JPH11133320A - Optical device, optical working machine using the optical device and method for controlling optical beam irradiation of the machine - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an optical device capable of improving the using efficiency of optical beams, an optical working machine using the optical device and method for controlling the irradiation of optical beams in the machine. SOLUTION: A mask 4 having a prescribed pattern 4a for transmitting an optical beam on its optical axis and an image rotator 2 arranged on the back-and-force position of the mask 4 so as to be rotated around the optical axis and capable of rotating an image of an optical beam in accordance with its rotated angle are used for the optical device. The mask 4 is set up or rotated so that the using efficiency of an optical beam from a light source is improved, the direction of an image transmitted through the pattern 4a is rotated by the rotator 2 to irradiate a work 7 with the image. Or the mask 4 is set up or rotated so that an image of the pattern 4a is turned to a prescribed direction on a prescribed irradiation position of the work 7, an optical beam from the light source is rotated by the rotator 2 so that the using efficiency of the beam is improved in accordance with the mask direction C1 of the mask 4 to irradiate the pattern 4a with the beam and it is also avaiable to irradiate the work 7 with the image.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical device capable of improving the utilization efficiency of a light beam, an optical processing machine using the same, and a method of controlling the irradiation of the light beam.

[0002]

2. Description of the Related Art A cross section perpendicular to the optical axis of a light beam such as a laser beam usually has a predetermined shape due to the type and characteristics of a light source such as the type of laser and the characteristics of a laser oscillator. There are many things. For example, the cross section of a laser beam emitted from an excimer laser device is often rectangular. Then, after this light beam is transmitted through a mask having a pattern of a predetermined shape, the light beam is irradiated on a work to be processed, and marking, etching, semiconductor exposure, annealing, or the like is performed.

For example, a method of performing marking using an excimer laser has been widely used, and a method using a mask on which figures, characters, and the like to be marked are generally well known is well known. FIG. 14 is an explanatory diagram of a conventional marking method using a mask, and the conventional technology will be described below with reference to FIG. The laser beam 1a emitted from a laser oscillator (not shown) passes through the pattern of the mask 41 and enters the condenser lens 43. The light emitted from the condenser lens 43 is emitted from the surface of the work 7 placed on the upper surface of the processing stage 6. Is irradiated. The mask 41 is mounted on an upper part of a mask moving stage 42 that can move in a direction perpendicular to the optical axis (U-axis direction in the drawing) and in a direction parallel to the optical axis (V-axis method in the drawing). The condenser lens 43 is attached to a lens moving stage 44 that can move in the optical axis direction (Z axis direction in the figure), and the processing stage 6 moves in the X axis direction and the Y axis direction orthogonal to the Z axis direction. They are attached by movable X-axis driving means 8 and Y-axis driving means 9, respectively. Then, the processing stage 6 is driven to move the work 7 to a predetermined position, and the laser beam transmitted through the predetermined pattern of the mask 4 is reduced or enlarged by the condenser lens 43 to mark the predetermined position of the work 7. It has become.

A plurality of patterns 41a, 41b, 41c, 41d as shown in FIG. 15, for example, are arranged on the mask 41 in the U-axis direction. It is drawn. At the time of processing, the mask moving stage 42 is controlled such that a pattern corresponding to each marking position (each moving position of the processing stage 6) is on the optical axis, and the laser beam transmitted through this pattern is marked on the work 7. It has become so.

[0005]

However, in the conventional marking method using the mask 41 as described above, a plurality of patterns 41a, 41b, 4
Even if one of 1c and 41d is selected, the longitudinal direction of the cross section of the laser beam applied to it is always constant, and there is a problem that the efficiency of using the laser beam with respect to the pattern is low. . That is, as shown in FIG. 16, the shape of the opening H of the mask 41 through which the laser beam passes is vertically long, and this longitudinal direction (hereinafter referred to as the mask direction) C1 is the longitudinal direction C0 of the cross section of the laser beam. Even when the laser beam is rotated by a predetermined angle α around the optical axis, the laser beam is irradiated onto the opening H without rotating the longitudinal direction C0 of the cross section. Therefore, if the opening H is formed as shown in FIG.
When the laser beam does not fall within the range of the cross section of the laser beam, it is necessary to perform the irradiation a plurality of times while shifting the position so as to cover the entire opening H. As a result, the number of times of irradiation becomes extremely large, so that the processing time required for the whole irradiation of the work 7 is extremely long, and there is a useless portion of the laser beam which is not used, so that the use efficiency of the laser beam is extremely low. There's a problem.

SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and provides an optical device capable of improving the utilization efficiency of a light beam, an optical processing machine using the same, and a light beam irradiation control method therefor. It is an object.

[0007]

Means for Solving the Problems, Functions and Effects In order to achieve the above object, an invention according to claim 1 is an optical device for forming an image by a light beam from a light source at a predetermined irradiation position. Predetermined pattern 4a transmitting light beam
A mask 4 on the optical axis, and an image rotator 2 provided rotatably about the optical axis and rotating the image of the light beam passing through the pattern 4a of the mask 4 according to the rotated angle. Is provided.

