JPH11140069A - Epoxy resin, production of the epoxy resin, composition containing the epoxy resin, and epoxy resin composition for sealing semiconductor comprising the composition - Google Patents

Epoxy resin, production of the epoxy resin, composition containing the epoxy resin, and epoxy resin composition for sealing semiconductor comprising the composition

Info

Publication number
JPH11140069A
JPH11140069A JP31049497A JP31049497A JPH11140069A JP H11140069 A JPH11140069 A JP H11140069A JP 31049497 A JP31049497 A JP 31049497A JP 31049497 A JP31049497 A JP 31049497A JP H11140069 A JPH11140069 A JP H11140069A
Authority
JP
Japan
Prior art keywords
epoxy resin
ether
composition
bis
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP31049497A
Other languages
Japanese (ja)
Other versions
JP4218995B2 (en
Inventor
Hideyasu Asakage
秀安 朝蔭
Chiaki Asano
千明 浅野
Yasuko Tabuchi
康子 田淵
Naritsuyo Takuwa
成剛 宅和
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tohto Kasei Co Ltd
Original Assignee
Tohto Kasei Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tohto Kasei Co Ltd filed Critical Tohto Kasei Co Ltd
Priority to JP31049497A priority Critical patent/JP4218995B2/en
Publication of JPH11140069A publication Critical patent/JPH11140069A/en
Application granted granted Critical
Publication of JP4218995B2 publication Critical patent/JP4218995B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Epoxy Compounds (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain the subject new resin capable of reducing a stress without damaging characteristics of the hardened product of the resin such as heat resistance and moisture resistance and useful for a semiconductor sealing mate rial, a molding material, a laminated sheet or the like. SOLUTION: This epoxy resin is the one of formula I [R1 and R2 are each H or CH3 ; R3 to R6 are each H, a 1-10C alkyl or bromine; (n) is a repeating unit of 0-5]. The epoxy resin for formula I is obtained by allowing epichlorohydrin and/or β-methylepichlorohydrin to react with a dihydric phenol- bis(2-hydroxyethyl) ether of formula II. The compound of formula II is obtained by allowing hydroquinone and/or a dihydric hydroquinone derivative having a phenolic hydroxy group or the like to react with ethylene oxide and/or propylene oxide in the presence or absence of the catalyst such as an alkali metal salt at -10 to 300 deg.C.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、新規なエポキシ樹
脂、該エポキシ樹脂の製造方法、該エポキシ樹脂含有組
成物及び該組成物からなるエポキシ樹脂組成物からなる
半導体封止材組成物に関し、さらに詳しくは、低粘度、
耐熱性、低応力等の特性に優れた硬化物を与える新規な
エポキシ樹脂及びその製造方法及びエポキシ樹脂組成物
に関する。従って本発明のエポキシ樹脂を使用したエポ
キシ樹脂組成物は、半導体封止材、成型材料、積層板、
接着剤、塗料などの広範囲の用途に有用である。
The present invention relates to a novel epoxy resin, a method for producing the epoxy resin, a composition containing the epoxy resin, and a semiconductor encapsulant composition comprising the epoxy resin composition comprising the composition. Specifically, low viscosity,
The present invention relates to a novel epoxy resin which gives a cured product having excellent properties such as heat resistance and low stress, a method for producing the same, and an epoxy resin composition. Therefore, the epoxy resin composition using the epoxy resin of the present invention is a semiconductor sealing material, a molding material, a laminate,
Useful for a wide range of applications such as adhesives and paints.

【0002】[0002]

【従来技術】エポキシ樹脂は、その優れた特性により電
気、塗料、建築、土木及び接着等の各種分野で広く使用
されている。しかし近年、各分野においてより特化され
た厳しい特性が要求されている。例えば電気・電子分野
においてTAB(テープ・オートメイテッド・ボンディ
ング)、COB(チップ・オン・ボード)などの従来の
トランスファー成型用樹脂に変わって液状のエポキシ樹
脂組成物を使用してベアチップを封止する表面実装方式
が注目されている。
2. Description of the Related Art Epoxy resins are widely used in various fields such as electricity, paints, architecture, civil engineering, and adhesion due to their excellent properties. However, in recent years, more specialized and strict characteristics have been required in each field. For example, in the electric / electronic field, a bare chip is sealed using a liquid epoxy resin composition instead of a conventional transfer molding resin such as TAB (tape automated bonding) and COB (chip on board). Attention has been paid to the surface mounting method.

【0003】従来の液状封止材樹脂組成物として最も汎
用されているものに、液状もしくは、低融点の結晶性の
ビスフェノールA型及びビスフェノールF型エポキシ樹
脂にエポキシ樹脂硬化剤、シリカ、アルミナ等のフィラ
ー及び反応性希釈剤としてエポキシ基を有する低粘度樹
脂を配合したものがある。
The most widely used conventional liquid sealing resin compositions include liquid or low melting crystalline bisphenol A type and bisphenol F type epoxy resins, as well as epoxy resin curing agents, silica, alumina and the like. There is one in which a low-viscosity resin having an epoxy group is blended as a filler and a reactive diluent.

【0004】特に近年の電子素子の高密度化及び小型化
に伴い液状封止材分野においても、従来以上により優れ
た耐熱性、耐湿性等が求められている。これらの特性を
改善する方法として、トランスファー成型用エポキシ樹
脂組成物の場合と同様にシリカ等のフィラー(充填材)
を多量に充填する方法がある。しかしながら、充填材を
多量に充填することにより液状封止材組成物は、高粘度
化して、成型不良や微細な回路の損傷が発生する問題が
あった。
In particular, with the recent increase in the density and miniaturization of electronic elements, even in the field of liquid sealing materials, better heat resistance, moisture resistance and the like have been demanded. As a method for improving these properties, a filler such as silica is used as in the case of the epoxy resin composition for transfer molding.
There is a method of filling a large amount of. However, when the filler is filled in a large amount, the liquid encapsulant composition has a high viscosity, and there has been a problem that molding defects and fine circuit damage occur.

