JPH10302648A - Glass substrate for plasma display - Google Patents

Glass substrate for plasma display

Info

Publication number
JPH10302648A
JPH10302648A JP9112288A JP11228897A JPH10302648A JP H10302648 A JPH10302648 A JP H10302648A JP 9112288 A JP9112288 A JP 9112288A JP 11228897 A JP11228897 A JP 11228897A JP H10302648 A JPH10302648 A JP H10302648A
Authority
JP
Japan
Prior art keywords
substrate
glass
glass substrate
electrode
plasma display
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP9112288A
Other languages
Japanese (ja)
Inventor
Takashi Maeda
敬 前田
Yasumasa Nakao
泰昌 中尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP9112288A priority Critical patent/JPH10302648A/en
Publication of JPH10302648A publication Critical patent/JPH10302648A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23Oxides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Glass Compositions (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Gas-Filled Discharge Tubes (AREA)

Abstract

PROBLEM TO BE SOLVED: To enhance the luminance or contrast of image display and minimize the yellowing of a substrate glass which is a problem on display by forming an insulating metal oxide film capable of preventing the dispersion of Ag ion to the substrate glass surface on the substrate glass. SOLUTION: Two parallel display electrodes of an X-electrode 5 and a Yn electrode 6 are formed on a glass substrate 10 for plasma display in a number of pairs, each of the display electrodes 5, 6 is formed of a transparent electrode 8 and a bus electrode (metal electrode) 9, and an ac voltage is applied between these parallel electrodes to perform a surface discharge. A dielectric layer 3 and a protecting layer 4 (MgO) are provided on the display electrodes 5, 6. The glass substrate 10 is formed of a front glass substrate 1 and an insulating metal oxide film 2, and the metal oxide film 2 is formed of at least one selected from the group consisting of SiO2 , ZrO2 , Al2 O3 and TiO2 . The yellowing of the substrate glass 1 by Ag ions generated according to surface discharge can be minimized.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、プラズマディスプ
レイ用のガラス基板に関する。
[0001] The present invention relates to a glass substrate for a plasma display.

【0002】[0002]

【従来の技術】従来、プラズマディスプレイ用のガラス
基板としては、1.5〜3.5mmの厚さの板状に成形
されたソーダライムシリケートガラス、もしくは、より
高歪点のガラスが用いられている。通常は、大量生産に
向き、平滑性に優れたフロート法によって基板ガラスは
成形される。
2. Description of the Related Art Conventionally, as a glass substrate for a plasma display, soda lime silicate glass formed into a plate having a thickness of 1.5 to 3.5 mm or glass having a higher strain point has been used. I have. Usually, the substrate glass is formed by a float method excellent in smoothness and suitable for mass production.

【0003】[0003]

【発明が解決しようとする課題】フロート法では、ガラ
ス表面は成形過程で水素雰囲気にさらされるため、ガラ
ス表面に数ミクロンの還元層が生成する。そのため、プ
ラズマディスプレイの製造工程において、基板ガラス表
面に透明電極を介して銀を電極として塗布、焼成する
と、銀イオンが透明電極を拡散で透過してガラス面に至
り還元層によって還元され、金属銀のコロイドを生成す
ることを本発明者等は知見した。この銀コロイドによっ
て、基板ガラスは黄色く着色し、画像表示の輝度やコン
トラストを向上する上で障害となる。また、パネル全体
が黄色く着色して見えるため、商品価値を下げるという
問題があることがわかった。
In the float method, since the glass surface is exposed to a hydrogen atmosphere during the molding process, a reduced layer of several microns is formed on the glass surface. Therefore, in the plasma display manufacturing process, when silver is applied as an electrode to the surface of the substrate glass via a transparent electrode and baked, silver ions pass through the transparent electrode by diffusion, reach the glass surface, are reduced by the reduction layer, and are reduced by metallic silver. The present inventors have found that a colloid is produced. The silver colloid causes the substrate glass to be colored yellow, which is an obstacle to improving brightness and contrast of image display. In addition, it has been found that there is a problem in that the entire panel appears to be colored yellow, which reduces the commercial value.

