JPH11151418A - Fire preventing device of harmful material removing machine for semiconductor production waste gas - Google Patents
Fire preventing device of harmful material removing machine for semiconductor production waste gasInfo
- Publication number
- JPH11151418A JPH11151418A JP10172969A JP17296998A JPH11151418A JP H11151418 A JPH11151418 A JP H11151418A JP 10172969 A JP10172969 A JP 10172969A JP 17296998 A JP17296998 A JP 17296998A JP H11151418 A JPH11151418 A JP H11151418A
- Authority
- JP
- Japan
- Prior art keywords
- wire mesh
- flame
- water
- wire
- exhaust gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Fire-Extinguishing Compositions (AREA)
- Chimneys And Flues (AREA)
- Treating Waste Gases (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】半導体製造に使用する各種ガ
スの無害化に当たり電熱式酸化加熱方式の除害機におい
て排ガス導入前処理のために設置する安全装置としての
火炎防止装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flame prevention device as a safety device installed for pretreatment of exhaust gas introduction in an electrothermal oxidation heating type abatement machine for detoxifying various gases used in semiconductor manufacturing.
【0002】[0002]
【従来の技術】CVDによる半導体製造においては、各
種薄膜作成に当たりデポジット用ガス(例えば、SiH
4,Si2H6,SiH2Cl2,TEOS,PH3,B
2H6,NH 3,N2O等)を使用し、デポジット工程を終
了した後にCVD内を清浄化するためにクリーニングガ
ス(例えば、NF3,SF6,C2F6,CF4等)が通常
使用される。2. Description of the Related Art In semiconductor manufacturing by CVD, each of
Depositing gas (eg, SiH
Four, SiTwoH6, SiHTwoClTwo, TEOS, PHThree, B
TwoH6, NH Three, NTwoO) etc. to finish the deposit process
Cleaning gas to clean the inside of the CVD
(For example, NFThree, SF6, CTwoF6, CFFourEtc.) is usually
used.
【0003】これらのガスは本来可燃性,爆発性,腐食
性,有毒性等の諸々の危険要因を有している。そのた
め、大気放出の前に例えば酸化加熱のような手段を備え
た除害機を使って除害(無毒化)しなければならない。[0003] These gases inherently have various danger factors such as flammability, explosiveness, corrosiveness, and toxicity. For this reason, it must be eliminated (detoxified) using an abatement machine equipped with a means such as oxidizing heating before being released to the atmosphere.
【0004】CVD内では使用ガスに対して複雑な分解
反応を起こし、その結果新たな分解生成物(例えば、F
2,HF,HCl,SiOX等)を発生し、それが未分解
のデポジットガス及びクリーニングガスと随伴して排出
される。[0004] In the CVD, a complicated decomposition reaction is caused to the used gas, and as a result, new decomposition products (for example, F
2, HF, and generates HCl, and the SiO X, etc.), it is discharged entrained with deposit gas and cleaning gas undecomposed.
【0005】このような不測の混合ガスを熱源を有する
ゾーン(反応筒)に酸化のための外部空気の共存下で加
熱酸化分解させる場合、例えばSiH4/N2O/N2混
合系においてはSiH4濃度1.9〜87.1%の範囲内で、
又、SiH4/NF3/N2混合系においてはSiH4濃度
0.66〜95.3%の領域で火源がある場合に爆発組成とな
り、実際に爆発現象を起こすことがある。When such an unexpected mixed gas is heated and oxidized and decomposed in a zone (reaction tube) having a heat source in the presence of external air for oxidation, for example, in a SiH 4 / N 2 O / N 2 mixed system, Within the SiH 4 concentration range of 1.9 to 87.1%,
In a SiH 4 / NF 3 / N 2 mixed system, the SiH 4 concentration
When there is a fire source in the area of 0.66 to 95.3%, it becomes explosive composition and may actually cause an explosion phenomenon.
【0006】又、特開平7-323211号に記載のように、熱
源を有するゾーンの前段階に水噴射設備を具備し、上記
した分解生成物としての粉塵を随伴した排ガス等を洗浄
する場合がある。この場合、例えばガス中にSiH2C
l2が存在すると SiH2Cl2+4H2O→Si(OH)4+2HCl+2
H2 のような加水分解反応が起こってH2ガスを発生する場
合があり、それが外部空気との混合で爆発現象を起こす
ことがある。Further, as described in Japanese Patent Application Laid-Open No. 7-323211, there is a case where a water injection facility is provided in a stage before a zone having a heat source to clean exhaust gas accompanied by dust as a decomposition product. is there. In this case, for example, SiH 2 C
When l 2 exists, SiH 2 Cl 2 + 4H 2 O → Si (OH) 4 + 2HCl + 2
May hydrolysis such as H 2 is generated H 2 gas going on, it may cause explosions in admixture with external air.