【0005】[0005]

【発明が解決しようとする課題】この問題点を解決する
手段としてこれまで脂肪族のエポキシ樹脂、例えば1,
6−ヘキサンジオールジグリシジルエーテル、ポリプロ
ピレングリコールジグリシジルエーテル等を反応性希釈
剤として用い、液状封止材樹脂組成物の低粘度化による
フィラーの高充填化及び樹脂硬化物の低弾性率化をはか
る、いわゆる硬化樹脂の低応力化によるパッケージクラ
ック等を防止する方法があるが、ビスフェノール型エポ
キシ樹脂に脂肪族系エポキシ樹脂を配合した液状樹脂組
成物は、長期に貯蔵すると反応性希釈剤として用いた脂
肪族系エポキシ樹脂がブリードアウトし不均一な組成物
となり易く、また、その硬化物特性は、耐熱性の低下及
び吸水率の上昇などの根本的な欠陥を有しており実用上
問題である。また、レゾルシンジグリシジルエーテルを
反応性希釈剤として用いた液状封止材組成物は、反応性
希釈剤を用いた時、耐熱性が低下する問題点の解決には
有効であるが、硬化樹脂の低応力化には、十分満足でき
るものではない。このように従来技術では、耐熱性及び
耐湿性を保持しながら硬化樹脂の低応力化をはかること
は極めて困難である。
As means for solving this problem, aliphatic epoxy resins such as 1,1 have been used.
Using 6-hexanediol diglycidyl ether, polypropylene glycol diglycidyl ether, or the like as a reactive diluent, to increase the filling of filler by lowering the viscosity of the liquid encapsulant resin composition and to lower the elastic modulus of the cured resin. Although there is a method of preventing package cracks and the like due to so-called reduced stress of a cured resin, a liquid resin composition in which an aliphatic epoxy resin is blended with a bisphenol-type epoxy resin has been used as a reactive diluent when stored for a long period of time. Aliphatic epoxy resins tend to bleed out and become non-uniform compositions, and their cured product properties have fundamental defects such as reduced heat resistance and increased water absorption, which is a practical problem. . In addition, the liquid encapsulant composition using resorcin diglycidyl ether as a reactive diluent is effective in solving the problem that heat resistance is reduced when a reactive diluent is used. It is not enough to reduce the stress. As described above, in the related art, it is extremely difficult to reduce the stress of the cured resin while maintaining heat resistance and moisture resistance.

【0006】[0006]

【課題を解決する手段】本発明は、上記の様な実情に鑑
みて、耐熱性、耐湿性等の樹脂硬化物特性を損なうこと
なく低応力化を有するエポキシ樹脂を求めて鋭意検討し
た結果、一般式(I)で表されるエポキシ樹脂を使用し
た組成物は低粘度であり、このエポキシ樹脂の硬化物
は、驚くべきことに耐熱性、耐湿性と低応力を有するこ
とを見出し本発明を完成するに到ったので、本発明の目
的は一般式(I)で表されるエポキシ樹脂及びその製造
方法を提供するものであり、また、エポキシ樹脂及び硬
化剤、さらに必要により硬化促進剤から構成されるエポ
キシ樹脂組成物において、該エポキシ樹脂成分として一
般式(I)で表されるエポキシ樹脂を含有することを特
徴とする新規なエポキシ樹脂組成物並びに該エポキシ樹
脂からなる半導体封止材組成物を提供するものである。
The present invention has been made in view of the above-mentioned circumstances, and as a result of an intensive study for an epoxy resin having low stress without impairing the properties of a cured resin such as heat resistance and moisture resistance, The composition using the epoxy resin represented by the general formula (I) has a low viscosity, and it has been surprisingly found that a cured product of the epoxy resin has heat resistance, moisture resistance and low stress. Since the invention has been completed, an object of the present invention is to provide an epoxy resin represented by the general formula (I) and a method for producing the same. A novel epoxy resin composition characterized by containing an epoxy resin represented by the general formula (I) as the epoxy resin component, and a semiconductor encapsulation comprising the epoxy resin. There is provided a wood composition.

【0007】[0007]

【化3】 Embedded image

【0008】なお、式中、R1,R2は、H又はCH3
示し、同一でも異なっていても良い。R3〜R6は、H又
はC1〜C10のアルキル基又は臭素を示し同一でも異な
っていても良く、nは、0〜5の繰り返し単位を示す。
In the formula, R 1 and R 2 represent H or CH 3 and may be the same or different. R 3 to R 6 represent H or a C 1 to C 10 alkyl group or bromine and may be the same or different, and n represents a 0 to 5 repeating unit.

【0009】即ち、本発明の要旨は、一般式(I)で表
される新規なエポキシ樹脂である。
That is, the gist of the present invention is a novel epoxy resin represented by the general formula (I).

【0010】[0010]

【化4】 なお、式中、R1〜R6及びnは前記の通りである。Embedded image In the formula, R 1 to R 6 and n are as described above.

【0011】本発明の一般式(I)で表されるエポキシ
樹脂は、下記の一般式(II)で示される2価フェノ−ル
−ビス(2−ヒドロキシエチル)エ−テルにエピクロル
ヒドリン及び/または、β−メチルエピクロルヒドリン
を反応させることにより得ることができる。
The epoxy resin represented by the general formula (I) of the present invention can be obtained by adding epichlorohydrin and / or epichlorohydrin to divalent phenol-bis (2-hydroxyethyl) ether represented by the following general formula (II). , Β-methylepichlorohydrin.

【0012】[0012]

【化5】 式中、RはH又はCHを示し、R3〜R6は、H又は
1〜C10のアルキル基又は臭素を示し同一でも異なっ
ていても良い。
Embedded image In the formula, R 2 represents H or CH 3 , and R 3 to R 6 represent H or a C 1 to C 10 alkyl group or bromine, and may be the same or different.

【0013】また、本発明における一般式(II)で示さ
れる2価フェノ−ル−ビス(2−ヒドロキシエチル)エ
−テルは、ハイドロキノン及び2価のフェノール性水酸
基を有するハイドロキノン誘導体、レゾルシン及び2価
のフェノール性水酸基を有するレゾルシン誘導体、カテ
コール及び2価のフェノール性水酸基を有するカテコー
ル誘導体等とエチレンオキサイド及び/又は、プロピレ
ンオキサイドをアルカリ金属塩等の触媒の存在下もしく
は、無触媒下−10〜300℃の温度にて比較的容易に
得ることが出来る。
The divalent phenol-bis (2-hydroxyethyl) ether represented by the general formula (II) according to the present invention comprises hydroquinone and a hydroquinone derivative having a divalent phenolic hydroxyl group, resorcinol and A resorcinol derivative having a divalent phenolic hydroxyl group, catechol and a catechol derivative having a divalent phenolic hydroxyl group and ethylene oxide and / or propylene oxide in the presence of a catalyst such as an alkali metal salt or in the absence of a catalyst. It can be obtained relatively easily at a temperature of 300 ° C.