【0004】電極としての銀ペーストが基板ガラスを着
色してしまうという問題は、実公平6−34341号公
報に記載されるように、自動車のリヤウインドガラスに
設けられるデフロースター用の銀電極がガラス基板を着
色する現象では知られており、この対策として銀電極と
基板との間に塗布される着色セラミック層中に金属粉で
ある還元剤を入れ、銀ペースト中の銀がイオン化するの
を防止して銀が着色セラミック層中を拡散することを防
いでガラス基板の着色を防止する方法が知られている。
As described in Japanese Utility Model Publication No. 6-34341, the problem of silver paste as an electrode coloring the substrate glass is that a silver electrode for a deflow star provided on a rear window glass of an automobile is made of glass. It is known for the phenomenon of coloring the substrate. As a countermeasure, a reducing agent, which is a metal powder, is placed in a colored ceramic layer applied between the silver electrode and the substrate to prevent silver in the silver paste from being ionized. There is known a method of preventing silver from diffusing in a colored ceramic layer to prevent coloring of a glass substrate.

【0005】このような方法は高精度の平滑性が要求さ
れるプラズマディスプレイ用ガラス基板に用いるのは適
切でない。
[0005] Such a method is not suitable for use in a glass substrate for a plasma display, which requires high precision smoothness.

【0006】[0006]

【課題を解決するための手段】本発明者らは、上記の問
題点を研究し、ガラス表面にある種の金属酸化物を保護
膜として形成した基板を用いることにより、銀のコロイ
ドによる黄発色を著しく低減できることを見出し本発明
に至った。
Means for Solving the Problems The present inventors have studied the above-mentioned problems, and have found that by using a substrate in which a certain kind of metal oxide is formed as a protective film on the glass surface, a yellow color due to silver colloid is obtained. Have been found to be able to be significantly reduced, leading to the present invention.

【0007】すなわち本発明は、基板ガラス上に、Ag
+ イオンの基板ガラス表面への拡散を阻止しうる絶縁性
の金属酸化膜を有するプラズマディスプレイ用ガラス基
板を提供する。
That is, according to the present invention, Ag
Provided is a glass substrate for a plasma display having an insulating metal oxide film capable of preventing + ions from diffusing into a substrate glass surface.

【0008】基板ガラス上に、絶縁性の金属酸化膜を介
して銀を焼成してなる銀層を有し、基板表面の黄色度が
* で15以下であるプラズマディスプレイ用ガラス基
板を提供する。
The present invention provides a glass substrate for a plasma display having a silver layer formed by firing silver via an insulating metal oxide film on a substrate glass and having a yellowness b * of 15 or less on the substrate surface. .

【0009】ガラス基板上に銀を塗布し焼成する場合
に、基板表面の黄色度がb* で15以下とすることがで
きる絶縁性の金属酸化膜を有するプラズマディスプレイ
用ガラス基板を提供する。
Provided is a glass substrate for a plasma display having an insulating metal oxide film that can have a yellowness b * of 15 or less on the surface of a substrate when silver is applied and baked on the glass substrate.

【0010】ここで前記基板ガラスの組成が、 SiO2 50〜72重量% Al2 3 0〜15重量% R2 O 6〜24重量% R′O 6〜24重量% (ここでRは、Li,NaおよびKからなる群から選ば
れる少なくとも1つを表わし、R′はMg,Ca,S
r,BaおよびZnからなる群から選ばれる少なくとも
1つを表わす。)であるプラズマディスプレイ用ガラス
基板が好ましい。
[0010] the composition of wherein said substrate glass, SiO 2 50-72 wt% Al 2 O 3 0 to 15 wt% R 2 O 6 to 24 wt% R'O 6 to 24 wt% (wherein R is R ′ represents at least one selected from the group consisting of Li, Na and K, and R ′ is Mg, Ca, S
represents at least one selected from the group consisting of r, Ba and Zn. )) Is preferred.