【0007】これらの爆発が生じると、閉塞系の配管内
で急激な圧力変動が起こり、CVD装置にまで影響を及
ぼすことになる。更に、局部的火炎の生成がCVDに至
る配管内の可燃性ガス(例えばSiH4等)に伝播し、
事故に至るおそれがある。[0007] When these explosions occur, abrupt pressure fluctuations occur in the closed piping, which affects the CVD apparatus. Further, the generation of the local flame propagates to a combustible gas (for example, SiH 4 or the like) in a pipe leading to the CVD,
An accident could result.
【0008】かかる危険性を含んだ除害機において一般
的な安全装置としてはガスを水中に放散して水を通過さ
せる水封式安全器や、圧力,温度の異常現象をセンサー
で検知してN2ガス等を除害機装置方向へ噴射する逆火
防止器がある。[0008] As a general safety device in the abatement machine including such a danger, a water seal type safety device that disperses gas into water and allows water to pass therethrough, or a sensor that detects abnormal phenomena of pressure and temperature with a sensor. There is a flashback preventer that injects N 2 gas or the like toward the abatement apparatus.
【0009】然し乍ら、水封式安全器は水封レベルの差
位に制限があり、広範囲な爆発現象に対応するのが困難
であり、又、逆火防止器はセンサーの検知時間の遅れに
不安要因を残している。However, the water ring type safety device is limited in the difference of the water ring level, and it is difficult to cope with a wide range of explosion phenomena, and the flashback prevention device is concerned about the delay of the detection time of the sensor. Factor remains.
【0010】[0010]
【発明が解決しようとする課題】そこで、ヒーターゾー
ンの前段階に水噴射設備を有する半導体排ガス除害機に
おいて、簡単な構成で火炎の伝播を防止することのでき
る安全機構としての火炎防止装置が求められている。Therefore, in a semiconductor exhaust gas abatement system having a water injection facility at a stage prior to a heater zone, there is provided a flame prevention device as a safety mechanism capable of preventing the propagation of flame with a simple configuration. It has been demanded.
【0011】[0011]
【課題を解決するための手段】本発明の請求項1記載の
半導体製造排ガス除害機の火炎防止装置は、酸化加熱式
の半導体製造排ガス除害機の加熱反応筒の前段階に取り
付けられる火炎防止装置であって、金網(2)と、該金網
(2)の上方に備えられ該金網(2)に向かって水を噴射する
水噴射ノズル(3)を有することを特徴とする。According to a first aspect of the present invention, there is provided a flame preventing apparatus for an exhaust gas abatement apparatus for manufacturing semiconductor exhaust gas according to the present invention. A wire mesh (2), said wire mesh
It has a water injection nozzle (3) provided above (2) for injecting water toward the wire mesh (2).
【0012】又、請求項2記載の火炎防止装置は、請求
項1記載の火炎防止装置において、金網(2a)は複数箇所
に間隔を開けて配置されており、各金網配置部に配置さ
れる金網(2a)は1枚又は複数枚であり、各金網配置部の
上方には水噴射ノズル(3)が備えられていることを特徴
とする。According to a second aspect of the present invention, there is provided the flame arresting device according to the first aspect, wherein the wire nettings (2a) are arranged at a plurality of locations with an interval therebetween, and are arranged at each of the wire netting arranging portions. The number of the wire mesh (2a) is one or more, and a water injection nozzle (3) is provided above each wire mesh disposing portion.
【0013】本発明の火炎防止装置は、半導体製造排ガ
ス除害処理における付帯装置に火炎伝播防止機能を付与
したものである。排ガス処理に対してCVDから除害機
に導入される排ガス中にはSiO2を代表とした粉塵、
及びF2,NH3,SiH2Cl 2等の水可溶性成分,加水
分解成分が含まれており、これらの物質が酸化加熱分解
処理を行う加熱反応筒に入ることはガス通過抵抗の増
大、金属腐食トラブルの促進、NOXのような望ましか
らざる副生成物の発生等の問題を起こすので出来る限り
事前に除去しておくのが望ましく、そのために水スクラ
バによる水散布をもって処置している。この付帯設備で
ある水スクラバに金網を設置することにより上記粉塵の
除去以外に火炎防止の機能を有することを見い出した。The flame prevention device of the present invention is a semiconductor manufacturing exhaust gas.
Of flame spread prevention function to ancillary equipment in waste treatment
It was done. Abatement machine from CVD for exhaust gas treatment
The exhaust gas introduced into theTwoDust,
And FTwo, NHThree, SiHTwoCl TwoWater-soluble components such as water
Decomposition components are contained, and these substances are
Entering the heating reaction tube for processing increases the gas passage resistance.
Large, promotion of metal corrosion trouble, NOXLike only want
Cause problems such as generation of various by-products.
It is desirable to remove it in advance, and
Treatment is performed by spraying water with a bath. With this ancillary equipment
By installing a wire mesh on a water scrubber, the dust
It has been found that it has a function of flame prevention other than removal.
