JPH1046398A - Method for controlling plating current of electroplating equipment - Google Patents

Method for controlling plating current of electroplating equipment

Info

Publication number
JPH1046398A
JPH1046398A JP20213396A JP20213396A JPH1046398A JP H1046398 A JPH1046398 A JP H1046398A JP 20213396 A JP20213396 A JP 20213396A JP 20213396 A JP20213396 A JP 20213396A JP H1046398 A JPH1046398 A JP H1046398A
Authority
JP
Japan
Prior art keywords
current
plating
anode
value
flexible conductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20213396A
Other languages
Japanese (ja)
Inventor
Yoshinori Kawashima
美典 川島
Yoji Nakazono
洋二 中園
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP20213396A priority Critical patent/JPH1046398A/en
Publication of JPH1046398A publication Critical patent/JPH1046398A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a method for controlling the plating current of an electroplating equipment with the ignition and burning in the flexible conductor of the equipment prevented with a simple device. SOLUTION: The surface temp. of a flexible conductor through which a plating current is passed is measured with an IR-radiation thermometer in an electroplating equipment, and the current is controlled based on the measured values. Further, the surface temps. of the plural flexible conductors for applying a plating current to the same plating tank are measured by an IR-radiation thermometer, and the current is controlled based on the difference in surface temp. between the flexible conductors. More preferably, the current strength of the plating tank is controlled to conform to the reference current strength.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、鋼帯(ストリッ
プ)など金属帯の電気めっき設備のめっき電流の制御方
法に関し、特に、電気めっき設備において電源と電解槽
との間でめっき電流を通電する可撓性の導電体(以下、
フレキシブル導体と記す)の発火、焼損を防止するため
のめっき電流の制御方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for controlling a plating current of an electroplating facility for a metal strip such as a steel strip (strip), and more particularly, to applying a plating current between a power supply and an electrolytic cell in the electroplating facility. Flexible conductors (hereinafter referred to as
The present invention relates to a method of controlling a plating current for preventing ignition and burning of a flexible conductor.

【0002】[0002]

【従来の技術】図3に電気めっき設備のめっき槽の一例
を側面図で示す。図3において、1は鋼帯(ストリッ
プ)、2はめっき液に浸漬された陽極(めっき電極)、
3はめっき液、4はコンダクタロール、5はゴムロー
ル、6はゴムライニングを施されためっき槽、7aは陽
極受台、8はめっき液受皿、9はめっき液オーバーフロ
ー、1aは鋼帯の搬送方向を示す。
2. Description of the Related Art FIG. 3 is a side view showing an example of a plating tank of an electroplating facility. In FIG. 3, 1 is a steel strip (strip), 2 is an anode (plating electrode) immersed in a plating solution,
Reference numeral 3 denotes a plating solution, 4 denotes a conductor roll, 5 denotes a rubber roll, 6 denotes a plating tank provided with rubber lining, 7a denotes an anode receiver, 8 denotes a plating solution tray, 9 denotes a plating solution overflow, and 1a denotes a transport direction of a steel strip. Is shown.

【0003】鋼帯1はめっき槽6内に満たされためっき
液3に接しながら、コンダクタロール4とゴムロール5
により搬送される。一方、めっき電流が陽極受台7a→
陽極2→めっき液3→鋼帯1→コンダクタロール4の経
路で流れ、陽極2自身は通電されることによりイオン化
してめっき液3中に溶解し、溶解した陽極2の成分が鋼
帯1にめっきされる。
[0003] The steel strip 1 is in contact with the plating solution 3 filled in the plating tank 6 while the conductor roll 4 and the rubber roll 5 are in contact with each other.
Transported by On the other hand, the plating current is changed to the anode receiving table 7a →
The anode 2 → the plating solution 3 → the steel strip 1 → flows in the path of the conductor roll 4, and the anode 2 itself is ionized by being energized and dissolved in the plating solution 3, and the dissolved components of the anode 2 become the steel strip 1. Plated.

【0004】次に、図4に電気めっき槽付帯設備の一例
を斜視図で示す。図4において、7a1 〜7a4 は陽極
受台、7b1 は陽極受台支柱、11a 、11b はブスバ
ー(:電源から電解槽まで電流を伝える金属棒)、12a
、12b は電流の流れる方向、14はブラシ、15は集電リ
ングを示し、他の符号は図3と同一の内容を示す。
[0004] Fig. 4 is a perspective view showing an example of an auxiliary equipment for an electroplating tank. In FIG. 4, 7a 1 ~7a 4 anode cradle, 7b 1 is an anode cradle struts, 11a, 11b are bus bars (: metal rod to transmit the current from the power supply to the electrolytic cell), 12a
, 12b indicate the direction of current flow, 14 indicates a brush, 15 indicates a current collecting ring, and other reference numerals indicate the same contents as in FIG.