【0014】上記の方法により得られ本発明に適用でき
る化合物の具体例を列挙すると次の通りであるが、特に
これらに限定されるわけではない。ハイドロキノン−ビ
ス(2−ヒドロキシエチル)エーテル、ハイドロキノン
−ビス(2−ヒドロキシプロピル)エーテル、モノメチ
ルハイドロキノン−ビス(2−ヒドロキシエチル)エー
テル、モノメチルハイドロキノン−ビス(2−ヒドロキ
シプロピル)エーテル、モノ−tert-ブチルハイドロキ
ノン−ビス(2−ヒドロキシエチル)エーテル、モノ−
tert-ブチルハイドロキノン−ビス(2−ヒドロキシプ
ロピル)エ−テル、ジ−tert-ブチルハイドロキノン−
ビス(2−ヒドロキシエチル)エーテル、ジ−tert-ブ
チルハイドロキノン−ビス(2−ヒドロキシプロピル)
エーテル、ジ−tert−アミルハイドロキノン−ビス(2
−ヒドロキシエチル)エーテル、ジ−tert−アミルハイ
ドロキノン−ビス(2−ヒドロキシプロピル)エーテ
ル、臭素化ハイドロキノン−ビス(2−ヒドロキシエチ
ル)エーテル、臭素化ハイドロキノン−ビス(2−ヒド
ロキシプロピル)エーテル等のハイドロキノン及び2価
のフェノール性水酸基を有するハイドロキノン誘導体、
及び、
Specific examples of the compounds obtained by the above method and applicable to the present invention are listed below, but are not particularly limited thereto. Hydroquinone-bis (2-hydroxyethyl) ether, hydroquinone-bis (2-hydroxypropyl) ether, monomethylhydroquinone-bis (2-hydroxyethyl) ether, monomethylhydroquinone-bis (2-hydroxypropyl) ether, mono-tert- Butyl hydroquinone-bis (2-hydroxyethyl) ether, mono-
tert-butylhydroquinone-bis (2-hydroxypropyl) ether, di-tert-butylhydroquinone-
Bis (2-hydroxyethyl) ether, di-tert-butylhydroquinone-bis (2-hydroxypropyl)
Ether, di-tert-amylhydroquinone-bis (2
Hydroquinones such as -hydroxyethyl) ether, di-tert-amylhydroquinone-bis (2-hydroxypropyl) ether, brominated hydroquinone-bis (2-hydroxyethyl) ether and brominated hydroquinone-bis (2-hydroxypropyl) ether And a hydroquinone derivative having a divalent phenolic hydroxyl group,
as well as,

【0015】レゾルシン−ビス(2−ヒドロキシエチ
ル)エーテル、レゾルシン−ビス(2−ヒドロキシプロ
ピル)エーテル、モノメチルレゾルシン−ビス(2−ヒ
ドロキシエチル)エーテル、モノメチルレゾルシン−ビ
ス(2−ヒドロキシプロピル)エーテル、モノ−tert−
ブチルレゾルシン−ビス(2−ヒドロキシエチル)エー
テル、モノ−tert−ブチルレゾルシン−ビス(2−ヒド
ロキシプロピル)エーテル、ジ−tert-ブチルレゾルシ
ン−ビス(2−ヒドロキシエチル)エーテル、ジ−tert
-ブチルレゾルシン−ビス(2−ヒドロキシプロピル)
エーテル、ジ−tert−アミルレゾルシン−ビス(2−ヒ
ドロキシエチル)エーテル、ジ−tert−アミルレゾルシ
ン−ビス(2−ヒドロキシプロピル)エーテル、臭素化
レゾルシン−ビス(2−ヒドロキシエチル)エーテル、
臭素化レゾルシン−ビス(2−ヒドロキシプロピル)エ
ーテル等のレゾルシン及び2価のフェノール性水酸基を
有するレゾルシン誘導体、及び、
Resorcin-bis (2-hydroxyethyl) ether, resorcin-bis (2-hydroxypropyl) ether, monomethylresorcin-bis (2-hydroxyethyl) ether, monomethylresorcin-bis (2-hydroxypropyl) ether, mono -Tert-
Butyl resorcin-bis (2-hydroxyethyl) ether, mono-tert-butyl resorcin-bis (2-hydroxypropyl) ether, di-tert-butyl resorcin-bis (2-hydroxyethyl) ether, di-tert
-Butylresorcin-bis (2-hydroxypropyl)
Ether, di-tert-amyl resorcin-bis (2-hydroxyethyl) ether, di-tert-amyl resorcin-bis (2-hydroxypropyl) ether, brominated resorcin-bis (2-hydroxyethyl) ether,
Resorcinol such as brominated resorcinol-bis (2-hydroxypropyl) ether and a resorcinol derivative having a divalent phenolic hydroxyl group, and

【0016】カテコール−ビス(2−ヒドロキシエチ
ル)エーテル、カテコール−ビス(2−ヒドロキシプロ
ピル)エーテル、モノメチルカテコール−ビス(2−ヒ
ドロキシエチル)エーテル、モノメチルカテコール−ビ
ス(2−ヒドロキシプロピル)エーテル、モノ−tert−
ブチルカテコール−ビス(2−ヒドロキシエチル)エー
テル、モノ−tert−ブチルカテコール−ビス(2−ヒド
ロキシプロピル)エーテル、ジ−tert-ブチルカテコー
ル−ビス(2−ヒドロキシエチル)エーテル、ジ−tert
-ブチルカテコール−ビス(2−ヒドロキシプロピル)
エーテル、ジ−tert−アミルカテコール−ビス(2−ヒ
ドロキシエチル)エーテル、ジ−tert−アミルカテコー
ル−ビス(2−ヒドロキシプロピル)エーテル、臭素化
カテコール−ビス(2−ヒドロキシエチル)エーテル、
臭素化カテコール−ビス(2−ヒドロキシプロピル)エ
ーテル等のカテコール及び2価のフェノール性水酸基を
有するカテコール誘導体である。
Catechol-bis (2-hydroxyethyl) ether, catechol-bis (2-hydroxypropyl) ether, monomethylcatechol-bis (2-hydroxyethyl) ether, monomethylcatechol-bis (2-hydroxypropyl) ether, mono -Tert-
Butyl catechol-bis (2-hydroxyethyl) ether, mono-tert-butyl catechol-bis (2-hydroxypropyl) ether, di-tert-butyl catechol-bis (2-hydroxyethyl) ether, di-tert
-Butylcatechol-bis (2-hydroxypropyl)
Ether, di-tert-amylcatechol-bis (2-hydroxyethyl) ether, di-tert-amylcatechol-bis (2-hydroxypropyl) ether, brominated catechol-bis (2-hydroxyethyl) ether,
Catechol such as brominated catechol-bis (2-hydroxypropyl) ether and catechol derivatives having a divalent phenolic hydroxyl group.