【0014】金網使用による逆火防止装置の基本原理は
火炎の有するエネルギーを金網により冷却せしめ、火炎
を排ガス導入の上流方向に出さないことである。それ
故、網素材は耐熱性を有する金属とする必要がある。
又、冷却効果を高めるためには網構造が密であり、火炎
が網目から出ないことが望ましい。[0014] The basic principle of the flashback prevention device using a wire mesh is that the energy of the flame is cooled by the wire mesh and the flame is not emitted upstream of the exhaust gas introduction. Therefore, the net material needs to be a metal having heat resistance.
Further, in order to enhance the cooling effect, it is desirable that the mesh structure is dense and the flame does not come out of the mesh.
【0015】然し乍ら、SiO2を代表とする粉塵の目
詰まりを無くし、全体としての通気抵抗を減らすことを
必要とするが、このことは金網の消炎機能と矛盾する。
その兼ね合いを見いだし、更に水噴射を加味することで
冷却効果を高め、粉塵目詰まりを流出させる実態を確認
した。However, it is necessary to eliminate clogging of dust typified by SiO 2 and to reduce the overall ventilation resistance, which is inconsistent with the quenching function of the wire mesh.
We found out the trade-off, and added the water jet to enhance the cooling effect and confirmed the fact that the dust clogged out.
【0016】すなわち、本件火炎防止装置は(a)半導体
排ガスの除害に当たっての事前洗浄、(b)金網細隙によ
る消炎作用、(c)粉霧状水による金網冷却化と火炎自体
の消滅、(d)水噴射での持ち込み粉塵除去による通気抵
抗増加の改善の機能を有する。That is, the flame prevention device of the present invention comprises (a) pre-cleaning for removing semiconductor exhaust gas, (b) quenching action by wire mesh slits, (c) cooling of wire mesh by atomized water and extinction of the flame itself, (d) It has the function of improving the increase in airflow resistance by removing dust brought in by water injection.
【0017】火炎伝播速度は金網の目開きに反比例する
ことが知られており、目開きが小さい(Tylerの場
合はメッシュ数が大きい)程、消炎できる火炎速度は大
となる。本発明の場合、代表的爆発現象のH2/空気混
合系を想定すると、火炎伝播速度は2.8m/Secであ
るので、これを消炎すべき金網の目開きは通常JISで
3,500程度(Tylerメッシュ6相当)が好適で
ある。It is known that the flame propagation speed is inversely proportional to the mesh size of the wire mesh. The smaller the mesh size (the larger the number of meshes in the case of Tyler), the larger the flame speed that can be extinguished. In the case of the present invention, assuming an H 2 / air mixture system of a typical explosion phenomenon, the flame propagation speed is 2.8 m / Sec. (Equivalent to Tyler mesh 6) is preferable.
【0018】本発明においてTylerメッシュ3〜8
の金網を2〜5枚使用する。その場合複数枚の金網を積
層するか間隔を開けて各金網を設置してもいずれでもよ
い。なお、使用枚数が5枚を超えると通気抵抗は増加す
るものの消炎効果の改善はあまり認められない。したが
って、5枚以下が好適である。In the present invention, Tyler mesh 3 to 8
2 to 5 wire meshes are used. In this case, a plurality of wire meshes may be stacked or each wire mesh may be installed at intervals. When the number of used sheets exceeds 5, the ventilation resistance increases but the quenching effect is not significantly improved. Therefore, five or less sheets are preferable.
【0019】本発明の火炎防止装置は角柱状でも円柱状
でもよい。金網形状は火炎防止装置の断面形状に合わせ
る。例えば、角柱状の場合は20cm角や20×15c
m、円柱状の場合は直径20cm等が例示できるが、こ
れは一例であり、本発明は具体的な寸法に限定されるも
のではない。同様に高さは30〜80cmを例示する
が、これについても本発明は具体的な寸法に限定される
ものではない。The flame prevention device of the present invention may be prismatic or cylindrical. The shape of the wire mesh is adjusted to the cross-sectional shape of the flame prevention device. For example, in the case of a prismatic shape, a 20 cm square or 20 × 15 c
m, a diameter of 20 cm, etc. can be exemplified in the case of a cylindrical shape, but this is an example, and the present invention is not limited to specific dimensions. Similarly, the height is illustrated as 30 to 80 cm, but the present invention is not limited to specific dimensions.
【0020】この箱構造の少なくとも天井の中央にノズ
ル1個を設置する。又、金網を1カ所以上5カ所まで設
置する。この場合1カ所に1枚づつ設置してもよいし、
複数枚積層して設置してもよい。複数枚の金網を間隔を
開けて設置する場合には、金網間にノズルを設置しても
よい。One nozzle is installed at least at the center of the ceiling of the box structure. In addition, wire mesh will be installed at one or more locations and up to five locations. In this case, one card may be installed in one place,
A plurality of sheets may be stacked and installed. When a plurality of wire meshes are installed at intervals, a nozzle may be installed between the wire meshes.