【0005】なお、図4においては、めっき槽6内の陽
極受台7a1 〜7a4 の配置を示すために、紙面左側の
めっき槽内の陽極受台7a3 、7a4 の上に配列された
陽極2および陽極受台支柱7b2 、7b3 、7b4 の記
載は略した。また、電気めっき槽付帯設備として、ブス
バー11a と陽極受台支柱7b1 〜7b4 の間には、陽極
受台支柱設置の容易化のために、材質が例えば銅のより
線である可撓性のフレキシブル導体131 、132 、133
134 が設けられている。
[0005] In FIG. 4, to show the arrangement of anode cradle 7a 1 ~7A 4 in the plating tank 6 is arranged on the anode cradle 7a in the plating bath of the left side 3, 7a 4 anode 2 and the anode cradle strut 7b 2, 7b 3, wherein the 7b 4 is short. Moreover, as the electroplating bath ancillary facilities, flexibility between the bus bar 11a and the anode cradle strut 7b 1 ~7b 4, for ease of anode cradle post installation, a strand material, for example copper Flexible conductors 13 1 , 13 2 , 13 3 ,
13 4 are provided.

【0006】複数本の陽極2は陽極受台7a1 〜7a4
の上に並べられており、陽極2には直流のプラス電圧が
印加される。電流は整流器からブスバー11a を通り、各
フレキシブル導体131 〜134 、陽極受台支柱7b1 〜7
4 、陽極受台7a1 〜7a4 を経由して各陽極2へ供
給される。
[0006] plurality of anodes 2 anode cradle 7a 1 ~7a 4
, And a positive DC voltage is applied to the anode 2. Current passes through the bus bar 11a from the rectifier, the flexible conductor 131-134, anode cradle strut 7b 1 to 7-
b 4 , is supplied to each anode 2 via the anode receiving tables 7 a 1 to 7 a 4 .

【0007】陽極2へ供給された電流は、陽極2→めっ
き液3→鋼帯1→コンダクタロール4→集電リング15→
ブラシ14→ブスバー11b と通り、整流器へ戻る。電気め
っき設備には、このようなめっき槽6が鋼帯1の表裏面
それぞれに対して複数槽設置されている。図5に、電気
めっき設備のめっき電流制御の回路図を示す。
The current supplied to the anode 2 is as follows: anode 2 → plating solution 3 → steel strip 1 → conductor roll 4 → current collecting ring 15 →
Return to the rectifier through brush 14 → bus bar 11b. In the electroplating equipment, a plurality of such plating tanks 6 are provided for each of the front and back surfaces of the steel strip 1. FIG. 5 shows a circuit diagram of the plating current control of the electroplating equipment.

【0008】図5において、C1 、C2 、C3 、C
n は、それぞれ、各めっき槽6に対応する各めっき設備
(以下、各めっき槽6に対応する各めっき設備をめっき
セルと記す)、21は整流器、22はダイオード、23はトラ
ンス、24はサイリスタ、25は各めっき槽6の電流制御装
置、26は直流電流検出器、27は全電流制御装置、28はブ
ライドルロール、29は例えば回転計発電機(:PG)で
ある鋼帯搬送速度検出器、30はめっき目付量設定器、31
は演算器、32は電流加算器、33、34は演算素子を示し、
他の符号は図1と同一の内容を示す。
In FIG. 5, C 1 , C 2 , C 3 , C
n is each plating equipment corresponding to each plating tank 6 (hereinafter, each plating equipment corresponding to each plating tank 6 is referred to as plating cell), 21 is a rectifier, 22 is a diode, 23 is a transformer, and 24 is a thyristor. , 25 is a current controller for each plating tank 6, 26 is a direct current detector, 27 is a full current controller, 28 is a bridle roll, 29 is a steel strip transport speed detector, for example, a tachometer generator (: PG). , 30 is a plating weight setting device, 31
Denotes an arithmetic unit, 32 denotes a current adder, 33 and 34 denote arithmetic elements,
Other symbols indicate the same contents as in FIG.

