JPH10293396A - Image forming material and image forming method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an image forming material and an image forming method by which infrared sensitivity is improved and greasing in printing is prevented and heat treatment after an exposure can be shortened. SOLUTION: This material has on a support body a compound capable of generating an acid by irradiation of an active beam of light, an infrared ray absorbent and a photosensitive layer containing either of the following (1) to (8). (1) a silanol compound, (2) a compound containing a carboxylic acid or its derivative and a compound having a hydoxyl group, (3) a compound having a cation polymerizing double bond, (4) secondary or tertiary alcohol having an aromatic group, (5) an alkali soluble polymer having in a molecule an aromatic ring having a methylol group, an alkoxymethyl group or an acetoxymethyl group, (6) aminoplast, (7) a benzoic acid derivative and (8) alicyclic or heterocyclic alcohol. In this image forming method, an image is plotted on the photosensitive layer of the image forming material by using infrared rays, and after heating treatment is performed, an unexposed part is removed by an alkaline developer.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention comprises a compound capable of forming an image by exposure to infrared light, capable of forming an acid upon irradiation with actinic light, a compound capable of being insolubilized in a developer in the presence of an acid, and an infrared absorber The present invention relates to an image forming material having a negative photosensitive layer and an image forming method using the same.

[0002]

2. Description of the Related Art As an image forming material having an infrared-sensitive negative photosensitive layer, US Pat. No. 5,340,699 discloses an acid generator, a resole resin (crosslinking agent), a novolak resin and an infrared ray. Having a photosensitive layer containing an absorbent,
There is disclosed a technique in which a heat treatment is performed after image exposure and before a development treatment to be used as a negative image forming material, and if the heat treatment is not performed, it is used as a positive image forming material.

However, the image type material has a problem in that the sensitivity to infrared rays is not sufficient, and it takes time to perform image exposure (drawing) with a semiconductor laser or the like. In addition, there is also a problem with the developability that a dye remains on the support and background stains occur during printing. In addition, there is a problem that the heat treatment after image exposure requires a relatively long time.

[0004]

SUMMARY OF THE INVENTION The object of the present invention is as follows.
To provide an image forming material and an image forming method with improved sensitivity; secondly, to provide an image forming material and an image forming method in which background contamination in printing is prevented; and thirdly, after exposure. An object of the present invention is to provide an image forming material and an image forming method capable of shortening the heat treatment of the present invention.

[0005]

The present invention which achieves the above object of the present invention is the following (1) to (9).

(1) An image-forming material comprising a support having thereon a photosensitive layer containing a compound capable of generating an acid upon irradiation with actinic rays, an infrared absorber and a silanol compound.

(2) A support having a photosensitive layer containing a compound capable of generating an acid upon irradiation with actinic rays, an infrared absorber, a compound containing a carboxylic acid or a derivative thereof, and a compound having a hydroxyl group, on a support. Characteristic image forming material.

(3) An image comprising a support having thereon a photosensitive layer containing a compound capable of generating an acid upon irradiation with actinic rays, an infrared absorber and a compound having a cationically polymerizable double bond. Forming material.

(4) On a support, there is provided a photosensitive layer containing a compound capable of generating an acid upon irradiation with actinic rays, an infrared absorber, and a secondary or tertiary alcohol having an aromatic group. Image forming materials.

(5) On a support, a compound capable of generating an acid upon irradiation with an actinic ray, an infrared absorber and an alkali-soluble polymer having an aromatic ring having a methylol group, an alkoxymethyl group or an acetoxymethyl group in a molecule are provided. An image forming material having a photosensitive layer containing the same.

(6) An image-forming material comprising a support having thereon a photosensitive layer containing a compound capable of generating an acid upon irradiation with actinic rays, an infrared absorber and an aminoplast.

(7) On a support, there is provided a photosensitive layer containing a compound capable of generating an acid upon irradiation with actinic rays, an infrared absorber and a compound represented by the following general formula (A). Image forming materials.

[0013]

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Wherein R represents a hydrogen atom, an alkyl group having 3 or less carbon atoms, an aryl group or a tolyl group, and R ₁ , R ₂ ,
R ₃ and R ₄ each represent a hydrogen atom, an alkyl group having 3 or less carbon atoms, or an alkoxy group having 3 or less carbon atoms. (8) A compound capable of generating an acid upon irradiation with actinic rays, an infrared absorber, an alicyclic alcohol and / or
Or an image forming material having a photosensitive layer containing a heterocyclic alcohol.

(9) An image is drawn on the photosensitive layer of the image-forming material according to any one of the above (1) to (8) by using infrared rays, heated, and then exposed with an alkaline developing solution. An image forming method, comprising:

Hereinafter, the present invention will be described in detail.

In the invention according to claims 1 to 9, as the compound capable of generating an acid upon irradiation with actinic rays (hereinafter referred to as "photoacid generator"), known compounds and mixtures can be used. For example, diazonium, phosphonium,
BF ₄ ⁻ , P of sulfonium and iodonium respectively
Salts such as F ₆ ⁻ , SbF ₆ ⁻ , SiF ₆ ²⁻ , and ClO ₄ ⁻ , organic halogen compounds, orthoquinone-diazidosulfonyl chloride, and organometallic / organohalogen compounds also form an acid upon irradiation with actinic light or It is an actinic ray-sensitive component that can be separated and can be used as a photoacid generator in the present invention. In principle, all organic halogen compounds which are known as free-radical-forming photoinitiators are compounds which form hydrohalic acid and can be used as photoacid generators in the image-forming materials according to the invention.

Examples of the compounds forming the above-mentioned hydrohalic acid include US Pat. Nos. 3,515,552, 3,536,489 and 3,779,778, and West German Patent Publication. Compounds described in JP-A-2,243,621 can be mentioned, and for example, compounds capable of generating an acid by photolysis described in West German Patent Publication No. 2,610,842 can also be used. .

Further, o-naphthoquinonediazide-4-sulfonic acid halogenide described in JP-A-50-36209 can be used.

In the inventions according to the first to ninth aspects, as the photoacid generator, an organic halogen compound is preferable from the viewpoints of sensitivity in image formation by infrared exposure and storage stability of the image forming material. As the organic halogen compound, a triazine having a halogen-substituted alkyl group and an oxadiazole having a halogen-substituted alkyl group are preferable, and an s-triazine having a halogen-substituted alkyl group is particularly preferable.

