JPH10335105A - Chip component - Google Patents

Chip component

Info

Publication number
JPH10335105A
JPH10335105A JP9144025A JP14402597A JPH10335105A JP H10335105 A JPH10335105 A JP H10335105A JP 9144025 A JP9144025 A JP 9144025A JP 14402597 A JP14402597 A JP 14402597A JP H10335105 A JPH10335105 A JP H10335105A
Authority
JP
Japan
Prior art keywords
film
chip component
external electrode
exterior
section
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9144025A
Other languages
Japanese (ja)
Other versions
JP3425848B2 (en
Inventor
Sadaaki Kurata
定明 倉田
Shinichi Harada
慎一 原田
Tomio Azuma
富雄 東
Ikuo Kakiuchi
育雄 垣内
Manabu Teraoka
学 寺岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHUKI SEIKI KK
Taiyo Yuden Co Ltd
Original Assignee
CHUKI SEIKI KK
Taiyo Yuden Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHUKI SEIKI KK, Taiyo Yuden Co Ltd filed Critical CHUKI SEIKI KK
Priority to JP14402597A priority Critical patent/JP3425848B2/en
Publication of JPH10335105A publication Critical patent/JPH10335105A/en
Application granted granted Critical
Publication of JP3425848B2 publication Critical patent/JP3425848B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a chip component capable of removing concerns about the mechanical strength of ceramic devices with its central section being narrower than its bilateral section. SOLUTION: An armor film 3 is continuously formed on the central cylinder section and the bilateral prism section of a conductor film 2 and an external electrode film 4 is formed on the bilateral prism section of the conductor film 2, except for the region formed where there is no armor film. Since the mechanically weak section of the ceramic element, with its central section being narrower than the bilateral section, is reinforced by the armor film 4 extending to the bilateral prism section, concerns about the mechanical strength can be removed.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、中央部分が両側部
分よりも細い磁器素子を用い、磁器素子の中央部分上に
外装膜を、両側部分上に外部電極膜をそれぞれ備えたチ
ップ部品に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a chip component which uses a porcelain element whose center portion is thinner than both side portions, and has an exterior film on the center portion of the porcelain element and external electrode films on both side portions. It is.

【0002】[0002]

【従来の技術】この種のチップ部品を開示するものとし
て、本出願人による特開平7−307201号公報があ
り、同公報には、一対の角柱部の間にこれよりも横断面
形が小さな角柱部または円柱部を一体に備えた磁器素子
と、磁器素子の表面に形成された導体膜と、導体膜の中
央角柱部上部分または中央円柱部上部分を覆う外装膜
と、導体膜の両側角柱部上部分を覆う外部電極膜とを備
えたチップ部品が開示されている。
2. Description of the Related Art Japanese Patent Laying-Open No. 7-307201 by the present applicant discloses a chip component of this type, which discloses a smaller cross-sectional shape between a pair of prism portions. A porcelain element integrally provided with a prismatic or cylindrical part, a conductor film formed on the surface of the porcelain element, an exterior film covering the central prismatic part or the central cylindrical part, and both sides of the conductor film A chip component including an external electrode film covering an upper portion of the prism is disclosed.

【0003】このチップ部品の構造によれば、例えば、
導体膜を抵抗材料から形成しその中央部分を必要に応じ
てトリミングすることによってチップ抵抗器を構成する
ことができ、また、導体膜を低抵抗材料から形成しその
中央部分に螺旋状溝を形成することによって所定周回の
コイルを持つチップインダクタを構成することができ、
さらに、導体膜を低抵抗材料から形成することによって
チップジャンパーを構成することができる。
According to the structure of this chip component, for example,
A chip resistor can be formed by forming a conductor film from a resistive material and trimming the central part as necessary, and a conductive film is formed from a low-resistance material and a spiral groove is formed in the central part. By doing so, it is possible to configure a chip inductor having a predetermined number of turns of the coil,
Further, a chip jumper can be formed by forming the conductor film from a low-resistance material.