【0009】各めっき槽6は、各々、図5に示される電
流制御装置25を有している。整流器21は、ダイオード2
2、トランス23、サイリスタ24で構成され、サイリスタ2
4により電流量を制御し、トランス23により低圧の電圧
を印加し、ダイオード22で直流に変換し、直流電流を陽
極2に供給する。めっき槽6に流れる電流は、直流電流
検出器(DCCT)26にて検出され、この検出されためっき
セルC1 の電流値mc 1 は、電流加算器32において他の
めっきセルC2 、C3 、Cn の検出電流値mc 2 、mc
3 、mc n と加算され、検出電流値の合計mc t が制御
に使用される。
Each of the plating tanks 6 has a current control device 25 shown in FIG. Rectifier 21 is diode 2
2 、 Transformer 23 、 Thyristor 24 、 Thyristor 2
The amount of current is controlled by 4, a low voltage is applied by the transformer 23, converted into direct current by the diode 22, and the direct current is supplied to the anode 2. The current flowing through the plating tank 6 is detected by the DC current detector (DCCT) 26, a current value mc 1 of the detected plating cell C 1, the other plating cell at a current adder 32 C 2, C 3 , C n detected current values mc 2 , mc
3, summed with mc n, the sum mc t of the detected current value is used for control.

【0010】一方、電気めっき設備における鋼帯1への
めっき目付量(合計)は、各めっきセルの検出電流値の
合計mc t に比例するので、この値が一定になるように
全電流制御装置27により、設定した合計電流値(基準
値)と検出電流値の合計mc tが一致するように制御さ
れる。全電流制御装置27の出力は、各めっき槽6の基準
電流として分配され、各めっき槽6は、各々この基準電
流値(=設定電流値)に一致するように各めっき槽6に
付属した電流制御装置25で制御される。
On the other hand, the plating basis weight of the steel strip 1 in the electroplating equipment (total) is proportional to the sum mc t of the detected current value of each plating cell, the total current control device so that this value is constant by 27 it is controlled such that the total mc t between the detected current value setting the total current value (reference value) coincide. The output of the total current control device 27 is distributed as a reference current of each plating tank 6, and each plating tank 6 has a current attached to each plating tank 6 so as to correspond to this reference current value (= set current value). It is controlled by the control device 25.

【0011】このような制御系および各めっきセルのハ
ード構成により、表面処理鋼帯を安定して生産すること
ができる。電気めっき設備は以上のように構成されてい
るが、めっき槽6内の陽極2の周囲にはスラジと称する
絶縁性の不純物が発生する。この場合、このスラジによ
り、陽極2と陽極受台7aの接触不良が生じ、めっき槽
6内の1部の陽極2に電流が流れない現象が生じる。
With such a control system and the hardware configuration of each plating cell, a surface-treated steel strip can be stably produced. Although the electroplating equipment is configured as described above, insulating impurities called sludge are generated around the anode 2 in the plating tank 6. In this case, due to the sludge, poor contact between the anode 2 and the anode receiving table 7a occurs, and a phenomenon occurs in which current does not flow to a part of the anode 2 in the plating tank 6.

【0012】この現象が生じると、各々の陽極2に電流
を供給するめっきセルの一部のフレキシブル導体13に電
流が流れなくなり、同一めっきセルの他のフレキシブル
導体13に電流が集中し、時には、この過剰電流により発
生するジュール熱により、フレキシブル導体13から発火
するという問題があった。この場合、各フレキシブル導
体の電流を直接測定し、加熱状態を推定する方法が挙げ
られるが、陽極2に供給する電流は直流であるため、測
定のためには全めっきセルの各々のフレキシブル導体に
大規模な直流電流検出器(DCCT)を設置する必要があ
り、また設備費の面から経済的でない。
When this phenomenon occurs, current does not flow through some of the flexible conductors 13 of the plating cell that supplies current to each anode 2, and current concentrates on other flexible conductors 13 of the same plating cell. There is a problem that the Joule heat generated by the excess current causes the flexible conductor 13 to ignite. In this case, there is a method of directly measuring the current of each flexible conductor and estimating the heating state. However, since the current supplied to the anode 2 is a direct current, the current is supplied to each flexible conductor of all the plating cells for measurement. A large-scale direct current detector (DCCT) must be installed, and it is not economical in terms of equipment costs.

【0013】このため、従来、電気めっき設備の操業者
は、操業を一時停止し、陽極2と陽極受台7aの接触箇
所を頻繁に清掃しながら操業する必要があり、電気めっ
き設備の操業能率が低下するという問題があった。
For this reason, conventionally, it has been necessary for the operator of the electroplating equipment to temporarily stop the operation and to operate while frequently cleaning the contact portion between the anode 2 and the anode receiving stand 7a. However, there was a problem that was reduced.

