JPH11142882A - Color liquid crystal panel and its manufacturing method - Google Patents
Color liquid crystal panel and its manufacturing methodInfo
- Publication number
- JPH11142882A JPH11142882A JP9304783A JP30478397A JPH11142882A JP H11142882 A JPH11142882 A JP H11142882A JP 9304783 A JP9304783 A JP 9304783A JP 30478397 A JP30478397 A JP 30478397A JP H11142882 A JPH11142882 A JP H11142882A
- Authority
- JP
- Japan
- Prior art keywords
- liquid crystal
- layer
- signal line
- opening
- colored layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、カラー画像表示機
能を有する液晶パネルおよびその製造方法に関するもの
である。[0001] 1. Field of the Invention [0002] The present invention relates to a liquid crystal panel having a color image display function and a method of manufacturing the same.
【0002】[0002]
【従来の技術】近年の微細加工技術、液晶材料技術およ
び実装技術などの進歩により、5〜50cm対角の液晶
パネルでCRTと比較しても遜色の無いテレビジョン画
像や各種の画像表示が商用ベースで提供されている。ま
た、液晶パネルを構成する2枚のガラス基板の一方にR
GBの着色層を形成しておくことにより、カラー表示も
容易に実現している。特にスイッチング素子を絵素毎に
内蔵させた、いわゆるアクティブ型の液晶パネルでは、
クロストークも少なくかつ高速応答で高いコントラスト
比を有する画像が保証されている。2. Description of the Related Art Recent advances in microfabrication technology, liquid crystal material technology, packaging technology, and the like have led to the commercialization of television images and various image displays on a 5 to 50 cm diagonal liquid crystal panel that are comparable to CRTs. Offered on a base. Further, one of the two glass substrates constituting the liquid crystal panel has R
By forming the GB colored layer, color display is easily realized. In particular, in a so-called active type liquid crystal panel in which switching elements are built in for each pixel,
An image having little crosstalk, high response speed and high contrast ratio is guaranteed.
【0003】これらの液晶パネルは、走査線としては1
00〜1000本、信号線としては200〜2000本
程度のマトリクス編成が一般的であるが、最近は大画面
化と高精細化が同時に進行している。[0003] These liquid crystal panels have one scanning line.
Generally, a matrix organization of about 100 to 1000 lines and about 200 to 2,000 signal lines is used, but recently, a large screen and high definition have been simultaneously advanced.
【0004】図7は液晶パネルへの実装状態を示し、液
晶パネル1を構成する一方の透明絶縁基板、例えばガラ
ス基板2の上に形成された走査線の電極端子群6に駆動
信号を供給する半導体集積回路チップ3を直接に接続す
るCOG(Chip-On-Glass)方式や、例えばポリイミド
系樹脂薄膜をベースとし、金メッキされた銅箔の端子
(図示せず)を有するTCPフィルム4を信号線の電極
端子群5に導電性媒体を含む適当な接着剤で圧接して固
定するTCP方式などの実装手段によって、電気信号が
画像表示部に供給される。ここでは便宜上二つの実装方
式を同時に図示しているが、実際には何れかの方式が適
宜選択されることは言うまでもない。FIG. 7 shows a state of mounting on a liquid crystal panel, in which a drive signal is supplied to one transparent insulating substrate constituting the liquid crystal panel 1, for example, a scanning line electrode terminal group 6 formed on a glass substrate 2. A COG (Chip-On-Glass) method for directly connecting the semiconductor integrated circuit chip 3 or a TCP film 4 having gold-plated copper foil terminals (not shown) based on, for example, a polyimide resin thin film and a signal line. An electrical signal is supplied to the image display unit by a mounting means such as a TCP system which is fixed to the electrode terminal group 5 by pressing with a suitable adhesive containing a conductive medium. Here, for the sake of convenience, two mounting schemes are shown at the same time, but it goes without saying that one of the two schemes is actually selected as appropriate.
【0005】7,8は液晶パネル1の画像表示部と信号
線および走査線の電極端子群5,6との間を接続する配
線路で、必ずしも電極端子群5,6と同一の導電材で構
成される必要はない。9は全ての液晶セルに共通の透明
導電性の対向電極を有するもう1枚の透明絶縁基板であ
るガラス基板で、液晶パネル1を構成する2枚のガラス
基板2,9は樹脂性のファイバやビーズなどのスペーサ
材によって数μm程度の所定の距離を隔てて形成され、
その間隙(ギャップ)は、ガラス基板2,9の周縁部に
おいて、有機性樹脂よりなるシール材と封口材とで封止
された閉空間になっており、この閉空間に液晶が充填さ
れている。Reference numerals 7 and 8 denote wiring paths for connecting the image display portion of the liquid crystal panel 1 to the electrode terminals 5 and 6 for the signal lines and the scanning lines, and are necessarily made of the same conductive material as the electrode terminals 5 and 6. No need to be configured. Reference numeral 9 denotes a glass substrate which is another transparent insulating substrate having a transparent conductive counter electrode common to all liquid crystal cells, and two glass substrates 2 and 9 constituting the liquid crystal panel 1 are made of resinous fibers or It is formed at a predetermined distance of about several μm by a spacer material such as beads,
The gap (gap) is a closed space sealed with a sealing material and a sealing material made of an organic resin at the peripheral portion of the glass substrates 2 and 9, and the closed space is filled with liquid crystal. .
【0006】カラー表示を実現する場合には、ガラス基
板9の閉空間側に着色層と称する染料または顔料のいず
れか一方もしくは両方を含む厚さ1〜2μm程度の有機
薄膜が被着されて色表示機能が与えられるので、その場
合にはガラス基板9は別名カラーフィルタと呼称され
る。そして液晶材料の性質によってはガラス基板9の上
面またはガラス基板2の下面のいずれかもしくは両面上
に偏光板が貼付され、液晶パネル1は電気光学素子とし
て機能する。In order to realize a color display, an organic thin film having a thickness of about 1 to 2 μm containing one or both of a dye and a pigment called a colored layer is deposited on the closed space side of the glass substrate 9 to form a color. Since a display function is provided, in that case, the glass substrate 9 is also called a color filter. Then, depending on the properties of the liquid crystal material, a polarizing plate is stuck on one or both of the upper surface of the glass substrate 9 and the lower surface of the glass substrate 2, and the liquid crystal panel 1 functions as an electro-optical element.
【0007】図8は、スイッチング素子として例えば薄
膜の絶縁ゲート型トランジスタを絵素毎に配置したアク
ティブ型液晶パネルの等価回路図である。実線で描かれ
た素子は一方のガラス基板であるアクティブ基板2の上
に、そして破線で描かれた素子はもう一方のガラス基板
9の上に形成されている。走査線11と信号線12は、
例えば非晶質シリコンを半導体層とし、シリコン窒化層
をゲート絶縁層とするTFT(薄膜トランジスタ)10
の形成と同時にアクティブ基板2(一方のガラス基板)
の上に作製される。FIG. 8 is an equivalent circuit diagram of an active liquid crystal panel in which, for example, a thin-film insulated gate transistor is arranged as a switching element for each picture element. The elements drawn in solid lines are formed on the active substrate 2 which is one glass substrate, and the elements drawn in broken lines are formed on the other glass substrate 9. The scanning line 11 and the signal line 12
For example, a TFT (thin film transistor) 10 using amorphous silicon as a semiconductor layer and a silicon nitride layer as a gate insulating layer
Active substrate 2 (one glass substrate) simultaneously with the formation of
Fabricated on
【0008】液晶セル13はアクティブ基板2の上に形
成された透明導電性の絵素電極14と、カラーフィルタ
9(もう一方のガラス基板)の上に形成された同じく透
明導電性の対向電極15と、2枚のガラス基板2,9で
構成された閉空間を満たす液晶16とで構成され、電気
的にはコンデンサと同じ扱いで良い。液晶セル13の時
定数を大きくするための蓄積容量の構成に関しては幾つ
かの選択が可能で、例えば図8では蓄積容量17は全絵
素に共通の共通電極18と絵素電極14とが、絶縁ゲー
ト型トランジスタのゲート絶縁層などの絶縁層を介して
構成される。The liquid crystal cell 13 includes a transparent conductive picture element electrode 14 formed on the active substrate 2 and a transparent conductive counter electrode 15 formed on the color filter 9 (the other glass substrate). And a liquid crystal 16 which fills a closed space formed by the two glass substrates 2 and 9, and may be electrically treated the same as a capacitor. With respect to the configuration of the storage capacitor for increasing the time constant of the liquid crystal cell 13, several choices are possible. For example, in FIG. 8, the storage capacitor 17 includes a common electrode 18 and a pixel electrode 14, which are common to all the pixels. It is formed via an insulating layer such as a gate insulating layer of an insulated gate transistor.
