JPH11135405A - Method for verification of pattern one-shot exposure data - Google Patents

Abstract

PROBLEM TO BE SOLVED: To ensure high-speed verification operations or the like, by comparing coordinates at specific positions within a pattern one shot obtained from CAD data before data conversion with coordinates at specific positions within a pattern one shot obtained from direct-drawing data or the like for pattern one shot after data conversion. SOLUTION: CAD data 22 which has been extracted as an application portion of a pattern one shot is disassembled, as 24, into fundamental aperture patterns, each of which is a fundamental unit of a pattern one shot. The individual fundamental aperture patterns are, respectively, provided with cell numbers, and coordinates indicting specific positions in a plurality of patterns contained in a pattern one shot are, respectively, detected, and a quantity of a shift between each of the coordinates and the origin of the pattern one shot is calculated at a step 25. The corresponding relation and the amount of the shift between each of the cell numbers and each of the fundamental aperture patterns are shored as EB mask data 27. With respect to the CAD data 23 for the application portion of the pattern one shot which has been disassembled into the fundamental aperture patterns, coordinates indicating specific positions in a plurality of patterns contained in the pattern one shot are calculated at a step 26.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for verifying pattern data for electron beam lithography in which a fine pattern is formed by an electron beam, and more particularly to a method of drawing a pattern suitable for a collective figure system for forming a fine pattern at a high speed. Verification method.

[0002]

2. Description of the Related Art With the progress of LSIs, miniaturization of patterns used in semiconductor devices is rapidly progressing. The drawing method using an electron beam is an effective exposure method that can form a pattern of 0.25 μm or less which will be required in the future.

FIG. 12 shows a schematic configuration of an electron beam lithography apparatus currently used. The electron beam lithography apparatus shown in FIG. 12 includes a first aperture 3 and a plurality of opening patterns 6A.
Is a device for forming an electron beam 50A into an electron beam 50B having a plurality of patterns with a second aperture 6 provided with a pattern and irradiating the electron beam 50B on a resist-coated semiconductor wafer 11 to form a fine pattern.

Referring to FIG. 12, an electron beam 50 emitted from an electron gun 1 is applied to a blanking electrode 2, a first aperture 3, a forming lens 4, a forming deflector 5, a second aperture 6, a reducing lens 7, a main deflector. 8, the semiconductor wafer 11 on the sample stage 12 is irradiated through the sub deflector 9 and the projection lens 10. The first aperture 3 has a rectangular opening 3A, and a rectangular beam 50A. A plurality of opening patterns 6A are previously formed as a collective cell on the second aperture 6, and a rectangular electron beam 50A is irradiated onto the collective cell on the second aperture 6 through the first aperture 3. An electron beam 50B having a plurality of patterns among them is applied to a semiconductor wafer 11B.
A plurality of patterns are transferred at a time by irradiating the resist coated on the substrate. In other words, one shot gives 1
Individual or multiple patterns of latent images can be formed on the resist.

The graphic data is stored in a storage device 15, and after being read out by a computer 14 into a graphic data memory 17, necessary processing such as data development and sorting is performed. These data are transferred to the blanking electrode 2, the shaping deflector 5, the main deflector 8, and the sub deflector 9 through the control device 16, and the electron beam 50 </ b> B having a desired shape is formed at a desired position on the semiconductor wafer 11. Irradiation is possible.

[0006] The number of shots required to draw the same pattern by this figure batch drawing method is about 1/10 to 1/100 of that of a variable shaping type electron beam exposure apparatus conventionally used. Becomes As a result, the time required for performing the electron beam exposure is reduced, and the throughput can be improved.

In the graphic batch drawing method, as described above, the second aperture (EB mask) provided with a plurality of opening patterns in advance is used. The opening pattern formed on the EB mask can be obtained by extracting a basic repeating part from LSI design data. Here, this is called a “basic aperture figure”.

A cell number is given to the extracted basic aperture graphic, and EB mask data describing the correspondence between the cell number and the basic aperture graphic as shown in FIG. 6C is created.
A second aperture (EB mask) 6 is created based on the EB mask data. FIGS. 7 and 11 show examples of the EB mask thus obtained.

On the other hand, as shown in FIG. 5B, figure collective direct drawing data describing the relationship between the coordinates indicating the drawing position on the wafer and the cell number to be drawn is created.