【0004】上記のチップ部品は、両外部電極膜の側面
のうちの1つを実装面として任意に利用でき、部品転動
や滑りを防止して安定した実装を行えると共に、部品自
体が表裏を持たない外観形状を有しているのでバルク供
給(ばら状態で収納されたチップ部品を所定向きで一列
に整列して供給する方式)に好適であるという利点を備
えている。
[0004] The above-mentioned chip component can arbitrarily use one of the side surfaces of both external electrode films as a mounting surface, can prevent component rolling and slipping, and can perform stable mounting. Since it has an external shape that does not have it, it has an advantage that it is suitable for bulk supply (a method of supplying chip components stored in a loose state in a line in a predetermined direction).

【0005】[0005]

【発明が解決しようとする課題】上記のチップ部品は、
中央部分が両側部分よりも細い磁器素子を用いているた
め、中央部分と両側部分との寸法差が大きくなると、両
者の強度差を原因として境界部分にクラックを生じる恐
れがある。
The above-mentioned chip parts are:
Since a porcelain element is used in the center portion which is thinner than the both side portions, if the dimensional difference between the center portion and the both side portions becomes large, there is a possibility that a crack may occur at the boundary portion due to the difference in strength between the two.

【0006】本発明は上記事情に鑑みてなされたもの
で、その目的とするところは、中央部分が両側部分より
も細い磁器素子を用いる場合でも強度面の懸念を一掃で
きるチップ部品を提供することにある。
SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a chip component capable of eliminating a concern about strength even when a porcelain element having a central portion smaller than both side portions is used. It is in.

【0007】[0007]

【課題を解決するための手段】上記目的を達成するた
め、本発明は、中央部分が両側部分よりも細い磁器素子
を用い、磁器素子の中央部分上に外装膜を、両側部分上
に外部電極膜をそれぞれ備えたチップ部品であって、前
記外装膜が磁器素子の両側部分まで延設され、該外装膜
の端縁に前記外部電極膜が接触している、ことをその主
たる特徴としている。
In order to achieve the above object, the present invention uses a porcelain element having a central portion narrower than both side portions, wherein an outer film is provided on the central portion of the porcelain element and external electrodes are provided on both side portions. A chip component provided with a film, wherein the outer film extends to both side portions of the porcelain element, and its main feature is that the outer electrode film is in contact with an edge of the outer film.

【0008】このチップ部品によれば、外装膜が磁器素
子の両側部分まで延設され、該外装膜の端縁に前記外部
電極膜が接触しているので、中央部分が両側部分よりも
細い磁器素子を用いる場合でも、磁器素子の強度的に弱
い部分を、磁器素子の両側部分まで延設された外装膜に
よって補強することができる。
According to this chip component, the outer film extends to both side portions of the porcelain element, and the outer electrode film is in contact with the edge of the outer film, so that the center portion is thinner than the both side portions. Even in the case of using the element, the weak portion of the porcelain element can be reinforced by the exterior film extending to both sides of the porcelain element.

【0009】[0009]

【発明の実施の形態】図1には本発明を適用したチップ
部品の外観斜視図を、図2にはその縦断面図をそれぞれ
示してある。同図に示したチップ部品は一対の四角柱部
間にこれよりも横断面形が小さな円柱部を備えた外観形
状を有しており、図中の1は磁器素子、2は回路用導体
膜(以下単に導体膜という)、3は外装膜、4は外部電
極膜である。
FIG. 1 is an external perspective view of a chip component to which the present invention is applied, and FIG. 2 is a longitudinal sectional view thereof. The chip component shown in the figure has an external appearance having a cylindrical portion having a smaller cross-sectional shape than a pair of square pillars, and 1 in the figure is a porcelain element, and 2 is a conductor film for a circuit. (Hereinafter simply referred to as a conductor film) 3 is an exterior film, and 4 is an external electrode film.

【0010】磁器素子1は、部品種類に応じた磁器材料
(セラミクス)から成り、図3(a)にも示すようにチ
ップ部品と相似した外観形状を有している。つまり、磁
器素子1は、向き及び大きさが等しい一対の四角柱部1
aと、横断面形が該四角柱部1aよりも小さく、且つ両
側四角柱部1aの間に同軸上に位置する円柱部1bとを
一体に備えている。
The porcelain element 1 is made of a porcelain material (ceramics) corresponding to the type of component, and has an appearance similar to that of a chip component as shown in FIG. That is, the porcelain element 1 has a pair of square pillars 1 having the same orientation and size.
a and a cylindrical portion 1b having a smaller cross-sectional shape than the rectangular column portion 1a and being coaxially located between the rectangular column portions 1a on both sides.