【0021】使用するノズルはSUS304,SUS3
16Lのように耐食性を有するNi−Cr系鉄合金から
なることが望ましい。The nozzles used are SUS304, SUS3
It is desirable to use a Ni-Cr-based iron alloy having corrosion resistance such as 16L.
【0022】除害機で処理する排ガスが1000リットル/m
in迄の風量の場合、ノズルから放出する水量は合計で5
〜50リットル/min程度であり、水温は室温でよい。Exhaust gas processed by the abatement machine is 1000 liter / m
In the case of air volume up to in, the amount of water discharged from the nozzle is 5 in total
It is about 50 liter / min, and the water temperature may be room temperature.
【0023】半導体製造排ガスの除害機の場合、上記し
たような可燃性,爆発性のガス除害、加水分解によって
二次的に生じた可燃性,爆発性ガス(例えばH2,エタ
ノール等)の処、更にはCVD内部で行われた反応の結
果、その過程が十分解明されない可燃性,爆発性の生成
粉塵が除害機に持ち込まれる場合もあり、それらが除害
機において酸化加熱分解させるために必要な外部空気と
熱源を介して火炎を発生したとしても、金網と水噴射の
存在によって火炎が伝播するのを防ぎ、事故に至らしめ
ない。In the case of an abatement system for semiconductor manufacturing exhaust gas, combustible and explosive gas (for example, H 2 , ethanol, etc.) secondary generated by flammable and explosive gas abatement and hydrolysis as described above. In addition, as a result of the reaction performed inside the CVD, flammable or explosive generated dust whose process is not fully understood may be brought into the abatement machine, and these are oxidized and decomposed in the abatement machine. Therefore, even if the flame is generated through the external air and heat source required for the purpose, the presence of the wire mesh and the water jet prevents the flame from propagating and does not cause an accident.
【0024】請求項3記載の火炎防止装置は請求項1の
火炎防止装置において、金網はNi−Cr系鉄合金製で
線径が0.7mm以上1.7mm以下の線材よりなるTyl
erメッシュ3以上8以下のものであり、該金網は1枚
又は2枚以上5枚以下が積層もしくは100mm間隔で1
枚づつ配置され、金網配置箇部の上方には金網に向けて
水を霧状に散布するための水噴射ノズルを有することを
特徴とする。According to a third aspect of the present invention, there is provided the flame prevention apparatus according to the first aspect, wherein the wire mesh is made of a Ni-Cr-based iron alloy and has a wire diameter of 0.7 mm or more and 1.7 mm or less.
er mesh of 3 or more and 8 or less, and the wire mesh is one or two or more and five or less laminated or one at an interval of 100 mm.
It is characterized by having a water spray nozzle for distributing water in a mist state toward the wire mesh above the wire mesh arrangement section.
【0025】これは、排ガスの持ち込み粉塵の処理と共
に火炎防止効果を十分とする上で好適な金網の構成を検
討したものである。又、腐食性ガスによる耐食材として
Ni−Cr系鉄合金の線材を使用し、ガスの通過抵抗及
び消炎効果の両面から考慮し、決定したものである。This is a study of the structure of a wire netting suitable for treating the dust brought in by the exhaust gas and ensuring a sufficient flame prevention effect. In addition, a wire made of a Ni-Cr-based iron alloy was used as a corrosion-resistant material by corrosive gas, and was determined in consideration of both the gas passage resistance and the quenching effect.
【0026】請求項4記載の火炎防止装置は、熱反応筒
の前工程に設置され、ガスの流れの上流側に向かって径
が小さくなる火炎遮断ノズルを1個又は複数個有してお
り、少なくとも最下流側に設置された火炎遮断ノズルの
上流側には該火炎遮断ノズルに向かって水を噴射するた
めの水噴射ノズルを備えていることを特徴とする。The flame preventing device according to the fourth aspect of the present invention has one or more flame shut-off nozzles which are installed in a preceding process of the thermal reaction tube and whose diameter decreases toward the upstream side of the gas flow. A water injection nozzle for injecting water toward the flame shutoff nozzle is provided at least on the upstream side of the flame shutoff nozzle installed at the most downstream side.
【0027】これによれば、火炎は火炎遮断ノズルで遮
断されると共に、火炎遮断ノズルと水噴射ノズルにより
冷却され、排ガス導入の上流方向に流出しないようにす
ることができる。又、水噴射は冷却の他に粉塵が火炎遮
断ノズルに目詰まりするのを防止する効果も有してい
る。According to this, the flame is shut off by the flame shut-off nozzle and is cooled by the flame shut-off nozzle and the water injection nozzle, so that the flame does not flow out in the upstream direction of the exhaust gas introduction. In addition to water cooling, the water jet has an effect of preventing dust from clogging the flame shut-off nozzle.
