JPH11104542A - Coating application system of coating material to substrate - Google Patents

Coating application system of coating material to substrate

Info

Publication number
JPH11104542A
JPH11104542A JP27448397A JP27448397A JPH11104542A JP H11104542 A JPH11104542 A JP H11104542A JP 27448397 A JP27448397 A JP 27448397A JP 27448397 A JP27448397 A JP 27448397A JP H11104542 A JPH11104542 A JP H11104542A
Authority
JP
Japan
Prior art keywords
substrate
line
coating
booth
circuit board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27448397A
Other languages
Japanese (ja)
Inventor
Keiji Miyaji
計二 宮地
Koichi Hoshino
幸一 星野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Sunac Corp
Original Assignee
Asahi Sunac Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Sunac Corp filed Critical Asahi Sunac Corp
Priority to JP27448397A priority Critical patent/JPH11104542A/en
Publication of JPH11104542A publication Critical patent/JPH11104542A/en
Pending legal-status Critical Current

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  • Coating Apparatus (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PROBLEM TO BE SOLVED: To make it possible to facilitate washing of substrate supporters, to reduce the line space over the entire part and to decrease the amt. of the washing liquid to be used. SOLUTION: A coating application line 21 and a drying line 22 are separated. A printed circuit board 28 is supported on the substrate supporter 25 transported by a transporting device 23 of the coating application line 21 and a liquid photoresist agent 38 is applied on printed circuit board 28 in a coating application booth 31. The printed circuit board 28 is thereafter removed from the substrate supporter 25 in an unloading section 34 and is transferred to a transporting device 24 on the drying line 22 side and is dried in a drying booth 35. On the other hand, the substrate supporter 25 on the coating application line 21 side from which the printed circuit board 28 is removed is washed in a washing booth 32 on the coating application line 21 side. At this time, the photoresist agent 38 adhered to the substrate supporter 25 is before curing and is, therefore, liable to fall. The easy washing is thus made possible.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、基板支持具に基板
を支持させた状態でその基板に塗布剤を塗布し、その
後、前記基板を乾燥させるようにした基板への塗布剤の
塗布システムに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a system for applying a coating material to a substrate, wherein the coating material is applied to the substrate while the substrate is supported by a substrate support, and then the substrate is dried. .

【0002】[0002]

【発明が解決しようとする課題】例えばプリント基板に
ソルダレジスト層を形成するために、プリント基板に液
状のフォトレジスト剤を塗布する場合、従来では、図3
に示すようなシステムで行うようにしている。
For example, when a liquid photoresist agent is applied to a printed circuit board in order to form a solder resist layer on the printed circuit board, a conventional method is shown in FIG.
The system is as shown in the figure.

【0003】すなわち、塗布ブース1と、乾燥ブース2
と、洗浄ブース3とが一つの搬送装置4により連なった
構成となっている。搬送装置4のチェーン4aには、プ
リント基板5を吊り下げ状態に支持するための基板支持
具6(ハンガー)が多数個取り付けられていて、これら
基板支持具6が矢印方向に搬送されるようになってい
る。
That is, a coating booth 1 and a drying booth 2
And the washing booth 3 are connected by one transfer device 4. A large number of substrate supports 6 (hangers) for supporting the printed circuit board 5 in a suspended state are attached to the chain 4a of the transport device 4 so that the substrate supports 6 are transported in the direction of the arrow. Has become.

【0004】しかして、まず、着荷部7において、基板
支持具6にプリント基板5を支持させ、この状態でプリ
ント基板5は塗布ブース1に送られる。この塗布ブース
1において、プリント基板5に、スプレイガン8により
ソルダレジスト用のフォトレジスト剤9が塗布される。
この後、プリント基板5は乾燥ブース2に送られ、基板
支持具6に支持された状態で乾燥が行われる。この乾燥
後、脱荷部10においてプリント基板5を基板支持具6
から外し、そのプリント基板5は露光器側へ送られ、露
光、現像、本焼き付けなどが行われる。
[0004] First, in the loading section 7, the printed board 5 is supported by the board support 6, and the printed board 5 is sent to the coating booth 1 in this state. In the application booth 1, a photoresist agent 9 for solder resist is applied to the printed board 5 by a spray gun 8.
Thereafter, the printed circuit board 5 is sent to the drying booth 2 and is dried while being supported by the substrate support 6. After the drying, the printed board 5 is moved to the substrate support 6 in the unloading section 10.
, And the printed circuit board 5 is sent to the exposure device side, where exposure, development, final printing, and the like are performed.

