JPH10302697A - Charged particle beam microscope - Google Patents

Charged particle beam microscope

Info

Publication number
JPH10302697A
JPH10302697A JP10568797A JP10568797A JPH10302697A JP H10302697 A JPH10302697 A JP H10302697A JP 10568797 A JP10568797 A JP 10568797A JP 10568797 A JP10568797 A JP 10568797A JP H10302697 A JPH10302697 A JP H10302697A
Authority
JP
Japan
Prior art keywords
sample
stage
charged particle
particle beam
vibration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10568797A
Other languages
Japanese (ja)
Inventor
Shunichi Watanabe
俊一 渡辺
Satoru Fukuhara
福原  悟
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP10568797A priority Critical patent/JPH10302697A/en
Publication of JPH10302697A publication Critical patent/JPH10302697A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To prevent a vibration from being generated on a scanning image on a monitor, by vibrating a sample by use of a piezoelectric actuator so as to cancel the resonance vibration of a stage or a mirror column. SOLUTION: A drive signal having an optional frequency component is imparted to a piezoelectric actuator 9 to vibrate a sample 6, whereby the vibration generated on a scanning image on a monitor is canceled. A small-sized piezoelectric actuator 9 having a sufficiently high resonance frequency to a stage 8 or a mirror column 5 is provided between the stage 8 and a sample holder 7, and the sample holder 7 is driven at a frequency conformed to the resonance frequency of the stage 8 or the mirror column 5, whereby the relative position of the sample 6 and a scanning electron beam 2 is corrected. The amplitude and phase of the drive signal are controlled while observing the image displayed on a monitor 15. Thus, the vibration generated when a disturbance having a complicated phase such as noise is inputted can be easily corrected.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は荷電粒子線顕微鏡に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a charged particle beam microscope.

【0002】[0002]

【従来の技術】荷電粒子線顕微鏡の構成を電子顕微鏡を
一例として図2に示す。図2で紙面の左右方向をX方
向,前後方向をY方向と定義している。電子銃1から発
生された電子線2は鏡体カラム5に設置された偏向器3
によりX,Y方向に偏向され、対物レンズ4等の電子光
学系により試料6の表面に収束され、試料6表面を走査
しながら照射する。ここで、X,Y各方向の偏向器3の
入力電流は走査電流源16により与えられ、各々の走査
電流は制御装置14により制御される。また、試料6は
試料ホルダ7に固定され、更に、水平移動,傾斜,回転
の機能を持ったステージ8により任意の位置に移動する
ことができる。鏡体カラム5およびステージ8は試料室
10に固定されている。更に、試料室10はベースプレ
ート11に直接あるいは防振具を介して固定されてい
る。電子線2が試料6に照射される時に発生する二次電
子12は二次電子検出器13で検出され、モニタ15に
試料6表面の走査画像が形成される。
2. Description of the Related Art The configuration of a charged particle beam microscope is shown in FIG. 2 using an electron microscope as an example. In FIG. 2, the left-right direction of the paper is defined as an X direction, and the front-rear direction is defined as a Y direction. An electron beam 2 generated from an electron gun 1 is applied to a deflector 3 installed in a mirror column 5.
Are deflected in the X and Y directions, converged on the surface of the sample 6 by an electron optical system such as the objective lens 4, and irradiated while scanning the surface of the sample 6. Here, the input current of the deflector 3 in each of the X and Y directions is provided by a scanning current source 16, and each scanning current is controlled by the controller 14. The sample 6 is fixed to a sample holder 7 and can be moved to an arbitrary position by a stage 8 having functions of horizontal movement, inclination and rotation. The mirror column 5 and the stage 8 are fixed to the sample chamber 10. Further, the sample chamber 10 is fixed to the base plate 11 directly or via a vibration isolator. Secondary electrons 12 generated when the electron beam 2 irradiates the sample 6 are detected by the secondary electron detector 13, and a scanned image of the surface of the sample 6 is formed on the monitor 15.