By using the above two data, it is possible to perform figure batch drawing for drawing a desired basic opening figure at a desired position (x, y). However, if there is an error in any one of the above two data, individual problems such as short-circuiting of the wiring, disconnection, deterioration of device characteristics, etc. are caused.
It is necessary to verify whether the mask data is converted without any difference from the original CAD data.

As a method of verifying data in this type of electron beam drawing, for example, Japanese Patent Application Laid-Open No. Hei 7-130596 discloses a method in which a cell number corresponding to an opening position on an EB mask is displayed on a graphic display at a position corresponding to a figure batch shot. And a method of visually checking the pattern data for collective figures has been proposed.

[0012] For example, Japanese Patent Application Laid-Open No. 6-349717 proposes a method in which a figure is overwritten in accordance with the magnitude of an exposure amount, and the exposure amount is checked using an interlayer calculation.

[0013]

However, the above-mentioned conventional method has the following problems.

That is, in the conventional verification method of visually confirming on a graphic display, it is undeniable that verification may be omitted. Further, in the case of a highly integrated pattern such as a recent state-of-the-art device, the number of shots required is enormous, so that verification requires an enormous amount of time and labor.

In the method proposed in Japanese Patent Application Laid-Open No. 6-349717, the position shift of the figure batch shot and the selection error of the basic opening figure cannot be detected. Is not suitable.

Then, a plurality of figures included in the figure batch shot are developed into individual figures for variable shaping, and the original CAD
Although a method of comparing and verifying with data can be considered, a large amount of graphics increases the time required for verification.

Furthermore, when a figure which was an oblique line in CAD data is approximated by a rectangle, all differences between the outline of the oblique line and the outline of the approximate rectangle are extracted as a difference figure. I can't tell if it's an approximation error.

Accordingly, the present invention has been made in view of the above problems, and has as its object to verify a plurality of figures included in each figure batch shot in verification of direct drawing data used in the figure batch drawing method. It is an object of the present invention to provide a verification method which can be represented by coordinates, speeds up verification of figure batch exposure data, increases efficiency, and reduces work steps.

[0019]

In order to achieve the above object, the present invention provides a method of obtaining coordinates (X, Y) of a specific position in a figure batch shot obtained from CAD data before data conversion, and EB.
The coordinates (X ', Y') of the specific position in the figure batch shot obtained from both the EB mask data describing the shape of the basic opening figure formed on the mask and the figure batch direct drawing data after the data conversion. By comparing, the direct drawing data for figure batch is verified.

In the present invention, it is preferable that, when converting the CAD data into the graphic drawing direct drawing data, a graphic collective intermediate describing the coordinates of a specific position from among a plurality of graphics included in each graphic collective shot. A first step of preparing data;
A second step of searching coordinates representing a specific position among a plurality of figures included in the figure batch shot, calculating a shift amount between the coordinates and the origin of the figure batch shot, and creating EB mask data; A third step of separating EB direct drawing data in which the converted figure batch and the variable shaping are mixed into figure batch data and variable shaping data, and a fourth step of reading out a drawing position and a cell number from the figure batch direct drawing data From the EB mask data, the fifth step of reading the cell number and the shift amount calculated in the second step, and the values obtained in the fourth step and the fifth step, each figure batch shot A sixth step of calculating coordinates of a specific position of a plurality of included figures, and a seventh step of reading coordinates of a specific position of a figure included in each of the figure collective shots from the figure collective intermediate data created in the first step. Process Compare coordinates of a specific position obtained in the sixth specific position obtained in step coordinates and the seventh step, and a eighth step of verifying.

[0021]

Embodiments of the present invention will be described below. In the verification method for figure batch exposure data of the present invention, in a preferred embodiment, first, EB direct drawing data in which a figure batch and variable shaping are mixed are created from CAD data. A step of creating figure batch intermediate data (28 in FIG. 2) describing coordinates of a specific position from a plurality of figures included in each figure batch shot, and a specific position among a plurality of figures included in the figure batch shot Find coordinates that represent
The shift amount (25 in FIG. 2) between the coordinates and the origin of the figure batch shot is calculated, and the EB mask data (2 in FIG. 2) is calculated.
And 7) creating.

