JPH11134612A - Production of thin film magnetic head and recording-reproduction separation type head - Google Patents

Abstract

PROBLEM TO BE SOLVED: To produce a thin film magnetic head free from the magnetic saturation of a magnetic core part adjacent to a gap film and excellent in the precision of track width by forming a magnetic film or a multilayered film by sputtering at a part adjacent to a magnetic gap, forming a magnetic film pattern by flame plating on the sputtered film and etching the sputtered film with the pattern as a mask. SOLUTION: A magnetic film 13 of CoNiFe is formed in about 0.5 μm m by sputtering on a lower magnetic film 12 on a substrate 11. A gap film 14 of Al2 O3 , SiO2 , Si3 N4 or Ta2 O5 is formed in 0.4 μm by sputtering on the magnetic films 13 and an upper magnetic core 15 is formed in 4 μm by flame plating. The gap film 14 is etched by reactive ion etching with the upper magnetic core 15 as a mask and the magnetic film 13 is worked by ion milling. High pattern precision can be maintained.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a thin-film magnetic head used for recording / reproducing of a magnetic disk drive or the like and a recording / reproducing separated type head.

[0002]

2. Description of the Related Art In a magnetic disk drive, data on a recording medium is read and written by a magnetic head. In order to increase the recording capacity per unit area of the magnetic disk, it is necessary to increase the areal recording density. A method for improving the areal recording density is to increase the track density and the linear recording density. Among them, in order to improve the track density, it is necessary to make the track width of the magnetic head finer and more precise. Further, in terms of shape, it is important to control the shape of the track portion because the track pitch can be reduced by preventing the writing and reading bleeding. As a method of forming a magnetic core including a track portion of a thin film magnetic head,
It is widely known that a method using dry etching such as ion milling and a frame plating method are used.

In a method using dry etching such as ion milling, a magnetic film such as permalloy is formed by sputtering on a substrate on which a lower magnetic core, a magnetic gap film, a conductor coil and an insulating film of the conductor coil are formed, A resist pattern is formed on the magnetic film by photolithography. Next, the magnetic film is subjected to dry etching such as ion milling using the resist pattern as a mask. Thereby, an upper magnetic core is formed. Japanese Patent Application Laid-Open No. 7-225917 discloses a method using such dry etching.
The publication discloses an example of a method of forming a magnetic pole end region defining a track width earlier than a rear region by using ion milling.

On the other hand, in the frame plating method, a resist frame is formed by photolithography on a substrate on which a lower magnetic core, a magnetic gap film, a conductor coil and an insulating film of the conductor coil are formed, and then the frame is formed. A magnetic film such as permalloy is plated on the substrate. Next, an area surrounded by the frame is masked with a resist by photolithography, and an unnecessary magnetic film is removed by wet etching to form an upper magnetic core.

[0005]

As described above, in order to achieve a higher recording density of a magnetic disk drive, it is necessary to narrow the track of the magnetic head and to increase the precision thereof. On the other hand, in order to avoid magnetic saturation at the tip of the magnetic core adjacent to the magnetic gap, it is necessary to increase the thickness of the magnetic core and use a material having a high saturation magnetic flux density (Bs). A method using dry etching such as ion milling of a thick film having a thickness of 3 to 4 μm can use a material having a high saturation magnetic flux density formed by a sputtering method. However, due to the dimensional variation of a resist pattern formed by photolithography, Since the dimensional variation when the magnetic film is dry-etched using the resist pattern as a mask overlaps, the upper magnetic core cannot be formed with high precision. In this regard, in the frame plating method, since the dimensional accuracy of the resist frame becomes the dimensional accuracy of the upper magnetic core as it is, in terms of the dimensional accuracy, it is more advantageous than a method using dry etching such as ion milling. Since possible materials are limited, it is difficult to use a material having a high saturation magnetic flux density. At present, permalloy, which is widely used in the frame plating method, has a saturation magnetic flux density of about 1
Tesla, not enough.