【0011】前記絶縁性の金属酸化膜が、SiO2 ,Z
rO2 ,Al2 3 およびTiO2からなる群から選択
される少なくとも1つであるプラズマディスプレイ用ガ
ラス基板が好ましい。
The insulating metal oxide film is made of SiO 2 , Z
A glass substrate for a plasma display which is at least one selected from the group consisting of rO 2 , Al 2 O 3 and TiO 2 is preferred.

【0012】[0012]

【発明の実施の形態】以下に本発明を図面に示す好適実
施例により説明するが、本発明はこれらに限定されるも
のではない。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to preferred embodiments shown in the drawings, but the present invention is not limited to these embodiments.

【0013】カラープラズマディスプレイのパネルは、
図1に示される表示面側のガラス基板10と、図示して
いないが、これに対向する背面側のガラス基板とがあ
る。図示される表示面側のガラス基板上にはX電極5、
Yn電極6の2本の平行する表示電極が多数対形成され
ている。各表示電極は透明電極8とバス電極(金属電
極)9から構成されている。この平行電極間に交流電圧
を印加して面放電を行う。表示電極の上には誘電体層3
と保護層(MgO)4が設けられる。一方図示していな
いが、これに対向する背面側のガラス基板上には表示電
極と直交する方向にアドレス電極を構成し、電極近傍に
設けられた赤(R)緑(G)青(B)の蛍光体を一画素
として発色させる。これらのプラズマディスプレイに用
いられる電極は銀ペースト等の銀を主体とする電極が用
いられる。図1に示される本発明のガラス基板10は、
前面ガラス基板1と絶縁性の金属酸化膜2とで構成され
ている。
The panel of the color plasma display is
There is a glass substrate 10 on the display surface side shown in FIG. 1 and a glass substrate on the back side (not shown) opposed to this. An X electrode 5 is provided on the glass substrate on the display surface side shown in the drawing.
Many pairs of two parallel display electrodes of the Yn electrode 6 are formed. Each display electrode includes a transparent electrode 8 and a bus electrode (metal electrode) 9. An AC voltage is applied between the parallel electrodes to perform surface discharge. Dielectric layer 3 on display electrode
And a protective layer (MgO) 4. On the other hand, although not shown, address electrodes are formed on the glass substrate on the rear side opposite thereto, in the direction orthogonal to the display electrodes, and red (R) green (G) blue (B) provided near the electrodes Is colored as one pixel. As the electrodes used in these plasma displays, electrodes mainly composed of silver such as silver paste are used. The glass substrate 10 of the present invention shown in FIG.
It comprises a front glass substrate 1 and an insulating metal oxide film 2.

【0014】本発明のプラズマディスプレイ用ガラス基
板は、上記の構成で説明されるパネル構造に限定される
ものではなく、銀ペーストをその表面で焼成するもので
あれば良い。銀ペーストは図1に示すように、透明電極
を介して基板上に形成されていてもよく、また、直接基
板上に形成されていても良い。また図1に示される透明
電極を有する表示面側のガラス基板のみならず、図示さ
れない背面板用のガラス基板であってもよい。
The glass substrate for a plasma display of the present invention is not limited to the panel structure described in the above configuration, but may be any as long as a silver paste is fired on its surface. The silver paste may be formed on the substrate via a transparent electrode as shown in FIG. 1, or may be formed directly on the substrate. Further, not only the glass substrate on the display surface side having the transparent electrode shown in FIG. 1 but also a glass substrate for a back plate (not shown) may be used.