【0028】[0028]
【発明の実施の形態】以下、本発明を好適な実施例を用
いて説明する。 [実施例1]図1は本実施例の火炎防止装置の概要を示
した図であり、この火炎防止装置を具備した除害機を使
用し、爆発組成範囲のSiH4ガスを除害した。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to preferred embodiments. Embodiment 1 FIG. 1 is a view showing an outline of a flame arresting device according to the present embodiment. An abatement machine equipped with this flame arresting device was used to remove SiH 4 gas in an explosive composition range.
【0029】この場合、(1)は火炎防止装置の箱構造を
形成する筒状体であり、実施例では断面20cm角、高
さ70cmの角柱状とした。(2)はSUS304からな
る線径1.02mmにて作成されたTylerメッシュ
6の金網であり、筒状体(1)の底部付近に1枚に設置し
た。In this case, (1) is a cylindrical body forming a box structure of the flame arrestor, and in the embodiment, it is a prism having a cross section of 20 cm square and a height of 70 cm. (2) is a wire mesh of Tyler mesh 6 made of SUS304 and having a wire diameter of 1.02 mm, and was installed near the bottom of the tubular body (1).
【0030】又、筒状体(1)の頭部から10cm下方の
断面中央に水噴射ノズル(3)(株式会社いけうち製ノン
コアフルコーンノズル3/8KSFL)を1個取り付
け、水を15リットル/minで噴射した。尚、実施例で
フルコーンノズルを用いたのは、フルコーンノズルは広
範囲に水滴を散布することができ、消炎を目的とした場
合に、効率よく高温気体から水滴への熱移動を行わせる
ことができる(冷却効率が高い)からである。Further, one water injection nozzle (3) (non-core full cone nozzle 3 / 8KSFL manufactured by Ikeuchi Co., Ltd.) is attached at the center of the cross section 10 cm below the head of the tubular body (1), and water is supplied at 15 liters / water. Injected at min. The reason for using the full-cone nozzle in the embodiment is that the full-cone nozzle is capable of spraying water droplets over a wide range, and in order to extinguish the flame, heat is efficiently transferred from the high-temperature gas to the water droplets. (High cooling efficiency).
【0031】除害機は表面温度700℃に設定した複数
本の電気ヒータを備え、火炎防止装置を経由して100
%SiH4が5リットル/min、N2が95リットル/min
の混合ガスを供給し、更に火炎防止装置を通過した場所
で外部空気175リットル/minを除害ガスに混合して
ヒータの熱源に曝した。The abatement machine has a plurality of electric heaters set at a surface temperature of 700 ° C.
% SiH 4 is 5 l / min, N 2 is 95 l / min
Was supplied, and 175 liters / min of external air was mixed with the abatement gas at a place where the gas passed through the flame arrestor and exposed to the heat source of the heater.
【0032】その結果、5%濃度のSiH4ガスは除害
機の排気部において0.1ppm以下の濃度にまで除害
された。SiH4の導入時濃度はSiH4/N2系で5
%、SiH4/空気/N2系で1.82%であり、SiH
4/空気/N2系の爆発下限組成値である1.37%を越
えているが、火炎防止装置を備えた本実施例では爆発を
生じる事なく安全に除害することができた。又、金網面
には粉塵の滞積はなかった。 [実施例2]図2は本実施例の火炎防止装置の概要を示
した図である。筒状体(1)は実施例1と同じものであ
る。SUS316L製で線径1.63mmのTyler
メッシュ3からなる金網(2a)5枚をガス通過方向(図面
では上方)より2枚,2枚,1枚となるように3カ所に
分けて計5枚設置した。各設置箇所の間隔はそれぞれ1
0cmとなるようにした。As a result, the SiH 4 gas having a concentration of 5% was harmed to a concentration of 0.1 ppm or less in the exhaust part of the harm eliminator. SiH when introduced concentration of 4 to 5 with SiH 4 / N 2 system
%, 1.82% in a SiH 4 / air / N 2 system,
Although the lower limit of the explosion limit of the 4 / air / N 2 system was 1.37%, in this example equipped with a flame arrestor, it was possible to safely remove the harmless gas without causing an explosion. There was no accumulation of dust on the wire mesh surface. [Embodiment 2] FIG. 2 is a diagram showing an outline of a flame prevention device of this embodiment. The cylindrical body (1) is the same as in the first embodiment. Tyler made of SUS316L and having a wire diameter of 1.63 mm
Five wire nets (2a) made of the mesh 3 were divided into three places so as to be two, two, and one from the gas passage direction (upward in the drawing), and a total of five were installed. Each installation location is 1 space
0 cm.
【0033】実施例1で使用したのと同じ水噴射ノズル
(3)3個を各金網設置箇所の上方5cmの断面中央に設
置した。噴射ノズルからは合計10リットル/minの水
量で水を散布した。The same water injection nozzle used in Example 1
(3) Three pieces were installed at the center of the cross section of 5 cm above each wire mesh installation location. Water was sprayed from the injection nozzle at a total flow rate of 10 liters / min.