【0014】[0014]

【発明が解決しようとする課題】本発明は、前記従来技
術の問題を解決し、電気めっき設備のフレキシブル導体
における発火、焼損を、簡易な装置で確実に防止可能な
電気めっき設備のめっき電流制御方法の提供を目的とす
る。
SUMMARY OF THE INVENTION The present invention solves the above-mentioned problems of the prior art, and controls the plating current of an electroplating facility capable of reliably preventing ignition and burning of a flexible conductor of the electroplating facility with a simple apparatus. The purpose is to provide a method.

【0015】[0015]

【課題を解決するための手段】第1の発明は、電気めっ
き設備において、めっき電流を通電するフレキシブル導
体の表面温度を赤外線放射温度計で測定し、その測定結
果に基づき前記電流を制御することを特徴とする電気め
っき設備のめっき電流制御方法である。第2の発明は、
電気めっき設備において、同一のめっき槽にめっき電流
を通電する複数本のフレキシブル導体の表面温度を赤外
線放射温度計で測定し、前記各フレキシブル導体間の表
面温度の差に基づき前記電流を制御することを特徴とす
る電気めっき設備のめっき電流制御方法である。
According to a first aspect of the present invention, in an electroplating facility, the surface temperature of a flexible conductor through which a plating current is applied is measured by an infrared radiation thermometer, and the current is controlled based on the measurement result. A plating current control method for an electroplating facility, characterized in that: The second invention is
In an electroplating facility, measuring the surface temperature of a plurality of flexible conductors for supplying a plating current to the same plating tank with an infrared radiation thermometer, and controlling the current based on a difference in surface temperature between the flexible conductors. A plating current control method for an electroplating facility, characterized in that:

【0016】第3の発明は、めっき槽のめっき電流値が
基準電流値に一致するように制御される電気めっき設備
のめっき電流制御方法であって、同一のめっき槽にめっ
き電流を通電する複数本のフレキシブル導体の表面温度
を赤外線放射温度計で測定し、前記各フレキシブル導体
の表面温度の最大値と最小値との差|ΔT|が予め設定
した値以上となった場合に、該めっき槽のめっき電流を
低減または一定値以下に制限することを特徴とする電気
めっき設備のめっき電流制御方法である。
A third invention is a plating current control method for an electroplating facility in which a plating current value in a plating tank is controlled so as to match a reference current value, wherein a plurality of plating currents are supplied to the same plating tank. The surface temperature of the flexible conductor is measured with an infrared radiation thermometer, and when the difference | ΔT | between the maximum value and the minimum value of the surface temperature of each flexible conductor is equal to or greater than a preset value, the plating bath A plating current of an electroplating facility, wherein the plating current is reduced or limited to a certain value or less.

【0017】また、前記第3の発明においては、前記基
準電流値が、少なくとも、目標とするめっき目付量、
または、少なくとも、目標とするめっき目付量および
鋼帯搬送速度(ラインスピード)で定められる基準電流
値であることが好ましい。
In the third aspect of the present invention, the reference current value is at least a target plating weight,
Alternatively, it is preferably at least a reference current value determined by a target plating weight and a steel strip transport speed (line speed).

【0018】[0018]

【発明の実施の形態】以下、本発明をさらに詳細に説明
する。本発明は、前記問題点を解決するためになされた
もので、電気めっき設備のフレキシブル導体の表面温度
を赤外線放射温度計で監視し、例えば、同一めっきセル
に取付けられた複数本のフレキシブル導体間で、基準値
以上の温度差が発生した時点で、該めっきセルの電流を
低減または一定値以下に制限し、また設備の操業者に警
報を出力する。
BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in more detail. The present invention has been made in order to solve the above problems, and monitors the surface temperature of the flexible conductor of the electroplating equipment with an infrared radiation thermometer, for example, between a plurality of flexible conductors attached to the same plating cell Then, when a temperature difference equal to or greater than the reference value occurs, the current of the plating cell is reduced or limited to a certain value or less, and an alarm is output to a facility operator.