【0015】基板ガラスの母組成については、重量%表
示で実質的にSiO2 50〜72、Al2 3
0〜15、R2 O 6〜24、R′O 6
〜24、(ここでRは、Li,NaおよびKからなる群
から選ばれる少なくとも1つを表わし、R′はMg,C
a,Sr,BaおよびZnからなる群から選ばれる少な
くとも1つを表わす。)であることが好ましい。
With respect to the base composition of the substrate glass, SiO 2 50 to 72, Al 2 O 3
0~15, R 2 O 6~24, R'O 6
To 24, wherein R represents at least one selected from the group consisting of Li, Na and K, and R ′ is Mg, C
represents at least one selected from the group consisting of a, Sr, Ba and Zn. ) Is preferable.

【0016】この組成範囲で、歪点が550℃以上であ
り、0〜300℃での熱膨張係数が70×10-7〜90
×10-7/℃となるような基板ガラスが得られる。歪点
が550℃以上のガラス基板は、プラズマディスプレイ
用基板を製造する際の焼成工程で、不規則な熱変形や大
きな熱収縮を生じにくいため好ましい。また、0〜30
0℃での熱膨張係数が70×10-7〜90×10-7/℃
となるような基板ガラスは、プラズマディスプレイパネ
ルの部材として通常用いられるガラスフリットと熱膨張
係数が整合しているため、プラズマディスプレイパネル
を製造する際に変形などの不具合を生じにくいので好ま
しい。
In this composition range, the strain point is 550 ° C. or higher, and the coefficient of thermal expansion at 0 to 300 ° C. is 70 × 10 -7 to 90.
A substrate glass having a density of 10-7 / C is obtained. A glass substrate having a strain point of 550 ° C. or higher is preferable because irregular thermal deformation and large thermal shrinkage hardly occur in a firing step in manufacturing a plasma display substrate. Also, 0-30
The coefficient of thermal expansion at 0 ° C. is 70 × 10 −7 to 90 × 10 −7 / ° C.
Such a substrate glass is preferable because it has a coefficient of thermal expansion that matches that of a glass frit that is generally used as a member of a plasma display panel, and thus does not easily cause problems such as deformation when manufacturing the plasma display panel.

【0017】前面ガラス基板1は通常フロート法で還元
雰囲気中で成形される。前面ガラス基板1上に設けられ
る絶縁性の金属酸化膜2は、本発明のプラズマディスプ
レイ用ガラス基板10において、Ag+ イオンが前面ガ
ラス基板1表面へ拡散されるのを防ぐためのもので、例
えば銀ペーストを銀電極として塗布し、580℃で焼成
した場合に前面ガラス基板1との間に絶縁性の金属酸化
膜2があるので、Ag+ イオンの前面ガラス基板への拡
散が制限されるため、金属銀AgOがガラス表面に生成
し、コロイドとなりガラス基板が黄色く発色するのを防
止することができる。
The front glass substrate 1 is usually formed by a float method in a reducing atmosphere. The insulating metal oxide film 2 provided on the front glass substrate 1 is for preventing Ag + ions from diffusing to the surface of the front glass substrate 1 in the glass substrate 10 for a plasma display of the present invention. When a silver paste is applied as a silver electrode and baked at 580 ° C., the diffusion of Ag + ions into the front glass substrate is restricted because the insulating metal oxide film 2 is present between the silver paste and the front glass substrate 1. In addition, it is possible to prevent metallic silver AgO from being formed on the glass surface and becoming a colloid, whereby the glass substrate is colored yellow.

【0018】Ag+ イオンの前面ガラス基板1表面への
拡散を阻止しうる程度は、例えば、絶縁性の金属酸化膜
2の表面に銀を塗布し、580℃で1時間焼成した場合
の色調変化が黄色度b* で15以下であるとして規定さ
れることができる。
The extent to which the diffusion of Ag + ions into the surface of the front glass substrate 1 can be prevented, for example, by changing the color tone when silver is applied to the surface of the insulating metal oxide film 2 and baked at 580 ° C. for 1 hour. Is less than or equal to 15 in yellowness b * .