【0034】ヒーター表面温度750℃に設定した除害
機に100%SiH2Cl2が4リットル/min、N2が9
6リットル/minの混合ガス(SiH2Cl2の濃度4
%)を火炎防止装置上方より導入し、それを通過した箇
所で外部空気を100リットル/min混入してヒータの
熱源に通した。[0034] 100% SiH 2 Cl 2 abatement machine set to the heater surface temperature 750 ° C. is 4 liters / min, N 2 9
6 liter / min mixed gas (SiH 2 Cl 2 concentration 4
%) Was introduced from above the flame arrestor, and at the point where it passed, 100 liter / min of external air was mixed and passed through the heat source of the heater.
【0035】この場合、化学等量的に加水分解が進行し
たならば通過ガス体中のH2濃度はH2/空気の爆発下限
値(LEL)の4%になっている状況であるが、除害処
理は安全且つ安定して進行し、除害機の排気部における
SiH2Cl2濃度は全く実測されなかった。又、金網上
には粉体乃至スラッジ状の固形物は存在しなかった。 [比較例1]火炎防止装置を取り外した以外は実施例1
で用いたのと同じ除害機を用いて、同じ条件で比較試験
を行った。In this case, if hydrolysis proceeds stoichiometrically, the H 2 concentration in the passing gas is 4% of the lower limit of explosion (LEL) of H 2 / air. The detoxification treatment proceeded safely and stably, and the SiH 2 Cl 2 concentration in the exhaust part of the detoxification equipment was not measured at all. Also, no powdery or sludge-like solids were present on the wire mesh. Comparative Example 1 Example 1 except that the flame prevention device was removed.
A comparative test was carried out under the same conditions using the same abatement apparatus used in the above.
【0036】その結果、SiH4/N2混合ガスが外部空
気と接触する箇所で異常な音が発生すると共に、系内の
圧力変動が起こり、除害機の安全操業制御機構が作動
し、ガス供給系の緊急停止信号が働き、ヒータの通電も
停止に至った。すなわち、何らかの異常燃焼を起こした
ことになる。 [実施例3]図3は本実施例の構成の概要を示した図で
ある。図中(5)は排ガスの流れの上流側の径が小さくな
るように絞られた火炎遮断ノズルであり、本実施例では
筒状体(4)に2個設けられている。実施例では各火炎遮
断ノズル(5)の形状は絞り部(5a)の径が10mmφ,開放部
(5b)の径(筒状体(4)の内径)が100mmφである。又、火
炎遮断ノズル(5)相互の間隔は100mmとした。尚、(5c)は
火炎遮断ノズル(5)の絞り部(5a)の上流側に設けられた
湾曲面を有する整流部である。この整流部(5c)は後述す
る水噴射ノズル(6)から噴射された水滴を受けると共
に、排ガスが流れる際の通気抵抗を減らすために設けら
れている。As a result, an abnormal sound is generated at the place where the SiH 4 / N 2 mixed gas comes into contact with the external air, and the pressure in the system fluctuates. The emergency stop signal of the supply system was activated, and the energization of the heater was stopped. That is, some abnormal combustion has occurred. [Embodiment 3] FIG. 3 is a diagram showing an outline of the configuration of this embodiment. In the figure, reference numeral (5) denotes a flame shutoff nozzle narrowed so that the diameter on the upstream side of the flow of the exhaust gas becomes small. In this embodiment, two nozzles are provided on the cylindrical body (4). In the embodiment, the shape of each flame shut-off nozzle (5) is as follows.
The diameter of (5b) (the inner diameter of the cylindrical body (4)) is 100 mmφ. The interval between the flame shutoff nozzles (5) was 100 mm. Incidentally, (5c) is a rectifying section having a curved surface provided upstream of the throttle section (5a) of the flame shutoff nozzle (5). The rectifying section (5c) is provided to receive water droplets jetted from a water jet nozzle (6), which will be described later, and to reduce ventilation resistance when exhaust gas flows.
【0037】(6)は実施例1で用いたのと同じ水噴射ノ
ズル(フルコーンノズル)であり、2個の火炎遮断ノズ
ルの中間、すなわち最下段(最下流側)の火炎遮断ノズ
ルの上部(上流側)に設けられ、最下段(最下流側)の
火炎遮断ノズルに向かって水を噴射することができる。
この水噴射ノズル(6)は、水圧0.5kgf/cm2,水噴出量30
リットル/minで稼働させた。(6) is the same water injection nozzle (full cone nozzle) used in Example 1, which is located between the two flame shutoff nozzles, that is, the upper part of the lowermost (most downstream) flame shutoff nozzle. (Upstream side), and can inject water toward the lowermost (most downstream side) flame shutoff nozzle.
This water injection nozzle (6) has a water pressure of 0.5 kgf / cm 2 ,
It was operated at liter / min.
【0038】尚、排ガスを反応筒(7)に導く排ガス導入
管が火炎遮断ノズル(5)や水噴射ノズル(6)を収納可能な
径を有している場合には、この排ガス導入管をそのまま
筒状体(4)として使用することができる。When the exhaust gas introducing pipe for guiding the exhaust gas to the reaction tube (7) has a diameter capable of accommodating the flame shut-off nozzle (5) and the water injection nozzle (6), the exhaust gas introducing pipe is used. It can be used as it is as a tubular body (4).