【0017】一般式(I)におけるnは5以下が好まし
い。nが5より大きいと粘度の上昇や耐熱性の低下を招
き好ましくない。一般式(I)におけるnは、平均値0
〜5を示し好ましくは平均値0〜1が良好な物性を示
す。本発明における2価フェノ−ル−ビス(2−ヒドロ
キシエチル)エーテルにエピクロルヒドリンを反応させ
る方法は、従来公知の方法が利用でき特に制限されるも
のではない。即ち、2価フェノ−ル−ビス(2−ヒドロ
キシエチル)エーテルの水酸基1モルに対してエピクロ
ルヒドリン及び/または、β−メチルエピクロルヒドリ
ンを1〜20モル添加し、水酸化ナトリウムのようなア
ルカリ金属水酸化物の存在下10〜120℃で反応を行
うことができる。その際非プロトン系極性溶剤、ケトン
系溶剤、芳香族炭化水素系溶剤等を使用してもよく、必
要に応じてテトラメチルアンモニウムクロリドなどの第
四アンモニウム塩類やBF3エーテル錯体などのルイス
酸類等の触媒を使用してもよい。また、反応で生成した
生成水を減圧下又は常圧下反応系外に除去しながら反応
を行うこともできる。
In the general formula (I), n is preferably 5 or less. When n is larger than 5, the viscosity is increased and the heat resistance is decreased, which is not preferable. N in the general formula (I) is an average value 0
To 5, and preferably an average value of 0 to 1 indicates good physical properties. The method of reacting epichlorohydrin with divalent phenol-bis (2-hydroxyethyl) ether in the present invention can be a conventionally known method and is not particularly limited. That is, 1 to 20 mol of epichlorohydrin and / or β-methyl epichlorohydrin is added to 1 mol of hydroxyl group of divalent phenol-bis (2-hydroxyethyl) ether, and alkali metal hydroxide such as sodium hydroxide is added. The reaction can be carried out at 10 to 120 ° C in the presence of a substance. At that time, an aprotic polar solvent, a ketone solvent, an aromatic hydrocarbon solvent or the like may be used. If necessary, quaternary ammonium salts such as tetramethylammonium chloride or Lewis acids such as BF 3 ether complex may be used. May be used. Further, the reaction can be carried out while removing the water produced by the reaction from the reaction system under reduced pressure or normal pressure.

【0018】エピクロルヒドリン及び/または、β−メ
チルエピクロルヒドリンと反応させた後、さらに脱塩化
水素反応を行った方が好ましい。脱塩化水素を行わない
と加水分解性塩素が高くなり硬化物の特性に悪影響を及
ぼす、特に電気・電子用途では加水分解性塩素が100
0ppm以下、さらに好ましくは500ppm以下が良
い。脱塩化水素反応は、従来公知の方法が利用でき特に
制限されるものではない。例えば、エピクロルヒドリン
と反応させた後、過剰のエピクロルヒドリンを除去しさ
らに疎水性溶剤中で水酸化ナトリウムのようなアルカリ
金属水酸化物の水溶液存在下10〜100℃で反応を行
うことができる。その際非プロトン系極性溶剤を使用し
てもよく、また必要に応じて第四アンモニウム塩等の触
媒を使用してもよい。尚、本発明での加水分解性塩素と
は、エポキシ樹脂をジオキサンに溶解し0.1N水酸化
カリウムーメタノール溶液を添加し、70℃で30分間
加熱したときの脱離した塩素を硝酸銀による電位差滴定
法で求めた値である。
After the reaction with epichlorohydrin and / or β-methylepichlorohydrin, it is preferable to further carry out a dehydrochlorination reaction. If dehydrochlorination is not performed, hydrolyzable chlorine will increase and adversely affect the properties of the cured product.
The content is preferably 0 ppm or less, more preferably 500 ppm or less. A conventionally known method can be used for the dehydrochlorination reaction, and there is no particular limitation. For example, after reacting with epichlorohydrin, excess epichlorohydrin is removed, and the reaction can be carried out at 10 to 100 ° C. in a hydrophobic solvent in the presence of an aqueous solution of an alkali metal hydroxide such as sodium hydroxide. At that time, an aprotic polar solvent may be used, and if necessary, a catalyst such as a quaternary ammonium salt may be used. The hydrolyzable chlorine in the present invention refers to a potential difference due to silver nitrate obtained by dissolving an epoxy resin in dioxane, adding a 0.1N potassium hydroxide-methanol solution, and heating at 70 ° C. for 30 minutes. This is the value determined by the titration method.

【0019】本発明では、一般式(I)で表されるエポ
キシ樹脂は、その耐熱性、耐湿性、低応力等の物性を損
なわない範囲で、一般式(II)で示される2価フェノ−
ル−(2−ヒドロキシエチル)エーテルの他に水酸基を
2個以上有する化合物を併用して製造することができ
る。代表的な水酸基を2個以上有する化合物としてたと
えばビスフェノールA、ビスフェノールF、臭素化ビス
フェノールA等のビスフェノール類、クレゾールノボラ
ック樹脂やフェノールノボラック樹脂等のノボラック樹
脂類、2,5−ジーtert−ブチルハイドロキノン、
2,5−ジーtert−アミルハイドロキノン等の多価
フェノール類等が挙げられる、また、1,6−ヘキサン
ジオール、シクロヘキサンジメタノール等のジアルコー
ル類、トリメチロ−ルプロパン、グリセリン等のポリア
ルコ−ル等が挙げられるが特にこれらに限定されるわけ
ではない。
In the present invention, the epoxy resin represented by the general formula (I) may be a divalent phenol represented by the general formula (II) as long as its physical properties such as heat resistance, moisture resistance and low stress are not impaired.
It can be produced by using a compound having two or more hydroxyl groups in addition to ru- (2-hydroxyethyl) ether. Representative compounds having two or more hydroxyl groups include, for example, bisphenols such as bisphenol A, bisphenol F and brominated bisphenol A, novolak resins such as cresol novolak resin and phenol novolak resin, 2,5-ditert-butylhydroquinone,
Polyhydric phenols such as 2,5-di-tert-amylhydroquinone and the like; dialcohols such as 1,6-hexanediol and cyclohexanedimethanol; and polyalcohols such as trimethylolpropane and glycerin. Examples include, but are not limited to, these.