【0019】金属酸化膜としては、SiO2 ,Zr
2 ,Al2 3 ,TiO2 等が例示され、これらは単
独でも混合物であってもよい。膜厚は特に限定されない
が、厚いほど銀イオンの基板への拡散防止効果が高ま
る。プラズマディスプレイ用の表示面側のガラス基板1
0は透明性を要求されるため10Å〜100μmさらに
は100〜2000Å程度が好ましい。
As the metal oxide film, SiO 2 , Zr
O 2 , Al 2 O 3 , TiO 2 and the like are exemplified, and these may be used alone or as a mixture. Although the film thickness is not particularly limited, the effect of preventing silver ions from diffusing into the substrate increases as the film thickness increases. Glass substrate 1 on the display surface side for plasma display
Since 0 is required to have transparency, it is preferably about 10 to 100 μm, and more preferably about 100 to 2000 °.

【0020】本発明のプラズマディスプレイ用ガラス基
板10の製造方法は、フロート法等で製造された前面ガ
ラス基板1上に、例えば、スパッター法、CVD法、デ
ィップ法、蒸着法等の公知の方法で絶縁性の金属酸化膜
2を形成する。絶縁性の金属酸化膜2は前面ガラス基板
1の表面上に直接形成してもよいし、必要により他の膜
又は層を介して形成してもよい。プラズマディスプレイ
用ガラス基板10としてこの絶縁性の金属酸化膜2上に
直接又は誘電体層等の他の膜又は層を介して存在する銀
がAg+ イオンとして前面ガラス基板1表面へ拡散され
るのが防げるよう銀層と前面ガラス基板1との間に存在
すればよい。
The method of manufacturing the glass substrate 10 for a plasma display according to the present invention is performed on the front glass substrate 1 manufactured by a float method or the like by, for example, a known method such as a sputtering method, a CVD method, a dip method, or a vapor deposition method. An insulating metal oxide film 2 is formed. The insulating metal oxide film 2 may be formed directly on the surface of the front glass substrate 1, or may be formed via another film or layer if necessary. Silver present as the plasma display glass substrate 10 directly on the insulating metal oxide film 2 or through another film or layer such as a dielectric layer is diffused as Ag + ions to the surface of the front glass substrate 1. May be present between the silver layer and the front glass substrate 1 so as to prevent the occurrence of blemishes.

【0021】例えば前面ガラス基板1をアルコールを主
体とする溶剤に水酸化シリコン、水酸化シリコンと水酸
化アルミニウム又は塩化チタンを希釈した溶液中に浸漬
し、引き上げた後焼成して酸化ケイ素膜、酸化ケイ素と
酸化アルミニウムとの混合膜または酸化チタン膜を形成
する。又は、1×10-5torr以下の圧力で二酸化ケ
イ素を蒸着源とし電子ビーム蒸着を行ない酸化ケイ素膜
を形成する。
For example, the front glass substrate 1 is immersed in a solution obtained by diluting silicon hydroxide, silicon hydroxide and aluminum hydroxide or titanium chloride in a solvent mainly composed of alcohol, pulled up, and fired to form a silicon oxide film, A mixed film of silicon and aluminum oxide or a titanium oxide film is formed. Alternatively, a silicon oxide film is formed by performing electron beam evaporation using silicon dioxide as an evaporation source at a pressure of 1 × 10 −5 torr or less.

