JPH1089918A - Alignment device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To detect elements of diffracted light in two measuring directions by one detetcor by forming a plurality of diffracted pictures which hardly overlap substantially with each other on the surface of front focal point of an objective lens and at its conjugate position. SOLUTION: Two linear beams are formed so that they may form a specified angle on the surface of front focal point of an objective lens 9 and hardly overlap with each other substantially. Then an alignment beam formed of two linear beams crossing on the light axis can be formed on an object to be inspected like a wafer 10 which is arranged on the surface of the rear focal point of the lens 9. In this case, a diffracted light generating from an alignment mark formed on the wafer 10 by the alignment beam forms a plurality of diffracted pictures which hardly overlap with each other substantially on the surface of front focal point of the lens 9 and at its conjugate position. Further a space filter 12 is arranged at a position to reform a diffracted picture, thereby detecting elements of diffracted light in two measuring directions by one detector 13 without reducing the detection efficiency substantially.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an alignment apparatus, and more particularly to an alignment apparatus for measuring and aligning a position of a wafer in a manufacturing process of a semiconductor device or the like.

[0002]

2. Description of the Related Art FIG. 8 schematically shows a structure of a conventional alignment apparatus. In the apparatus shown in FIG. 8, a laser beam 102 emitted from a laser light source 101 is split via a polarizing beam splitter 103a into two beams whose polarization directions are orthogonal to each other. That is, the p-polarized beam transmitted through the polarizing beam splitter 103a is incident on a cylindrical lens 104a having a positive refractive power in a plane perpendicular to the plane of FIG. On the other hand, the s-polarized beam reflected by the polarization beam splitter 103b passes through a mirror 105b, and then has a positive refractive power in a plane parallel to the paper surface.
4b.

[0003] p through a cylindrical lens 104a
The polarized beam enters the polarizing beam splitter 103b via the mirror 105a, and the s-polarized beam enters the polarizing beam splitter 103b via the cylindrical lens 104b. Thus,
P coupled through polarizing beam splitter 103b
The polarized beam and the s-polarized beam form two linear beams orthogonal to each other about the optical axis on the rear focal plane of the cylindrical lens 104a and the cylindrical lens 104b. In addition, the cylindrical lens 1
The rear focal plane of the objective lens 107 coincides with the rear focal plane of the objective lens 107, and the rear focal plane of the objective lens 107 coincides with the rear focal plane of the cylindrical lens 104b. Therefore, the light from the two linear beams orthogonal to each other passes through the objective lens 107, and then, on the wafer 108 disposed on the rear focal plane, the light orthogonal to the optical axis.
A cross-shaped alignment beam composed of two linear beams is formed. Note that an alignment mark corresponding to the alignment beam is formed on the wafer 108.

The wafer 108 for the alignment beam
Diffracted light from the alignment mark of
7, a diffraction image is formed on the front focal plane. Light from this diffraction image is transmitted to the objective lens 107 and the polarizing beam splitter 10.
3b. The light reflected by the half mirror 106 enters the polarization beam splitter 103c via the relay lens 109. Thus, the light from the diffraction image is split into two lights via the polarizing beam splitter 103c, and re-forms the diffraction images on the spatial filters 110a and 110b, respectively. The light of the re-formed diffraction image is applied to the spatial filter 1
10a and the spatial filter 110b, the detector 1
11a and the detector 111b.

Here, the polarization beam splitter 103c
Is the diffracted light from the alignment mark with respect to one of the two linear beams constituting the cross alignment beam, and is used to measure the position of the wafer 108 in the X direction. Is the diffracted light component. The s-polarized light reflected by the polarization beam splitter 103c is diffracted light from the alignment mark with respect to the other linear beam of the two linear beams forming the cross alignment beam, and
Is a diffracted light component for position measurement in the Y direction.

FIG. 9 is a diagram showing a configuration of the spatial filter 110 of FIG. In FIG. 9, reference numeral 1 is used without distinguishing between the spatial filter 110a and the spatial filter 110b.
The reference numeral 10 is used. In FIG. 9, the spatial filter 110
Is composed of a light shielding portion 110c indicated by oblique lines in the figure and two rectangular light transmitting portions 110d. Therefore, the image 110e based on the reflected light from the wafer 108 when the alignment mark on the wafer 108 does not overlap the alignment beam, and the image 110e from the wafer 108 when the alignment mark on the wafer 108 overlaps the alignment beam. The zero-order diffraction image 110e based on the second-order diffracted light is blocked by the light-shielding portion 110c.