【0011】導体膜2は、部品種類に応じた導体材料か
ら成り、スパッタリングや電解・無電解メッキ等を利用
した周知の薄膜形成手法によって、磁器素子1の表面全
体に所定の厚みをもって形成されている。部品種類にも
よるがこの導体膜2の厚みは約3μmである。
The conductive film 2 is made of a conductive material according to the type of component, and is formed with a predetermined thickness on the entire surface of the ceramic element 1 by a known thin film forming technique utilizing sputtering, electrolytic / electroless plating, or the like. I have. The thickness of the conductor film 2 is about 3 μm, depending on the type of parts.

【0012】外装膜3は、エポキシ系の樹脂やシリコン
系のガラス等から成り、ペースト塗布・硬化等を利用し
た周知の厚膜形成手法によって、導体膜2の中央円柱部
上と両側角柱部上の一部(中央円柱部と隣接する4側面
の一部)に所定の厚みをもって連続的に形成されてい
る。この外装膜3の厚みは約15μmで、図示例のもの
では両側角柱部の4側面の中央円柱部側の約1/3まで
外装膜3が延設されている。
The exterior film 3 is made of an epoxy-based resin or a silicon-based glass, etc., and is formed on the center column portion and both side prism portions of the conductor film 2 by a well-known thick film forming technique using paste application and curing. (A part of the four side surfaces adjacent to the central column portion) is formed continuously with a predetermined thickness. The thickness of the exterior film 3 is about 15 μm, and in the illustrated example, the exterior film 3 is extended to about 1 / of the side of the center column on the four side surfaces of the prisms on both sides.

【0013】外部電極膜4は、銀,ニッケル等の電極材
料から成り、ペースト塗布・硬化等を利用した周知の厚
膜形成手法によって、導体膜2の両側角柱部上の外装膜
3が形成されていない部分に所定の厚みをもって形成さ
れている。この外部電極膜4の厚みは20〜45μm
で、図示例のものでは外部電極膜4の端縁4aが外装膜
3の端縁3aの上に僅かに重なった状態で接触してい
る。
The external electrode film 4 is made of an electrode material such as silver, nickel or the like, and the exterior film 3 on both side prism portions of the conductor film 2 is formed by a well-known thick film forming technique utilizing paste application and curing. It is formed with a predetermined thickness on the part that is not. The thickness of the external electrode film 4 is 20 to 45 μm.
In the illustrated example, the edge 4a of the external electrode film 4 is in contact with the edge 3a of the exterior film 3 while slightly overlapping the edge 3a.

【0014】図1及び図2に示したチップ部品の構造に
よれば、磁器素子1と導体膜2に抵抗器に適した材料を
採用することによってチップ抵抗器を構成することがで
き、以下、その製造方法の一例を図3を参照して説明す
る。
According to the structure of the chip component shown in FIGS. 1 and 2, a chip resistor can be formed by adopting a material suitable for a resistor for the ceramic element 1 and the conductor film 2. An example of the manufacturing method will be described with reference to FIG.

【0015】まず、図3(a)に示すように、一対の四
角柱部1a間にこれよりも横断面形が小さな円柱部1b
を一体に備えたアルミナ等の絶縁材料から成る磁器素子
1を得た後、多数の磁器素子1を一括でバレル研磨して
その角及び稜線に丸み付けをする。
First, as shown in FIG. 3A, a cylindrical portion 1b having a smaller cross-sectional shape than a pair of square pillar portions 1a.
After obtaining the ceramic element 1 made of an insulating material such as alumina, the ceramic element 1 is integrally barrel-polished and its corners and ridges are rounded.