In the embodiment of the present invention,
As a method of verifying the data, a step (33 in FIG. 3) of separating the figure batch and the variable-shape mixed direct drawing data (32 in FIG. 3) after conversion into the figure batch-direct drawing data and the variable shaping data;
The drawing position (36 in FIG. 1) and the cell number (37 in FIG. 1) are read from the figure batch direct drawing data (30 in FIG. 1), and the cell number (FIG. 1 in FIG. 1) is read from the EB mask data (27 in FIG. 1). 37) and the shift amount (25 in FIG. 1), and calculating the coordinates of specific positions of a plurality of figures included in each figure batch shot (39 in FIG. 1). A step of reading coordinates of specific positions of a figure included in the figure batch shot (40 in FIG. 1), a step of comparing and verifying the coordinates of these specific positions (41 in FIG. 1),
including.

According to the embodiment of the present invention, since a plurality of figures included in each figure batch shot can be represented by one coordinate, figure batch exposure data can be verified at high speed.

[0024]

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a block diagram showing an embodiment of the present invention;

FIG. 2 is a diagram for explaining the processing flow of one embodiment of the present invention. With reference to FIG. 2, a description will be given of a data conversion process for creating EB direct drawing data in which graphic batches and variable shaping are mixed from CAD data.

First, the CAD data 20 is separated into a pattern to which figures are collectively applied and a pattern to which variable shaping is applied (step 21).

The CAD data 22 extracted as the graphic batch application section is decomposed into basic aperture graphics, which are basic units of a graphic batch shot (step 24). At this time, a cell number is given to each basic opening figure, and a coordinate representing a specific position is searched for among a plurality of figures included in the figure batch shot, and a shift amount between the coordinate and the origin of the figure batch shot is obtained. Is calculated (step 25). The correspondence between each cell number and the basic aperture figure and the shift amount are stored as EB mask data 27.

With respect to the CAD data 23 of the figure collective application section decomposed into the basic opening figure, coordinates indicating a specific position among a plurality of figures included in the figure collective shot are calculated (step 26). CA with this coordinate data added
The D data is stored as the figure collective intermediate data 28.

Further, the figure collective intermediate data 28 is converted into a format suitable for a figure collective drawing apparatus, and stored as figure collective direct drawing data 30.

On the other hand, CAD extracted for variable molding
The data 23 is converted into the variable forming direct drawing data 31 via the variable forming intermediate data 29.

The figure drawing direct drawing data 30 and the variable forming direct drawing data 31 are respectively synthesized and stored as figure drawing and variable forming mixed direct drawing data 32.

The processing for the graphic batch application unit in the data conversion flow will be specifically described with reference to FIG. 4A is CAD data (graphic collective application section), FIG. 4B is disassembled into basic opening graphic, FIG. 4C is graphic intermediate data, FIG. 4D is EB mask data, FIG.
(E) is a figure for explaining an example of the figure collective direct drawing data.

A repetitive pattern is extracted from the CAD data extracted as the graphic batch application section shown in FIG. 4A, and is decomposed into basic aperture graphics as shown in FIG. 4B.

FIG. 4D shows the extracted basic aperture figures.
As shown in the figure, a cell number is given, and the origin (X _0M ⁱ , Y _0M ⁱ ) of the figure collective shot and the specific coordinates (in the present embodiment, the lower left coordinates in this embodiment) among a plurality of figures included in the basic opening figure ) (X _M ⁱ , Y _M ⁱ ) and the shift amount (S _x ⁱ ,
S _y ⁱ ) and stores it as EB mask data 27.

[0035] EB mask data, as shown in FIG. 5 (c), the cell number i, the basic opening graphic data, and the shift amount S _x ^i, in turn a set of S _y ⁱ by the number to use as the base opening figure Take a side-by-side format.

On the other hand, FIG.
As shown in (c), the origin (X _i ,
Y _i ) and a plurality of figures included in the figure batch shot,
The specific coordinates (X _i ′, Y _i ′) are held. As shown in FIG. 5A, this data includes the origin (X _i , Y _i ) of the figure batch shot, the cell number to be drawn, and the specific coordinates (X _i ′,
Y _i ′) are arranged in order of the number of figure batch shots.

FIG. 4E shows the direct drawing data 30 for the figure batch.
As shown in the figure, the figure batch shot position (X _i , Y _i ) and the value of the cell number i are held. This data is shown in FIG.
As shown in, these values (drawing coordinates and cell number)
It takes a format in which the number of figure batch shots is arranged in order.