【0019】以上のような電流制御方法を用いることに
より、フレキシブル導体の過熱、発火、焼損を防ぎ、安
定してめっき製品を生産することができる。本発明は、
鋼帯など金属帯の連続電気めっきに好ましく適用され、
また、電気錫系めっき、電気ニッケル系めっき、電気亜
鉛系めっき、電気クロム系めっきなどの電気純金属めっ
き、電気合金めっきに好ましく適用されるが、めっきの
種類は制限されるものではない。
By using the above-described current control method, it is possible to prevent overheating, ignition and burning of the flexible conductor, and to produce a plated product stably. The present invention
It is preferably applied to continuous electroplating of metal strips such as steel strips,
Further, it is preferably applied to electric pure metal plating such as electric tin-based plating, electric nickel-based plating, electric zinc-based plating, and electrochromic plating, and electric alloy plating, but the type of plating is not limited.

【0020】図1に本発明の電気めっき設備のめっき電
流制御方法の一例を示す。図1において、401 、402
403 、404 は赤外線放射温度計、41は温度比較器、42は
陽極接触不良のアラーム出力信号、43は電流リミッタ、
Rは赤外線を示し、他の符号は図3〜5と同一の内容を
示す。本発明においては、例えば、フレキシブル導体13
1 、132 、133 、134 の表面温度を赤外線放射温度計40
1 、402 、403 、404 にて検出し、この温度情報を温度
比較器41に送る。
FIG. 1 shows an example of a plating current control method for an electroplating facility according to the present invention. In FIG. 1, 40 1 , 40 2 ,
40 3, 40 4 is an infrared radiation thermometer, the temperature comparator 42 is an alarm output signal of the anode contact failure 41, 43 current limiter,
R indicates infrared rays, and other symbols indicate the same contents as in FIGS. In the present invention, for example, the flexible conductor 13
The surface temperature of 1 , 13 2 , 13 3 , 13 4 is measured by infrared radiation thermometer 40
1, 40 2, 40 3, detected in 40 4, and sends the temperature information to the temperature comparator 41.

【0021】温度比較器41は、この温度を常時比較す
る。陽極2と各陽極受台7a1 、7a2 、7a3 、7a
4 との間に絶縁性のスラジが存在しない時には、この赤
外線放射温度計401 〜404 で測定している4本のフレキ
シブル導体131 、132 、133 、134 に流れる電流はほぼ
等しく、各フレキシブル導体の温度もほぼ一定に保たれ
ている。
The temperature comparator 41 constantly compares this temperature. The anode 2 and each of the anode receivers 7a 1 , 7a 2 , 7a 3 , 7a
By the time insulating sludge does not exist between the 4, current flowing through the flexible conductor 13 1 four being measured by an infrared radiation thermometer 40 1-40 4, 13 2, 13 3, 13 4 is substantially Equally, the temperature of each flexible conductor is also kept substantially constant.

【0022】しかし、この4本の陽極受台7a1 、7a
2 、7a3 、7a4 のうち1本でも陽極2との間にスラ
ジが存在すると、この陽極受台7aに電流が流れなくな
り、該陽極受台7aに接続しているフレキシブル導体13
にも電流が流れなくなり、このフレキシブル導体13では
ジュール熱が発生せず、該フレキシブル導体13の温度は
低下する。
However, these four anode receivers 7a 1 , 7a
If sludge exists between any one of the anodes 2 , 7 a 3 , and 7 a 4 , no current flows through the anode pedestal 7 a and the flexible conductor 13 connected to the anode pedestal 7 a
As a result, no current flows, and no Joule heat is generated in the flexible conductor 13, and the temperature of the flexible conductor 13 decreases.

【0023】一方、めっき槽6の基準電流値(=設定電
流値)は、目標とするめっき目付量、鋼帯搬送速度(ラ
インスピード)などが変わらなければ、基本的には変わ
らないので、同一めっきセルにおける他のフレキシブル
導体13には電流が過剰に流れ温度が上昇し、電流が流れ
ていないフレキシブル導体13と、過剰に流れているフレ
キシブル導体13には温度差が生じることになる。
On the other hand, the reference current value (= set current value) of the plating tank 6 is basically the same unless the target plating weight, the steel strip conveying speed (line speed), and the like change, so that they are the same. The current flows excessively through the other flexible conductors 13 in the plating cell and the temperature rises, and a temperature difference occurs between the flexible conductor 13 through which no current flows and the flexible conductor 13 through which the current flows excessively.

【0024】さらには、4本の陽極受台7aの内、2台
の陽極受台7aにおいてスラジによる電流遮断が発生す
ると、電流が流れていないフレキシブル導体13と電流が
流れているフレキシブル導体13との温度差はさらに大き
くなる。本発明においては、例えば、温度比較器41によ
り、同一めっきセルC1 における複数本のフレキシブル
導体131 、132 、133 、134 の最大温度と最小温度の差
を演算し、その温度差|ΔT|が予め設定した値(=|
ΔT|異常検出の設定値)以上となった場合に、図1に
示す電流リミッタ43により、めっきセルC1 の電流を低
減または一定値以下に制限することにより、フレキシブ
ル導体13の過熱、発火、焼損を防止することができる。
Further, when current interruption due to sludge occurs in the two anode supports 7a among the four anode supports 7a, the flexible conductor 13 in which no current flows and the flexible conductor 13 in which current flows are formed. Is further increased. In the present invention, for example, the temperature comparator 41 calculates the difference between the maximum temperature and the minimum temperature of the plurality of flexible conductors 13 1 , 13 2 , 13 3 , and 13 4 in the same plating cell C 1, and calculates the temperature difference. | ΔT | is a preset value (= |
[Delta] T | when an abnormal set value of the detection) above, the current limiter 43 shown in FIG. 1, by limiting the current of the plating cell C 1 reduction or below a certain value, overheating of the flexible conductor 13, fire, Burnout can be prevented.

【0025】また、同一めっきセルC1 に付設されるフ
レキシブル導体が2本の場合は、2本の表面温度の差|
ΔT|を用いればよい。なお、本発明において、めっき
セルC1 の電流を一定値以下に制限する場合としては、
前記した|ΔT|異常検出の設定値が余裕をもった設
定値の場合、または、例えばめっきセルC1 の前記し
た基準電流値が前記異常検出と同時または相前後して低
下する場合が例示される。
When two flexible conductors are attached to the same plating cell C 1 , the difference between the two surface temperatures |
ΔT | may be used. In the present invention, as if to limit the current of the plating cell C 1 to the predetermined value or less,
Wherein the | [Delta] T | when setting the abnormality detection is a margin setting value, or, for example, if the reference current value the the plating cell C 1 drops in succession the abnormality detecting simultaneously or phases are illustrated You.

【0026】[0026]

【実施例】以下、本発明を実施例に基づいて具体的に説
明する。前記した図1に示す電気めっき設備のめっき電
流制御方法を採用し、陽極2として錫を用い、鋼帯1に
電気錫めっきを施した。この時の図1に示すめっきセル
1 のめっき電流I、各フレキシブル導体131、132 、1
33 、134 に流れるめっき電流I1 、I2 、I3
4 、赤外線放射温度計で検出した各フレキシブル導体
13の表面温度T1 、T2 、T3 、T4 および該各フレキ
シブル導体13の表面温度の最大値と最小値との差=|Δ
T|の時間経過を図2に示す。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be specifically described below based on embodiments. The plating current control method of the electroplating equipment shown in FIG. 1 described above was employed, and tin was used as the anode 2 and the steel strip 1 was subjected to electrotin plating. Plating current I of the plating cell C 1 shown in FIG. 1 when this, the flexible conductor 13 1, 13 2, 1
3 3, 13 plating current I 1 flowing through the 4, I 2, I 3,
I 4, each flexible conductors detected by the infrared radiation thermometer
13 and the difference between the maximum value and the minimum value of the surface temperature of each of the flexible conductors 13, T 1 , T 2 , T 3 , T 4 = | Δ
FIG. 2 shows the time lapse of T |.

【0027】図2に示されるように、めっきセルC1
の電源投入後、陽極受台7a1 において接触不良が発生
し、さらに時間が経過後、陽極受台7a2 においても接
触不良が発生した。これに伴い、フレキシブル導体1
33 、134 に流れる電流I3 、I4 が上昇し、赤外線放
射温度計で検出したフレキシブル導体133 、134 の表面
温度T3 、T4も上昇し、各フレキシブル導体13の表面
温度の最大値と最小値との差=|ΔT|が異常検出の設
定値に達した時点で、図1に示す電流リミッタ43が作動
し、めっきセルC1 の電流Iが低減し、めっきセルC1
のフレキシブル導体13の発火、焼損を防止することがで
きた。
As shown in FIG. 2, after the power supply to the plating cell C 1 is turned on, a contact failure occurs at the anode support 7a 1 , and after a lapse of time, a contact failure also occurs at the anode support 7a 2 . did. Along with this, flexible conductor 1
3 3, 13 current flows through the 4 I 3, I 4 is raised, the flexible conductor 13 3 detected by the infrared radiation thermometer, 13 4 of the surface temperature T 3, T 4 also rises, the surface temperatures of the flexible conductor 13 When the difference between the maximum value and the minimum value of | = ΔΔT | reaches the set value for abnormality detection, the current limiter 43 shown in FIG. 1 is activated, the current I of the plating cell C 1 is reduced, and the plating cell C 1
The ignition and burning of the flexible conductor 13 could be prevented.

【0028】本発明によれば、めっきセルに電流を供給
する各フレキシブル導体の表面温度を検出し、その結果
に基づき、めっき槽内の電気的接触不良の発生を検知
し、めっきセルの電流を制御するようにしたので、陽極
と陽極受台との間でスラジの堆積が生じ、特定のフレキ
シブル導体に電流が集中し、該フレキシブル導体の温度
が上昇し、焼損の危険性が生じても、温度異常により該
めっきセルの電流を低減または制限して制御するので、
トラブルの心配のない安定した操業ができるようにな
る。
According to the present invention, the surface temperature of each flexible conductor that supplies current to the plating cell is detected, and based on the result, the occurrence of electrical contact failure in the plating tank is detected, and the current of the plating cell is detected. Because it was controlled, sludge deposition occurs between the anode and the anode support, current is concentrated on a specific flexible conductor, the temperature of the flexible conductor increases, and even if there is a risk of burning, Since the current of the plating cell is controlled by reducing or limiting due to the temperature abnormality,
Stable operation without worrying about troubles.

【0029】また、赤外線放射温度計を用いて表面温度
を測定することにより、全めっきセルの各フレキシブ
ル導体ごとに大規模な直流電流検出器を設置する必要が
ない、局部的にも損傷し易いフレキシブル導体の平均
温度が測定可能となる、さらには、フレキシブル導体
の直接的な温度履歴管理が可能となり、保守が容易であ
るという効果も有する。
Further, by measuring the surface temperature using an infrared radiation thermometer, it is not necessary to install a large-scale DC current detector for each flexible conductor of all the plating cells, and it is easily damaged locally. The average temperature of the flexible conductor can be measured, and the temperature history of the flexible conductor can be directly managed, so that maintenance is easy.

【0030】また、特に、本発明の第3の発明において
は、その基本原理として、電気的接触不良の発生した陽
極受台に対応するフレキシブル導体の温度は、通常の通
電時より低下し、逆に他のフレキシブル導体の温度は上
昇するため、各フレキシブル導体の表面温度の最大値と
最小値との差=|ΔT|が、感度および信頼性の高い特
性値となり、従来問題となっていたフレキシブル導体に
おける発火、焼損が、確実に防止可能となった。
In particular, in the third invention of the present invention, as a basic principle, the temperature of the flexible conductor corresponding to the anode cradle in which the electrical contact failure has occurred is lower than that during normal energization, In addition, since the temperature of other flexible conductors rises, the difference between the maximum value and the minimum value of the surface temperature of each flexible conductor = | ΔT | Ignition and burning in the conductor can be reliably prevented.

【0031】[0031]

【発明の効果】本発明によれば、従来問題となっていた
電気めっき設備におけるフレキシブル導体における発
火、焼損を、簡易な装置で確実に防止可能となり、生産
性の向上が達成できる。
According to the present invention, ignition and burning of a flexible conductor in an electroplating facility, which has been a problem in the past, can be reliably prevented with a simple apparatus, and an improvement in productivity can be achieved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の電気めっき設備のめっき電流制御方法
の一例を示す説明図である。
FIG. 1 is an explanatory diagram showing an example of a plating current control method for an electroplating facility of the present invention.

【図2】めっきセルの電流、各フレキシブル導体の電
流、各フレキシブル導体の表面温度、および各表面温度
の最大値と最小値との差の時間経過を示すグラフであ
る。
FIG. 2 is a graph showing a current of a plating cell, a current of each flexible conductor, a surface temperature of each flexible conductor, and a time course of a difference between a maximum value and a minimum value of each surface temperature.

【図3】電気めっき設備のめっき槽の一例を示す側面図
である。
FIG. 3 is a side view showing an example of a plating tank of an electroplating facility.

【図4】電気めっき槽付帯設備の一例を示す斜視図であ
る。
FIG. 4 is a perspective view showing an example of an auxiliary equipment for an electroplating tank.

【図5】電気めっき設備のめっき電流制御の回路図であ
る。
FIG. 5 is a circuit diagram of plating current control of an electroplating facility.