Specific examples of oxadiazoles having a halogen-substituted alkyl group are described in JP-A-54-74728.
JP-A-55-24113, JP-A-55-7774
No. 2, JP-A-60-3626 and JP-A-60-138
No. 539, 2-halomethyl-1,3,4-
Oxadiazole-based compounds are exemplified. Preferred examples of the 2-halomethyl-1,3,4-oxadiazole-based photoacid generator are shown below.

[0022]

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S- having a halogen-substituted alkyl group
As the triazine, a compound represented by the following general formula (1) is preferable.

[0024]

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In the general formula (1), R represents an alkyl group,
A halogen-substituted alkyl group, a phenylvinylene group or an aryl group (for example, a phenyl group, a naphthyl group or the like) which may be substituted with an alkoxy group, or a substituted product thereof;
X represents a halogen atom.

Examples of compounds of the s-triazine photoacid generator represented by the general formula (1) are shown below.

[0027]

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[0028]

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In the first to ninth aspects of the present invention, the content of the photoacid generator can be varied over a wide range depending on its chemical properties and the composition or physical properties of the photosensitive layer of the image forming material of the present invention. Suitably, the range is from about 0.1 to about 20% by weight, preferably 0.2 to 10% by weight, based on the total weight of solids in the layer.

In the inventions according to the first to ninth aspects, an infrared absorbing dye, carbon black, magnetic powder or the like having an absorption at a wavelength of 700 nm or more can be used as the infrared absorbing agent. Particularly preferred infrared absorbers are 700 to 850.
This is an infrared absorbing dye having an absorption peak at nm and a molar extinction coefficient ε at the peak of 10 ⁵ or more.

Examples of the infrared absorbing dye include a cyanine dye, a squarylium dye, a croconium dye, an azurenium dye, a phthalocyanine dye, a naphthalocyanine dye, a polymethine dye, a naphthoquinone dye,
Examples include thiopyrylium dyes, dithiol metal complex dyes, anthraquino dyes, indoaniline metal complex dyes, and intermolecular CT dyes.

Further, as the above-mentioned infrared absorbing dye, JP-A-6
3-139191 and 64-33547, JP-A-1
-160683, 1-280750, 1-29
No. 3342, No. 2-2074, No. 3-26593,
3-30991, 3-34891, 3-36
Nos. 093, 3-36094, 3-36095,
The compounds described in JP-A-3-42281 and JP-A-3-103476 are exemplified.

As the infrared absorber, a cyanine dye represented by the following general formula (2) or (3) is particularly preferred.

[0034]

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In the general formulas (2) and (3), Z ₁ and Z ₂ each represent a sulfur atom, a selenium atom or an oxygen atom, and X ₁ and X ₂ each represent a benzocondensation which may have a substituent. A nonmetallic atom group necessary for forming a ring or a naphtho condensed ring; R ₃ and R ₄ each represent a substituent; one of R ₃ and R ₄ has an anionic dissociable group;
R ₅ , R ₆ , R ₇ and R ₈ each represent an alkyl group having 1 to 3 carbon atoms, a hydrogen atom or a halogen atom. L represents a chain of conjugated bonds having 5 to 13 carbon atoms.

The cyanine dye represented by the general formula (2) or (3) includes those in which the general formula (2) or (3) forms a cation and has a counter anion. in this case,
As the counter anion, Cl ⁻ , Br ⁻ , ClO ₄ ⁻ , B
And alkylboron such as F ₄ ⁻ and t-butyltriphenylboron.

In the general formulas (2) and (3), the number of carbon atoms (n) in the chain of conjugated bonds represented by L is determined when a laser emitting infrared light is used as a light source for image exposure. It is preferable to select an effective value according to the transmission wavelength of the light. For example, Y at an emission wavelength of 1060 nm
When an AG laser is used, n is preferably 9 to 13. The conjugate bond may have an arbitrary substituent, and the conjugate bond may form a ring with a plurality of substituents.

In the general formulas (2) and (3), the ring represented by X ₁ and the ring represented by X ₂ can have any substituent. Halogen atom as the substituent, an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, (the M hydrogen atom or an alkali metal atom) -SO ₃ M and -COOM is a group selected from the preferred .

R ₃ and R ₄ are each an optional substituent,
Preferably, an alkyl group having 1 to 5 carbon atoms or an alkoxy group having 1 to 5 carbon atoms;-(CH ₂ ) _n -O-)
_{k - (CH 2) m OR} (n and m are each an integer of 1 to 3, k
Represents 0 or 1, and R represents an alkyl group having 1 to 5 carbon atoms. One of R ₃ and R ₄ is —R—SO ₃ M and the other is —
R—SO ₃ ⁻ (R represents an alkyl group having 1 to 5 carbon atoms, M represents an alkali metal atom); or one of R ₃ and R ₄ represents —
R-COOM other hand is -R-COO ^- (R is an alkyl group having 1 to 5 carbon atoms, M represents an alkali metal atom.)
It is. R ₃ and R ₄ are, in terms of sensitivity and developability, R ₃
And one is -R-SO ₃ of R ₄ ^- or -R-COO ^-, it is preferred the other is -R-SO ₃ M or -R-COOM.

The cyanine dye represented by the general formula (2) or (3) has an absorption peak at 750 to 900 nm when a semiconductor laser is used as a light source for image exposure, and at 900 to 1200 nm when a YAG laser is used. And those having a molar extinction coefficient of ε> 1 × 10 ⁵ are preferred.

Representative specific examples of the infrared absorber preferably used are shown below, but are not limited thereto.

[0042]

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[0043]

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[0044]

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[0045]

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[0046]

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[0047]

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[0048]

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[0049]

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[0050]

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[0051]

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[0052]

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[0053]

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[0054]

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[0055]

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These dyes can be synthesized by known methods, but the following commercially available products can also be used.

Nippon Kayaku: IR750 (anthraquinone type); IR002, IR003 (aluminum type);
R820 (polymethine type); IRG022, IRG03
3 (diimmonium-based); CY-2, CY-4, CY-
9, CY-20 Mitsui Toatsu: KIR103, SIR103 (phthalocyanine-based); KIR101, SIR114 (anthraquinone-based); PA1001, PA1005, PA1006, S
IR128 (metal complex type) Dainippon Ink and Chemicals: Fastogen blue 812
0 Midori Kagaku: MIR-101, 1011, 1021 Others are also commercially available from companies such as Nippon Kogaku Dyestuffs, Sumitomo Chemical, and Fuji Photo Film.

The amount of the infrared absorber added is 0.5 to 10 w
A range of t% is preferred.