In the variable shaping direct drawing data 31, a set of a drawing position (x, y), a figure width W, a figure height H, and a cell number 0 indicating variable shaping data are sequentially arranged. Are lined up.

Next, the converted EB direct drawing data is converted to the original CA
A description will be given of a data verification process for checking whether there is any difference from the D data. FIG. 3 shows a processing flow used in this data verification step.

Referring to FIG. 3, first, a cell number is searched from the direct drawing data 32 in which the figure batch and the variable shaping are mixed.
It is separated into variable shaping data having cell number 0 and graphic batch data having values other than cell number 0 (step 33).

Verification of the graphic batch direct drawing data is performed from both the graphic batch direct drawing data 30 and the EB mask data 27 (step 34).

On the other hand, the direct writing data for variable shaping 31 is verified by interlayer calculation between the intermediate data for variable shaping 29 and the intermediate data 29 for variable shaping (step 35).

Referring to FIG. 1, the processing of the partial verification direct drawing data in the data verification flow will be specifically described.

As shown in FIG. 5B, the drawing position (X _i , Y _i ) of the figure batch shot is included in the figure drawing direct drawing data.
And cell number i are lined up, these values are read out one set at a time.

On the other hand, the EB mask data 27 includes FIG.
As shown in (c), the cell number i and the shift amount (S _x ⁱ , S
_{Since y} ⁱ ) is stored, the shift amount corresponding to the cell number to be drawn can be known. Further, the drawing position (X _i, Y _i) the shift amount ^{_{(S x i, S y i}} ) from the specific coordinates of a graphic included in each shape collectively the shot (X _i ',
Y _i ′) (lower left in this embodiment) can be calculated (step 39).

On the other hand, as shown in FIG. 5A, specific coordinates (X _i ′, Y _i ′) (lower left in this embodiment) in each figure batch shot are stored in the figure batch intermediate data 28. Therefore, this is read out (step 40).

[0047] In addition, calculated in step _{39 (X i ', Y i} ') and the value of the read in step _{40 (X i ', Y i} '), to verify the number of figures bulk shot (Step 41 ). As a result, data verification of all figure batch shots can be performed.

Next, a second embodiment of the present invention will be described with reference to the drawings. Here, data conversion is performed on CAD data including oblique lines as shown in FIG.

First, a repetitive pattern is extracted from the CAD data and is decomposed into basic aperture figures as shown in FIG. Normally, oblique lines cannot be drawn in the variable shaping, and data conversion is performed on a pattern including such oblique lines as much as possible using a batch of figures.

FIG. 8D shows the extracted basic aperture figures.
As shown in the figure, the cell number is given, and the specific coordinates (in this embodiment, the minimum of the X coordinate in the present embodiment) of the origin (X _0M ⁱ , Y _0M ⁱ ) of the figure collective shot and a plurality of figures included in the basic opening figure. value, the minimum value of the Y coordinate) (X _M ^i, Y shift difference of _M ⁱ⁾ (S _x ^i, calculated as S _y ^i), is stored as EB mask data. The EB mask data is shown in FIG.
As shown in, the cell number i, taking the basic opening graphic data, and the shift amount S _x ^i, the format ordered sets of S _y ⁱ by the number to be used as the primary aperture shapes.

On the other hand, FIG.
As shown in (c), the origin (X _i ,
Y _i ) and a plurality of figures included in the figure batch shot,
Specific coordinates (X _i ′, Y _i ′) or (X _i ′,
Y _i "), or _{(X i", Y i '} ), or (X _i ", Y _i" holding a). This data is shown in FIG.
As shown in (1), the origin (X _i , Y _i ) of the figure batch shot and the cell number to be drawn, and the specific coordinates (X _i ′, Y _i ′) or (among the plurality of figures included in the figure batch shot) _{X i ', Y i ")} , or _{(X i", Y i'} ), or _{(X i ", Y i"} ) set takes the form an ordered by the number of figures collectively shot of.

As shown in FIG. 8E, the figure batch direct drawing data holds the figure batch shot position (X _i , Y _i ) and the value of the cell number i. As shown in FIG. 9B, this data takes a form in which these values are arranged in order by the number of figure batch shots.