【0016】次に、図3(b)に示すように、磁器素子
1の表面全体に、酸化ルテニウム等の抵抗材料から成る
導体膜(抵抗膜)2を、スパッタリングや電解・無電解
メッキ等によって形成する。また、必要に応じて導体膜
の中央円柱部上部分にトリミング溝(図示省略)をレー
ザ光照射やダイシング等の手法による部分的な除去加工
によって形成して抵抗値調整を行う。
Next, as shown in FIG. 3B, a conductor film (resistive film) 2 made of a resistive material such as ruthenium oxide is coated on the entire surface of the ceramic element 1 by sputtering, electrolytic / electroless plating, or the like. Form. Further, if necessary, a trimming groove (not shown) is formed in the upper portion of the central cylindrical portion of the conductor film by partial removal processing using a method such as laser beam irradiation or dicing to adjust the resistance value.

【0017】次に、図3(c)に示すように、導体膜の
中央円柱部上と両側角柱部上の一部に、エポキシ系の樹
脂やシリコン系のガラス等を主成分とする外装ペースト
を、塗布領域に対応した周面形状を有するローラ等を用
いてコーティングし、これを焼き付け等の熱処理によっ
て硬化させて外装膜3を形成する。
Next, as shown in FIG. 3 (c), an exterior paste mainly composed of an epoxy resin or a silicon glass is provided on the central cylindrical portion of the conductor film and a portion on both side prism portions. Is coated using a roller or the like having a peripheral surface shape corresponding to the application region, and is cured by heat treatment such as baking to form the exterior film 3.

【0018】次に、図3(d)に示すように、導体膜2
の両側角柱部上の外装膜3が形成されていない部分に、
銀,ニッケル等の金属粉を含有した電極ペーストを、浸
漬法(ディップ法)または注型法等によってコーティン
グし、これを焼き付け等の熱処理によって硬化させて外
部電極膜4を形成する。以上で、図1及び図2に示した
ものと同様の外観形状を有するチップ抵抗器を得ること
ができる。
Next, as shown in FIG.
In the part where the exterior film 3 is not formed on both side prisms,
An electrode paste containing a metal powder such as silver or nickel is coated by a dipping method (dipping method) or a casting method or the like, and is cured by a heat treatment such as baking to form the external electrode film 4. As described above, a chip resistor having an appearance similar to that shown in FIGS. 1 and 2 can be obtained.

【0019】また、図1及び図2に示したチップ部品の
構造によれば、磁器素子1と導体膜2にインダクタに適
した材料を採用し、中央円柱部上の導体膜2に螺旋状溝
を形成することによって所定周回のコイルを持つチップ
インダクタを構成することができ、以下、その製造方法
の一例を図3を参照して説明する。
According to the structure of the chip component shown in FIGS. 1 and 2, the porcelain element 1 and the conductor film 2 are made of a material suitable for an inductor, and the conductor film 2 on the central column is formed in a spiral groove. Is formed, a chip inductor having a coil having a predetermined number of turns can be formed. Hereinafter, an example of a method for manufacturing the chip inductor will be described with reference to FIG.

【0020】まず、図3(a)に示すように、一対の四
角柱部1a間にこれよりも横断面形が小さな円柱部1b
を一体に備えたフェライト等の磁性材料から成る磁器素
子1を得た後、多数の磁器素子1を一括でバレル研磨し
てその角及び稜線に丸み付けをする。
First, as shown in FIG. 3 (a), a cylindrical portion 1b having a smaller cross section than a pair of square pillars 1a.
After obtaining the ceramic element 1 made of a magnetic material such as ferrite integrally provided with the above, a large number of the ceramic elements 1 are barrel-polished at once and the corners and ridges thereof are rounded.

【0021】次に、図3(b)に示すように、磁器素子
1の表面全体に、銅,銀等の低抵抗材料から成る導体膜
2を、スパッタリングや電解・無電解メッキ等によって
形成する。そして、導体膜2の中央円柱部上部分に螺旋
状溝(図示省略)をレーザ光照射やダイシング等の手法
による部分的な除去加工によって形成して所定周回のコ
イルを形成する。
Next, as shown in FIG. 3B, a conductor film 2 made of a low-resistance material such as copper or silver is formed on the entire surface of the porcelain element 1 by sputtering, electrolytic / electroless plating, or the like. . Then, a spiral groove (not shown) is formed in the upper portion of the central cylindrical portion of the conductive film 2 by a partial removal process using a method such as laser light irradiation or dicing to form a coil having a predetermined number of turns.