SUMMARY OF THE INVENTION It is an object of the present invention to manufacture a thin film magnetic head and a read / write separation type head having a high precision narrow track width and high saturation magnetic flux density (Bs) at the tip of a magnetic core adjacent to a magnetic gap. It provides a method.

[0007]

According to the present invention, there is provided a lower magnetic core, wherein the lower magnetic core is laminated on the lower magnetic core, one end of which is continuous with the lower magnetic film, and the other end of which faces the lower magnetic core via a magnetic gap; An upper magnetic core that forms a magnetic circuit together with the lower magnetic core; a conductor coil provided between the lower magnetic core and the upper magnetic core; and an electrical connection between the lower magnetic core, the upper magnetic core, and the conductor coil. In a method of manufacturing a thin-film magnetic head comprising: an insulating film to be insulated, a step 1 of forming a magnetic film serving as the lower magnetic core into a desired pattern by sputtering; and a non-magnetic film serving as the magnetic gap on the magnetic film. Forming the upper magnetic core having a desired pattern on the nonmagnetic film by frame plating, and using the upper magnetic core as a mask. Characterized in that a step 3 of forming the magnetic gap and the lower magnetic core of the magnetic film made of a non-magnetic film and a lower magnetic core serving as the magnetic gap is etched with the desired pattern.

Further, the present invention has first and second magnetic layers of ferromagnetic material separated by a nonmagnetic layer, and an antiferromagnetic layer provided to be connected to one of the magnetic layers, When the applied magnetic field from the recording medium is zero, the first
A reproducing head in which the magnetization direction of the magnetic layer is perpendicular to the magnetization direction of the second layer; and a magnetic shield disposed on the read head via a magnetic shield, one end of which is connected to the magnetic shield and one end of which is connected to the magnetic shield. Opposing each other via a magnetic gap and forming a magnetic circuit together with the magnetic shield, a conductor coil provided between the magnetic shield and the upper magnetic core, the magnetic shield, the upper magnetic core, and the conductor In a method for manufacturing a recording / reproducing separation type head in which an induction type recording head including an insulating film for electrically insulating coils from each other is integrally formed, the head is manufactured by the same method as described above.

That is, in order to solve the above-mentioned problems, the present invention is directed to a case where each of the upper magnetic core, the magnetic gap and the lower magnetic core is used alone, or a portion including a plurality of the upper magnetic core, the magnetic gap and the lower magnetic core. A step 1 of applying a pattern 1 on which a sputtered film is formed, a step 2 of forming a pattern 2 formed on the pattern 1 by using a frame plating method, and etching the pattern 1 using the pattern 2 as a mask The present invention provides a thin-film magnetic head having a laminated structure formed by sequentially performing step 3, wherein the pattern 1 is formed by one of a lift-off method, an ion milling method, and a reactive ion etching method (RIE). Using multiple methods,
The pattern 1 includes a magnetic film having a saturation magnetic flux density (Bs) of 1.5 Tesla (T) or more, or a magnetic film having a saturation magnetic flux density (Bs) of 1.5 Tesla (T) or more and a nonmagnetic material. A three-layer film in which a non-magnetic film is vertically sandwiched between magnetic films having a saturation magnetic flux density (Bs) of 1.5 Tesla (T) or more; The non-magnetic film is made of Al ₂ O ₃ , SiO ₂ , Si ₃ N ₄ , Ta ₂ O ₅
And reactive ion etching is used to etch the non-magnetic film, and after forming the non-magnetic layer that becomes the magnetic gap after the formation of the pattern 1, the steps 2 and 3 are performed. A thin-film magnetic head and a method of manufacturing the same.

[0010] Alternatively, the thin-film magnetic head may be used as a recording head, stacked with a reproducing head using the magnetoresistance effect or the giant magnetoresistance effect, and used as a recording / reproducing separated thin-film magnetic head.