The silanol compound contained in the photosensitive layer according to the first aspect of the present invention has at least one hydroxyl group bonded to a silicon atom per silicon atom on average. Here, the average means that, for example, even if a compound has one silicon atom to which no hydroxyl group is bonded, the same effect can be obtained if one silicon atom to which two hydroxyl groups are bonded is obtained. is there. Such silanol compounds include, for example, diphenylsilanediol, triphenylsilanol, cis- (1,
(3,5,7-tetrahydroxy) -1,3,5,7-tetraphenylcyclotetrasiloxane and the like can be used.

The amount of the silanol compound is 5 to 70% by weight.
Is preferably within the range.

In the invention according to claim 2, the carboxylic acid or carboxylic acid derivative contained in the photosensitive layer includes aromatic carboxylic acids such as cinnamic acid, benzoic acid, tolylacetic acid, toluic acid, isophthalic acid, dimethyl isophthalate, and isophthalic acid. Aromatic esters such as di-t-butyl acid, acid anhydrides such as glutaric anhydride, succinic anhydride, and benzoic anhydride; copolymers such as styrene-maleic anhydride copolymer and styrene-methacrylic acid copolymer Is mentioned.

In the invention according to claim 2, the compound having a hydroxyl group contained in the photosensitive layer includes a polyhydric alcohol such as glycerin, poly p-hydroxystyrene,
High molecular compounds such as p-hydroxystyrene / styrene copolymer and novolak resin are exemplified.

In the photosensitive layer according to the second aspect of the invention, the composition ratio of the carboxylic acid or its derivative to the compound having a hydroxyl group is preferably in the range of 1:30 to 30 to 1 in terms of equivalent ratio.

In the invention according to claim 2, one of the compound having a hydroxyl group and the carboxylic acid or a derivative thereof may be a polymer compound. When the compound having a hydroxyl group is a polymer compound, it is preferable to use a carboxylic acid or a derivative thereof in an amount of 1 to 50 in a weight ratio to the polymer compound 100. When the carboxylic acid or its derivative is a polymer compound, it is preferable to use a compound having a hydroxyl group with respect to the polymer compound 100 in an amount of 1 to 20 by weight ratio.

In the invention according to claim 2, at least one of the carboxylic acid and the compound having a hydroxyl group is preferably a high molecular compound from the viewpoint of film-forming properties. However, even if both are low molecular weight, it is sufficient that the coating film can be formed by a method such as mixing a high molecular compound. As the high molecular compound, the alkali-soluble polymer according to claim 1 is preferable.

In the invention according to claim 2, a polymer compound having both a compound having a hydroxyl group and a carboxylic acid or a carboxylic acid derivative at the same time can be used. Examples of the polymer compound include p-hydroxystyrene having a hydroxyl group and a carboxylic acid or a carboxylic acid derivative, such as methacrylic acid ester such as methyl methacrylate, acrylic acid ester such as methyl acrylate, maleic anhydride, methacrylic acid, and acrylic acid. And the like.

The weight average molecular weight of these high molecular compounds is desirably in the range of 1,000 to 50,000. If the molecular weight is less than 1,000, sufficient heat resistance and coating properties cannot be obtained. On the other hand, if the molecular weight exceeds 50,000, the solubility in an aqueous alkali solution is not sufficient, and pattern deformation due to swelling is observed, so that high resolution cannot be obtained.

The amount of the carboxylic acid or its derivative and the compound having a hydroxyl group is preferably in the range of 5 to 50% by weight.

In the invention according to claim 3, the compound having a cationically polymerizable double bond contained in the photosensitive layer includes p-diisopropenylbenzene, m-diisopropenylbenzene, diphenylethylene, indenone, acenaphthene, -Norbornene, 2,5-norbornadiene, 2,3-benzofuran, indole, 5-methoxyindole, 5-methoxy-2-methylindole, N
At least one compound selected from the group consisting of -vinyl-2-pyrrolidone and N-vinylcarbazole.

The amount of the compound having a cationic double bond is preferably in the range of 5 to 50% by weight.

In the invention according to claim 4, examples of the secondary or tertiary alcohol having an aromatic group include biphenyl derivatives, naphthalene derivatives and triphenyl derivatives. Specifically, the following general formula (5) To (8).

[0072]

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In the general formulas (5) to (8), R ₁ and R ₂ may be the same or different and each represents a hydrogen atom,
X represents a methyl group or an ethyl group, X represents a hydrogen atom, a halogen atom, a methyl group or a methoxy group, and Y represents -SO _{2
-, - CH 2 -, -} S -, - C (CH 3) 2 - represents, n
Represents 1 or 2.

As specific compounds, for example, 4,4 '
-Bis (α-hydroxyisopropyl) biphenyl,
3,3'-bis (α-hydroxyisopropyl) biphenyl, 2,4,2 ', 4'-tetra (α-hydroxyisopropyl) biphenyl, 3,5,3', 5'-tetra (α-hydroxyisopropyl) Biphenyl, 4,4 '
-Bis (α-hydroxyisopropyl) biphenyl sulfone, 3,3′-bis (α-hydroxyisopropyl)
Biphenyl sulfone, 4,4'-bis (α-hydroxyisopropyl) biphenylmethane, 3,3'-bis (α
-Hydroxyisopropyl) biphenylmethane, 4,
4'-bis (α-hydroxyisopropyl) biphenyl sulfide, 3,3'-bis (α-hydroxyisopropyl) biphenyl sulfide, 2,2-bis (4-α-
Hydroxyisopropylphenyl) propane, 2,2-
And bis (3-α-hydroxyisopropylphenyl) propane. The naphthalene derivative is 1,5-bis (1
-Hydroxypropyl) naphthalene, 2,6-bis (α
-Hydroxypropyl) naphthalene and the like. Triphenyl derivatives are tris (4-α-hydroxyisopropylphenyl) methane, tris (3-α-hydroxyisopropylphenyl) methane, 1,1,1-tris (4-
α-hydroxyisopropylphenyl) ethane, 1,
1,1-tris (3-α-hydroxyisopropylphenyl) ethane and the like.

As the secondary or tertiary alcohol having an aromatic group, there can be mentioned compounds represented by the following general formulas (9) to (11).

[0076]

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In the general formula (9), R ₁ and R ₂ may be the same or different and each represents a hydrogen atom, a halogen atom or a methoxy group, and R ₃ represents a hydrogen atom, a phenyl group or a cyclopropyl group. .