【0022】次に、図3(c)に示すように、導体膜の
中央円柱部上と両側角柱部上の一部に、エポキシ系の樹
脂やシリコン系のガラス等を主成分とする外装ペースト
を、塗布領域に対応した周面形状を有するローラ等を用
いてコーティングし、これを焼き付け等の熱処理によっ
て硬化させて外装膜3を形成する。
Next, as shown in FIG. 3 (c), an exterior paste mainly composed of epoxy resin, silicon glass, or the like is provided on the central cylindrical portion of the conductor film and a part of the rectangular prism portions on both sides. Is coated using a roller or the like having a peripheral surface shape corresponding to the application region, and is cured by heat treatment such as baking to form the exterior film 3.

【0023】次に、図3(d)に示すように、導体膜2
の両側角柱部上の外装膜3が形成されていない部分に、
銀,ニッケル等の金属粉を含有した電極ペーストを、浸
漬法(ディップ法)または注型法等によってコーティン
グし、これを焼き付け等の熱処理によって硬化させて外
部電極膜4を形成する。以上で、図1及び図2に示した
ものと同様の外観形状を有するチップインダクタを得る
ことができる。
Next, as shown in FIG.
In the part where the exterior film 3 is not formed on both side prisms,
An electrode paste containing a metal powder such as silver or nickel is coated by a dipping method (dipping method) or a casting method or the like, and is cured by a heat treatment such as baking to form the external electrode film 4. Thus, a chip inductor having an appearance similar to that shown in FIGS. 1 and 2 can be obtained.

【0024】勿論、図1及び図2に示したチップ部品の
構造は先に述べたチップ抵抗器やチップインダクタ以外
のチップ部品、例えば、チップジャンパーや複合回路部
品等にも適用することができる。
Of course, the structure of the chip components shown in FIGS. 1 and 2 can be applied to chip components other than the above-described chip resistors and chip inductors, for example, chip jumpers and composite circuit components.

【0025】このように、図1及び図2に示したチップ
部品によれば、外装膜3を導体膜2の中央円柱部上と両
側角柱部上の一部に連続的に形成し、外部電極膜4を導
体膜2の両側角柱部上の外装膜3が形成されていない部
分に形成してあるので、中央部分が両側部分よりも細い
磁器素子1を用いる場合でも、磁器素子1の強度的に弱
い部分を、両側角柱部上まで延設された外装膜4によっ
て的確に補強して、強度面の懸念を一掃することができ
る。
As described above, according to the chip component shown in FIGS. 1 and 2, the outer film 3 is continuously formed on the central column portion of the conductive film 2 and a part on both side prism portions, and the external electrode is formed. Since the film 4 is formed on the rectangular prism portions on both sides of the conductor film 2 where the exterior film 3 is not formed, the strength of the porcelain element 1 can be improved even when the porcelain element 1 whose center portion is thinner than both side portions is used. The weak portion can be properly reinforced by the exterior film 4 extending up to the prism portions on both sides, so that concerns about the strength can be eliminated.

【0026】また、外部電極膜4の端縁4aが外装膜3
の端縁3aの上に僅かに重なって該端縁3aを覆ってい
るので、外装膜3が端縁3aから剥離することを外部電
極膜4によって防止できると共に、外部電極膜4と外装
膜3との結合性を高めることができる。
The edge 4a of the external electrode film 4 is
The outer electrode film 4 can prevent the outer film 3 from peeling off from the outer edge 3a because the outer film 3 slightly overlaps and covers the outer edge 3a. Can be enhanced.

【0027】さらに、外部電極膜4の厚みが外装膜3の
厚みよりも大きいので、両側角柱部上に位置する外装膜
3が部品実装の妨げになることがなく、外部電極膜4の
側面を半田等の接合材を介して基板電極(ランド)に適
正に接触させて部品接続を良好に行うことができる。
Further, since the thickness of the external electrode film 4 is larger than the thickness of the outer film 3, the outer film 3 located on the prism portions on both sides does not hinder the component mounting, and the side surfaces of the outer electrode film 4 Parts can be satisfactorily connected by properly contacting the substrate electrode (land) via a bonding material such as solder.

【0028】さらに、外部電極膜を両側角柱部上に形成
する場合に比べて外部電極膜間の距離を大きく取ること
ができるので、部品長手寸法が小さい場合でも部品実装
時に生じ得る外部電極膜の相互短絡(ショート)の問題
を回避できる。
Further, since the distance between the external electrode films can be made longer than when the external electrode films are formed on the prisms on both sides, even if the longitudinal dimension of the component is small, the external electrode film which can be generated at the time of component mounting can be obtained. The problem of mutual short-circuit (short) can be avoided.

【0029】尚、図1及び図3に示した実施形態では、
外部電極膜4の端縁4aが外装膜3の端縁3aの上に僅
かに重なるようにしたものを例示したが、図4(a)に
示すように外部電極膜4の端縁4aの重なりしろを大き
くすれば、外部電極膜4と外装膜3との結合性をより高
めることができると共に、外部電極膜4の側面面積(接
続面積)を拡大することができる。勿論、外部電極膜4
の端縁4aは外装膜3の端縁3aの上に必ずしも重ねる
必要はなく、図4(b)に示すように、外部電極膜4の
端縁4aと外装膜3の端縁3aとが重ならずに接触する
ような形態を採用してもよい。
In the embodiment shown in FIGS. 1 and 3,
An example in which the edge 4a of the external electrode film 4 slightly overlaps the edge 3a of the exterior film 3 has been described, but as shown in FIG. 4A, the edge 4a of the external electrode film 4 overlaps. If the margin is increased, the bonding between the external electrode film 4 and the exterior film 3 can be further improved, and the side surface area (connection area) of the external electrode film 4 can be increased. Of course, the external electrode film 4
The edge 4a of the external electrode film 4 does not necessarily have to overlap the edge 3a of the exterior film 3, and as shown in FIG. 4B, the edge 4a of the external electrode film 4 and the edge 3a of the exterior film 3 overlap. Instead, a form that makes contact may be adopted.

【0030】また、図1及び図3に示した実施形態で
は、外装膜4を厚膜手法を利用して形成したものを例示
したが、該外装膜4は成形技術を利用して形成すること
も可能である。以下、型を用いた成形によって外装膜4
を形成する手順を図5を参照して説明する。
Further, in the embodiment shown in FIGS. 1 and 3, the case where the exterior film 4 is formed by using the thick film method is exemplified, but the exterior film 4 is formed by using a molding technique. Is also possible. Hereinafter, the exterior film 4 is formed by molding using a mold.
Will be described with reference to FIG.

【0031】まず、図5(a)に示すような一対の型板
11,12を用意し、導体形成後の磁器素子1をセット
した後、型を閉じる。この型板11,11は、型閉じ状
態で、導体形成後の磁器素子1を所定の姿勢で保持し、
且つ外装膜4の形成部分に相当したクリアランスCを有
するキャビティを画成する。そして、図5(b)に示す
ように、図示省略のゲートから上記クリアランスC内に
外装ペーストPを注入し、注入された外装ペーストPを
熱処理等によって硬化させる。成形法については特段の
制限はないが、注型成形の場合には外装ペーストPとし
て先に述べた外装ペーストと同様のものを使用すること
ができ、外装ペーストPの組成を変更すれば射出成形や
トランスファー成形等によっても外装膜を同様に形成す
ることができる。ペースト硬化後に型を開いて磁器素子
1を取り出せば、図5(c)に示すように、外装膜3が
所望の領域に形成された素子を得ることができ、これに
外部電極膜4を形成すれば図1及び図2と同様のチップ
部品を得ることができる。
First, a pair of mold plates 11 and 12 as shown in FIG. 5A are prepared, and after setting the porcelain element 1 after forming the conductor, the mold is closed. The mold plates 11, 11 hold the porcelain element 1 after conductor formation in a predetermined posture in a mold closed state,
In addition, a cavity having a clearance C corresponding to a portion where the exterior film 4 is formed is defined. Then, as shown in FIG. 5B, the exterior paste P is injected into the clearance C from a gate (not shown), and the injected exterior paste P is cured by heat treatment or the like. There is no particular limitation on the molding method, but in the case of cast molding, the same as the above-mentioned exterior paste can be used as the exterior paste P. If the composition of the exterior paste P is changed, injection molding can be performed. The exterior film can also be formed in a similar manner by transfer molding or transfer molding. If the porcelain element 1 is taken out after the paste is hardened and the porcelain element 1 is taken out, as shown in FIG. Then, a chip component similar to that shown in FIGS. 1 and 2 can be obtained.