【0039】排ガスとして100%H210リットル,希釈
用N2190リットル/min(混合ガス中のH2濃度5%)を
上記ノズル設置部を経由して反応筒(7)に導入した。反
応筒(7)は電熱ヒータを備え、雰囲気温度を700℃に設定
した。As exhaust gas, 10 liters of 100% H 2 and 190 liters / min of N 2 for dilution (5% H 2 concentration in the mixed gas) were introduced into the reaction tube (7) via the nozzle installation section. The reaction tube (7) was provided with an electric heater, and the ambient temperature was set at 700 ° C.
【0040】他方、外部空気を75リットル/minの流量
で直接反応筒(7)に供給し、排ガスのH2と混合の上、燃
焼除害せしめた。その結果、処理ガス放出孔側のガス中
H2濃度は1000ppmを示し、計算上の除害率は98%とな
った。そして、火炎遮断ノズル(5)より排ガス導入側に
火炎が来た形跡はなかった。尚、水噴射後の貯水槽水温
は55℃となった。On the other hand, external air was directly supplied to the reaction tube (7) at a flow rate of 75 liter / min, mixed with H 2 of the exhaust gas, and burned and harmed. As a result, the H 2 concentration in the gas on the processing gas discharge hole side was 1000 ppm, and the calculated removal rate was 98%. There was no evidence that a flame came from the flame shutoff nozzle (5) to the exhaust gas introduction side. In addition, the water temperature of the water tank after the water injection was 55 ° C.
【0041】尚、本実施例では火炎遮断ノズルは2個と
したが、1個又は3個以上としても良い。又、本実施例
では最下段(最下流側)の火炎遮断ノズルの上流側にの
み水噴射ノズルを設けたが、火炎遮断ノズルが複数ある
場合には、他の火炎遮断ノズルの上流側にも水噴射ノズ
ルを設けてもよい。 [比較例2]火炎遮断ノズル(5)や水噴射ノズル(6)を設
置しない以外は実施例3と同様の装置を用いて比較を行
った。ガス供給条件(組成,風量,濃度)は実施例3と
同一にして混合排ガスを700℃雰囲気の反応筒に供給
し、更に実施例3同様に外部空気を反応筒へ直接導入し
た。In this embodiment, the number of the flame shut-off nozzles is two, but may be one or three or more. Further, in this embodiment, the water injection nozzle is provided only on the upstream side of the lowermost (most downstream) flame shutoff nozzle. However, when there are a plurality of flame shutoff nozzles, the water injection nozzle is also provided on the upstream side of other flame shutoff nozzles. A water injection nozzle may be provided. Comparative Example 2 A comparison was made using the same apparatus as in Example 3 except that the flame shutoff nozzle (5) and the water injection nozzle (6) were not provided. The mixed exhaust gas was supplied to the reaction tube in an atmosphere of 700 ° C. under the same gas supply conditions (composition, air volume, and concentration) as in Example 3, and external air was directly introduced into the reaction tube as in Example 3.
【0042】その結果、反応筒内で起こった燃焼が爆発
現象を伴って一部は反応筒に設けられた放爆口を突破
し、他部は排ガス導入管側へ逆火伝播を起こした。逆火
焔は1000℃以上となった。As a result, some of the combustion that occurred in the reaction tube broke through the explosion opening provided in the reaction tube with an explosion phenomenon, and the other portion caused backfire propagation to the exhaust gas introduction pipe side. The reverse flame exceeded 1000 ° C.
【0043】[0043]
【発明の効果】以上述べたように、本発明によりヒータ
ーゾーンの前段階に水噴射設備を有する半導体排ガス除
害機において、簡単な構成で火炎の伝播を防止すること
のできる安全機構としての火炎防止装置を提供すること
ができた。As described above, according to the present invention, in a semiconductor exhaust gas abatement system having a water injection facility before a heater zone, a flame as a safety mechanism capable of preventing the propagation of flame with a simple structure. The prevention device can be provided.
【図1】実施例1の構成の概要を示した図。FIG. 1 is a diagram illustrating an outline of a configuration according to a first embodiment.
【図2】実施例2の構成の概要を示した図。FIG. 2 is a diagram illustrating an outline of a configuration according to a second embodiment.
【図3】実施例3の構成の概要を示した図。FIG. 3 is a diagram illustrating an outline of a configuration according to a third embodiment.
(1) 筒状体 (2) 金網 (3) 水噴射ノズル (5) 火炎遮断ノズル (6) 水噴射ノズル (1) Cylindrical body (2) Wire mesh (3) Water injection nozzle (5) Flame shut-off nozzle (6) Water injection nozzle
Claims (4)
加熱反応筒の前段階に取り付けられる火炎防止装置であ
って、 金網と、該金網の上方に備えられ該金網に向かって水を
噴射する水噴射ノズルを有することを特徴とする半導体
製造排ガス除害機の火炎防止装置。1. A flame prevention device attached to a stage prior to a heating reaction tube of an oxidation heating type semiconductor manufacturing exhaust gas abatement system, comprising: a wire mesh; and water jetted toward the wire mesh provided above the wire mesh. A flame prevention device for a semiconductor manufacturing exhaust gas abatement machine, comprising:
ており、各金網配置部に配置される金網は1枚又は複数
枚であり、各金網配置部の上方には水噴射ノズルが備え
られていることを特徴とする請求項1記載の半導体製造
排ガス除害機の火炎防止装置。2. A wire mesh is arranged at a plurality of locations with an interval, and one or a plurality of wire meshes are arranged in each wire mesh disposing portion, and a water injection nozzle is provided above each wire mesh disposing portion. The flame prevention device for a semiconductor manufacturing exhaust gas abatement apparatus according to claim 1, wherein:
0.7mm以上1.7mm以下の線材よりなるTylerメ
ッシュ3以上8以下のものであり、該金網は1枚又は2
枚以上5枚以下が積層もしくは100mm間隔で1枚づつ
配置され、金網配置箇部の上方には金網に向けて水を霧
状に散布するための水噴射ノズルを有することを特徴と
する請求項1記載の半導体製造排ガス除害機の火炎防止
装置。3. A wire mesh made of a Ni—Cr-based iron alloy and having a Tyler mesh of 3 or more and 8 or less made of a wire having a wire diameter of 0.7 mm or more and 1.7 mm or less.
5. The method according to claim 1, wherein at least five or less sheets are stacked or arranged one by one at an interval of 100 mm, and a water jet nozzle for spraying water in a mist toward the wire mesh is provided above the wire mesh arrangement part. 2. A flame prevention device for a semiconductor manufacturing exhaust gas abatement apparatus according to claim 1.
流れの上流側に向かって径が小さくなる火炎遮断ノズル
を1個又は複数個有しており、少なくとも最下流側に設
置された火炎遮断ノズルの上流側には該火炎遮断ノズル
に向かって水を噴射するための水噴射ノズルが備えられ
ていることを特徴とする半導体製造排ガス除害機の火炎
防止装置。4. The apparatus has one or a plurality of flame shut-off nozzles which are installed in a pre-process of the heating reaction tube and whose diameter decreases toward the upstream side of the gas flow, and are installed at least at the most downstream side. A flame prevention device for a semiconductor manufacturing exhaust gas abatement machine, characterized in that a water injection nozzle for injecting water toward the flame shutoff nozzle is provided upstream of the flame shutoff nozzle.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17296998A JP3862862B2 (en) | 1997-09-19 | 1998-06-19 | Flame prevention device for semiconductor manufacturing exhaust gas abatement machine |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27382097 | 1997-09-19 | ||
JP9-273820 | 1997-09-19 | ||
JP17296998A JP3862862B2 (en) | 1997-09-19 | 1998-06-19 | Flame prevention device for semiconductor manufacturing exhaust gas abatement machine |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH11151418A true JPH11151418A (en) | 1999-06-08 |
JP3862862B2 JP3862862B2 (en) | 2006-12-27 |
Family
ID=26495116
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17296998A Expired - Lifetime JP3862862B2 (en) | 1997-09-19 | 1998-06-19 | Flame prevention device for semiconductor manufacturing exhaust gas abatement machine |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002026358A1 (en) * | 2000-09-28 | 2002-04-04 | Kosta Kapitoures | Pollutant emission control |
WO2002035590A1 (en) * | 2000-10-27 | 2002-05-02 | Tokyo Electron Limited | Heat-treating device |
GB2402086A (en) * | 2002-03-01 | 2004-12-01 | Oiko Group Ltd | Device for removing pollutants from exhaust gases |
GB2402085A (en) * | 2002-03-01 | 2004-12-01 | Oiko Group Ltd | Device for removing pollutants from exhaust gases |
-
1998
- 1998-06-19 JP JP17296998A patent/JP3862862B2/en not_active Expired - Lifetime
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002026358A1 (en) * | 2000-09-28 | 2002-04-04 | Kosta Kapitoures | Pollutant emission control |
WO2002035590A1 (en) * | 2000-10-27 | 2002-05-02 | Tokyo Electron Limited | Heat-treating device |
GB2402086A (en) * | 2002-03-01 | 2004-12-01 | Oiko Group Ltd | Device for removing pollutants from exhaust gases |
GB2402085A (en) * | 2002-03-01 | 2004-12-01 | Oiko Group Ltd | Device for removing pollutants from exhaust gases |
GB2402086B (en) * | 2002-03-01 | 2005-08-17 | Oiko Group Ltd | Device and method for removing pollutants from exhaust gases |
Also Published As
Publication number | Publication date |
---|---|
JP3862862B2 (en) | 2006-12-27 |
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