As the magnetic film of 1.5 Tesla or more formed by the sputtering method, there are Co-based and Fe-based magnetic films, for example, CoNiFe or the like. When this magnetic film is not patterned and etched using a pattern formed by a frame plating method on the upper portion as a mask, as in, for example, Japanese Patent Application Laid-Open No. 7-262519, the mask resists the etching. Therefore, it is necessary to greatly increase the film thickness from the required film thickness, and furthermore, the etched particles adhere to the mask material, that is, the influence of so-called re-adhesion is required. Therefore, the film to be etched needs to be patterned in advance as in the present invention.
By doing so, the etching time can be shortened, so that it is not necessary to increase the thickness of the mask material, and the amount of redeposition is greatly reduced, so that a pattern can be formed with high precision. In the lift-off method used for forming the pattern, since a film is formed by a sputtering method, a multilayer mask material having an overhang shape is suitable as a mask material for the lift-off. In the case of ion milling, a normal method using Ar may be used. Reactive ion etching (RIE)
Can be a normal parallel plate type or ECR, ICP,
A high-density plasma etching apparatus using a helicon wave or the like may be used. The gas used is CHF ₃ , SF ₆ , CF ₄
Or a fluorine-based gas such as BCl ₃ , Cl ₂ , SiCl
A chlorine gas such as ₄ may be mainly used, and a rare gas or an inert gas may be added. As the frame plating method, an ordinary method using a resist frame and electrolytic plating may be applied.

[0012]

BEST MODE FOR CARRYING OUT THE INVENTION

[Embodiment 1] FIG. 2 is a diagram showing a manufacturing process of a thin-film magnetic head according to an embodiment of the present invention as viewed from a medium facing surface. FIG.
(A) Upper magnetic film (CoNiFe) for lower magnetic core on substrate 11 and lower magnetic film 12 for lower magnetic core
13 shows a step (Step 1) of forming a film of about 0.5 μm by the sputtering method and forming a pattern 1 by the lift-off method. This magnetic film may be a laminated film with a non-magnetic film. Further, the pattern forming method at this time may be an ion milling method, and it is preferable that the end portion is tapered.

FIG. 2B shows Al ₂ for the gap film 14.
This shows that O ₃ was formed by a 0.4 μm sputtering method.
Instead of Al ₂ O ₃ , SiO ₂ , Si ₃ N ₄ , Ta ₂ O ₅ or the like may be used. FIG. 2C shows a state where the upper magnetic core 15 is formed to 4 μm by the frame plating method (Step 2). Step 3 is shown in FIGS. 2- (d) and (c). Figure 2
(d), using the upper magnetic core 15 as a mask, reactive ion etching (RI) using a mixed gas of Cl ₂ and BCl _3.
E) shows the gap film 14 etched. FIG. 2E shows the upper magnetic core 15 and the gap film 1.
4 shows a state in which the magnetic film 13 is processed by using the magnetic film 13 with the upper and lower magnetic cores by ion milling using the mask 4 to form a magnetic head. At this time, the pattern accuracy was good because it was determined by the upper magnetic core 15 formed by the frame plating method.

[Embodiment 2] FIG. 3 shows a step 1 of forming a pattern 1 by a lift-off method. FIG. 3A shows a state where the mask material 101 having an undercut shape is formed. Undercutting of the mask material is indispensable to enable lift-off when forming a film by a sputtering method. FIG. 3B shows a state where the magnetic film 102 composed of a laminated film of CoNiFe or a nonmagnetic film is formed by the sputtering method. FIG. 3C shows a state where the pattern 1 including the magnetic film 13 is formed by performing lift-off using a solvent. Since the magnetic film formed by the sputtering method enters the undercut portion of the mask material, the end of the pattern 1 has a tapered shape as shown in the figure.

Next, as in the first embodiment, FIGS.
In steps (2) and (3) shown in (e), the magnetic film 13, the gap film 14, and the magnetic film 15 are formed.