In the variable forming direct drawing data 31, a set of a drawing position (x, y), a figure width W, a figure height H, and a cell number 0 indicating variable forming data are sequentially arranged. Are lined up.

Next, the converted EB direct drawing data is converted to the original CA
A data verification process for confirming whether the data is different from the D data will be described with reference to FIG.

First, a cell number is searched from the direct drawing data 32 in which the figure batch and the variable shaping are mixed, and separated into the variable shaping data having the cell number 0 and the figure batch data having a value other than the cell number 0 (step 33). ).

As shown in FIG. 9B, the drawing position (X _i , Y _i ) of the figure batch shot is included in the figure batch direct drawing data.
And cell number i are lined up, these values are read out one set at a time.

On the other hand, the EB mask data 27 includes FIG.
As shown in (c), the cell number i and the shift amount (S _x ⁱ , S
_{Since y} ⁱ ) is stored, the shift amount corresponding to the cell number to be drawn can be known.

[0058] Further, this drawing position (X _i, Y _i) the shift amount ^{_{(S x i, S y i}} ) from the minimum value of the X coordinate at certain coordinates (the embodiment of figures included in each figure collectively shot , Y coordinate) (X _i ′, Y _i ′) or (X _i ′,
Y _i "), or _{(X i", Y i '} ), or _{(X i ", Y i"} ) can be calculated (Step 3
9).

On the other hand, as shown in FIG. 9A, the figure collective intermediate data 28 includes specific coordinates (in this embodiment, the minimum value of the X coordinate and the minimum value of the Y coordinate) (X _i ', Y _i'), or _{(X i ', Y i "} ), or _{(X i", Y i'} ), or (X _i ", Y _i" so) is stored, reads this (Step 4
0). Further, the value calculated in step 39 ((X _i ′,
Y _i ′) and calculated in step 40 ((X _i ′,
Y _i ′) or (X _i ′, Y _i ″), or (X _i ″, Y _i ′), or (X _i ″, Y _i ″) is verified by the number of figure batch shots (step). 41). As a result, data verification of all figure batch shots can be performed.

[0060]

As described above, according to the present invention,
In the verification of direct drawing data used for the figure batch drawing method,
This makes it possible to represent a plurality of figures included in each figure batch shot with one coordinate, thereby achieving the effect of speeding up the verification work of the figure batch exposure data, increasing the efficiency, and reducing the number of work steps.

The reason is that, in the present invention, the coordinates (X, Y) of a specific position in a figure batch shot obtained from CAD data before data conversion and the shape of a basic aperture figure formed on an EB mask are described. By comparing the obtained EB mask data with the coordinates (X ', Y') of a specific position in the figure batch shot obtained from both the figure batch direct drawing data after the data conversion, the figure batch direct drawing data is obtained. This is due to the fact that verification is performed.

[Brief description of the drawings]

FIG. 1 is a diagram for explaining a processing flow of verification of a graphic batch application unit according to an embodiment of the present invention.

FIG. 2 is a diagram illustrating a processing flow of data conversion according to an embodiment of the present invention.

FIG. 3 is a diagram for explaining a verification processing flow for a graphic batch application unit and a variable shaping application unit according to an embodiment of the present invention.

FIG. 4 is an explanatory diagram specifically illustrating a data conversion method according to an embodiment of the present invention.

FIG. 5 is an explanatory diagram specifically illustrating a data format in one embodiment of the present invention.

FIG. 6 is an explanatory diagram specifically illustrating a data format in one embodiment of the present invention.

FIG. 7 is an explanatory diagram showing an example of a graphic batch EB mask;

FIG. 8 is an explanatory diagram specifically illustrating a data conversion method according to a second embodiment of the present invention.

FIG. 9 is an explanatory diagram specifically illustrating a data format used in the second embodiment of the present invention.

FIG. 10 is an explanatory diagram specifically illustrating a data format used in the second embodiment of the present invention.

FIG. 11 is an explanatory diagram showing another example of the graphic batch EB mask.