【0009】図9はカラー表示用液晶パネルの要部断面
図である。染色された感光性ゼラチンまたは着色性感光
性樹脂などよりなる着色層19は先述したように、カラ
ーフィルタ9の閉空間側で絵素電極14に対応してRG
Bの三原色で所定の配列にしたがって配置されている。
全ての絵素電極14に共通の対向電極15は着色層19
の介在による液晶セル内での電圧配分損失を回避するた
めには図示したように着色層19の上に形成される。液
晶16に接して2枚のガラス基板2,9の上に被着され
た、例えば0.1μm程度の膜厚のポリイミド系樹脂薄
膜層20は液晶分子を決められた方向に揃えるための配
向膜である。加えて液晶16にツイスト・ネマチック
(TN)型のものを用いる場合には上下に2枚の偏光板
21を必要とする。FIG. 9 is a sectional view of an essential part of a liquid crystal panel for color display. As described above, the colored layer 19 made of dyed photosensitive gelatin or colored photosensitive resin is formed on the closed space side of the color filter 9 in correspondence with the pixel electrode 14 by RG.
The three primary colors B are arranged according to a predetermined arrangement.
The counter electrode 15 common to all the pixel electrodes 14 is a colored layer 19
In order to avoid the voltage distribution loss in the liquid crystal cell due to the interposition of the liquid crystal cell, as shown in FIG. A polyimide resin thin film layer 20 having a thickness of, for example, about 0.1 μm, which is adhered on the two glass substrates 2 and 9 in contact with the liquid crystal 16, is an alignment film for aligning liquid crystal molecules in a predetermined direction. It is. In addition, when a twisted nematic (TN) type liquid crystal is used, two polarizing plates 21 are required on the upper and lower sides.
【0010】R,G,Bの着色層19の境界に低反射性
の不透明膜22を配置すると、アクティブ基板2の上の
信号線12などの配線層からの反射光を防止できて画像
のコントラスト比が向上し、またスイッチング素子であ
るTFT10の外部光照射によるOFF動作時のリーク
電流の増大が防げて強い外光の下でも液晶パネルを動作
させることが可能となり、既にブラックマトリクス(B
M)として実用化されている。BMの構成も多数考えら
れるが、隣り合った着色層の境界における段差の発生と
光の透過率などを考慮するとコスト的には不利である
が、0.1μm程度の膜厚のCr薄膜が簡便でかつ合理
的である。When a low-reflection opaque film 22 is disposed at the boundary between the R, G, and B colored layers 19, reflected light from a wiring layer such as the signal line 12 on the active substrate 2 can be prevented, and image contrast can be reduced. The ratio is improved, and the leakage current at the time of the OFF operation of the switching element TFT 10 due to external light irradiation can be prevented from increasing, so that the liquid crystal panel can be operated even under strong external light.
M). Many BM configurations are conceivable, but it is disadvantageous in terms of cost in consideration of the occurrence of steps at the boundary between adjacent colored layers and light transmittance. However, a Cr thin film having a thickness of about 0.1 μm is simple. And reasonable.
【0011】なお、図9において理解を簡単にするた
め、TFT10,走査線11および蓄積容量17に加え
て裏面光源やスペーサなどの構成要素も省略している。
23は絵素電極14とTFT10のドレインとを接続す
るための導電性薄膜で、一般的には信号線12と同一の
部材で同時に形成されドレイン配線(電極)と称され
る。ここでは図示しなかったが、対向電極15は画像表
示部より僅かに外よりの外周部で適当な導電性ペースト
を介してTFT10を有するアクティブ基板2の上の適
当な導電性パターンに接続され、電極端子群5,6の一
部に組み込まれて電気的接続が与えられている。In FIG. 9, for simplicity of understanding, in addition to the TFT 10, the scanning line 11, and the storage capacitor 17, components such as a back light source and a spacer are also omitted.
Reference numeral 23 denotes a conductive thin film for connecting the pixel electrode 14 and the drain of the TFT 10, and is generally formed simultaneously with the same member as the signal line 12 and is called a drain wiring (electrode). Although not shown here, the counter electrode 15 is connected to an appropriate conductive pattern on the active substrate 2 having the TFT 10 via an appropriate conductive paste at an outer peripheral portion slightly outside the image display portion, Electrical connection is provided by being incorporated in a part of the electrode terminal groups 5 and 6.
【0012】図10は従来の液晶パネル1の走査線側の
周縁部における断面図を示し、アクティブ基板2とカラ
ーフィルタ9とを接着性の樹脂シール24で封止した状
態図を示す。樹脂シール24の形状は、幅は0.5〜
1.2mm程度で、高さは液晶セルのギャツプ量の数μ
mであり、小型の液晶パネルではスクリーン印刷で効率
よく、また大型の液晶パネルではシール描画機を用いて
異物の転写がないように形成される。FIG. 10 is a sectional view of a peripheral portion of the conventional liquid crystal panel 1 on the scanning line side, and shows a state in which the active substrate 2 and the color filter 9 are sealed with an adhesive resin seal 24. The width of the shape of the resin seal 24 is 0.5 to
The height is about 1.2 mm and the height is several μ
m, which is efficiently formed by screen printing on a small liquid crystal panel, and formed so as not to transfer foreign matter using a seal drawing machine on a large liquid crystal panel.
【0013】画像表示部の周辺は液晶パネルを斜めから
見た時に裏面からの不要な光が漏洩してこないように、
所定の配列数以上の着色層19'とBM22'とが配置さ
れている。25はゲート絶縁層、26はパシベーション
絶縁層である。In order to prevent unnecessary light from leaking from the back side when the liquid crystal panel is viewed obliquely around the image display section,
The colored layers 19 'and the BMs 22' are arranged in a predetermined number or more. 25 is a gate insulating layer and 26 is a passivation insulating layer.
【0014】最新の液晶パネルは狭額縁化、すなわち画
像表示部外の領域は出来るだけ小さく設計して表示機器
の軽量化と小型化を推進中であり、そのためシール24
も出来るだけ画像表示部に近づけて配置される。この結
果、シール24の上にはBM22'を配置せざるを得な
くなる。The latest liquid crystal panel is designed to have a narrower frame, that is, the area outside the image display unit is designed to be as small as possible to promote the reduction of the weight and size of the display device.
It is also arranged as close to the image display as possible. As a result, the BM 22 'must be arranged on the seal 24.
【0015】それと同時に、対角25cm以上の大型パ
ネルにおいても表示容量と表示画質の向上のために高精
細化が同時に進行し、開口率の確保も要求される結果、
BM幅を細くすると同時に液晶パネルを構成する2枚の
ガラス基板2,9の貼り合せ精度向上が俄かに技術的課
題となってきた。具体的には貼り合せ精度が、従来は数
μmで十分であったが、開口率を80%以上に高めるた
めには2μm以下の高精度を要求されるようになってき
た。At the same time, even in a large-sized panel having a diagonal width of 25 cm or more, high definition is simultaneously promoted in order to improve display capacity and display image quality, and as a result, it is required to secure an aperture ratio.
Improving the bonding accuracy of the two glass substrates 2 and 9 constituting the liquid crystal panel at the same time as reducing the BM width has suddenly become a technical problem. Specifically, the pasting accuracy of several μm was sufficient in the past, but in order to increase the aperture ratio to 80% or more, high accuracy of 2 μm or less has come to be required.
【0016】液晶パネルの貼り合せ精度は、アクティブ
基板とカラーフィルタの加工精度および貼り合せ工程に
おける上記二つの基板の貼り合せ精度の総和であり、当
然のことではあるが液晶パネルが大きい程、ガラス基板
が大きい程、ガラス基板の反りやウネリも加算されて精
度は低下する。The bonding accuracy of the liquid crystal panel is the sum of the processing accuracy of the active substrate and the color filter and the bonding accuracy of the two substrates in the bonding process. As the substrate is larger, the warpage and undulation of the glass substrate are also added, and the accuracy is reduced.
【0017】貼り合せ時に2枚のガラス基板を精度1〜
2μmで重ねることは、大型基板の高精度露光機の機構
や実力から考えてもさほど困難なことではないが、シー
ル24の硬化工程で上記したガラス基板の反りもあいま
って実用上確保できる精度は数μmに低下してしまうの
が現状である。At the time of bonding, two glass substrates are attached with an accuracy of 1 to
It is not too difficult to overlap at 2 μm in view of the mechanism and ability of a high-precision exposure machine for large substrates, but the accuracy that can be practically secured due to the warpage of the glass substrate in the curing process of the seal 24 is At present, it is reduced to several μm.
【0018】[0018]
【発明が解決しようとする課題】硬化工程の中でも、特
に重要なことは温度の均一性に関わる問題である。ガラ
ス基板の膨張係数は1℃あたり数ppmもあるので、例
えば10℃の温度差が30cmの大きさの2枚のガラス
基板間にあると10〜20μmの伸縮差が生じてしまう
ことになる。このため、硬化工程における加熱・冷却は
徐熱・徐冷が必須であるが、余りに時間をかけて生産性
を低下させるわけにもいかない。Among the curing steps, one of the most important is the problem of temperature uniformity. Since the expansion coefficient of a glass substrate is several ppm per 1 ° C., for example, if a temperature difference of 10 ° C. exists between two glass substrates having a size of 30 cm, a difference in expansion and contraction of 10 to 20 μm occurs. Therefore, gradual heating and gradual cooling are indispensable for heating and cooling in the curing step, but it cannot be reduced too much time to reduce productivity.