【0005】一方、プリント基板5が外された基板支持
具6は、洗浄ブース3に送られ、ここで洗浄される。こ
こでの洗浄は、例えば基板支持具6を現像液などの洗浄
液中に入れて行ったり、或いは基板支持具6に洗浄液を
吹き付けることによって行われる。洗浄された基板支持
具6は再び着荷部7に送られ、その基板支持具6に新た
なプリント基板5が支持されるようになる。
On the other hand, the substrate support 6 from which the printed circuit board 5 has been removed is sent to the cleaning booth 3 where it is cleaned. The cleaning here is performed, for example, by placing the substrate support 6 in a cleaning liquid such as a developing solution, or by spraying the cleaning liquid on the substrate support 6. The washed substrate support 6 is sent to the loading section 7 again, and a new printed circuit board 5 is supported on the substrate support 6.

【0006】しかしながら、上記した従来のシステムで
は、次のような問題点がある。すなわち、基板支持具6
を洗浄ブース3において洗浄するについて、基板支持具
6が乾燥ブース2を通過した後であり、基板支持具6に
付着したフォトレジスト剤9が硬化した後になるため、
そのフォトレジスト剤9が落ちにくく、洗浄に多くの時
間がかかることになる。このため、全体のラインスペー
スを大きく確保する必要があり、また、多量の洗浄液が
必要となる。
[0006] However, the above-mentioned conventional system has the following problems. That is, the substrate support 6
Is washed in the washing booth 3 after the substrate support 6 has passed through the drying booth 2 and after the photoresist agent 9 attached to the substrate support 6 has been cured.
The photoresist agent 9 hardly falls off, and it takes much time for cleaning. For this reason, it is necessary to secure a large overall line space, and a large amount of cleaning liquid is required.

【0007】本発明は上記した事情に鑑みてなされたも
のであり、その目的は、基板支持具の洗浄が容易にでき
て、全体のラインスペースを小さくできると共に、洗浄
液の使用量も少なくすることができる基板への塗布剤の
塗布システムを提供するにある。
The present invention has been made in view of the above circumstances, and an object of the present invention is to facilitate the cleaning of a substrate support, to reduce the entire line space, and to reduce the amount of a cleaning liquid used. It is an object of the present invention to provide a system for applying a coating agent to a substrate.

【0008】[0008]

【課題を解決するための手段】本発明の基板への塗布剤
の塗布システムは、上記の目的を達成するために、塗布
ラインと乾燥ラインとを分離して備え、前記塗布ライン
の搬送装置により搬送される基板支持具に基板を支持さ
せた状態でその基板に塗布剤を塗布し、塗布剤が塗布さ
れた前記基板を前記基板支持具から外して前記乾燥ライ
ンへ移す一方、基板が外された前記基板支持具を塗布ラ
イン側において洗浄するようにしたことを特徴とするも
のである。
In order to achieve the above object, a system for applying a coating agent to a substrate according to the present invention is provided with a coating line and a drying line separated from each other. While applying the coating agent to the substrate in a state where the substrate is supported by the substrate support being conveyed, the substrate on which the coating agent is applied is removed from the substrate support and transferred to the drying line, while the substrate is removed. The substrate support is cleaned on the coating line side.

【0009】上記した手段によれば、基板に塗布剤を塗
布した後、基板は基板支持具から外されて乾燥ラインへ
移され乾燥されるが、基板が外された基板支持具は乾燥
ラインへは移されず、塗布ライン側において洗浄され
る。したがって、基板支持具としては乾燥ラインを通過
せずに洗浄されることになるため、基板支持具に付着し
た塗布剤は硬化前であるため落ちやすく、容易に洗浄す
ることができるようになる。
According to the above-mentioned means, after the coating agent is applied to the substrate, the substrate is removed from the substrate support and moved to a drying line and dried. Is not transferred and is washed on the application line side. Therefore, since the substrate support is cleaned without passing through the drying line, the coating agent adhered to the substrate support is easy to be dropped since it has not been cured, and can be easily cleaned.