According to the first aspect of the present invention, the optical device can rotate the image of the light beam transmitted through the predetermined pattern of the mask to a predetermined angle by the image rotator. Therefore, using this optical device,
A mask is installed in a direction in which the amount of light transmitted through the pattern with respect to the light source increases, and an image of the light beam transmitted through the mask is rotated in a desired direction by an image rotator, thereby increasing the efficiency of use of the light beam. At the same time, an image of the pattern can be formed at a predetermined position on the workpiece in a predetermined direction. As a result, it is possible to improve the use efficiency of the light beam and to improve the productivity when the light beam is used for optical processing or the like.

According to a second aspect of the present invention, in the optical device of the first aspect, the mask 4 is provided so as to be rotatable about the optical axis.

According to the second aspect of the present invention, since the mask is configured to be rotatable about the optical axis, the use efficiency of the light beam incident on the mask is improved.
The mask direction, that is, the longitudinal direction of the pattern can be rotated based on the shape of the pattern of the mask. For example, when the cross section of the light beam is rectangular, the mask direction may be rotated so as to coincide with the longitudinal direction of the light beam cross section in order to improve the utilization efficiency of the light beam. Thus, the efficiency of use of the light beam can be improved regardless of the direction of the mask. As a result, in addition to the effect of the first aspect of the present invention, the constraints in the pattern design of the mask are relaxed, and the design work is facilitated.

[0011] The invention described in claim 3 is the invention according to claim 1 or 2.
The optical device described above, the pattern 4a of the mask 4 is installed or rotated so as to increase the use efficiency of the light beam from the light source, and the image transmitted through the pattern 4a by controlling the rotation of the image rotator 2 Is an optical processing machine that rotates the workpiece in a predetermined direction to process the work 7.

According to the invention described in claim 3, according to claim 1 of the present invention,
Or, configure an optical processing machine by using the optical device according to 2, so that the utilization efficiency of the light beam is high, that is, so that the longitudinal direction of the pattern matches the longitudinal direction of the light beam, the optical axis of the light beam On the other hand, the pattern of the mask is set or rotated, and the rotation of the image rotator for inputting the image of the pattern is controlled so that the workpiece can be processed so that the image is oriented in a predetermined direction. Thereby, the utilization efficiency of the light beam of the optical processing machine is increased, and the productivity at the time of processing can be improved.

According to a fourth aspect of the present invention, in the optical processing machine according to the third aspect, based on a preset rotation angle of the image of the pattern 4a at a predetermined irradiation position of the workpiece 7.
A controller 10 for controlling the rotation of the image rotator 2
Is provided.

According to a fourth aspect of the present invention, in the optical processing machine, when a predetermined pattern on the workpiece is irradiated with the image of the mask pattern, the rotation angle of the image is set in advance in correspondence with each of the predetermined patterns. And a controller for controlling the rotation of the image rotator based on the set predetermined position and rotation angle. Therefore, the optical processing can be automatically performed using various types of masks having different mask directions, and it is easy to respond to automation of the optical processing machine.

According to a fifth aspect of the present invention, there is provided an optical device for forming an image by a light beam from a light source at a predetermined irradiation position, wherein the optical device is provided rotatably around an optical axis of the light beam and the light beam. The image rotator 2 is rotated in accordance with the angle of rotation and passes therethrough, and a mask 4 having a predetermined pattern 4a on the optical axis for transmitting a light beam passing through the image rotator 2 is provided.

According to the fifth aspect of the present invention, in this optical device, a light beam from a light source is rotated in a predetermined direction by an image rotator, and the rotated light beam is irradiated on a predetermined pattern of a mask and transmitted. Can be done. Therefore, using this optical device, a mask is set so as to irradiate a pattern image on a predetermined position of a work in a predetermined direction, and a light beam is transmitted in a direction in which the amount of light transmitted through the pattern increases in accordance with the direction of the mask. By rotating the light beam from the light source by the image rotator so that the light is incident on the mask, the utilization efficiency of the light beam is increased, and an image of the pattern can be formed at a predetermined position on the workpiece in a predetermined direction. become. As a result, it is possible to improve the use efficiency of the light beam and to improve the productivity when the light beam is used for optical processing or the like.

According to a sixth aspect of the present invention, in the optical device of the fifth aspect, the mask 4 is provided so as to be rotatable about the optical axis.

According to the sixth aspect of the present invention, since the mask is configured to be rotatable around the optical axis, the mask direction, that is, the mask direction, that is, the direction of the image of the pattern at a predetermined irradiation position of the workpiece is set. The longitudinal direction of the pattern can be rotated. At this time, when the light beam from the light source is rotated by the image rotator and is incident on the mask, the light beam is rotated so as to improve the utilization efficiency of the light beam. For example, when the cross section of the light beam is rectangular, the image rotator may be rotated so that the mask direction and the longitudinal direction of the cross section of the light beam coincide with each other in order to improve the utilization efficiency of the light beam. Thereby, regardless of the direction of the image at the irradiation position, that is, the direction of the mask,
The utilization efficiency of the light beam can be improved, and an image can be formed at a predetermined position on the work. As a result, claim 5
In addition to the effects of the invention described above, constraints in the mask pattern design are relaxed, and the design work is facilitated.

The invention described in claim 7 is the fifth or sixth invention.
In the optical device described above, the angle for rotating the image rotator 2 is one of the angles for rotating the mask 4.
/ 2.

According to the seventh aspect of the present invention, considering that the rotation angle of the image passing through the image rotator is twice the rotation angle of the image rotator itself, it is の of the rotation angle of the mask. By controlling only the image rotator to rotate, it is possible to control the irradiation so that the beam use efficiency is always increased according to the rotation angle of the mask. Therefore, as in the case of the fifth or sixth aspect, the productivity when this optical device is used for optical processing is improved, and the design is facilitated by reducing the constraints when designing the mask.

According to an eighth aspect of the present invention, there is provided the optical device according to the fifth, sixth or seventh aspect, wherein the pattern 4 of the mask 4 is aligned with an image direction of the workpiece 7 at a predetermined processing position.
a is set or rotated, the rotation of the image rotator 2 is controlled so that the use efficiency of the light beam from the light source is increased, and the mask 4 is irradiated with the image. 7 is an optical processing machine.

According to an eighth aspect of the present invention, an optical processing machine is configured by using the optical device according to the fifth, sixth or seventh aspect, and the image rotator is rotated so that the light beam utilization efficiency is increased. The light passing through the image rotator is irradiated on the mask. Accordingly, when processing a pattern image at a predetermined position on a workpiece in a predetermined direction, the efficiency of use of the light beam can be increased, so that productivity during processing can be improved.

According to a ninth aspect of the present invention, in the optical processing machine according to the eighth aspect, based on a preset rotation angle of the image of the pattern 4a at a predetermined irradiation position of the workpiece 7.
A configuration is provided that includes a controller 10 that sets or rotates the pattern 4a of the mask 4 and controls the rotation of the image rotator 2 so that the utilization efficiency of the light beam increases in accordance with the longitudinal direction of the pattern 4a.

According to the ninth aspect of the present invention, the rotation angle of the image of the pattern at a predetermined position of the work is preset in the controller of the optical processing machine in correspondence with each of the predetermined positions. Based on each set predetermined position and rotation angle,
The rotation of the mask and the rotation of the image rotator are controlled. Therefore, even when using various types of masks having different longitudinal directions, that is, different mask directions, the mask is automatically irradiated with a light beam so that the use efficiency of the light beam is always increased according to the mask direction. Processing can be performed, and it is easy to respond to automation of the optical processing machine.

The invention according to claim 10 is the third invention.
10. The optical processing machine according to 4, 8, or 9, further comprising an irradiation position moving means for moving an irradiation position of the image to be processed onto the work 7.

According to the tenth aspect of the present invention, in the optical processing machine, the image to be processed is moved to the predetermined irradiation position of the work by the irradiation position moving means. Thus, an image can be processed at a desired position of the work, so that optical processing can be performed on a wide variety of works. Therefore, the productivity of the optical processing machine can be improved.

According to an eleventh aspect of the present invention, in the optical processing machine according to the tenth aspect, the irradiation position moving means is a processing stage 6 for moving and positioning the work 7.

According to the eleventh aspect of the present invention, the irradiation position of the image on the work is moved by using the processing stage for placing and moving and positioning the work, so that the movement of the irradiation position is easy. Becomes Therefore, the claim 1
Similarly to the effect of the invention described in No. 0, optical processing can be performed on a wide variety of workpieces, and productivity is improved. Further, the configuration is facilitated by using a processing stage used in ordinary optical equipment and the like.

According to a twelfth aspect of the present invention, in the optical processing machine of the tenth aspect, the irradiation position moving means moves a telecentric lens for transferring the image to be processed onto the work 7 in a direction perpendicular to the optical axis. This is the means for positioning.

According to the twelfth aspect, the telecentric lens for transferring the image to be processed on the work to the work is moved and positioned in the direction perpendicular to the optical axis, so that the irradiation position of the image on the work is moved. Therefore, the irradiation position can be easily moved. Therefore, the claim 1
Similarly to the effect of the invention described in No. 0, optical processing can be performed on a wide variety of workpieces, and productivity is improved. Further, the use of a telecentric lens used in an ordinary optical device or the like further facilitates the configuration.

According to a thirteenth aspect of the present invention, there is provided a light beam irradiation control method of an optical processing machine for processing an image of a pattern 4a of a mask 4 by a light beam from a light source at a predetermined irradiation position on a work 7. The pattern 4a of the mask 4 is set or rotated so that the utilization efficiency is increased, and the direction of the image transmitted through the pattern 4a is rotated by the image rotator 2 to irradiate the image onto the work 7.

According to the thirteenth aspect of the present invention, the mask is installed or rotated so that the utilization efficiency of the light beam from the light source is increased, and the direction of the image transmitted through the mask pattern is rotated by the image rotator. This image can be irradiated on the work. Thus, the amount of the light beam transmitted through the pattern is increased to increase the utilization efficiency, and the predetermined position of the workpiece can be irradiated with the predetermined pattern, so that the productivity at the time of optical processing can be improved.

According to a fourteenth aspect of the present invention, there is provided a light beam irradiation control method of an optical processing machine for processing an image of a pattern 4a of a mask 4 by a light beam from a light source at a predetermined irradiation position of a work 7. The mask 4 is installed or rotated so that the image of the pattern 4a is directed in a predetermined direction at a predetermined irradiation position of the work 7, and the utilization efficiency of the light beam from the light source increases according to the longitudinal direction of the pattern 4a. The light beam is rotated by the image rotator 2 to irradiate the pattern 4a as described above.
Irradiation method.

According to the present invention, the longitudinal direction of the mask pattern, that is, the mask direction is rotated in accordance with the direction of the image to be processed on the workpiece, and the image rotator is rotated in accordance with the mask direction. The light beam from the light source is rotated to irradiate the work such that the amount of the light beam transmitted through the pattern is increased. Thus, the use efficiency of the light beam from the light source can be increased, and a predetermined pattern on the workpiece can be irradiated with the predetermined pattern, so that the productivity at the time of optical processing can be improved.

[0035]

Embodiments of the present invention will be described below in detail with reference to the drawings. FIG. 1 is a configuration diagram of a main part of an optical processing machine according to the first embodiment. Here, a laser processing machine such as a laser marker will be described as an example. The apparatus according to the present invention is also applicable to laser etching, annealing, and the like. The laser oscillator 1 includes an oscillator such as an excimer laser oscillator that emits a laser beam 1a having a predetermined sectional shape.
a is incident on the incident surface 2 a of the image rotator 2. The image rotator 2 receives the incident laser beam 1a.
Is an optical element for rotating the laser beam at a predetermined rotation angle about the optical axis, and the laser beam 1b emitted from the emission surface 2b
Is irradiated on the mask 4. The mask 4 has a pattern 4a on which, for example, a figure or a character to be marked is drawn, and only the drawn figure or the like has a pattern 4a that transmits the laser beam 1b. Alternatively, it is constituted by a transmissive element using a liquid crystal mask or the like. The laser beam 1c transmitted through the pattern 4a
Is reduced or enlarged by a condenser lens 5 composed of a telecentric lens or the like, and is irradiated on a work 7 installed on an upper surface of a processing stage 6.

The processing stage 6 has two orthogonal axes (X shown in the drawing).
(Axis, Y axis), and each axis is driven by an X axis driving means 8 and a Y axis driving means 9. The X-axis driving means 8 and the Y-axis driving means 9 have an X-axis servo motor 8a and a Y-axis servo motor 9a, respectively, and the rotation of these servo motors is controlled by a transmission mechanism including, for example, a ball screw and a nut. It is transmitted in the axial direction, and the processing stage 6 is driven. The X-axis servo motor 8a and the Y-axis servo motor 9a may be constituted by, for example, a stepping motor.

The image rotator 2 is, for example, shown in FIG.
The entrance surface 2a and the exit surface 2b are inclined at a predetermined angle β in directions opposite to each other with respect to the longitudinal direction of the image rotation prism, and the reflection surface 2c is It is parallel to the longitudinal direction and intersects the incident surface 2a and the exit surface 2b at the same angle as the predetermined angle β. Here, since the laser beam incident from the incident surface 2a is reflected by the reflecting surface 2c and is emitted from the emitting surface 2b, the image incident from the incident surface 2a moves vertically (here, a direction perpendicular to the reflecting surface 2c). Are emitted from the emission surface 2b as an image in which the positional relationship is inverted.
When the image rotator 2 rotates, the emitted image rotates twice as much as the rotated angle.

The image rotator 2 is mounted so as to penetrate the center of a first rotatable disk-shaped rotary stage 3, and the rotation axis of the rotary stage 3 is in the longitudinal direction of the image rotator 2. It is parallel to.
A gear 16 is provided on the outer peripheral surface of the first rotary stage 3.
The gear 16b is engaged with a gear 16a attached to the output shaft of the first rotary motor 15 composed of, for example, a stepping motor. The image rotator 2 is rotated about the rotation axis by the rotation of the first rotation motor 15.

The rotation angle input means 11 sets the mask direction C1 of the mask 4 as a rotation angle with respect to the longitudinal direction of the cross section of the laser beam 1a (hereinafter referred to as a reference position). FIG. 3 shows the mask direction C1 and the reference position C0.
In the figure, the reference position C0 corresponding to the mask direction C1 of the pattern 4a to be irradiated is shown.
Is set by the rotation angle input means 11. The rotation angle input means 11 may be composed of, for example, a numeric keypad for inputting numerical data of the rotation angle θ, a write switch for giving a command to write the input data, or a general keyboard. Alternatively, for example, the configuration data may be input from another management control device that manages the operation of the laser processing machine via data communication or the like.

Considering that the cross section perpendicular to the optical axis of the laser beam 1a emitted from the laser oscillator 1 usually overlaps the original shape when rotated by 180 degrees (for example, a rectangle in the case of an excimer laser). The setting range of the rotation angle θ is at least ±
The angle may be 90 ° or more. Therefore, in this case,
The rotatable range of the first rotary stage 3 may be １ ／ of the set range of the rotation angle θ, that is, ± 45 ° or more.
No further control mechanism for the rotation angle is required.

The controller 10 is composed of a computer device mainly composed of a microcomputer or the like.
The controller 10 inputs setting data of the rotation angle θ in the mask direction C1 from the rotation angle input means 11, calculates a rotation command value to the first rotation motor 15 based on the setting data, and outputs the command. The image rotator 2 is rotated by an angle corresponding to 1/2 of the rotation angle .theta. In the mask direction C1. Further, the controller 10 calculates and outputs drive command values to the X-axis driving means 8 and the Y-axis driving means 9, and performs control so as to position the processing stage 6 at a predetermined position to be irradiated.

FIGS. 4 to 6 show examples of the pattern 4a of the mask 4 according to the first embodiment. 4 shows a case where the mask direction C1 coincides with the reference position C0 (that is, the mask direction C1 is 0 °). FIG. 4 shows that the mask direction C1 is 90 °, and FIG. 5 shows that the mask direction C1 is at a predetermined angle θ. There is a case. As shown in these figures,
Each pattern 4a on the mask 4 is drawn in a predetermined mask direction C1 according to each figure or character or the purpose of processing. When the longitudinal direction of the laser beam 1a is oriented in the mask direction C1, each pattern 4a is completely inserted into the cross section of the laser beam 1a.

Next, the operation of the present embodiment will be described. The operator places the mask 4 at a predetermined position in accordance with the work 7 to be processed, and sets the rotation angle θ (each angle shown in FIGS. 4 to 6) in the mask direction C1 corresponding to the pattern 4a of the mask 4. It is set by the rotation angle input means 11.
When machining is started thereafter, the controller 10 controls the rotation command value of the first rotation motor 15 (for a pulse motor, , The number of rotation pulses).
As a result, the longitudinal direction of the cross section of the laser beam 1b emitted from the image rotator 2 is directed to the set rotation angle θ. Then, the controller 10 calculates and outputs a drive command value to the X-axis driving means 8 and the Y-axis driving means 9, and performs processing by positioning the processing stage 6 at a predetermined position to be irradiated.

As described above, the image rotator 2 is rotated in accordance with the mask direction C1 of each mask 4 to rotate the longitudinal direction of the cross section of the laser beam 1a. As a result, the unused portion of the laser beam 1a is reduced, and the laser beam 1a can be efficiently used as a whole. This also allows the laser beam 1a
Since the number of times of irradiation is reduced, the operating rate of the laser processing machine is increased, and the productivity is improved.

In this embodiment, the controller 10 automatically controls the first rotating stage 3 to a predetermined angle based on the setting data of the rotating angle θ inputted by the rotating angle input means 11. However, the present invention is not limited to this. For example, an operator may be able to manually rotate the first rotary stage 3 at a predetermined angle in accordance with the mask direction C1.

Next, a second embodiment will be described with reference to FIGS. FIG. 7 shows a configuration diagram of a laser processing machine according to the present embodiment. In the figure, the same components as those in FIG. 1 are denoted by the same reference numerals, and description thereof will be omitted.
An image rotator 2 attached to a first rotary stage 3 rotatably driven by a first rotary motor 15 emits a laser beam 1a emitted from a laser oscillator 1.
Is applied to the mask 4 attached on the rotation axis of the second rotation stage 14. The laser beam 1c transmitted through the pattern 4a of the mask 4 is reduced or enlarged by the condenser lens 5, and is irradiated on the work 7 installed on the upper surface of the processing stage 6.

A hollow portion is provided near the rotation axis of the second rotary stage 14, so that the laser beam 1c transmitted through the mask 4 can reach the condenser lens 5 through the hollow portion. I have. A gear 18b is attached to the outer peripheral surface of the second rotary stage 14, and this gear 18b meshes with a gear 18a attached to the output shaft of a second rotary motor 17 composed of, for example, a stepping motor. I have. The mask 4 is rotated around the optical axis of the laser beam 1b via the gears 18a and 18b by the rotation of the second rotary motor 17.

The processing program storage means 12 stores the first rotation stage 3, the second rotation stage 14, and the processing stage 6 in a predetermined sequence corresponding to the processing purpose and the shape of the pattern 4a of the mask 4. A machining program representing a processing procedure is stored in advance before machining is started. The method of storing the machining program in the machining program storage means 12 may be input, for example, by a general keyboard or a dedicated machining program input switch (not shown), or may be inserted and removed like a digital cassette tape or a floppy disk. Alternatively, the input may be made using a readable / writable external memory, communication, or the like.
The processing program is set according to the contents shown in FIG. 8, for example. In FIG. 8, the position coordinates (X, Y coordinates) of the processing stage 6 at each processing step corresponding to the processing point number, and And the mask direction C1 of the mask 4 at the position.

Here, the processing purpose in this embodiment is as follows.
It is assumed that a curved marking as shown in FIG. 9 is performed, and the pattern 4a of the mask 4 is represented by a rectangle as shown in FIG. At this time, by controlling the position of the processing stage 6, the laser beam 1 c transmitted through the pattern 4 a sequentially moves to the irradiation positions 31, 32, 33, etc., and the first rotary stage 3 and the second rotary stage 14. Is controlled, the mask direction C1 becomes the rotation angles .theta.1, .theta.2, .theta.3 corresponding to the respective irradiation positions 31, 32, 33. As described in the previous embodiment, the rotation angle of the first rotation stage 3 (that is, the rotation angle of the image rotator 2) is one of the rotation angle of the second rotation stage 14 (that is, the rotation angle in the mask direction C1). / 2. In such a case, each of the irradiation positions 31, 32, and 33 corresponds to the position shown in FIG.
Corresponds to the position of the processing stage 6 at each processing point number (that is, corresponds to a processing step), and each rotation angle θ
1, θ2 and θ3 are the mask directions C1 of the mask 4 at each position.
It is assumed that the machining program is created in advance so as to correspond to.

FIG. 11 shows an example of a flowchart of the processing sequence processing according to the present embodiment, and the processing procedure in the present embodiment will be described with reference to FIG. Here, the number of each processing step is represented by adding S, and the position coordinates of the processing stage 6 corresponding to the processing point number n are represented by (Xn, Y
n), and the rotation angle θn in the mask direction C1 at this position. First, in S1, the controller 10 reads a machining program corresponding to the workpiece 7 to be machined from the machining program storage means 12, and starts machining according to the machining program. Then, in S2, the processing point number n is initialized (normally, n = 0). After this, S3
Then, a drive command is output to the X-axis driving means 8 and the Y-axis driving means 9 to position the processing stage 6, and the work 7 is moved to the processing position (Xn, Yn) corresponding to the processing point number n. Next, in step S4, the second rotation stage 14 is controlled via the second rotation motor 17 to rotate the mask 4 to the rotation angle θn corresponding to the processing point number n, and in step S5
Then, the first rotation stage 3 is controlled via the first rotation motor 15 and the image rotator 2 is rotated by the rotation angle θn.
Rotate to 1/2 of the angle. Thereafter, in step S6, the work 7 is irradiated with the laser beam 1c by controlling the Q switch (not shown). Next, in S7, it is checked whether or not the machining point number n has become equal to or greater than the maximum set value N in the machining program. After n is incremented by 1, the process returns to S3 to repeat the above processing. On the other hand, when it becomes equal to or more than the maximum set value N, the processing is ended in S9.

In this way, the work 7 is automatically moved to each processing point position according to the processing program of the work 7, and the mask direction C1 matches the direction of the image of the laser beam at each processing point position. By rotating the mask 4 and the image rotator 2 corresponding to the mask direction C1, laser processing can be performed automatically. At this time, since the image rotator 2 is rotated in accordance with the mask direction C1 of each mask 4, unnecessary energy that does not contribute to the processing among the energy of the laser beam 1a can be reduced, and the laser beam 1a as a whole can be reduced. Can be used efficiently. Further, similarly to the previous embodiment, the number of times of irradiation of the laser beam 1a is reduced, so that the operation rate of the laser processing machine is increased, and the productivity is improved.

Next, a third embodiment will be described with reference to FIG. FIG. 12 shows a configuration diagram of a laser processing machine according to the present embodiment. In this embodiment, an example is shown in which the rotation of the image rotator 2 and the mask 4 in the second embodiment is rotated by the same motor. I have.
7, the same components as those shown in FIG. 7 are denoted by the same reference numerals, and the description thereof will be omitted. The gear 16a and the gear 18a are both attached to the output shaft of the same rotation motor via a connection shaft 19. As this rotation motor, for example, a stepping motor is used. In the present embodiment, an example is shown in which the first rotation motor 15 for rotating the image rotator 2 is also used.
May be used also as the second rotation motor 17 for rotating the motor.
As described above, since the rotation angle of the image rotator 2 must be に 対 し て of the rotation angle of the mask 4 in the mask direction C1, the reduction ratio Ri of the gears 16a and 16b is required.
And the reduction ratio Rm of the gears 18a and 18b are configured to satisfy the following relational expression.

Ri / Rm = 2 where Ri represents the number of teeth of the gear 16b / the number of teeth of the gear 16a, and Rm represents the number of teeth of the gear 18b / the number of teeth of the gear 18a.

In such a configuration, the controller 10
Controls the first rotation motor 15 so as to rotate the mask 4 in accordance with the rotation angle θ in the mask direction C1, thereby simultaneously rotating the image rotator 2 by the rotation angle θ / 2.
Can be controlled. Therefore, since the controller 10 has to perform only the rotation control processing of one of the image rotator 2 and the mask 4, the calculation load during the processing sequence control is reduced. The processing procedure at this time is as shown in FIG.
Is basically the same as the flowchart shown in FIG. However, the processing of S4 or S5 in the figure can be omitted. Thus, the same operation and effect as those of the second embodiment can be obtained, and the control processing is simplified.

As described above, the work is performed so that the longitudinal direction of the cross section perpendicular to the optical axis of the laser beam is equal to the mask direction C1 of the mask 4 and the image of the pattern 4a of the mask 4 is oriented in a predetermined direction. 7, the rotation angles of the mask 4 and the image rotator 2 with respect to the laser beam are controlled. Therefore, the portion of the laser beam that is not used for processing is reduced, and the energy of the laser beam can be maximized within the usable range. As a result, the energy of the laser beam can be used efficiently, and the number of times of irradiating the laser beam to the work 7 is reduced, so that the operation rate of the laser processing machine is increased and the productivity is improved.

The rotation angle of the mask 4 and / or the image rotator 2 is set in advance by the controller 10 in accordance with the direction of the image to be processed at the predetermined irradiation position of the work 7. The rotation of the mask 4 and the image rotator 2 is automatically controlled based on the rotation angle. Therefore, optical processing can be automatically performed using various types of masks 4 having different mask directions (longitudinal direction of the pattern 4a), and it is easy to respond to automation of the optical processing machine. As described above, the efficiency of use of the laser beam can be improved regardless of the direction of the mask direction C1. This allows the mask direction to be set arbitrarily when designing the pattern of the mask 4.
The design constraints are eased and the design work is facilitated.

In the above embodiment, the positional relationship between the mask 4 and the image rotator 2 which constitute the main optical device according to the present invention is described with reference to the case where the image rotator 2 receives the laser beam 1 a from the laser oscillator 1. Although the mask 4 is irradiated after being rotated, this position may be reversed. That is, the laser beam 1a from the laser oscillator 1 is applied to the mask 4, and the mask 4 is set or rotated so that the mask direction C1 of the mask 4 coincides with the longitudinal direction of the cross section of the laser beam 1a. The use efficiency of the laser beam 1a from the laser beam may be increased, and the laser beam transmitted through the mask 4 may be rotated by the image rotator 2 to irradiate the workpiece. In this case, the rotation angle of the image rotator 2 may be set in the mask direction at each processing position in the processing program shown in FIG.

The image rotator 2 described in the above embodiment is not limited to this, and may be, for example, an image rotator 2 using three mirrors as shown in FIG. This image rotator 2
Is provided with a mirror 21 at the upper part on the incident side and a mirror 23 at the upper part on the output side, and a mirror 22
It has. Mirror 21 and mirror 23 are mirror 22
At the same angle β and toward the opposite side. Thus, the image incident on the mirror 21 is emitted from the mirror 23 with the up-down direction being reversed in the figure. Then, by rotating such an image rotator 2 in the longitudinal direction by a predetermined angle θ0, the image on the emission side is rotated twice the angle θ0 with respect to the image on the incident side in the same manner as described above.

Further, in the above embodiment, the irradiation position moving means for moving the irradiation position of the image to be processed onto the work 7 is provided so as to be able to place the work 7 and move in the direction perpendicular to the optical axis to be positioned. Although the example using the processing stage 6 is shown, the present invention is not limited to this. For example, the irradiation position moving means may be constituted by means (not shown) capable of moving the condensing lens 5 composed of a telecentric lens in a direction perpendicular to the optical axis and positioning. The irradiation position moving means can be configured to include, for example, a two-axis orthogonal stage and a drive motor, similarly to the processing stage 6. In this case, similar to the case where the processing stage 6 is used,
Since the telecentric lens is widely used in ordinary optical equipment, the configuration is easy.

Further, the light source of the light beam is not limited to an excimer laser oscillator, and other light sources may be used as long as the light beam has a directional shape such as a rectangle or an ellipse. It may be. And, as the optical processing machine using the optical device according to the present invention, an excimer laser processing machine has been described as an example, but is not limited thereto, and has the above-described directionality from another light source. The same operation and effect can be obtained in a processing machine that performs optical processing using a light beam.

[Brief description of the drawings]

FIG. 1 shows a configuration diagram of an example of an optical processing machine according to a first embodiment of the present invention.

FIG. 2 shows an embodiment of an image rotator according to the present invention.

FIG. 3 is an explanatory diagram of a relationship between a mask direction and a reference position according to the present invention.

FIG. 4 is an explanatory diagram of a relationship example between a mask direction and a laser beam according to the present invention.

FIG. 5 is an explanatory diagram of a relationship example between a mask direction and a laser beam according to the present invention.

FIG. 6 is an explanatory diagram of a relationship example between a mask direction and a laser beam according to the present invention.

FIG. 7 shows a configuration diagram of a laser processing machine according to a second embodiment of the present invention.

FIG. 8 shows an example of a machining program according to a second embodiment of the present invention.

FIG. 9 shows an example of a marking trajectory of a laser beam machine according to a second embodiment of the present invention.

FIG. 10 shows a pattern example of a mask according to a second embodiment of the present invention.

FIG. 11 shows an example of a flowchart of a machining sequence process according to the second embodiment of the present invention.

FIG. 12 shows a configuration diagram of a laser processing machine according to a third embodiment of the present invention.

FIG. 13 shows another example of the image rotator according to the present invention.

FIG. 14 shows an example of a laser processing machine using a mask according to the related art.

FIG. 15 is an explanatory diagram of a mask according to a conventional technique.

FIG. 16 is an explanatory diagram of a relationship between a laser beam and a mask according to the related art.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Laser oscillator 1a, 1b, 1c Laser beam 2 Image rotator 4 Mask 4a Pattern 5 Condensing lens 6 Processing stage 7 Work 10 Controller 11 Rotation angle input means 12 Processing program storage means C1 Mask direction

────────────────────────────────────────────────── ─── Continued on the front page (51) Int.Cl. ⁶ Identification symbol FI H01S 3/101 H01L 21/30 502Z (72) Inventor Hironobu Ishima 1200 Manda, Hiratsuka-shi, Kanagawa Komatsu Ltd.

Claims (14)

[Claims] An optical device for forming an image by a light beam from a light source at a predetermined irradiation position, comprising: a mask (4) having a predetermined pattern (4a) transmitting the light beam on an optical axis; And an image rotator that is rotatably provided around the center and rotates the image of the light beam that has passed through the pattern (4a) of the mask (4) according to the rotated angle.
(2) An optical device comprising: 2. The optical device according to claim 1, wherein the mask is provided so as to be rotatable about the optical axis. 3. An optical device according to claim 1, further comprising:
The pattern (4a) of the mask (4) is installed or rotated so that the utilization efficiency of the light beam from the light source is increased, and the pattern (4) is controlled by controlling the rotation of the image rotator (2).
An optical processing machine characterized in that an image transmitted through a) is rotated in a predetermined direction to process a work (7). 4. The optical processing machine according to claim 3, wherein the image rotator is set on the basis of a preset rotation angle of the image of the pattern at a predetermined irradiation position of the workpiece. An optical processing machine comprising a controller (10) for controlling rotation. 5. An optical device for forming an image by a light beam from a light source at a predetermined irradiation position, wherein the optical device is provided rotatably about an optical axis of the light beam, and the light beam is rotated in accordance with the rotated angle. An image rotator (2) for rotating and passing the same, and a mask (4) having on the optical axis a predetermined pattern (4a) for transmitting a light beam passing through the image rotator (2). Optical device. 6. The optical device according to claim 5, wherein the mask is provided so as to be rotatable about the optical axis. 7. The optical device according to claim 5, wherein an angle at which the image rotator is rotated is の of an angle at which the mask is rotated. . 8. An optical device according to claim 5, wherein the pattern (4a) of the mask (4) is set or aligned so as to coincide with the image direction at a predetermined processing position of the work (7). The mask (4) is rotated by controlling the rotation of the image rotator (2) so that the use efficiency of the light beam from the light source is increased, and is transmitted through the pattern (4a) of the mask (4). An optical processing machine characterized in that a processed image is processed into a work (7). 9. The pattern of the mask (4) according to claim 8, based on a preset rotation angle of an image of the pattern (4a) at a predetermined irradiation position of the workpiece (7). A controller (1) for setting or rotating (4a) and controlling the rotation of the image rotator (2) so as to increase the light beam use efficiency in accordance with the longitudinal direction of the pattern (4a).
An optical processing machine comprising (0). 10. An optical processing machine according to claim 3, further comprising an irradiation position moving means for moving an irradiation position of the image to be processed onto the work (7). Optical processing machine. 11. The optical processing machine according to claim 10, wherein the irradiation position moving means is a processing stage (6) for moving and positioning the work (7). 12. The optical processing machine according to claim 10, wherein the irradiation position moving means converts the image to be processed into a workpiece.
(7) An optical processing machine, characterized in that the optical processing machine is means for positioning by moving the telecentric lens to be transferred to the optical axis in a direction perpendicular to the optical axis. 13. A mask (4) formed by a light beam from a light source.
In the light beam irradiation control method of the optical processing machine for processing the image of the pattern (4a) at a predetermined irradiation position of the work (7), the pattern (4a) ) Is installed or rotated, and the direction of the image transmitted through the pattern (4a) is rotated by the image rotator (2) to irradiate the image onto the work (7). 14. A mask (4) using a light beam from a light source.
In the light beam irradiation control method of the optical processing machine for processing the image of the pattern (4a) in a predetermined irradiation position of the work (7), the image of the pattern (4a) of the mask (4) is The mask (4) is installed or rotated so as to face a predetermined direction at a predetermined irradiation position, and the light beam is applied such that the use efficiency of the light beam from the light source increases according to the longitudinal direction of the pattern (4a). A light beam irradiation control method characterized by irradiating the pattern (4a) with rotation by an image rotator (2) and irradiating the image to a work (7).