In the general formula (10), R ₄ and R ₅ may be the same or different and each represents a hydrogen atom or a phenyl group.

In the general formula (11), A represents an alkyl group having 4 or less carbon atoms or a methylol group.

The secondary or tertiary alcohol having a hydroxyl group at the carbon directly bonded to the aromatic ring used in the present invention includes a phenylmethanol derivative and an alicyclic alcohol having an aromatic ring.

The phenylmethanol derivatives include:
For example, diphenylmethanol, 4,4'-difluorodiphenylmethanol, 4,4'-dichloro-diphenylmethanol, 4,4'-dimethyl-diphenylmethanol, 4,4'-dimethoxydiphenylmethanol, triphenylmethanol, α- (4 -Pyridyl) -benzhydrol, benzylphenylmethanol, 1,1-diphenylethanol, cyclopropyldiphenylmethanol, 1-phenylethyl alcohol, 2-phenyl-2
-Propanol, 2-phenyl-2-butanol, 1-
Phenyl-1-butanol, 2-phenyl-3-butyn-2-ol, 1-phenyl-1-propanol, 1,
2-diphenylethylene glycol, tetraphenylethylene glycol, 2,3-diphenyl-2,3-butanediol, α-naphtholbenzein, α, α′-dihydroxy-p-diisopropylbenzene, α, α′-
Dihydroxy-m-diisopropylbenzene and the like.

The alicyclic alcohol having an aromatic ring includes 1-indanol, 2-bromoindanol,
Chromanol, 9-fluorenol, 9-hydroxy-
3-fluorene, 9-hydroxyxanthene, 1-acenaphthenol, 9-hydroxy-3-nitrofluorene, thiochroman-4-ol, 9-phenylxanthen-9-ol, 1,5-dihydroxy-1,2,3 ,
4-tetrahydronaphthalene, dibenzosuberenol,
Dibenzosuberol and the like.

Further, in addition to the above, as the secondary or tertiary alcohol used in the invention according to claim 4, 1- (9-
Anthryl) ethanol, 2,2,2-trifluoro-
Examples thereof include 1- (9-anthryl) ethanol and 1-naphthylethanol.

In the invention according to claim 5, the alkali-soluble polymer having an aromatic ring having a methylol group, an alkoxymethyl group or an acetoxymethyl group in the molecule contained in the photosensitive layer is represented by the following general formula (12). Polymers having a group in which one or two hydrogen atoms on the aromatic ring of the compound are removed in the molecule.

[0085]

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In the general formula (12), X represents a methylol group, an alkoxymethyl group having 1 to 5 carbon atoms or an acetoxymethyl group. Y represents an alkyl group, a hydroxyl group, a halogen atom, a hydrogen atom, or an alkoxy group.

Further, as the alkali-soluble polymer to be contained in the photosensitive layer of the invention according to claim 5, a polymer compound having a repeating unit represented by the following general formula (13) or (14) is preferable.

[0088]

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In the general formulas (13) and (14), R
₁ represents an alkyl group, a hydrogen atom, a halogen atom or a cyano group, and L represents a single bond, -O-, -O-CO-, -CON.
R _3- , -CONR ₃ CO-, -CONR ₃ SO _2- , -N
R ₃ —, —NR ₃ CO—, —NR ₃ SO ₂ —, —SO ₂ —,
Represents —SO ₂ NR ₃ — or —SO ₂ NR ₃ CO— (R ₃ represents a hydrogen atom, an alkyl group, an aralkyl group or an aromatic ring group). X and Y have the same meanings as X and Y in formula (12).

The repeating unit represented by the above general formula (13) or (14) includes vinyl benzyl alcohol, α-methyl vinyl benzyl alcohol, vinyl benzyl acetate, α-methyl vinyl benzyl acetate, p-methoxy styrene, It is preferable to copolymerize with a monomer such as methylolphenyl methacrylamide.

In the invention according to claim 6, the aminoplast contained in the photosensitive layer is represented by the following general formula (15):
The compound represented by is preferred.

[0092]

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In the general formula (15), Z is -NRR '
Or a phenyl group. _{R, R ', R 10 ~R} 13 are each a hydrogen _{atom, -CH 2 OH, -CH 2 OR} a or -CO-OR _a
Represents R _a represents an alkyl group.

The melamine or benzoguanamine represented by the general formula (15) can be easily obtained as a commercial product, and the methylol form thereof can be obtained by condensation of melamine or benzoguanamine with formalin. Ethers can be obtained by modifying a methylol compound with various alcohols by a known method. As the alkyl group represented by _Ra in the general formula (15), an alkyl group having 1 to 4 carbon atoms which may be linear or branched is preferable.

Specific examples of the compound represented by the general formula (15) include the following, but are not limited thereto.

[0096]

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[0097]

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In the invention according to claim 6, as the aminoplast to be contained in the photosensitive layer, a compound represented by the following general formula (16) and a plurality of A melamine resin having a triazine nucleus bonded thereto and a compound represented by the following general formula (18) or (19) can also be used.

[0099]

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In the general formulas (16) to (19), R represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.

In the invention according to claim 7, as the compound represented by the general formula (A), o-acetylbenzoic acid, o-aldehydebenzoic acid, o-benzoylbenzoic acid, o-toluoylbenzoic acid, o- It is desirable to use acetoxybenzoic acid.

The content of the compound represented by formula (A) in the photosensitive layer is suitably in the range of 5 to 50% by weight, preferably 10 to 30% by weight.

The alicyclic alcohol used in the invention according to claim 8 includes, for example, 2-adamantanol,
-Methyl-2-adamantanol, 2-ethyl-2-adamantanol, 2-propyl-2-adamantanol, 2-butyl-2-adamantanol, exo-norborneol, endo-norborneol, borneol, DL-iso Borneol, terpinen-4-ol, S-cis-verbenol, isopinocanphenol, pinanediol and the like.

As the heterocyclic alcohol, for example, 1,
4-dioxane-2,3-diol, 5-methyl-1,
4-dioxane-2,3-diol, 5,6-dimethyl-1,4-dioxane-2,3-diol, DL-ex
o-Hydroxytropinone, 4-hydroxy-4-phenylpiperidine, 3-quinuclidinol, 4-chromanol, thiochroman-4-ol, DL-mavalonic acid lactone and the like. The heterocyclic alcohol preferably contains O or S in the heterocyclic ring.

In the invention according to claim 8, as the alcohol, a secondary or tertiary alcohol may be added in addition to the alicyclic alcohol and the heterocyclic alcohol.