【0010】[0010]

【発明の実施の形態】以下、本発明を、プリント基板に
ソルダレジスト層を形成するために、プリント基板に液
状のフォトレジスト剤を塗布する場合に適用した一実施
例について図1及び図2を参照して説明する。まず、図
1において、本発明の塗布システムでは、塗布ライン2
1と乾燥ライン22とが分離されていて、それぞれに搬
送装置23,24が設けられている。各搬送装置23,
24は、図示しないモータを駆動源として、環状に設け
られたチェーン23a,24aをそれぞれ矢印A,Bで
示す方向へ移動させる構成となっている。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, an embodiment in which the present invention is applied to a case where a liquid photoresist agent is applied to a printed circuit board in order to form a solder resist layer on the printed circuit board will be described with reference to FIGS. It will be described with reference to FIG. First, in FIG. 1, in the coating system of the present invention, a coating line 2
1 and a drying line 22 are separated from each other, and transporting devices 23 and 24 are provided respectively. Each transfer device 23,
Reference numeral 24 denotes a configuration in which an annular chain 23a, 24a is moved in directions indicated by arrows A, B, respectively, using a motor (not shown) as a drive source.

【0011】塗布ライン21側のチェーン23aには、
図2に示すようなハンガーと呼ばれる基板支持具25が
多数個取り付けられていて、これら基板支持具25がチ
ェーン23aを介して矢印Aで示す方向へ搬送されるよ
うになっている。基板支持具25は、本体部26の下部
に、洗濯ばさみのような挟み具27が2個取り付けられ
た構成となっていて、本体部26の上端部が上記チェー
ン23aに取り付けられている。この基板支持具25
は、基板としてのプリント基板28の上辺部を2個の挟
み具27により挟むことにより、プリント基板28を吊
り下げ状態に支持する構成となっている。乾燥ライン2
2のチェーン24a側にも、上記基板支持具25と同様
な構成の基板支持具29が取り付けられている。
The chain 23a on the coating line 21 side includes
A plurality of substrate supports 25 called hangers as shown in FIG. 2 are attached, and these substrate supports 25 are transported in the direction indicated by arrow A via the chain 23a. The substrate support 25 has a configuration in which two clippers 27 such as clothespins are attached to the lower portion of the main body 26, and the upper end of the main body 26 is attached to the chain 23a. . This substrate support 25
Is configured to support the printed board 28 in a suspended state by sandwiching an upper side portion of the printed board 28 as a board by two clipping members 27. Drying line 2
The substrate support 29 having the same configuration as the substrate support 25 is also attached to the second chain 24a side.

【0012】塗布ライン21には、塗布ブース31と洗
浄ブース32とが図1に示す配置形態で設けられてい
る。塗布ブース31の図1中左側が着荷部33とされ、
また、塗布ブース31と洗浄ブース32との間の右側が
脱荷部34とされている。また、乾燥ライン22には乾
燥ブース35が設けられていて、乾燥ブース35の図1
中左側が着荷部36とされ、右側が脱荷部37とされて
いる。
The coating line 21 is provided with a coating booth 31 and a washing booth 32 in the arrangement shown in FIG. The left side of the coating booth 31 in FIG.
The right side between the coating booth 31 and the washing booth 32 is an unloading section 34. A drying booth 35 is provided in the drying line 22.
The middle left is the receiving part 36 and the right is the unloading part 37.

【0013】塗布ブース31内には、塗布剤としての液
状のフォトレジスト剤38を霧状にして吹き付けるスプ
レイガン39が配設され、洗浄ブース32内には、シン
ナーなどの洗浄液40を吹き付けるスプレイガン41が
配設されている。乾燥ブース35には、約80℃の熱風
が供給されるようになっている。
A spray gun 39 for spraying a liquid photoresist agent 38 as a coating agent in a mist state is disposed in the coating booth 31, and a spray gun for spraying a cleaning liquid 40 such as a thinner in the cleaning booth 32. 41 are provided. Hot air of about 80 ° C. is supplied to the drying booth 35.

【0014】しかして、上記構成において、基板として
のプリント基板28に、塗布剤としてのフォトレジスト
剤38を塗布する場合には、次のようにして行う。ま
ず、塗布ライン21の着荷部33において、プリント基
板28を基板支持具25に吊り下げ状態に支持させ、こ
の状態でプリント基板28は塗布ブース31に送られ
る。この塗布ブース31において、プリント基板28の
表裏両面に、スプレイガン39によりフォトレジスト剤
38が塗布される。
In the above configuration, when the photoresist agent 38 as the coating agent is applied to the printed circuit board 28 as the substrate, the following is performed. First, in the loading section 33 of the coating line 21, the printed board 28 is supported by the board support 25 in a suspended state, and the printed board 28 is sent to the coating booth 31 in this state. In this application booth 31, a photoresist agent 38 is applied to both front and back surfaces of the printed circuit board 28 by a spray gun 39.