【0022】バス電極9である銀層の形成は、特に限定
されないが、銀粉末70〜80wt%フリット(低融点
鉛ガラス)3〜5wt%、オイルと樹脂を混合したビー
クル27〜15wt%等の組成の銀ペーストを所定の形
状に塗布し、これを乾燥した後、所定温度、例えば50
0〜600℃で焼成することで透明電極8上にバス電極
9を形成する。透明電極8は通常ITOやSnO2 でス
パッタ法、CVD法、真空蒸着法、パイロゾル法、ゾル
ゲル法などにより厚さ400〜5000Åに形成され
る。
The formation of the silver layer serving as the bus electrode 9 is not particularly limited, but may be, for example, 70 to 80 wt% of silver powder, 3 to 5 wt% of frit (low melting point lead glass), or 27 to 15 wt% of a vehicle in which oil and resin are mixed. A silver paste having a composition is applied in a predetermined shape, dried, and then dried at a predetermined temperature, for example, 50 ° C.
By baking at 0 to 600 ° C., the bus electrode 9 is formed on the transparent electrode 8. The transparent electrode 8 is usually formed of ITO or SnO 2 to a thickness of 400 to 5000 ° by a sputtering method, a CVD method, a vacuum evaporation method, a pyrosol method, a sol-gel method, or the like.

【0023】[0023]

【実施例】以下に実施例により本発明を説明するが、本
発明はこれらの実施例に限定されるものではない。フロ
ート法で成形されたソーダライムシリケートガラスおよ
びPDP用ガラス基板表面にCVD法、スパッタ法およ
びディップ法によってSiO2 膜を形成した。その後、
ガラス表面の膜の上にスパッタ法で形成した2000Å
厚のITOからなる透明電極を介して銀ペースト(ノリ
タケ社製、NP4002)を印刷し、580℃で1時間
焼成した。印刷面の反対面から観察したガラス表面の色
調を市販の測色計によって測定した。ディップ法による
SiO2 膜はシリコンアルコキサイド水溶液に基板ガラ
スを浸漬、一定の速度で引き上げた後、400℃で焼成
することにより形成した。結果を表1に示した。
EXAMPLES The present invention will be described below with reference to examples, but the present invention is not limited to these examples. An SiO 2 film was formed on the surface of the soda lime silicate glass and the glass substrate for PDP formed by the float method by the CVD method, the sputtering method, and the dipping method. afterwards,
2000Å formed by sputtering on the film on the glass surface
A silver paste (NP4002, manufactured by Noritake Co., Ltd.) was printed through a transparent electrode made of thick ITO, and baked at 580 ° C. for 1 hour. The color tone of the glass surface observed from the opposite side of the printing surface was measured by a commercially available colorimeter. The SiO 2 film formed by the dipping method was formed by immersing the substrate glass in an aqueous solution of silicon alkoxide, pulling it up at a constant speed, and baking it at 400 ° C. The results are shown in Table 1.

【0024】表1の実施例1〜5には、ガラス基板の組
成、保護膜の形成方法、保護膜の厚みおよびコロイドに
よる基板表面の色調を示す。表1中の母ガラス組成は、
表2に示す通りである。基板表面の色調は、C光源によ
るL* * * 表色系で表している。表1の例6および
7は比較例であり、ガラス基板に何も膜を付けずに同様
の測定を行った結果を示している。これにより、本発明
の実施例1〜5では銀コロイド発色が抑えられ、比較例
6および7に比較して黄色度を表すb* が小さくなって
いることがわかる。
Examples 1 to 5 in Table 1 show the composition of the glass substrate, the method of forming the protective film, the thickness of the protective film, and the color tone of the substrate surface due to the colloid. The mother glass composition in Table 1 is
It is as shown in Table 2. The color tone of the substrate surface is represented by an L * a * b * color system using a C light source. Examples 6 and 7 in Table 1 are comparative examples, and show the results of performing similar measurements without attaching any film to the glass substrate. Thus, it can be seen that in Examples 1 to 5 of the present invention, silver colloid color development was suppressed, and b * representing the degree of yellowness was smaller than in Comparative Examples 6 and 7.

