JPH10302628A - Exposing device for color cathode-ray tube - Google Patents

Abstract

PROBLEM TO BE SOLVED: To enhance the quality of a light absorbing film to provide a high- quality color cathode-ray tube by providing an optical system of an exposing device with a member attenuating wavelengths shorter than the wavelength range of a photosensitive resist which shows the maximum sensitivity. SOLUTION: A member having an absorption rate whereby a wavelength frame shorter than the maximum sensitivity wavelength range of a photosensitive resist is attenuated, e.g. soda lime glass 11 or colored glass 12, is mounted on a dimming filter in the optical system of an exposing device during formation of a light absorbing film, so that the pattern of the light absorbing film is edged more sharply. Hence a high-quality color cathode-ray tube can be obtained.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure apparatus for a color cathode ray tube, and more particularly, to obtaining a high quality color cathode ray tube by reducing a wavelength range shorter than a maximum sensitivity wavelength range of a photosensitive resist in an exposure table optical system. To an exposure apparatus that can

[0002]

2. Description of the Related Art To form a color cathode ray tube, a photosensitive resist is applied to an inner surface of a face panel of a washed panel to form a photoresist film. Next, after exposing to a desired shape through a pattern such as a shadow mask, and developing with hot water spray or the like, a dot-shaped or stripe-shaped temporary pattern is formed. Next, a light absorbing material such as graphite is uniformly applied to the inner surface of the face plate of the panel and then dried. After that, when the stripping process is performed using an oxidizing agent such as aqueous hydrogen peroxide, the photoresist film previously fixed as a temporary pattern dissolves and swells. The light-absorbing film that has been applied is removed together with the light-absorbing film to form a pattern, that is, a black stripe or a black matrix. Next, when the three primary color phosphor layers are formed between the patterns of the light absorbing film formed by the above-described steps, a phosphor screen is formed. However, the pattern of the light absorbing film is not uniform, If the cut is poor, the phosphor layer becomes uneven and the quality of the color cathode ray tube is remarkably deteriorated.

Exposure for forming the black matrix or black stripe is performed by an exposure apparatus shown in FIG. First, after a shadow mask 3 is mounted on the face panel 2 on which the photosensitive resist film 1 is formed at a predetermined distance from the inner surface of the face panel 2, an exposure including a light source 4, an optical correction lens 5, and a light control filter 6 is performed. Attach to equipment. Light source 4 installed in lamp house 7
The light that has passed through the cover glass 8 has its ray trajectory corrected to the actual electron beam trajectory by the optical correction lens 5, and the illuminance distribution on the inner surface of the face panel 2 is adjusted by the light control filter 6, and then the shadow is adjusted. The photosensitive resist film 1 is exposed through openings in the mask 3. The light source 4
In general, an ultra-high pressure mercury lamp is used, and exposure is performed with ultraviolet light.

[0004]

In this type of conventional exposure apparatus, the spectral wavelength of light to be exposed is determined by the type of exposure light source as shown in FIG. Shown is the spectrum 9 of the extra-high pressure mercury lamp. On the other hand, it is known that the absorption wavelength of the photosensitive resist differs depending on the type of long wave, and FIG. The wavelength intensity of the light source used at the time of this exposure is hardly a problem in a normal color cathode ray tube, but the reason is not clear in a higher definition color cathode ray tube. The quality of the color cathode ray tube deteriorates because the phosphor layer becomes uneven and the quality of the color cathode ray tube deteriorates.

[0005]

SUMMARY OF THE INVENTION The present invention has been proposed for the purpose of solving the above-mentioned problems, and is a member for attenuating light having a wavelength shorter than a wavelength region showing a maximum sensitivity of a light absorption characteristic of a photosensitive resist. Is applied to the light control filter of the optical system.

According to the above arrangement, the optical system has a spectral filter for attenuating light having a wavelength shorter than the wavelength region of the photosensitive resist exhibiting the maximum sensitivity, so that the end of the pattern of the light absorbing film is improved. It was found that a high quality color cathode ray tube having no unevenness in the phosphor layer can be obtained.

FIG. 2 shows the configuration of an exposure apparatus used in the present invention. A lamp house 7 equipped with a light source 4 having an emission spectrum from the ultraviolet region to the visible region, an optical correction lens 5 for correcting an optical path emitted from the light source disposed on the light source, and a central portion and a periphery of the optical correction lens In the present embodiment, the adjusting filter 13 is made of soda lime glass 11 having an absorptance shown in FIG. Using a colored glass 12 such as that described above, the intensity of light having a wavelength shorter than the wavelength region of the photosensitive resist exhibiting the maximum sensitivity can be halved to obtain a high-quality light absorbing film.

Optically, in order to attenuate wavelengths shorter than the wavelength range of the photosensitive resist having the maximum sensitivity, not only the dimming filter 13 but also the optical system of the exposure apparatus, for example,
Cover glass 14 of lamp house 7 and optical correction lens 1
The wavelength can be attenuated by the material No. 5, and a similar effect can be obtained by adding a member for attenuating the wavelength anywhere in the optical system of the exposure apparatus.

[0009]

As described above, the present invention improves the quality of the light absorbing film by providing the optical system of the exposure apparatus with a member that attenuates a wavelength shorter than the wavelength region of the photosensitive resist that exhibits the maximum sensitivity. Thus, a high-quality color cathode ray tube can be obtained.

[Brief description of the drawings]

FIG. 1 shows the spectral absorption characteristics of soda lime glass and colored glass used as a light control filter for exposure of the present invention.

FIG. 2 is a configuration diagram of a general exposure apparatus.

FIG. 3 Spectral spectrum characteristics of a mercury lamp used as an exposure light source

FIG. 4 shows light absorption characteristics of a photosensitive resist used for forming a light absorption film of a color cathode ray tube.

[Explanation of symbols]

 REFERENCE SIGNS LIST 1 photosensitive resist film 2 panel 3 shadow mask 4 light source 7 lamp house 9 spectral spectrum of mercury lamp 10 light absorption spectrum of photosensitive resist 11 spectral absorption rate of soda lime glass 12 spectral absorption rate of colored glass 13 light control filter 14 cover glass 15 optical Correction lens

Claims (5)

[Claims] A light source having an emission spectrum ranging from an ultraviolet region to a visible region; an optical correction lens for correcting an optical path emitted from the light source disposed on the light source; and a central portion and a peripheral portion of the optical correction lens. Having a light control filter to adjust the intensity of the light, a photosensitive resist film is formed on the inner surface,
In an exposure apparatus in which a shadow mask formed with a large number of light transmission holes forms a predetermined pattern on a panel assembled in opposition to the photosensitive resist film, the dimming filter controls light passing through an optical correction lens. An exposure apparatus, wherein a light absorption pattern is formed by attenuating light having a wavelength shorter than a wavelength region exhibiting a maximum sensitivity of a light absorption characteristic of a photosensitive resist that forms a light transmission pattern on a panel. 2. An exposure apparatus according to claim 1, wherein said light control filter is an ultraviolet cut filter for reducing light intensity by half at a maximum light absorption wavelength of a photosensitive resist. 3. An exposure apparatus according to claim 2, wherein said ultraviolet cut filter is made of soda lime glass. 4. An exposure apparatus according to claim 2, wherein said ultraviolet cut filter is made of colored glass. 5. A member for attenuating light having a wavelength shorter than the wavelength region of the photosensitive resist having the maximum sensitivity of the light absorption characteristic of the photosensitive resist, instead of the dimming filter according to claim 1. An exposure apparatus, wherein the exposure apparatus is provided.