The content of the alicyclic or heterocyclic alcohol in the photosensitive layer is suitably from 5 to 50% by weight, preferably from 1 to 50% by weight.
0 to 30% by weight.

It is preferred that the photosensitive layer of the image forming material according to the first to sixth aspects of the present invention contains an alkali-soluble polymer. Examples of the alkali-soluble polymer include a novolak resin, a polymer having a hydroxystyrene unit, a polymer having a structural unit represented by the following general formula (4), and other known acrylic resins.

Examples of the novolak resin include phenol-formaldehyde resin, cresol-formaldehyde resin, phenol-cresol-formaldehyde copolycondensate resin described in JP-A-55-57841, and And a copolycondensate resin of p-substituted phenol and phenol or cresol and formaldehyde as described in JP-A-127553. The novolak resin is preferably contained in the range of 20 to 80% by weight based on the photosensitive layer.

Examples of the polymer having a hydroxystyrene unit include polyhydroxystyrene and hydroxystyrene copolymer described in JP-B-52-41050.

The polymer having the structural unit represented by the general formula (4) may be a homopolymer having a repeating structure composed of only the structural unit or an unsaturated dimer of the structural unit and another vinyl monomer. It is a copolymer in which one or more structural units having a structure in which a heavy bond is cleaved are combined.

[0111]

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In the general formula (4), R ₁ and R ₂ each represent a hydrogen atom, an alkyl group such as a methyl group or an ethyl group, or a carboxyl group, preferably a hydrogen atom.
R ₃ represents a hydrogen atom, a halogen atom such as a chlorine atom or a bromine atom, or an alkyl group such as a methyl group or an ethyl group, and is preferably a hydrogen atom or a methyl group. R ₄ represents a hydrogen atom, an alkyl group such as a methyl group or an ethyl group, a phenyl group or a naphthyl group.

Y represents a phenylene group or a naphthylene group including those having a substituent; examples of the substituent include an alkyl group such as a methyl group and an ethyl group; a halogen atom such as a chlorine atom and a bromine atom; a carboxyl group; Examples thereof include an alkoxy group such as an ethoxy group, a hydroxyl group, a sulfo group, a cyano group, a nitro group, an acyl group, and the like, and preferably have no substituent or are substituted with a methyl group. X is a divalent organic group linking a nitrogen atom and an aromatic carbon atom, and n represents an integer of 0 to 5, and preferably n is 0.

The polymer having the structural unit represented by the general formula (4) is more specifically exemplified by, for example, the following (a) to (f)
Can be represented by

[0115]

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In (a) to (f), R _{1 to} R ₅ each represent a hydrogen atom, an alkyl group or a halogen atom;
Represents an alkyl group or a halogen atom. Also, m, n,
1, k and s represent mol% of each structural unit.

Further, a novolak resin, a polymer having a hydroxystyrene unit, a polymer having a structural unit represented by the general formula (4), and an acrylic resin can also be used in combination.

The acrylic resin is a polymer having acrylic acid, methacrylic acid, or an ester thereof as a constituent unit, and is preferably a polymer having a monomer unit represented by the general formula (4). is there.

The alkali-soluble polymer is preferably contained in the photosensitive layer in an amount of 20 to 80% by weight.

In the photosensitive layer of the image forming material according to the first to sixth aspects of the present invention, an insolubilizing agent described in the following literature can be used in combination. JP-A-2-25850 and JP-A-2-1203
No. 66, JP-A-2-150846, JP-A-2-170
No. 165, JP-A-2-173647, JP-A-2-24
4789, JP-A-2-245756, JP-A-3-1
No. 79355, JP-A-3-192361, JP-A-4-192
No. 42158, JP-A-4-51243, JP-A-4-4-2
87043, JP-A-5-66562, JP-A-5-1
27371, JP-A-5-142774, JP-A-5-142
148774, JP-A-5-188597, JP-A-5-18897
-313372, JP-A-5-341529, JP-A-6-51517, JP-A-6-266108, JP-A-6-348015, JP-A-7-28246, JP-A-7-77802, JP-A-7- 104473, JP-A-7-120928, JP-A-7-140661, JP-A-7-219226, JP-A-7-225480, JP-A-7-239947, JP-A-7-248624,
JP-A-7-31467, JP-A-8-6251, JP-A-8-62832, JP-A-8-95248, JP-A-8-110638, JP-A-8-146609, JP-A-8-240907, Kaihei 8-254819,
JP-A-8-292560, JP-A-8-292561
JP-A-9-61995, JP-A-4-165359
JP-A-3-156463, JP-A-7-15999
3, JP-A-7-159992, JP-A-5-1947
9, JP-A-5-150454, JP-A-4-2697
No. 54, JP-A-4-216556, JP-A-5-181
265, JP-A-8-190191, JP-A-8-32
0563 and JP-A-8-328256.

The techniques of sensitizers, stabilizers and photoacid generators described in the above publications can be applied to the photosensitive layer of the image forming material according to the first to eighth aspects of the present invention.

The photosensitive layer of the image forming material according to the first to eighth aspects of the present invention may contain a nonionic surfactant. Nonionic surfactants include polyoxyethylene alkyl ether, polyoxyethylene alkyl allyl ether, polyoxyethylene derivative, oxyethylene / oxypropylene block copolymer, sorbitan fatty acid ester, polyoxyethylene sorbitan fatty acid ester, polyoxyethylene sorbitol fatty acid ester Glycerin fatty acid ester, polyoxyethylene fatty acid ester, polyoxyethylene alkylamine, alkyl alkanolamide, polyethylene glycol and the like. The nonionic surfactant is preferably contained in the photosensitive layer in the range of 0.01 to 10% by weight.

Further, a lipophilic resin can be added to the photosensitive layer according to the first to eighth aspects of the present invention in order to improve the oil sensitivity of the photosensitive layer. As the lipophilic resin, for example,
As described in JP-A-50-125806, condensates of phenols and aldehydes substituted with an alkyl group having 3 to 15 carbon atoms, such as t-butylphenol formaldehyde resin, can be used.

The photosensitive layer of the image forming material of the invention according to any one of claims 1 to 8 may further contain, if necessary, a dye or pigment other than the above.
A sensitizer and the like can be contained.

The image forming material according to the first to eighth aspects of the present invention is prepared by dissolving the components for forming the photosensitive layer in a solvent, coating the solution on a suitable support surface, and drying to provide a sensitive layer. can do.