On the other hand, a predetermined order based on diffracted light of a predetermined order other than the 0th-order diffracted light from the wafer 108 in a state where the alignment beam and the alignment beam on the wafer 108 are overlapped (hereinafter simply referred to as “predetermined order diffracted light”). The diffraction image 110f passes through the light transmitting unit 110d, and passes through the detector 1
11 is detected. Thus, in the alignment apparatus of FIG. 8, the position of the alignment mark in the X direction and the position of the alignment mark in the Y direction
The directional position, that is, the X-directional position and the Y-directional position of the wafer 108 are measured.

[0008]

As described above, in the conventional alignment apparatus, a diffracted light component for measuring the position of the wafer 108 in the X direction and a diffracted light component for measuring the position of the wafer 108 in the Y direction are provided. And are detected by different detectors. Therefore, in order to further simplify the configuration of the conventional alignment apparatus, a configuration in which one detector detects two light components is considered. In this case, a spatial filter 120 having a configuration as shown in FIG. 10 is used.

In the spatial filter 120 shown in FIG. 10, in order to block a zero-order diffraction image 120a based on the zero-order diffraction light from the wafer 108, a cross-shaped light shielding portion 1 is formed at the center thereof.
20b are provided. Therefore, the central portion of the predetermined diffraction image 120c based on the diffraction light of the predetermined order from the wafer 108 is blocked by the cross-shaped light shielding portion 120b. Since the intensity distribution of the predetermined diffraction image 120c exhibits a so-called Gaussian distribution, blocking the central portion of the predetermined diffraction image 120c means that the portion having the highest intensity of the predetermined diffraction image 120c is blocked. As a result, the amount of light obtained by the detection unit decreases, and the detection efficiency decreases.

The present invention has been made in view of the above-mentioned problems, and has an alignment apparatus capable of detecting diffracted light components in two measurement directions with one detector without substantially lowering detection efficiency. The purpose is to provide.

[0011]

According to the present invention, there is provided an irradiation system for irradiating an object having an alignment mark formed thereon with an alignment beam through an objective lens. A detection system for detecting a diffracted light generated from the alignment mark with respect to the beam, and an alignment apparatus for measuring a position of the test object based on the diffracted light detected by the detection system; Has linear beam forming means for forming two linear beams at a predetermined angle to each other at the front focal plane of the objective lens and not substantially overlapping each other, and comprises a front focal plane of the objective lens. The objective lens is placed on the object to be examined disposed on a rear focal plane of the objective lens based on light from two linear beams formed on the surface. Provides alignments and wherein the forming of the alignment beam consisting of two linear beams intersecting at the optical axis.

According to a preferred aspect of the present invention, the detection system is arranged at a position optically conjugate with a position where the diffracted light from the alignment mark forms an image via the objective lens. A spatial filter for blocking light of a zero-order diffraction image formed by the zero-order diffracted light from the alignment mark and passing light of a predetermined diffraction image formed by diffracted light of a predetermined order other than the zero-order diffracted light; And a detector for detecting the light of the predetermined diffraction image via the filter. The optical system further includes an optical path separating unit configured to separate the diffracted light from the alignment mark from an optical path of the irradiation system to an optical path of the detection system, wherein the irradiation system includes an optical path of the irradiation system via the optical path separating unit. It is preferable to have a light shielding means for blocking the diffracted light from the alignment mark incident on the light source.

[0013]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS In the present invention, two linear beams are formed at a predetermined angle at the front focal plane of an objective lens and do not substantially overlap each other. Therefore, an alignment beam composed of two linear beams intersecting at the optical axis can be formed on a test object such as a wafer arranged on the rear focal plane of the objective lens. In this case, the diffracted light generated from the alignment mark formed on the wafer with respect to the alignment beam forms a plurality of diffraction images that do not substantially overlap each other at the front focal plane of the objective lens and its conjugate position.

Therefore, according to the present invention, for example, a spatial filter disposed at a position where a diffraction image is reproduced is provided.
The light of the 0th-order diffracted image formed by the 0th-order diffracted light from the alignment mark is blocked, and the light of the predetermined diffracted image formed by the diffracted light of the predetermined order other than the 0th-order diffracted light is passed, thereby substantially reducing the detection efficiency A single detector can detect diffracted light components in two measurement directions without using a single detector. Further, an optical path separating means for separating the diffracted light from the alignment mark from the light path of the irradiation system to the light path of the detection system is to cut off the diffracted light from the alignment mark incident on the light path of the irradiation system via the light path separating means. Is preferred. As a result, it is possible to avoid the return diffracted light from entering the light source, the output of the light source is stabilized, and the position measurement of the test object is stabilized.

An embodiment of the present invention will be described with reference to the accompanying drawings. FIG. 1 is a view schematically showing a configuration of an alignment apparatus according to a first embodiment of the present invention. The alignment apparatus of FIG. 1 includes a laser light source 1 that outputs a helium neon laser beam having a wavelength of 633 nm, for example. A laser beam 2 emitted from a laser light source 1 is split into two beams whose polarization directions are orthogonal to each other via a polarizing beam splitter 3a as a light splitting unit. That is, the p-polarized beam transmitted through the polarizing beam splitter 3a has a positive refractive power in a plane perpendicular to the plane of FIG. 1 including the optical axis AX and a plane parallel to the plane including the optical axis AX. And enters the cylindrical lens 4a having no refractive power. On the other hand, the s-polarized beam reflected by the polarizing beam splitter 3a passes through a mirror, has a positive refractive power in a plane parallel to the plane including the optical axis AX, and has a plane including the optical axis AX. Incident on a cylindrical lens 4b having no refracting power in a plane perpendicular to.

The p-polarized beam, which has been condensed in a plane perpendicular to the plane of the drawing including the optical axis AX by the action of the cylindrical lens 4a, passes through the stop 5a to form a parallel flat plate 6
a. The plane-parallel plate 6a is configured to be rotatable about an axis that passes through the optical axis AX and is parallel to a direction perpendicular to the paper surface. Therefore, by rotation of the parallel plane plate 6a, the incident beam is translated in a plane including the optical axis AX and perpendicular to the plane of the drawing. On the other hand, the s-polarized beam that has been condensed in a plane parallel to the sheet including the optical axis AX by the action of the cylindrical lens 4b enters the plane-parallel plate 6b via the stop 5b. The parallel plane plate 6b has an optical axis AX
And rotatable about an axis perpendicular to the plane of the drawing. Therefore, by the rotation of the parallel plane plate 6b,
The incident beam is translated in a plane including the optical axis AX and parallel to the paper.

The p-polarized beam passing through the plane-parallel plate 6a directly enters the polarizing beam splitter 3b via a mirror, and the s-polarized beam passing through the plane-parallel plate 6b.
Thus, the p-polarized beam and the s-polarized beam are combined along the same optical path via the polarization beam splitter 3b. The p-polarized beam passing through the polarizing beam splitter 3b forms a linear beam 20p on the rear focal plane of the cylindrical lens 4a. On the other hand, the s-polarized beam passing through the polarizing beam splitter 3b forms a linear beam 20s on the rear focal plane of the cylindrical lens 4b. The rear focal plane of the cylindrical lens 4a and the rear focal plane of the cylindrical lens 4b coincide with each other, and the rear focal plane coincides with the front focal plane of the objective lens 9 described later.

FIG. 2 is a diagram showing how the light from the linear beam 20p and the linear beam 20s formed on the front focal plane of the objective lens 9 forms a cross alignment beam through the objective lens 9. is there. As shown in FIG. 2, the linear beam 20p and the linear beam 20s form an angle of 90 ° without overlapping each other on the rear focal plane of the cylindrical lens 4a and the cylindrical lens 4b, that is, the front focal plane of the objective lens 9. It is formed as follows. When the plane-parallel plates 6a and 6b are arranged perpendicular to the optical axis AX without rotating, the linear beam 2
The 0p and the linear beam 20s are two linear beams orthogonal to each other with the optical axis AX as a center, as indicated by the broken line in the figure. However, in the first embodiment, the parallel plane plate 6a
The linear beam 20p and the linear beam 20s are translated in the directions indicated by arrows in FIG. As a result, as described above, the linear beam 20p and the linear beam 20s can be formed on the front focal plane of the objective lens 9 so as to form an angle of 90 ° without overlapping each other.

Therefore, the light from the linear beam 20p and the linear beam 20s passes through the objective lens 9 to a cruciform alignment composed of two linear beams orthogonal to the rear focal plane about the optical axis AX. A beam 21 is formed. In this way, the alignment beam 21 is formed on the wafer 10 as the test object arranged on the rear focal plane of the objective lens 9. Note that an alignment mark corresponding to the alignment beam 21 is formed on the wafer 10. Further, the wafer 10 is provided with the optical axis A of the objective lens 9.
It is supported by an XY stage 15 that can move two-dimensionally in a plane perpendicular to X.

FIG. 3 is a diagram showing a state in which the diffraction light generated from the alignment mark AM forms a diffraction image on the front focal plane of the objective lens 9 when the alignment mark AM and the alignment beam 21 on the wafer 10 overlap. It is. FIG. 4 is a diagram showing a positional relationship between the linear beam 20p and the linear beam 20s formed on the front focal plane of the objective lens 9 and a corresponding diffraction image. As shown in FIG. 3 and FIG.
In a state where M and the alignment beam 21 overlap, diffracted light is generated from the alignment mark AM on the wafer 10. The zero-order diffracted light from the alignment mark AM is
The light is condensed by the objective lens 9 and forms zero-order diffraction images 21p and 21s on the front focal plane 9a of the objective lens 9.
The diffracted light of a predetermined order from the alignment mark AM is condensed by the objective lens 9 and forms predetermined diffraction images 22p and 22s on the front focal plane 9a of the objective lens 9.

As described above, the zero-order diffraction images 21p and 21p
s is formed at a point symmetrical position with respect to the optical beam AX with respect to the linear beam 20p and the linear beam 20s. The predetermined diffraction images 22p and 22s are the same as the zero-order diffraction images 21p and 2s.
It is formed in parallel with 1s at equal intervals. As a result, the zero-order diffraction images 21p and 21s and the predetermined diffraction image 22p
And 22s do not overlap each other, and the predetermined diffraction image 2
2p and 22s hardly overlap except for a very small part. The light from the 0th-order diffraction images 21p and 21s and the predetermined diffraction images 22p and 22s are reflected by the half mirror 8 serving as an optical path separating means, and then the relay lens 1
1 and re-image on the spatial filter 12.

FIG. 5 shows the spatial filter 12, the reconstructed zero-order diffraction images 21p and 21s, and the predetermined diffraction image 22p.
It is a figure which shows the relationship with p and 22s. As shown in FIG. 5, the spatial filter 12 includes a light shielding unit 12 indicated by oblique lines in the figure.
a and three square light transmitting portions 12b. The light shielding portion 12a is arranged so as to block the light of the zero-order diffraction images 21p and 21s, and the light transmitting portion 12b is arranged so as to pass the light of the predetermined diffraction images 22p and 22s. Thus, by the action of the spatial filter 12, the light from the zero-order diffraction images 21p and 21s does not reach the detector 13 at all, and the predetermined diffraction images 22p and
Almost all of the light from 2s reaches the detector 13. Thus, in the detector 13, the predetermined diffraction image 22p is detected with high detection efficiency.
And light from 22s can be detected.

The predetermined diffraction image 2 detected by the detector 13
The 2p light is a diffracted light component for measuring the position of the wafer 10 in the X direction, and the light of the predetermined diffraction image 22s is a diffracted light component for measuring the position of the wafer 10 in the Y direction. Thus, in the first embodiment, one detection unit 13 having high detection efficiency is used.
, The X and Y positions of the alignment mark AM, and thus the X and Y positions of the wafer 10 are measured. Then, by driving the XY stage 15 two-dimensionally in accordance with the measured X-direction position and Y-direction position of the wafer 10, the wafer 10 can be aligned at a predetermined position.

FIG. 6 is a diagram schematically showing a configuration of an alignment apparatus according to a second embodiment of the present invention. The alignment apparatus of the second embodiment has a configuration similar to that of the first embodiment. However, in the second embodiment, the half mirrors 63a and 63b are used instead of the polarization beam splitters 3a and 3b, the polarization beam splitter 68 is used instead of the half mirror 8, and the objective lens 9 and the polarization 1/4 between beam splitter 68
The only difference from the first embodiment is that a wave plate 64 is provided. Therefore, in FIG. 6, elements having the same functions as those of the first embodiment are denoted by the same reference numerals as in FIG. Hereinafter, the second embodiment will be described focusing on the difference from the first embodiment.

In the second embodiment, a p-polarized laser beam 2 from a laser light source 1 passes through a half mirror 63a.
It is split into two beams. The beam transmitted through the half mirror 63a is incident on the half mirror 63b via the cylindrical lens 4a, the stop 5a, and the plane parallel plate 6a. On the other hand, the beam reflected by the half mirror 63b is incident on the half mirror 63b via the cylindrical lens 4b, the stop 5b and the parallel plane plate 6b. The two beams combined along the same optical path via the half mirror 63b form a linear beam 20a and a linear beam 20b (not shown) after passing through the polarizing beam splitter 68. The linear beam 20a and the linear beam 20b are formed so as to form an angle of 90 ° without overlapping each other on the front focal plane of the objective lens 9, similarly to the linear beam 20p and the linear beam 20s of the first embodiment. Is done.

Therefore, the light from the linear beam 20a and the linear beam 20b becomes circularly polarized light via the quarter-wave plate 64, and is placed on the wafer 10 placed on the rear focal plane of the objective lens 9 on the optical axis. A cross-shaped alignment beam 21 composed of two linear beams orthogonal to AX is formed. Diffracted light from the alignment mark AM on the wafer 10 with respect to the alignment beam 21 is condensed by the objective lens 9, becomes s-polarized light via the １ ／ wavelength plate 64, and forms a diffraction image on the front focal plane of the objective lens 9. . The light of the diffraction image is reflected by the polarizing beam splitter 64,
The image is re-imaged on the spatial filter 12 via the relay lens 11.

The relationship between the spatial filter 12 and the reconstructed diffraction image is the same as in the first embodiment. Therefore, due to the action of the spatial filter 12, almost all of the light of the predetermined diffraction image reaches the detector 13 without the light of the zero-order diffraction image reaching the detector 13 at all. As a result, also in the second embodiment, light of a high-order diffraction image can be detected with high detection efficiency.

In the first and second embodiments, all the diffracted light from the wafer 10 cannot be guided to the detector by the half mirror 8 and the polarization beam splitter 68 as the optical path separating means. A part of the diffracted light from 10 returns to the laser light source 1 via the optical path separating means. When the diffracted light reaches the laser light source 1, the output of the laser light source 1 becomes unstable, which may adversely affect the position measurement of the wafer 10. Therefore, in the first embodiment and the second embodiment, the stop 5 for blocking the diffracted light returning to the laser light source 1 is provided.

FIG. 7 is a diagram showing a state in which the diffracted light from the wafer 10 is prevented from returning to the laser light source 1 by the action of the stop 5 and the plane-parallel plate 6. In FIG. 7, the cylindrical lenses 4a and 4b, the diaphragms 5a and 5b, and the parallel flat plates 6a and 6b are indicated by reference numerals 4, 5, and 6 without distinction. In FIG. 7, a laser beam 2 emitted from a laser light source 1 along an optical axis AX passes through a cylindrical lens 4 and a diaphragm 5 and is then moved upward by a parallel plane plate 6 rotated counterclockwise in the figure. Is translated. On the other hand, the diffracted light from the wafer 10 is translated by the parallel plane plate 6 to the lower side in the figure, and then enters the stop 5 in a state far from the optical axis AX. Since the stop 5 is formed so as to pass only the laser beam 2 incident along the optical axis AX, the optical axis A
Diffracted light from the wafer 10 largely deviating from X is blocked by the stop 5 and does not reach the laser light source 1. As a result, the output of the laser light source 1 becomes stable, and
The position measurement of 0 becomes stable.

In each of the above embodiments, the rear focal planes of the two cylindrical lenses coincide with the front focal plane of the objective lens. However, for example, the two cylindrical lenses are connected via an afocal relay lens. The rear focal plane of the objective lens and the front focal plane of the objective lens can be conjugated. In each of the above-described embodiments, two linear beams having an overall L shape and forming an angle of 90 ° are formed on the front focal plane of the objective lens. However,
What is important in the present invention is that the two linear beams make an angle with each other and do not substantially overlap each other.

[0031]

As described above, according to the present invention, it is possible to form a plurality of diffraction images that do not substantially overlap each other at the front focal plane of the objective lens and at its conjugate position, so that the detection efficiency is substantially reduced. It is possible to detect the diffracted light components in two measurement directions with one detector without lowering it.

[Brief description of the drawings]

FIG. 1 is a view schematically showing a configuration of an alignment apparatus according to a first embodiment of the present invention.

FIG. 2 is a diagram showing a state in which light from a linear beam 20p and a linear beam 20s formed on a front focal plane of an objective lens 9 forms a cross alignment beam via the objective lens 9.

FIG. 3 is a diagram showing a state in which diffracted light generated from the alignment mark AM forms a diffraction image on a front focal plane of the objective lens 9 in a state where the alignment mark AM and the alignment beam 21 on the wafer 10 overlap.

FIG. 4 is a diagram showing a positional relationship between a linear beam 20p and a linear beam 20s formed on a front focal plane of an objective lens 9 and a corresponding diffraction image.

FIG. 5 shows a spatial filter 12, reconstructed zero-order diffraction images 21p and 21s and predetermined diffraction images 22p and 22
It is a figure showing relation with s.

FIG. 6 is a diagram schematically showing a configuration of an alignment apparatus according to a second embodiment of the present invention.

FIG. 7 shows the operation of the diaphragm 5 and the plane-parallel plate 6, the wafer 1
FIG. 4 is a diagram illustrating a state in which diffracted light from 0 is blocked from returning to the laser light source 1.

FIG. 8 is a diagram schematically showing a configuration of a conventional alignment apparatus.

FIG. 9 is a diagram showing a configuration of the spatial filter 110 of FIG.

FIG. 10 shows a spatial filter 12 required for detection by one detector in the conventional alignment apparatus of FIG.
FIG. 3 is a diagram showing a configuration of a zero.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Laser light source 2 Laser beam 3, 63 Polarization beam splitter 4 Cylindrical lens 5 Aperture 6 Parallel plane plate 8, 68 Half mirror 9 Objective lens 10 Wafer 11 Relay lens 12 Spatial filter 13 Detector 15 XY stage 64 1/4 wavelength plate

Claims (5)

[Claims] An irradiation system for irradiating an object with an alignment mark formed thereon with an alignment beam through an objective lens; and detecting a diffracted light generated from the alignment mark with respect to the alignment beam. A detection system, wherein the alignment system measures the position of the test object based on the diffracted light detected by the detection system, wherein the irradiation system forms a predetermined angle with each other on a front focal plane of the objective lens and Linear beam forming means for forming two linear beams that do not substantially overlap each other, wherein the linear beam forming means is formed based on light from the two linear beams formed on a front focal plane of the objective lens. The alignment comprising two linear beams intersecting the optical axis of the objective lens on the test object disposed on a rear focal plane of the objective lens Alignment apparatus characterized by forming the over arm. 2. The detection system according to claim 1, wherein the diffracted light from the alignment mark is arranged at a position optically conjugate with a position where an image is formed via the objective lens, and a zero-order diffracted light from the alignment mark is formed. A spatial filter for blocking the light of the zero-order diffracted image and passing the light of the predetermined diffractive image formed by the diffracted light of the predetermined order other than the zero-order diffracted light; The alignment apparatus according to claim 1, further comprising a detector for detecting light. 3. An irradiation system comprising: an optical path separating unit configured to separate diffracted light from the alignment mark from an optical path of the irradiation system to an optical path of the detection system, wherein the irradiation system performs the irradiation through the optical path separating unit. The alignment apparatus according to claim 1, further comprising a light blocking unit configured to block diffracted light from the alignment mark incident on an optical path of the system. 4. The linear beam forming means includes: a light splitting means for splitting light from a light source into two lights along different optical paths; and two lights split via the light splitting means. A first shaping optical system for shaping one of the light beams into a linear beam, and a first translation means for translating the light passing through the first shaping optical system with respect to the optical axis; A second shaping optical system for shaping the other of the two lights split by the light splitting unit into a linear beam; and a light shaping the second shaping optical system with respect to an optical axis. And a light coupling means for coupling two lights passing through the first shaping optical system and the second shaping optical system along the same optical path. The alignment device according to any one of claims 1 to 3, wherein Place. 5. The light-shielding means is disposed between the first shaping optical system and the first parallel moving means, passes light incident through the light splitting means, and the first parallel moving means. A first stop for blocking the diffracted light incident through the light source; a first stop disposed between the second shaping optical system and the second parallel moving means; 5. The alignment apparatus according to claim 4, further comprising a second stop for blocking the diffracted light incident through the second translation means.