JPH10326014A5 - - Google Patents

Info

Publication number
JPH10326014A5
JPH10326014A5 JP1997082855A JP8285597A JPH10326014A5 JP H10326014 A5 JPH10326014 A5 JP H10326014A5 JP 1997082855 A JP1997082855 A JP 1997082855A JP 8285597 A JP8285597 A JP 8285597A JP H10326014 A5 JPH10326014 A5 JP H10326014A5
Authority
JP
Japan
Prior art keywords
group
positive photoresist
deep ultraviolet
photoresist composition
exposure according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997082855A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10326014A (ja
JP3797506B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP08285597A priority Critical patent/JP3797506B2/ja
Priority claimed from JP08285597A external-priority patent/JP3797506B2/ja
Priority to US09/048,787 priority patent/US6242153B1/en
Priority to KR10-1998-0010768A priority patent/KR100479275B1/ko
Publication of JPH10326014A publication Critical patent/JPH10326014A/ja
Publication of JPH10326014A5 publication Critical patent/JPH10326014A5/ja
Application granted granted Critical
Publication of JP3797506B2 publication Critical patent/JP3797506B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP08285597A 1997-03-27 1997-04-01 遠紫外線露光用ポジ型フォトレジスト組成物 Expired - Fee Related JP3797506B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP08285597A JP3797506B2 (ja) 1997-03-27 1997-04-01 遠紫外線露光用ポジ型フォトレジスト組成物
US09/048,787 US6242153B1 (en) 1997-03-27 1998-03-27 Positive photoresist composition for far ultraviolet ray exposure
KR10-1998-0010768A KR100479275B1 (ko) 1997-03-27 1998-03-27 원자외선노광용포지티브포토레지스트조성물

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP9-75644 1997-03-27
JP7564497 1997-03-27
JP08285597A JP3797506B2 (ja) 1997-03-27 1997-04-01 遠紫外線露光用ポジ型フォトレジスト組成物

Publications (3)

Publication Number Publication Date
JPH10326014A JPH10326014A (ja) 1998-12-08
JPH10326014A5 true JPH10326014A5 (enrdf_load_stackoverflow) 2004-10-07
JP3797506B2 JP3797506B2 (ja) 2006-07-19

Family

ID=26416793

Family Applications (1)

Application Number Title Priority Date Filing Date
JP08285597A Expired - Fee Related JP3797506B2 (ja) 1997-03-27 1997-04-01 遠紫外線露光用ポジ型フォトレジスト組成物

Country Status (1)

Country Link
JP (1) JP3797506B2 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8017303B2 (en) * 2009-02-23 2011-09-13 International Business Machines Corporation Ultra low post exposure bake photoresist materials

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