Examples of the solvent include propylene glycol monomethyl ether, propylene glycol monoethyl ether, methyl cellosolve, methyl cellosolve acetate, ethyl cellosolve, ethyl cellosolve acetate, dimethylformamide, dimethyl sulfoxide, dioxane, acetone, cyclohexanone, trichloroethylene, methyl ethyl ketone and the like. No. These solvents are used alone or in combination of two or more.

The coating method can be a conventionally known method, for example, spin coating, wire bar coating, dip coating, air knife coating, roll coating, blade coating, curtain coating and the like. The amount of application varies depending on the application, for example,
In the case of a photosensitive lithographic printing plate, the solid content is 0.5 to 5.0.
g / m ² is preferred.

In the invention according to claims 1 to 8, the support may be a metal plate such as aluminum, zinc, steel or copper, or a metal plated or deposited with chromium, zinc, copper, nickel, aluminum or iron. Examples thereof include a plate, paper, a plastic film and a glass plate, paper coated with a resin, paper covered with a metal foil such as aluminum, and a plastic film subjected to a hydrophilic treatment.

When the invention according to claims 1 to 8 is applied to a photosensitive lithographic printing plate, a surface treatment such as graining treatment, anodic oxidation treatment and, if necessary, sealing treatment is performed as a support. It is preferable to use an aluminum plate. A known method can be applied to these processes.

Examples of the graining method include a mechanical method and an electrolytic etching method.
Examples of the mechanical method include a ball polishing method, a brush polishing method, a polishing method using liquid honing, and a buff polishing method. The various methods described above can be used alone or in combination depending on the composition of the aluminum material and the like.

For etching by electrolysis, phosphoric acid,
It is carried out using a bath in which inorganic acids such as sulfuric acid, hydrochloric acid and nitric acid are used alone or in combination of two or more. After the graining treatment, if necessary, a desmut treatment is performed with an aqueous solution of an alkali or an acid to neutralize and wash with water.

The anodizing treatment is carried out by using a solution containing one or more of sulfuric acid, chromic acid, oxalic acid, phosphoric acid, malonic acid and the like as an electrolytic solution, and using an aluminum plate as an anode for electrolysis. The amount of anodic oxide film formed is 1 to 50 m
g / dm ² is suitable, and preferably 10 to 40 mg / g.
dm ² , particularly preferably 25 to 40 mg / dm ² . The amount of the anodic oxide film is determined, for example, by immersing the aluminum plate in a chromic acid phosphate solution (prepared by dissolving 35 g of phosphoric acid 85% solution and 20 g of chromium (IV) oxide in 1 liter of water) to dissolve the oxide film. It is determined from the weight change measurement before and after dissolution of the coating on the plate.

Examples of the sealing treatment include a boiling water treatment, a steam treatment, a sodium silicate treatment, and a dichromate aqueous solution treatment. In addition, the aluminum plate support may be subjected to an undercoating treatment with an aqueous solution of a water-soluble polymer compound or a metal salt such as fluorinated zirconic acid.

The image forming material according to the first to eighth aspects of the present invention uses infrared rays for image exposure. Semiconductor laser, He-Ne laser, YAG laser,
A carbon dioxide laser or the like can be used. The output is suitably 50 mW or more, preferably 100 mW or more.

In the image forming material according to any one of the first to eighth aspects, the photosensitive layer is subjected to heat treatment after image exposure. This heat treatment is suitably performed at 80 to 200 ° C., preferably 100 to 130 ° C., for 10 seconds to 5 minutes. As the heating means, a known method such as radiation from an infrared heater or nip by a heating roll can be used.

The image forming material according to the first to eighth aspects of the present invention forms an image by eluting and removing a non-exposed portion with an alkaline developer. As the alkaline developer, an aqueous alkaline developer is suitable. Examples of the aqueous alkaline developer include aqueous solutions of alkali metal salts such as sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, sodium metasilicate, potassium metasilicate, dibasic sodium phosphate, and tertiary sodium phosphate. No. The concentration of the alkali metal salt is preferably used in the range of 0.05 to 20% by weight, more preferably 0.1 to 10% by weight.

The aqueous alkaline developer may optionally contain an anionic surfactant, an amphoteric surfactant or an organic solvent such as alcohol.

As the organic solvent, propylene glycol, ethylene glycol monophenyl ether, benzyl alcohol, n-propyl alcohol and the like are useful.

[0139]

Next, the present invention will be described more specifically with reference to examples. In the following examples and comparative examples, “parts” means “parts by weight”.

Example 1 Preparation of Support A 0.24 mm thick aluminum plate (material: 1050, tempered H16) was degreased in a 5% aqueous sodium hydroxide solution at 60 ° C. for 1 minute, and then 0.5 mol / l The electrolytic etching was performed in a hydrochloric acid aqueous solution at a temperature of 25 ° C., a current density of 60 A / dm ² and a processing time of 30 seconds. Then, after a desmut treatment at 60 ° C. for 10 seconds in a 5% aqueous sodium hydroxide solution, an anodizing treatment is performed in a 20% sulfuric acid solution at a temperature of 20 ° C., a current density of 3 A / dm ² and a treatment time of 1 minute. Was. Further, hot water sealing treatment was performed for 20 seconds with hot water at 30 ° C. to produce an aluminum plate as a support for a lithographic printing plate material.

The photosensitive layer coating solution 1 having the following composition was applied on the aluminum plate support using a spin coater so that the film thickness after drying was 2 g / m ² , and dried at 90 ° C. for 2 minutes. An image forming material was obtained.

Photosensitive Layer Coating Solution 1 Infrared Absorbing Dye (IR49) 2 parts Photoacid Generator (Exemplified Compound (12)) 3 parts Silanol Compound A (cis- (1,3,5,7-tetrahydroxy) -1 , 3,5,7-tetraphenylcyclotetrasiloxane) 20 parts Novolak resin A (described below) 70 parts

[0143]

Embedded image

Propylene glycol monomethyl ether 1000 parts This image forming material was treated with a semiconductor laser (wavelength 830 nm).
m, output 500 mW). The laser beam diameter was 13 μm at 1 / e ² of the intensity at the peak. The resolution is 2000 in both the scanning direction and the sub-scanning direction.
dpi. After image exposure, the image forming material is
With Konica PS plate developer SDR-1 for 3 minutes.
(Manufactured by Konica Corporation) diluted with water to a volume ratio of 6 times at 27 ° C.
After immersing in a developing solution for 30 seconds and developing to remove a non-image portion (unexposed portion), the plate was washed with water to produce a lithographic printing plate.