【0032】さらに、図1及び図2に示した実施形態で
は、一対の四角柱部間にこれよりも横断面形が小さな円
柱部を備えた外観形状を有するものをチップ部品として
例示したが、チップ部品は、図6に示すように、一対の
四角柱部間にこれよりも横断面形が小さな四角柱部を備
えた外観形状を有するものであってもよい。このチップ
部品は、磁器素子として、向き及び大きさが等しい一対
の四角柱部と、横断面形が該四角柱部よりも小さく、且
つ両側四角柱部の間に同軸上に位置する四角柱部とを一
体に備えたものを用いる点を相違するだけで、他の構成
は図1及び図2に示したものと同じである。
Further, in the embodiment shown in FIGS. 1 and 2, a chip component having an external shape having a cylindrical portion having a smaller cross-sectional shape than a pair of square pillar portions is exemplified as a chip component. As shown in FIG. 6, the chip component may have an external shape including a square pillar portion having a smaller cross-sectional shape than a pair of square pillar portions. This chip component is a porcelain element comprising a pair of square pillars having the same orientation and size, and a square pillar having a cross section smaller than the square pillar and coaxially located between the square pillars on both sides. The other configuration is the same as that shown in FIG. 1 and FIG. 2 except that an integrated unit is used.

【0033】[0033]

【発明の効果】以上詳述したように、本発明によれば、
中央部分が両側部分よりも細い磁器素子を用いる場合で
も、磁器素子の強度的に弱い部分をその両側部分まで延
設された外装膜によって的確に補強して、強度面の懸念
を一掃して高品質のチップ部品を提供できる。
As described in detail above, according to the present invention,
Even in the case of using a porcelain element whose central part is thinner than both sides, the weak part of the porcelain element is properly reinforced with an exterior film extending to both sides to eliminate the concerns of strength and increase the height. We can provide high quality chip parts.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明を適用したチップ部品の外観斜視図FIG. 1 is an external perspective view of a chip component to which the present invention is applied.

【図2】図1に示したチップ部品の縦断面図FIG. 2 is a longitudinal sectional view of the chip component shown in FIG. 1;

【図3】チップ部品の製造手順を示す図FIG. 3 is a diagram showing a manufacturing procedure of a chip component;

【図4】外部電極膜と外装膜の境界部分の変形例を示す
FIG. 4 is a diagram showing a modified example of a boundary portion between an external electrode film and an exterior film.

【図5】外装膜を型を用いた成形によって形成する手順
を示す図
FIG. 5 is a diagram showing a procedure for forming an exterior film by molding using a mold.

【図6】本発明を適用した他のチップ部品の外観斜視図FIG. 6 is an external perspective view of another chip component to which the present invention is applied.

【符号の説明】[Explanation of symbols]

1…磁器素子、2…導体膜、3…外装膜、3a…外装膜
の端縁、4…外部電極膜、4a…外部電極膜の端縁、1
1,12…型、C…クリアランス、P…外装ペースト。
DESCRIPTION OF SYMBOLS 1 ... Ceramic element, 2 ... Conductor film, 3 ... Outer film, 3a ... Edge of outer film, 4 ... External electrode film, 4a ... Edge of external electrode film, 1
1,12: mold, C: clearance, P: exterior paste.