【0020】以下、本発明のエポキシ樹脂組成物につい
て説明する。本発明のエポキシ樹脂組成物において、本
発明のエポキシ樹脂は、単独でまたは、他のエポキシ樹
脂と併用して用いることが出来る。併用する場合、本発
明のエポキシ樹脂の占める割合は、全エポキシ樹脂中の
2重量%以上が好ましく、特に5重量%以上が特に好ま
しい。本発明のエポキシ樹脂と併用しうる他のエポキシ
樹脂としては、ビスフェノールA、ビスフェノールF、
臭素化ビスフェノールA、ビスフェノールS等のジグリ
シジルエーテルであるビスフェノール型エポキシ樹脂、
或いは、フェノール、クレゾール、ビスフェノールA、
ナフトール、ナフタレンジオール等のフェノール類とホ
ルムアルデヒド等のアルデヒド類やケトン類との縮合反
応により得られるノボラック型フェノール樹脂のポリグ
リシジルエーテル及びフェノール、クレゾール、ビスフ
ェノールA、ナフトール、ナフタレンジオール等のフェ
ノール類とキシリレングリコールとの縮合反応等により
得られるアラルキル型フェノール樹脂のポリグリシジル
エーテル等のポリフェノール系化合物類のエポキシ樹
脂、或いは、2,5−ジーtert−ブチルハイドロキ
ノン、2,5−ジーtert−アミルハイドロキノン等
の多価フェノール類のポリグリシジルエーテル、或い
は、脂環式エポキシ樹脂又はビフェニル型エポキシ樹脂
又はグリシジルアミン系エポキシ樹脂若しくはグリシジ
ルエステル系エポキシ樹脂等が挙げられるが特にこれら
に限定されるわけではない。
Hereinafter, the epoxy resin composition of the present invention will be described. In the epoxy resin composition of the present invention, the epoxy resin of the present invention can be used alone or in combination with another epoxy resin. When used in combination, the proportion occupied by the epoxy resin of the present invention is preferably at least 2% by weight, particularly preferably at least 5% by weight, of the total epoxy resin. Other epoxy resins that can be used in combination with the epoxy resin of the present invention include bisphenol A, bisphenol F,
Bisphenol type epoxy resins which are diglycidyl ethers such as brominated bisphenol A and bisphenol S,
Or phenol, cresol, bisphenol A,
Polyglycidyl ether of novolak type phenolic resin obtained by condensation reaction of phenols such as naphthol and naphthalene diol with aldehydes and ketones such as formaldehyde and phenols such as phenol, cresol, bisphenol A, naphthol and naphthalene diol and xylyl. Epoxy resin of polyphenolic compounds such as aralkyl-type phenolic resin polyglycidyl ether obtained by condensation reaction with lenglycol, or 2,5-di-tert-butylhydroquinone, 2,5-di-tert-amylhydroquinone, etc. Polyglycidyl ether of polyhydric phenols, or alicyclic epoxy resin or biphenyl type epoxy resin or glycidylamine epoxy resin or glycidyl ester epoxy Fat and the like but not particularly limited thereto.

【0021】本発明で用いられる硬化剤として、種々の
ものが使用できる。例えばジアミノジフェニルメタン、
ジエチレントリアミン、トリエチレンテトラミン、イソ
ホロンジアミン、ダイマー酸等の酸類とポリアミン類と
の縮合物であるポリアミドアミン等のアミン系化合物、
無水フタル酸、無水トリメリット酸、無水ピロメリット
酸、無水マレイン酸、ヘキサヒドロ無水フタル酸等酸無
水物系化合物、フェノール、クレゾール、ビスフェノー
ルA、ナフトール、ナフタレンジオール等のフェノール
類とホルムアルデヒド等のアルデヒド類やケトン類との
縮合反応により得られるノボラック型フェノール樹脂、
また、フェノール、クレゾール、ビスフェノールA、ナ
フトール、ナフタレンジオール等のフェノール類とキシ
リレングリコールとの縮合反応等により得られるアラル
キル型フェノール樹脂等のフェノール系化合物類、ジシ
アンジアミド及びその誘導体、2−メチルイミダゾ−
ル、2−エチル−4−メチルイミダゾール等のイミダゾ
ール類及びその誘導体、アジピン酸ジヒドラジド、イソ
フタル酸ジヒドラジド等のヒドラジド類、BF3錯体等
が挙げられるが特にこれらに限定されるわけではない。
これら硬化剤は、単独でも良いし、2種類以上を併用し
ても良い。本発明の樹脂組成物には、必要に応じて硬化
促進剤を使用することができる。例えば、ホスフィン
類、イミダゾール類、第3級アミン、BF3錯体等公知
の種々の硬化促進剤が使用でき特に限定されるわけでは
ない。硬化促進剤を用いる場合、エポキシ樹脂に対して
0.01〜10重量%の範囲が好ましい。
Various curing agents can be used in the present invention. For example, diaminodiphenylmethane,
Diamine triamine, triethylene tetramine, isophorone diamine, amine compounds such as polyamidoamine which is a condensate of polyamines with acids such as dimer acid,
Acid anhydride compounds such as phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, maleic anhydride, hexahydrophthalic anhydride, phenols such as phenol, cresol, bisphenol A, naphthol and naphthalene diol and aldehydes such as formaldehyde Novolak type phenolic resin obtained by condensation reaction with ketones and
Also, phenolic compounds such as aralkyl-type phenolic resins obtained by condensation reaction of phenols such as phenol, cresol, bisphenol A, naphthol, and naphthalene diol with xylylene glycol, dicyandiamide and derivatives thereof, 2-methylimidazo-
And imidazoles such as 2-ethyl-4-methylimidazole and derivatives thereof, hydrazides such as adipic dihydrazide and isophthalic dihydrazide, and BF 3 complexes, but are not particularly limited thereto.
These curing agents may be used alone or in combination of two or more. In the resin composition of the present invention, a curing accelerator can be used as needed. For example, various known curing accelerators such as phosphines, imidazoles, tertiary amines, and BF 3 complexes can be used and are not particularly limited. When a curing accelerator is used, the amount is preferably in the range of 0.01 to 10% by weight based on the epoxy resin.

【0022】本発明の樹脂組成物には、他の樹脂やゴム
成分を配合して、さらに、その特性を発揮させることが
出来る。配合可能な樹脂としてフェノール樹脂、ユリア
樹脂、メラミン樹脂、フラン樹脂、ジアリルフタレート
樹脂、ケイ素樹脂、ウレタン樹脂等の熱硬化性樹脂、又
はポリエステル樹脂、ポリアミド樹脂、ABS樹脂、ポ
リオレフィン樹脂等の熱可塑性樹脂である。ゴム成分と
しては、シリコーンゴム、カルボキシル基含有変性ニト
リルゴム、アミノ基含有変性ニトリルゴム、スチレンー
ブタジエン共重合体等が挙げられるが、特にこれらに限
定される訳ではない。
The resin composition of the present invention can be further blended with other resin or rubber components to exhibit its properties. Thermoplastic resins such as phenolic resin, urea resin, melamine resin, furan resin, diallyl phthalate resin, silicon resin and urethane resin, or thermoplastic resins such as polyester resin, polyamide resin, ABS resin and polyolefin resin It is. Examples of the rubber component include a silicone rubber, a carboxyl group-containing modified nitrile rubber, an amino group-containing modified nitrile rubber, and a styrene-butadiene copolymer, but are not particularly limited thereto.

【0023】本発明の樹脂組成物には、各種充填材を配
合して、さらに、その特性を発揮させることが出来る。
配合可能な充填材として酸化アルミニウム、酸化マグネ
シウム等の金属酸化物、水酸化アルミニウム等の金属水
酸化物、炭酸カルシウム、炭酸マグネシウム等の金属炭
酸塩、溶融シリカ、結晶シリ、マイカ、カオリン、クレ
イ、或いは三酸化アンチモン等が挙げられるが、特にこ
れらに限定される訳ではない。本発明の樹脂組成物に
は、必要に応じて希釈剤、着色剤、顔料及び難燃剤等を
添加してもよい。本発明の樹脂組成物を調整する方法と
して、常温もしくは、加熱下で市販されているニーダ
ー、ロール、一軸もしくは二軸押出機等を用い混練りす
る方法等が適用される。
The resin composition of the present invention can be mixed with various fillers to further exhibit its characteristics.
Metal oxides such as aluminum oxide and magnesium oxide, metal hydroxides such as aluminum hydroxide, metal carbonates such as calcium carbonate and magnesium carbonate, fused silica, crystalline silicium, mica, kaolin, clay, Alternatively, antimony trioxide and the like can be mentioned, but it is not particularly limited thereto. If necessary, a diluent, a colorant, a pigment, a flame retardant, and the like may be added to the resin composition of the present invention. As a method for preparing the resin composition of the present invention, a method of kneading using a commercially available kneader, roll, single-screw or twin-screw extruder at room temperature or under heating is applied.

【0024】[0024]

【実施例】以下、実施例により本発明を更に詳細に説明
するが、本発明は、これら実施例に限定されるものでな
い。また、以下の例に記載の「部」とは、特に記載しな
い限り「重量部」を示し、粘度は、特に記載しない限り
BH型回転粘度計(トキメック社製)25℃で測定した
値である。 実施例1 温度計、コンデンサー、油水分離管を取り付けたセパラ
ブルフラスコにハイドロキノン−(2−ヒドロキシエチ
ル)エーテル200部、エピクロルヒドリン1100
部、ジエチレングリコールジメチルエーテル110部を
加えて65℃に昇温した後99%の水酸化ナトリウム1
12部を投入し、同温度で攪拌下6時間反応した。反応
終了後、110mmHg、65℃なる条件でエピクロル
ヒドリンの一部及び生成水を回収し、珪藻土を充填した
濾過器により生成物を濾過し固液分離を行った。得られ
た濾液を5mmHg、170℃なる条件でエピクロルヒ
ドリン及び溶剤を回収して、目的とする樹脂250部を
得た。得られた樹脂の性状は、エポキシ当量172g/
eq、粘度250mPa・s、加水分解性塩素120p
pmであった。また、樹脂のゲルパーミネーションクロ
マトグラフの分析データを図1に赤外分光分析の分析デ
ータを図2に電界脱離質量分析の分析結果を図3にそれ
ぞれ示す。
EXAMPLES Hereinafter, the present invention will be described in more detail by way of examples, but the present invention is not limited to these examples. In the following examples, “parts” means “parts by weight” unless otherwise specified, and the viscosity is a value measured at 25 ° C. by a BH-type rotational viscometer (manufactured by Tokimec) unless otherwise specified. . Example 1 A separable flask equipped with a thermometer, a condenser, and an oil-water separation tube was charged with 200 parts of hydroquinone- (2-hydroxyethyl) ether and 1100 epichlorohydrin.
And 110 parts of diethylene glycol dimethyl ether, and the mixture was heated to 65 ° C. and then 99% sodium hydroxide 1
12 parts were charged and reacted at the same temperature with stirring for 6 hours. After completion of the reaction, a part of epichlorohydrin and produced water were recovered under conditions of 110 mmHg and 65 ° C., and the product was filtered with a filter filled with diatomaceous earth to perform solid-liquid separation. Epichlorohydrin and a solvent were recovered from the obtained filtrate under the conditions of 5 mmHg and 170 ° C. to obtain 250 parts of a target resin. The properties of the obtained resin were 172 g / epoxy equivalent.
eq, viscosity 250mPa · s, hydrolyzable chlorine 120p
pm. FIG. 1 shows the analysis data of the gel permeation chromatograph of the resin, FIG. 2 shows the analysis data of the infrared spectroscopic analysis, and FIG. 3 shows the analysis result of the electric field desorption mass spectrometry.

