishing is performed using air as a fluid.
滑液を用いて研磨を行う磁気ヘッドの製法。3. The method of manufacturing a magnetic head according to claim 1, wherein the polishing is performed using a polishing liquid or a lubricating liquid as a fluid.
を行う前または後で流体を減圧して前記スライダーを保
持して移送する工程を有する磁気ヘッドの製法。4. The method of manufacturing a magnetic head according to claim 1, further comprising a step of reducing the pressure of the fluid before or after performing the polishing process and holding and transferring said slider.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16373397A JPH1116115A (en) | 1997-06-20 | 1997-06-20 | Manufacture of magnetic head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16373397A JPH1116115A (en) | 1997-06-20 | 1997-06-20 | Manufacture of magnetic head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH1116115A true JPH1116115A (en) | 1999-01-22 |
Family
ID=15779643
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16373397A Pending JPH1116115A (en) | 1997-06-20 | 1997-06-20 | Manufacture of magnetic head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH1116115A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6926582B2 (en) | 2002-04-16 | 2005-08-09 | Hitachi Global Storage Technologies Nethrlands B.V. | System and method for rounding disk drive slider corners and/or edges using a flexible slider fixture, an abrasive element, and support elements to control slider orientation |
US7028388B2 (en) * | 1999-06-18 | 2006-04-18 | Fujitsu Limited | Method of manufacturing magnetic head |
US7049809B2 (en) | 2004-07-15 | 2006-05-23 | Hitachi Global Storage Technologies Netherlands B.V. | System, method, and apparatus for handling and testing individual sliders in a row-like format in single slider processing systems |
-
1997
- 1997-06-20 JP JP16373397A patent/JPH1116115A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7028388B2 (en) * | 1999-06-18 | 2006-04-18 | Fujitsu Limited | Method of manufacturing magnetic head |
US6926582B2 (en) | 2002-04-16 | 2005-08-09 | Hitachi Global Storage Technologies Nethrlands B.V. | System and method for rounding disk drive slider corners and/or edges using a flexible slider fixture, an abrasive element, and support elements to control slider orientation |
US7049809B2 (en) | 2004-07-15 | 2006-05-23 | Hitachi Global Storage Technologies Netherlands B.V. | System, method, and apparatus for handling and testing individual sliders in a row-like format in single slider processing systems |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5934973A (en) | Semiconductor wafer dicing saw | |
JP3286941B2 (en) | Truing method of diamond grinding wheel | |
JPH0426982B2 (en) | ||
JP2005153085A (en) | Truing method of chamfering grinding wheel and chamfering device | |
KR20010013346A (en) | Methods and apparatus for conditioning grinding stones | |
JP3052201B2 (en) | Precision plane processing machine | |
US6398623B1 (en) | Processing method of device and processing method of slider | |
JPH1116115A (en) | Manufacture of magnetic head | |
Gatzen et al. | Precision machining of rigid disk head sliders | |
US4279102A (en) | Method of manufacturing narrow track ferrite head cores | |
US6452750B1 (en) | Slider including a rail having a concave end and method of manufacturing same | |
JPH10286755A (en) | Conditioning method of abrasive grain fix type grinding surface plate | |
JP4203486B2 (en) | Polishing pad dresser for dressing polishing pad used for finish polishing of aluminum substrate for hard disk, and method for polishing aluminum substrate for hard disk | |
TW562719B (en) | Conditioning pad allowing individual tuning of particles | |
JP2006068835A (en) | End face polishing method for substrate for record medium using abrasive grain fluidized processing | |
JPH09180389A (en) | Magnetic head slider production device and magnetic head slider production | |
JPH10134316A (en) | Method for working magnetic head | |
JPS63113818A (en) | Manufacture of thin film magnetic head | |
JP3671250B2 (en) | Diamond grinding wheel and its truing device | |
JPH05298646A (en) | Manufacture of magnetic head | |
JPH06179165A (en) | Surface plate for lapping work | |
JP2770567B2 (en) | Processing method of magnetic head | |
JPS6299064A (en) | Mirror-surface polishing for metal and polishing surface plate used therefor | |
JPH0652520A (en) | Method and device for working thin film magnetic head | |
JP2003039322A (en) | Tool for correcting polishing pad |