フロントページの続き (72)発明者 東 富雄 和歌山県日高郡印南町島田1197番地 中紀 精機株式会社内 (72)発明者 垣内 育雄 和歌山県日高郡印南町島田1197番地 中紀 精機株式会社内 (72)発明者 寺岡 学 和歌山県日高郡印南町島田1197番地 中紀 精機株式会社内Continued on the front page (72) Inventor Tomio Higashi, 1197 Shimada, Inami-cho, Hidaka-gun, Wakayama Prefecture Inside Chuki Seiki Co., Ltd. (72) Inventor Ikuo Kakiuchi 1197, Shimada, Inami-cho, Hidaka-gun, Wakayama Prefecture Chuki Seiki Co., Ltd. (72) Inventor Manabu Teraoka 1197 Shimada, Inami-cho, Hidaka-gun, Wakayama Prefecture Inside Chuki Seiki Co., Ltd.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 中央部分が両側部分よりも細い磁器素子
を用い、磁器素子の中央部分上に外装膜を、両側部分上
に外部電極膜をそれぞれ備えたチップ部品であって、 前記外装膜が磁器素子の両側部分まで延設され、該外装
膜の端縁に前記外部電極膜が接触している、 ことを特徴とするチップ部品。
1. A chip component comprising a porcelain element having a center portion narrower than both side portions, an exterior film on a central portion of the porcelain element, and an external electrode film on both side portions, wherein the exterior film is A chip component extending to both side portions of a porcelain element, wherein the external electrode film is in contact with an edge of the exterior film.
【請求項2】 外部電極膜が少なくとも外装膜の端縁を
覆っている、 ことを特徴とする請求項1記載のチップ部品。
2. The chip component according to claim 1, wherein the external electrode film covers at least an edge of the exterior film.
【請求項3】 外部電極膜の厚みが外装膜の厚みよりも
大きい、 ことを特徴とする請求項1または2記載のチップ部品。
3. The chip component according to claim 1, wherein the thickness of the external electrode film is larger than the thickness of the exterior film.
【請求項4】 外装膜が型を用いた成形によって形成さ
れたものである、 ことを特徴とする請求項1乃至3の何れか1項記載のチ
ップ部品。
4. The chip component according to claim 1, wherein the exterior film is formed by molding using a mold.
JP14402597A 1997-06-02 1997-06-02 Chip components Expired - Fee Related JP3425848B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14402597A JP3425848B2 (en) 1997-06-02 1997-06-02 Chip components

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14402597A JP3425848B2 (en) 1997-06-02 1997-06-02 Chip components

Publications (2)

Publication Number Publication Date
JPH10335105A true JPH10335105A (en) 1998-12-18
JP3425848B2 JP3425848B2 (en) 2003-07-14

Family

ID=15352586

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14402597A Expired - Fee Related JP3425848B2 (en) 1997-06-02 1997-06-02 Chip components

Country Status (1)

Country Link
JP (1) JP3425848B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011044450A (en) * 2009-08-19 2011-03-03 Panasonic Corp Resistor, and method of manufacturing and mounting the same

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0256426U (en) * 1988-10-15 1990-04-24
JPH02281701A (en) * 1989-04-24 1990-11-19 Matsushita Electric Ind Co Ltd Chip resistor
JPH05251210A (en) * 1991-12-20 1993-09-28 Mitsubishi Materials Corp Conductive chip type ceramic element and manufacturing method thereof
JPH07307201A (en) * 1994-03-18 1995-11-21 Taiyo Yuden Co Ltd Chip component and its manufacture

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0256426U (en) * 1988-10-15 1990-04-24
JPH02281701A (en) * 1989-04-24 1990-11-19 Matsushita Electric Ind Co Ltd Chip resistor
JPH05251210A (en) * 1991-12-20 1993-09-28 Mitsubishi Materials Corp Conductive chip type ceramic element and manufacturing method thereof
JPH07307201A (en) * 1994-03-18 1995-11-21 Taiyo Yuden Co Ltd Chip component and its manufacture

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011044450A (en) * 2009-08-19 2011-03-03 Panasonic Corp Resistor, and method of manufacturing and mounting the same

Also Published As

Publication number Publication date
JP3425848B2 (en) 2003-07-14

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