【0025】実施例2 温度計、コンデンサー、油水分離管を取り付けたセパラ
ブルフラスコにハイドロキノン−(2−ヒドロキシエチ
ル)エーテル200部、エピクロルヒドリン1100
部、ジエチレングリコールジメチルエーテル110部を
加えて65℃に昇温した後99%の水酸化ナトリウム9
5部を投入し、同温度で攪拌下6時間反応した。反応終
了後、110mmHg、65℃なる条件でエピクロルヒ
ドリンの一部及び生成水を回収し、珪藻土を充填した濾
過器により生成物を濾過し固液分離を行った。得られた
濾液を5mmHg、170℃なる条件でエピクロルヒド
リン及び溶剤を回収して、得られた生成物をメチルイソ
ブチルケトン350部を加え生成物を溶解した。その後
10重量%水酸化ナトリウム30部を加えて、85℃で
2時間反応させ、200部の水を加えて塩類を溶解し、
静置して下層の水相を分離除去した。リン酸溶液にて中
和後、水洗液が中性になるまで樹脂溶液を水洗し、瀘過
した。5mmHg、170℃なる条件下でメチルイソブ
チルケトンを除去し目的とする樹脂270部を得た。得
られた樹脂の性状は、エポキシ当量178g/eq、粘
度270mPa・s、加水分解性塩素160ppmであ
った。
Example 2 200 parts of hydroquinone- (2-hydroxyethyl) ether and 1100 epichlorohydrin were placed in a separable flask equipped with a thermometer, a condenser and an oil-water separator.
And 110 parts of diethylene glycol dimethyl ether, the mixture was heated to 65 ° C., and then 99% sodium hydroxide 9
Five parts were charged and reacted at the same temperature for 6 hours with stirring. After completion of the reaction, a part of epichlorohydrin and produced water were recovered under conditions of 110 mmHg and 65 ° C., and the product was filtered with a filter filled with diatomaceous earth to perform solid-liquid separation. Epichlorohydrin and the solvent were recovered from the obtained filtrate under the conditions of 5 mmHg and 170 ° C., and 350 parts of methyl isobutyl ketone was added to the obtained product to dissolve the product. Thereafter, 30 parts of 10% by weight sodium hydroxide was added, and the mixture was reacted at 85 ° C. for 2 hours, and 200 parts of water was added to dissolve the salts.
After standing, the lower aqueous phase was separated and removed. After neutralization with a phosphoric acid solution, the resin solution was washed with water until the washing solution became neutral, and filtered. Under a condition of 5 mmHg and 170 ° C., methyl isobutyl ketone was removed to obtain 270 parts of a target resin. The properties of the obtained resin were epoxy equivalent 178 g / eq, viscosity 270 mPa · s, and hydrolyzable chlorine 160 ppm.

【0026】実施例3、4及び比較例1、2 実施例1で得たエポキシ樹脂(以下「エポキシ樹脂A」
及び実施例2で得たエポキシ樹脂(以下「エポキシ樹脂
B」)及び比較例1としてレゾルシンジグリシジルエー
テルEpodil769(エポキシ当量126g/e
q、粘度420mPa・s Air Product社
製)比較例2としてポリプロピレングリコールジグリシ
ジルエーテルPG−207S(エポキシ当量312g/
eq、粘度60mPa・s、東都化成社製)をそれぞれ
第1表で表される配合に従って調整し、混合物を熱ロー
ルにて60℃で混練りし、エポキシ樹脂組成物を得た。
尚、主剤のエポキシ樹脂の配合は、同粘度(2700c
ps)となるように配合し、また、溶融シリカは、エポ
キシ樹脂、硬化剤及び溶融シリカの合計量中の70重量
%になるように配合した。また、エポキシ樹脂として分
子蒸留タイプのビスフェノールA型エポキシ樹脂YD−
8125(エポキシ当量175g/eq、粘度3900
mPa・s、東都化成社製)、硬化剤としてフェノール
ノボラック樹脂BRG−555(水酸基当量104g/
eq,軟化点66℃、昭和高分子社製)、硬化促進剤と
してトリフェニルフォスフィン(TPP和光純薬社
製)、シランカップリング剤A−187(日本ユニカー
社製)フィラ−として溶融シリカFB−35(龍森社
製)を使用した。
Examples 3 and 4 and Comparative Examples 1 and 2 The epoxy resin obtained in Example 1 (hereinafter referred to as "epoxy resin A")
And the epoxy resin obtained in Example 2 (hereinafter referred to as “epoxy resin B”) and as Comparative Example 1 resorcin diglycidyl ether Epodil 679 (epoxy equivalent 126 g / e
q, viscosity 420 mPa · s Air Product Co., Ltd.) As Comparative Example 2, polypropylene glycol diglycidyl ether PG-207S (epoxy equivalent 312 g /
eq, a viscosity of 60 mPa · s, manufactured by Toto Kasei Co., Ltd.) were adjusted according to the formulations shown in Table 1, and the mixture was kneaded at 60 ° C. with a hot roll to obtain an epoxy resin composition.
The epoxy resin used as the main component has the same viscosity (2700 c
ps), and the fused silica was blended so as to be 70% by weight based on the total amount of the epoxy resin, the curing agent and the fused silica. Further, as the epoxy resin, a molecular distillation type bisphenol A type epoxy resin YD-
8125 (epoxy equivalent 175 g / eq, viscosity 3900
mPa · s, manufactured by Toto Kasei Co., Ltd.) and a phenol novolak resin BRG-555 (having a hydroxyl equivalent of 104 g /
eq, softening point 66 ° C., manufactured by Showa Polymer Co., Ltd.) triphenylphosphine (manufactured by TPP Wako Pure Chemical Industries, Ltd.) as a curing accelerator, silane coupling agent A-187 (manufactured by Nippon Unicar), fused silica FB as filler -35 (manufactured by Tatsumori) was used.

【0027】得られた樹脂組成物を120℃で1時間、
次いで150℃で2時間、更に180℃で5時間の条件
で硬化せしめ試験片とし、JIS K−6911に準拠
して曲げ強度、曲げ弾性率を測定した。また、吸水率
は、直径50mm厚さ2mmの円盤状の試験片を温度4
0℃、湿度85%RHなる条件下で200時間処理した
ときの重量変化により求めた。ガラス転移温度は、熱機
械測定装置(セイコー電子社製)により昇温速度5℃/
分の条件下で求めた。第1表には上記の測定結果を併記
した。
The obtained resin composition was heated at 120 ° C. for 1 hour,
Next, the test piece was cured at 150 ° C. for 2 hours and further at 180 ° C. for 5 hours to obtain a test piece, and the flexural strength and flexural modulus were measured in accordance with JIS K-6911. In addition, the water absorption was measured at a temperature of 4 mm for a disc-shaped test piece having a diameter of 50 mm and a thickness of 2 mm.
It was determined from the change in weight when treated for 200 hours at 0 ° C. and 85% RH. The glass transition temperature was measured using a thermomechanical measuring device (manufactured by Seiko Denshi) at a heating rate of 5 ° C. /
Minutes. Table 1 also shows the above measurement results.