Under the above conditions, the sensitivity was evaluated by the exposure energy (mJ / cm ² ) required for developing the exposed portion, and the background smear due to printing was evaluated.

Example 2 The same experiment as in Example 1 was conducted except that the composition of the photosensitive layer coating solution was changed to the following photosensitive layer coating solution 2.

Photosensitive layer coating liquid 2 Infrared absorbing dye (IR49) 2 parts Photoacid generator (Exemplified compound (1)) 3 parts Silanol compound B (diphenylsilanediol) 20 parts Novolak resin A 70 parts Propylene glycol monomethyl ether 1000 Part Example 3 The same experiment as in Example 1 was performed except that the composition of the photosensitive layer coating solution was changed to the following photosensitive layer coating solution 3.

Photosensitive Layer Coating Solution 3 Infrared Absorbing Dye (IR49) 2 parts Photoacid Generator (Exemplified Compound (1)) 3 parts Novolak Resin A 85 parts Dimethyl isophthalate 5 parts Propylene glycol monomethyl ether 1000 parts Example 4 Photosensitivity The same experiment as in Example 1 was conducted except that the composition of the layer coating solution was changed to the following photosensitive layer coating solution 4.

Photosensitive Layer Coating Solution 4 Infrared Absorbing Dye (IR49) 2 parts Photoacid Generator (Exemplified Compound (1)) 3 parts Poly-p-hydroxystyrene 85 parts Benzoic anhydride 5 parts Propylene glycol monomethyl ether 1000 parts Example 5 The same experiment as in Example 1 was conducted except that the composition of the photosensitive layer coating solution was changed to the following photosensitive layer coating solution 5.

Photosensitive Layer Coating Solution 5 The same as the photosensitive layer coating solution 1 except that the silanol compound A in the photosensitive layer coating solution 1 was changed to diisopropenylbenzene.

Example 6 The same experiment as in Example 1 was carried out except that the composition of the photosensitive layer coating solution was changed to the following photosensitive layer coating solution 6.

Photosensitive Layer Coating Solution 6 Same as Photosensitive Layer Coating Solution 1 except that silanol compound A in photosensitive layer coating solution 1 was changed to indole.

Example 7 The same experiment as in Example 1 was conducted, except that the composition of the photosensitive layer coating solution was changed to the following photosensitive layer coating solution 7.

Photosensitive Layer Coating Solution 7 Infrared absorbing dye (IR49) 2 parts Photoacid generator (Exemplified Compound (1)) 3 parts Novolak resin A 70 parts Diphenylmethanol 20 parts Propylene glycol monomethyl ether 1000 parts Example 8 Photosensitive layer The same experiment as in Example 1 was conducted except that the composition of the coating solution was changed to the following photosensitive layer coating solution 8.

Photosensitive Layer Coating Solution 8 Same as Photosensitive Layer Coating Solution 7, except that diphenylmethanol in Photosensitive Layer Coating Solution 7 was changed to 4,4-dimethoxyphenylmethanol.

Example 9 The same experiment as in Example 1 was conducted, except that the composition of the photosensitive layer coating solution was changed to the following photosensitive layer coating solution 9.

Photosensitive layer coating solution 9 Same as photosensitive layer coating solution 7, except that diphenylmethanol in photosensitive layer coating solution 7 was changed to benzpinacol.

Example 10 The same experiment as in Example 1 was conducted except that the composition of the photosensitive layer coating solution was changed to the following photosensitive layer coating solution 10.

Photosensitive Layer Coating Solution 10 The same as Photosensitive Layer Coating Solution 7 except that diphenylmethanol in Photosensitive Layer Coating Solution 7 was changed to α, α'-dihydroxy-p-diisopropylbenzene.

Example 11 The same experiment as in Example 1 was carried out except that the composition of the photosensitive layer coating solution was changed to the following photosensitive layer coating solution 11.

Photosensitive Layer Coating Solution 11 The same as Photosensitive Layer Coating Solution 7, except that diphenylmethanol in Photosensitive Layer Coating Solution 7 was changed to 1-indanol.

Example 12 The same experiment as in Example 1 was performed except that the composition of the photosensitive layer coating solution was changed to the following photosensitive layer coating solution 12.

Photosensitive Layer Coating Solution 12 Same as Photosensitive Layer Coating Solution 7, except that diphenylmethanol in Photosensitive Layer Coating Solution 7 was changed to 9-hydroxyxanthene.

Example 13 The same experiment as in Example 1 was carried out except that the composition of the photosensitive layer coating solution was changed to the following photosensitive layer coating solution 13.

Photosensitive Layer Coating Solution 13 Same as Photosensitive Layer Coating Solution 7 except that diphenylmethanol in Photosensitive Layer Coating Solution 7 was changed to 4,4'-bis (α-hydroxyisopropyl) biphenyl.

Example 14 The same experiment as in Example 1 was carried out except that the composition of the photosensitive layer coating solution was changed to the following photosensitive layer coating solution 14.

Photosensitive Layer Coating Solution 14 Same as Photosensitive Layer Coating Solution 7, except that diphenylmethanol in Photosensitive Layer Coating Solution 7 was changed to 2,6-bis (1-hydroxyisopropyl) naphthalene.

Example 15 The same experiment as in Example 1 was conducted except that the composition of the photosensitive layer coating solution was changed to the following photosensitive layer coating solution 15.

Photosensitive layer coating solution 15 Infrared absorbing dye (IR49) in the composition of photosensitive layer coating solution 14
Is the same as that of the photosensitive layer coating solution 14 except that is changed to an infrared absorbing dye (IR53).

Example 16 The same experiment as in Example 1 was conducted except that the composition of the photosensitive layer coating solution was changed to the following photosensitive layer coating solution 16.

Photosensitive Layer Coating Solution 16 Infrared Absorbing Dye (IR49) 2 parts Photoacid Generator (Exemplified Compound (1)) 3 parts Novolak Resin A 50 parts Resin A (described below) 40 parts Propylene glycol monomethyl ether 1000 parts Resin A A mixed solvent of 125 ml of acetone and 125 ml of methanol was placed in a 500 ml four-necked flask equipped with a thermometer, a reflux condenser, a stirrer, a heating device, and a nitrogen gas inlet tube.
9.0 g of ethyl acrylate (0.09
mol), ethyl methacrylate 34.2 g (0.30
mol) acrylonitrile 15.9 g (0.30 mo
l), 0.86 g (0.01 mol) of methacrylic acid, 35.2 g (0.2 mol) of vinylbenzyl acetate,
And 4-hydroxyphenyl methacrylamide 51.6
g (0.30 mol) was dissolved. Further, 3.28 g (0.02 m) of azobisisobutyronitrile is used as a polymerization initiator.
ol) and heated under vigorous stirring under a nitrogen stream,
Reflux at about 60 ° C. for 6 hours. After the reaction was completed, the reaction solution was cooled to room temperature, and then poured into water to precipitate a polymer compound. This was collected by filtration and dried under vacuum at 50 ° C. for 24 hours. As a result, an alkali-soluble acrylic copolymer (resin 1)
Was obtained in an amount of 100 g. The yield based on the total amount of monomers is 90.
%Met.