【0025】[0025]

【表1】 [Table 1]

【0026】 [0026]

【0027】[0027]

【発明の効果】本発明によれば、画素表示の輝度やコン
トラストが高くとれ、表示上で問題となる黄色の少ない
プラズマディスプレイ用ガラス基板が得られる。
According to the present invention, it is possible to obtain a glass substrate for a plasma display which has high brightness and contrast of pixel display and has a small yellow color which causes a problem in display.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明のプラズマディスプレイ用ガラス基板
の断面図である。
FIG. 1 is a sectional view of a glass substrate for a plasma display of the present invention.

【符号の説明】[Explanation of symbols]

1 前面ガラス基板 2 絶縁性の金属酸化膜 3 誘電体層 4 保護層 5 X電極 6 Yn電極 8 透明電極 9 バス電極(金属電極) 10 プラズマディスプレイ用ガラス基板 DESCRIPTION OF SYMBOLS 1 Front glass substrate 2 Insulating metal oxide film 3 Dielectric layer 4 Protective layer 5 X electrode 6 Yn electrode 8 Transparent electrode 9 Bus electrode (metal electrode) 10 Glass substrate for plasma display

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI H01J 17/16 H01J 17/16 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 6 Identification code FI H01J 17/16 H01J 17/16

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】基板ガラス上に、Ag+ イオンの基板ガラ
ス表面への拡散を阻止しうる絶縁性の金属酸化膜を有す
るプラズマディスプレイ用ガラス基板。
1. A glass substrate for a plasma display having an insulating metal oxide film on a substrate glass capable of preventing diffusion of Ag + ions to the surface of the substrate glass.
【請求項2】前記基板ガラスの組成が、 SiO2 50〜72重量% Al2 3 0〜15重量% R2 O 6〜24重量% R′O 6〜24重量% (ここでRは、Li,NaおよびKからなる群から選ば
れる少なくとも1つを表わし、R′はMg,Ca,S
r,BaおよびZnからなる群から選ばれる少なくとも
1つを表わす。)である請求項1記載のプラズマディス
プレイ用ガラス基板。
Wherein the composition of the substrate glass, SiO 2 50-72 wt% Al 2 O 3 0 to 15 wt% R 2 O 6 to 24 wt% R'O 6 to 24 wt% (wherein R is R ′ represents at least one selected from the group consisting of Li, Na and K, and R ′ is Mg, Ca, S
represents at least one selected from the group consisting of r, Ba and Zn. The glass substrate for a plasma display according to claim 1, wherein
【請求項3】前記絶縁性の金属酸化膜が、SiO2 ,Z
rO2 ,Al2 3 およびTiO2からなる群から選択
される少なくとも1つである請求項1または2記載のプ
ラズマディスプレイ用ガラス基板。
3. The insulating metal oxide film is made of SiO 2 , Z
The glass substrate for a plasma display according to claim 1, wherein the glass substrate is at least one selected from the group consisting of rO 2 , Al 2 O 3, and TiO 2 .
JP9112288A 1997-04-30 1997-04-30 Glass substrate for plasma display Withdrawn JPH10302648A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9112288A JPH10302648A (en) 1997-04-30 1997-04-30 Glass substrate for plasma display

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9112288A JPH10302648A (en) 1997-04-30 1997-04-30 Glass substrate for plasma display

Publications (1)

Publication Number Publication Date
JPH10302648A true JPH10302648A (en) 1998-11-13

Family

ID=14582948

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9112288A Withdrawn JPH10302648A (en) 1997-04-30 1997-04-30 Glass substrate for plasma display

Country Status (1)