【0028】[0028]

【表1】 [Table 1]

【0029】[0029]

【発明の効果】本発明の新規なエポキシ樹脂は、実施例
1及び2に示すとおり、低粘度であり、かつ、本発明の
新規なエポキシ樹脂を使用した硬化物は、表1からも明
らかなように、良好な耐熱性、低吸水率を有し、かつ低
弾性率であることから低応力化に優れる。従って、本発
明のエポキシ樹脂を使用したエポキシ樹脂組成物は、半
導体封止材、成型材料、積層板、接着剤、塗料などの広
範囲の用途に有用である。
As described in Examples 1 and 2, the novel epoxy resin of the present invention has a low viscosity, and the cured product using the novel epoxy resin of the present invention is clearly shown in Table 1. As described above, it has good heat resistance, low water absorption, and low elasticity, and thus is excellent in reducing stress. Therefore, the epoxy resin composition using the epoxy resin of the present invention is useful for a wide range of applications such as semiconductor encapsulants, molding materials, laminates, adhesives, and paints.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI H01L 23/31 (72)発明者 宅和 成剛 東京都江戸川区東葛西3−17−14 東都化 成株式会社研究所内──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 6 Identification symbol FI H01L 23/31 (72) Inventor Seigo Tawawa 3-17-14 Higashikasai, Edogawa-ku, Tokyo Inside the Tokyo Metropolitan Chemical Research Laboratory

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 一般式(I)で表される新規なエポキシ
樹脂。 【化1】 式中、R1,R2は、H又はCH3を示し、同一でも異な
っていても良い。R3〜R6は、H又はC1〜C10のアル
キル基又は臭素を示し同一でも異なっていても良く、n
は、0〜5の繰り返し単位を示す。
1. A novel epoxy resin represented by the general formula (I). Embedded image In the formula, R 1 and R 2 represent H or CH 3 and may be the same or different. R 3 to R 6 represent H or a C 1 to C 10 alkyl group or bromine, and may be the same or different;
Represents a repeating unit of 0 to 5.
【請求項2】 下記の式(II)で示される2価フェノ−
ル−ビス(2−ヒドロキシエチル)エ−テルにエピクロ
ルヒドリン及び/または、β−メチルエピクロルヒドリ
ンを反応させることを特徴とする請求項1記載のエポキ
シ樹脂の製造方法。 【化2】 式中、RはH又はCHを示し、R3〜R6は、H又は
1〜C10のアルキル基又は臭素を示し同一でも異なっ
ていても良い。
2. A divalent phenol represented by the following formula (II):
The method for producing an epoxy resin according to claim 1, wherein epichlorohydrin and / or β-methylepichlorohydrin are reacted with ru-bis (2-hydroxyethyl) ether. Embedded image In the formula, R 2 represents H or CH 3 , and R 3 to R 6 represent H or a C 1 to C 10 alkyl group or bromine, and may be the same or different.
【請求項3】 エポキシ樹脂及び硬化剤、さらに必要に
より硬化促進剤から構成されるエポキシ樹脂組成物にお
いて、該エポキシ樹脂成分として請求項1記載のエポキ
シ樹脂を含有することを特徴とする新規なエポキシ樹脂
組成物。
3. An epoxy resin composition comprising an epoxy resin, a curing agent and, if necessary, a curing accelerator, wherein the epoxy resin according to claim 1 is contained as the epoxy resin component. Resin composition.
【請求項4】 エポキシ樹脂及び硬化剤、さらに必要に
より硬化促進剤で構成されるエポキシ樹脂組成物からな
るエポキシ樹脂半導体封止材組成物において、該エポキ
シ樹脂成分として請求項1記載のエポキシ樹脂が組成物
中に含有するエポキシ樹脂の5重量%以上であることを
特徴とする新規なエポキシ樹脂半導体封止材組成物。
4. An epoxy resin semiconductor encapsulant composition comprising an epoxy resin composition comprising an epoxy resin, a curing agent and, if necessary, a curing accelerator, wherein the epoxy resin according to claim 1 is used as the epoxy resin component. A novel epoxy resin semiconductor encapsulant composition characterized by being at least 5% by weight of the epoxy resin contained in the composition.
JP31049497A 1997-11-12 1997-11-12 Epoxy resin, method for producing epoxy resin, composition containing epoxy resin, and epoxy resin semiconductor sealing material composition comprising the composition Expired - Fee Related JP4218995B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP31049497A JP4218995B2 (en) 1997-11-12 1997-11-12 Epoxy resin, method for producing epoxy resin, composition containing epoxy resin, and epoxy resin semiconductor sealing material composition comprising the composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31049497A JP4218995B2 (en) 1997-11-12 1997-11-12 Epoxy resin, method for producing epoxy resin, composition containing epoxy resin, and epoxy resin semiconductor sealing material composition comprising the composition

Publications (2)

Publication Number Publication Date
JPH11140069A true JPH11140069A (en) 1999-05-25
JP4218995B2 JP4218995B2 (en) 2009-02-04

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Country Link
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006265111A (en) * 2005-03-22 2006-10-05 Sumitomo Chemical Co Ltd Epoxy compound and epoxy resin cured product
JP2007254581A (en) * 2006-03-23 2007-10-04 Nippon Kayaku Co Ltd Epoxy resin, epoxy resin composition and cured material thereof
WO2012105071A1 (en) * 2011-02-03 2012-08-09 ナミックス株式会社 Resin sealng material for semiconductor

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006265111A (en) * 2005-03-22 2006-10-05 Sumitomo Chemical Co Ltd Epoxy compound and epoxy resin cured product
JP2007254581A (en) * 2006-03-23 2007-10-04 Nippon Kayaku Co Ltd Epoxy resin, epoxy resin composition and cured material thereof
WO2012105071A1 (en) * 2011-02-03 2012-08-09 ナミックス株式会社 Resin sealng material for semiconductor
JP2012162585A (en) * 2011-02-03 2012-08-30 Namics Corp Resin sealng material for semiconductor

Also Published As

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