The weight average molecular weight of the obtained alkali-soluble acrylic copolymer (resin A) was determined by gel permeation chromatography (GPC) using pullulan standard,
It was 50,000 when measured with N, N-dimethylformamide (DMF) solvent.

Example 17 The same experiment as in Example 1 was conducted except that the composition of the photosensitive layer coating solution was changed to the following photosensitive layer coating solution 17.

Photosensitive Layer Coating Solution 17 Infrared Absorbing Dye (IR49) 2 parts Photoacid Generator (Exemplary Compound (1)) 3 parts Novolak Resin A 70 parts Hexamethoxymethylmelamine 20 parts Propylene glycol monomethyl ether 1000 parts Example 18 The same experiment as in Example 1 was performed except that the composition of the photosensitive layer coating solution was changed to the following photosensitive layer coating solution 18.

Photosensitive Layer Coating Solution 18 The same as Photosensitive Layer Coating Solution 14 except that hexamethoxymethylmelamine in the composition of the photosensitive layer coating solution 17 was changed to tetramethoxybenzoguanamine.

Example 19 The same experiment as in Example 1 was conducted except that the composition of the photosensitive layer coating solution was changed to the following photosensitive layer coating solution 19.

Photosensitive layer coating solution 19 Infrared absorbing dye (IR49) 2 parts Photoacid generator (Exemplified compound (1)) 3 parts Novolak resin A 70 parts o-acetylbenzoic acid 20 parts Propylene glycol monomethyl ether 1000 parts Examples 20 The same experiment as in Example 1 was performed except that the composition of the photosensitive layer coating solution was changed to the following photosensitive layer coating solution 20.

Photosensitive Layer Coating Solution 20 Infrared Absorbing Dye (IR49) 2 parts Photoacid Generator (Exemplified Compound (1)) 3 parts Novolak resin A 70 parts o-acetoxybenzoic acid 20 parts Propylene glycol monomethyl ether 1000 parts Examples 21 The same experiment as in Example 1 was performed, except that the composition of the photosensitive layer coating solution was changed to the following photosensitive layer coating solution 21.

Photosensitive layer coating solution 21 Infrared absorbing dye (IR49) 2 parts Photoacid generator (Exemplary compound (1)) 3 parts Novolak resin A 70 parts 1,4-dioxane-2,3-diol 20 parts Propylene glycol Monomethyl ether 1000 parts Example 22 The same experiment as in Example 1 was performed except that the composition of the photosensitive layer coating solution was changed to the following photosensitive layer coating solution 22.

Photosensitive Layer Coating Solution 22 Infrared Absorbing Dye (IR49) 2 parts Photoacid Generator (Exemplified Compound (1)) 3 parts Novolak Resin A 70 parts 2-Methyl-2-adamantanol 20 parts Propylene glycol monomethyl ether 1000 Part Comparative Example The same experiment as in Example 1 was performed, except that the silanol in the composition of the photosensitive layer coating solution 1 was changed to resol (Shownol CKP918, manufactured by Showa Polymer Co., Ltd.).

The above results are shown in Table 1 below.

[0182]

[Table 1]

In Table 1, the meanings of the symbols in the print stain column are as follows.

：: None at all △: Slightly stained

[0185]

The effects of the invention according to claims 1 to 9 are as follows.

An image forming material and an image forming method with improved sensitivity are provided.

[0187] An image forming material and an image forming method in which background contamination in printing is prevented are provided.

An image forming material and an image forming method capable of shortening the heat treatment after exposure are provided.

──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. ⁶ Identification code FI G03F 7/30 G03F 7/30 7/38 511 7/38 511

Claims (9)

[Claims] 1. An image-forming material comprising a support having thereon a photosensitive layer containing a compound capable of generating an acid upon irradiation with actinic rays, an infrared absorber and a silanol compound. 2. A photosensitive layer containing a compound capable of generating an acid upon irradiation with actinic rays, an infrared absorber, a compound containing a carboxylic acid or a derivative thereof, and a compound having a hydroxyl group, on a support. Image forming material. 3. An image forming method comprising a support having thereon a photosensitive layer containing a compound capable of generating an acid upon irradiation with an actinic ray, an infrared absorber, and a compound having a cationically polymerizable double bond. material. 4. An image comprising, on a support, a photosensitive layer containing a compound capable of generating an acid upon irradiation with an actinic ray, an infrared absorber, and a secondary or tertiary alcohol having an aromatic group. Forming material. 5. A support comprising a compound capable of generating an acid upon irradiation with actinic rays, an infrared absorber and an alkali-soluble polymer having an aromatic ring having a methylol group, an alkoxymethyl group or an acetoxymethyl group in a molecule on a support. An image-forming material comprising a photosensitive layer. 6. An image-forming material comprising a support having thereon a photosensitive layer containing a compound capable of generating an acid upon irradiation with actinic rays, an infrared absorber and an aminoplast. 7. A compound capable of generating an acid upon irradiation with an actinic ray on a support, an infrared absorber, and the following general formula (A)
An image forming material having a photosensitive layer containing a compound represented by the formula: Embedded image [Wherein, R represents a hydrogen atom, an alkyl group having 3 or less carbon atoms, an aryl group or a tolyl group, and R ₁ , R ₂ , R ₃ and R ₄ each represent a hydrogen atom, an alkyl group having 3 or less carbon atoms or Represents an alkoxy group having 3 or less carbon atoms. ] 8. An image comprising a support having thereon a compound capable of generating an acid upon irradiation with actinic rays, an infrared absorber, and a photosensitive layer containing an alicyclic alcohol and / or a heterocyclic alcohol. Forming material. 9. An image is drawn on the photosensitive layer of the image forming material according to any one of claims 1 to 8 using infrared rays, heated, and then unexposed portions are removed with an alkaline developer. An image forming method comprising: