JPH10307396A5 - - Google Patents
Info
- Publication number
- JPH10307396A5 JPH10307396A5 JP1997115797A JP11579797A JPH10307396A5 JP H10307396 A5 JPH10307396 A5 JP H10307396A5 JP 1997115797 A JP1997115797 A JP 1997115797A JP 11579797 A JP11579797 A JP 11579797A JP H10307396 A5 JPH10307396 A5 JP H10307396A5
- Authority
- JP
- Japan
- Prior art keywords
- deep ultraviolet
- photoresist composition
- alkali
- resin
- positive photoresist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11579797A JP3865863B2 (ja) | 1997-05-06 | 1997-05-06 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11579797A JP3865863B2 (ja) | 1997-05-06 | 1997-05-06 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH10307396A JPH10307396A (ja) | 1998-11-17 |
| JPH10307396A5 true JPH10307396A5 (https=) | 2004-10-14 |
| JP3865863B2 JP3865863B2 (ja) | 2007-01-10 |
Family
ID=14671325
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11579797A Expired - Lifetime JP3865863B2 (ja) | 1997-05-06 | 1997-05-06 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3865863B2 (https=) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000035835A1 (en) * | 1998-12-11 | 2000-06-22 | Daicel Chemical Industries, Ltd. | Process for the preparation of organic compounds with imide catalysts |
| US7537879B2 (en) * | 2004-11-22 | 2009-05-26 | Az Electronic Materials Usa Corp. | Photoresist composition for deep UV and process thereof |
| US7951522B2 (en) | 2004-12-29 | 2011-05-31 | Tokyo Ohka Kogyo Co., Ltd. | Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal |
| US7927778B2 (en) | 2004-12-29 | 2011-04-19 | Tokyo Ohka Kogyo Co., Ltd. | Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal |
| JP4661397B2 (ja) * | 2005-06-27 | 2011-03-30 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物 |
| JP4796792B2 (ja) * | 2005-06-28 | 2011-10-19 | 富士フイルム株式会社 | ポジ型感光性組成物及びそれを用いたパターン形成方法 |
| CN102066439B (zh) * | 2008-03-12 | 2013-08-07 | 大赛璐化学工业株式会社 | 包含内酯骨架的单体、高分子化合物及光致抗蚀剂组合物 |
| JP6435109B2 (ja) * | 2013-04-26 | 2018-12-05 | 東京応化工業株式会社 | レジスト組成物、レジストパターン形成方法 |
-
1997
- 1997-05-06 JP JP11579797A patent/JP3865863B2/ja not_active Expired - Lifetime
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