【0003】[0003]

【発明が解決しようとする課題】従来の荷電粒子線装置
では半導体工場クリーンルーム等の騒音が大きな場所に
設置した時に走査画像に振動が現れる。この振動は騒音
の音圧が試料室10の表面に入力した時、試料室10を
わずかに振動させ、このわずかな振動がステージ8を共
振させるために発生している。あるいは、音圧が鏡体カ
ラム5に入力し鏡体カラム5が共振した時、電子源1を
振動させるために発生する。上述した騒音の音圧は試料
室10、及び鏡体カラム5に直接入力するので、機械的
な減衰器を用いて振動を減衰させることは困難である。
音圧により発生する振動を減衰させるため、装置全体を
覆う防音壁や、試料室10,鏡体カラム5を覆う遮音板
を設け、装置に入力する騒音の音圧を減衰させる方法が
提案されている(特願平7−245762号)。
In a conventional charged particle beam apparatus, vibrations appear in a scanned image when the apparatus is installed in a place such as a semiconductor factory clean room where noise is large. This vibration causes the sample chamber 10 to slightly vibrate when the sound pressure of the noise is input to the surface of the sample chamber 10, and this slight vibration causes the stage 8 to resonate. Alternatively, the sound pressure is generated to vibrate the electron source 1 when the sound pressure is input to the column 5 and the column 5 resonates. Since the sound pressure of the above-described noise is directly input to the sample chamber 10 and the mirror column 5, it is difficult to attenuate the vibration using a mechanical attenuator.
In order to attenuate the vibration generated by the sound pressure, there has been proposed a method of providing a soundproof wall covering the entire apparatus, a sound insulating plate covering the sample chamber 10 and the mirror column 5, and attenuating the sound pressure of noise input to the apparatus. (Japanese Patent Application No. 7-245762).

【0004】しかし、問題となっている走査画像の振動
周波数はステージ8の共振周波数である50〜300H
zの低周波である。この低周波の騒音を減衰し、試料室
が完全に振動しなくするためには、装置を完全に覆う防
音壁等の大掛かりな装置が必要となり、現実的には実現
が困難である。
However, the vibration frequency of the scan image in question is 50 to 300H, which is the resonance frequency of the stage 8.
low frequency of z. In order to attenuate the low-frequency noise and completely prevent the sample chamber from vibrating, a large-scale device such as a soundproof wall that completely covers the device is required, and it is practically difficult to realize it.

【0005】本発明の目的は、大掛かりな防音壁などを
用いることなしに、走査画像に振動を現れないようにす
る電子顕微鏡を提供する。
[0005] An object of the present invention is to provide an electron microscope that prevents vibrations from appearing in a scanned image without using a large-scale soundproof wall or the like.

【0006】[0006]

【課題を解決するための手段】上記課題を解決するた
め、本発明は走査画像に現れる振動がステージ8、及び
鏡体カラム5の共振であることを解明することにより、
ステージ8,鏡体カラム5が共振しても、モニタ15に
表示される走査画像には振動が現れないようにしたもの
である。ステージ8,鏡体カラム5が共振しない場合に
は、ステージ8と鏡体カラム5は試料室10と一体に振
動し、走査画像には振動が現れない。しかし、ステージ
8が共振する場合は、ステージ8の振動は試料室10,
鏡体カラム5の振動に対して大きくなるので、走査画像
に振動が現れてしまう。一方、鏡体カラム5が共振した
時は、走査電子線2が試料6に対して相対的に振動して
しまうことから、走査画像に振動が現れる。ステージ
8、及び鏡体カラム5が共振している時でも、試料6と
走査電子線2の相対的な位置が振動しないように補正す
ることができれば、走査画像に振動を現れなくすること
ができる。
In order to solve the above problems, the present invention clarifies that the vibration appearing in the scanned image is the resonance of the stage 8 and the mirror column 5,
Even if the stage 8 and the mirror column 5 resonate, no vibration appears in the scanned image displayed on the monitor 15. When the stage 8 and the mirror column 5 do not resonate, the stage 8 and the mirror column 5 vibrate integrally with the sample chamber 10, and no vibration appears in the scanned image. However, when the stage 8 resonates, the vibration of the stage 8 is
Since it becomes large with respect to the vibration of the mirror column 5, the vibration appears in the scanned image. On the other hand, when the mirror column 5 resonates, the scanning electron beam 2 relatively vibrates with respect to the sample 6, so that a vibration appears in the scanned image. Even when the stage 8 and the mirror column 5 are resonating, if the relative position between the sample 6 and the scanning electron beam 2 can be corrected so as not to vibrate, vibration can be prevented from appearing in the scanned image. .