Country Link
JP (1) JPH10302648A (en)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000026937A1 (en) * 1998-10-29 2000-05-11 Mitsubishi Denki Kabushiki Kaisha Ac plane discharge plasma display panel
JP2001202890A (en) * 2000-01-18 2001-07-27 Nec Corp Plasma display panel and method of manufacturing the same
KR20010095198A (en) * 2000-03-31 2001-11-03 마츠시타 덴끼 산교 가부시키가이샤 Display panel and manufacturing method of the same
NL1017143C2 (en) 2000-01-19 2002-04-23 Nippon Sheet Glass Co Ltd Glass object and glass substrate for a picture plate.
WO2004110693A1 (en) * 2003-06-12 2004-12-23 Nippon Sheet Glass Co., Ltd. Laser beam machining method and laser beam machining device
FR2866644A1 (en) * 2004-02-19 2005-08-26 Saint Gobain Glass plate with a metal deposit, resistant to coloration due to a metallic specie, for use as an electronic substrate notably for screen applications
CN1311501C (en) * 2003-10-21 2007-04-18 三星Sdi株式会社 Plasma display panel
USRE40104E1 (en) 1997-03-31 2008-02-26 Mitsubishi Denki Kabushiki Kaisha Plasma display panel with bus electrodes having black electroconductive material
KR100822201B1 (en) 2006-04-03 2008-04-17 삼성에스디아이 주식회사 Plasma display panel
US7471042B2 (en) 2001-02-06 2008-12-30 Panasonic Corporation Plasma display panel with an improved electrode
KR100895927B1 (en) * 2006-02-10 2009-05-07 히다찌 플라즈마 디스플레이 가부시키가이샤 Flat panel display and display panel apparatus having the same
JP2014080655A (en) * 2012-10-16 2014-05-08 Ulvac Japan Ltd Film deposition apparatus

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE40104E1 (en) 1997-03-31 2008-02-26 Mitsubishi Denki Kabushiki Kaisha Plasma display panel with bus electrodes having black electroconductive material
US6472821B1 (en) 1998-10-29 2002-10-29 Mitsubishi Denki Kabushiki Kaisha AC plane discharge type plasma display panel
WO2000026937A1 (en) * 1998-10-29 2000-05-11 Mitsubishi Denki Kabushiki Kaisha Ac plane discharge plasma display panel
JP2001202890A (en) * 2000-01-18 2001-07-27 Nec Corp Plasma display panel and method of manufacturing the same
NL1017143C2 (en) 2000-01-19 2002-04-23 Nippon Sheet Glass Co Ltd Glass object and glass substrate for a picture plate.
KR20010095198A (en) * 2000-03-31 2001-11-03 마츠시타 덴끼 산교 가부시키가이샤 Display panel and manufacturing method of the same
US7471042B2 (en) 2001-02-06 2008-12-30 Panasonic Corporation Plasma display panel with an improved electrode
KR100909735B1 (en) 2001-02-06 2009-07-29 파나소닉 주식회사 Plasma Display Panel And Method Of Manufacturing The Same
WO2004110693A1 (en) * 2003-06-12 2004-12-23 Nippon Sheet Glass Co., Ltd. Laser beam machining method and laser beam machining device
CN1311501C (en) * 2003-10-21 2007-04-18 三星Sdi株式会社 Plasma display panel
WO2005080278A2 (en) * 2004-02-19 2005-09-01 Saint-Gobain Glass France Sheet of glass for application of a metallic deposit and resistant to a coloration possibly induced by such a deposit
WO2005080278A3 (en) * 2004-02-19 2007-03-08 Saint Gobain Sheet of glass for application of a metallic deposit and resistant to a coloration possibly induced by such a deposit
FR2866644A1 (en) * 2004-02-19 2005-08-26 Saint Gobain Glass plate with a metal deposit, resistant to coloration due to a metallic specie, for use as an electronic substrate notably for screen applications
KR100895927B1 (en) * 2006-02-10 2009-05-07 히다찌 플라즈마 디스플레이 가부시키가이샤 Flat panel display and display panel apparatus having the same
KR100822201B1 (en) 2006-04-03 2008-04-17 삼성에스디아이 주식회사 Plasma display panel
JP2014080655A (en) * 2012-10-16 2014-05-08 Ulvac Japan Ltd Film deposition apparatus

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