【符号の説明】[Explanation of symbols]

1 鋼帯(ストリップ) 2 陽極 3 めっき液 4 コンダクタロール 5 ゴムロール 6 めっき槽 7a 陽極受台 7b 陽極受台支柱 11a 、11b ブスバー 131 、132 、133 、134 フレキシブル導体 21 整流器 25 電流制御装置 26 直流電流検出器 27 全電流制御装置 28 ブライドルロール 29 鋼帯搬送速度検出器 30 めっき目付量設定器 31 演算器 32 電流加算器 401 、402 、403 、404 赤外線放射温度計 41 温度比較器 42 アラーム出力信号 43 電流リミッタ R 赤外線 C1 、C2 、C3 、Cn めっきセルDESCRIPTION OF SYMBOLS 1 Steel strip (strip) 2 Anode 3 Plating solution 4 Conductor roll 5 Rubber roll 6 Plating tank 7a Anode support 7b Anode support columns 11a and 11b Bus bar 13 1 , 13 2 , 13 3 , 13 4 Flexible conductor 21 Rectifier 25 Current control Device 26 DC current detector 27 Total current control device 28 Bridle roll 29 Steel strip transport speed detector 30 Plating weight setting device 31 Computing device 32 Current adder 40 1 , 40 2 , 40 3 , 40 4 Infrared radiation thermometer 41 temperature comparator 42 the alarm output signal 43 current limiter R infrared C 1, C 2, C 3 , C n plating cell

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 電気めっき設備において、めっき電流を
通電するフレキシブル導体の表面温度を赤外線放射温度
計で測定し、その測定結果に基づき前記電流を制御する
ことを特徴とする電気めっき設備のめっき電流制御方
法。
1. A plating current for an electroplating facility, wherein the surface temperature of a flexible conductor through which a plating current flows is measured by an infrared radiation thermometer, and the current is controlled based on the measurement result. Control method.
【請求項2】 電気めっき設備において、同一のめっき
槽にめっき電流を通電する複数本のフレキシブル導体の
表面温度を赤外線放射温度計で測定し、前記各フレキシ
ブル導体間の表面温度の差に基づき前記電流を制御する
ことを特徴とする電気めっき設備のめっき電流制御方
法。
2. In an electroplating facility, the surface temperature of a plurality of flexible conductors for applying a plating current to the same plating tank is measured by an infrared radiation thermometer, and based on a difference in surface temperature between the respective flexible conductors, A plating current control method for an electroplating facility, comprising controlling a current.
【請求項3】 めっき槽のめっき電流値が基準電流値に
一致するように制御される電気めっき設備のめっき電流
制御方法であって、同一のめっき槽にめっき電流を通電
する複数本のフレキシブル導体の表面温度を赤外線放射
温度計で測定し、前記各フレキシブル導体の表面温度の
最大値と最小値との差|ΔT|が予め設定した値以上と
なった場合に、該めっき槽のめっき電流を低減または一
定値以下に制限することを特徴とする電気めっき設備の
めっき電流制御方法。
3. A plating current control method for an electroplating facility in which a plating current value of a plating tank is controlled to be equal to a reference current value, wherein a plurality of flexible conductors for supplying a plating current to the same plating tank. Is measured with an infrared radiation thermometer, and when the difference | ΔT | between the maximum value and the minimum value of the surface temperature of each of the flexible conductors is equal to or greater than a preset value, the plating current of the plating tank is reduced. A plating current control method for an electroplating facility, wherein the plating current is reduced or limited to a certain value or less.
JP20213396A 1996-07-31 1996-07-31 Method for controlling plating current of electroplating equipment Pending JPH1046398A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20213396A JPH1046398A (en) 1996-07-31 1996-07-31 Method for controlling plating current of electroplating equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20213396A JPH1046398A (en) 1996-07-31 1996-07-31 Method for controlling plating current of electroplating equipment

Publications (1)

Publication Number Publication Date
JPH1046398A true JPH1046398A (en) 1998-02-17

Family

ID=16452516

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20213396A Pending JPH1046398A (en) 1996-07-31 1996-07-31 Method for controlling plating current of electroplating equipment

Country Status (1)

Country Link
JP (1) JPH1046398A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019181179A1 (en) * 2018-03-22 2019-09-26 富山住友電工株式会社 Plating treatment device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019181179A1 (en) * 2018-03-22 2019-09-26 富山住友電工株式会社 Plating treatment device
KR20190139999A (en) * 2018-03-22 2019-12-18 도야마 스미토모 덴코우 가부시키가이샤 Plating processing equipment

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