FIG. 12 is an explanatory view schematically showing a schematic configuration of a conventional figure batch type electron beam writing apparatus.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 Electron gun 2 Blanking electrode 3 1st aperture 3A 1st aperture opening 4 Molding lens 5 Molding deflector 6 2nd aperture 6A, 6B 2nd aperture opening 7 Reduction lens 8 Main deflector 9 Secondary deflector 10 Projection lens DESCRIPTION OF SYMBOLS 11 Semiconductor wafer 11A, 11B Latent image in resist 12 Sample stand 13 Graphic data memory 14 Calculator 15 Storage device 16 Control device 20, 22, 23 CAD data 27 EB mask data 28, 29 Intermediate data 30, 31, 32 Direct drawing Data 21, 24, 25, 26, 34, 35, 39, 40, 4
1 processing step 36 drawing position data 37 cell number data 38 shift amount data

Claims (3)

[Claims] 1. A pattern collective drawing method in which a mask in which a plurality of patterns are formed is provided in an electron optical system, and a latent image pattern corresponding to the plurality of patterns of the mask function is repeatedly formed in one region of a resist every time an electron beam is shot. (A) a step of preparing figure batch intermediate data describing coordinates of a specific position from among a plurality of figures included in each figure batch shot; and (b) a figure. (B) searching for coordinates representing a specific position among a plurality of figures included in the collective shot, calculating a shift amount between the coordinates and the origin of the collective shot, and creating EB mask data; E where the batch of figures after conversion and the variable shaping are mixed
(D) reading a drawing position and a cell number from the figure batch direct drawing data, and (e) reading the EB mask data from the EB mask data. Reading the cell number and the shift amount calculated in the step (b); and (f) determining the specific positions of a plurality of figures included in each figure batch shot from the values obtained in the steps (d) and (e). (G) reading the coordinates of a specific position of a figure included in each figure batch shot from the figure batch intermediate data created in the step (a); and (h) reading the step (a). comparing and verifying the coordinates of the specific position obtained in f) and the coordinates of the specific position obtained in the step (g). A method for verifying data used in a graphic batch drawing method, comprising: 2. The EB mask data describing the coordinates of a specific position of a figure contained in a figure batch shot obtained from CAD data before data conversion, the shape of a basic opening figure formed on an EB mask, and figure batch drawing. Verifying the collective direct drawing data for figures by comparing the coordinates of the specific position of the graphic included in the collective shot for the figures obtained from both of the direct drawing data for collective figures after conversion to the device orientation,
A verification method for figure batch exposure data, characterized in that: 3. A collective drawing of figures wherein a mask having a plurality of patterns formed in an electron optical system is provided, and a latent image pattern corresponding to the plurality of patterns of the mask function is repeatedly formed in one region of a resist every time an electron beam is shot. A method of verifying data used in the method, comprising: (a) a step of separating, from CAD data, a pattern to which a graphic batch is applied and a pattern to which variable shaping is applied; The CAD data is decomposed into basic opening figures, which are basic units of the figure batch shot. At this time, each of the basic opening figures is given a cell number, and a specific position among a plurality of figures included in the figure batch shot is specified. , A shift amount between the coordinates and the origin of the figure batch shot is calculated, and the correspondence between each cell number and the basic opening figure is calculated. And (c) storing the shift amount as EB mask data; and (c) specifying, from the plurality of graphics included in the graphics batch shot, the CAD data of the graphics batch application unit decomposed into the basic aperture graphics. The coordinates indicating the position are calculated, and the CAD data to which the coordinate data is added is stored as figure batch intermediate data, and the figure batch intermediate data is converted into a format suitable for the figure batch drawing apparatus to convert the figure batch data. (D) converting CAD data extracted for variable shaping into intermediate data for variable shaping, and converting the CAD data extracted for variable shaping into direct drawing data for variable shaping; Combining the drawing data and the direct drawing data for variable shaping, and storing the drawing data and the variable shaping mixed direct drawing data; and (f) the graphic batch and the variable shaping mixed direct drawing data. (G) reading the drawing position and cell number from the figure batch direct drawing data, and reading the cell number and the cell number from the EB mask data. The shift amount is read, the coordinates of a specific position of a plurality of figures included in each figure batch shot are calculated, and the coordinates of the specific position of a figure included in each figure batch shot are read from the figure batch intermediate data. Comparing and verifying the coordinates of the specific position; and (h) verifying the variable-shaping direct-drawing data with respect to the variable-forming direct-drawing data by interlayer calculation with respect to the variable-forming intermediate data. A verification method for figure batch exposure data, comprising the steps of: