JPH1082907A - 色フィルタおよびその作成方法 - Google Patents
色フィルタおよびその作成方法Info
- Publication number
- JPH1082907A JPH1082907A JP7786097A JP7786097A JPH1082907A JP H1082907 A JPH1082907 A JP H1082907A JP 7786097 A JP7786097 A JP 7786097A JP 7786097 A JP7786097 A JP 7786097A JP H1082907 A JPH1082907 A JP H1082907A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- ink
- black matrix
- forming
- raised
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title description 3
- 239000011159 matrix material Substances 0.000 claims abstract description 42
- 238000007639 printing Methods 0.000 claims abstract description 42
- 239000011521 glass Substances 0.000 claims abstract description 14
- 238000000151 deposition Methods 0.000 claims abstract description 8
- 238000004049 embossing Methods 0.000 claims abstract description 7
- 238000000034 method Methods 0.000 claims description 42
- 239000000758 substrate Substances 0.000 claims description 32
- 239000000463 material Substances 0.000 claims description 22
- 239000010410 layer Substances 0.000 claims description 11
- 239000010409 thin film Substances 0.000 claims description 6
- 239000000853 adhesive Substances 0.000 claims description 4
- 230000001070 adhesive effect Effects 0.000 claims description 4
- 239000011241 protective layer Substances 0.000 claims description 3
- 239000003086 colorant Substances 0.000 claims description 2
- 239000012778 molding material Substances 0.000 claims 1
- 239000012780 transparent material Substances 0.000 abstract description 43
- 239000007788 liquid Substances 0.000 abstract description 9
- 239000000976 ink Substances 0.000 description 56
- 230000005855 radiation Effects 0.000 description 16
- 239000004973 liquid crystal related substance Substances 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 238000000206 photolithography Methods 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 3
- 150000002118 epoxides Chemical class 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- 229920000877 Melamine resin Polymers 0.000 description 2
- 229920006397 acrylic thermoplastic Polymers 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 239000011344 liquid material Substances 0.000 description 2
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 2
- 230000005499 meniscus Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 2
- 229920001567 vinyl ester resin Polymers 0.000 description 2
- ZFFGZCTVZNNVLP-UHFFFAOYSA-N (3-acetyloxy-2,2-dimethylpropyl) acetate Chemical compound CC(=O)OCC(C)(C)COC(C)=O ZFFGZCTVZNNVLP-UHFFFAOYSA-N 0.000 description 1
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 1
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000007646 gravure printing Methods 0.000 description 1
- 239000012943 hotmelt Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical group [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 238000007644 letterpress printing Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000012815 thermoplastic material Substances 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
- H10F39/024—Manufacture or treatment of image sensors covered by group H10F39/12 of coatings or optical elements
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US62343096A | 1996-03-28 | 1996-03-28 | |
| US623430 | 1996-03-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH1082907A true JPH1082907A (ja) | 1998-03-31 |
| JPH1082907A5 JPH1082907A5 (enExample) | 2005-02-24 |
Family
ID=24498063
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7786097A Pending JPH1082907A (ja) | 1996-03-28 | 1997-03-28 | 色フィルタおよびその作成方法 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPH1082907A (enExample) |
| KR (1) | KR970066662A (enExample) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20010011655A (ko) * | 1999-07-29 | 2001-02-15 | 김우연 | 평판형 표시장치의 도광판 및 그 제조방법 |
| US6710829B2 (en) | 2000-05-03 | 2004-03-23 | Benq Corporation | Method of performing a uniform illumination pattern in a back-light plate using a press |
| JP2006005022A (ja) * | 2004-06-15 | 2006-01-05 | Dainippon Printing Co Ltd | インプリント方法及びインプリント装置 |
| KR100649722B1 (ko) * | 2000-04-21 | 2006-11-24 | 엘지.필립스 엘시디 주식회사 | 일렉트로루미네센스 표시소자의 패터닝장치 및 이를이용한 패터닝방법 |
| JP2009026670A (ja) * | 2007-07-23 | 2009-02-05 | Seiko Epson Corp | 電気光学装置、電子機器、電気光学装置の製造方法 |
| US7569153B2 (en) | 2002-05-23 | 2009-08-04 | Lg Display Co., Ltd. | Fabrication method of liquid crystal display device |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100848957B1 (ko) * | 2001-11-12 | 2008-07-29 | 엘지디스플레이 주식회사 | 액정표시소자의 제조방법 |
-
1997
- 1997-03-28 JP JP7786097A patent/JPH1082907A/ja active Pending
- 1997-04-01 KR KR1019970011962A patent/KR970066662A/ko not_active Withdrawn
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20010011655A (ko) * | 1999-07-29 | 2001-02-15 | 김우연 | 평판형 표시장치의 도광판 및 그 제조방법 |
| KR100649722B1 (ko) * | 2000-04-21 | 2006-11-24 | 엘지.필립스 엘시디 주식회사 | 일렉트로루미네센스 표시소자의 패터닝장치 및 이를이용한 패터닝방법 |
| US7963757B2 (en) | 2000-04-21 | 2011-06-21 | Lg Display Co., Ltd. | Apparatus and method for patterning pixels of an electro-luminescent display device |
| US6710829B2 (en) | 2000-05-03 | 2004-03-23 | Benq Corporation | Method of performing a uniform illumination pattern in a back-light plate using a press |
| US7569153B2 (en) | 2002-05-23 | 2009-08-04 | Lg Display Co., Ltd. | Fabrication method of liquid crystal display device |
| JP2006005022A (ja) * | 2004-06-15 | 2006-01-05 | Dainippon Printing Co Ltd | インプリント方法及びインプリント装置 |
| JP2009026670A (ja) * | 2007-07-23 | 2009-02-05 | Seiko Epson Corp | 電気光学装置、電子機器、電気光学装置の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR970066662A (ko) | 1997-10-13 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20040319 |
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| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20040319 |
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| A131 | Notification of reasons for refusal |
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| A521 | Request for written amendment filed |
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| A521 | Request for written amendment filed |
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| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20071128 |
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| A131 | Notification of reasons for refusal |
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| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080410 |
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| A02 | Decision of refusal |
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