【0007】本発明はステージ8や鏡体カラム5の共振
周波数に対し十分高い共振周波数を持った小型の圧電ア
クチュエータ9を、ステージ8と試料ホルダ7の間に設
け、試料ホルダ7をステージ8あるいは鏡体カラム5の
共振周波数と一致した周波数で駆動することにより試料
6と走査電子線2の相対的な位置を補正するものであ
る。この時の駆動信号の振幅,位相はモニタ15に表示
される画像を観察しながら制御するので、騒音等の位相
が複雑な外乱が入力した時に発生する振動も容易に補正
することができる。
According to the present invention, a small-sized piezoelectric actuator 9 having a resonance frequency sufficiently higher than the resonance frequency of the stage 8 and the mirror column 5 is provided between the stage 8 and the sample holder 7 and the sample holder 7 is mounted on the stage 8 or the sample holder 7. The relative position between the sample 6 and the scanning electron beam 2 is corrected by driving the mirror column 5 at the same frequency as the resonance frequency. Since the amplitude and phase of the drive signal at this time are controlled while observing the image displayed on the monitor 15, the vibration generated when a disturbance having a complicated phase such as noise is input can be easily corrected.

【0008】[0008]

【発明の実施の形態】本発明の実施例を図1の電子装置
を例に用いて説明する。図1で紙面の左右方向をX方
向,前後方向をY方向と定義している。電子銃1,偏向
器3,対物レンズ4等の電子光学系から構成される鏡体
カラム5は試料室10の上面に固定されている。電子銃
1で発生した電子線2は偏向器3によりX,Y方向に偏
向され、試料6表面を走査し、この時に発生する二次電
子12を二次電子検出器13で検出し、制御回路14に
よりモニタ15に試料6表面の走査画像を形成してい
る。ステージ8は試料室10の下面に固定され、内蔵さ
れている。試料6は試料ホルダ7に固定されている。更
に、試料ホルダ7は圧電アクチュエータ9を介してステ
ージ8に取り付けられている。ここで、ステージ8は試
料6を任意の位置に移動,回転,傾斜させる機能を有し
ている。更に、圧電アクチュエータ9は信号発生回路1
8,駆動電圧源19より構成される駆動制御回路17に
より駆動される。駆動制御回路17は試料6及び試料ホ
ルダ7をX,Y方向に任意の周波数,振幅,位相で振動
させる機能を有している。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described using the electronic device of FIG. 1 as an example. In FIG. 1, the left-right direction of the paper is defined as an X direction, and the front-rear direction is defined as a Y direction. A mirror column 5 composed of an electron optical system such as an electron gun 1, a deflector 3, and an objective lens 4 is fixed to an upper surface of a sample chamber 10. The electron beam 2 generated by the electron gun 1 is deflected in the X and Y directions by the deflector 3, scans the surface of the sample 6, detects secondary electrons 12 generated at this time by the secondary electron detector 13, and controls the control circuit. A scanning image of the surface of the sample 6 is formed on the monitor 15 by the monitor 14. The stage 8 is fixed to the lower surface of the sample chamber 10 and is built therein. The sample 6 is fixed to a sample holder 7. Further, the sample holder 7 is attached to a stage 8 via a piezoelectric actuator 9. Here, the stage 8 has a function of moving, rotating, and tilting the sample 6 to an arbitrary position. Further, the piezoelectric actuator 9 is connected to the signal generation circuit 1.
8, driven by a drive control circuit 17 composed of a drive voltage source 19. The drive control circuit 17 has a function of oscillating the sample 6 and the sample holder 7 at an arbitrary frequency, amplitude, and phase in the X and Y directions.