[Embodiment 3] FIG. 4 is a view showing the thin film magnetic head manufacturing process of the present invention viewed from the medium facing surface (however, the magnification of the figure is not uniform). 3A shows a step 1 in which a magnetic film (CoNiFe) 24 is patterned on the substrate 21, the lower magnetic core 22, and the magnetic gap film 23 by sputtering the lower portion for the upper magnetic core. The pattern forming method of the magnetic film 24 may be either the lift-off method or the ion milling method as in the second embodiment, and the magnetic film may be a laminated film. (B) shows the process 2 in which the pattern of the upper magnetic film 25 for the upper magnetic core is formed by using the frame plating method.
(C) shows a step 3 in which a magnetic head is manufactured by etching the lower magnetic film 24 by ion milling using the pattern of the magnetic film 25 as a mask.

[Embodiment 4] FIG. 5 is a diagram showing a manufacturing process of a thin-film magnetic head according to an embodiment of the present invention as viewed from a medium facing surface (however, the magnification of the drawing is not uniform).
3A, a magnetic film (CoNiFe) 33 formed by sputtering on an upper portion for the lower magnetic core is formed by sputtering on the substrate 31 and the magnetic film 32 below the lower magnetic core as a step 1 and patterned. (B) shows a state in which alumina for the magnetic gap film 34 is formed by a sputtering method. (C), a lower magnetic film (CoNiFe) 35 for the upper magnetic core is formed again by the sputtering method in Step 1;
Pattern. The magnetic film 33 and the magnetic film 35 may be laminated films as in the second and third embodiments, and the pattern forming method may be a lift-off method or an ion milling method. (D) shows a step 2 in which a magnetic film 36 for an upper magnetic core is formed on the magnetic film 35 by frame plating. FIGS. 5- (e) to (g) show the step 3.
(E) shows the magnetic film 35 etched by ion milling using the magnetic film 36 as a mask.

FIG. 2F shows that the gap film 34 is etched by reactive ion etching (RIE) with a mixed gas of Cl ₂ and BCl _{3 using} the magnetic films 36 and 35 as a mask. (G) shows that the magnetic film 33 is etched by ion milling using the magnetic films 36 and 35 and the gap film 34 as a mask to produce a magnetic head. [Embodiment 5] FIG. 1 is a schematic view of a recording / reproducing separation type thin film magnetic head obtained by the steps shown in Embodiments 1 to 4 (however, the magnification of the drawing is not uniform). In this embodiment, a thin-film magnetic head is stacked as a recording head on a reproducing head using a magnetoresistive film or a giant magnetoresistive film 3. Change the upper magnetic core of the recording head to a high Bs C
The magnetic core 10 is formed of a pattern 1 of a magnetic core 10 made of a sputtered film of oNiFe (Bs = 1.6T) and a magnetic core 6 which is a plated magnetic film (NiFe) formed by a frame plating method.

Lower magnetic shield 1, magnetoresistive film 3,
A reproducing head having a magnetic domain control film 5 and an electrode 4, and an inductive recording head in which a magnetomotive force is generated in the upper magnetic core 6 and the upper magnetic shield 2 serving also as the lower magnetic core by the electromagnetic induction effect of the conductor coil 8. It is.

FIG. 6 is an overall perspective view of a magnetic disk drive which is an example of the present invention. The configuration of this magnetic disk device is as follows:
Magnetic disk for recording information, DC motor (not shown) as means for rotating this, magnetic head for writing and reading information, positioning device for means for supporting and changing the position with respect to the magnetic disk That is, it comprises an actuator and a voice coil motor. These figures show an example in which five magnetic disks are mounted on the same rotating shaft to increase the total storage capacity.

FIG. 7 shows an example in which a disk array device is assembled by combining a plurality of the above magnetic recording / reproducing devices. In this case, since a plurality of magnetic recording / reproducing devices are handled at the same time, the processing capability of information can be increased, and the reliability of the devices can be improved. Also in this case, it is needless to say that the performance (low error rate, low power consumption, etc.) of each magnetic recording / reproducing device is better, and therefore a high-performance recording / reproducing separation type head is indispensable.

FIG. 8 is a configuration diagram showing the electric body facing surface of the spin valve head according to the present embodiment. In FIG. 8, a spin valve head (giant magnetoresistive head) configured as a reproducing magnetoresistive head includes a magnetoresistive film 40, a magnetic domain control layer 42, and a pair of electrodes 44. The resistance effect film 40 is stacked on the antiferromagnetic film 46. The magnetoresistive film 40 is formed by laminating a plurality of films having a size corresponding to the track width of the magnetic recording medium. The multilayer film includes a first ferromagnetic film 48, a nonmagnetic film 45, and second ferromagnetic films 47 and 49, and a second ferromagnetic film 49 is laminated on the antiferromagnetic film 46. I have. These multilayer films are stacked in a state of being cut off to a size corresponding to a predetermined width (the width of the magnetoresistive film). The first ferromagnetic film 48 is formed of, for example, NiFe, CoF
e, CoNiFe or the like, and the film thickness is 5 nm.
(Preferably 2 to 15 nm). For example, Cu is used for the nonmagnetic film 45, and the film thickness is 2n.
m (preferably 1 to 5 nm). The second ferromagnetic films 47 and 49 each constitute a laminated film as a fixed layer. For the second ferromagnetic film 47, for example, Co is used, and the film thickness is set to 1 nm. For example, NiFe is used for the second ferromagnetic film 49, and the film thickness is set to 1 nm, and preferably 1 to 5 nm for both. NiO is used for the antiferromagnetic film 16 and its thickness is set to 50 nm (preferably 20 to 80 nm). The second ferromagnetic films 45 and 49 are fixed so that their magnetization directions substantially point to the medium facing surface by exchange coupling with the antiferromagnetic film 46. First ferromagnetic film 48
Is set, for example, in the width direction of the magnetoresistive film, and this magnetization direction changes in the direction perpendicular to the plane of the drawing by the magnetic field of the magnetic recording medium. The first ferromagnetic film 48 has a size which is larger than the total thickness of the second ferromagnetic films 45 and 49 and is about two to three times.

The magnetic domain control layer 42 is composed of a laminated film in which a permanent magnet film 41 and an orientation control base film 43 are laminated.
The magnetic domain control layers 42 are arranged adjacent to both sides of a region in the width direction crossing the laminating direction of the magnetoresistive effect film 40. As the permanent magnet film 41, for example, a CoCrPt-based alloy is used.
m (preferably 5 to 20 nm) of Cr is used. The first ferromagnetic film 48 is controlled to a single magnetic domain by a magnetic field generated from the magnetic domain control layer 42. The magnetic domain control layer 42 is disposed at substantially the same height as the first ferromagnetic film 48, and has a thickness of 10 nm (preferably 4 to 30 nm, more preferably 5 to 12 nm).

Each of the pair of electrodes 44 has a magnetic domain control layer 42.
A part of each electrode 44 is laminated on the first ferromagnetic film 48. That is, each electrode 44 is laminated on the first ferromagnetic film 48 and the magnetic domain control layer 42 while keeping the electrode interval. Each electrode 44 is, for example, Au, cu,
The electrode 44 is made of a metal such as Ta, and the interval between the electrodes 44 is set to be smaller than the width of the magnetoresistive film.

In the spin valve head, the output is the specific resistance change rate Δρ inherent to the spin valve film and the cosine cos Δθ of the angle Δθ formed by the magnetization directions of the first and second ferromagnetic films.
Is proportional to the product of It is known that the spin-bump head has higher sensitivity than the AMR head because the specific resistance change amount Δρ is twice or more higher than that of the AMR head. Here, assuming that the magnetization direction of the second ferromagnetic film is fixed perpendicular to the medium facing surface, for example, just below (−90 °), cosΔθ is equal to the magnetization direction of the first ferromagnetic film and the medium. Cos (θ +
90 °). That is, the output is si
It is proportional to nθ. Therefore, in order to change the output linearly with the change in θ, θ is desirably around 0 °. Therefore, the magnetization direction of the first ferromagnetic film is set so as to be substantially parallel to the medium facing surface, that is, to be almost right beside.

FIG. 9 shows that the antiferromagnetic film 46 of the spin valve head is made of FeMn, NiMn instead of NiO.
FIG. 2 is a configuration diagram of a spin valve head using an alloy such as a Cr-based or CrMn-based alloy. Either one of the second ferromagnetic films 47 and 49 can be omitted. As shown in FIG. 9, the laminating direction of the magnetoresistive film 40 is different from that of FIG.
An antiferromagnetic film 46 is stacked on the magnetoresistive film 40.
In any of the cases shown in FIGS. 8 and 9, the antiferromagnetic film 46 can be replaced with a permanent magnet film. The thickness of each layer in this drawing is the same as in FIG. Magnetic domain control layer 42
Is lower than the upper surface of the antiferromagnetic film 16.

As another example of the film configuration of the spin valve head, Ta (5 nm), NiF
e (5 nm), CoFe (1 nm), Cu (2.5 n
m), CoFe (3 nm), CrMnPt (30 nm)
And Ta (5 nm) are sequentially laminated, and a Co—Cr—Pt alloy and an electrode 14 are formed as hard bias layers at both ends.
(Ta) is provided. As a result, the resistance change rate is 6.
It can be 5%. The upper CoFe layer becomes a fixed layer, and the lower CoFe layer and NiFe layer become free layers with respect to the magnetic field of the medium.

As another example, the lower magnetic shield 1
Ta (5 nm), NiFe (5 nm), Cu (2n
m), Co (1 nm), FeNi (1 nm), CrMnP
Each layer of t (50 nm) and Ta (5 nm) is sequentially laminated, and the same hard bias layer and electrode as described above are provided.

[0029]

According to the present invention, a magnetic film or a multilayer film having good magnetic properties which cannot be produced by the frame plating method is applied to a portion adjacent to a gap film which is easily magnetically saturated by using a sputtering method. Further, by forming a pattern by frame plating on the upper portion thereof and etching it using the mask as a mask, dimensional accuracy of the pattern can be secured, and a thin film magnetic head and a recording / reproducing separation type head having excellent characteristics and accuracy can be manufactured.

[Brief description of the drawings]

FIG. 1 is a schematic diagram of a read / write separated type thin-film magnetic head according to an embodiment of the present invention.

FIG. 2 is a view of the thin-film magnetic head according to the embodiment of the present invention as viewed from a medium facing surface in a manufacturing process.

FIG. 3 is a view of a step of the lift-off method according to the embodiment of the present invention as viewed from a medium facing surface.

FIG. 4 is a view of the thin-film magnetic head according to the embodiment of the present invention as viewed from a medium facing surface in a manufacturing process.

FIG. 5 is a view of the thin-film magnetic head according to the embodiment of the present invention as viewed from a medium facing surface in a manufacturing process.

FIG. 6 is an overall view of a magnetic disk drive according to the present invention.

FIG. 7 is a conceptual diagram of a disk array device according to the present invention.

FIG. 8 is a sectional view of a spin valve head according to the present invention.

FIG. 9 is a sectional view of a spin valve head according to the present invention.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 ... Lower magnetic shield, 2 ... Upper magnetic shield, 3 ... Magnetoresistance effect film or giant magnetoresistance effect film, 4 ... Electrode, 5
... magnetic domain control films, 6, 10 ... magnetic cores, 7, 14, 23,
34 gap film, 8 conductor coil, 9 insulating film, 1
1, 21, 31 ... substrate, 12, 25, 32, 36 ... magnetic film, 13, 24, 33, 35 ... magnetic film or laminated film, 1
5: Upper magnetic core, 22: Lower magnetic core, 101: Mask material, 102: Magnetic film or multilayer film by sputtering.

 ──────────────────────────────────────────────────の Continuing on the front page (72) Inventor, Moriaki Fuyama 1-280, Higashi-Koigakubo, Kokubunji-shi, Tokyo Inside the Hitachi, Ltd. Inside the Hitachi Central Research Laboratory

Claims (9)

[Claims] A lower magnetic core, one end of which is stacked on the lower magnetic core and one end of which is connected to the lower magnetic film and the other end of which faces the lower magnetic core via a magnetic gap, and forms a magnetic circuit together with the lower magnetic core; An upper magnetic core to be formed, a conductive coil provided between the lower magnetic core and the upper magnetic core, and an insulating film for electrically insulating the lower magnetic core, the upper magnetic core, and the conductive coil from each other. In the method for manufacturing a thin film magnetic head, a step 1 of forming a magnetic film serving as the lower magnetic core into a desired pattern by sputtering; a step of forming a nonmagnetic film serving as the magnetic gap on the magnetic film; A step 2 of forming the upper magnetic core having a desired pattern on the film by a frame plating method; and forming the magnetic gap using the upper magnetic core as a mask. Forming a magnetic gap and a lower magnetic core having a desired pattern by etching a non-magnetic film and a magnetic film serving as a lower magnetic core. 3. A method for manufacturing a thin-film magnetic head, comprising: 2. A method according to claim 1, wherein said pattern 1 is formed by a lift-off method, an ion milling method, a reactive ion etching method (R).
2. The method of manufacturing a thin-film magnetic head according to claim 1, wherein one or more of IE) is used. 3. The method according to claim 2, wherein the upper magnetic core is 1.5 tesla (T).
3. The method of manufacturing a thin-film magnetic head according to claim 1, comprising a magnetic film having the above saturation magnetic flux density (Bs). 4. The method according to claim 1, wherein the upper magnetic core is 1.5 tesla (T).
4. The method of manufacturing a thin-film magnetic head according to claim 3, comprising a laminated film of a magnetic film and a non-magnetic film having the above saturation magnetic flux density (Bs). 5. The thin film magnetic device according to claim 4, wherein the laminated film is a three-layer film in which a non-magnetic film is vertically sandwiched between magnetic films having a saturation magnetic flux density (Bs) of 1.5 Tesla (T) or more. Head manufacturing method. 6. The method according to claim 1, wherein the non-magnetic film is made of Al ₂ O ₃ , SiO ₂ , S
_{i 3 N 4, Ta 2 O} 5 of consisting of at least one of claims 4 or 5 method of manufacturing a thin film magnetic head according. 7. The method of manufacturing a thin-film magnetic head according to claim 6, wherein said non-magnetic film is etched by reactive ion etching. 8. A recording medium comprising: first and second magnetic layers of a ferromagnetic material separated by a nonmagnetic layer; and an antiferromagnetic layer provided to be connected to one of the magnetic layers. A reproducing head in which the magnetization direction of the first magnetic layer of the ferromagnetic material is perpendicular to the magnetization direction of the second layer when the applied magnetic field is zero; An upper magnetic core that is stacked on the magnetic shield, one end of which is connected to the magnetic shield and the other end is opposed via a gap; and an upper magnetic core that forms a magnetic circuit with the magnetic shield, and is provided between the magnetic shield and the upper magnetic core. A method for manufacturing a read / write separation type head in which an induction type recording head including a conductor coil and an insulating film for electrically insulating the magnetic shield, the upper magnetic core and the conductor coil from each other is integrally formed. Forming a magnetic film to be a magnetic core into a desired pattern by sputtering; forming a non-magnetic film to be the magnetic gap on the magnetic film; and forming a desired pattern on the non-magnetic film by frame plating. A step 2 of forming the upper magnetic core having: a non-magnetic film serving as the magnetic gap and a magnetic film serving as the lower magnetic core are etched by using the upper magnetic core as a mask; 3. A method for manufacturing a read / write separation type head, comprising: a step 3 of forming a core. 9. A method of manufacturing a thin-film magnetic head having an upper magnetic core, a lower magnetic core, a magnetic gap, a conductor coil and an insulating film, wherein each of the upper magnetic core, the magnetic gap and the lower magnetic core is used alone or A step 1 of applying a pattern 1 in which a sputtered film is formed on a portion including a plurality of upper magnetic cores, a magnetic gap, and a lower magnetic core; and a step of forming a pattern 2 formed on the pattern 1 by frame plating. 2. A thin-film magnetic head, comprising: a step 3 of etching the pattern 1 using the pattern 2 as a mask.