【0015】フォトレジスト剤38が塗布されたプリン
ト基板30は、脱荷部34に送られ、ここで基板支持具
27から外された後、乾燥ライン22の着荷部36にお
いて、乾燥ライン22側の基板支持具29に移し代えら
れる。基板支持具29に支持されたプリント基板28
は、乾燥ブース35に送られ、基板支持具29に支持さ
れた状態で熱風による乾燥が行われる。この乾燥後、プ
リント基板28は、脱荷部37において基板支持具29
から外された後、露光器側へ送られ、露光、現像、本焼
き付けなどが行われる。
The printed circuit board 30 to which the photoresist agent 38 has been applied is sent to the unloading section 34, where it is removed from the substrate support 27. It is transferred to the substrate support 29. Printed circuit board 28 supported by substrate support 29
Is sent to the drying booth 35 and dried by hot air while being supported by the substrate support 29. After this drying, the printed circuit board 28 is moved to the substrate support 29
After being removed from the device, it is sent to the exposure device side where exposure, development, main printing, and the like are performed.

【0016】一方、塗布ライン21において、プリント
基板28が外された基板支持具25は、洗浄ブース32
に送られ、ここで洗浄される。ここでの洗浄は、基板支
持具25に、スプレイガン41により洗浄液40を吹き
付けることによって行われる。洗浄された基板支持具2
5は、洗浄ブース32の出口側において、エアーを吹き
付けることにより乾燥され、この後、再び着荷部33に
送られ、その基板支持具25に新たなプリント基板28
が支持されるようになる。
On the other hand, in the coating line 21, the substrate support 25 from which the printed circuit board 28 has been removed
, Where it is washed. The cleaning here is performed by spraying a cleaning liquid 40 on the substrate support 25 with a spray gun 41. Washed substrate support 2
5 is dried by blowing air at the outlet side of the washing booth 32, and then is sent again to the loading section 33, where a new printed board 28 is attached to the board support 25.
Will be supported.

【0017】上記した実施例によれば、次のような効果
を得ることができる。すなわち、プリント基板28にフ
ォトレジスト剤38を塗布した後、そのプリント基板2
8は塗布ライン21側の基板支持具25から外されて乾
燥ライン22へ移され乾燥されるが、プリント基板28
が外された基板支持具25は乾燥ライン22へは移され
ず、塗布ライン21側において洗浄される。したがっ
て、塗布ライン21側の基板支持具25としては乾燥ラ
イン22を通過せずに洗浄されることになるため、基板
支持具25に付着したフォトレジスト剤38は硬化前で
あるため落ちやすく、容易に洗浄することができるよう
になる。これに伴い、基板支持具25の洗浄に要する時
間を少なくでき、ひいては全体のラインスペースを小さ
くすることが可能になり、また、洗浄液40の使用量も
少なくすることが可能になる。
According to the above-described embodiment, the following effects can be obtained. That is, after applying the photoresist agent 38 to the printed board 28, the printed board 2
8 is removed from the substrate support 25 on the application line 21 side and transferred to the drying line 22 for drying.
The substrate support 25 from which is removed is not transferred to the drying line 22 but is washed on the application line 21 side. Therefore, since the substrate support 25 on the application line 21 side is washed without passing through the drying line 22, the photoresist agent 38 adhered to the substrate support 25 is easy to fall off since it has not been cured, and is easy to clean. Can be washed. Along with this, the time required for cleaning the substrate support 25 can be reduced, and the overall line space can be reduced, and the amount of the cleaning liquid 40 used can be reduced.

【0018】本発明は、上記した実施例にのみ限定され
るものではなく、次のように変形または拡張することが
できる。基板支持具25を洗浄する手段については、洗
浄液40を吹き付けながら、ブラシを回転させることに
より洗浄する構成としてもよく、また、基板支持具25
を、洗浄液40を貯留した槽内に入れて洗浄する構成と
してもよい。
The present invention is not limited to the embodiment described above, but can be modified or expanded as follows. The means for cleaning the substrate support 25 may be configured such that the cleaning is performed by rotating the brush while spraying the cleaning liquid 40.
May be placed in a tank in which the cleaning liquid 40 is stored for cleaning.

【0019】基板としては、プリント基板28に限られ
ず、矩形状をなすものであれば、スイッチ装置のパネル
などでも良く、また、塗布剤としては、ペンキなどの塗
料であっても良い。
The substrate is not limited to the printed circuit board 28, but may be a switch device panel or the like as long as it has a rectangular shape. The coating agent may be a paint such as paint.

【0020】[0020]

【発明の効果】以上の説明にて明らかなように、本発明
によれば、塗布ラインの基板支持具としては乾燥ライン
を通過せずに洗浄されることになるため、基板支持具に
付着した塗布剤は硬化前であるため落ちやすく、容易に
洗浄することができるようになる。これに伴い、基板支
持具の洗浄に要する時間を少なくでき、ひいては全体の
ラインスペースを小さくすることが可能になり、また、
洗浄液の使用量も少なくすることが可能になる。
As is apparent from the above description, according to the present invention, since the substrate support of the application line is cleaned without passing through the drying line, the substrate adheres to the substrate support. Since the coating agent has not yet been cured, it easily falls off and can be easily washed. Along with this, the time required for cleaning the substrate support can be reduced, and as a result, the entire line space can be reduced, and
It is also possible to reduce the amount of the cleaning liquid used.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例のシステムを簡略化して示す
平面図
FIG. 1 is a simplified plan view showing a system according to an embodiment of the present invention.

【図2】プリント基板を基板支持具にて支持した状態の
斜視図
FIG. 2 is a perspective view of a state in which a printed board is supported by a board support.

【図3】従来例を示す図1相当図FIG. 3 is a diagram corresponding to FIG. 1 showing a conventional example.

【符号の説明】[Explanation of symbols]

21は塗布ライン、22は乾燥ライン、23,24は搬
送装置、25,29は基板支持具、28はプリント基板
(基板)、31は塗布ブース、32は洗浄ブース、35
は乾燥ブース、38はフォトレジスト剤(塗布剤)、4
0は洗浄液を示す。
21 is a coating line, 22 is a drying line, 23 and 24 are transfer devices, 25 and 29 are substrate supports, 28 is a printed circuit board (substrate), 31 is a coating booth, 32 is a washing booth, 35
Is a drying booth, 38 is a photoresist agent (coating agent), 4
0 indicates a cleaning solution.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 塗布ラインと乾燥ラインとを分離して備
え、 前記塗布ラインの搬送装置により搬送される基板支持具
に基板を支持させた状態でその基板に塗布剤を塗布し、 塗布剤が塗布された前記基板を前記基板支持具から外し
て前記乾燥ラインへ移す一方、基板が外された前記基板
支持具を塗布ライン側において洗浄するようにしたこと
を特徴とする基板への塗布剤の塗布システム。
1. A coating line and a drying line are separately provided, and an application agent is applied to a substrate while the substrate is supported by a substrate support conveyed by a conveyance device of the application line. The coated substrate is removed from the substrate support and transferred to the drying line, while the substrate support from which the substrate is removed is washed on the coating line side. Coating system.
JP27448397A 1997-10-07 1997-10-07 Coating application system of coating material to substrate Pending JPH11104542A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27448397A JPH11104542A (en) 1997-10-07 1997-10-07 Coating application system of coating material to substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27448397A JPH11104542A (en) 1997-10-07 1997-10-07 Coating application system of coating material to substrate

Publications (1)

Publication Number Publication Date
JPH11104542A true JPH11104542A (en) 1999-04-20

Family

ID=17542327

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27448397A Pending JPH11104542A (en) 1997-10-07 1997-10-07 Coating application system of coating material to substrate

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Country Link
JP (1) JPH11104542A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008038418A1 (en) * 2006-09-27 2008-04-03 Gogou Co., Ltd. Painting apparatus, painting facility, painting method, and method of manufacturing painted article
JP2012049541A (en) * 2010-08-26 2012-03-08 Samsung Electro-Mechanics Co Ltd Resist application apparatus for manufacturing printed circuit board
JP2016140773A (en) * 2015-01-29 2016-08-08 ダイハツ工業株式会社 Cleaning device of fixture for painting

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008038418A1 (en) * 2006-09-27 2008-04-03 Gogou Co., Ltd. Painting apparatus, painting facility, painting method, and method of manufacturing painted article
JPWO2008038418A1 (en) * 2006-09-27 2010-01-28 株式会社五合 Painting equipment, painting facility, painting method, and method for producing painted article
JP2012049541A (en) * 2010-08-26 2012-03-08 Samsung Electro-Mechanics Co Ltd Resist application apparatus for manufacturing printed circuit board
JP2016140773A (en) * 2015-01-29 2016-08-08 ダイハツ工業株式会社 Cleaning device of fixture for painting

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