【0019】シール樹脂の熱硬化に当たり100℃以下
の低温化も検討されているが、一般的に硬化温度が低く
なると、気密性と密着性の低下は免れない。またシール
樹脂中の残留溶剤が液晶に溶け込んで液晶セルの保持率
が低下し、高温および長期動作時に液晶パネルの表示特
性が劣化することも避けられない。Attempts have been made to lower the temperature to 100 ° C. or less in the heat curing of the sealing resin. However, generally, when the curing temperature is lowered, the airtightness and the adhesion are inevitably reduced. In addition, it is inevitable that the residual solvent in the sealing resin dissolves in the liquid crystal and the retention of the liquid crystal cell is reduced, and the display characteristics of the liquid crystal panel are deteriorated at high temperatures and during long-term operation.
【0020】カラーフィルタの作製に関しても、コスト
的な観点から使用される露光機はプロキシミテイ方式の
ものが大半で、精度的にはトータルピッチ2μm程度が
量産の限界であり、高精度の貼り合せには色々と課題が
多い。Regarding the production of color filters, most of the exposure apparatuses used from the viewpoint of cost are of the proximity type, and the total pitch of about 2 μm is the limit of mass production. Has many issues.
【0021】[0021]
【課題を解決するための手段】本発明はかかる現状に鑑
みなされたもので、色表示機能を有する着色層をアクテ
ィブ基板の上に形成することにより、従来の貼り合わせ
に関連する諸課題を回避せんとするものである。SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and has various problems associated with the conventional bonding by forming a colored layer having a color display function on an active substrate. It is something you want to do.
【0022】本発明のカラー液晶パネルは、第1の透明
絶縁基板の上に、そこに形成された絶縁ゲート型トラン
ジスタのドレイン電極の上に開口部を有する着色層が色
毎に信号線の一部を含んでストライプ状に形成されると
ともに、絶縁ゲート型トランジスタの上には複数の着色
層が形成され、着色層間に位置する信号線の上に電着法
により染料または顔料の何れかもしくは両方を含む黒色
着色層が形成され、ドレイン電極を含んで着色層の上と
黒色着色層の上に絵素電極が形成されたアクティブ基板
を備え、このアクティブ基板と、一主面の上に透明導電
層を有する第2の透明絶縁基板とを、その間に液晶を充
填してパネル化したものである。In the color liquid crystal panel according to the present invention, a colored layer having an opening on a first transparent insulating substrate and on a drain electrode of an insulated gate transistor formed thereon is provided for each signal line for each color. And a plurality of colored layers are formed on the insulated gate transistor, and one or both of a dye and a pigment are formed on a signal line positioned between the colored layers by an electrodeposition method. Is formed, and an active substrate is formed on which a pixel electrode is formed on the colored layer including the drain electrode and on the black colored layer, including the drain electrode. A second transparent insulating substrate having a layer is filled with liquid crystal therebetween to form a panel.
【0023】[0023]
【発明の実施の形態】請求項1に記載の液晶パネルは、
第1の透明絶縁基板の一主面の上に複数本の走査線を有
し、少なくとも一層以上の絶縁層を介して前記走査線と
概ね直交する複数の信号線を有し、前記走査線と前記信
号線との交点毎に少なくとも一つの絶縁ゲート型トラン
ジスタと透明導電性の絵素電極を有し、前記絵素電極下
に顔料を含む着色層を有して形成されたアクティブ基板
と、一主面の上に透明導電層を有し前記アクティブ基板
と対向する第2の透明絶縁基板との間に充填された液晶
とを備えた液晶パネルであって、第1の透明絶縁基板の
上に形成された絶縁ゲート型トランジスタのドレイン電
極の上に開口部を有する着色層が信号線の一部を含んで
ストライプ状に形成されるとともに、絶縁ゲート型トラ
ンジスタの上には複数の着色層が形成され、着色層間の
信号線の上に染料または顔料の何れかもしくは両方を含
む黒色着色層が形成され、ドレイン電極を含んで着色層
の上と黒色着色層の上とに絵素電極が形成されているこ
とを特徴とする。DESCRIPTION OF THE PREFERRED EMBODIMENTS The liquid crystal panel according to claim 1 is
A plurality of scanning lines are provided on one main surface of the first transparent insulating substrate, and a plurality of signal lines that are substantially orthogonal to the scanning lines via at least one or more insulating layers. An active substrate having at least one insulated gate transistor and a transparent conductive picture element electrode at each intersection with the signal line, and having a colored layer containing a pigment under the picture element electrode; A liquid crystal panel having a transparent conductive layer on the main surface and having a liquid crystal filled between the active substrate and a second transparent insulating substrate facing the active substrate, wherein the liquid crystal panel is provided on the first transparent insulating substrate. A coloring layer having an opening is formed in a stripe shape including a part of the signal line on the drain electrode of the formed insulated gate transistor, and a plurality of coloring layers are formed on the insulated gate transistor. Dye on the signal line between the colored layers Others are black colored layer is formed containing either or both of the pigment, characterized in that the picture element electrode and on the upper and black coloring layer color layer includes a drain electrode are formed.
【0024】請求項2に記載の液晶パネルは、第1の透
明絶縁基板の一主面の上に複数本の走査線を有し、少な
くとも一層以上の絶縁層を介して前記走査線と概ね直交
する複数の信号線を有し、前記走査線と前記信号線との
交点毎に少なくとも一つの絶縁ゲート型トランジスタと
透明導電性の絵素電極を有し、前記絵素電極下に顔料を
含む着色層を有して形成されたアクティブ基板と、一主
面上に透明導電層を有し前記アクティブ基板と対向する
第2の透明絶縁基板との間に充填された液晶とを備えた
液晶パネルであって、第1の透明絶縁基板の上に形成さ
れた絶縁ゲート型トランジスタのドレイン電極の上に開
口部を有する着色層が信号線の一部を含んでストライプ
状に形成されるとともに、絶縁ゲート型トランジスタの
上には複数の着色層が形成され、着色層間の信号線の上
に染料または顔料の何れかもしくは両方を含む黒色着色
層が形成され、ドレイン電極の上の開口部が導電性材質
で埋められ、前記導電性材質を含んで着色層の上と黒色
着色層の上とに絵素電極が形成されていることを特徴と
する。A liquid crystal panel according to a second aspect has a plurality of scanning lines on one main surface of the first transparent insulating substrate, and is substantially orthogonal to the scanning lines via at least one or more insulating layers. Having at least one insulated gate transistor and a transparent conductive pixel electrode at each intersection of the scanning line and the signal line, and including a pigment under the pixel electrode A liquid crystal panel comprising: an active substrate formed with a layer; and a liquid crystal filled between a second transparent insulating substrate having a transparent conductive layer on one main surface and facing the active substrate. A colored layer having an opening on the drain electrode of the insulated gate transistor formed on the first transparent insulating substrate is formed in a stripe shape including a part of the signal line, and the insulated gate is formed. More than one color on type transistor Is formed, a black coloring layer containing either or both of a dye and a pigment is formed on the signal line between the coloring layers, the opening above the drain electrode is filled with a conductive material, and the conductive material is included. And a picture element electrode is formed on the colored layer and on the black colored layer.
【0025】請求項3に記載の液晶パネルは、第1の透
明絶縁基板の一主面の上に複数本の走査線を有し、少な
くとも一層以上の絶縁層を介して前記走査線と概ね直交
する複数の信号線を有し、前記走査線と前記信号線との
交点毎に少なくとも一つの絶縁ゲート型トランジスタと
透明導電性の絵素電極を有し、前記絵素電極下に顔料を
含む着色層を有して形成されたアクティブ基板と、一主
面の上に透明導電層を有し前記アクティブ基板と対向す
る第2の透明絶縁基板との間に充填された液晶とを備え
た液晶パネルであって、第1の透明絶縁基板の上に形成
された絶縁ゲート型トランジスタのドレイン電極の上に
第1の開口部を有する着色層が信号線の一部を含んでス
トライプ状に形成されるとともに、絶縁ゲート型トラン
ジスタの上には複数の着色層が形成され、着色層間の信
号線の上に染料または顔料の何れかもしくは両方を含む
黒色着色層が形成され、第1の開口部の上に第2の開口
部を有する透明絶縁層が前記着色層と黒色着色層の上に
形成され、第2の開口部内のドレイン電極を含んで着色
層の上と黒色着色層の上の透明絶縁層の上に絵素電極が
形成されていることを特徴とする。A liquid crystal panel according to a third aspect has a plurality of scanning lines on one main surface of the first transparent insulating substrate, and is substantially orthogonal to the scanning lines via at least one or more insulating layers. Having at least one insulated gate transistor and a transparent conductive pixel electrode at each intersection of the scanning line and the signal line, and including a pigment under the pixel electrode A liquid crystal panel comprising: an active substrate formed with a layer; and a liquid crystal filled between a second transparent insulating substrate having a transparent conductive layer on one main surface and facing the active substrate. Wherein a colored layer having a first opening is formed in a stripe shape including a part of a signal line on a drain electrode of an insulated gate transistor formed on a first transparent insulating substrate. With the insulated gate transistor Is formed on the signal line between the colored layers, a black colored layer containing either or both of the dye and the pigment is formed, and the transparent insulating layer having the second opening on the first opening Is formed on the coloring layer and the black coloring layer, and a pixel electrode is formed on the coloring layer including the drain electrode in the second opening and on the transparent insulating layer on the black coloring layer. It is characterized by the following.
【0026】請求項4に記載の液晶パネルの製造方法
は、請求項1に記載の液晶パネルの製造方法であって、
第1の透明絶縁基板の上に走査線,信号線、および絶縁
ゲート型トランジスタを形成する工程と,絶縁ゲート型
トランジスタのドレイン電極の上に開口部を有し顔料を
含む着色層を絶縁ゲート型トランジスタの上に複数の着
色層を形成するように、信号線の一部を含んで色毎
(R,G,B)にストライプ状に形成する工程と、前記
開口部の上および走査線と信号線の端子電極の上に感光
性樹脂を残す工程と、電着によって信号線の上に染料ま
たは顔料の何れかもしくは両方を含む黒色着色層を形成
する工程と、前記感光性樹脂を除去後、前記開口部を含
んで着色層と黒色着色層の上に透明導電性の絵素電極を
形成する工程とを有することを特徴とする。A method for manufacturing a liquid crystal panel according to a fourth aspect is the method for manufacturing a liquid crystal panel according to the first aspect,
Forming a scanning line, a signal line, and an insulated gate transistor on a first transparent insulating substrate; and forming a colored layer having an opening on a drain electrode of the insulated gate transistor and containing a pigment by an insulated gate type. Forming a plurality of colored layers on the transistor in a stripe shape for each color (R, G, B) including a part of the signal line; Step of leaving a photosensitive resin on the terminal electrode of the line, and a step of forming a black colored layer containing either or both of a dye and a pigment on the signal line by electrodeposition, after removing the photosensitive resin, Forming a transparent conductive picture element electrode on the colored layer and the black colored layer including the opening.
【0027】請求項5に記載の液晶パネルの製造方法
は、請求項2に記載の液晶パネルの製造方法であって、
第1の透明絶縁基板の上に走査線,信号線,および絶縁
ゲート型トランジスタを形成する工程と、絶縁ゲート型
トランジスタのドレイン電極の上に開口部を有し顔料を
含む着色層を、絶縁ゲート型トランジスタの上に複数の
着色層を形成するように、信号線の一部を含んで色毎
(R,G,B)にストライプ状に形成する工程と、前記
開口部の上および走査線と信号線の端子電極の上とに感
光性樹脂を残す工程と、電着によって信号線の上に染料
または顔料の何れかもしくは両方を含む黒色着色層を形
成する工程と、前記感光性樹脂を除去後、前記開口部内
を無電界メッキによって導電性材質で埋める工程と、前
記導電性材質を含んで着色層と黒色着色層の上に透明導
電性の絵素電極を形成する工程とを有することを特徴と
する。A method of manufacturing a liquid crystal panel according to a fifth aspect is the method of manufacturing a liquid crystal panel according to the second aspect,
Forming a scanning line, a signal line, and an insulated gate transistor on a first transparent insulating substrate; and forming a colored layer having an opening and containing a pigment on a drain electrode of the insulated gate transistor by using an insulated gate. Forming stripes for each color (R, G, B) including a part of the signal line so as to form a plurality of colored layers on the type transistor; Leaving the photosensitive resin on the terminal electrode of the signal line, forming a black colored layer containing either or both of the dye and the pigment on the signal line by electrodeposition, and removing the photosensitive resin Thereafter, a step of filling the inside of the opening with a conductive material by electroless plating, and a step of forming a transparent conductive pixel electrode on the colored layer and the black colored layer containing the conductive material. Features.
【0028】請求項6に記載の液晶パネルの製造方法
は、請求項3に記載の液晶パネルの製造方法であって、
第1の透明絶縁基板の上に走査線,信号線,および絶縁
ゲート型トランジスタを形成する工程と、絶縁ゲート型
トランジスタのドレイン電極の上に第1の開口部を有し
顔料を含む着色層を絶縁ゲート型トランジスタの上に複
数の着色層を形成するように、信号線の一部を含んで色
毎(R,G,B)にストライプ状に形成する工程と、第
1の開口部の上および走査線と信号線の端子電極の上と
に感光性樹脂を残す工程と、電着によって信号線の上に
染料または顔料の何れかもしくは両方を含む黒色着色層
を形成する工程と、前記感光性樹脂を除去後、第1の開
口部の上に第2の開口部を有する透明絶縁層を着色層と
黒色着色層の上に形成する工程と、第2の開口部を含ん
で着色層と黒色着色層の上の透明絶縁層の上に透明導電
性の絵素電極を形成する工程とを有することを特徴とす
る。請求項1の液晶パネルによれば、色表示機能を有す
る着色層が絵素電極下に、またBM機能を有する黒色着
色層が信号線の上に、それぞれ高精度で形成されている
ので開口率を高めることができ、カラーフィルタを用い
ることなくカラー液晶パネルが得られる。According to a sixth aspect of the present invention, there is provided a method of manufacturing a liquid crystal panel, comprising the steps of:
Forming a scan line, a signal line, and an insulated gate transistor on a first transparent insulating substrate; and forming a colored layer having a first opening and containing a pigment on a drain electrode of the insulated gate transistor. Forming stripes for each color (R, G, B) including a part of the signal line so as to form a plurality of colored layers on the insulated gate transistor; And a step of leaving a photosensitive resin on the terminal electrodes of the scanning lines and the signal lines, a step of forming a black colored layer containing one or both of a dye and a pigment on the signal lines by electrodeposition, Forming a transparent insulating layer having a second opening on the first opening on the colored layer and the black colored layer after removing the conductive resin; and forming a colored layer including the second opening on the colored layer. A transparent conductive pixel electrode is formed on the transparent insulating layer on the black colored layer. Characterized by a step of. According to the liquid crystal panel of the first aspect, the coloring layer having the color display function is formed under the pixel electrode, and the black coloring layer having the BM function is formed on the signal line with high precision. And a color liquid crystal panel can be obtained without using a color filter.
【0029】請求項2の液晶パネルによれば、ドレイン
電極の上の着色層に形成された開口部が導電性材質で埋
められて平坦化されているので、請求項1と同じ作用に
加えて絵素電極とドレイン電極との電気的接触が確実に
なる。According to the liquid crystal panel of the second aspect, the opening formed in the coloring layer above the drain electrode is filled with a conductive material and flattened. Electrical contact between the pixel electrode and the drain electrode is ensured.
【0030】請求項3の液晶パネルによれば、着色層と
黒色着色層とが透明絶縁層で覆われるので、請求項1と
同じ作用に加えて着色層や黒色着色層からの不純物の溶
出や好ましからざるガスの放出が抑制され、液晶パネル
の信頼性が向上する。According to the liquid crystal panel of the present invention, the colored layer and the black colored layer are covered with the transparent insulating layer. The release of unwanted gas is suppressed, and the reliability of the liquid crystal panel is improved.
【0031】請求項4の液晶パネルの製造方法によれ
ば、パネル製造に際し、信号線の上に黒色着色層が電着
で形成されるので、着色層と黒色着色層との段差が解消
され、請求項1と同じ作用に加えて配向処理が容易とな
り、表示画質が向上する作用がある。According to the method of manufacturing a liquid crystal panel of the present invention, the black colored layer is formed by electrodeposition on the signal line when the panel is manufactured, so that the step between the colored layer and the black colored layer is eliminated. In addition to the same effect as in the first aspect, there is an effect that the alignment processing is facilitated and the display image quality is improved.
【0032】請求項5の液晶パネルの製造方法によれ
ば、ドレイン電極の上の着色層に形成された開口部が導
電性材質で埋められて平坦化されるので、請求項2と同
じ作用に加えて着色層への開口部形成時の加工条件への
制約が緩和される。According to the method of manufacturing a liquid crystal panel of the present invention, the opening formed in the coloring layer on the drain electrode is filled with a conductive material and flattened. In addition, restrictions on processing conditions when forming an opening in the colored layer are eased.
【0033】請求項6の液晶パネルの製造方法によれ
ば、請求項3と同じ作用に加えて、ドレイン電極の上の
着色層に形成された第1の開口部を覆って透明絶縁層が
被着され、さらに透明絶縁層に第2の開口部が形成され
てドレイン電極が露出するので、絵素電極が段切れしに
くくなりドレイン電極との電気的接触が安定化する。According to the liquid crystal panel manufacturing method of the sixth aspect, in addition to the same function as the third aspect, the transparent insulating layer covers the first opening formed in the coloring layer above the drain electrode. Then, since the second opening is formed in the transparent insulating layer to expose the drain electrode, the pixel electrode is less likely to be disconnected, and the electrical contact with the drain electrode is stabilized.
【0034】以下本発明の実施の形態について図1〜図
5を用いて説明する。なお、従来例と同一の機能を有す
る部位については同じ符号を付すことにする。 (実施の形態1)図1は本発明の(実施の形態1)のア
クティブ基板を示し、図2(a)〜(d),図3(a)
(b),図4は図1のA−A’線上の工程断面図を示
す。An embodiment of the present invention will be described below with reference to FIGS. Parts having the same functions as those of the conventional example are denoted by the same reference numerals. (Embodiment 1) FIG. 1 shows an active substrate according to (Embodiment 1) of the present invention, and FIGS. 2 (a) to 2 (d) and FIG. 3 (a).
(B), FIG. 4 is a process sectional view taken along line AA ′ of FIG.
【0035】図1において、31は第1の透明絶縁基板
2の絶縁ゲート型トランジスタの上に2種類の着色層1
9を積層化して形成された光シールド、32は絶縁ゲー
ト型トランジスタのドレイン電極の上の着色層19に形
成された開口部であり、着色層19は信号線12の一部
を含んで色毎(R,G,B)にストライプ状に形成され
ている。34は着色層19間の信号線12の上に形成さ
れた黒色着色層である。透明導電性の絵素電極14はこ
れら着色層19の上に形成されている。In FIG. 1, reference numeral 31 denotes two types of colored layers 1 on an insulated gate transistor of a first transparent insulating substrate 2.
Reference numeral 32 denotes an opening formed in the coloring layer 19 above the drain electrode of the insulated gate transistor, and the coloring layer 19 includes a part of the signal line 12 for each color. (R, G, B) are formed in a stripe shape. Reference numeral 34 denotes a black colored layer formed on the signal line 12 between the colored layers 19. The transparent conductive picture element electrode 14 is formed on these colored layers 19.
【0036】(実施の形態1)における工程では、まず
図2(a)に示されたように、第1の透明絶縁基板2の
一主面の上に少なくともスイッチング素子である絶縁ゲ
ート型トランジスタ10(図示せず)と走査線11、信
号線12およびドレイン電極23を逐次形成して第1の
透明絶縁基板2をアクティブ化する。25は先述したよ
うにゲート絶縁層などの透明な絶縁層である。In the process of the first embodiment, first, as shown in FIG. 2A, at least one insulated gate transistor 10 serving as a switching element is provided on one main surface of the first transparent insulating substrate 2. (Not shown), the scanning line 11, the signal line 12, and the drain electrode 23 are sequentially formed to activate the first transparent insulating substrate 2. 25 is a transparent insulating layer such as a gate insulating layer as described above.
【0037】次に、図2(b)〜(d)に示したよう
に、顔料を分散させた感光性樹脂を用いて写真食刻法
で、ドレイン電極23の上に開口部32を有する顔料を
含む着色層19を信号線12の一部を含んで色毎(R,
G,B)にストライプ(縦縞)状に形成する。この時、
絶縁ゲート型トランジスタ10を外部の光から遮断する
光シールドを形成するため、R,G,Bの3色の内の2
色を信号線12とドレイン電極23間に位置する絶縁ゲ
ート型トランジスタ10(図示せず)上に光シールド3
1を島状に残して積層化する必要がある。これは、着色
層19はある幅の波長の光を透過する性質を持っている
が、それらの内の二つを重ね合わせると全ての組み合わ
せで可視光は殆ど透過できなくなる性質を利用し、光シ
ールド31を金属薄膜に代えて構成するためである。図
2(b)ではRの着色層19を形成し、図2(c)では
次にGの着色層19を形成し、図2(d)では最後にB
の着色層19を形成しているところを示す。Next, as shown in FIGS. 2B to 2D, a pigment having an opening 32 on the drain electrode 23 is formed by photolithography using a photosensitive resin in which the pigment is dispersed. The colored layer 19 including a part of the signal line 12 for each color (R,
G, B) in the form of stripes (vertical stripes). At this time,
In order to form a light shield that shields the insulated gate transistor 10 from external light, two out of three colors of R, G, and B are used.
A light shield 3 is provided on the insulated gate transistor 10 (not shown) located between the signal line 12 and the drain electrode 23.
It is necessary to laminate the layers 1 while leaving them in an island shape. This is because the coloring layer 19 has a property of transmitting light of a certain wavelength, but when two of them are overlapped, visible light can hardly be transmitted in all combinations. This is because the shield 31 is configured in place of the metal thin film. In FIG. 2B, an R colored layer 19 is formed, in FIG. 2C, a G colored layer 19 is formed next, and in FIG.
In which the colored layer 19 is formed.
【0038】ストライプ状の着色層19の形成後、図3
(a)に示したように、通常の写真食刻によりドレイン
電極23の上の開口部32を感光性樹脂33で覆う。こ
の時、図示はしないが、信号線12の端子電極5の上に
も感光性樹脂33を残しておく必要がある。走査線11
の端子電極6の上は電圧が印可されないので必要性はな
いが、電着時の不要な汚染から逃れるためにも走査線1
1の端子電極6の上にも感光性樹脂33を残しておくの
が良い。After the formation of the striped colored layer 19, FIG.
As shown in (a), the opening 32 above the drain electrode 23 is covered with a photosensitive resin 33 by ordinary photographic etching. At this time, although not shown, it is necessary to leave the photosensitive resin 33 also on the terminal electrode 5 of the signal line 12. Scanning line 11
Since no voltage is applied to the terminal electrodes 6 of the scanning lines 1, there is no necessity.
It is preferable to leave the photosensitive resin 33 on the one terminal electrode 6 as well.
【0039】その後、電着法により信号線12の上に黒
い染料または顔料の何れかもしくは両方を含む黒色着色
層34を析出させる。そのためには、全ての信号線12
は並列または直列に接続されている必要があり、適当な
電位供給個所をアクティブ基板2の周縁部に設けてお
き、電位供給個所にクリップなどの冶具を用いて直流電
位を与え、適当な容器中の電着液中にアクティブ基板2
を浸漬させることで電着が実施されるが、ここでは詳細
は省略する。Thereafter, a black colored layer 34 containing one or both of a black dye and a pigment is deposited on the signal line 12 by an electrodeposition method. To do so, all signal lines 12
Must be connected in parallel or in series. An appropriate potential supply point is provided on the periphery of the active substrate 2 and a DC potential is applied to the potential supply point using a jig such as a clip, and the potential is supplied to an appropriate container. Active substrate 2 in electrodeposition liquid
Is immersed in the electrodeposition, but details are omitted here.
【0040】黒色着色層34の厚みは着色層19と同じ
になるようにして、着色層19と黒色着色層34とがほ
ぼ平坦となるようにする。もちろん、3色(R,G,
B)の着色層19も厚みが揃うように顔料の分散度と透
過率を考慮しておくことが望ましい。黒色着色層34の
形成後にドレイン電極23の上の感光性樹脂33を除去
して再び開口部32を露出した状態が図3(b)に示さ
れている。The thickness of the black colored layer 34 is made the same as that of the colored layer 19 so that the colored layer 19 and the black colored layer 34 are substantially flat. Of course, three colors (R, G,
It is desirable to consider the degree of dispersion and transmittance of the pigment so that the thickness of the colored layer 19 of B) is also uniform. FIG. 3B shows a state in which the photosensitive resin 33 on the drain electrode 23 is removed after the formation of the black colored layer 34 and the opening 32 is exposed again.
【0041】アクティブ基板として最後の工程は、図4
に示したように、スパッタなどの真空製膜装置を用いて
アクティブ基板2の全面に透明導電性のITO薄膜を被
着し、微細加工技術によりドレイン電極23の上の開口
部32を含んで着色層19と黒色着色層34の上に絵素
電極14を形成することである。The last step as an active substrate is shown in FIG.
As shown in (1), a transparent conductive ITO thin film is deposited on the entire surface of the active substrate 2 by using a vacuum film forming apparatus such as sputtering, and colored including the opening 32 above the drain electrode 23 by a fine processing technique. The purpose is to form the pixel electrode 14 on the layer 19 and the black colored layer 34.
【0042】色表示機能を有する着色層19を形成され
たアクティブ基板2は、この後透明導電層を一主面の上
に形成された第2の透明絶縁基板と貼り合わせられてパ
ネル化され、カラー液晶パネルが完成する。The active substrate 2 on which the colored layer 19 having a color display function is formed is thereafter bonded to a second transparent insulating substrate formed on one principal surface of the active substrate 2 to form a panel. The color liquid crystal panel is completed.
【0043】(実施の形態2)図5は本発明の(実施の
形態2)のアクティブ基板の工程を示す。この(実施の
形態2)においても図2(a)〜(d)と図3(a),
(b)に示したように、着色層19と黒色着色層34の
形成までは(実施の形態1)と同一の製造工程で進行
し、引き続き、図5(a)に示したように、ドレイン電
極23の上の着色層19に形成されている開口部32を
無電界メッキによって、導電性材質35、例えばニッケ
ルなどの金属で着色層19の厚み分とほぼ等しい厚みで
埋めて平坦化する。これは顔料を含む着色層19には一
般的にはネガ型のものが使用されるが、顔料による紫外
線の吸収によって着色層19に形成された開口部32の
断面形状は逆テーパとなり易く、後続する透明導電性の
絵素電極の形成時に開口部32のエッジで絵素電極14
が段切れを起こさないようにするためである。(Embodiment 2) FIG. 5 shows a process of an active substrate according to (Embodiment 2) of the present invention. Also in this (Embodiment 2), FIGS. 2A to 2D and FIGS.
As shown in FIG. 5B, the steps up to the formation of the colored layer 19 and the black colored layer 34 proceed in the same manufacturing steps as in the first embodiment, and subsequently, as shown in FIG. The opening 32 formed in the coloring layer 19 on the electrode 23 is filled with a conductive material 35, for example, a metal such as nickel, to a thickness substantially equal to the thickness of the coloring layer 19 and flattened by electroless plating. In general, a negative type is used for the coloring layer 19 containing a pigment, but the cross-sectional shape of the opening 32 formed in the coloring layer 19 by absorption of ultraviolet rays by the pigment tends to have an inverse taper. When the transparent conductive picture element electrode is formed, the picture element electrode 14
Is to prevent disconnection.
【0044】なお、無電界メッキ時に導電性材質で構成
されている走査線11と信号線12の端子電極5,6の
上にも導電性材質35が析出するが、これを回避したけ
れば除去可能な樹脂、例えばポリビニルアルコール(P
VA)を端子電極5,6の上に塗布しておけばよい。端
子電極5,6は上述したようにアクティブ基板2の周縁
部に位置し、しかもTCP実装の場合には少なくとも5
0μm以上の大きさを有するので精度の高い塗布方法は
不要である。Note that the conductive material 35 is also deposited on the terminal electrodes 5 and 6 of the scanning line 11 and the signal line 12 made of a conductive material during electroless plating, but if this is to be avoided, it is removed. Possible resins, such as polyvinyl alcohol (P
VA) may be applied on the terminal electrodes 5 and 6. The terminal electrodes 5 and 6 are located on the periphery of the active substrate 2 as described above, and at least 5 in the case of TCP mounting.
Since it has a size of 0 μm or more, a highly accurate coating method is unnecessary.
【0045】導電性材質35で開口部32を埋めた後、
図5(b)に示したように、スパッタなどの真空製膜装
置を用いてアクティブ基板2の全面に透明導電性のIT
O薄膜を被着し、微細加工技術によりドレイン電極23
の上の導電性材質35を含んで着色層19と黒色着色層
34の上に絵素電極14を形成して、(実施の形態2)
によるアクティブ基板2が完成する。そして後に透明導
電層を一主面の上に形成された第2の透明絶縁基板と貼
り合わせられてパネル化され、カラー液晶パネルが完成
する。After filling the opening 32 with the conductive material 35,
As shown in FIG. 5B, a transparent conductive IT is formed on the entire surface of the active substrate 2 by using a vacuum film forming apparatus such as sputtering.
O thin film is applied and the drain electrode 23 is
The pixel electrode 14 is formed on the colored layer 19 and the black colored layer 34 including the conductive material 35 on the substrate (Embodiment 2)
The active substrate 2 is completed. Then, the transparent conductive layer is later attached to a second transparent insulating substrate formed on one main surface to form a panel, and a color liquid crystal panel is completed.
【0046】(実施の形態3)図6は本発明の(実施の
形態3)のアクティブ基板の工程を示す。 (実施の形態3)においても図2(a)〜(d)と図3
(a),(b)に示したように、着色層19と黒色着色
層34の形成までは(実施の形態1)と同一の製造工程
で進行し、引き続き、図6(a)に示したように、アク
ティブ基板2の全面に透明絶縁層36を被着形成し、ド
レイン電極23の上には開口部37を形成する。透明絶
縁層36としては感光性の例えば、日本合成ゴム(株)
製の商品名オプトマーPC302を用いると透明絶縁層
36の形成と開口部37の形成が同時に行え合理的であ
る。(Embodiment 3) FIG. 6 shows a process of an active substrate according to (Embodiment 3) of the present invention. Also in (Embodiment 3), FIGS. 2A to 2D and FIG.
As shown in (a) and (b), the steps up to the formation of the colored layer 19 and the black colored layer 34 proceed in the same manufacturing steps as in (Embodiment 1), and subsequently shown in FIG. As described above, the transparent insulating layer 36 is formed on the entire surface of the active substrate 2, and the opening 37 is formed on the drain electrode 23. The transparent insulating layer 36 is made of a photosensitive material, for example, Nippon Synthetic Rubber Co., Ltd.
The use of Optmer PC302 (trade name) made of the transparent insulating layer 36 and the formation of the opening 37 can be performed at the same time, which is reasonable.
【0047】透明絶縁層36を着色層19と黒色着色層
34の上に形成すると良い理由は、一つには電着法で形
成される黒色着色層34からの好ましからざるイオン性
不純物の液晶中への溶出を防止することであり、二つに
は着色層19と黒色着色層34からの好ましからざるガ
ス放出を防止することである。これらの放出成分は液晶
中に溶け込んで液晶を劣化させる副作用をもたらし易
く、特に高温時の動作では留意せねばならない事項であ
る。三つには、先述したように、開口部32の断面形状
が逆テーパであっても、透明絶縁層36で開口部32内
の側面が埋められて断面形状が正テーパ化し易いからで
ある。The reason why the transparent insulating layer 36 is preferably formed on the colored layer 19 and the black colored layer 34 is, in part, for the reason that undesirable ionic impurities from the black colored layer 34 formed by the electrodeposition method are contained in the liquid crystal. The second is to prevent undesired gas release from the colored layer 19 and the black colored layer 34. These emission components easily dissolve in the liquid crystal and have a side effect of deteriorating the liquid crystal, and this is a matter to be noted particularly in operation at high temperatures. Third, as described above, even if the cross-sectional shape of the opening 32 is an inversely tapered shape, the side surface inside the opening 32 is filled with the transparent insulating layer 36, and the cross-sectional shape is easily tapered.
【0048】そして図示はしないが、透明絶縁層36を
厚く、例えば2〜3μmの厚みで形成すれば絶縁ゲート
型トランジスタ10の光シールド31として形成された
2種類の着色層の積層化(R+G,G+B,B+R)3
1に伴う段差の発生を吸収してアクティブ基板2の画像
表示部を完全に平坦化できるからである。Although not shown, if the transparent insulating layer 36 is formed thick, for example, with a thickness of 2 to 3 μm, two types of colored layers formed as the light shield 31 of the insulated gate transistor 10 are laminated (R + G, G + B, B + R) 3
This is because the image display portion of the active substrate 2 can be completely flattened by absorbing the generation of the step accompanying 1.
【0049】透明絶縁層36の形成後、図6(b)に示
したように、スパッタなどの真空製膜装置を用いてアク
ティブ基板2の全面に透明導電性のITO薄膜を被着
し、微細加工技術によりドレイン電極23の上の開口部
37を含んで透明絶縁層36の上に絵素電極14を形成
して、(実施の形態3)によるアクティブ基板2が完成
する。そして後に透明導電層を一主面の上に形成された
第2の透明絶縁基板と貼り合わせられてパネル化され、
カラー液晶パネルが完成する。After the formation of the transparent insulating layer 36, as shown in FIG. 6B, a transparent conductive ITO thin film is deposited on the entire surface of the active substrate 2 by using a vacuum film forming apparatus such as sputtering. The picture element electrode 14 is formed on the transparent insulating layer 36 including the opening 37 above the drain electrode 23 by a processing technique, and the active substrate 2 according to the third embodiment is completed. Then, the transparent conductive layer is later attached to a second transparent insulating substrate formed on one main surface to form a panel,
The color liquid crystal panel is completed.
【0050】[0050]
【発明の効果】以上のように本発明の液晶パネルによれ
ば、色表示機能を有する着色層が絵素電極の下に、また
BM機能を有する黒色着色層が信号線の上に高精度で形
成されているので、高い開口率のカラー液晶パネルが得
られ、従来のカラーフィルタとアクティブ基板を用いた
パネル化工程における貼り合わせ時の諸課題は解消させ
ることができる。As described above, according to the liquid crystal panel of the present invention, a colored layer having a color display function is formed under a pixel electrode, and a black colored layer having a BM function is formed on a signal line with high accuracy. Since it is formed, a color liquid crystal panel having a high aperture ratio can be obtained, and various problems at the time of bonding in a panel forming process using a conventional color filter and an active substrate can be solved.
【0051】また、本発明の液晶パネルによれば、上記
と同様に開口率の高い液晶パネルが得られると同時に、
絵素電極とドレイン電極との電気的接触が確実になり、
液晶パネルの信頼性が向上する。According to the liquid crystal panel of the present invention, a liquid crystal panel having a high aperture ratio can be obtained in the same manner as described above.
The electrical contact between the pixel electrode and the drain electrode is ensured,
The reliability of the liquid crystal panel is improved.
【0052】さらに本発明の液晶パネルによれば、上記
と同様に開口率の高い液晶パネルが得られるとともに、
着色層や黒色着色層からの不純物の溶出や好ましからざ
るガスの放出が抑制され、液晶パネルの信頼性、特に高
温動作時の信頼性が著しく向上する。また、透明絶縁層
を厚く形成することで、アクティブ基板表面を平坦化で
きて表示画質が格段と向上する。Further, according to the liquid crystal panel of the present invention, a liquid crystal panel having a high aperture ratio can be obtained in the same manner as described above.
Elution of impurities from the colored layer and the black colored layer and emission of undesired gas are suppressed, and the reliability of the liquid crystal panel, particularly during high-temperature operation, is significantly improved. Further, by forming the transparent insulating layer to be thick, the surface of the active substrate can be flattened, and display quality can be remarkably improved.
【0053】本発明の液晶パネルの製造方法によれば、
黒色着色層が電着で形成されるので、着色層と黒色着色
層との段差が解消されて配向処理が容易となり、表示画
質が向上する。According to the liquid crystal panel manufacturing method of the present invention,
Since the black colored layer is formed by electrodeposition, the step between the colored layer and the black colored layer is eliminated, the alignment process is facilitated, and the display quality is improved.
【0054】また、ドレイン電極上の着色層に形成され
た開口部が導電性材質で埋められて平坦化されること
で、着色層への開口部形成時の加工条件が容易となって
絵素電極とドレイン電極との電気的接触が確実になり、
液晶パネルの信頼性が向上する。Further, since the opening formed in the coloring layer on the drain electrode is filled with a conductive material and flattened, the processing conditions for forming the opening in the coloring layer are facilitated, and The electrical contact between the electrode and the drain electrode is assured,
The reliability of the liquid crystal panel is improved.
【0055】また、着色層と黒色着色層の上に透明絶縁
層を形成する場合、ドレイン電極の上の着色層に形成さ
れた第1の開口部の上に第2の開口部を有する透明絶縁
層が被着され、この第2の開口部を通してドレイン電極
が露出するので、透明絶縁層の上に絵素電極が形成され
ても絵素電極が段切れしにくくなって絵素電極とドレイ
ン電極との電気的接触が確実になり、液晶パネルの信頼
性が向上する等の優れた効果が得られる。When a transparent insulating layer is formed on the colored layer and the black colored layer, a transparent insulating layer having a second opening above the first opening formed in the colored layer above the drain electrode. A layer is deposited, and the drain electrode is exposed through the second opening. Therefore, even if a pixel electrode is formed on the transparent insulating layer, the pixel electrode is less likely to be disconnected and the pixel electrode and the drain electrode Electrical contact with the liquid crystal panel, and excellent effects such as improvement in the reliability of the liquid crystal panel can be obtained.
【0056】以上述べたように、本発明の要件は、顔料
を含む着色層と、着色層間を電着法により染料または顔
料の何れかもしくは両方を含む黒色着色層で埋めてアク
ティブ基板の表面を平坦化し、平坦化されたアクティブ
基板の表面に透明導電性の絵素電極を形成したカラー液
晶パネルであって、絶縁ゲート型トランジスタなどのス
イッチング素子の構成や材料による差異、および電極線
である走査線や信号線の構成や材料による差異があって
も、当然本発明に含まれることは言うまでも無いだろ
う。As described above, the requirement of the present invention is that the surface of the active substrate is filled with a coloring layer containing a pigment and a black coloring layer containing either or both of a dye and a pigment by an electrodeposition method. This is a color liquid crystal panel in which transparent conductive pixel electrodes are formed on the flattened active substrate surface. Differences due to the configuration and material of switching elements such as insulated gate transistors, and scanning as electrode lines. Needless to say, even if there is a difference depending on the configuration or material of the line or the signal line, the difference is included in the present invention.
【図1】本発明の(実施の形態1)にかかるアクティブ
基板の平面図FIG. 1 is a plan view of an active substrate according to a first embodiment of the present invention.
【図2】本発明の(実施の形態1)にかかるアクティブ
基板の工程断面図FIG. 2 is a process cross-sectional view of the active substrate according to the first embodiment of the present invention.
【図3】本発明の(実施の形態1)にかかるアクティブ
基板のその後の工程断面図FIG. 3 is a sectional view of the active substrate according to the first embodiment of the present invention after the process.
【図4】本発明の(実施の形態1)にかかるアクティブ
基板のさらにその後の工程断面図FIG. 4 is a sectional view of a further subsequent step of the active substrate according to the first embodiment of the present invention;
【図5】本発明の(実施の形態2)にかかるアクティブ
基板の工程断面図FIG. 5 is a process sectional view of the active substrate according to the second embodiment of the present invention;
【図6】本発明の(実施の形態3)にかかるアクティブ
基板の工程断面図FIG. 6 is a process sectional view of an active substrate according to a third embodiment of the present invention.
【図7】液晶パネルの実装状態を示す斜視図FIG. 7 is a perspective view showing a mounted state of a liquid crystal panel.
【図8】アクティブ型液晶パネルの等価回路図FIG. 8 is an equivalent circuit diagram of an active liquid crystal panel.
【図9】従来のアクティブ型液晶パネルの要部断面図FIG. 9 is a sectional view of a main part of a conventional active liquid crystal panel.
【図10】従来のカラー液晶パネルの走査線側の周縁部
における断面図FIG. 10 is a cross-sectional view of a peripheral portion on the scanning line side of a conventional color liquid crystal panel.
2 アクティブ基板(第1の透明絶縁基板) 9 カラーフィルタ 12 信号線 14 絵素電極 19 顔料を含む着色層(R,G,B) 23 ドレイン電極 31 2種類の着色層を積層化した光シールド 32 着色層に形成された開口部 33 感光性樹脂 34 黒色着色層 35 導電性材質 36 透明絶縁層 2 Active Substrate (First Transparent Insulating Substrate) 9 Color Filter 12 Signal Line 14 Pixel Electrode 19 Colored Layer Containing Pigment (R, G, B) 23 Drain Electrode 31 Light Shield with Two Types of Colored Layers Stacked 32 Opening formed in colored layer 33 Photosensitive resin 34 Black colored layer 35 Conductive material 36 Transparent insulating layer
Claims (6)
の走査線を有し、少なくとも一層以上の絶縁層を介して
前記走査線と概ね直交する複数の信号線を有し、前記走
査線と前記信号線との交点毎に少なくとも一つの絶縁ゲ
ート型トランジスタと透明導電性の絵素電極を有し、前
記絵素電極下に顔料を含む着色層を有して形成されたア
クティブ基板と、 一主面の上に透明導電層を有し前記アクティブ基板と対
向する第2の透明絶縁基板との間に充填された液晶とを
備えた液晶パネルであって、 第1の透明絶縁基板の上に形成された絶縁ゲート型トラ
ンジスタのドレイン電極の上に開口部を有する着色層が
信号線の一部を含んでストライプ状に形成されるととも
に、 絶縁ゲート型トランジスタの上には複数の着色層が形成
され、 着色層間の信号線の上に染料または顔料の何れかもしく
は両方を含む黒色着色層が形成され、 ドレイン電極を含んで着色層の上と黒色着色層の上とに
絵素電極を形成したカラー液晶パネル。A first transparent insulating substrate having a plurality of scanning lines on one principal surface thereof, and a plurality of signal lines substantially orthogonal to the scanning lines via at least one or more insulating layers; Having at least one insulated gate transistor and a transparent conductive pixel electrode at each intersection of the scanning line and the signal line, and having a colored layer containing a pigment under the pixel electrode. What is claimed is: 1. A liquid crystal panel comprising: an active substrate; and a liquid crystal having a transparent conductive layer on one main surface and filled between a second transparent insulating substrate facing the active substrate. A colored layer having an opening on a drain electrode of an insulated gate transistor formed on an insulating substrate is formed in a stripe shape including a part of a signal line, and a plurality of colored layers are formed on the insulated gate transistor. Colored layer is formed, and the signal between the colored layers A color liquid crystal panel in which a black coloring layer containing either or both of a dye and a pigment is formed on a line, and picture element electrodes are formed on the coloring layer including the drain electrode and on the black coloring layer.
の走査線を有し、少なくとも一層以上の絶縁層を介して
前記走査線と概ね直交する複数の信号線を有し、前記走
査線と前記信号線との交点毎に少なくとも一つの絶縁ゲ
ート型トランジスタと透明導電性の絵素電極を有し、前
記絵素電極下に顔料を含む着色層を有して形成されたア
クティブ基板と、 一主面の上に透明導電層を有し前記アクティブ基板と対
向する第2の透明絶縁基板との間に充填された液晶とを
備えた液晶パネルであって、 第1の透明絶縁基板の上に形成された絶縁ゲート型トラ
ンジスタのドレイン電極の上に開口部を有する着色層が
信号線の一部を含んでストライプ状に形成されるととも
に、 絶縁ゲート型トランジスタの上には複数の着色層が形成
され、 着色層間の信号線の上に染料または顔料の何れかもしく
は両方を含む黒色着色層が形成され、 ドレイン電極の上の開口部が導電性材質で埋められ、 前記導電性材質を含んで着色層の上と黒色着色層の上と
に絵素電極を形成したカラー液晶パネル。2. A semiconductor device comprising: a plurality of scanning lines on one main surface of a first transparent insulating substrate; and a plurality of signal lines substantially orthogonal to the scanning lines via at least one or more insulating layers. Having at least one insulated gate transistor and a transparent conductive pixel electrode at each intersection of the scanning line and the signal line, and having a colored layer containing a pigment under the pixel electrode. What is claimed is: 1. A liquid crystal panel comprising: an active substrate; and a liquid crystal having a transparent conductive layer on one main surface and filled between a second transparent insulating substrate facing the active substrate. A colored layer having an opening on a drain electrode of an insulated gate transistor formed on an insulating substrate is formed in a stripe shape including a part of a signal line, and a plurality of colored layers are formed on the insulated gate transistor. Colored layer is formed, and the signal between the colored layers A black coloring layer containing either or both of a dye and a pigment is formed on the signal line, and the opening above the drain electrode is filled with a conductive material. Color liquid crystal panel with pixel electrodes formed on and above the layer.
の走査線を有し、少なくとも一層以上の絶縁層を介して
前記走査線と概ね直交する複数の信号線を有し、前記走
査線と前記信号線との交点毎に少なくとも一つの絶縁ゲ
ート型トランジスタと透明導電性の絵素電極を有し、前
記絵素電極下に顔料を含む着色層を有して形成されたア
クティブ基板と、 一主面の上に透明導電層を有し前記アクティブ基板と対
向する第2の透明絶縁基板との間に充填された液晶とを
備えた液晶パネルであって、 第1の透明絶縁基板の上に形成された絶縁ゲート型トラ
ンジスタのドレイン電極の上に第1の開口部を有する着
色層が信号線の一部を含んでストライプ状に形成される
とともに、 絶縁ゲート型トランジスタの上には複数の着色層が形成
され、 着色層間の信号線の上に染料または顔料の何れかもしく
は両方を含む黒色着色層が形成され、 第1の開口部の上に第2の開口部を有する透明絶縁層が
前記着色層と黒色着色層の上に形成され、 第2の開口部内のドレイン電極を含んで着色層の上と黒
色着色層の上の前記透明絶縁層の上に絵素電極を形成し
たカラー液晶パネル。3. A first transparent insulating substrate having a plurality of scanning lines on one principal surface thereof, and a plurality of signal lines substantially orthogonal to the scanning lines via at least one insulating layer. Having at least one insulated gate transistor and a transparent conductive pixel electrode at each intersection of the scanning line and the signal line, and having a colored layer containing a pigment under the pixel electrode. What is claimed is: 1. A liquid crystal panel comprising: an active substrate; and a liquid crystal having a transparent conductive layer on one main surface and filled between a second transparent insulating substrate facing the active substrate. A colored layer having a first opening is formed in a stripe shape including a part of a signal line on a drain electrode of an insulated gate transistor formed on an insulating substrate. Is formed with a plurality of colored layers. A black colored layer containing either or both of a dye and a pigment is formed on a signal line between the transparent layer and the transparent layer having a second opening on the first opening. And a pixel electrode formed on the transparent insulating layer on the colored layer including the drain electrode in the second opening and on the black colored layer.
あって、 第1の透明絶縁基板の上に走査線,信号線,および絶縁
ゲート型トランジスタを形成する工程と、 絶縁ゲート型トランジスタのドレイン電極の上に開口部
を有し顔料を含む着色層を絶縁ゲート型トランジスタの
上に複数形成するように、信号線の一部を含んで色毎
(R,G,B)にストライプ状に形成する工程と、 前記開口部の上および走査線と信号線の端子電極の上と
に感光性樹脂を残す工程と、 電着によって信号線の上に染料または顔料の何れかもし
くは両方を含む黒色着色層を形成する工程と、 前記感光性樹脂を除去後、前記開口部を含んで着色層と
黒色着色層の上に透明導電性の絵素電極を形成する工程
とを有するカラー液晶パネルの製造方法。4. A method for manufacturing a liquid crystal panel according to claim 1, wherein: forming a scanning line, a signal line, and an insulated gate transistor on the first transparent insulating substrate; In order to form a plurality of colored layers containing a pigment having an opening on the drain electrode on the insulated gate transistor, a stripe shape is formed for each color (R, G, B) including a part of the signal line. Forming a photosensitive resin over the opening and over the terminal electrodes of the scanning line and the signal line; and including one or both of a dye and a pigment on the signal line by electrodeposition. A step of forming a black colored layer; and a step of forming a transparent conductive picture element electrode on the colored layer and the black colored layer including the opening after removing the photosensitive resin. Production method.
あって、 第1の透明絶縁基板の上に走査線,信号線,および絶縁
ゲート型トランジスタを形成する工程と、 絶縁ゲート型トランジスタのドレイン電極の上に開口部
を有し顔料を含む着色層を絶縁ゲート型トランジスタの
上に複数形成するように、信号線の一部を含んで色毎
(R,G,B)にストライプ状に形成する工程と、 前記開口部および走査線と信号線の端子電極の上とに感
光性樹脂を残す工程と、 電着によって信号線の上に染料または顔料の何れかもし
くは両方を含む黒色着色層を形成する工程と、 前記感光性樹脂を除去後、前記開口部内を無電界メッキ
によって導電性材質で埋める工程と、 前記導電性材質を含んで着色層と黒色着色層の上に透明
導電性の絵素電極を形成する工程とを有するカラー液晶
パネルの製造方法。5. The method of manufacturing a liquid crystal panel according to claim 2, wherein: forming a scanning line, a signal line, and an insulated gate transistor on the first transparent insulating substrate; In order to form a plurality of colored layers containing a pigment having an opening on the drain electrode on the insulated gate transistor, a stripe shape is formed for each color (R, G, B) including a part of the signal line. Forming a photosensitive resin on the terminal portion of the opening and the scanning line and the signal line; and coloring the signal line with a dye or a pigment on the signal line by electrodeposition. A step of forming a layer; a step of filling the inside of the opening with a conductive material by electroless plating after removing the photosensitive resin; and a step of forming a transparent conductive layer on the colored layer and the black colored layer containing the conductive material. Form a pixel electrode Method of manufacturing a color liquid crystal panel and a step.
あって、 第1の透明絶縁基板の上に走査線,信号線,および絶縁
ゲート型トランジスタを形成する工程と、 絶縁ゲート型トランジスタのドレイン電極の上に第1の
開口部を有し顔料を含む着色層を絶縁ゲート型トランジ
スタの上に複数形成するように、信号線の一部を含んで
色毎(R,G,B)にストライプ状に形成する工程と、 第1の開口部の上および走査線と信号線の端子電極の上
とに感光性樹脂を残す工程と、 電着によって信号線の上に染料または顔料の何れかもし
くは両方を含む黒色着色層を形成する工程と、 前記感光性樹脂を除去後、第1の開口部の上に第2の開
口部を有する透明絶縁層を着色層と黒色着色層の上に形
成する工程と、 第2の開口部を含んで着色層と黒色着色層の上の透明絶
縁層の上に透明導電性の絵素電極を形成する工程とを有
するカラー液晶パネルの製造方法。6. A method for manufacturing a liquid crystal panel according to claim 3, wherein: forming a scanning line, a signal line, and an insulated gate transistor on the first transparent insulating substrate; Each of the colors (R, G, B) including a part of the signal line so as to form a plurality of coloring layers containing a pigment having a first opening on the drain electrode and containing a pigment on the insulated gate transistor. Forming a photosensitive resin on the first opening and on the scanning line and the terminal electrode of the signal line; and depositing either a dye or a pigment on the signal line by electrodeposition. Or a step of forming a black colored layer containing both, and after removing the photosensitive resin, forming a transparent insulating layer having a second opening on the first opening on the colored layer and the black colored layer. Forming a colored layer including a second opening and a black layer Method of manufacturing a color liquid crystal panel and a step of forming a transparent conductive pixel electrode on the transparent insulating layer on the color layer.
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JP09304783A JP3107777B2 (en) | 1997-11-07 | 1997-11-07 | Color liquid crystal panel and manufacturing method thereof |
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JP3107777B2 JP3107777B2 (en) | 2000-11-13 |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100434594B1 (en) * | 2000-10-20 | 2004-06-07 | 엔이씨 엘씨디 테크놀로지스, 엘티디. | Active Matrix Type Liquid Crystal Display Device |
JP2010152298A (en) * | 2008-11-21 | 2010-07-08 | Toppan Printing Co Ltd | Thin film transistor, method for manufacturing the same, and image display apparatus |
JP2011186484A (en) * | 1999-09-30 | 2011-09-22 | Samsung Electronics Co Ltd | Thin film transistor substrate for liquid crystal display device and method for manufacturing the same |
US9294542B2 (en) | 2011-05-16 | 2016-03-22 | Wesley John Boudville | Systems and methods for changing an electronic display that contains a barcode |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH076850U (en) * | 1993-06-29 | 1995-01-31 | 日本信号株式会社 | Non-contact automatic ticket gate |
-
1997
- 1997-11-07 JP JP09304783A patent/JP3107777B2/en not_active Expired - Fee Related
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011186484A (en) * | 1999-09-30 | 2011-09-22 | Samsung Electronics Co Ltd | Thin film transistor substrate for liquid crystal display device and method for manufacturing the same |
KR100434594B1 (en) * | 2000-10-20 | 2004-06-07 | 엔이씨 엘씨디 테크놀로지스, 엘티디. | Active Matrix Type Liquid Crystal Display Device |
US7423709B2 (en) | 2000-10-20 | 2008-09-09 | Nec Lcd Technologies, Ltd. | Color filter substrate, manufacturing method of color filter substrate, active matrix type liquid crystal display, and manufacturing method of active matrix type liquid crystal display |
JP2010152298A (en) * | 2008-11-21 | 2010-07-08 | Toppan Printing Co Ltd | Thin film transistor, method for manufacturing the same, and image display apparatus |
US9294542B2 (en) | 2011-05-16 | 2016-03-22 | Wesley John Boudville | Systems and methods for changing an electronic display that contains a barcode |
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JP3107777B2 (en) | 2000-11-13 |
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