【0009】本発明では圧電アクチュエータ9に任意の
周波数成分を持った駆動信号を与え、試料6を振動させ
ることにより、モニタ15上の走査画像で発生している
振動を相殺している。ここで、駆動信号は駆動制御回路
17から出力される。ここで、駆動制御回路17の信号
発生回路では駆動信号の周波数,振幅,位相を任意に設
定することができる。ここで、駆動信号はモニタ15上
の走査画像の振動が最少になるように設定されるが、そ
の周波数はステージ8または鏡体カラムの共振周波数と
一致している。なお、本実施例で使用される圧電アクチ
ュエータはステージ8および鏡体カラム5の共振周波数
に対して十分高い共振周波数を持つものである。
In the present invention, a driving signal having an arbitrary frequency component is given to the piezoelectric actuator 9 to vibrate the sample 6, thereby canceling the vibration generated in the scanned image on the monitor 15. Here, the drive signal is output from the drive control circuit 17. Here, the signal generation circuit of the drive control circuit 17 can arbitrarily set the frequency, amplitude, and phase of the drive signal. Here, the drive signal is set so that the vibration of the scanned image on the monitor 15 is minimized, and its frequency matches the resonance frequency of the stage 8 or the mirror column. The piezoelectric actuator used in this embodiment has a resonance frequency sufficiently higher than the resonance frequency of the stage 8 and the mirror column 5.

【0010】本実施例では駆動信号の波形は任意に設定
することができるので、ステージ8の移動,傾斜等によ
り、ステージ8の共振周波数が変わり、画像振動の周波
数が変わる場合も対応することができる。また、騒音等
の位相が不安定な外乱が入力した時に発生する画像振動
も、駆動信号の位相を随時変化させることにより相殺す
ることができる。
In this embodiment, since the waveform of the drive signal can be set arbitrarily, it is possible to cope with the case where the resonance frequency of the stage 8 changes due to the movement or inclination of the stage 8 and the frequency of image vibration changes. it can. Further, image vibrations generated when a disturbance having an unstable phase such as noise is input can be canceled by changing the phase of the drive signal as needed.

【0011】[0011]

【発明の効果】本発明ではステージ8または鏡体カラム
5の共振振動を相殺するように試料を圧電アクチュエー
タにより振動させているので、モニタ上の走査画像には
振動が現れなくなる。
According to the present invention, since the sample is vibrated by the piezoelectric actuator so as to cancel the resonance vibration of the stage 8 or the mirror column 5, the vibration does not appear in the scanned image on the monitor.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例の説明図。FIG. 1 is an explanatory diagram of an embodiment of the present invention.

【図2】従来の電子顕微鏡の説明図。FIG. 2 is an explanatory view of a conventional electron microscope.

【符号の説明】[Explanation of symbols]

1…電子銃、2…走査電子線、3…偏向器、4…対物レ
ンズ、5…鏡体カラム、6…試料、7…試料ホルダ、8
…ステージ、9…圧電アクチュエータ、10…室、11
…ベースプレート、12…二次電子、13…二次電子検
出器、14…制御装置、15…モニタ、16…走査電流
源、17…駆動制御回路、18…信号発生回路、19…
駆動電圧源。
DESCRIPTION OF SYMBOLS 1 ... Electron gun, 2 ... Scanning electron beam, 3 ... Deflector, 4 ... Objective lens, 5 ... Mirror column, 6 ... Sample, 7 ... Sample holder, 8
... Stage, 9 ... Piezoelectric actuator, 10 ... Room, 11
... Base plate, 12 ... Secondary electron, 13 ... Secondary electron detector, 14 ... Control device, 15 ... Monitor, 16 ... Scan current source, 17 ... Drive control circuit, 18 ... Signal generation circuit, 19 ...
Drive voltage source.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】荷電粒子線を発生する荷電粒子源と、上記
荷電粒子線を試料上で走査させる偏向器と、上記荷電粒
子線を上記試料上で収束させる対物レンズの電子光学系
とから構成される鏡体カラムと、上記試料を固定する試
料ホルダ、上記試料を任意の位置に移動,回転,傾斜さ
せるステージ、上記ステージを内蔵した試料室、上記試
料上への上記荷電粒子線の照射により発生した二次荷電
粒子,透過荷電粒子、及び反射荷電粒子等を検出し、上
記検出信号をモニタで画像として観察する荷電粒子線顕
微鏡において、画像上に発生する振動を補正するよう
に、試料を駆動させる機能を有することを特徴とする荷
電粒子線顕微鏡。
1. A charged particle source for generating a charged particle beam, a deflector for scanning the charged particle beam on a sample, and an electron optical system of an objective lens for converging the charged particle beam on the sample. Mirror column, a sample holder for fixing the sample, a stage for moving, rotating, and tilting the sample to an arbitrary position, a sample chamber containing the stage, and irradiating the sample with the charged particle beam. In a charged particle beam microscope that detects generated secondary charged particles, transmitted charged particles, reflected charged particles, and the like, and observes the above detection signal as an image on a monitor, the sample is corrected so that vibrations generated on the image are corrected. A charged particle beam microscope having a function of driving.
【請求項2】請求項1に記載の上記試料ホルダを圧電ア
クチュエータを用いて周波数,振幅、および位相を制御
しながら駆動する荷電粒子線顕微鏡。
2. A charged particle beam microscope which drives the sample holder according to claim 1 while controlling frequency, amplitude and phase using a piezoelectric actuator.
JP10568797A 1997-04-23 1997-04-23 Charged particle beam microscope Pending JPH10302697A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10568797A JPH10302697A (en) 1997-04-23 1997-04-23 Charged particle beam microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10568797A JPH10302697A (en) 1997-04-23 1997-04-23 Charged particle beam microscope

Publications (1)

Publication Number Publication Date
JPH10302697A true JPH10302697A (en) 1998-11-13

Family

ID=14414324

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10568797A Pending JPH10302697A (en) 1997-04-23 1997-04-23 Charged particle beam microscope

Country Status (1)

Country Link
JP (1) JPH10302697A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003007328A1 (en) * 2001-07-13 2003-01-23 Nanofactory Instruments Ab Device for reducing the impact of distortions in a microscope
US7109484B2 (en) 2000-07-27 2006-09-19 Ebara Corporation Sheet beam-type inspection apparatus

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7109484B2 (en) 2000-07-27 2006-09-19 Ebara Corporation Sheet beam-type inspection apparatus
US7417236B2 (en) 2000-07-27 2008-08-26 Ebara Corporation Sheet beam-type testing apparatus
US7829871B2 (en) 2000-07-27 2010-11-09 Ebara Corporation Sheet beam-type testing apparatus
WO2003007328A1 (en) * 2001-07-13 2003-01-23 Nanofactory Instruments Ab Device for reducing the impact of distortions in a microscope
JP2005520281A (en) * 2001-07-13 2005-07-07 ナノファクトリー インストルメンツ アーベー Devices for reducing the effects of microscope distortion
US6924489B2 (en) 2001-07-13 2005-08-02 Nanofactory Instruments Ab Device for reducing the impact of distortions in a microscope

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